Evaporation tank structure of liquid source and deposition equipment

Abstract

The utility model discloses an evaporation tank structure of a liquid source and deposition equipment. The evaporation tank structure comprises an evaporation tank, a liquid chemical source is stored in the evaporation tank, the evaporation tank comprises a double-layer tank wall, a second layer wall is arranged on the outer side of a first layer wall, and the second layer wall is an aluminum layer; the heating element is arranged at the bottom of the evaporation tank and is used for heating the liquid chemical source; and the ultrasonic generator is used for providing ultrasonic waves to promote the vaporization rate of the liquid chemical source. Through the evaporation tank structure, the complexity of a heating system can be reduced, uniform heating and effective heat preservation of multiple areas of the bottom and the side face of the evaporation tank are achieved, and the temperature control stability of the evaporation tank is improved, so that the evaporation speed of a liquid chemical source in the evaporation tank can be increased, and the partial pressure of chemical source gas in mixed gas is increased; furthermore, the introduction time of the chemical source and the deposition circulation duration are shortened, and the productivity of equipment is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor processing, and in particular to an evaporation tank structure of a liquid source and a deposition device. Background Art

[0002] Due to the limitation of the principle, the thin film growth rate of the atomic layer deposition (ALD) system is very slow compared with the chemical vapor deposition (CVD) system. Therefore, under the premise of ensuring that the film performance parameters meet the required specifications, the growth rate per cycle (GPC) and cycle time are the most critical parameters for measuring the performance of an ALD system, which will directly affect the equipment's production capacity, the customer's business operations and factory equipment configuration.

[0003] ALD is a thin film deposition device developed based on the principle of saturated adsorption. The main factors affecting the growth rate and cycle duration of a single cycle are the dosing speed of the liquid chemical source and the purging efficiency of the reaction chamber. The purging efficiency of the reaction chamber is closely related to the structural design of the chamber. Insufficient purging will lead to obvious CVD reaction, which will cause the film performance to fail to meet the required specifications. However, excessive purging will result in the inability to form a perfect chemical source monolayer adsorption layer on the wafer surface, which will affect GPC. The requirement for the introduction of the liquid chemical source is to deliver a specific dose of the chemical source into the reaction chamber in the shortest possible time and form an adsorption layer on the wafer surface.

[0004] The dosage requirement for the liquid chemical source in a single cycle of ALD is not large, but the requirements for the speed and stability of the introduction are very high. The industry generally uses an evaporator with certain temperature control requirements to achieve the conversion of the chemical source from liquid to gas, and then the carrier gas flowing through the evaporator intermittently carries the chemical source vapor out of the evaporator and finally reaches the reaction chamber. Therefore, the temperature control and stability of each part of the liquid source evaporator have a direct impact on the evaporation and repeatability of the liquid source. At present, the commonly used temperature control of the evaporator is mainly based on the design of the heating system, such as improving the stability and repeatability of the heating jacket, and introducing a strategy of multi-zone independent heating, which will increase the complexity of the heating system.

[0005] In order to solve the above-mentioned problems existing in the prior art, the art urgently needs an improved liquid source evaporator structure, which can reduce the complexity of the heating system, achieve uniform heating and effective insulation of multiple areas on the bottom and sides of the evaporator, and improve the temperature control stability of the evaporator, thereby accelerating the evaporation rate of the liquid chemical source in the evaporator, increasing the partial pressure of the chemical source gas in the mixed gas, and thereby shortening the introduction time of the chemical source and the deposition cycle time, thereby improving the production capacity of the equipment. Utility Model Content

[0006] A brief summary of one or more aspects is given below to provide a basic understanding of these aspects. This summary is not an exhaustive overview of all conceived aspects, and is neither intended to identify the key or decisive elements of all aspects nor to define the scope of any or all aspects. Its only purpose is to give some concepts of one or more aspects in a simplified form as a prelude to a more detailed description that will be given later.

[0007] In order to overcome the above-mentioned defects in the prior art, the utility model provides an evaporation tank structure of a liquid source, and a deposition device, which can reduce the complexity of the heating system, realize uniform heating and effective heat preservation of multiple areas on the bottom and sides of the evaporation tank, and improve the temperature control stability of the evaporation tank, thereby accelerating the evaporation rate of the liquid chemical source in the evaporation tank, increasing the partial pressure of the chemical source gas in the mixed gas, thereby shortening the introduction time of the chemical source and the deposition cycle time, and improving the production capacity of the equipment.

