Stress compensator for flat emitters

Abstract

Various methods and systems are provided for a stress compensator (422, 1222) of a planar emitter (420) of a cathode of an x-ray tube (300). In one example, an emitter assembly (410) includes a planar emitter (420) formed with a planar emission surface (602) having a serpentine pattern (604). The emitter assembly (410) also includes a stress compensator (422, 1222) selectively coupled to the planar emitter (420) at a first end (424) of the planar emitter (420). The stress compensator (422, 1222) includes a spring (702, 1224, 1226) formed of a plurality of linear portions arranged in parallel, where each linear portion (704, 706, 708, 710, 712, 1508, 1510, 1518, 1520) of the plurality of linear portions is coupled to a preceding and / or a following linear portion by a turn (724, 1512).

Description

Technical Field

[0001] The embodiments of the subject matter disclosed herein relate to X-ray tubes, and more specifically to thermal expansion and centrifugal stress compensators for flat emitters of cathodes. Background Technology

[0002] In an X-ray tube, ionizing radiation is generated by accelerating electrons from the cathode to the anode in a vacuum via an electric field. The electrons originate from the emitter at the cathode. The emitter can be a flat-surface emitter, also known as a “strip emitter” and / or a “flat emitter,” formed of an electron-emitting material such as tungsten. A flat emitter has a flat electron-emitting surface divided by slots with multiple interconnects to create a single tortuous current-carrying path (also called a “serpentine” path) comprising multiple spaced but interconnected strips, or multiple parallel current-carrying paths. The flat emitter can be positioned on the cathode, with the flat electron-emitting surface orthogonal to the anode. The flat emitter can be heated by flowing current through it to release electrons and accelerate them toward the anode. For example, a flat emitter can operate at temperatures above 2000°C. In some examples, the X-ray tube can be used with X-ray imaging systems, such as computed tomography (CT) imaging systems that include a rotating gantry, and thus the X-ray tube rotates around the object being imaged to provide different imaging views of the object. The rotation of the gantry, and therefore the rotation of the X-ray tube, can apply centrifugal forces exceeding 30G on the flat emitter. Summary of the Invention

[0003] This document provides various systems for stress compensators for emitter assemblies of cathodes. The stress compensator is selectively coupled to the flat emitter of the emitter assembly at a first end of the flat emitter. The flat emitter is formed as a substantially flat sheet with a serpentine pattern. The stress compensator includes a spring formed by a plurality of parallel linear sections, each of which is coupled to a preceding and / or following linear section via a bend. The emitter assembly, including the flat emitter and the stress compensator, can be positioned within the cathode assembly of an X-ray tube. The X-ray tube may also include an anode assembly spaced apart from the cathode assembly.

[0004] It should be understood that the above brief description is provided to introduce some concepts further described in the detailed embodiments in a simplified form. This is not intended to identify key or essential features of the claimed subject matter, the scope of which is uniquely defined by the claims following the detailed embodiments. Furthermore, the claimed subject matter is not limited to specific implementations that address any shortcomings pointed out above or in any part of this disclosure. Attached Figure Description

[0005] This disclosure will be better understood by referring to the following description of non-limiting embodiments, in which:

[0006] Figure 1 A schematic diagram of an X-ray imaging system according to an exemplary embodiment is shown;

[0007] Figure 2 It shows Figure 1 Block diagram of the illustrated X-ray imaging system;

[0008] Figure 3 It shows that it can be included in Figure 1 and / or Figure 2 A schematic diagram of a cross-sectional view of a portion of an X-ray tube in an imaging system;

[0009] Figure 4 A perspective view of the cathode cup of an X-ray tube is shown, wherein the cathode cup includes an emitter assembly that is positioned within the cathode cup by a first positioning support and a second positioning support.

[0010] Figure 5 A top view of the emitter assembly of the cathode cup is shown;

[0011] Figure 6 A top view of the stress compensator of the transmitter assembly is shown;

[0012] Figure 7 A perspective view of the stress compensator is shown;

[0013] Figure 8 A perspective view of the second positioning support for the cathode cup is shown;

[0014] Figure 9 A perspective view of the first positioning support of the cathode cup is shown;

[0015] Figure 10 Various views of the first positioning support are shown at various manufacturing stages;

[0016] Figure 11 A perspective view of the cathode cup of an X-ray tube is shown, wherein the cathode cup includes an emitter assembly that is positioned within the cathode cup by a third positioning support and a fourth positioning support.

[0017] Figure 12 A perspective view of the transmitter assembly is shown, including a second configuration of the stress compensator;

[0018] Figure 13 A top view of the stress compensator of the transmitter assembly is shown;

[0019] Figure 14 A perspective view of the stress compensator is shown;

[0020] Figure 15 A perspective view of the fourth positioning support of the cathode cup is shown;

[0021] Figure 16 A perspective view of the flat launcher connected to the fourth positioning support is shown;

[0022] Figure 17 A perspective view of the third positioning support is shown; and

[0023] Figure 18 A perspective view of a second configuration of a stress compensator positioned in a third positioning support is shown. Detailed Implementation

[0024] The following description relates to various embodiments of stress compensators for flat emitters of the cathode of an X-ray tube. X-ray imaging systems can be interventional radiography imaging systems, fluoroscopy imaging systems, mammography imaging systems, fixed or mobile radiography (RAD) imaging systems, tomography imaging systems, computed tomography (CT) imaging systems, etc. An X-ray imaging system includes an X-ray source (e.g., an X-ray tube) to generate an irradiating X-ray beam. The X-ray tube includes an anode assembly and a cathode assembly, the latter comprising a cathode. The cathode assembly includes an emitter mounted in a cathode cup.

[0025] Conventional X-ray imaging systems use an emitter positioned in the focusing cup of the cathode of an X-ray tube to emit electrons and generate an X-ray beam. The emitter can be a flat emitter with a substantially planar surface. Flat emitters (also known as ribbon emitters) are not formed from coiled filaments / wires but from a substantially flat sheet of tungsten with a serpentine pattern cut through the flat sheet. Flat emitters are more efficient than coiled emitters because the flat surface of the emitter provides more focused electron emission and emits more electrons per surface area compared to coiled filaments. A continuous goal in X-ray tube development is to design emitters that provide a brighter electron source (e.g., more electrons per surface area) and emit more emission.

[0026] Current is transmitted through the emitter and heats it to emit electrons. The current can be supplied to the emitter via a source coupled to it. The current can travel along the serpentine pattern of the flat emitter to heat it and induce electron emission. When current is applied directly through the emitter to generate heat and induce electron emission, the emitter surface can reach temperatures typically above 2000°C. At these temperatures, properties of the materials forming the emitter, such as creep resistance and yield strength, can be significantly reduced from room temperature values. The high operating temperature of the emitter can also cause thermal strain due to thermal expansion. If the emitter is spatially fixed, thermal expansion can cause filament contact in the serpentine pattern, resulting in an electrical short circuit that may stop electron emission and / or degrade the emitter. High operating temperatures can also cause thermal expansion of lower-temperature substructures, such as supports that position the emitter within the X-ray tube. For example, in conventional X-ray tube designs, the emitter may be suspended and / or positioned on an insulator within a cathode cup.

[0027] X-ray imaging also involves rotating the X-ray tube around the imaging area to acquire projection data, for example, at different energy levels. Rotating the X-ray tube around its central axis applies centrifugal force to the X-ray tube, and thus to the emitter. This centrifugal force can be, for example, 30G, 50G, or greater. The centrifugal force experienced by the emitter can cause it to move and short-circuit. For example, the emitter may move within the cathode cup and / or its shape may deform, which could cause segments of the serpentine pattern to contact each other and / or contact the cathode cup and short-circuit. Additionally, the radial load G caused by the rotation of the X-ray tube can push the emitter and compress it like a spring. This compression can cause the filaments of the serpentine pattern to compress and contact, which short-circuits the emitter. This is undesirable because short-circuiting can degrade the emitter and render it, and therefore the X-ray tube, inoperable.

[0028] The combination of high centrifugal force, thermal strain, and reduced material properties can cause the emitter to deform in the direction of the centrifugal force. This can lead to the closure of the slots dividing the emission surface, causing adjacent strips to come into contact with each other. The closed slots can create an electrical short circuit, thereby reducing the temperature of the emission region and affecting the emission distribution of the emitter. Therefore, it is desirable to prevent short circuits in the emitter when high external forces (e.g., centrifugal force due to rotation) and high temperatures are applied.

