Ionization impurity removal device for ultrapure water preparation machine
By setting up a rotating mechanism and a limiting frame in the ionization and decomposition device, the stable placement and convenient disassembly of the filter interlayer are achieved, which solves the problem of replacement in traditional devices, improves the efficiency of use and reduces labor intensity.
Patent Information
- Application Number
- CN202420974742.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-05-08
- Publication Date
- 2024-12-27
- Estimated Expiration
- 2034-05-08
AI Technical Summary
In traditional ionization and decomposition devices, it is difficult to replace the filter interlayer, resulting in accumulation of impurities that affect the filtration effect and improve labor intensity.
An ionization and decomposition device for ultrapure water preparation machine is designed. By setting a rotating mechanism and a limiting frame in the filter box, the stable placement and convenient disassembly of the filter interlayer are achieved, reducing the difficulty of replacing the filter interlayer.
It improves the efficiency of the filter interlayer, solves the problem of impurities accumulation affecting the filtration effect, and reduces the labor intensity when replacing the filter interlayer.
Smart Images

Figure CN222239178U_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the field of ultrapure water preparation machines, and in particular to an ionization and impurity removal device for ultrapure water preparation machines. Background Art
[0002] It is well known that ultrapure water refers to water with a resistivity of 18MΩ*cm (25°C), and there are almost no impurities in ultrapure water except water molecules, and there are no bacteria, viruses, chlorinated dioxins and other organic matter, and of course no mineral trace elements required by the human body. In other words, it is water from which almost all atoms except oxygen and hydrogen have been removed. Therefore, in the preparation process of ultrapure water, it is necessary to remove impurities from the raw water, and the most commonly used method is ionization impurity removal. The traditional ionization impurity removal method is to directly pass the raw water through an ionization box, and then remove impurities in the raw water through the ionization reaction in the ionization box. However, due to the influence of the flow rate and flow rate of the raw water, the impurity removal effect of the ionization impurity removal device is poor.
[0003] At present, a Chinese patent with the announcement number CN215659686U discloses a construction material grinding device, which includes a filtering water storage tank, an ionized water purification tank and a water quality detection tank; the filtering water storage tank can perform preliminary filtration on the raw water, and the water storage tank is connected to multiple water inlets of the ionized water purification tank one by one through multiple outlet pipes...
[0004] The raw water is initially filtered through a filter water tank, and then the filtered water is further ionized and impurities are removed through an ionization water purification tank. Finally, a water quality test box determines whether the ionized purified water is ultrapure water. After the filter water tank has been used for a certain period of time, a certain amount of impurities in the water will accumulate in the filter interlayer inside it. The large amount of impurities in the filter interlayer will have a certain impact on the overall filtering effect of the filter water tank, which may reduce the filtering rate of the filter water tank or cause the filter water tank to be blocked. The filter interlayer is generally fixed inside the filter water tank, which makes it time-consuming and laborious for people to replace the filter interlayer, increasing people's labor intensity.
[0005] In view of the above-mentioned related technologies, the inventor believes that the filter interlayer arranged in the filter water storage tank has the defect of being inconvenient to replace. Therefore, an ionization and impurity removal device for an ultrapure water preparation machine is proposed to solve the above-mentioned problem. Utility Model Content
[0006] In order to solve the problem that the filter interlayer arranged in the filter water storage tank is inconvenient to replace, the present application provides an ionization and impurity removal device for an ultrapure water preparation machine.
[0007] The present application provides an ionization and impurity removal device for an ultrapure water preparation machine using the following technical solution:
[0008] An ionization and impurity removal device for an ultrapure water preparation machine comprises a filtering water storage tank, a fixed inner cavity is provided in the middle of one end of the filtering water storage tank, a fixed slot is provided in the middle of one side of the inner wall of the fixed inner cavity, a filter box is installed inside the fixed slot, a placement slot is provided in the middle of the top of the filter box, a plurality of filter interlayers are arranged and installed inside the placement slot, a fixed frame is fixedly installed on the outer surface of the filtering water storage tank near the opening of the fixed inner cavity, limiting holes are symmetrically provided on both side edges of the fixed frame, a fixing plate is fixedly installed in the middle of the front end face of the filter box, a sealing gasket is fused to the edge of one end of the fixing plate, a fixing frame is fixedly connected to the middle of the other end of the fixing plate, a limiting frame is symmetrically and movably installed inside the fixing frame, and a rotating mechanism is also provided inside the fixing frame for controlling the movement of the limiting frame.
