Ultraviolet purification device and immersion lithography machine

Abstract

The utility model provides an ultraviolet purification device. The ultraviolet purification device comprises a base; the first shell is arranged on the base, and the first shell can reflect ultraviolet light; the plurality of ultraviolet light source groups are arranged on the inner wall of the first shell and are used for emitting ultraviolet light; the liquid conveying pipeline is located in the first shell, arranged around the axis of the first shell and used for conveying liquid to be purified. The utility model further provides the immersion type photoetching machine. According to the ultraviolet purification device and the immersion photoetching machine provided by the invention, the immersion liquid can be efficiently purified, and the temperature of the immersion liquid can be prevented from being influenced in the evolution process.

Description

Technical Field

[0001] The present application relates to the field of semiconductor manufacturing technology, and in particular to an ultraviolet purification device and an immersion photolithography machine. Background Art

[0002] Immersion lithography is based on traditional dry lithography technology. A layer of immersion liquid is filled between the lower surface of the projection lens and the photoresist on the silicon wafer to increase the refractive index of the entire optical path. Ultrapure water is usually used as the immersion liquid. The purity and temperature changes of ultrapure water will directly lead to exposure defects, thereby reducing the yield rate of integrated circuits.

[0003] Therefore, before entering the lithography equipment, the immersion liquid will pass through the process water cooling system (PCW Chiller) and the ultrapure water preparation system (PWS) in order to cool and purify the immersion liquid. Among them, the ultrapure water preparation system needs to perform ultraviolet irradiation on the immersion liquid through an ultraviolet purification device in addition to degassing and deionizing the immersion liquid, so as to sterilize and disinfect the immersion liquid.

[0004] The ultraviolet light source in the ultraviolet purification device is usually an ultraviolet (UV) mercury lamp. The purification efficiency of ultraviolet mercury lamp is low. This is because the spectrum of ultraviolet mercury lamp is relatively wide, and the ultraviolet spectrum segment that plays an effective role only occupies a small part of the spectrum of ultraviolet mercury lamp, while a considerable part of the spectrum of ultraviolet mercury lamp is in the visible light segment (stray light) and infrared spectrum segment. Among them, the infrared spectrum segment will generate heat, affecting the temperature of the immersion liquid, thereby affecting the yield of photolithography. In addition, ultraviolet mercury lamps are easily damaged, causing mercury vapor to volatilize, which in turn contaminates the ultraviolet purification device and ultrapure water preparation system.

[0005] Therefore, there is a need for an ultraviolet purification device that can efficiently purify the immersion liquid while preventing the temperature of the immersion liquid from affecting the yield of photolithography. Utility Model Content

[0006] The purpose of the present application is to provide an ultraviolet purification device and an immersion photolithography machine, which can efficiently purify the immersion liquid while preventing the evolution process from affecting the temperature of the immersion liquid.

[0007] In a first aspect, an embodiment of the present application provides an ultraviolet purification device, comprising: a base; a first shell, arranged on the base, the first shell being capable of reflecting ultraviolet light; a plurality of ultraviolet light source groups, the plurality of ultraviolet light source groups being arranged on the inner wall of the first shell for emitting ultraviolet light; and an infusion pipeline, located inside the first shell and arranged around the axis of the first shell for conveying a liquid to be purified.

[0008] In some embodiments, the ultraviolet light sources in the plurality of ultraviolet light source groups are ultraviolet light emitting diodes.

[0009] In some embodiments, the multiple ultraviolet light source groups are equidistantly distributed along the axial direction of the first shell, and the ratio of the spacing between adjacent ultraviolet light source groups along the axial direction of the first shell to the distance from the ultraviolet light source to the tangent line of the outer surface of the infusion pipeline is less than or equal to 2√3.

[0010] In some embodiments, any one of the plurality of ultraviolet light source groups includes a plurality of ultraviolet light sources, and the plurality of ultraviolet light sources are distributed in the same circular cross-section of the first shell and are symmetrically distributed about the center of the circular cross-section.