[0029] A transmitter assembly design is desired that resists short circuits caused by thermal expansion, centrifugal force, and compression of the transmitter. This document describes a transmitter assembly comprising a flat transmitter and a stress compensator selectively coupled to the flat transmitter. The stress compensator provides a compliant element within the transmitter assembly, which is not fixedly coupled to the flat transmitter and / or integrated into the flat transmitter itself. As described herein, “compliance” defines a flexible element, mechanism, or assembly that transmits force and motion through the deformation of an elastomer. This allows for the use of different types of transmitters and / or the transmitter assembly in different cathode assembly configurations. Furthermore, the stress compensator can have different configurations emphasizing various benefits of compliant design, such as increased transmitter compliance with thermal expansion during heating and / or due to rotation of the X-ray tube in which the transmitter is positioned.

[0030] The technical advantages of the system disclosed herein include a simple and compact emitter assembly for generating an X-ray beam that does not significantly increase the complexity, space, or weight of the cathode (also referred to herein as the "cathode assembly") while improving emitter efficiency. Deterioration of the emitter due to short circuits is reduced by attaching a stress compensator to the end of the emitter, wherein the stress compensator includes a spring that provides deformation flexibility.

[0031] Before further discussion of the stress compensator for the transmitter assembly, an example imaging system in which the transmitter assembly can be implemented is shown. Figure 1 A schematic diagram of an embodiment of an X-ray imaging system 100 according to an exemplary embodiment is shown. This X-ray imaging system is configured to acquire raw image data and process the image data for display and / or analysis. It should be understood that various embodiments are applicable to numerous X-ray imaging systems that implement X-ray tubes, such as radiographic (RAD) imaging systems, X-ray mammography imaging systems, fluoroscopy imaging systems, tomography imaging systems, or computed tomography (CT) imaging systems. The following discussion of the X-ray imaging system 100 is merely an example of such a specific embodiment and is not intended to limit it in terms of modality.

[0032] The X-ray imaging system 100 can be configured as one or more of an interventional radiographic imaging system, a mammography imaging system, a fixed or mobile RAD imaging system, etc. Specifically, the X-ray imaging system 100 is configured to image a subject 112 (such as a patient, an inanimate object, one or more manufactured parts) and / or foreign objects (such as dental implants, stents, and / or contrast agents present in the body). In one embodiment, the X-ray imaging system 100 includes a gantry 102, which may further include at least one X-ray source 104 configured to project an X-ray radiation beam for imaging the subject 112 lying on the examination table 114. Specifically, the X-ray source 104 is configured to project an X-ray radiation beam toward a detector assembly 108 positioned on opposite sides of the gantry 102. In some embodiments, the X-ray source 104 is configured to traverse different angular positions around the subject 112 to acquire desired projection data. Therefore, the rack 102 and the components mounted thereon can be configured to rotate about the rotation center 106 to acquire projection data, for example, at different energy levels. Alternatively, in an embodiment where the projection angle relative to the subject 112 varies over time, the mounted components can be configured to move along a general curve rather than along a circumference.

[0033] although Figure 1 A single X-ray source 104 is depicted, but in some embodiments, multiple X-ray tubes and detectors may be employed to project multiple X-ray radiation beams for acquiring projection data at different energy levels corresponding to the patient. In some embodiments, the X-ray source 104 can achieve dual-energy gemstone spectral imaging (GSI) via rapid peak kilovolt (kVp) voltage switching. In some embodiments, the X-ray detector employed is a photon-counting detector capable of distinguishing X-ray photons of different energies. In other embodiments, two sets of X-ray tubes and detectors are used to generate dual-energy projections, one set configured for low kVp and the other for high kVp. Therefore, it should be understood that the methods described herein can be implemented using both single-energy and dual-energy acquisition techniques.

[0034] In some CT imaging system configurations, an X-ray tube projects a cone-shaped beam of X-ray radiation, which is collimated to lie in the XYZ plane of a Cartesian coordinate system and is often referred to as the "imaging plane." The X-ray beam passes through the object being imaged, such as a patient or subject. After being attenuated by the object, the X-ray beam strikes an array of detector elements. The intensity of the attenuated X-ray beam received at the detector elements depends on the attenuation of the beam by the object. Each detector element in the array generates a separate electrical signal, which is a measurement of the X-ray beam attenuation at the detector location. Attenuation measurements from all detector elements are acquired individually to produce a transmission distribution.

[0035] In some CT systems, a gantry is used to rotate the X-ray tube and detector assembly within the imaging plane and around the object to be imaged, causing the angle at which the radiation beam intersects the object to continuously change. A set of X-ray beam attenuation measurements (e.g., projection data) from the detector assembly at a single gantry angle is referred to as a “view.” A “scan” of the object comprises a set of views acquired at different gantry angles or viewing angles during a single rotation of the X-ray tube and detector. It is conceivable that the benefits of the methods described herein stem from medical imaging modalities beyond CT; therefore, as used herein, the term “view” is not limited to the uses described above relative to projection data from a single gantry angle. The term “view” is used to mean a data acquisition whenever multiple data acquisitions from different angles exist (whether from CT, positron emission tomography (PET), or single-photon emission CT (SPECT) acquisitions), and / or any other modality (including modalities yet to be developed) and their combinations in fusion implementations.

[0036] Projection data is processed to reconstruct an image corresponding to a two-dimensional slice obtained from an object, or, in some examples, to reconstruct an image corresponding to a three-dimensional rendering of the object, the projection data includes multiple views or scans. One method for reconstructing an image from a set of projection data is known in the art as filtered backprojection. Transmission and emission tomography reconstruction techniques also include statistical iterative methods, such as MLEM and ordered subset expectation reconstruction techniques, as well as iterative reconstruction techniques. This method converts attenuation measurements from scans into integers called “CT numbers” or “Henness units,” which are used to control the brightness of the corresponding pixels on a display device.

[0037] Figure 2 It is shown in block diagram 200 Figure 1 Further details of the X-ray imaging system 100. (See below) Figure 2As shown, the X-ray imaging system 100 includes an X-ray source 104 configured to project a beam of X-rays 206 through a subject 112. The subject 112 may include a human subject, luggage, or other object to be scanned. The X-ray source 104 may be one or more X-ray tubes that generate X-rays 206 having an energy spectrum typically ranging from thirty (30) keV to two hundred (200) keV. The X-rays 206 pass through the subject 112 and, after attenuation, strike an array of detectors 208 in a detector assembly 108. Each detector module in the detector assembly 108 generates an analog electrical signal representing the intensity of the striking X-ray beam as the X-ray beam passes through the subject 112, and thus representing the attenuated beam. In one embodiment, the detector assembly 108 is a scintillator-based detector assembly that can be implemented as an energy-integrated detector; however, it is also contemplated that a direct-conversion detector or a photon-counting detector (e.g., CdTe, CZT, Si detector, etc.) can also be implemented.

[0038] X-ray imaging system 100 includes an X-ray controller 210 that provides power and timing signals to X-ray source 104. X-ray imaging system 100 may also include a gantry motor controller 212 that controls the rotational speed and position of gantry 102. In some examples, X-ray imaging system 100 may include a table motor controller 226 configured to control the position of the patient 112 (e.g., via one or more motors of table 114) positioned on the table 114. Rotation of gantry 102 and operation of X-ray source 104 are controlled by computing device 216 of X-ray imaging system 100. Computing device 216 may include a processor 222 configured to send and receive signals from one or more of the X-ray controller 210, gantry motor controller 212, and table motor controller 226. Furthermore, computing device 216 may receive signals from detector assembly 108 and generate an image corresponding to the scanned patient 112. X-ray imaging system 100 may include image reconstructor 230, which is configured to receive sampled and digitized X-ray data (e.g., from a data acquisition system of computing device 216) and perform high-speed image reconstruction. The reconstructed image may be applied as input to computing device 216 and stored in storage device 218.

[0039] The computing device 216 communicates with the processor 222 to enable the operator to use the operator console 220 to control scanning parameters and view the generated images. That is, the operator console 220 includes some form of operator interface, such as a keyboard, mouse, voice-activated controller, or any other suitable input device that allows the operator to control the X-ray imaging system 100 and view reconstructed images or other data from the computing device 216 on the display unit 232. Additionally, the operator console 220 allows the operator to store the generated images in a storage device 218, which may include a hard disk drive, floppy disk, optical disk, etc. The operator can also use the operator console 220 to provide commands and instructions to the computing device 216 to control the X-ray controller 210, which provides power and timing signals to the X-ray source 104.