[0009] Preferably, the rotating mechanism includes a movable plate, which is rotatably mounted at the middle part of one end of the inner wall of the fixed frame, a No. 1 slide groove is provided on one side edge of the limit frame, connecting blocks are welded on both side edges of the movable plate passing through the No. 1 slide groove, and a knob is installed at the middle part of one end of the movable plate extending to the outside of the fixed frame.
[0010] Preferably, a No. 2 slide groove is symmetrically opened on both side edges of the inner wall of the fixed slot, and limiting protrusions are symmetrically welded on both side edges of the outer surface of the filter box, one side edge of the limiting protrusion is located inside the No. 2 slide groove, and the No. 2 slide groove and the limiting protrusion are embedded with each other.
[0011] Preferably, a plurality of limit columns are symmetrically fixed to the bottom edge of the inner wall of the placement groove, and limit sleeves are fixedly installed at the bottom of the front and rear ends of the filter interlayer, one side of the outer surface of the limit column is located inside the limit sleeve, and the limit column and the limit sleeve are adapted to each other.
[0012] Preferably, one side edge of the limiting frame is movably inserted into the limiting hole, and the limiting hole and the limiting frame are engaged with each other.
[0013] In summary, this application includes the following beneficial technical effects:
[0014] By stably placing multiple filter interlayers inside the filter box, the filter box is movably connected to the fixed card slot along the fixed inner cavity opening, and at the same time the fixed plate is placed in the fixed frame, and the knob is turned to drive the limit frame to be movably inserted into the limit hole, thereby limiting and fixing the filter box after stable placement; compared with the existing technology, this solution has the effect of facilitating the disassembly, assembly and replacement of the filter interlayer in the filter box, improving the overall use efficiency of the filter interlayer, solving the problem of a certain amount of impurities accumulated in the filter interlayer affecting the filtering effect, and reducing the labor intensity of people when replacing the filter interlayer. BRIEF DESCRIPTION OF THE DRAWINGS
[0015] Figure 1 It is a schematic diagram of the overall structure of the embodiment of the application;
[0016] Figure 2 It is a structural schematic diagram of the filter box in the application embodiment;
[0017] Figure 3 is a schematic diagram of the structure of the filter interlayer in the application embodiment;
[0018] Figure 4 It is a schematic diagram of the internal structure of the filter box in the application embodiment;
[0019] Explanation of the reference numerals: 1. Filter water storage tank; 2. Fixed inner cavity; 3. Fixed card slot; 4. Filter box; 5. Placement slot; 6. Limit column; 7. Filter interlayer; 8. Limit card sleeve; 9. Fixed frame; 10. Limit hole; 11. Fixed plate; 12. Fixed frame; 13. Limit frame; 14. Movable plate; 15. No. 1 slide; 16. Connecting block; 17. Knob; 18. No. 2 slide; 19. Limit protrusion; 20. Sealing gasket. DETAILED DESCRIPTION
[0020] The following is combined with Figure 1-4 This application is described in further detail.
[0021] The present application discloses an ionization and impurity removal device for an ultrapure water preparation machine. Figure 1-4 , an ionization and impurity removal device for an ultrapure water preparation machine comprises a filtering water storage tank 1, a fixed inner cavity 2 is provided in the middle of one end of the filtering water storage tank 1, a fixed card slot 3 is provided in the middle of one side of the inner wall of the fixed inner cavity 2, a filter box 4 is installed inside the fixed card slot 3, a placement slot 5 is provided in the middle of the top of the filter box 4, and a plurality of filter interlayers 7 are arranged and installed inside the placement slot 5, a fixed frame 9 is fixedly installed on the outer surface of the filtering water storage tank 1 near the opening of the fixed inner cavity 2, and limiting holes 10 are symmetrically provided on both side edges of the fixed frame 9, a fixing plate 11 is fixedly installed in the middle of the front end surface of the filter box 4, a sealing gasket 20 is fused on the edge of one end of the fixing plate 11, and a fixing frame 12 is fixedly connected to the middle of the other end of the fixing plate 11, and a limiting frame 13 is symmetrically and movably installed inside the fixing frame 12, and one side edge of the limiting frame 13 is movably inserted into the limiting hole 10, and the limiting hole 10 and the limiting frame 13 are engaged with each other. A rotating mechanism is also provided inside the fixing frame 12 for controlling the limiting frame 13 to move.