[0008] Specifically, the evaporation tank structure of the liquid source provided according to the first aspect of the utility model includes: an evaporation tank, in which the liquid chemical source is stored, the evaporation tank includes a double-layer tank wall, the second layer wall is arranged on the outside of the first layer wall, and the second layer wall is an aluminum layer; a heating element is arranged at the bottom of the evaporation tank to heat the liquid chemical source; and an ultrasonic generator is used to provide ultrasonic waves to promote the vaporization rate of the liquid chemical source.

[0009] Furthermore, in some embodiments of the present invention, the second layer of wall at least covers the side wall and the bottom of the evaporation tank.

[0010] Furthermore, in some embodiments of the present invention, the first wall layer is a stainless steel layer.

[0011] Furthermore, in some embodiments of the present invention, the evaporation tank structure further includes: a heat-insulating layer, which is arranged on the outside of the second layer wall and covers the outer side walls and top of the evaporation tank.

[0012] Furthermore, in some embodiments of the present invention, the evaporation tank structure also includes: a first inlet and a first outlet, the first inlet is connected to a carrier gas source to provide a carrier gas into the evaporation tank, and the first outlet is connected to a reaction chamber to send the vapor of the liquid chemical source carried by the carrier gas to the reaction chamber.

[0013] Furthermore, in some embodiments of the present invention, the evaporation tank structure further includes: a liquid level meter, one end of which extends into the interior of the evaporation tank to obtain the liquid level of the liquid chemical source in the evaporation tank.

[0014] Furthermore, in some embodiments of the present invention, the evaporation tank structure further includes: a second interface for replenishing the liquid chemical source into the evaporation tank.

[0015] Furthermore, in some embodiments of the present invention, the ultrasonic generator is disposed at the bottom center of the evaporation tank.

[0016] Furthermore, in some embodiments of the present invention, a plurality of the ultrasonic generators are formed into an array to provide an ultrasonic array to the liquid chemical source in the evaporation tank above the ultrasonic generator.

[0017] In addition, the above-mentioned deposition equipment provided according to the second aspect of the utility model includes: a reaction chamber, the interior of which is used to perform a deposition process; and the above-mentioned liquid source evaporation tank structure provided by the first aspect of the utility model, which is used to provide vapor of the liquid chemical source into the reaction chamber to perform a deposition process. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The above features and advantages of the present invention can be better understood after reading the detailed description of the embodiments of the present disclosure in conjunction with the following drawings. In the drawings, the components are not necessarily drawn to scale, and components with similar related properties or features may have the same or similar reference numerals.

[0019] Figure 1 A schematic structural diagram showing an evaporation tank structure of a liquid source provided according to some embodiments of the utility model; and

[0020] Figure 2 A side cross-sectional view of an evaporation tank of a liquid source provided according to some embodiments of the utility model is shown.

[0021] Reference numerals:

[0022] 100 Liquid source evaporation tank structure;

[0023] 110 evaporation tank;

[0024] 111 First wall;

[0025] 112 Second wall;

[0026] 113 Insulation layer;

[0027] 120 Heating element;

[0028] 140 First Entrance;

[0029] 141 First Exit;

[0030] 142 second interface;

[0031] 150 Ultrasonic generator;

[0032] 160 Level gauges; and

[0033] 170 Liquid chemical sources. DETAILED DESCRIPTION

[0034] The following specific embodiments illustrate the implementation of the present invention. Those skilled in the art can easily understand other advantages and functions of the present invention from the contents disclosed in this specification. Although the description of the present invention will be introduced in conjunction with the preferred embodiment, this does not mean that the features of this utility model are limited to this implementation. On the contrary, the purpose of introducing the utility model in conjunction with the implementation is to cover other options or modifications that may be extended based on the claims of the present utility model. In order to provide an in-depth understanding of the present utility model, the following description will include many specific details. The present utility model can also be implemented without using these details. In addition, in order to avoid confusion or blurring the focus of the present utility model, some specific details will be omitted in the description.

[0035] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installation", "connection" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0036] In addition, the terms "upper", "lower", "left", "right", "top", "bottom", "horizontal" and "vertical" used in the following description should be understood as the directions shown in the paragraph and the related drawings. Such relative terms are only used for the convenience of description and do not mean that the device described therein must be manufactured or operated in a specific direction, and therefore should not be understood as limiting the present invention.