[0040] Figure 3 Examples are shown that can be included in Figure 1 and / or Figure 2 A schematic cross-sectional view of the X-ray tube 300 in the imaging system. For example, the X-ray tube 300 could be... Figure 1 X-ray source 104 and / or Figure 2 An exemplary implementation of an X-ray source. Figures 3 to 18 The system of axes 301 is provided for reference. In one example, the z-axis may be a vertical axis (e.g., parallel to the axis of gravity), the y-axis may be a transverse axis (e.g., a horizontal axis), and the z-axis may be a longitudinal axis. However, in other examples, these axes may have other orientations. Figures 3 to 18 It is shown approximately to scale, but other relative dimensions may be used.

[0041] The X-ray tube 300 includes an anode assembly 342 and a cathode assembly 344, both of which are housed in a frame 346. The frame 346 defines a region with a relatively low pressure (e.g., vacuum) compared to the environment, in which high voltages may be present. Furthermore, the frame 346 may be positioned within a housing (not shown) filled with a cooling medium (such as oil), which also provides insulation against high voltages.

[0042] Anode assembly 342 includes an anode 348 having a target 366. The anode 348 and target 366 can be common components within the X-ray tube 300 or can be separate components. The anode 348 can be made of a variety of metals or alloys, such as tungsten, molybdenum, copper, or any material that contributes to bremsstrahlung radiation (e.g., decelerating radiation) when bombarded by electrons. The target 366 of the anode 348 can be selected to have a relatively high refractory value to withstand the heat generated by electrons impacting the anode 348. Anode assembly 342 also includes a rotor 372 and a stator (not shown), located outside the X-ray tube 300 and surrounding the rotor 372, for inducing rotation of the anode 348 during operation. The anode 348 is rotatably supported by a bearing assembly 350, which, upon rotation, also causes the anode 348 to rotate about its centerline 370. Thus, the centerline 370 defines the axis of rotation of the anode 348 and the bearing assembly 350. As shown in the figure, the anode 348 has an annular shape and includes an annular opening 374 at its center for receiving the bearing assembly 350. Different embodiments of the bearing assembly 350 can be formed, for example, having a plurality of suitable ball bearings. In an exemplary embodiment, the bearing assembly 350 includes a liquid metal hydrodynamic bearing having sufficient load-carrying capacity and an acceptable acoustic noise level to... Figures 1 to 2 The X-ray imaging system 100 operates within this system. Generally, the bearing assembly 350 includes stationary components (such as a central shaft 376) and rotating parts (such as a sleeve 378 to which the anode 348 is attached). Although relative to... Figure 3 The central shaft 376 is described as a stationary component of the bearing assembly 350 and the sleeve 378 as a rotating component of the bearing assembly 350; however, embodiments of this disclosure also apply to embodiments in which the central shaft 376 is a rotating shaft and the sleeve 378 is a stationary component. In this configuration, the anode 348 will rotate as the central shaft 376 rotates.

[0043] The central shaft 376 may optionally include a coolant flow path 380 through which coolant (not shown) (such as oil) can flow to cool the bearing assembly 350. Thus, the coolant allows heat generated from the anode 348 of the X-ray tube 300 to be extracted from the anode and transferred from the X-ray tube 300 to the outside. In a straddle-mounted X-ray tube configuration, the coolant flow path 380 extends along the longitudinal length of the X-ray tube 300 (e.g., along the centerline 370). In an alternative embodiment, the coolant flow path 380 may extend through a portion of the X-ray tube 300, such as in a cantilever configuration where the X-ray tube 300 is placed in an imaging system.

[0044] The cathode assembly 344 includes a central insulating housing 358 from which a mask 360 extends. The mask 360 encloses a series of electrical leads 356 that extend to a cathode cup 362 mounted at an end of the mask 360. The cathode cup 362 includes an emitter assembly (not shown) electrically connected to one or more of the leads 356. The space 354 between the cathode cup 362 and the anode 348 is evacuated (e.g., as part of the vacuum of the X-ray tube 300) to minimize collisions between electrons and other atoms and maximize the potential.

[0045] In the operation of X-ray tube 300, an electron beam is generated by cathode assembly 344. Specifically, the emitter assembly of cathode assembly 344 receives one or more electrical signals via a series of electrical leads 356. The electrical signals heat the emitter of the emitter assembly, causing the emitter to emit electrons in the form of an electron beam. The electron beam occupies the space 354 between cathode cup 362 and target 366 of anode 348. The electrical signals may be timing / control signals that cause cathode assembly 344 to emit an electron beam at one or more energies and at one or more frequencies. The electrical signals may also at least partially control the potential between cathode assembly 344 and anode 348. In some embodiments, cathode cup 362 serves as an electrostatic lens that focuses electrons emitted from the emitter to form an electron beam. In CT applications, X-rays 364 are generated when the high-speed electrons of the electron beam are abruptly decelerated as they are guided from cathode assembly 344 through a potential difference of, for example, 60,000 (60,000) volts or higher between the cathode assembly and the target 366 formed on anode 348 to the target. X-rays 364 are directed toward detector components (such as radiation emission channels 368 formed in the frame 346) via radiation emission channels 368. Figure 1 Detector component 108 and / or Figure 2 (The detector component) is emitted.

[0046] To prevent the anode 348 from overheating when bombarded by electrons, the rotor 372 rotates the anode 348 around the centerline 370 at a high speed (e.g., 90 Hz to 250 Hz). In addition to the rotation of the anode 348 within the frame 346, in CT applications, the X-ray tube 300 as a whole can be rotated around the object (such as...) at a rate typically 1 Hz or faster. Figure 1 and Figure 2 The subject 112 of the X-ray imaging system 100 in the X-ray system rotates. For example, the gantry 102 and its components (e.g., including the X-ray source 104) may be configured to rotate about a rotation center 106.

[0047] Figure 4 A perspective view 400 of a cathode cup 402 is shown, which can be... Figure 3An example of the cathode cup 362 of the cathode assembly 344. The elements of the cathode cup 402 are positioned as illustrated in the axis system 301. The elements of the cathode cup 402 and / or the elements connected to the cathode cup are similarly numbered, and these elements are related to... Figure 3 The components of the X-ray tube 300 are equivalent.

[0048] The cathode cup 402 may include a base 404, an insulator 406, a focusing element 408, and an emitter assembly 410. The cathode cup 402 may also include a first positioning support 412 and a second positioning support (in...). Figure 4 (Not visible in the image), the first positioning support and the second positioning support are configured to position the emitter assembly 410 within the cathode cup 402. In some examples, the insulator 406 may be a ceramic insulator (e.g., formed of ceramic), and in other examples, the insulator 406 may be formed of a material that sufficiently insulates the base 404 from the focusing element 408 and the emitter assembly 410. The base 404 may be formed of a metal such as, for example, nickel, steel, Kovar alloy, and / or niobium. The focusing element 408 may include one or more features 416 having the same or similar geometry configured to focus emitted electrons (e.g., from the emitter assembly 410) into a single electron beam. In some examples, the focusing element 408 may have a substantially circular shape (e.g., in the xz plane), in which each of one or more features 416 of the focusing element 408 is shaped into a rectangular shape with a circular side (e.g., a portion of the circumference forming the substantially circular shape of the focusing element 408), and wherein a channel 414 exists between one or more features 416. The channel 414 may be adjusted based on the width and strength of the emitter of the emitter assembly 410. Each of one or more features 416 of the focusing element 408 also includes a leg support 418 extending perpendicular to the substantially circular shape of the focusing element 408 and may be a single structure continuous with the substantially circular shape. The emitter assembly 410 includes a flat emitter 420 and a stress compensator 422. The stress compensator 422 may be selectively coupled to the flat emitter 420. For example, the flat emitter 420 may be coupled to the stress compensator 422 via snap-fit, welding, brazing, or other coupling methods. The emitter assembly 410 can be positioned within the cathode cup 402 by connecting the stress compensator 422 to the first positioning support 412 and the flat emitter 420 to the second positioning support. Relative to Figures 8 to 10 Further details regarding the geometry of each of the first positioning support 412 and the second positioning support are described. (As relative to...) Figure 3As described, the cathode cup 362 can be electrically connected to one or more leads (e.g., strips, wires, cables, pins, or other electrical connection components) in the series of leads 356. The series of leads 356 can be configured to provide different currents to different elements. For example, a first current can be provided by a lead in the series of leads 356 connected to the focusing element 408. A second current can be provided by a lead in the series of leads 356 connected to the first positioning support 412. A third current can be provided by a lead in the series of leads 356 connected to the second positioning support. One or more of the first, second, and / or third currents can be the same or different. For example, the first current supplied to the focusing element 408 can be configured to focus electrons emitted by the emitter assembly. The second and third currents supplied to the first and second positioning supports, respectively, can be configured to heat the flat emitter 420 of the emitter assembly 410 to the temperature at which the flat emitter 420 emits electrons.