[0011] In some embodiments, the number of the plurality of ultraviolet light sources is three, and the outer surface of the infusion pipeline is tangent to a line connecting the at least three ultraviolet light sources.

[0012] In some embodiments, the infusion line is a cylindrical spiral line.

[0013] In some embodiments, the first shell is cylindrical, and an outer surface of the first shell is configured to diffusely reflect the ultraviolet light.

[0014] In some embodiments, the outer surface of the first shell further includes a diffuse reflective coating.

[0015] In some embodiments, the ultraviolet purification device further includes a second shell, which is disposed on the base and outside the first shell and is capable of shielding ultraviolet light.

[0016] In some embodiments, the peripheral wall of the second shell is provided with a first through hole and a second through hole penetrating the peripheral wall, the first through hole being used to allow the first end of the infusion pipeline to pass through the second shell, and the second through hole being used to allow the second end of the infusion pipeline to pass through the second shell.

[0017] The beneficial effects of the ultraviolet purification device provided in the embodiments of the present application include but are not limited to the following:

[0018] The ultraviolet device provided in the embodiment of the present application includes a second shell that can shield ultraviolet light, a first shell that is arranged inside the second shell and can reflect ultraviolet light, and an infusion pipeline that is located inside the first shell and is arranged around the axis of the first shell for conveying the liquid to be purified. The surrounding infusion pipeline can prolong the time that the liquid in the infusion pipeline is exposed to ultraviolet light, thereby improving the ultraviolet purification efficiency. In addition, the first shell can diffusely reflect the ultraviolet light irradiated to the inner wall of the first shell, and reflect the ultraviolet light to the infusion pipeline, thereby enhancing the ultraviolet irradiation of the infusion pipeline and improving the ultraviolet purification efficiency.

[0019] The ultraviolet device also includes a plurality of ultraviolet light source groups arranged on the inner wall of the first shell. The ultraviolet light sources in the plurality of ultraviolet light source groups are ultraviolet light emitting diodes, which have the advantages of no heat radiation, high light source purification efficiency, no pollution and long service life.

[0020] In a second aspect, an embodiment of the present application provides an immersion lithography machine, comprising: an ultrapure water preparation system, wherein the ultrapure water preparation system comprises the ultraviolet purification device as described in the first aspect of the present application.

[0021] The beneficial effects of the immersion lithography machine provided by the embodiment of the present application include but are not limited to the following:

[0022] The ultraviolet purification device used in the ultrapure water preparation system in the immersion lithography machine provided in the embodiment of the present application can perform efficient ultraviolet purification on the immersion liquid without affecting the temperature of the immersion liquid. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] The following figures describe in detail the exemplary embodiments disclosed in this application. The same reference numerals represent similar structures in several views of the drawings. Those skilled in the art will understand that these embodiments are non-limiting, exemplary embodiments, and the drawings are only for the purpose of illustration and description, and are not intended to limit the scope of this application. Other embodiments may also accomplish the inventive intent in this application. It should be understood that the drawings are not drawn to scale.

[0024] in:

[0025] Figure 1 It is a structural schematic diagram of an ultraviolet purification device;

[0026] Figure 2 is a schematic structural diagram of an ultraviolet purification device according to some embodiments of the present application;

[0027] Figure 3 A schematic diagram of the positional relationship between the ultraviolet light source and the infusion pipeline in any ultraviolet light source group according to some embodiments of the present application;

[0028] Figure 4 A schematic diagram of the relationship between the spacing of multiple ultraviolet light source groups along the first shell axis defense line and the distance from the ultraviolet light source to the tangent line of the outer surface of the infusion pipeline according to some embodiments of the present application; and

[0029] Figure 5 It is a schematic diagram of the structure of an immersion lithography machine according to some embodiments of the present application. DETAILED DESCRIPTION

[0030] The following description provides specific application scenarios and requirements of the present application, with the purpose of enabling those skilled in the art to make and use the content in the present application. It will be apparent to those skilled in the art that various local modifications to the disclosed embodiments are apparent, and the general principles defined herein may be applied to other embodiments and applications without departing from the spirit and scope of the present application. Therefore, the present application is not limited to the embodiments shown, but to the widest scope consistent with the claims.

