Gas supply device and reaction equipment for wet oxygen process

Abstract

The utility model discloses a gas supply device and reaction equipment for the wet oxygen process, the gas supply device for the wet oxygen process comprises a water vapor generating assembly and a gas supply assembly, the water vapor generating assembly comprises a water storage container and a heat supply piece, the gas supply assembly comprises a first gas path and a second gas path, the first gas path introduces gas into the water storage container, and the second gas path introduces gas into the water storage container; gas entering the water storage container through the gas inlet carries water vapor above the liquid level of the pure water and is discharged from the water outlet; the reaction equipment comprises a gas supply device for the wet oxygen process. After the gas enters the water storage container, water vapor generated by evaporation of the pure water is liquefied into water vapor when encountering the gas, the gas carries the water vapor and enters the second gas path from the gas outlet, then the gas carrying the water vapor is introduced into the reaction chamber and participates in the wet oxygen reaction, and the gas introduced into the water storage container does not enter the pure water; the water vapor generated by pure water is discharged from the air outlet, the pure water is not disturbed by the air, the pollution to the pure water in the water vapor generation process can be reduced, and the water changing frequency is reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of photovoltaic cell preparation, in particular to a gas supply device and reaction equipment for a wet oxygen process. Background Art

[0002] During the preparation of photovoltaic cells, an oxide layer needs to be formed in a boron diffusion device. The temperature in the reaction chamber is close to the softening temperature of quartz. Long-term high-temperature reaction has a great impact on the life of the furnace body and quartz devices, and is likely to cause deformation and damage to the reaction chamber and the carrier. In the related technology, water vapor is brought out by bubbling oxygen in pure water, and oxygen carrying water vapor is introduced during the formation of the oxide layer by wet oxidation to lower the reaction temperature. However, the bubbling method is easy to contaminate pure water, causing the resistivity of pure water to drop rapidly, affecting the process effect, and the water needs to be changed more frequently. Summary of the invention

[0003] The utility model aims to solve at least one of the technical problems existing in the prior art. To this end, the utility model proposes an air supply device for a wet oxygen process, which can reduce pure water pollution and extend the water replacement cycle.

[0004] The utility model also provides a reaction device having the gas supply device for wet oxygen process.

[0005] According to the first aspect of the present invention, a gas supply device for a wet oxygen process includes:

[0006] The water vapor generating assembly comprises a water storage container and a heating element, wherein the water storage container is used to store pure water and receive the heat emitted by the heating element, and the water storage container has an air inlet and an air outlet;

[0007] The gas supply component includes a first gas circuit and a second gas circuit. One end of the first gas circuit is used to connect to the gas source, and the other end is connected to the gas inlet and can pass gas into the water storage container. One end of the second gas circuit is connected to the gas outlet. The gas entering the water storage container through the gas inlet carries the water vapor above the pure water liquid level and is discharged from the gas outlet.

[0008] The gas supply device for the wet oxygen process according to the embodiment of the utility model has at least the following beneficial effects:

[0009] In the utility model, after the gas enters the water storage container, the water vapor evaporated from the pure water meets the gas and liquefies to form water vapor. The gas carries the water vapor and enters the second gas path from the gas outlet. The second gas path introduces the gas carrying water vapor into the reaction chamber to participate in the wet oxygen reaction. The gas introduced into the water storage container does not enter the pure water, but simply carries the water vapor generated by the pure water and is discharged from the gas outlet. The pure water is not disturbed by the gas, so the pollution of the pure water in the process of water vapor generation can be reduced, the frequency of water changes can be reduced, and the process efficiency can be improved.

[0010] According to some embodiments of the utility model, the gas supply assembly further includes a purge gas circuit, one end of which is used to connect to a gas source, and the other end of which is used to discharge gas into the reaction chamber;

[0011] Alternatively, the gas supply assembly further comprises a purge gas circuit, one end of the purge gas circuit is in communication with the first gas circuit, and the other end of the purge gas circuit is in communication with the second gas circuit;

[0012] Alternatively, the gas supply assembly further includes a purge gas circuit and a process gas circuit, one end of the process gas circuit is used to introduce gas into the reaction chamber, the second gas circuit and the purge gas circuit are both connected to the other end of the process gas circuit, and the purge gas circuit is used to introduce gas released from a gas source.

