Mask cleaning device

Abstract

The utility model provides a mask cleaning device. The mask cleaning device comprises a bearing plate, a clamping mechanism, a cleaning mechanism and a rotating mechanism. The bearing plate is provided with a first plate surface and a second plate surface which are opposite; a containing groove is punched in the center of the first plate face. The clamping mechanism is arranged on the first plate face and used for fixing the mask plate to the first plate face, and a membrane arranged on the membrane face of the mask plate is located in the containing groove. The cleaning mechanism is detachably arranged on the first plate face, located outside the clamping mechanism and used for cleaning the mirror face of the mask plate. The rotating mechanism is arranged at the center of the second plate surface; after the cleaning mechanism is detached, the rotating mechanism drives the bearing plate to rotate.

Description

Technical Field

[0001] The present application relates to the technical field of mask plates, and in particular to a mask plate cleaning device. Background Art

[0002] A mask is a metal layer or photoresist layer with graphics, text and other information on the surface. It is widely used in IC, FPD, MEMS, optical devices and other industries. The mask surface is provided with a diaphragm. When the mirror surface of the mask is contaminated, the diaphragm needs to be removed before the mirror surface of the mask can be cleaned. However, when removing the diaphragm, the tool used to remove the diaphragm may scratch the mask, making the mask scrapped. Utility Model Content

[0003] The main technical problem solved by the present application is to provide a mask cleaning device to solve the problem that the mask may be scratched when removing the membrane.

[0004] In order to solve the above technical problems, the technical solution adopted in the present application is: to provide a mask cleaning device. The mask cleaning device includes a carrier plate, a clamping mechanism, a cleaning mechanism and a rotating mechanism. The carrier plate has a first plate surface and a second plate surface opposite to each other; a placement groove is punched at the center of the first plate surface. The clamping mechanism is arranged on the first plate surface, and is used to fix the mask on the first plate surface, and the membrane arranged on the membrane surface of the mask is located in the placement groove. The cleaning mechanism is detachably arranged on the first plate surface and is located outside the clamping mechanism, and is used to clean the mirror surface of the mask. The rotating mechanism is arranged at the center of the second plate surface; after the cleaning mechanism is disassembled, the rotating mechanism drives the carrier plate to rotate.

[0005] The mask is mounted on the first plate surface by using a clamping mechanism, and the film sheet arranged on the film surface of the mask plate is exactly located in the placement groove. The cleaning mechanism is mounted on the first plate surface, so that the mirror surface of the mask plate opposite to the film surface can be directly cleaned without removing the film sheet on the mask plate. After the cleaning is completed, the cleaning mechanism is disassembled and rotated by using a rotating mechanism to dry the moisture on the mask plate.

[0006] Since the diaphragm is located in the placement groove, the placement groove serves as a placement, so there is no need to remove the diaphragm set on the mask surface, reducing the risk of scratching the mask. This solves the problem that the mask may be scratched when the diaphragm is removed. The placement groove can also protect the diaphragm, thereby reducing the contamination of the diaphragm, so that after cleaning and drying, the diaphragm on the mask surface is relatively clean, and the mirror surface of the mask is also relatively clean, so it can be used normally, improving the cleaning efficiency. In addition, there is no need to re-stick a new diaphragm, saving costs.

[0007] In some embodiments, the number of the clamping mechanisms is four, and the four clamping mechanisms are used to clamp the four corners of the rectangular mask.

[0008] In some embodiments, a first annular water groove is formed on the first plate surface, and the first annular water groove is located between the placement groove and the clamping mechanism.

[0009] In some embodiments, the lower wall of the first annular water tank has a depression, and the depression is provided with a first drainage hole.

[0010] In some embodiments, the side wall of the first annular water tank is inclined outward.

[0011] In some embodiments, the rotating mechanism includes a driving motor and a connecting sleeve; the connecting sleeve is fixed at the center of the second plate surface, and the shaft end of the driving motor is sleeved in the connecting sleeve.

[0012] In some embodiments, a second annular water tank is provided on the first plate surface, and the second annular water tank is located outside the clamping mechanism. The mask cleaning device also includes a retaining ring, which is provided on the first plate surface and outside the second annular water tank; and a second drainage hole is provided on the bottom wall of the second annular water tank.