[0031] UV purification of liquids refers to the process of irradiating liquids with ultraviolet light to kill viruses and bacteria in the liquid. Figure 1 The ultraviolet purification device in the prior art generally includes an infusion pipeline 10, a quartz tube 20 and an ultraviolet mercury lamp 30. The infusion pipeline 10 transports the liquid to be ultraviolet purified into the quartz tube 20, and the ultraviolet mercury lamp 30 disposed under the quartz tube irradiates the liquid with ultraviolet light.

[0032] There are usually two quartz tubes 20 , and the ultraviolet mercury lamp 30 purifies the liquid in the quartz tube 20 only by irradiating the bottom of the quartz tube 20 , and the purification efficiency is low.

[0033] In addition, the spectrum of the ultraviolet mercury lamp 30 is relatively wide, the effective ultraviolet spectrum segment accounts for a small proportion, the ultraviolet purification efficiency is low, and the heat generated by the infrared spectrum segment in the spectrum will affect the temperature of the liquid, thereby affecting the processing effect of the process that requires the liquid temperature. In addition, the ultraviolet mercury lamp 30 is also easily damaged, causing mercury vapor to volatilize, thereby contaminating the ultraviolet purification device.

[0034] Therefore, there is a need for an ultraviolet purification device that can efficiently sterilize and disinfect liquids without causing pollution or affecting the temperature of the liquid.

[0035] The present application provides an ultraviolet purification device, comprising: a base; a first shell, arranged on the base, the first shell being capable of reflecting ultraviolet light; a plurality of ultraviolet light source groups, the plurality of ultraviolet light source groups being arranged on the inner wall of the first shell for emitting ultraviolet light; and an infusion pipeline, located inside the first shell and arranged around the axis of the first shell for conveying a liquid to be purified.

[0036] The surrounding infusion pipeline can prolong the time that the liquid in the infusion pipeline is exposed to the ultraviolet light, thereby improving the ultraviolet purification efficiency.

[0037] In addition, the ultraviolet light sources in the multiple ultraviolet light source groups are ultraviolet light emitting diodes (UV-LEDs), which have the following advantages: a) the ultraviolet light source provided by the ultraviolet light emitting diodes is a cold light source, has no thermal radiation, and will not affect the temperature of the liquid; b) in addition, the light energy of the ultraviolet light emitting diodes is concentrated in the ultraviolet spectrum, and has a higher light source purification efficiency than the ultraviolet mercury lamp; c) it will not cause equipment pollution; d) the ultraviolet light emitting diodes have a longer life, which is usually more than 10 times that of the ultraviolet mercury lamp.

[0038] The ultraviolet purification device provided in the present application will be described in detail below with reference to the accompanying drawings and embodiments.

[0039] refer to Figure 2 The present application provides an ultraviolet purification device, including a base 100, a second shell 200, a first shell 300 arranged inside the second shell 200, a plurality of ultraviolet light source groups 400 arranged inside the first shell 300, and an infusion pipeline 500 located inside the first shell 300 and arranged around the axis of the first shell 300.

[0040] In some embodiments, the material of the base 100 includes metal, such as stainless steel, carbon steel, cast iron, aluminum, nickel, iron-chromium-aluminum alloy or high-temperature alloy, etc., to shield ultraviolet light and prevent ultraviolet light from passing through the base 100 and emitting the ultraviolet purification device. The shape of the base 100 can be adjusted according to installation requirements and is not limited here.