[0013] According to some embodiments of the present utility model, the gas supply assembly includes a first valve for opening and closing the first gas circuit, a second valve for opening and closing the second gas circuit, and a third valve for opening and closing the purge gas circuit;

[0014] The gas supply device for the wet oxygen process has a first gas supply state and a second gas supply state. When in the first gas supply state, the first valve and the second valve are opened, and the third valve is closed. When in the second gas supply state, the first valve and the second valve are closed, and the third valve is opened.

[0015] According to some embodiments of the utility model, a water replenishment component is further included, which includes a water replenishment passage. The water storage container has a water inlet. One end of the water replenishment passage is used to introduce pure water, and the other end is connected to the water inlet and is used to pass pure water into the water storage container.

[0016] According to some embodiments of the present utility model, the water replenishment component also includes a resistivity detection element, which is connected to the water replenishment passage and is used to detect the resistivity of pure water in the water replenishment passage.

[0017] According to some embodiments of the utility model, a waste discharge component is further included, wherein the waste discharge component includes a waste discharge waterway, and the water storage container has a water outlet, and the water outlet is used to discharge the pure water in the water storage container through the waste discharge waterway.

[0018] According to some embodiments of the utility model, the waste discharge component also includes a timer and a waste discharge valve that are communicatively connected, the waste discharge valve is used to open and close the waste discharge water path, and the timer is used to set the opening and closing cycle of the waste discharge valve so that the waste discharge valve is opened and closed regularly.

[0019] According to some embodiments of the present invention, a temperature control component is further included, wherein the temperature control component is connected to the water storage container, and the temperature control component is configured to maintain the temperature of the water storage container at 60°C-80°C.

[0020] According to some embodiments of the present invention, the air supply assembly further includes a heat-insulating structure, and the heat-insulating structure is wrapped around the outside of the second air path.

[0021] The reaction device according to the second embodiment of the utility model comprises:

[0022] The reaction device of the first aspect embodiment;

[0023] The reaction chamber, wherein one end of the second gas path away from the gas outlet is connected to the reaction chamber and is used to pass the gas carrying water vapor into the reaction chamber.

[0024] Additional aspects and advantages of the present invention will be given in part in the following description, and in part will become apparent from the following description, or will be learned through the practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] The present invention is further described below with reference to the accompanying drawings and embodiments, wherein:

[0026] Figure 1 It is a schematic diagram of an embodiment of a gas supply device for a wet oxygen process of the utility model;

[0027] Figure 2 FIG. 1 is a schematic diagram of another embodiment of a gas supply device for a wet oxygen process.

[0028] Reference numerals:

[0029] Water vapor generation component 100, water storage container 110, air inlet 111, air outlet 112, water outlet 113, water inlet 114, water inlet pipe 115, heating element 120; air supply component 200, first air path 201, second air path 202, air source 203, insulation structure 204, purge air path 205, process air path 206, first valve 207, second valve 208, third valve 209, pressure relief valve 210, pressure relief air path 211; waste discharge component 300, waste discharge water path 310, waste discharge valve 320, waste water tank 330, drain valve 340, drain pipeline 350, drain pump 360, one-way valve 370, waste water treatment equipment 380; water replenishment component 400, water replenishment passage 410, water source 420, water replenishment valve 430; reaction chamber 500. DETAILED DESCRIPTION

[0030] The embodiments of the present invention are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and cannot be understood as limiting the present invention.

[0031] In the description of the present invention, it should be understood that descriptions involving orientation, such as up, down, front, back, left, right, etc., indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0032] In the description of the present utility model, "several" means more than one, "many" means more than two, "greater than", "less than", "exceed" etc. are understood to exclude the number itself, and "above", "below", "within" etc. are understood to include the number itself. If there is a description of "first" or "second", it is only used to distinguish the technical features, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features or implicitly indicating the order of the indicated technical features.

[0033] In the description of the present invention, unless otherwise clearly defined, terms such as setting, installing, connecting, etc. should be understood in a broad sense, and technicians in the relevant technical field can reasonably determine the specific meanings of the above terms in the present invention based on the specific content of the technical solution.

