Gas inlet system and waste gas treatment equipment

Abstract

The utility model provides an air inlet system and waste gas treatment equipment, the air inlet system comprises an exhaust amplification device, and the exhaust amplification device comprises a main channel penetrating from the first end of the exhaust amplification device to the second end of the exhaust amplification device and used for allowing waste gas to pass through; the first through hole penetrates through the side wall of the exhaust amplifying device and is used for introducing pressure regulating gas; the adjusting channel is arranged in the side wall of the exhaust amplifying device and is communicated with the main channel, the adjusting channel is communicated with the first through hole, and the adjusting channel is arranged to enable the flowing direction of pressure adjusting gas introduced into the first through hole to be adjusted to be consistent with the flowing direction of waste gas in the main channel; the first end of the acceleration pipeline is connected with the second end of the exhaust amplification device in a sealed mode, and the cross section area of the inner side wall of the acceleration pipeline is gradually reduced in the direction from the first end of the acceleration pipeline to the second end of the acceleration pipeline. The gas inlet system and the waste gas treatment equipment are used for preventing backfire.

Description

Technical Field

[0001] The present application relates to the field of semiconductor manufacturing technology, and in particular to an air intake system and exhaust gas treatment equipment used in a semiconductor manufacturing plant. Background Art

[0002] The semiconductor manufacturing process uses process gases of different types and flow rates. These gases are corrosive, highly toxic, flammable and explosive, and cannot be discharged after being treated by the centralized waste gas treatment equipment (center scrubber) in the factory area. This requires a local or regional waste gas treatment equipment (local scrubber or abatement). In the local or regional waste gas treatment equipment, the process waste gas is reduced through chemical reactions and physical adsorption of high-temperature water washing, or the process waste gas is oxidized and then enters the centralized waste gas treatment equipment through the exhaust pipeline for re-treatment before being discharged.

[0003] However, when some flammable and explosive gases (such as H2, SiH4 and other gases) are pumped from the main production chamber through a dry pump and then through connecting pipes to enter the local or regional waste gas treatment equipment for treatment, flashback may occur, causing high temperatures in the connecting pipes, which poses a high safety risk and damages the local or regional waste gas treatment equipment and its connecting pipes, resulting in increased production costs. In order to prevent such incidents, an air intake system for waste gas treatment equipment with an anti-flashback function is needed to reduce the risk of accidents. Utility Model Content

[0004] The purpose of the present application is to provide an air intake system and an exhaust gas treatment device, wherein the air intake system is installed in the exhaust gas treatment device to avoid backfire in the exhaust gas treatment device, thereby reducing the risk of accidents.

[0005] On the one hand, an embodiment of the present application provides an intake system for an exhaust gas treatment device, including: an exhaust amplification device, the exhaust amplification device including: a main channel extending from a first end to a second end of the exhaust amplification device, for passing exhaust gas; a first through hole extending through a side wall of the exhaust amplification device, for introducing a pressure-regulated gas; a regulating channel arranged in the side wall of the exhaust amplification device and extending through the main channel, the regulating channel being conductively connected to the first through hole and being arranged to adjust the flow direction of the pressure-regulated gas introduced into the first through hole to be consistent with the flow direction of the exhaust gas in the main channel; a flow limiting plate, the flow limiting plate being arranged on the regulating channel perpendicular to the main channel; an acceleration line, the first end of the acceleration line being sealed and connected to the second end of the exhaust amplification device, and the cross-sectional area of ​​the inner wall of the acceleration line gradually decreases from the first end to the second end of the acceleration line.

[0006] In some embodiments of the present application, the regulating channel is perpendicular to the first through hole, and is used to adjust the flow direction of the pressure-regulated gas introduced into the first through hole.

[0007] In some embodiments of the present application, the exhaust amplification device includes a first part and a second part, the first part is located at the first end of the exhaust amplification device and is used to pass the pressure-regulated gas, and the first through hole penetrates the side wall of the second part.

[0008] In some embodiments of the present application, the connecting ends of the first part and the second part respectively include a first connecting part and a second connecting part arranged along the circumferential direction, and the first connecting part and the second connecting part are detachably connected via a connecting piece.