[0037] It is understood that although the terms "first", "second", "third", etc. may be used herein to describe various components, regions, layers and / or parts, these components, regions, layers and / or parts should not be limited by these terms, and these terms are only used to distinguish different components, regions, layers and / or parts. Therefore, the first component, region, layer and / or part discussed below may be referred to as the second component, region, layer and / or part without departing from some embodiments of the present invention.

[0038] As mentioned above, the dosage requirement for the liquid chemical source in a single cycle of ALD is not large, but the requirements for the introduction speed and stability are very high. The industry generally uses an evaporator with certain temperature control requirements to achieve the conversion of the chemical source from liquid to gas, and then the carrier gas flowing through the evaporator intermittently carries the chemical source vapor out of the evaporator and finally reaches the reaction chamber. Therefore, the temperature control and stability of each part of the liquid source evaporator have a direct impact on the evaporation and repeatability of the liquid source. At present, the commonly used temperature control of the evaporator is mainly based on the design of the heating system, such as improving the stability and repeatability of the heating jacket, and introducing a strategy of multi-zone independent heating, which will increase the complexity of the heating system.

[0039] In order to solve the above-mentioned problems existing in the prior art, the utility model provides an evaporation tank structure of a liquid source, and a deposition device, which can reduce the complexity of the heating system, realize uniform heating and effective heat preservation of multiple areas at the bottom and sides of the evaporation tank, and improve the temperature control stability of the evaporation tank, thereby accelerating the evaporation rate of the liquid chemical source in the evaporation tank, increasing the partial pressure of the chemical source gas in the mixed gas, thereby shortening the introduction time of the chemical source and the deposition cycle time, and improving the production capacity of the equipment.

[0040] In some non-limiting embodiments, the evaporation tank structure of the liquid source provided by the first aspect of the present invention may be configured in the deposition device provided by the second aspect of the present invention.

[0041] The working principle of the above-mentioned deposition device will be described below in conjunction with some embodiments of the evaporation tank structure of the liquid source. Those skilled in the art will understand that the embodiments of the evaporation tank structure of the liquid source are only some non-limiting implementation methods provided by the utility model, which are intended to clearly demonstrate the main concept of the utility model and provide some specific solutions that are convenient for the public to implement, rather than to limit all working modes or all functions of the deposition device. Similarly, the deposition device is also only a non-limiting implementation method provided by the utility model, and does not constitute a limitation on the configuration subject of the evaporation tank structure of the liquid source.

[0042] First, see Figure 1 , Figure 1A schematic structural diagram of an evaporation tank structure of a liquid source provided according to some embodiments of the utility model is shown.

[0043] like Figure 1 As shown, in some embodiments of the present invention, the evaporation tank structure 100 of the liquid source may include an evaporation tank 110, in which the liquid chemical source is stored. A first inlet 140 and a first outlet 141 may be provided at the upper end of the evaporation tank 110. The first inlet 140 may be connected to a carrier gas source (not shown in the drawings) to provide a carrier gas into the evaporation tank 110. The first outlet 141 may be connected to a reaction chamber (not shown in the drawings) to send the vapor of the liquid chemical source carried by the carrier gas to the reaction chamber to perform a deposition process in the reaction chamber.

[0044] Furthermore, if Figure 1 As shown, in some embodiments of the present invention, the evaporation tank structure 100 of the liquid source may further include a liquid level meter 160. One end of the liquid level meter 160 may extend into the interior of the evaporation tank 110 to obtain the liquid level of the liquid chemical source in the evaporation tank 110. Specifically, when the liquid chemical source consumed by the deposition process in the reaction chamber reaches a certain amount, the liquid level of the liquid chemical source in the evaporation tank 110 decreases, and the liquid level of the liquid chemical source in the evaporation tank 110 may be obtained in real time through the liquid level meter 160, so as to perform subsequent processing such as alarm reminder or timely liquid replenishment of the liquid level change of the liquid chemical source in the evaporation tank 110.

[0045] Furthermore, in some preferred embodiments, the upper end of the evaporation tank structure 100 of the liquid source may include a second interface 142, which can replenish the liquid chemical source into the evaporation tank 110 in time after the liquid level of the liquid chemical source in the evaporation tank 110 is lower than the standard liquid level, thereby maintaining the stability of the deposition process in the reaction chamber.