[0034] In the description of the utility model, the description with reference to the terms "one embodiment", "some embodiments", "illustrative embodiments", "examples", "specific examples", or "some examples" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the utility model. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner.

[0035] Reference Figure 1In the embodiment of the utility model, a gas supply device for wet oxygen process (hereinafter referred to as gas supply device) is provided, which is used to provide gas with water vapor to the reaction chamber 500. The gas supply device includes a water vapor generation component 100 and a gas supply component 200. The water vapor generation component 100 includes a water storage container 110 and a heating element 120. The water storage container 110 is used to store pure water. The heating element 120 can release heat to the water storage container 110. The pure water exchanges heat with the inner wall of the water storage container 110, so that the temperature of the pure water is maintained within a preset range. The water storage container 110 has an air inlet 111 and an air outlet 112. The gas supply component 200 includes a first There is a gas circuit 201 and a second gas circuit 202. One end of the first gas circuit 201 is used to connect to the gas source 203, and the other end is connected to the gas inlet 111. The gas in the gas source 203 enters the water storage container 110 through the first gas circuit 201 and the gas inlet 111. One end of the second gas circuit 202 is connected to the gas outlet 112. The gas in the water storage container 110 can be discharged into the second gas circuit 202 through the gas outlet 112. The second gas circuit 202 is used to supply gas to the reaction chamber 500.

[0036] The temperature of the gas discharged from the gas source 203 is lower than the temperature of the pure water in the water storage container 110. When the gas enters the water storage container 110, the water vapor evaporated from the pure water meets the gas and liquefies to form water vapor. The gas carries the water vapor and enters the second gas path 202 from the gas outlet 112. The second gas path 202 introduces the gas carrying water vapor into the reaction chamber 500 to participate in the wet oxygen reaction, thereby reducing the process operating temperature in the reaction chamber 500, increasing the service life of the quartz equipment, reducing the maintenance cost of the reaction equipment, shortening the process time, and increasing production capacity.

[0037] It is understandable that in the present invention, the gas introduced into the water storage container 110 does not enter the pure water, but simply carries the water vapor generated by the pure water and is discharged from the gas outlet 112. The pure water is not disturbed by the gas, which can reduce the pollution of the pure water during the water vapor generation process, reduce the frequency of water changes, and improve the process efficiency. In addition, as the gas continues to be introduced into the water storage container 110, the water vapor generated by the pure water in the water storage container 110 is continuously liquefied to form water vapor, and is carried out of the water storage container 110 by the gas. The amount of water vapor carried by the gas is stable, which is conducive to optimizing the process effect in the reaction chamber 500. Compared with the method of generating water vapor by bubbling, the amount of water vapor generated is not affected by the stability of bubbling, and can continuously provide sufficient water vapor to the process chamber to meet the requirements of the wet oxygen reaction for the amount and duration of water vapor.

[0038] In one embodiment, the air inlet 111 and the air outlet 112 are both arranged at the top of the water storage container 110, and the air inlet 111 and the air outlet 112 are both higher than the liquid level of the pure water in the water storage container 110. The water vapor generated by the pure water in the water storage container 110 is concentrated above the liquid level of the pure water. The gas entering the water storage container 110 through the air inlet 111 can directly exchange heat with the water vapor, so that the water vapor is quickly liquefied to form water vapor. The water vapor flows with the flow of the gas and is discharged from the water storage container 110 from above the liquid level of the pure water along with the gas. In the process of generating and discharging the water vapor from the water storage container 110, the gas does not pass into the pure water. The air inlet 111 and the air outlet 112 are both located at the top of the water storage container 110. The flow path of the gas in the water storage container 110 is short, the pollution to the pure water is small, and the gas can quickly carry the water vapor out of the water storage container 110, and the generation rate and discharge efficiency of the gas carrying the water vapor are high.