[0009] In some embodiments of the present application, the acceleration pipeline is in the shape of a frustum.

[0010] In some embodiments of the present application, the inner diameter of the first end of the accelerating tube is 36 mm to 40 mm, the inner diameter of the second end of the accelerating tube is 10 mm to 14 mm, and the height of the accelerating tube is 40 mm to 50 mm.

[0011] On the other hand, the present application also provides an exhaust gas treatment device, including: the above-mentioned intake system, the first end of the exhaust amplification device is used to introduce exhaust gas; an exhaust gas reaction chamber, which is sealed and connected to the second end of the acceleration pipeline, and is used to treat exhaust gas; a water dissolution system, which is connected to the exhaust port of the exhaust gas reaction chamber, and is used to dissolve the soluble gas discharged from the exhaust gas reaction chamber.

[0012] In some embodiments of the present application, the exhaust gas treatment equipment also includes a central exhaust gas treatment system for treating the gas discharged from the water dissolution system.

[0013] In some embodiments of the present application, the central exhaust gas treatment system is connected to the exhaust port of the water dissolution system through an acid and toxicity exhaust pipe.

[0014] In some embodiments of the present application, the water dissolution system includes a water storage container and a water washing tower connected in sequence.

[0015] In the intake system provided by the embodiments of the present application, regulating gas is introduced through a first through-hole penetrating the side wall of the exhaust amplification device, and the flow direction of the regulating gas introduced into the first through-hole is adjusted to be the same as the flow direction of the exhaust gas in the main channel through an adjustment channel provided in the side wall of the exhaust amplification device and communicating with the main channel, so that the pressure P1 of the exhaust gas introduced into the first end of the exhaust amplification device becomes smaller to P2 (P2 < P1) when passing through the second end of the exhaust amplification device, which plays a role in increasing the flow rate of the exhaust gas in the main channel. Subsequently, after the exhaust gas passes through the acceleration pipeline, the flow rate further increases when flowing out from the second end of the acceleration pipeline, thus achieving the effect of preventing backfire. At the same time, the pressure of the exhaust gas at the second end of the acceleration pipeline also increases to P3, where the value of P3 is basically the same as the value of P1, so that the resistance of the exhaust gas flowing out from the second end of the acceleration pipeline remains almost unchanged, avoiding the situation of poor exhaust of the dry pump, increased power, and increased energy consumption. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] The following drawings detail the exemplary embodiments disclosed in the present application. Wherein the same reference numerals represent similar structures in several views of the drawings. Those of ordinary skill in the art will understand that these embodiments are non-limiting, exemplary embodiments, and the drawings are only for the purpose of illustration and description, and are not intended to limit the scope of the present application. Embodiments in other ways may also achieve the inventive intent of the present application. It should be understood that the drawings are not drawn to scale.

[0017] Wherein:

[0018] Figure 1 is a schematic structural diagram of an exhaust gas treatment system;

[0019] Figure 2 is a schematic structural diagram of an installation of a flow-limiting plate in an exhaust pipe;

[0020] Figure 3 is a three-dimensional structural schematic diagram of the intake system shown in the embodiments of the present application;

[0021] Figure 4 is a sectional schematic diagram of the three-dimensional structure of the intake system shown in the embodiments of the present application;

[0022] Figure 5 is a sectional structural schematic diagram of the intake system shown in the embodiments of the present application;

[0023] Figure 6 is a schematic structural diagram of an exhaust gas treatment device shown in some embodiments of the present application. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0024] The following description provides specific application scenarios and requirements of the present application, aiming to enable those skilled in the art to manufacture and use the content of the present application. For those skilled in the art, various partial modifications to the disclosed embodiments are obvious, and the general principles defined here can be applied to other embodiments and applications without departing from the spirit and scope of the present application. Therefore, the present application is not limited to the disclosed embodiments, but has the broadest scope consistent with the claims.

