Resistor electroplating device with good uniformity

Abstract

The utility model relates to the technical field of electroplating devices, and discloses a resistance electroplating device with good uniformity, which comprises a bottom plate, a sliding plate is arranged above the bottom plate, a bolt is arranged at the top of the sliding plate, the bottom of the sliding plate is fixedly connected to the top of the bottom plate through the bolt, a fixed block is arranged above the sliding plate, and the fixed block is fixedly connected to the bottom of the bottom plate through the bolt. A telescopic assembly is arranged below the fixing block. The stability of the device can be improved through the supporting columns and the supporting disc which are arranged at the bottom of the bottom plate, the fixed block can move in the sliding groove through the sliding groove and the sliding block, the working efficiency is improved, the portability of the device is improved, and the telescopic assembly is arranged, so that the practicability of the device is improved. And the first telescopic shaft and the second telescopic shaft can be controlled to move up and down through the motor, the practicability of the device can be improved, and the reliability of the device can be improved through the arranged bottom plate.

Description

Technical Field

[0001] The utility model relates to the technical field of electroplating devices, in particular to a resistance electroplating device with good uniformity. Background Art

[0002] In the production process of semiconductor integrated circuits and other semiconductor devices, it is necessary to make a variety of metal layers on the surface of the resistor to achieve electrical interconnection and other functions. Electroplating is one of the key processes for making these metal layers. Resistor electroplating is to place the resistor in the plating solution, apply the negative voltage to the pre-made thin metal layer (seed layer) on the resistor, and apply the positive voltage to the soluble or insoluble anode. The metal ions in the plating solution are deposited on the surface of the resistor through the action of the electric field.

[0003] According to the published patent with publication number CN106917123B, the present invention discloses a wafer electroplating device, including an electroplating container, a wafer, an anode, an electroplating power supply, a diaphragm and a pull-down element; the diaphragm is placed in the electroplating container, and the pull-down element tightens the diaphragm to make the diaphragm concave; the upper part of the diaphragm is filled with an upper plating solution, and the lower part of the diaphragm is filled with a lower plating solution; the wafer is immersed in the upper plating solution, and the anode is immersed in the lower plating solution; wherein the conductivity of the upper plating solution is greater than the conductivity of the lower plating solution. The wafer electroplating device of the present invention divides the electrolyte into an upper electroplating liquid and a lower electroplating liquid with different conductivity through a diaphragm, so that the outer transmission resistance between the edge area of ​​the wafer surface and the anode is greater than the inner transmission resistance between the central area of ​​the wafer surface and the anode, and drives the wafer to rotate through a rotating motor, thereby realizing a uniform distribution of the electric field on the wafer electroplating surface; it has the characteristics of simple operation, good uniformity, high electroplating efficiency, etc., but still has the following problems:

[0004] The existing resistance electroplating device is relatively fixed in position, has low working efficiency, and is inconvenient to assemble and operate. Utility Model Content

[0005] In order to solve the above technical problems, the utility model provides a resistance electroplating device with good uniformity.

[0006] The utility model is implemented by the following technical scheme: a resistance electroplating device with good uniformity, comprising a bottom plate, a slide plate is arranged above the bottom plate, a bolt is arranged on the top of the slide plate, the bottom of the slide plate is fixedly connected to the top of the bottom plate by the bolt, a fixed block is arranged above the slide plate, and a telescopic component is arranged below the fixed block;

[0007] The telescopic assembly includes a first telescopic shaft, the top end of the first telescopic shaft extends to the top of the fixed block through a fixed block, a second telescopic shaft is arranged below the first telescopic shaft, the second telescopic shaft is sleeved in the first telescopic shaft, the outer surfaces of the first telescopic shaft and the second telescopic shaft are respectively provided with a first telescopic ring and a second telescopic ring, the first telescopic ring and the second telescopic ring are respectively sleeved on the outer surfaces of the first telescopic shaft and the second telescopic shaft, a first supporting shaft is arranged below the first telescopic ring, the top end of the first supporting shaft is fixedly connected to the bottom of the first telescopic ring, a second supporting shaft is arranged below the first supporting shaft, and the bottom end of the second supporting shaft is fixedly connected to the top of the second telescopic ring.