[0039] The gas supply assembly 200 further includes a gas source 203, which is connected to one end of the first gas path 201 away from the water storage container 110, and the gas stored in the gas source 203 is passed into the water storage container 110 through the first gas path 201. A plurality of gas sources 203 may be provided, and different types of gases are stored in different gas sources 203. According to the requirements of the wet oxygen reaction, the corresponding gas source 203 may be selectively made to pass gas into the first gas path 201; for example, the gas source 203 is connected to the first gas path 201 through a pipeline provided with a valve, and the valve is in a normally closed state. When a certain type of gas is required for the wet oxygen reaction, the valve on the corresponding pipeline is opened, and the gas in the gas source 203 enters the first gas path 201 through the pipeline, and then passes into the water storage container 110. The gas type is not limited to being set to oxygen, nitrogen, argon, etc. In one embodiment of the present invention, the gas is set to nitrogen. The chemical properties of nitrogen are stable, and the effect on the resistivity of pure water is small. The water vapor formed by pure water is of high quality and the frequency of water replacement is low. By carrying water vapor into the reaction chamber 500 for wet oxygen reaction by nitrogen, the gas flow rate can be balanced, the uniformity of the gas field in the reaction chamber 500 can be improved, and the oxide layer generated by the wet oxygen reaction is more uniform.

[0040] The gas supply device also includes a temperature control component, which is connected to the heating element 120. The temperature control component is configured to maintain the temperature of the heating element 120 at 60°C-80°C. The heating element 120 continuously dissipates heat to the pure water, so that the temperature of the pure water is also maintained in the range of 60°C-80°C, so as to generate sufficient water vapor in the water storage container 110, so as to avoid the situation that the water vapor formed is too small due to the low temperature of the pure water, and cannot meet the requirements of the wet oxygen reaction, resulting in a long wet oxygen reaction time, which affects the process effect and the service life of the device. It is understandable that the temperature of the gas entering the water storage container 110 is lower than the temperature of the pure water. When the difference between the gas temperature and the pure water temperature is large, the water vapor generated by the pure water can be quickly liquefied. Therefore, the amount of water vapor generated and the generation efficiency can also be changed by adjusting the difference between the gas temperature and the pure water temperature; for example, the pure water is introduced into the water storage container 110 at room temperature, or the pure water is introduced into the water storage container 110 after being cooled.

[0041] The temperature control component includes a temperature sensing element and a system module. The temperature sensing element and the heating element 120 are both communicatively connected to the system module. The heating element 120 is used to heat the water storage container 110. The temperature sensing element is used to detect the temperature of the water storage container 110 and feed back the detected value to the system module. The system module sends an instruction to start or stop heating to the heating element 120 according to the current temperature of the water storage container 110. Through real-time detection of the temperature of the water storage container 110 and heating feedback, the temperature of the water storage container 110 is maintained within a preset range, so that water vapor has a relatively stable generation amount. It can be understood that the heating element 120 is wrapped around the outside of the water storage container 110 to enhance the heat transfer efficiency between the heating element 120 and the water storage container 110. The heating element 120 is not limited to being set as a heating rod, a heating sleeve, etc.; in one embodiment, the heating element 120 has an inner cavity that matches the outer contour of the water storage container 110, and the water storage container 110 is accommodated in the inner cavity of the heating element 120. The contact area between the water storage container 110 and the heating element 120 is large, which can improve the heat transfer efficiency between the two.

[0042] In addition, the gas supply assembly 200 further includes a heat preservation structure 204, which is wrapped around the outside of the second gas path 202 to reduce heat exchange between the gas and the external environment, reduce temperature changes of the gas carrying water vapor in the second gas path 202, and reduce the effect of the gas temperature on the wet oxygen reaction. The material of the heat preservation structure 204 is not limited to glass wool, rock wool, polyurethane foam, etc.

[0043] In order to avoid the resistivity and purity of pure water decreasing when the gas supply device is used for a long time, which will affect the process quality, refer to Figure 2The gas supply device of the present invention is also provided with a waste discharge assembly 300, which includes a waste discharge water path 310 for discharging the pure water in the water storage container 110 that no longer meets the purity requirement. Specifically, the water storage container 110 has a water outlet 113, which is used to discharge the pure water in the water storage container 110 through the waste discharge water path 310, so that the water storage container 110 can be refilled with pure water of higher purity.

[0044] The water outlet 113 is arranged at the lower part of the water storage container 110, such as the bottom of the water storage container 110, the middle and lower part of the side wall, etc., so that the pure water in the water storage container 110 can be discharged more thoroughly. The waste discharge component 300 also includes a timer and a waste discharge valve 320 that are connected in communication. The waste discharge valve 320 is connected to the waste discharge water path 310 and is used to open and close the waste discharge water path 310. The timer is set with an opening and closing cycle of the waste discharge valve 320, so that the waste discharge valve 320 is opened and closed regularly, so as to realize the regular discharge of the pure water in the water storage container 110.