[0022] By stably placing multiple filter interlayers 7 inside the filter box 4, the filter box 4 is movably snapped into the fixed slot 3 along the opening of the fixed inner cavity 2, and the fixed plate 11 is snapped into the fixed frame 9. The knob 17 is turned to drive the limit frame 13 to move, so that one side edge of the limit frame 13 is movably inserted into the limit hole 10, and the fixed plate 11 is fixed inside the fixed frame 9, thereby limiting and fixing the stably placed filter box 4, which reflects the stability of the filter box 4 placed in the fixed slot 3.
[0023] Reference Figure 3 The rotating mechanism includes a movable plate 14, which is rotatably mounted at the middle of one end of the inner wall of the fixed frame 12. A No. 1 slide groove 15 is provided on one side edge of the limit frame 13. Connecting blocks 16 are welded on both sides of the movable plate 14 through the No. 1 slide groove 15. A knob 17 is installed at the middle of one end of the movable plate 14 extending to the outside of the fixed frame 12.
[0024] The movable plate 14 is driven to move by rotating the knob 17, so that the movable plate 14 moves the connecting block 16 up and down along the inside of the No. 1 slide groove 15, and then the connecting block 16 pushes the limiting frame 13 to move relatively or toward each other along the inside of the fixed frame 12, which reflects the activity adjustment effect of the knob 17 on the limiting frame 13.
[0025] Reference Figure 2 and Figure 3 A No. 2 slide groove 18 is symmetrically provided on both sides of the inner wall of the fixed slot 3, and limiting protrusions 19 are symmetrically welded on both sides of the outer surface of the filter box 4. One side of the limiting protrusion 19 is located inside the No. 2 slide groove 18. The No. 2 slide groove 18 and the limiting protrusion 19 are embedded with each other. By making the limiting protrusion 19 move along the inside of the No. 2 slide groove 18, the No. 2 slide groove 18 guides and supports the moving filter box 4, thereby reflecting the stability of the filter box 4 when it is moving.
[0026] Reference Figure 2 A number of limiting columns 6 are symmetrically fixed to the bottom edge of the inner wall of the placement groove 5, and limiting sleeves 8 are fixedly installed on the bottom of the front and rear ends of the filter interlayer 7. One side of the outer surface of the limiting column 6 is located inside the limiting sleeve 8. The limiting column 6 and the limiting sleeve 8 are adapted to each other. By aligning the limiting sleeve 8 with the position of the limiting column 6 and sleeved on its outer surface, the filter interlayer 7 is neatly arranged inside the filter box 4, and the limiting column 6 supports the filter interlayer 7 placed in parallel, thereby keeping the filter interlayer 7 in a stable state when installed and placed, which reflects the overall support effect of the limiting column 6.
[0027] The implementation principle of the ionization and impurity removal device for an ultrapure water preparation machine in the embodiment of the present application is as follows: by stably placing multiple filter interlayers 7 inside the filter box 4, the limiting sleeve 8 is aligned with the position of the limiting column 6 and sleeved on its outer surface, so that the filter interlayer 7 is in a neatly arranged state inside the filter box 4, the filter box 4 is movably connected to the fixed card slot 3 along the opening of the fixed inner cavity 2, the limiting protrusion 19 is movable along the inside of the second slide groove 18, so that the second slide groove 18 guides and supports the active filter box 4, so as to keep the filter box 4 in a stable state when moving, and at the same time, the fixed plate 11 is connected and placed in the fixed frame 9, and the knob 17 is turned to drive the movable plate 14 The movable plate 14 moves the connecting block 16 up and down along the No. 1 slide groove 15, and then the connecting block 16 pushes the limiting frame 13 to move relatively or toward the inside of the fixed frame 12, so that one side edge of the limiting frame 13 is movably inserted into the limiting hole 10, and the fixing plate 11 is fixed inside the fixing frame 9, thereby limiting and fixing the filter box 4 after stable placement; compared with the prior art, this scheme has the effect of facilitating the disassembly, assembly and replacement of the filter interlayer 7 in the filter box 4, improving the overall use efficiency of the filter interlayer 7, solving the problem of a certain amount of impurities accumulated in the filter interlayer 7 affecting the filtering effect, and reducing the labor intensity of people when replacing the filter interlayer 7.