[0025] Refer to the appended Figure 1 As shown, it is a schematic structural diagram of an exhaust gas treatment system. The exhaust gas treatment equipment includes that the exhaust gas generated in the production chamber 10, such as flammable and explosive H2, SiH4, etc., enters the dry pump 30 through the first pipeline 20, and then enters the exhaust gas treatment equipment 70 through the second pipeline 40 for treatment. After being treated by the exhaust gas treatment equipment 70, it enters the central exhaust gas treatment system 50 through the third pipeline 60. However, there will be a problem of backfire in the exhaust gas treatment equipment of the exhaust gas treatment system, damaging the exhaust gas treatment system 70 and the second pipeline 40, resulting in an increase in production costs.

[0026] To solve the above problems, as Figure 2 shown, a flow-limiting plate 61 can be installed in the exhaust pipeline 60. The flow-limiting plate includes through-holes for gas to pass through. Since the cross-sectional area of the through-holes is smaller than the cross-sectional area of the exhaust pipeline, the flow rate of the exhaust gas increases after passing through the through-holes, so that V2 > V1. By designing the cross-sectional area of the through-holes, the flame flashback speed V3 at the position where flashback is likely to occur at the other end of the exhaust pipeline can be made V3 < V2, thus playing a role in preventing backfire. However, such a design will bring the following problems: when exhausting gas normally through the exhaust pipeline, due to the sudden reduction of the cross-sectional area of the pipeline, the exhaust of the dry pump will be blocked, resulting in an increase in the power of the dry pump and an increase in energy consumption.

[0027] To address the above deficiencies, an embodiment of the present application provides an intake system for an exhaust gas treatment device. The intake system increases the flow rate of the exhaust gas flowing in the main pipeline and reduces the pressure of the exhaust gas by introducing a pressure-regulating gas into the side wall and adjusting the flow direction of the pressure-regulating gas to be the same as that of the main pipeline. Subsequently, the flow rate and pressure of the exhaust gas are increased again through an acceleration pipeline, so that the pressure of the exhaust gas flowing out of the intake system is basically the same as the pressure of the exhaust gas entering the intake system, but the flow rate increases. This not only avoids the occurrence of backfire in the exhaust gas treatment device but also avoids the adverse effects on the dry pump caused by the pressure change in the intake system.

[0028] The technical solution of the present invention will be described in detail below with reference to the embodiments and the drawings.

[0029] Refer to the appended Figure 3 、appended Figure 4 and appended Figure 5 As shown, an embodiment of the present application provides an intake system for an exhaust gas treatment device, comprising:

[0030] The exhaust amplification device 101 comprises:

[0031] A main channel 1011 extending from the first end to the second end of the exhaust amplification device 101 for passing exhaust gas;

[0032] A first through hole 1012 penetrating through the side wall of the exhaust amplification device 101 is used to introduce pressure-regulated gas;

[0033] a regulating channel 1013 disposed in the side wall of the exhaust amplification device 101 and communicating with the main channel, the regulating channel 1013 corresponding to the position of the first through hole 1012 and configured to adjust the flow direction of the pressure regulating gas introduced into the first through hole 1012 to be consistent with the flow direction of the exhaust gas in the main channel 1011;

[0034] The acceleration pipeline 102 has a first end which is sealed to the second end of the exhaust amplification device 101 , and a cross-sectional area of ​​an inner wall of the acceleration pipeline 102 gradually decreases from the first end to the second end of the acceleration pipeline.

[0035] like Figure 4 and Figure 5 As shown, when the exhaust gas enters the main channel 1011 from the first end of the exhaust amplification device 101, the pressure of the exhaust gas at the first end of the exhaust amplification device 101 is set to P1, and the exhaust gas flows from the first end to the second end of the exhaust amplification device 101 along the main channel 1011, wherein the flow direction of the exhaust gas is AA.

[0036] The pressure regulating gas is introduced from the first through hole 1012 that passes through the side wall of the exhaust amplification device, and the flow direction of the pressure regulating gas is BB, wherein the direction BB is perpendicular to the direction AA. In some embodiments of the present application, the pressure regulating gas is, for example, nitrogen. The reason for using nitrogen is that it can directly discharge into the environment without polluting the environment after the exhaust gas is treated while adjusting the flow rate and pressure of the exhaust gas in the main channel. The pressure regulating gas can be introduced into the first through hole 1012 in a high-speed jet state from a high-pressure gas tank or a high-pressure gas supply pipeline, so as to drive the exhaust gas in the main channel to flow from the first end in a high-pressure state to the second end in a low-pressure state.