[0045] It can be understood that the timer is integrated into the system module, and the timer records the on-off time of the waste valve 320. When the time recorded by the timer reaches the opening and closing cycle of the waste valve 320, the system module sends a command to the waste valve 320, and the waste valve 320 opens and discharges the pure water in the water storage container 110. Alternatively, the timer records and displays the time since the waste valve 320 was last opened. The operator compares the time recorded by the timer with the opening and closing cycle of the waste valve 320. When the recorded time reaches the opening and closing cycle of the waste valve 320, the operator manually opens the waste valve 320 to discharge the pure water in the water storage container 110.

[0046] The waste discharge assembly 300 further includes a waste water tank 330, which is connected to the waste water discharge path 310 and is used to temporarily store the pure water discharged from the waste water discharge path 310. The waste discharge assembly 300 further includes a drain valve 340, a drain pipeline 350 and a drain pump 360. One end of the drain pipeline 350 is connected to the waste water tank 330, and the other end is used to communicate with the waste water treatment equipment 380. The drain valve 340 and the drain pump 360 are both connected to the drain pipeline 350, and the drain valve 340 is used to open and close the drain pipeline 350. When the amount of pure water stored in the waste water tank 330 reaches a preset value, the drain valve 340 opens, and the drain pump 360 extracts the pure water in the waste water tank 330, and transports the pure water to the waste water treatment equipment 380 through the drain pipeline 350 for further treatment. The waste discharge assembly 300 also includes a one-way valve 370, which is connected to the drain pipe 350. The one-way valve 370 is arranged downstream of the wastewater tank 330, the drain valve 340 and the drain pump 360 along the flow direction of the wastewater. The one-way valve 370 is configured to allow the wastewater in the drain pipe 350 to flow unidirectionally toward the wastewater treatment equipment 380, thereby preventing the water flow in the wastewater treatment equipment 380 from flowing back into the wastewater tank 330.

[0047] The air supply device also includes a water replenishment component 400, which includes a water replenishment passage 410. The water storage container 110 has a water inlet 114. One end of the water replenishment passage 410 is used to introduce pure water, and the other end is connected to the water inlet 114. After the pure water in the water storage container 110 is discharged through the waste water discharge passage 310, new pure water is added to the water storage container 110 through the water replenishment passage 410, so that the pure water in the water storage container 110 meets the purity and resistivity requirements.

[0048] The air supply device also includes a water source 420, one end of the water replenishment passage 410 is connected to the water source 420, and the water source 420 provides pure water to the water replenishment passage 410; a water replenishment valve 430 is provided on the water replenishment passage 410, and the water replenishment valve 430 is used to open and close the passage between the water source 420 and the water inlet 114. When a water replenishment operation is required, the water replenishment valve 430 is opened, and the pure water in the water replenishment passage 410 is passed into the water storage container 110 through the water inlet 114. A water inlet pipe 115 is also provided in the water storage container 110, and a water inlet 114 is provided at the top of the water storage container 110. One end of the water inlet pipe 115 is connected to the water inlet 114, and the other end extends to the bottom of the water storage container 110. The outlet at the lower end of the water inlet pipe 115 is a drain outlet of the water inlet pipe 115. During the water vapor generation process, the drain outlet of the water inlet pipe 115 is located below the liquid level of the pure water, and the water vapor is located above the liquid level of the pure water. The discharge of the water vapor is not affected by the water inlet 114, and the pure water can use gravity to flow directly to the bottom of the water storage container 110 through the water inlet pipe 115, thereby saving the number of water supply power components in the air supply device, which is conducive to reducing costs.

[0049] The water replenishment component 400 also includes a resistivity detection element 440, which is connected to the water replenishment passage 410 and is used to detect the resistivity of the pure water in the water replenishment passage 410 to ensure that the resistivity of the pure water entering the water storage container 110 meets the requirements. It can be understood that the water replenishment component 400 also includes a system module, and the resistivity detection element 440 and the water replenishment valve 430 are both connected to the system module for communication. The resistivity detection element 440 transmits the detected resistivity value to the system module, and the system module determines whether the resistivity of the pure water meets the requirements, and then sends an opening or closing instruction to the water replenishment valve 430; for example, when the resistivity is low, the system module sends a closing instruction to the water replenishment valve 430, and the water replenishment passage 410 stops supplying water to the water storage container 110.