[0049] Figure 5 A top view 500 of the emitter assembly 410 of the cathode cup 402 is shown. (As shown relative to...) Figure 4 As briefly described, emitter assembly 410 includes a flat emitter 420 and a stress compensator 422. The flat emitter 420 may be a substantially flat emitter having a planar emission surface 602. The flat emitter 420 may include a serpentine pattern 604 for at least a first portion 606 of the emitter length 608 of the flat emitter 420. The serpentine pattern 604 includes a series of filaments connected together and having gaps between each curve of the serpentine pattern 604. The serpentine pattern 604 may be cut through one or more sheets of the substantially flat sheet 610 forming the flat emitter 420.

[0050] The flat emitter 420 may be a dual-path strip emitter including a first path 612 and a second path 614, each having a serpentine pattern 604 along a first portion 606 of the emitter length 608. The first path 612 and the second path 614 may be spaced apart from each other by a gap 616 extending along the emitter length 608. In other words, the first path 612 and the second path 614 may be structurally independent of each other. In some examples, the flat emitter 420 may include a single path (e.g., the first path 612 or the second path 614) or more than two paths. At each of the first end 424 and the second end 426, the first path 612 and the second path 614 may include a cut that extends partially along the emitter length 608. For example, the flat emitter 420 includes a first cut 618 at the first end 424 (e.g., each of the first path 612 and the second path 614). The flat emitter 420 also includes a second cut 620 at a second end 426 (e.g., each of the first passage 612 and the second passage 614). Both the first cut 618 and the second cut 620 extend through the planar emission surface 602 of the flat emitter 420 (e.g., parallel to the y-axis of the axis system 301). The gaps 622 between each segment 624 of the serpentine pattern (e.g., parallel to the x-axis of the axis system 301) may be perpendicular to the first cut 618 and the second cut 620 (e.g., parallel to the z-axis of the axis system 301).

[0051] Each of the first cut 618 and the second cut 620 may have a first width 626, which is smaller than the passage width 628 of each of the first passage 612 and the second passage 614, and smaller than the emitter width 630 of the flat emitter 420. One or more of the first cut 618 and the second cut 620 may be configured to receive the connector 632 and connect the flat emitter 420 to the stress compensator 422, such that each of the first passage 612 and the second passage 614 of the flat emitter 420 can be connected to the stress compensator 422. Furthermore, one or more of the first cut 618 and the second cut 620 may be used to connect each of the first passage 612 and the second passage 614 of the flat emitter 420 to a second positioning support, such as relative to... Figure 8 Further description.

[0052] Figure 6A top view 600 of a stress compensator 422 is shown. The stress compensator 422 may be formed from one or more of niobium, molybdenum, steel alloy, tungsten-uranium alloy, and / or another refractory material. The stress compensator 422 includes a spring 702 formed by a plurality of linear portions arranged in parallel, each of the plurality of linear portions being connected to a preceding and / or following linear portion via a bend. The plurality of linear portions may include a first linear portion 704 having a first length 714, a second linear portion 706 having a second length 716, a third linear portion 708 having a third length 718, a fourth linear portion 710 having a fourth length 720, and a fifth linear portion 712 having a fifth length 722. A first ratio of the second length 716 to the first length 714 may be greater than or equal to three. The third length 718 of the third linear portion 708 may be greater than each of the first length 714 and the second length 716. The fourth length 720 of the fourth linear portion 710 may be equal to the second length 716. The fifth length 722 of the fifth linear portion 712 can be equal to the first length 714. The second ratio of the fourth length 720 to the fifth length 722 can be the same as or different from the first ratio. For example, the second ratio can also be 3, or it can be 2, 5, or another value. The values ​​of the first ratio, the second ratio, and the number of linear portions can help prevent undesirable in-plane rotation and / or deformation of the spring 702. The first ratio, the second ratio, and / or the number of linear portions of the spring 702 can be "adjusted" (e.g., adjusted) so that the stress compensator 422 provides compliance to give the same stiffness to the emitter (e.g., flat emitter 420) to which the stress compensator 422 is attached along the emitter length (e.g., emitter length 608).

[0053] Each of the multiple linear sections is connected to the preceding and / or following linear section via a bend 724. For example, the first linear section 704 is connected to the second linear section 706 via a bend 724. The second linear section 706 is also connected to the third linear section 708 via a bend 724. The third linear section 708 is also connected to the fourth linear section 710 via a bend 724. The fourth linear section 710 is also connected to the fifth linear section 712 via a bend 724. In this way, the spring 702 is formed by a continuous serpentine path.

[0054] The stress compensator 422 also includes a set of connecting extensions having connecting elements complementary to and enabling the stress compensator 422 to be connected to a transmitter (e.g., a flat transmitter 420). A first connecting extension 726 in this set of connecting extensions may include one or more connecting elements 730. The first connecting extension 726 may be connected to a first linear portion 704 via a bend 724. In the example described herein, the first connecting extension 726 may include two connecting elements 730 complementary to a first notch 618 of the flat transmitter 420. A second connecting extension 728 may be connected to a fifth linear portion 712. The second connecting extension 728 may be connected to a second linear portion 706 via a bend 724. The geometry of the first connecting extension 726 and the second connecting extension 728 may be adjusted based on the type of transmitter to which the stress compensator 422 is to be connected. For example, in a transmitter assembly where a single-path transmitter is used, the first connecting extension 726 may include a single connecting element 730. In some examples, the first connecting extension 726 and the second connecting extension 728 may have the same geometry. For example, when the first ratio and the second ratio are the same, the first connecting extension 726 and the second connecting extension 728 may have the same geometry, which allows the stress compensator 422 to be connected to the flat emitter 420 at either the first connecting extension 726 or the second connecting extension 728, and the stress compensator 422 to provide the same thermal expansion and centrifugal stress compliance to both the first passage 612 and the second passage 614 of the flat emitter 420. Each connecting element 730 of the first connecting extension 726 and / or the second connecting extension 728 may extend perpendicular to the length of a plurality of linear portions of the spring 702 (e.g., the first length 714, the third length 718, etc.). In some examples, the first connecting extension 726 and / or the second connecting extension 728 may be omitted from the stress compensator 422 (e.g., when the stress compensator 422 may be connected to a launcher or other element on one side of the spring, and / or when the stress compensator 422 is connected to the launcher via other components).

[0055] Go to Figure 7 A perspective view 700 of a stress compensator 422 is shown. A first connecting extension 726 and a second connecting extension 728 of the stress compensator 422 may include a recess 804 in each connecting element 730. The recess 804 extends the connecting element length 806 of the connecting element 730. The recess 804 also extends a first portion 808 of the connecting element height 810 of the connecting element 730. The recess 804 may be configured to receive a connector for connecting the stress compensator 422 to the flat emitter 420. Figure 7 (not shown in the image) or other components. For example, the connector may be... Figure 5 Connector 632.

[0056] return Figure 5 The diagram shows a connector 632 positioned in a recess 804 of each connector element 730 of the first connector extension 726 and in a cutout 618 of the flat emitter 420 at the first end 424. The connector 632 may be a cylindrical rod, a planar member, and / or have another geometry whose length is parallel to and less than the cutout length 634 of the first cutout 618 (e.g., parallel to the z-axis of the axial system 301). The connector 632 may also have a width parallel to and less than a first width 626 of the first cutout 618 (e.g., parallel to the x-axis of the axial system 301). The flat emitter 420 can be coupled to the stress compensator 422 by sliding, pressing, snapping, or otherwise inserting the connector 632 into one or more recesses 804 of the stress compensator 422 and into one or more of the first and second cutouts 618 and 620 of the flat emitter 422. In some examples, the flat emitter 420 may be welded or otherwise fixedly connected to the stress compensator 422 via connector 632. Welding the stress compensator 422 to the flat emitter 420 via connector 632 allows the stress compensator 422 to conduct current. When the flat emitter 420 is formed by two separate single paths (e.g., a first path 612 and a second path 614), welding both the first path 612 and the second path 614 to the stress compensator 422 allows current to be conducted through the stress compensator 422 to each of the first path 612 and the second path 614, thereby eliminating the need for an emitter-emitter weld between the first path 612 and the second path 614.

[0057] Positioning the emitter assembly 410 with stress compensator 422 within a cathode cup (e.g., cathode cup 402) may include additional manufacturing requirements for the cathode cup. Conventional emitter assemblies may include stress compensators directly integrated into the emitter, such as those continuous with the emission region at the end of the emitter. Conventional emitters with integrated stress compensators can therefore be coupled to positioning elements of the cathode cup at a first end and a second end of the emitter, wherein the positioning elements at each end may have the same geometry. In the emitter assembly 410 described herein, stress compensator 422 is selectively coupled to a flat emitter 420 at a first end 424. Therefore, a first positioning support 412 at the first end 424 may have a different geometry than a second positioning support at the second end 426 to accommodate stress compensator 422.