[0046] Next, see Figure 2 , Figure 2 A side cross-sectional view of an evaporation tank of a liquid source provided according to some embodiments of the utility model is shown.

[0047] like Figure 2 As shown, in some embodiments of the present invention, the evaporation tank 110 may include a double-layer tank wall. The inner side of the evaporation tank 110 is a first layer wall 111, which is in direct contact with the liquid chemical source 170 inside. Optionally, the first layer wall 111 may be made of stainless steel. Stainless steel is rust-proof and can withstand weak corrosive media such as air, steam, and water.

[0048] Furthermore, since the thermal conductivity of the first layer wall 111 made of stainless steel is relatively poor, the second layer wall 112 can be sleeved on the outside of the first layer wall 111, and the second layer wall 112 can be made of aluminum material to form an aluminum layer. In some preferred embodiments of the utility model, aluminum is the most suitable material, which not only has high thermal conductivity but also is easy to shape. Optionally, in some other embodiments, materials with high thermal conductivity such as graphite or copper can also be used as the second layer wall 112. However, in comparison, copper is not recommended as the second layer wall 112 because the copper second layer wall 112 is prone to metal contamination.

[0049] In some preferred embodiments of the present invention, the aluminum layer of the second wall 112 can be made of pure aluminum as much as possible to ensure that its thermal conductivity is high enough. In addition, the thickness of the aluminum layer of the second wall 112 located on the side wall and the bottom of the evaporator 110 can be the same, for example, 3 to 4 mm. In order to ensure that the thermal conductivity of the second wall 112 is significant enough, the thickness of the second wall 112 is generally not less than 2 mm, and the height of the second wall 112 on the side preferably covers more than 80% to 90% of the height of the side.

[0050] The liquid source evaporation tank structure 100 further includes a heating element 120. The heating element 120 may be disposed at the bottom of the evaporation tank to heat the liquid chemical source 170 inside the evaporation tank 110. In this embodiment, by covering the outer side of the stainless steel first wall 111 with an aluminum second wall 112 and cooperating with a single-zone heating element 120, a multi-zone heating temperature control effect may be achieved.

[0051] The evaporation temperature of the liquid chemical source in the evaporation tank 110 is generally selected depending on the type of chemical. The evaporation temperature of conventional chemicals is between 40° C. and 90° C. Therefore, the liquid chemical source in the evaporation tank 110 can be maintained between 40° C. and 90° C. by the heating element 120 to evaporate and vaporize it.

[0052] In some preferred embodiments, the second wall 112 may at least cover the side wall and the bottom of the evaporation tank 110. By utilizing the high thermal conductivity of aluminum, the bottom of the evaporation tank 110 may be heated uniformly, and the side of the evaporation tank 110 may be provided with a more effective heat preservation effect, thereby reducing the complexity of the heating system.

[0053] Furthermore, the liquid source evaporator structure 100 may further include an insulation layer 113. The insulation layer 113 may be disposed outside the second wall 112, covering the outer sidewall and top of the evaporator 110, thereby improving the insulation effect of the heated liquid chemical source 170 in the evaporator 110.

[0054] Optionally, in some embodiments, a thermocouple (TC) may be further included in the evaporation tank structure 100 of the liquid source. One end of the thermocouple may extend into the interior of the evaporation tank 110 to detect the temperature of the tank body of the evaporation tank 110 and the liquid of the liquid chemical source therein, and may also cooperate with a temperature controller to control the power output of the heating element 120 to ensure the temperature stability of the liquid chemical source in the evaporation tank 110.

[0055] Continue as Figure 2 As shown, since the time requirement for the dosing of the liquid chemical source of ALD is very short, generally between 0.25 seconds and 0.35 seconds, it is necessary that a sufficient amount of gaseous molecules can be successfully transported to the reaction chamber by the carrier gas. At the same time, in the time other than the dosing of the liquid chemical source, the liquid chemical source 170 in the evaporator 110 needs to be vaporized in a very short time to replenish the gaseous chemical source and wait for the next dosing of the gaseous chemical source. Therefore, the evaporator structure 100 of the liquid source may also include an ultrasonic generator 150. The ultrasonic generator 150 may provide ultrasonic waves to promote the vaporization rate of the liquid chemical source 170 in the evaporator 110. Furthermore, the ultrasonic generator 150 may preferably be arranged at the bottom center of the evaporator 110 to ensure symmetrical scattering of ultrasound, which is beneficial to reduce the reflection of ultrasound by the side wall, thereby more conducive to ensuring the stability of liquid tension. As shown in FIG. Figure 2 As shown, in the evaporation tank 110 , there is a gas space above the liquid chemical source 170 , which stores the steam of the liquid chemical source 170 after evaporation of the liquid chemical source 170 , that is, the gaseous chemical source.