[0050] The gas supply assembly 200 further includes a purge gas circuit 205, one end of which is used to connect to the gas source 203, and the other end is used to discharge gas to the reaction chamber 500. When the wet oxygen reaction is not performed in the reaction chamber 500, the gas in the gas source 203 enters the purge gas circuit 205, and passes into the reaction chamber 500 from the purge gas circuit 205 to remove the residual water vapor or other gas in the reaction chamber 500. Alternatively, one end of the purge gas circuit 205 is connected to the first gas circuit 201, and the other end is connected to the second gas circuit 202, so that the gas in the gas source 203 enters the purge gas circuit 205 through a part of the first gas circuit 201, and passes into the reaction chamber 500 through a part of the second gas circuit 202. In this way, the gas in the purge gas circuit 205 can simultaneously remove the residual water vapor and other gas in part of the second gas circuit 202 and the reaction chamber 500. Alternatively, the gas supply assembly 200 further includes a process gas circuit 206, one end of which is used to introduce gas into the reaction chamber 500, and the second gas circuit 202 and the purge gas circuit 205 are both connected to the other end of the process gas circuit 206, and the purge gas circuit 205 is used to introduce gas released from the gas source 203. After the gas in the gas source 203 enters the purge gas circuit 205, it flows to the process gas circuit 206 through the purge gas circuit 205, and then enters the reaction chamber 500, so as to remove the residual water in the process gas circuit 206 and the reaction chamber 500. vapor and other gases; it can be understood that when a wet oxygen reaction is carried out in the reaction chamber 500, the gas entering the water storage container 110 carries water vapor into the second gas path 202, and then passes into the reaction chamber 500 through the process gas path 206. After the wet oxygen reaction stops, there is a possibility that residual water vapor and other gases exist in the process gas path 206. At this time, the first gas path 201 and the second gas path 202 are closed, and the gas is passed into the purge gas path 205 to remove the residual water vapor and other gases in the process gas path 206 and the reaction chamber 500.

[0051] The gas supply assembly 200 also includes a first valve 207 for opening and closing the first gas path 201, a second valve 208 for opening and closing the second gas path 202, and a third valve 209 for opening and closing the purge gas path 205; the gas supply device has a first gas supply state and a second gas supply state. When the gas supply device is in the first gas supply state, the first valve 207 and the second valve 208 are opened, and the third valve 209 is closed. At this time, the gas source 203 supplies gas from the first gas path 201 to the water storage container 110. , the gas carrying water vapor enters the process gas path 206 through the second gas path 202, and finally enters the reaction chamber 500 to participate in the wet oxygen reaction; when the gas supply device is in the second gas supply state, the first valve 207 and the second valve 208 are closed, and the third valve 209 is opened. At this time, the gas source 203 enters the purge gas path 205, and is passed into the process gas path 206 and the reaction chamber 500 through the purge gas path 205 to remove the residual water vapor and other gases in the process gas path 206 and the reaction chamber 500.

[0052] It is understandable that the insulation structure 204 can be wrapped around the outside of the second gas path 202 and the process gas path 206 at the same time, so as to provide insulation measures on the entire path of the gas carrying water vapor flow, further reducing the temperature change during the flow of gas and water vapor.

[0053] The air supply assembly 200 also includes a pressure relief valve 210 and a pressure relief air path 211. The pressure relief air path 211 is connected to the second air path 202. The pressure relief valve 210 is used to open and close the pressure relief air path 211. The pressure relief valve 210 can be opened and closed and the opening can be adjusted to adjust the pressure in the water storage container 110. By relieving the pressure of the water storage container 110 through the pressure relief valve 210, the internal and external pressure difference of the water storage container 110 can be reduced, so that the pressure in the water storage container 110 is within a preset range, thereby avoiding damage to the water storage container 110 due to excessive pressure in the water storage container 110 caused by continuous formation of water vapor in the water storage container 110.