[0058] Figure 8 The second positioning support 812 is shown (e.g., relative to...). Figures 4 to 7The second positioning support 812 is a perspective view 800. It may be an example of a conventional positioning support for supporting different types of launchers, including those with stress compensators integrated into the body of the launcher. The second positioning support 812 includes one or more launcher supports 902 that are complementary to the second cutout 620 of the flat launcher 420. The launcher supports 902 may extend vertically to a support height 904 greater than the base height 906 of the second positioning support 812. The launcher supports may have a support width 908 less than the first width 626 of the second cutout 620 of the flat launcher 420. The launcher supports 902 may also have a support length 910 less than or equal to the cutout length 634 of the second cutout 620. The second positioning support 812 may be coupled to a second end 426 of the flat launcher 420. The transmitter support 902 can be inserted into the second cutout 620 at the second end 426 of both the first passage 612 and the second passage 614 of the flat transmitter 420. Similar to the connector 632, the flat transmitter 420 can be coupled to the second positioning support 812 at the second end 426 by sliding, pressing, snapping, or otherwise inserting the transmitter support 902 into one or more second cutouts 620 of the flat transmitter 420. In some examples, the flat transmitter 420 can be welded or otherwise fixedly coupled to the second positioning support 812. The substantially flat sheet 610 forming the flat transmitter 420 can be in coplanar contact with at least a portion of the planar support surface 912 of the second positioning support 812.

[0059] Figure 9A perspective view 900 of a first positioning support 412 is shown. The first positioning support 412 may be a machined version of a second positioning support 812, and therefore may include some of the same elements. The elements of the second positioning support 812 included in the first positioning support 412 may be similarly numbered. In the first positioning support 412, one or more transmitter supports in the transmitter support 902 may be segmented into a first support segment 902a and a second support segment 902b. The first support segment 902a may have a first segment length 1010. The second support segment 902b may have a second segment length 1012. The first segment length 1010 may be greater than the second segment length 1012. The transmitter support 902 is segmented by a groove 1002 extending through a transmitter support height 1004, which includes a portion of the support height 904 and a base height 906. The groove 1002 extends between the first support section 902a and the second support section 902b. The groove 1002 has a groove width 1006, which is configured to be greater than the stress compensator width 802 of the stress compensator 422 (e.g., from the first connecting extension 726 to the second connecting extension 728, see...). Figure 7 The grooves 804 of the first connecting extension 726 and / or the second connecting extension 728 of the stress compensator 422 can be laterally positioned relative to the launcher support 902, such as... Figure 4 As shown, and in Figure 10 As further shown, the stress compensator 422 can be fixedly connected to the first positioning support 412. The first positioning support 412 can be connected to the flat emitter 420 via the stress compensator 422.

[0060] Figure 10 Various views 1000 of the first positioning support 412 at various manufacturing stages are shown. As briefly described above, the first positioning support 412 may be a machined version of the second positioning support 812. Relative to Figure 9The components of the first positioning support 412 described herein may be similarly labeled and will not be repeated for the sake of brevity. The first positioning support 412 may be machined using electrical discharge machining (EDM). The baseline configuration 1102 may include a groove 1104 cut in the emitter support 902. The groove width 1106 of the groove 1104 may be smaller than the groove width 1006 of the groove 1002. The groove 1104 may be further extended to form a groove 1002 in the second machined support 1108. The groove 1002 may be machined to accommodate a recess for mounting the stress compensator 422. The stress compensator 422 may be positioned in the groove 1002 of the second machined support 1108. In some examples, the stress compensator 422 may be welded to the second machined support 1108 of the first positioning support 412, such that the stress compensator 422 and the first positioning support 412 are a single continuous piece. Once the stress compensator 422 is securely coupled to the first positioning support 412 in the groove 1002, further processing (e.g., EDM) can be performed to “release” the first support segment 902a from the base 1110 of the first positioning support 412. Perspective view 1112 and side view 1114 (referencing the third axis system 1199) of the final configuration of the first positioning support 412 show vertical clearances 1116 (e.g., parallel to the y-axis of the third axis system 1199) between the first support segment 902a and the base 404, and between the stress compensator 422 and the base 404. The vertical gap 1116 provides further compliance with both thermal and centrifugal stresses that could otherwise degrade the stress compensator 422 and / or the first positioning support 412 (e.g., if the vertical gap 1116 were absent and the first support segment 902a and / or the stress compensator 422 were fixedly / rigidly coupled to the base 404). The second positioning support 812 may be continuous with the base 404 and may connect the stress compensator 422 and the first positioning support to the base 404. Further machining of the first positioning support 412 prior to integration into the cathode cup 402 may include pencil blasting and additional cleaning.

[0061] Different imaging systems and / or imaging procedures performed by the imaging system may have different operating conditions. For example, some imaging procedures may include heating the flat emitter to a temperature below 2000°C, while others may include heating the flat emitter to a temperature above 2000°C. Furthermore, some imaging procedures may include rotating the X-ray tube at a rate applying a centrifugal force of less than 30G on the flat emitter, while others may include rotating the X-ray tube at a rate applying a centrifugal force equal to or greater than 30G on the flat emitter. Therefore, it may be desirable to adjust the amount of heat and centrifugal force experienced by the flat emitter by adjusting the configuration of the stress compensator. For example, the stress compensator 422 may have a second configuration that includes relative to... Figures 4 to 10 The stress compensator 422 is described, along with its additional components. These additional components, which compensate for varying amounts of thermal and centrifugal stress provided by the stress compensator 422 to the flat emitter 420 without deviating from the geometry of the stress compensator 422, include a spring formed by a plurality of parallel linear sections, each of which is connected to a preceding and / or following linear section via a bend. This description is relative to... Figures 11 to 18 The second configuration is described.

[0062] Figure 11 A perspective view 1100 shows a configuration of the cathode cup 402 including a second configuration 1222 of the stress compensator 422. Relative to... Figures 4 to 11 The elements of the cathode cup 402 and / or those connected to it are similarly numbered and need not be repeated. In relation to Figures 11 to 18 In the described configuration, the cathode cup 402 includes an emitter assembly 410 with a flat emitter 420, and a second configuration 1222 of a stress compensator 422. The second configuration 1222 of the stress compensator 422 may be formed of niobium, molybdenum, steel alloy, tungsten-uranium alloy and / or another refractory material.

[0063] The geometry of the second configuration 1222 of the stress compensator 422 may require changes to the geometry of some other elements of the cathode cup 402 to accommodate the second configuration 1222 of the stress compensator 422. For example, the second configuration 1222 of the stress compensator 422 may include a connection via an intermediary (in...) Figure 12 (Not visible in the image) The first spring 1224 and the second spring 1226 are connected. One or more of the first spring 1224 and the second spring 1226 can be relative to... Figures 4 to 10 An example of the spring 702 of the described stress compensator 422. A third positioning support 1212 is positioned at the first end 424 of the cathode cup 402 (e.g., in place of the first positioning support 412), and a fourth positioning support ( Figure 11 The emitter assembly 410 (not shown) is positioned at the second end 426 of the cathode cup 402 (e.g., instead of the second positioning support 812). The emitter assembly 410 can be positioned in the cathode cup 402 by connecting the stress compensator 422 to the third positioning support 1212 and the flat emitter 420 to the fourth positioning support.

[0064] The third positioning support 1212 can be connected to the insulator 406 at the first end 424. The fourth positioning support can be connected to the insulator 406 at the second end 426, as relative to... Figure 17 Further description. Relative to Figures 16 to 18Further details regarding the geometry of each of the third positioning support 1212 and the fourth positioning support are described.

[0065] One or more leads (e.g., strips, wires, cables, pins, or other electrical connection components) of the series of electrical leads 356 can be coupled to each of the third positioning support 1212 and the fourth positioning support. Current can be supplied to the third positioning support 1212 and / or the fourth positioning support to heat the flat emitter 420 of the emitter assembly 410 to the temperature at which the flat emitter 420 emits electrons.