[0041] In some embodiments, the second housing 200 is disposed on the base 100 and is capable of shielding ultraviolet light. Ultraviolet light is harmful to the operator's body, especially to the eyes, so the second housing 200 is required to shield the ultraviolet light emitted by the plurality of ultraviolet light source groups 400 to prevent the ultraviolet light from causing harm to the operator. The second housing 200 may be connected to the base 100, or may cover the surface of the base 100.

[0042] In some embodiments, the second housing 200 is connected to the base 100 via a hinge. Specifically, a first connection hole matching the hinge is provided on the outer surface of the bottom of the second housing 200, and a second connection hole matching the hinge is provided on the surface of the base 100 facing the second housing 200. A plurality of screws or pins penetrate through a plurality of through holes penetrating the hinge and penetrate into the first connection hole and the second connection hole respectively, so as to fix the hinge to the second housing 200 and the base 100 respectively. The opening and closing of the second housing 200 is controlled by the opening and closing of the hinge.

[0043] When the ultraviolet purification device is working, the second housing 200 is covered on the base 100 and is in a closed state to shield ultraviolet light. When the ultraviolet purification device needs to be inspected internally, the second housing 200 is opened to expose the internal structure of the ultraviolet purification device for easy inspection.

[0044] In some embodiments, the peripheral wall of the second housing 200 is provided with a first through hole 101 and a second through hole 102 penetrating the peripheral wall, the first through hole 101 being used to allow the first end of the infusion pipeline 500 to pass through the second housing 200, and the second through hole 102 being used to allow the second end of the infusion pipeline 500 to pass through the second housing 200. In some embodiments, the first through hole 101 and the second through hole 102 are located on adjacent peripheral walls of the second housing 200. In some embodiments, the first through hole 101 and the second through hole 102 are located on opposite peripheral walls of the second housing 200.

[0045] In some embodiments, the material of the second shell 200 includes metal, such as stainless steel, carbon steel, cast iron, aluminum, nickel, iron-chromium-aluminum alloy or high-temperature alloy, so as to shield ultraviolet light and prevent ultraviolet light from passing through the second shell 200 and emitting from the ultraviolet purification device.

[0046] The shape of the second housing 200 is not limited, and it can be covered on the base 100. In some embodiments, the second housing 200 is a rectangular parallelepiped, and the thickness of the second housing 200 is 0-2 mm.

[0047] In some embodiments, the first shell 300 is disposed inside the second shell 200 and is capable of reflecting ultraviolet light.

[0048] In some embodiments, the first shell 300 is cylindrical, and the inner surface of the first shell 300 is configured to diffusely reflect the ultraviolet light irradiated to the inner surface of the first shell 300, so that the ultraviolet light is reflected to the axis area close to the first shell 300, thereby improving the ultraviolet purification efficiency of the liquid in the infusion pipeline 500 located inside the first shell 300. In some embodiments, the roughness of the inner surface of the first shell 300 is 0 to 0.3 nm.

[0049] In some embodiments, the material of the first housing 300 includes quartz.

[0050] In some embodiments, the thickness of the first shell 300 is 0.1-5 mm.

[0051] In some embodiments, the outer surface of the first housing 300 further includes a diffuse reflection coating to further diffusely reflect the ultraviolet light irradiated to the first housing 300. In some embodiments, the material of the diffuse reflection coating includes one or more of metal, Ta2O5, SiO2 or TiO2. In some embodiments, the diffuse reflection coating has a thickness of 0.1 to 1 mm.

[0052] In some embodiments, the first shell 300 is fixed by a slot disposed on the surface of the base 100 .

[0053] In some embodiments, the plurality of ultraviolet light source groups 400 are disposed on the inner wall of the first housing 300 to emit ultraviolet light.

[0054] In some embodiments, the ultraviolet light sources in the plurality of ultraviolet light source groups 400 are ultraviolet light emitting diodes, which have the advantages of no heat radiation, high light source purification efficiency, no pollution, and long service life.