[0008] As a further improvement of the above scheme, a slide groove is provided on the top of the slide plate, a roller shaft is arranged in the slide groove, both ends of the roller shaft are fixedly connected to the inner wall of the slide groove, a sliding block is sleeved on the outer surface of the roller shaft, the top of the sliding block is fixedly connected to the bottom of the fixed block, and two sliding blocks and two roller shafts are provided.

[0009] As a further improvement of the above scheme, a lifting block is arranged below the second telescopic shaft, the top of the lifting block is fixedly connected to the bottom of the second telescopic shaft, an electroplating drum is arranged below the lifting block, a driving shaft is arranged inside the electroplating drum, and both ends of the driving shaft are fixedly connected to the inner wall of the lifting block.

[0010] As a further improvement of the above solution, a storage frame is provided on one side of the lifting block, the bottom of the storage frame is fixedly connected to the top of the lifting block, a motor is provided in the storage frame, and the bottom of the motor is fixedly connected to the bottom of the lifting block.

[0011] As a further improvement of the above solution, an electroplating box is arranged below the lifting block, the bottom of the electroplating box is fixedly connected to the top of the slide, a through groove is opened on one side of the electroplating box, and a transmission block is arranged in the through groove.

[0012] As a further improvement of the above solution, a sliding box is provided on one side of the electroplating box, a through groove is provided on the inner surface of the sliding box, one end of the transmission block is fixedly connected to the electroplating box, and the other end is fixedly connected to the sliding box.

[0013] As a further improvement of the above scheme, sliding bars are provided on both sides of the sliding box, and the bottom of the sliding bars is fixedly connected to the top of the sliding plate. Sliding blocks are provided on both sides of the sliding box, one side of the sliding block is fixedly connected to the sliding box, and the other side is slidably connected to the sliding bar. A support column is provided at the bottom of the base plate, and the top of the support column is fixedly connected to the bottom of the base plate. A support plate is provided below the support column, and the bottom of the support column is fixedly connected to the top of the support plate.

[0014] Compared with the prior art, the beneficial effects of the present invention are:

[0015] The utility model can improve the stability of the device by arranging the support column and the support plate at the bottom of the base plate, can make the fixed block move in the slide groove by arranging the slide groove, thereby improving the working efficiency and the portability of the device, can control the up and down movement of the first telescopic shaft and the second telescopic shaft by the motor by arranging the telescopic assembly, thereby improving the practicality of the device, and can improve the reliability of the device by arranging the base plate. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 It is a schematic diagram of the overall structure of the utility model;

[0017] Figure 2 For this utility model Figure 1 Schematic diagram of the midsole structure;

[0018] Figure 3 For this utility model Figure 1 Schematic diagram of the fixed block structure;

[0019] Figure 4 For this utility model Figure 3 Schematic diagram of the structure of the telescopic component;

[0020] Figure 5 For this utility model Figure 1 Enlarged structural diagram at A in the middle.

[0021] Description of main symbols:

[0022] 1. Bottom plate; 2. Slide plate; 3. Fixed block; 4. Telescopic assembly; 401. First telescopic axis; 402. Second telescopic axis; 403. First telescopic ring; 404. Second telescopic ring; 405. First support axis; 406. Second support axis; 5. Roller; 6. Sliding block; 7. Lifting block; 8. Electroplating roller; 9. Motor; 10. Electroplating box; 11. Transmission block; 12. Sliding box; 13. Slide bar. DETAILED DESCRIPTION

[0023] The present invention is further described below in conjunction with the accompanying drawings and specific implementation methods. It should be noted that, under the premise of no conflict, the various embodiments or technical features described below can be arbitrarily combined to form a new embodiment.