[0066] Figure 12 A perspective view 1200 of the emitter assembly 410 of the cathode cup 402 is shown. (As shown relative to...) Figure 11 As briefly described, the transmitter assembly 410 includes a second configuration 1222 of a flat transmitter 420 and a stress compensator 422. Relative to... Figure 5 The components of the described flat transmitter 420 are similarly numbered and will not be repeated. In relation to... Figures 4 to 10 In the described configuration of the transmitter assembly 410, the spring 702 of the stress compensator 422 is positioned axially aligned with the flat transmitter 420 (e.g., along the z-axis of the axial system 301). In the second configuration 1222, the stress compensator 422 is selectively coupled to a first end 424 of the flat transmitter 420, wherein the first spring 1224 and the second spring 1226 of the stress compensator 422 are positioned perpendicular to the flat transmitter 420. Intermediate component ( Figure 12 The first spring 1224 and the second spring 1226 may be axially aligned with each other (e.g., along the z-axis of the axial system 301) and aligned with the first width 626 of the first cut 618 of the flat emitter 420 at the first end 424.

[0067] Figure 13 A top view 1300 shows a second configuration 1222 of the stress compensator 422. Similar to... Figures 4 to 10The described configuration of the stress compensator 422, specifically a second configuration 1222, includes a spring formed by a plurality of parallel linear portions, each of which is connected to a preceding and / or following linear portion via a bend. The second configuration 1222 includes a first spring 1224 and a second spring 1226. Each of the first spring 1224 and the second spring 1226 may be an example of a spring 702 of the stress compensator 422, wherein each of the first spring 1224 and the second spring 1226 is formed by a plurality of parallel linear portions, and each linear portion is connected to a preceding and / or following linear portion via a bend. The configuration of the first spring 1224 and the second spring 1226 may be mirrored across the central plane 1502 (e.g., the zy plane) of the second configuration 1222 of the stress compensator 422. The second spring 1226 is connected to the first spring 1224 via an intermediate piece 1504 positioned between the first spring 1224 and the second spring 1226, such that the first spring 1224, the intermediate piece 1504 and the second spring 1226 are positioned in series (e.g., along the x-axis of the axial system 301).

[0068] The first spring 1224 and the second spring 1226 each form a free and continuous serpentine path. Each of the first spring 1224 and the second spring 1226 includes a first strip 1506 formed by a first linear portion 1508 and a second linear portion 1510. The first linear portion 1508 and the second linear portion 1510 are connected by a bend 1512. The first strip 1506 has a first length 1516. The first spring 1224 and the second spring 1226 also include a second strip 1514 connected to the first strip 1506 via the bend 1512. The second strip 1514 is formed by a third linear portion 1518 and a fourth linear portion 1520. The third linear portion 1518 and the fourth linear portion 1520 are connected by the bend 1512. The second strip 1514 has a second length 1522. The second length 1522 of the second strip 1514 may be less than the first length 1516 of the first strip 1506. The first spring 1224 and the second spring 1226 also include a leg 1524 connected to the second strip 1514 via a bend 1512. The leg 1524 has a third length 1526. The third length 1526 may be less than the second length 1522 of the second strip 1514. The leg 1524 may also include a positioning extension 1528 extending perpendicular to the third length 1526 of the leg 1524. The positioning extension 1528 may help position the second configuration 1222 of the stress compensator 422 within the third positioning support 1212, as relative to... Figure 18As further described, the first strip 1506, the second strip 1514, and the leg 1524 may be arranged in parallel. The second configuration 1222 of the stress compensator 422 is further formed by a single continuous serpentine path extending from the leg 1524 of the first spring 1224, across the intermediate member 1504, and reaching the leg 1524 of the second spring 1226.

[0069] The length 1530 of the second configuration 1222 of the stress compensator 422 includes a first spring length 1532 of the first spring 1224, a second spring length 1536 of the second spring 1226, and an intermediate length 1534 of the intermediate member 1504. Each of the first spring length 1532 and the second spring length 1536 may be equal to the first length 1516 of the first strip 1506. The width 1538 of the second configuration 1222 of the stress compensator 422 includes a spring width 1540 of the first spring 1224 and the second spring 1226, and an intermediate width 1542 of the intermediate member 1504. The intermediate width 1542 may be greater than the spring width 1540. The width 1538 may be equal to the intermediate width 1542. The ratio of the length 1530 to the width 1538 of the second configuration 1222 of the stress compensator 422 may be greater than or equal to ten. The ratio of the length 1530 to the width 1538 of each of the first spring 1224 and the second spring 1226, the number of linear portions and / or the number of strip portions can be adjusted so that the second configuration 1222 of the stress compensator 422 provides compliance to give the same stiffness to the flat launcher 420 along the launcher length 1608.

[0070] Intermediate component 1504 includes one or more transmitter supports in transmitter supports 1544. The transmitter support 1544 has a geometry that is complementary to a transmitter (e.g., a flat transmitter 420) and allows the stress compensator 422 to be coupled to that transmitter. The geometry of the transmitter support 1544 can be adjusted based on the type of transmitter to which the stress compensator 422 is to be coupled. For example, in a transmitter assembly where a single-path transmitter is used, intermediate component 1504 may include a single transmitter support 1544.

[0071] Go to Figure 14 A perspective view 1400 shows the second configuration 1222 of the stress compensator 422. (Compared to...) Figures 4 to 10Compared to the described stress compensator 422, the second configuration 1222 of stress compensator 422 can provide a higher first resonant mode. The height 1602 of the first spring 1224 and / or the second spring 1226 can be adjusted (e.g., independently of each other) to adjust the second configuration 1222 of stress compensator 422, which can provide increased stiffness in the normal direction. This can result in an increased first modal frequency. Furthermore, since the connection of stress compensator 422 is closer to the flat emitter 420, the second configuration 1222 of stress compensator 422 can have a reduced torque arm and corresponding deflection. The emitter support 1544 of the intermediate member 1504 may include a vertical extension 1604 positioned between two recesses 1606. The vertical extension 1604 may extend a support length 910 less than or equal to the cut length 634 of the first cut 618 of the flat emitter 420.

[0072] return Figure 12 The vertical extension 1604 of the transmitter support 1544 is shown positioned at a first end 424 in a first notch 618 of the flat transmitter 420 to selectively connect the stress compensator 422 to the flat transmitter 420. The flat transmitter 420 can be connected to the second configuration 1222 of the stress compensator 422 by sliding, pressing, snap-fitting, welding, brazing, or otherwise inserting the transmitter support 1544 of the intermediate member 1504 of the second configuration 1222 of the stress compensator 422 into one or more of the first notches 618 of the flat transmitter 420. In some examples, the flat transmitter 420 can be welded or otherwise fixedly connected to the second configuration 1222 of the stress compensator 422 via the transmitter support 1544. Welding the second configuration 1222 of the stress compensator 422 to the flat transmitter 420 via the transmitter support 1544 allows the second configuration 1222 of the stress compensator 422 to conduct current. When the flat emitter 420 is formed by two independent single channels (e.g., first channel 612 and second channel 614), a second configuration 1222 in which both the first channel 612 and the second channel 614 are welded to the stress compensator 422 allows current to be conducted to each of the first channel 612 and the second channel 614, thereby eliminating the need for an emitter-emitter weld between the first channel 612 and the second channel 614.

[0073] Positioning the emitter assembly 410 with the second configuration 1222 of the stress compensator 422 within a cathode cup (e.g., cathode cup 402) may include additional manufacturing requirements for the cathode cup. In the emitter assembly 410 described herein, the second configuration 1222 of the stress compensator 422 may be selectively coupled to a flat emitter 420 at a first end 424, and the flat emitter 420 may be selectively coupled to a fourth positioning support at a second end 426. The second configuration 1222 of the stress compensator 422 may be coupled to and positioned within the cathode cup via a third positioning support 1212 at the first end 424. The third positioning support 1212 and the fourth positioning support 1550 may have different geometries to accommodate the second configuration 1222 of the stress compensator 422 and the flat emitter 420, respectively.

[0074] Figure 15 The fourth positioning support 1550 is shown (e.g., relative to...). Figures 11 to 14 Perspective view 1500 of the described fourth positioning support. The fourth positioning support 1550 can be relative to... Figure 8 A modified version of the described second positioning support 812. Therefore, the fourth positioning support 1550 may include elements incorporated in and described relative to the second positioning support 812. The elements of the second positioning support 812 included in the fourth positioning support 1550 may be similarly numbered and will not be repeated. Similar to the baseline configuration 1102, the fourth positioning support 1550 may include a channel 1104 cut in the transmitter support 902. The channel 1104 may have a channel width 1106. The channel 1104 may segment the transmitter support 902 into a first support segment 902a having a first segment length 1010 and a second support segment 902b having a second segment length 1012. The first segment length 1010 may be greater than the second segment length 1012. The channel 1104 may extend parallel to the base height 906 and is part of the base height.