[0055] In some embodiments, any one of the plurality of ultraviolet light source groups 400 includes a plurality of ultraviolet light sources, and the plurality of ultraviolet light sources are distributed in the same circular cross section of the first housing 300 and are symmetrically distributed about the center of the circular cross section.

[0056] In some embodiments, any one of the plurality of ultraviolet light source groups 400 includes at least three ultraviolet light sources, and the outer surface of the infusion pipeline 500 is tangent to the line connecting the at least three ultraviolet light sources. Figure 3 As shown, the ultraviolet light emitted from any of the at least three ultraviolet light sources to the inner wall of the first shell 300 can be reflected to the infusion pipeline 500 after diffuse reflection by the inner wall of the first shell 300. Figure 3 The middle arrow line is a schematic diagram of the optical path of ultraviolet light, wherein when the ultraviolet light source is a light emitting diode, the light emitting angle of the ultraviolet light source is 120°.

[0057] In some embodiments, the number of ultraviolet light sources in any ultraviolet light source group 400 among the plurality of ultraviolet light source groups 400 may be 3, 4, 5 or 6.

[0058] In some embodiments, the plurality of ultraviolet light source groups 400 are equidistantly distributed along the axis of the first housing 300. In some embodiments, the ratio of the spacing between adjacent ultraviolet light source groups 400 along the axis of the first housing 300 to the distance from the plurality of ultraviolet light sources to the tangent line of the outer surface of the infusion pipeline 500 is less than or equal to 2√3. Figure 4, the arrow line is a schematic diagram of the optical path of the ultraviolet light, the dotted line in the figure is the tangent of the outer surface of the infusion pipeline 500, when the ultraviolet light source is a light-emitting diode, the light-emitting angle of the ultraviolet light source is 120°, assuming that the distance from the ultraviolet light source to the tangent of the outer surface of the infusion pipeline 500 is a, when the spacing between the multiple ultraviolet light source groups 400 along the axial direction of the first shell 300 is 2√3a, the ultraviolet light emitted by the multiple ultraviolet light source groups 400 can just cover the outer surface of the infusion pipeline 500.

[0059] In some embodiments, the infusion pipeline 500 is located inside the first housing 300 and is disposed around the axis of the first housing 300 to transport the liquid to be purified. In some embodiments, the infusion pipeline 500 is a cylindrical spiral pipeline.

[0060] In some embodiments, the ratio of the inner diameter of the infusion pipeline 500 to the length of the spiral region of the infusion pipeline 500 along the axial direction of the first shell 300 is 1:(10-100).

[0061] In some embodiments, the first end of the infusion line 500 passes through the second housing 200 to be connected to a liquid inlet device, and the second end of the infusion line 500 passes through the second housing 200 to output the ultraviolet purified liquid. In some embodiments, the second end of the infusion line 500 is connected to a liquid transmission system.

[0062] In some embodiments, the material of the infusion line 500 includes quartz, which can allow the ultraviolet light to pass through the wall of the infusion line 500 to sterilize the liquid inside the infusion line 500.

[0063] In some embodiments, the liquid transported by the infusion pipeline 500 can be water, liquid organic solvent or solution, etc.

[0064] The beneficial effects of the ultraviolet purification device provided in the embodiments of the present application include but are not limited to the following:

[0065] The ultraviolet device provided in the embodiment of the present application includes a second shell that can shield ultraviolet light, a first shell that is arranged inside the second shell and can reflect ultraviolet light, and an infusion pipeline that is located inside the first shell and is arranged around the axis of the first shell for conveying the liquid to be purified. The surrounding infusion pipeline can prolong the time that the liquid in the infusion pipeline is exposed to ultraviolet light, thereby improving the ultraviolet purification efficiency. In addition, the first shell can diffusely reflect the ultraviolet light irradiated to the inner wall of the first shell, and reflect the ultraviolet light to the infusion pipeline, thereby enhancing the ultraviolet irradiation of the infusion pipeline and improving the ultraviolet purification efficiency.