[0024] Example:

[0025] Please combine Figure 1-5, a resistance electroplating device with good uniformity in this embodiment includes a bottom plate 1, a slide plate 2 is arranged above the bottom plate 1, a bolt is arranged on the top of the slide plate 2, the bottom of the slide plate 2 is fixedly connected to the top of the bottom plate 1 by the bolt, a fixing block 3 is arranged above the slide plate 2, and a telescopic component 4 is arranged below the fixing block 3;

[0026] The telescopic assembly 4 includes a first telescopic shaft 401, the top end of the first telescopic shaft 401 extends to the top of the fixed block 3 through the fixed block 3, a second telescopic shaft 402 is arranged below the first telescopic shaft 401, the second telescopic shaft 402 is sleeved in the first telescopic shaft 401, the outer surfaces of the first telescopic shaft 401 and the second telescopic shaft 402 are respectively provided with a first telescopic ring 403 and a second telescopic ring 404, the first telescopic ring 403 and the second telescopic ring 404 are respectively sleeved on the outer surfaces of the first telescopic shaft 401 and the second telescopic shaft 402, a first support shaft 405 is arranged below the first telescopic ring 403, the top end of the first support shaft 405 is fixedly connected to the bottom of the first telescopic ring 403, a second support shaft 406 is arranged below the first support shaft 405, and the bottom end of the second support shaft 406 is fixedly connected to the top of the second telescopic ring 404.

[0027] A slide groove is provided at the top of the slide plate 2, and a roller shaft 5 is arranged in the slide groove. Both ends of the roller shaft 5 are fixedly connected to the inner wall of the slide groove. A sliding block 6 is sleeved on the outer surface of the roller shaft 5. The top of the sliding block 6 is fixedly connected to the bottom of the fixed block 3. There are two sliding blocks 6 and two roller shafts 5.

[0028] A lifting block 7 is arranged below the second telescopic shaft 402, and the top of the lifting block 7 is fixedly connected to the bottom of the second telescopic shaft 402. A plating drum 8 is arranged below the lifting block 7, and a driving shaft is arranged inside the plating drum 8. Both ends of the driving shaft are fixedly connected to the inner wall of the lifting block 7.

[0029] A storage frame is provided on one side of the lifting block 7 , the bottom of which is fixedly connected to the top of the lifting block 7 , a motor 9 is provided in the storage frame, and the bottom of the motor 9 is fixedly connected to the bottom of the lifting block 7 .

[0030] An electroplating box 10 is arranged below the lifting block 7, the bottom of the electroplating box 10 is fixedly connected to the top of the slide plate 2, a through groove is opened on one side of the electroplating box 10, and a transmission block 11 is arranged in the through groove.

[0031] A sliding box 12 is provided on one side of the electroplating box 10 , and a through groove is provided on the inner surface of the sliding box 12 . One end of the transmission block 11 is fixedly connected to the electroplating box 10 , and the other end is fixedly connected to the sliding box 12 .

[0032] Slide bars 13 are provided on both sides of the sliding box 12, and the bottom of the slide bar 13 is fixedly connected to the top of the slide plate 2. Slide blocks are provided on both sides of the sliding box 12, one side of the slide block is fixedly connected to the sliding box 12, and the other side is slidably connected to the slide bar 13. A support column is provided at the bottom of the base plate 1, and the top of the support column is fixedly connected to the bottom of the base plate 1. A support plate is provided below the support column, and the bottom of the support column is fixedly connected to the top of the support plate.

[0033] The implementation principle of one of the embodiments of the present application is: manually put the resistor to be electroplated into the sliding box 12, slide through the sliding bars 13 on both sides of the sliding box 12, and fix it to the transmission block 11 through the through grooves set on the inner surface of the sliding box 12, and then transfer the resistor to the electroplating box 10 through the transmission block 11, and then drive the second telescopic shaft 402 through the first telescopic shaft 401, and then drive the lifting block 7 through the second telescopic shaft 402, and then drive the electroplating roller 8 through the lifting block 7, and then electroplate the resistor in the electroplating box 10.

[0034] The above-mentioned implementation modes are only preferred implementation modes of the present invention, and cannot be used to limit the protection scope of the present invention. Any non-substantial changes and substitutions made by technicians in this field on the basis of the present invention shall fall within the scope of protection required by the present invention.