[0013] In some embodiments, the inner wall of the retaining ring is flush with the outer side wall of the second annular water groove.

[0014] In some embodiments, the first plate surface is a plane; when the film on the mask is located in the placement groove, the remaining film surface of the mask contacts a portion of the first plate surface.

[0015] In some embodiments, the cleaning mechanism is an ultrasonic cleaner. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0017] Figure 1 It is a structural schematic diagram of the mask cleaning device provided by the present application;

[0018] Figure 2 yes Figure 1 Top view of the .

[0019] In the figure: 1. cleaning mechanism; 2. retaining ring; 3. carrying plate; 31. first plate surface; 32. second plate surface; 33. placement groove; 34. first annular water groove; 35. first drainage hole; 36. second annular water groove; 37. second drainage hole; 4. rotating mechanism; 5. clamping mechanism; 6. mask; 61. mirror surface; 62. membrane surface; 7. membrane. DETAILED DESCRIPTION

[0020] The scheme of the embodiment of the present application is described in detail below in conjunction with the drawings of the specification.

[0021] In the following description, for the purpose of explanation rather than limitation, specific details such as specific system structures, interfaces, and technologies are provided to facilitate a thorough understanding of the present application.

[0022] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0023] The terms "first", "second", "third" in this application are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Thus, the features defined as "first", "second", "third" can expressly or implicitly include at least one of the features. In the description of this application, the meaning of "multiple" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined. In the embodiments of this application, all directional indications (such as up, down, left, right, front, back...) are only used to explain the relative position relationship, movement, etc. between the components under a certain specific posture (as shown in the accompanying drawings). If the specific posture changes, the directional indication also changes accordingly. In addition, the terms "including" and "having" and any of their variations are intended to cover non-exclusive inclusions. For example, a process, method, system, product or device comprising a series of steps or units is not limited to the steps or units listed, but optionally also includes steps or units that are not listed, or optionally also includes other steps or units inherent to these processes, methods, products or devices.

[0024] Reference to "embodiments" herein means that a particular feature, structure, or characteristic described in conjunction with the embodiments may be included in at least one embodiment of the present application. The appearance of the phrase in various locations in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment that is mutually exclusive with other embodiments. It is explicitly and implicitly understood by those skilled in the art that the embodiments described herein may be combined with other embodiments.

[0025] The embodiment of the present disclosure provides a mask cleaning device. The mask cleaning device includes a carrier plate 3, a clamping mechanism 5, a cleaning mechanism 1 and a rotating mechanism 4. The carrier plate 3 has a first plate surface 31 and a second plate surface 32 facing each other; a placement groove 33 is punched at the center of the first plate surface 31. The clamping mechanism 5 is arranged on the first plate surface 31, and is used to fix the mask 6 on the first plate surface 31, and the membrane 7 arranged on the membrane surface 62 of the mask 6 is located in the placement groove 33. The cleaning mechanism 1 is detachably arranged on the first plate surface 31 and is located outside the clamping mechanism 5, and is used to clean the mirror surface 61 of the mask 6. The rotating mechanism 4 is arranged at the center of the second plate surface 32; after the cleaning mechanism 1 is disassembled, the rotating mechanism 4 drives the carrier plate 3 to rotate.

[0026] The mask plate 6 is mounted on the first plate surface 31 by using the clamping mechanism 5, and the film sheet 7 provided on the film surface 62 of the mask plate 6 is just located in the placement groove 33. The cleaning mechanism 1 is mounted on the first plate surface 31, so that the mirror surface 61 of the mask plate 6 opposite to the film surface 62 can be directly cleaned without removing the film sheet 7 on the mask plate 6.

[0027] After cleaning is completed, the cleaning mechanism 1 is disassembled, and the rotating mechanism 4 is used to rotate to dry the moisture on the mask plate 6 .

[0028] Since the diaphragm 7 is located in the placement groove 33 , the placement groove 33 serves to place and protect the diaphragm 7 , thereby reducing contamination of the diaphragm 7 .

[0029] Compared with digging a placement groove 33 on the surface of the supporting plate 3, in this embodiment, the placement groove 33 is punched at the center of the first plate surface 31 of the supporting plate 3, so that the thickness of the placement groove 33 is roughly the same as the thickness of the supporting plate 3, so that the strength of the placement groove 33 and the supporting plate 3 is roughly the same, and the mass of the supporting plate 3 is smaller.