[0056] Optionally, in some embodiments, a plurality of ultrasonic generators 150 may be combined and formed into an array to provide an ultrasonic array to the liquid chemical source 170 in the evaporation tank 110 above the ultrasonic generator 150 to increase the vaporization rate of the liquid chemical source 170 .

[0057] So far, the above-mentioned evaporation tank structure 100 of the liquid source provided in the first aspect of the utility model has been introduced. In another aspect of the utility model, a deposition device is also provided. The deposition device may include: a reaction chamber, the interior of which may be used for a deposition process; and the above-mentioned evaporation tank structure 100 of the liquid source, which may be used to provide vapor of the liquid chemical source into the reaction chamber for a deposition process, thereby improving the stability and repeatability of the dosage of the liquid chemical source introduced.

[0058] In summary, the utility model provides an evaporation tank structure of a liquid source, and a deposition device, which can reduce the complexity of the heating system, achieve uniform heating and effective heat preservation of multiple areas on the bottom and sides of the evaporation tank, and improve the temperature control stability of the evaporation tank, thereby accelerating the evaporation rate of the liquid chemical source in the evaporation tank, increasing the partial pressure of the chemical source gas in the mixed gas, and thereby shortening the introduction time of the chemical source and the deposition cycle time, thereby improving the production capacity of the equipment.

[0059] The previous description of the disclosure is provided to enable any person skilled in the art to make or use the disclosure. Various modifications to the disclosure will be apparent to those skilled in the art, and the general principles defined herein may be applied to other variations without departing from the spirit or scope of the disclosure. Thus, the disclosure is not intended to be limited to the examples and designs described herein, but should be granted the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A liquid source evaporation tank structure, characterized in that: include: An evaporation tank storing a liquid chemical source therein, the evaporation tank comprising a double-layer tank wall, wherein the second layer of the wall is arranged outside the first layer of the wall, and the second layer of the wall is an aluminum layer; A heating element, disposed at the bottom of the evaporation tank, for heating the liquid chemical source; as well as An ultrasonic generator is used to provide ultrasonic waves to accelerate the vaporization rate of the liquid chemical source.

2. The evaporation tank structure according to claim 1, characterized in that: The second wall at least covers the side wall and the bottom of the evaporation tank.

3. The evaporation tank structure according to claim 1, characterized in that: The first wall layer is a stainless steel layer.

4. The evaporation tank structure according to claim 1, characterized in that: Also includes: The heat-insulating layer is arranged on the outer side of the second wall and covers the outer side wall and the top of the evaporating tank.

5. The evaporation tank structure according to claim 1, characterized in that: Also includes: A first inlet and a first outlet, wherein the first inlet is connected to a carrier gas source to provide carrier gas to the evaporation tank, and the first outlet is connected to a reaction chamber to send the vapor of the liquid chemical source carried by the carrier gas to the reaction chamber.

6. The evaporation tank structure according to claim 1, characterized in that: Also includes: A liquid level meter, one end of which extends into the interior of the evaporation tank, is used to obtain the liquid level of the liquid chemical source in the evaporation tank.

7. The evaporation tank structure according to claim 6, characterized in that: Also includes: The second interface is used to replenish the liquid chemical source into the evaporation tank.

8. The evaporation tank structure according to claim 1, characterized in that: The ultrasonic generator is arranged at the bottom center of the evaporation tank.

9. The evaporation tank structure according to claim 8, characterized in that: The plurality of ultrasonic generators are formed into an array to provide an ultrasonic array to the liquid chemical source in the evaporation tank above the ultrasonic generators.

10. A deposition device, characterized in that: include: A reaction chamber, the interior of which is used for performing a deposition process; and The evaporation tank structure of the liquid source according to any one of claims 1 to 9 is used to provide vapor of the liquid chemical source into the reaction chamber to perform a deposition process.

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