[0075] Figure 16 A perspective view 1600 shows a flat launcher 420 coupled to a fourth positioning support 1550. A first support segment 902a is shown positioned at a second end 426 in a second cutout 620 of the flat launcher 420 to selectively engage the flat launcher 420 to the fourth positioning support 1550. The flat launcher 420 can be engaged to the fourth positioning support 1550 by sliding, pressing, snapping, or otherwise inserting one or more of the first support segments 902a of the fourth positioning support 1550 into one or more of the second cutouts 620 of the flat launcher 420.

[0076] Figure 17 A perspective view 1700 of the third positioning support 1212 is shown. In some examples, the third positioning support 1212 may be formed of niobium. The third positioning support 1212 includes a central body 1902, a first arm 1904, and a second arm 1906. The central body 1902 may be planar on a third side 1960 (e.g., relative to the xz plane of the axial system 301). The central body 1902 may include a protrusion 1908 tangent to the planar surface on the third side 1960. The protrusion 1908 may be configured such that when the third positioning support 1212 is positioned in the cathode cup 402 (e.g., as...), Figure 11 As shown), a portion of the central body 1902 is spaced apart from the insulator 406 (e.g., such that a gap exists between them). The protrusion 1908 may also serve as a recess, which creates a spacing for positioning the second configuration 1222 of the stress compensator 422 during the manufacturing (e.g., rough EDM) process.

[0077] The first arm 1904 and the second arm 1906 each extend laterally (e.g., along the x-axis) from the central body on the first side 1962 and the second side 1964, respectively. Each of the first arm 1904 and the second arm 1906 includes a wing 1910 extending vertically (e.g., parallel to the y-axis) from the first arm 1904 and / or the second arm 1906. The wing 1910 may be a welded element, at which the second configuration 1222 of the stress compensator 422 may be welded to the third positioning support 1212, as relative to... Figure 18 Further description.

[0078] Figure 18 A perspective view 1800 shows a second configuration 1222 of the stress compensator 422 positioned in a third positioning support 1212. The third positioning support 1212 is configured to be in coplanar contact with the second configuration 1222 of the stress compensator 422. The protrusions 1908 of the central body 1902 and the wings 1910 of each of the first arm 1904 and the second arm 1906 can be self-fixing elements that provide rigid support to help position the stress compensator 422 in the third positioning support 1212 during the manufacture and assembly of the cathode cup 402. For example, the wings 1910 of the first arm 1904 and the wings 1910 of the second arm 1906 are in coplanar contact with the positioning extensions 1528 of the legs 1524 of each of the first spring 1224 and the second spring 1226, respectively.

[0079] In this manner, a stress compensator for the emitter assembly is provided, which allows the emitter to thermally expand. The stress compensator can be selectively integrated into the cathode and is therefore removable and interchangeable (e.g., replaced) with existing cathode emitter support structures. Compared to conventional existing cathode emitter support structures, the stress compensator described herein improves the reliability and performance of the cathode emitter by increasing the modal frequency, reducing plastic deformation, and decreasing the stress on the cathode emitter. This reduces short circuits caused by compression, such as those due to the thermal expansion of the emitter and / or the G-force / centrifugal force experienced by the emitter, which may occur in a fixed emitter (e.g., fixed with six degrees of freedom from a first end and a second end). The stress compensator is configured to compensate for thermal expansion and centrifugal stress on a flat emitter during the execution of a method in which the stress compensator and the flat emitter are positioned in the cathode assembly using a first positioning support at the first end and a second positioning support at the second end opposite the first end, and the X-ray tube is operated to emit electrons from the flat emitter by subjecting the flat emitter to temperatures above 2000°C and centrifugal forces above 20G. When coupled to a flat emitter, the stress compensator can provide similar stress within the emitting surface of the flat emitter for comparative load conditions where the spring element of the stress compensator is directly integrated into the emitter. Since deformation typically caused by thermal expansion and / or centrifugal forces experienced by the emitter is directed to the stress compensator, where the spring of the stress compensator distributes the deformation force, stress on the emitter is reduced and the usable life of the emitter is increased. During operation of an X-ray beam, which may include rotation of the X-ray beam and heating of the emitter, emitter compression and potential short circuits due to compression can be mitigated because centrifugal forces and thermal expansion of the emitter can cause temporary deformation of the stress compensator. The cathode can therefore have increased reliability and X-ray beam emission performance. The technical effects of the cathode for imaging systems described herein are increased electron focusing capability of the cathode, high voltage stability of the cathode, and increased yield of manufactured cathodes.

[0080] This disclosure also provides support for a launcher assembly comprising: a flat launcher formed as a planar launching surface having a serpentine pattern; and a stress compensator selectively coupled to the flat launcher at a first end thereof, the stress compensator comprising a spring formed of a plurality of linear portions arranged in parallel, wherein each of the plurality of linear portions is coupled to a preceding and / or following linear portion via a bend. In a first example of the system, a first linear portion of the plurality of linear portions of the spring has a first length, a second linear portion of the plurality of linear portions of the spring has a second length, and the ratio of the second length to the first length is greater than or equal to three. In a second example of the system (optionally including the first example), a third linear portion of the plurality of linear portions of the spring has a third length greater than each of the first length and the second length. In a third example of the system (optionally including one or both of the first and second examples), a fourth linear portion of the plurality of linear portions of the spring has a second length, and a fifth linear portion of the plurality of linear portions of the spring has a first length. In a fourth example of the system (optionally including one or more or each of the first to third examples), the stress compensator further includes a first connecting extension coupled to the first linear portion and a second connecting extension coupled to the fifth linear portion. In a fifth example of the system (optionally including one or more or each of the first to fourth examples), the stress compensator further includes a second spring coupled to the spring via an intermediate member positioned between the spring and the second spring, such that the spring, the intermediate member, and the second spring are positioned in series. In a sixth example of the system (optionally including one or more or each of the first to fifth examples), the intermediate member includes a launcher support. In a seventh example of the system (optionally including one or more of the first to sixth examples), the spring and the second spring each include a first strip formed by a first linear portion and a second linear portion of the plurality of linear portions, a second strip connected to the first strip and formed by a third and a fourth linear portion of the plurality of linear portions, and a leg of the plurality of linear portions connected to the second strip, wherein each of the first strip, the second strip, and the leg is arranged in parallel. In an eighth example of the system (optionally including one or more of the first to seventh examples), the first strip has a first length, the second strip has a second length less than the first length, and the leg has a third length less than the second length. In a ninth example of the system (optionally including one or more of the first to eighth examples), the leg includes a positioning extension that extends perpendicular to the first strip, the second strip, and the leg.In a tenth example of the system (optionally including one or more or each of the first to ninth examples), the configuration of the spring and the second spring is mirror-image across the central plane of the stress compensator. In an eleventh example of the system (optionally including one or more or each of the first to tenth examples), the length of the stress compensator includes the first spring length of the spring, the second spring length of the second spring, and the intermediate length of the intermediate member; the width of the stress compensator includes the spring widths of the spring and the second spring, and the intermediate width of the intermediate member; and wherein the ratio of the length to the width of the stress compensator is greater than or equal to ten. In a twelfth example of the system (optionally including one or more or each of the first to eleventh examples), the stress compensator is formed of niobium, molybdenum, steel alloy, tungsten-uranium alloy, and / or another refractory material.

[0081] This disclosure also provides support for an X-ray tube comprising: a cathode assembly including an emitter assembly; and an anode assembly spaced apart from the cathode assembly, wherein the emitter assembly includes: a flat emitter formed as a planar emitting surface having a serpentine pattern; and a stress compensator selectively coupled to the flat emitter at a first end of the flat emitter, the stress compensator including a spring formed of a plurality of parallel linear portions, wherein each of the plurality of linear portions is coupled to a preceding and / or following linear portion via a bend. In a first example of the system, the cathode assembly includes a cathode cup comprising: a base; a focusing element; a first positioning support and a second positioning support; and an insulator positioned between the base and the focusing element, the first positioning support, and the second positioning support, wherein the insulator is configured to electrically isolate the base from the focusing element, the first positioning support, the second positioning support, and the transmitter assembly, wherein the transmitter assembly is positioned within the cathode cup by coupling a stress compensator to the first positioning support and a flat emitter to the second positioning support. In a second example of the system (optionally including the first example), the flat emitter includes a first cut at a first end and a second cut at a second end opposite to the first end, wherein both the first and second cuts extend through the planar emission surface. In a third example of the system (optionally including one or both of the first and second examples), the second positioning support includes an emitter support complementary to the first and / or second cuts of the flat emitter. In a fourth example of the system (optionally including one or more or each of the first to third examples), the first positioning support includes: a launcher support having a first support section and a second support section, wherein the launcher support is complementary to the first cutout and / or the second cutout of the flat launcher; and a groove extending between the first support section and the second support section, wherein the groove is configured to position the stress compensator therein. In a fifth example of the system (optionally including one or more or each of the first to fourth examples), the stress compensator is fixedly coupled to the first positioning support.