[0030] The rotating mechanism 4 is arranged at the center of the second plate surface 32, so that the rotation axis of the rotating mechanism is located at the center of the second plate surface 32; and the placement groove 33 is located at the center of the first plate surface 31; so that when the rotating mechanism 4 rotates, the diaphragm 7 in the placement groove 33 performs non-eccentric centrifugal motion to avoid the diaphragm 7 being thrown off the mask plate 6.

[0031] The film sheet 7 disposed on the film surface 62 of the mask plate 6 may be a protective film, or may be an optical film or the like.

[0032] The first plate surface 31 and the second plate surface 32 may both be curved surfaces; they may both be flat surfaces; or one may be a curved surface and the other may be a flat surface. This article takes the example that the first plate surface 31 and the second plate surface 32 may both be flat surfaces for explanation. The mask 6 may be rectangular or circular.

[0033] For example, a punching machine is used to punch out the placement groove 33 at the center of the first plate surface 31, so that the placement groove 33 and the supporting plate 3 are an integrated structure, thereby solving the problem of fracture between the placement groove 33 and the supporting plate 3 caused by welding or the like.

[0034] The clamping mechanism 5 can be fixed on the first plate surface 31. The clamping mechanism 5 can also be slidably arranged on the first plate surface 31, so as to clamp the mask plates 6 of various sizes. The number of the clamping mechanism 5 can be one or more. The clamping mechanism 5 can be a clamp; the clamping mechanism 5 can be a cylinder. When the clamping mechanism 5 is a cylinder, the number of the clamping mechanism 5 is at least two that cooperate with each other.

[0035] The size of the placement groove 33 can be larger than the size of the film sheet 7 set on the film surface 62 of the mask 6, so that the placement groove 33 can place multiple film sheets 7 of different sizes. Of course, the size of the placement groove 33 can be the same as the size of the film sheet 7 set on the film surface 62 of the mask 6, so that the placement groove 33 can place film sheets 7 of one specification.

[0036] The cleaning mechanism 1 can be an ultrasonic cleaner; of course, the cleaning mechanism 1 can include a nozzle and a spherical brush, and the nozzle is used to spray cleaning liquid and deionized pure water to clean the mirror surface, and the spherical brush is used to wipe the mirror surface to achieve a clean effect. The spherical brush can be a soft roller brush. The cleaning mechanism 1 can be detachably arranged on the first plate surface 31 by bolts, quick-release joints, etc. The position where the mask 6 contacts the clamping mechanism 5, the placement groove, etc. is provided with a chamfer and a protective structure to reduce the risk of scratching the mask.

[0037] The rotating mechanism 4 may include a driving motor and a connecting sleeve; the connecting sleeve is fixed at the center of the second plate surface 32, and the shaft end of the driving motor is sleeved in the connecting sleeve. The axis of the connecting sleeve, the axis of the shaft end of the driving motor and the center line of the second plate surface 32 coincide. Of course, the rotating mechanism 4 can only be a driving motor.

[0038] In some embodiments, there are four clamping mechanisms 5, and the four clamping mechanisms 5 are used to clamp the four corners of the rectangular mask 6. For example, the clamping mechanism 5 can be a clamp or a cylinder.

[0039] In some embodiments, the first plate surface 31 is provided with a first annular water groove 34, and the first annular water groove 34 is located between the placement groove 33 and the clamping mechanism 5. In this way, during cleaning, the first annular water groove 34 can collect moisture between the remaining film surface 62 of the mask 6 and the first plate surface 31, thereby reducing the flow of moisture into the placement groove 33 and avoiding affecting the membrane 7 in the placement groove 33. The first annular water groove 34 can be a rectangular water groove or a circular water groove.

[0040] In some embodiments, the lower wall of the first annular water groove 34 has a depression, and the depression is provided with a first drainage hole 35. Thus, the water in the first annular water groove 34 can be drained. Of course, the first drainage hole 35 may not be provided, and the water in the first annular water groove 34 may be cleaned after the mask 6 is removed.

[0041] In some embodiments, the sidewall of the first annular water trough 34 is tilted outwardly, so that the first annular water trough 34 is larger and can collect more water.