Claims

1. A resistance plating device with good uniformity, characterized in that: It comprises a bottom plate (1), a slide plate (2) is arranged above the bottom plate (1), a bolt is arranged on the top of the slide plate (2), the bottom of the slide plate (2) is fixedly connected to the top of the bottom plate (1) by the bolt, a fixing block (3) is arranged above the slide plate (2), and a telescopic assembly (4) is arranged below the fixing block (3); The telescopic assembly (4) comprises a first telescopic shaft (401), the top end of the first telescopic shaft (401) extends to the top of the fixed block (3), a second telescopic shaft (402) is arranged below the first telescopic shaft (401), the second telescopic shaft (402) is sleeved in the first telescopic shaft (401), the outer surfaces of the first telescopic shaft (401) and the second telescopic shaft (402) are respectively provided with a first telescopic ring (403) and a second telescopic ring (404), the first telescopic shaft (401) and the second telescopic shaft (402) are respectively provided with a first telescopic ring (403) and a second telescopic ring (404), The ring (403) and the second telescopic ring (404) are respectively sleeved on the outer surfaces of the first telescopic shaft (401) and the second telescopic shaft (402); a first support shaft (405) is arranged below the first telescopic ring (403); the top end of the first support shaft (405) is fixedly connected to the bottom of the first telescopic ring (403); a second support shaft (406) is arranged below the first support shaft (405); the bottom end of the second support shaft (406) is fixedly connected to the top of the second telescopic ring (404).

2. A resistance plating device with good uniformity as claimed in claim 1, characterized in that: A slide groove is provided at the top of the slide plate (2), a roller shaft (5) is arranged in the slide groove, both ends of the roller shaft (5) are fixedly connected to the inner wall of the slide groove, a sliding block (6) is sleeved on the outer surface of the roller shaft (5), the top of the sliding block (6) is fixedly connected to the bottom of the fixed block (3), and two sliding blocks (6) and two roller shafts (5) are provided.

3. A resistance plating device with good uniformity as claimed in claim 1, characterized in that: A lifting block (7) is arranged below the second telescopic shaft (402), the top of the lifting block (7) is fixedly connected to the bottom of the second telescopic shaft (402), an electroplating roller (8) is arranged below the lifting block (7), a driving shaft is arranged inside the electroplating roller (8), and both ends of the driving shaft are fixedly connected to the inner wall of the lifting block (7).

4. A resistance plating device with good uniformity as claimed in claim 1, characterized in that: A storage frame is provided on one side of the lifting block (7), the bottom of the storage frame is fixedly connected to the top of the lifting block (7), a motor (9) is provided in the storage frame, and the bottom of the motor (9) is fixedly connected to the bottom of the lifting block (7).

5. A resistance plating device with good uniformity as claimed in claim 1, characterized in that: A plating box (10) is arranged below the lifting block (7), the bottom of the plating box (10) is fixedly connected to the top of the slide plate (2), a through groove is opened on one side of the plating box (10), and a transmission block (11) is arranged in the through groove.

6. A resistance plating device with good uniformity as claimed in claim 1, characterized in that: A sliding box (12) is provided on one side of the electroplating box (10), and a through groove is provided on the inner surface of the sliding box (12). One end of the transmission block (11) is fixedly connected to the electroplating box (10), and the other end is fixedly connected to the sliding box (12).

7. A resistance plating device with good uniformity as claimed in claim 1, characterized in that: The sliding box (12) is provided with sliding bars (13) on both sides, the bottom of the sliding bars (13) is fixedly connected to the top of the sliding plate (2), the sliding boxes (12) are provided with sliding blocks on both sides, one side of the sliding blocks is fixedly connected to the sliding box (12), and the other side is slidably connected to the sliding bars (13), the bottom of the base plate (1) is provided with a support column, the top of the support column is fixedly connected to the bottom of the base plate (1), and a support plate is provided below the support column, the bottom of the support column is fixedly connected to the top of the support plate.

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