[0066] The ultraviolet device also includes a plurality of ultraviolet light source groups arranged on the inner wall of the first shell. The ultraviolet light sources in the plurality of ultraviolet light source groups are ultraviolet light emitting diodes, which have the advantages of no heat radiation, high light source purification efficiency, no pollution and long service life.

[0067] refer to Figure 5 On the other hand, an embodiment of the present application further provides an immersion lithography machine, including: an ultrapure water preparation system 600, used to purify water to obtain ultrapure water, and the ultrapure water preparation system 600 includes an ultraviolet purification device provided in an embodiment of the present application, which is used to perform ultraviolet purification on the water.

[0068] In some embodiments, the ultrapure water preparation system 600 further includes a degassing device and a deionizing device for performing degassing and deionizing treatments on the water, respectively.

[0069] In some embodiments, reference Figure 5 The immersion lithography machine further includes a process water cooling system (PCWChiller) 700, a water transfer system (TCS) 800, and a process chamber 900. The process cooling water system 700 is used to cool the water, the water transfer system 800 is used to adjust the flow of the water, and the process chamber 900 is used to perform the photolithography process. The water used as the immersion liquid passes through the process water cooling system 700, the ultrapure water preparation system 600, and the water transfer system 800 in sequence into the process chamber 900. The process water cooling system 700, the ultrapure water preparation system 600, the water transfer system 800, and the process chamber 900 are connected through a liquid transfer pipeline 1000.

[0070] In some embodiments, the process chamber 900 includes a chamber body 901, a base 902 for carrying a wafer disposed inside the chamber 901, and a photolithography machine objective lens 903 located above the base. After being transported to the chamber body 901 through a liquid transmission pipeline 1000, the ultrapure water fills and covers the area between the lower surface of the photolithography machine objective lens 903 and the photoresist on the wafer to increase the refractive index of the optical path.

[0071] The beneficial effects of the immersion lithography machine provided by the embodiment of the present application include but are not limited to the following:

[0072] The ultraviolet purification device used in the ultrapure water preparation system in the immersion lithography machine provided in the embodiment of the present application can perform efficient ultraviolet purification on the immersion liquid without affecting the temperature of the immersion liquid.

[0073] It should be noted that different embodiments may produce different beneficial effects. In different embodiments, the beneficial effects that may be produced may be any one or a combination of the above, or any other beneficial effects that may be obtained.

[0074] The basic concepts have been described above. Obviously, for those skilled in the art, the above detailed disclosure is only for example and does not constitute a limitation of this specification. Although not explicitly stated here, those skilled in the art may make various modifications, improvements and corrections to this application. Such modifications, improvements and corrections are suggested in this specification, so such modifications, improvements and corrections still belong to the spirit and scope of the exemplary embodiments of this application.

[0075] It should be noted that in the description of this application, unless otherwise clearly specified and limited, the terms "install", "connect", "connect", and "fix" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a rotating connection or a sliding connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood in combination with specific circumstances.

[0076] In addition, when terms such as "first", "second", and "third" are used in the specification of this application to describe various features, these terms are only used to distinguish these features and cannot be understood as indicating or implying the relationship between the features, the relative importance, or implicitly indicating the number of features indicated.

[0077] In addition, the present specification describes exemplary embodiments by reference to idealized exemplary cross-sectional views and / or plan views and / or stereograms. Therefore, differences from the illustrated shapes due to, for example, manufacturing techniques and / or tolerances are foreseeable. Therefore, the exemplary embodiments should not be interpreted as being limited to the shapes of the regions shown herein, but should include deviations in shapes caused by, for example, manufacturing. Therefore, the regions shown in the figures are schematic in nature, and their shapes are not intended to illustrate the actual shapes of the regions of the device nor to limit the scope of the exemplary embodiments.