[0028] Finally, a few points should be explained: First, in the description of this application, it should be noted that, unless otherwise specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, which may refer to mechanical connection or electrical connection, or internal communication between two components, or direct connection. "upper", "lower", "left", "right", etc. are only used to indicate relative positional relationships. When the absolute position of the object being described changes, the relative positional relationship may change;
[0029] Secondly: In the drawings of the embodiments disclosed in the present utility model, only the structures related to the embodiments disclosed in the present utility model are involved, and other structures can refer to the general design. In the absence of conflict, the same embodiment and different embodiments of the present utility model can be combined with each other;
[0030] Finally: The above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present utility model should be included in the protection scope of the present utility model.
[0031] The above are all preferred embodiments of the present application, and the protection scope of the present application is not limited thereto. Therefore, any equivalent changes made according to the structure, shape, and principle of the present application should be included in the protection scope of the present application.
Claims
1. An ionization and impurity removal device for an ultrapure water preparation machine, comprising a filter water storage tank (1), wherein a fixed inner cavity (2) is provided in the middle of one end of the filter water storage tank (1), characterized in that: A fixing slot (3) is provided in the middle of one side of the inner wall of the fixed inner cavity (2), a filter box (4) is installed inside the fixing slot (3), a placement slot (5) is provided in the middle of the top of the filter box (4), a plurality of filter interlayers (7) are arranged and installed inside the placement slot (5), a fixing frame (9) is fixedly installed on the outer surface of the filter water storage tank (1) near the opening of the fixed inner cavity (2), both sides of the fixing frame (9) are symmetrically provided with limiting holes (10), a fixing plate (11) is fixedly installed in the middle of the front end surface of the filter box (4), a sealing gasket (20) is welded to the edge of one end of the fixing plate (11), a fixing frame (12) is fixedly connected to the middle of the other end of the fixing plate (11), a limiting frame (13) is symmetrically and movably installed inside the fixing frame (12), and a rotating mechanism is also provided inside the fixing frame (12) for controlling the limiting frame (13) to move.
2. The ionization and impurity removal device for an ultrapure water preparation machine according to claim 1, characterized in that: The rotating mechanism comprises a movable plate (14), the movable plate (14) being rotatably mounted at the middle of one end of the inner wall of the fixed frame (12), a first slide groove (15) being provided on one side edge of the limiting frame (13), both side edges of the movable plate (14) passing through the first slide groove (15) being welded with connecting blocks (16), and a knob (17) being mounted at the middle of one end of the movable plate (14) extending to the outside of the fixed frame (12).
3. The ionization and impurity removal device for an ultrapure water preparation machine according to claim 1, characterized in that: The inner wall of the fixed slot (3) is symmetrically provided with a second slide groove (18), and the outer surface of the filter box (4) is symmetrically welded with a limiting protrusion (19) on both sides of the edge, and one side of the limiting protrusion (19) is located inside the second slide groove (18), and the second slide groove (18) and the limiting protrusion (19) are interlocked.
4. The ionization and impurity removal device for an ultrapure water preparation machine according to claim 1, characterized in that: A plurality of limiting columns (6) are symmetrically fixedly connected to the bottom edge of the inner wall of the placement groove (5), and limiting sleeves (8) are fixedly installed at the bottoms of the front and rear ends of the filtering interlayer (7), one side of the outer surface of the limiting column (6) is located inside the limiting sleeve (8), and the limiting column (6) and the limiting sleeve (8) are adapted to each other.
5. The ionization and impurity removal device for an ultrapure water preparation machine according to claim 1, characterized in that: One side edge of the limiting frame (13) is movably inserted into the limiting hole (10), and the limiting hole (10) and the limiting frame (13) are engaged with each other.