[0082] This disclosure also provides a support for a cathode cup, the cathode cup comprising: a base; a focusing element; a first positioning support and a second positioning support; an insulator positioned between the base and the focusing element, the first positioning support, and the second positioning support, wherein the insulator is configured to electrically isolate the base from the focusing element, the first positioning support, and the second positioning support; and an emitter assembly comprising: a flat emitter formed as a planar emission surface having a serpentine pattern; and a stress compensator selectively coupled to the flat emitter at a first end of the flat emitter, the stress compensator comprising a spring formed of a plurality of parallel linear portions, wherein each of the plurality of linear portions is coupled to a preceding and / or following linear portion via a bend, and wherein the emitter assembly is positioned in the cathode cup by coupling the stress compensator to the first positioning support and the flat emitter to the second positioning support.

[0083] Figures 3 to 18 Example configurations for the relative positioning of various components are shown. In at least one example, if such components are shown to be in direct contact or directly connected to each other, they may be referred to as being in direct contact or directly connected, respectively. Similarly, in at least one example, components shown to be adjacent to each other may be referred to as being adjacent to each other, respectively. For example, components placed in coplanar contact with each other may be referred to as being in coplanar contact. As another example, in at least one example, components positioned to be spaced apart from each other and having only space between them without other components may be described as such. As yet another example, components shown to be above / below each other, on opposite sides of each other, or on the left / right side of each other may be described relative to each other. Furthermore, as shown, in at least one example, the topmost component or the point of the component may be referred to as the “top” of the component, and the bottommost component or the point of the component may be referred to as the “bottom” of the component. As used herein, top / bottom, upper / lower, above / below may be relative to the vertical axis of the figure and may be used to describe the positioning of the components in the figure relative to each other. Therefore, in one example, an element shown above other elements is vertically positioned above the other elements. Furthermore, the shapes of the elements depicted in the figures can be described as having those shapes (e.g., circular, straight, planar, curved, rounded, chamfered, angled, etc.). Additionally, in at least one example, elements shown intersecting each other can be described as intersecting elements or intersecting with each other. Also, in one example, an element shown as being inside or outside another element can be described as such.

[0084] As used herein, elements or steps listed in the singular and beginning with the word "a" or "an" should be understood to not exclude a plurality of said elements or steps unless such exclusion is explicitly stated. Furthermore, references to "one embodiment" of the invention are not intended to be construed as excluding the existence of additional embodiments that also include the referenced features. Moreover, unless explicitly stated to the contrary, embodiments that "comprise," "include," or "have" elements or multiple elements having a particular characteristic may include additional such elements that do not have that characteristic. The terms "comprise" and "in" are used as concise linguistic equivalents to the corresponding terms "comprising" and "wherein". Furthermore, the terms "first," "second," and "third," etc., are used merely as notations and are not intended to impose numerical requirements or a particular order of placement on their objects.

[0085] This written description uses examples to disclose the invention, including the best mode, and also enables those skilled in the art to practice the invention, including making and using any device or system and performing any included methods. The scope of patentability of the invention is defined by the claims, but may include other examples that would occur to those skilled in the art. Such other examples are intended to fall within the scope of the claims if they have structural elements that are not indistinguishable from the literal language of the claims, or if they include equivalent structural elements that have minor differences from the literal language of the claims.

Claims

1. A transmitter assembly (410), the transmitter assembly comprising: A flat emitter (420) is formed as a planar emitting surface (602) with a serpentine pattern (604). and A stress compensator (422, 1222) is selectively coupled to the flat emitter (420) at a first end (424), the stress compensator (422) comprising a spring (702, 1224, 1226) formed by a plurality of parallel linear portions, wherein each of the plurality of linear portions (704, 706, 708, 710, 712, 1508, 1510, 1518, 1520) is coupled to the preceding and / or following linear portion via a bend (724, 1512).

2. The transmitter assembly (410) according to claim 1, wherein a first linear portion (704) of the plurality of linear portions of the spring (702) has a first length (714), a second linear portion (706) of the plurality of linear portions of the spring (702) has a second length (716), and the ratio of the second length (716) to the first length (714) is greater than or equal to three.

3. The transmitter assembly (410) according to claim 2, wherein the third linear portion (708) of the plurality of linear portions of the spring (702) has a third length (718) greater than each of the first length (714) and the second length (716).

4. The transmitter assembly (410) according to claim 2, wherein the fourth linear portion (710) of the plurality of linear portions of the spring (702) has the second length (716), and the fifth linear portion (712) of the plurality of linear portions of the spring (702) has the first length (714).

5. The transmitter assembly (410) according to claim 4, wherein the stress compensator (422) further comprises a first connection extension (726) connected to the first linear portion (704) and a second connection extension (728) connected to the fifth linear portion (712).

6. The transmitter assembly (410) of claim 1, wherein the stress compensator (1222) further comprises a second spring (1226) connected to the spring (1224) via an intermediate member (1504) positioned between the spring (1224) and the second spring (1226), such that the spring (1224), the intermediate member (1504) and the second spring (1226) are positioned in series.

7. The transmitter assembly (410) of claim 6, wherein the intermediate component (1504) includes a transmitter support (1544).

8. The transmitter assembly (410) according to claim 6, wherein the spring (1224) and the second spring (1226) each include a first strip (1506) formed by a first linear portion (1508) and a second linear portion (1510) of the plurality of linear portions, a second strip (1514) connected to the first strip (1506) and formed by a third linear portion (1518) and a fourth linear portion (1520) of the plurality of linear portions, and a leg (1524) of the plurality of linear portions connected to the second strip (1514), wherein each of the first strip (1506), the second strip (1514) and the leg (1524) is arranged in parallel.

9. The transmitter assembly (410) according to claim 8, wherein the first strip (1506) has a first length (1516), the second strip (1514) has a second length (1522) less than the first length (1516), and the leg (1524) has a third length (1526) less than the second length (1522).

10. The transmitter assembly (410) of claim 8, wherein the leg (1524) includes a positioning extension (1528) extending perpendicular to the first strip (1506), the second strip (1514) and the leg (1524).

11. The transmitter assembly (410) of claim 6, wherein the configuration of the spring (1224) and the second spring (1226) is mirrored across the central plane (1502) of the stress compensator (1222).

12. The transmitter assembly (410) according to claim 6, wherein: The length (1530) of the stress compensator (1222) includes the first spring length (1536) of the spring (1224), the second spring length (1532) of the second spring (1226), and the intermediate length (1534) of the intermediate member (1504). The width (1538) of the stress compensator (1222) includes the spring width (1540) of the spring (1224) and the second spring (1226) and the intermediate member width (1538) of the intermediate member (1504); and The ratio of the length (1530) to the width (1538) of the stress compensator (1222) is greater than or equal to ten.

13. The launcher assembly (410) according to claim 1, wherein the stress compensator (422, 1222) is formed of niobium, molybdenum, steel alloy, tungsten-uranium alloy and / or another refractory material.

14. An X-ray tube (300), the X-ray tube comprising: Cathode assembly (344), the cathode assembly including emitter assembly (410). and An anode assembly (342) spaced apart from the cathode assembly (344), wherein the emitter assembly (410) includes: A flat emitter (420) is formed as a planar emitting surface (602) with a serpentine pattern (604). and A stress compensator (422, 1222) is selectively coupled to the flat emitter (420) at a first end (424), the stress compensator (422, 1222) comprising a spring (702, 1224, 1226) formed by a plurality of parallel linear portions, wherein each of the plurality of linear portions (704, 706, 708, 710, 712, 1508, 1510, 1518, 1520) is coupled to the preceding and / or following linear portion via a bend (724, 1512).

15. The X-ray tube (300) of claim 14, wherein the cathode assembly (344) includes a cathode cup (362, 402), the cathode cup comprising: Base (404); Focusing element (408); First positioning support (412, 1212) and second positioning support (812, 1550); An insulator (406) positioned between the base (404) and the focusing element (408), the first positioning support (412, 1212), and the second positioning support (812, 1550), wherein the insulator (406) is configured to electrically isolate the base (404) from the focusing element (408), the first positioning support (412, 1212), and the second positioning support (812, 1550); and The emitter assembly (410) is positioned in the cathode cup (362, 402) by connecting the stress compensator (422, 1222) to the first positioning support (412, 1212) and the flat emitter (420) to the second positioning support (812, 1550).

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