[0078] At the same time, the present application uses specific words to describe the embodiments of this specification. For example, "one embodiment", "an embodiment", and / or "some embodiments" refer to a certain feature, structure or characteristic related to at least one embodiment of the present application. Therefore, it should be emphasized and noted that "one embodiment" or "an embodiment" or "an alternative embodiment" mentioned twice or more in different positions in the present application does not necessarily refer to the same embodiment. In addition, some features, structures or characteristics in one or more embodiments of the present application can be appropriately combined.

[0079] Similarly, it should be noted that in order to simplify the description of the disclosure of this application and thus help understand one or more embodiments of the invention, in the above description of the embodiments of this application, multiple features are sometimes combined into one embodiment, figure or description thereof. However, this disclosure method does not mean that the features required by the object of this application are more than the features mentioned in the claims. In fact, the features of the embodiments are less than all the features of the single embodiment disclosed above.

[0080] Finally, it should be understood that the embodiments described in this application are only used to illustrate the principles of the embodiments of the present application. Other variations may also fall within the scope of the present application. Therefore, as an example and not a limitation, the alternative configurations of the embodiments of the present application may be considered to be consistent with the teachings of the present application. Accordingly, the embodiments of the present application are not limited to the embodiments explicitly introduced and described in this application.

Claims

1. An ultraviolet purification device, characterized in that: include: Pedestal; A first shell is disposed on the base, and the first shell can reflect ultraviolet light; A plurality of ultraviolet light source groups, wherein the plurality of ultraviolet light source groups are arranged on the inner wall of the first shell and are used to emit ultraviolet light; as well as The infusion pipeline is located inside the first shell and is arranged around the axis of the first shell, and is used to transport the liquid to be purified.

2. The ultraviolet purification device according to claim 1, characterized in that: The ultraviolet light sources in the plurality of ultraviolet light source groups are ultraviolet light emitting diodes.

3. The ultraviolet purification device according to claim 2, characterized in that: The multiple ultraviolet light source groups are equidistantly distributed along the axis of the first shell, and the ratio of the spacing between adjacent ultraviolet light source groups along the axis of the first shell to the distance from the ultraviolet light source to the tangent line of the outer surface of the infusion pipeline is less than or equal to 2√3.

4. The ultraviolet purification device according to claim 1, characterized in that: Any one of the plurality of ultraviolet light source groups includes a plurality of ultraviolet light sources, and the plurality of ultraviolet light sources are distributed in the same circular cross section of the first shell and are distributed symmetrically with respect to the center of the circular cross section.

5. The ultraviolet purification device according to claim 4, characterized in that: The number of the multiple ultraviolet light sources is three, and the outer surface of the infusion pipeline is tangent to the line connecting the at least three ultraviolet light sources.

6. The ultraviolet purification device according to claim 1, characterized in that: The infusion pipeline is a cylindrical spiral pipeline.

7. The ultraviolet purification device according to claim 1, characterized in that: The first shell is cylindrical, and the inner surface of the first shell is configured to diffusely reflect the ultraviolet light.

8. The ultraviolet purification device according to claim 1, characterized in that: The outer surface of the first shell also includes a diffuse reflection coating.

9. The ultraviolet purification device according to claim 1, characterized in that: It also includes a second shell, which is arranged on the base and outside the first shell and can shield ultraviolet light.

10. The ultraviolet purification device according to claim 9, characterized in that: The peripheral wall of the second shell is provided with a first through hole and a second through hole penetrating the peripheral wall, the first through hole is used to allow the first end of the infusion pipeline to pass through the second shell, and the second through hole is used to allow the second end of the infusion pipeline to pass through the second shell.

11. An immersion lithography machine, characterized in that: include: An ultrapure water preparation system, comprising the ultrapure water purification device according to any one of claims 1 to 10.

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