[0037] In some embodiments of the present application, the exhaust amplification device 101 includes a first portion 101a and a second portion 101b that are conductively connected, the first portion 101b is located at the first end of the exhaust amplification device and is used to pass the pressure-regulated gas, the first portion 101b is located at the second end of the exhaust amplification device, and the first through hole 1012 passes through the side wall of the second portion 101b. The conductive connection refers to the main channel 1011 passing through the interiors of the first portion 101a and the second portion 101b at the same time.

[0038] In some embodiments of the present application, the connection ends of the first part 101a and the second part 101b respectively include a first connection part 1014 and a second connection part 1015 arranged along the circumferential direction, and the first connection part 1014 and the second connection part 1015 are detachably connected by a connection member (not shown in the figure). The connection member is, for example, a bolt. The first connection part 1014 and the second connection part 1015 can also be integrally connected, and the first part 101a and the second part 101b are also integrally connected.

[0039] In the embodiment of the present application, the regulating channel 1013 is arranged in the side wall of the exhaust amplification device and is connected to the main channel. The regulating channel 1013 is connected to the first through hole 1012 and is configured so that the pressure-regulated gas flowing along the BB direction entering the first through hole 1012 flows along the CC direction under the action of the regulating channel 1013, wherein the CC direction is consistent with the flow direction AA of the exhaust gas in the main channel, and then, the pressure-regulated gas flowing along the CC direction merges with the exhaust gas in the main channel and flows out from the second end of the exhaust amplification device 101 together.

[0040] In some embodiments of the present application, the regulating channel 1013 is disposed in the side wall of the second portion 101b of the exhaust amplification device and vertically penetrates the first through hole 1012 to adjust the flow direction of the pressure-regulated gas introduced into the first through hole 1012 .

[0041] The intake system described in the embodiment of the present application further includes an acceleration line 102, the first end of the acceleration line 102 is sealedly connected to the second end of the exhaust amplification device 101, and the cross-sectional area of ​​the inner wall of the acceleration line 102 gradually decreases from the first end of the acceleration line to the second end. The first end of the acceleration line 102 is a connection end connected to the second portion 101b.

[0042] In some embodiments of the present application, the shape of the acceleration pipeline is a frustum of a cone. Wherein, the inner cross-section and the outer cross-section of the acceleration pipeline in the shape of a frustum of a cone can both be in the shape of a frustum of a cone. The inner diameter of the first end of the acceleration pipeline is, for example, 36 mm to 40 mm, the inner diameter of the second end of the acceleration pipeline is, for example, 10 mm to 14 mm, and the height range of the frustum of the cone is, for example, 40 mm to 50 mm.

[0043] With the above settings, when the mixture of waste gas and pressure-regulating gas enters the first end of the acceleration pipeline, the pressure is P2. After passing through the frustum-of-a-cone-shaped acceleration pipeline, due to the uniform reduction of the inner diameter of the acceleration pipeline, the pressure of the mixture of waste gas and pressure-regulating gas changes to P3 when it enters the second end of the acceleration pipeline, and the value of P3 is close to the value of P1. At the same time, the flow rate of the mixture of waste gas and pressure-regulating gas also further increases. On the one hand, it plays a role in preventing backfire. On the other hand, the resistance of the gas discharged from the second end of the acceleration pipeline is basically unchanged, so that the entropy of the dry pump is basically not disturbed and the energy consumption is also basically kept unchanged.