[0054] The utility model also provides a reaction equipment, including the above-mentioned gas supply device, and also includes a reaction chamber 500. The end of the second gas path 202 away from the gas outlet 112 is connected to the reaction chamber 500, so that the gas carrying water vapor is introduced into the reaction chamber 500 to participate in the wet oxygen reaction, thereby reducing the process temperature in the reaction chamber 500, shortening the process time for forming an oxide layer, and being able to increase the service life of devices such as quartz.

[0055] The embodiments of the utility model are described in detail above in conjunction with the accompanying drawings, but the utility model is not limited to the above embodiments. Various changes can be made within the knowledge of ordinary technicians in the relevant technical field without departing from the purpose of the utility model. In addition, the embodiments of the utility model and the features in the embodiments can be combined with each other without conflict.

Claims

1. A gas supply device for a wet oxygen process, characterized in that: include: The water vapor generating assembly comprises a water storage container and a heating element, wherein the water storage container is used to store pure water and receive the heat emitted by the heating element, and the water storage container has an air inlet and an air outlet; The gas supply component includes a first gas circuit and a second gas circuit. One end of the first gas circuit is used to connect to the gas source, and the other end is connected to the gas inlet and can pass gas into the water storage container. One end of the second gas circuit is connected to the gas outlet. The gas entering the water storage container through the gas inlet carries the water vapor above the pure water liquid level and is discharged from the gas outlet.

2. The gas supply device for wet oxygen process according to claim 1, characterized in that: The gas supply assembly further includes a purge gas circuit, one end of which is used to connect to a gas source, and the other end of which is used to discharge gas into the reaction chamber; Alternatively, the gas supply assembly further comprises a purge gas circuit, one end of the purge gas circuit is in communication with the first gas circuit, and the other end of the purge gas circuit is in communication with the second gas circuit; Alternatively, the gas supply assembly further includes a purge gas circuit and a process gas circuit, one end of the process gas circuit is used to introduce gas into the reaction chamber, the second gas circuit and the purge gas circuit are both connected to the other end of the process gas circuit, and the purge gas circuit is used to introduce gas released from a gas source.

3. The gas supply device for wet oxygen process according to claim 2, characterized in that: The gas supply assembly includes a first valve for opening and closing the first gas circuit, a second valve for opening and closing the second gas circuit, and a third valve for opening and closing the purge gas circuit; The gas supply device for the wet oxygen process has a first gas supply state and a second gas supply state. When in the first gas supply state, the first valve and the second valve are opened, and the third valve is closed. When in the second gas supply state, the first valve and the second valve are closed, and the third valve is opened.

4. The gas supply device for wet oxygen process according to claim 1, characterized in that: It also includes a water replenishment component, which includes a water replenishment passage. The water storage container has a water inlet. One end of the water replenishment passage is used to introduce pure water, and the other end is connected to the water inlet and is used to pass pure water into the water storage container.

5. The gas supply device for wet oxygen process according to claim 4, characterized in that: The water replenishment component also includes a resistivity detection element, which is connected to the water replenishment passage and is used to detect the resistivity of pure water in the water replenishment passage.

6. The gas supply device for wet oxygen process according to claim 1, characterized in that: It also includes a waste discharge component, which includes a waste discharge water path. The water storage container has a water outlet, and the water outlet is used to discharge the pure water in the water storage container through the waste discharge water path.

7. The gas supply device for wet oxygen process according to claim 6, characterized in that: The waste discharge component also includes a timer and a waste discharge valve that are communicatively connected. The waste discharge valve is used to open and close the waste discharge waterway. The timer is used to set the opening and closing cycle of the waste discharge valve so that the waste discharge valve is opened and closed regularly.

8. The gas supply device for wet oxygen process according to claim 1, characterized in that: It also includes a temperature control component, which is connected to the water storage container and is configured to maintain the temperature of the water storage container at 60°C-80°C.

9. The gas supply device for wet oxygen process according to claim 1, characterized in that: The air supply component also includes a heat preservation structure, and the heat preservation structure is wrapped around the outside of the second air path.

10. A reaction device, characterized in that: include: The reaction equipment according to any one of claims 1 to 9; The reaction chamber, wherein one end of the second gas path away from the gas outlet is connected to the reaction chamber and is used to pass the gas carrying water vapor into the reaction chamber.

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