[0042] In some embodiments, a second annular water tank 36 is provided on the first plate surface 31, and the second annular water tank 36 is located outside the clamping mechanism 5; the mask cleaning device further includes a retaining ring 2, which is provided on the first plate surface 31 and outside the second annular water tank; a second drainage hole 37 is provided on the bottom wall of the second annular water tank 36. In this way, when drying, the rotating mechanism 4 rotates so that the retaining ring 2 can block the water, and the water blocked by the retaining ring 2 flows into the second annular water tank 36 and is discharged through the second drainage hole 37.

[0043] In some examples, the second drain hole 37 is provided with a removable plug. After the second annular water trough 36 has collected the water, the plug is opened and the water in the second annular water trough 36 is drained out through the second drain hole 37. In other examples, an annular collecting trough is placed on one side of the second plate surface 32 so that the supporting plate 3 can rotate while the annular collecting trough does not move. When drying, the water in the second drain hole 37 can flow into the annular collecting trough. The gap between the annular collecting trough and the second plate surface 32 is small, so that the water in the second drain hole 37 can be prevented from being thrown out from the gap between the annular collecting trough and the second plate surface 32.

[0044] In some embodiments, the inner wall of the retaining ring 2 is flush with the outer wall of the second annular water groove 36 .

[0045] In some embodiments, the first plate surface 31 is a plane; when the membrane 7 on the mask 6 is located in the placement groove 33, the remaining membrane surface 62 of the mask 6 is in contact with part of the first plate surface 31. In this way, the gap between the two can be reduced to prevent water from flowing into the placement groove 33. The membrane 7 occupies a part of the membrane surface 62; the other part of the membrane surface 62 is not occupied by the membrane 7, that is, the remaining membrane surface 62 of the mask 6.

[0046] The above description is only an implementation method of the present application, and does not limit the patent protection scope of the present application. Any equivalent structure or equivalent process transformation made using the contents of the present application specification and drawings, or directly or indirectly used in other related technical fields, are also included in the patent protection scope of the present application.

Claims

1. A mask cleaning device, characterized in that: include: The bearing plate comprises a first plate surface and a second plate surface facing each other; a placement groove is punched at the center of the first plate surface; A clamping mechanism is arranged on the first plate surface and is used to fix the mask on the first plate surface, and the film sheet arranged on the film surface of the mask is located in the placement groove; A cleaning mechanism, which is detachably arranged on the first plate surface and is located outside the clamping mechanism, and is used for cleaning the mirror surface of the mask; The rotating mechanism is arranged at the center of the second plate surface; after the cleaning mechanism is disassembled, the rotating mechanism drives the carrying plate to rotate.

2. The mask cleaning device according to claim 1, characterized in that: The number of the clamping mechanisms is four, and the four clamping mechanisms are used to clamp the four vertices of a rectangular mask.

3. The mask cleaning device according to claim 1, characterized in that: The first plate surface is provided with a first annular water groove, and the first annular water groove is located between the placement groove and the clamping mechanism.

4. The mask cleaning device according to claim 3, characterized in that: The lower wall of the first annular water tank has a depression, and the depression is provided with a first drainage hole.

5. The mask cleaning device according to claim 3, characterized in that: The side wall of the first annular water tank is arranged to be inclined outward.

6. The mask cleaning device according to claim 1, characterized in that: The rotating mechanism comprises a driving motor and a connecting sleeve; the connecting sleeve is fixed at the center of the second plate surface, and the shaft end of the driving motor is sleeved in the connecting sleeve.

7. The mask cleaning device according to claim 1, characterized in that: A second annular water groove is provided on the first plate surface, and the second annular water groove is located outside the clamping mechanism; The mask cleaning device further comprises a retaining ring, which is arranged on the first plate surface and outside the second annular water tank; a second drainage hole is arranged on the bottom wall of the second annular water tank.

8. The mask cleaning device according to claim 7, characterized in that: The inner wall of the retaining ring is flush with the outer wall of the second annular water groove.

9. The mask cleaning device according to claim 1, characterized in that: The first plate surface is a plane; when the film sheet on the mask is located in the placement groove, the remaining film surface of the mask contacts part of the first plate surface.

10. The mask cleaning device according to claim 1, characterized in that: The cleaning mechanism is an ultrasonic cleaner.

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