[0044] The intake system provided by the embodiments of the present application passes the pressure-regulating gas through the first through hole penetrating the side wall of the exhaust amplification device, and adjusts the flow direction of the pressure-regulating gas introduced into the first through hole to be the same as the flow direction of the waste gas in the main channel through the adjustment channel provided in the side wall of the exhaust amplification device and communicating with the main channel, so that the pressure P1 of the waste gas introduced into the first end of the exhaust amplification device becomes smaller to P2 (P2 < P1) when passing through the second end of the exhaust amplification device, which plays a role in increasing the flow rate of the waste gas in the main channel. Subsequently, after the waste gas passes through the acceleration pipeline, the flow rate further increases when flowing out from the second end of the acceleration pipeline, so as to achieve the effect of preventing backfire. At the same time, the pressure of the waste gas at the second end of the acceleration pipeline also increases to P3, where the value of P3 is basically the same as the value of P1, so that the resistance of the waste gas flowing out from the second end of the acceleration pipeline is almost unchanged, avoiding the situation of poor exhaust of the dry pump, increased power, and increased energy consumption.

[0045] Refer to the attached Figure 6 As shown, on the other hand, the present application further provides a waste gas treatment device, including: the above-mentioned intake system 210, the first end of the exhaust amplification device is used for introducing waste gas; a waste gas reaction chamber 220, which is hermetically connected to the second end of the acceleration pipeline and is used for treating waste gas; a water dissolution system, which is connected to the exhaust port of the waste gas reaction chamber and is used for dissolving the soluble gas discharged from the waste gas reaction chamber. In some embodiments of the present application, the water dissolution system includes a water storage container 230 and a water washing tower 240 connected in sequence. In some embodiments of the present application, the waste gas treatment device further includes a central waste gas treatment system 260 for treating the gas discharged from the water dissolution system.

[0046] In some embodiments of the present application, the central exhaust gas treatment system 260 is connected to the exhaust port of the water dissolution system through an acid and poison exhaust pipe 250.

[0047] The waste gas generated in the production chamber, such as flammable and explosive H2, SiH4, etc., enters the dry pump and then passes through the exhaust pipe 200 to enter the waste gas treatment system described in the embodiment of the present application, wherein the exhaust pipe is connected to the first end of the exhaust amplification device of the intake system 210. After the waste gas is treated by the intake system, the waste gas is discharged from the intake system at a higher flow rate and basically the same pressure value, and enters the waste gas reaction chamber 220. Chemical reactions such as combustion occur in the waste gas reaction chamber, wherein the flammable and toxic waste gas is treated and enters the water-soluble system. The water-soluble system is used to convert the water-soluble gas generated in the waste reaction chamber into an aqueous solution and then discharge it. Among them, the water-soluble gas generated in the waste reaction chamber first passes through the water storage container 230, and some of the gas that is not completely dissolved is discharged from the water storage container and enters the water washing tower 240 to further clean the combustion waste discharged from the waste gas reaction chamber 220, such as dust and substances that can be dissolved in water. After passing through the water washing tower 240, it enters the central waste gas treatment system 260 through the acid exhaust pipe 250 for subsequent treatment.

[0048] It should be noted that different embodiments may produce different beneficial effects. In different embodiments, the beneficial effects that may be produced may be any one or a combination of the above, or any other beneficial effects that may be obtained.

[0049] The basic concepts have been described above. Obviously, for those skilled in the art, the above detailed disclosure is only for example and does not constitute a limitation of this specification. Although not explicitly stated here, those skilled in the art may make various modifications, improvements and corrections to this application. Such modifications, improvements and corrections are suggested in this specification, so such modifications, improvements and corrections still belong to the spirit and scope of the exemplary embodiments of this application.

[0050] It should be noted that in the description of this application, unless otherwise clearly specified and limited, the terms "install", "connect", "connect", and "fix" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a rotating connection or a sliding connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood in combination with specific circumstances.

[0051] In addition, when terms such as "first", "second", and "third" are used in the specification of this application to describe various features, these terms are only used to distinguish these features and cannot be understood as indicating or implying the relationship between the features, the relative importance, or implicitly indicating the number of features indicated.

[0052] In addition, the present specification describes exemplary embodiments by reference to idealized exemplary cross-sectional views and / or plan views and / or stereograms. Therefore, differences from the illustrated shapes due to, for example, manufacturing techniques and / or tolerances are foreseeable. Therefore, the exemplary embodiments should not be interpreted as being limited to the shapes of the regions shown herein, but should include deviations in shapes caused by, for example, manufacturing. Therefore, the regions shown in the figures are schematic in nature, and their shapes are not intended to illustrate the actual shapes of the regions of the device nor to limit the scope of the exemplary embodiments.

[0053] At the same time, the present application uses specific words to describe the embodiments of this specification. For example, "one embodiment", "an embodiment", and / or "some embodiments" refer to a certain feature, structure or characteristic related to at least one embodiment of the present application. Therefore, it should be emphasized and noted that "one embodiment" or "an embodiment" or "an alternative embodiment" mentioned twice or more in different positions in the present application does not necessarily refer to the same embodiment. In addition, some features, structures or characteristics in one or more embodiments of the present application can be appropriately combined.

[0054] Similarly, it should be noted that in order to simplify the description of the disclosure of this application and thus help understand one or more embodiments of the invention, in the above description of the embodiments of this application, multiple features are sometimes combined into one embodiment, figure or description thereof. However, this disclosure method does not mean that the features required by the object of this application are more than the features mentioned in the claims. In fact, the features of the embodiments are less than all the features of the single embodiment disclosed above.

[0055] Finally, it should be understood that the embodiments described in this application are only used to illustrate the principles of the embodiments of the present application. Other variations may also fall within the scope of the present application. Therefore, as an example and not a limitation, the alternative configurations of the embodiments of the present application may be considered to be consistent with the teachings of the present application. Accordingly, the embodiments of the present application are not limited to the embodiments explicitly introduced and described in the present application.

Claims

1. An air intake system for an exhaust gas treatment device, characterized in that: The intake system comprises: an exhaust amplification device, the exhaust amplification device comprising: A main passage extending from the first end to the second end of the exhaust amplification device, for passing exhaust gas; A first through hole penetrating through the side wall of the exhaust amplification device is used to introduce pressure-regulated gas; a regulating channel provided in the side wall of the exhaust amplification device and communicating with the main channel, the regulating channel being communicated with the first through hole and being configured to adjust the flow direction of the pressure regulating gas introduced into the first through hole to be consistent with the flow direction of the exhaust gas in the main channel; An acceleration pipeline, wherein a first end of the acceleration pipeline is sealedly connected to a second end of the exhaust amplification device, and a cross-sectional area of ​​an inner wall of the acceleration pipeline gradually decreases from the first end to the second end of the acceleration pipeline.

2. The air intake system according to claim 1, characterized in that: The regulating channel is perpendicular to the first through hole.

3. The air intake system according to claim 1, characterized in that: The exhaust amplification device comprises a first part and a second part. The first part is located at a first end of the exhaust amplification device and is used for introducing pressure-regulated gas. The first through hole penetrates a side wall of the second part.

4. The air intake system according to claim 3, characterized in that: The connecting ends of the first part and the second part respectively include a first connecting part and a second connecting part arranged along the circumferential direction, and the first connecting part and the second connecting part are detachably connected via a connecting piece.

5. The air intake system according to claim 1, characterized in that: The accelerating pipeline is in the shape of a truncated cone.

6. The air intake system according to claim 5, characterized in that: The inner diameter of the first end of the accelerating pipeline is 36 mm to 40 mm, the inner diameter of the second end of the accelerating pipeline is 10 mm to 14 mm, and the height of the accelerating pipeline is 40 mm to 50 mm.

7. A waste gas treatment device, characterized in that: include: The air intake system according to any one of claims 1 to 6, wherein the first end of the exhaust amplification device is used to introduce exhaust gas; An exhaust gas reaction chamber, sealed and connected to the second end of the accelerating pipeline, for treating the exhaust gas; The water dissolution system is connected to the exhaust port of the exhaust gas reaction chamber and is used to dissolve the soluble gas discharged from the exhaust gas reaction chamber.

8. The exhaust gas treatment equipment according to claim 7, characterized in that: It also includes a central exhaust gas treatment system for treating the gas discharged from the water dissolution system.

9. The exhaust gas treatment equipment according to claim 8, characterized in that: The central exhaust gas treatment system is connected to the exhaust port of the water dissolution system through an acid and poison exhaust pipe.

10. The exhaust gas treatment equipment according to claim 7, characterized in that: The water dissolution system comprises a water storage container and a water washing tower which are connected in sequence.

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