Sputtering table

Abstract

The utility model provides a sputtering table, and relates to the technical field of semiconductors. The sputtering table comprises a loading chamber, a conveying chamber and a process chamber; the loading chamber is provided with a signal emitter, a signal receiver, a controller and a servo motor; the signal transmitter and the signal receiver are respectively arranged on two sides of the moving direction of the silicon wafer, the signal transmitter is used for transmitting optical signals, and the signal receiver is used for receiving the optical signals transmitted by the signal transmitter; the controller is connected with the signal receiver and is used for judging whether to give an alarm or not according to the signal sent by the signal receiver; by means of the structure, the positions of the silicon wafers can be effectively detected in the transmission process of the silicon wafers, the transmission process of the silicon wafers can be adjusted in time, accurate transmission of the silicon wafers is guaranteed, fragments are avoided, normal operation of the production process is guaranteed, and therefore the production efficiency is improved. And the cost loss caused by silicon wafer breakage can be reduced.

Description

Technical Field

[0001] The present application relates to the field of semiconductor technology, and in particular to a sputtering station. Background Art

[0002] Silicon wafers are the main substrate material in the semiconductor industry and are widely used in industries such as integrated circuits and photovoltaic cells. They are the basic materials that support the development of today's semiconductor industry and even social technology. In the back sputtering process of the insulated gate bipolar transistor (IGBT) on the sputtering table, due to the ultra-thin characteristics of silicon wafers, the thickness is generally 80-130 angstroms. After the silicon wafers are heated, due to the stress, the surface of the silicon wafers is easily bent, thereby affecting the transmission process of the silicon wafers. If there is an error in the transmission process of the silicon wafers, it may cause the silicon wafers to break, thereby affecting the particle size and causing damage to the silicon wafers in the same basket. Utility Model Content

[0003] In order to at least overcome the above-mentioned deficiencies in the prior art, an object of the present application is to provide a sputtering station.

[0004] In a first aspect, an embodiment of the present application provides a sputtering station, the sputtering station comprising: a loading chamber, a transfer chamber, and a process chamber;

[0005] The loading chamber is provided with a signal transmitter, a signal receiver, a controller and a servo motor;

[0006] The signal transmitter and the signal receiver are respectively arranged on both sides of the moving direction of the silicon wafer, the signal transmitter is used to transmit the optical signal, and the signal receiver is used to receive the optical signal transmitted by the signal transmitter;

[0007] The controller is connected to the signal receiver, and the controller is used to determine whether to alarm according to the signal sent by the signal receiver;

[0008] The servo motor is used to control the film basket to move.

[0009] In a possible implementation, the controller is provided with a timer, and the timer is used to record the time when the signal sent by the signal receiver is received, and the controller is used to determine whether to alarm according to the time recorded by the timer.

[0010] In a possible implementation, the loading chamber is further provided with a brake, and the brake is used to control the film basket to not move.

[0011] In a possible implementation, the loading chamber is further provided with a relay, the relay is connected to the controller, and the relay is used to output an alarm signal according to a signal sent by the controller;

[0012] The relay is connected to the servo motor and the brake respectively, and the relay is used to control the working states of the servo motor and the brake.

[0013] In a possible implementation, the relay includes a first contact and a second contact, the relay is connected in series with the servo motor via the first contact, and the relay is connected in series with the brake via the second contact.

[0014] In a possible implementation, the first contact is a normally closed contact, and the second contact is a normally open contact.

[0015] In a possible implementation, the loading chamber further includes a power supply, and the power supply is respectively connected to the signal transmitter, the signal receiver, the controller, and the servo motor.

[0016] In a possible implementation, the loading chamber further includes a switch, and the switch is used to control whether the detection logic is effective.

[0017] In a possible implementation, the signal transmitter and the signal receiver are through-beam photoelectric sensors.

[0018] In a possible implementation, the sputtering table is further provided with a display screen, and the display screen is provided with a reset button.

[0019] Based on any of the above aspects, the sputtering table provided in the embodiment of the present application can effectively detect the position of the silicon wafer during the transmission process of the silicon wafer through a signal transmitter and a signal receiver, and promptly discover the deviation of the transmission position, and determine whether to issue an alarm through a controller. The transmission process of the silicon wafer can be adjusted in time to ensure the accurate transmission of the silicon wafer, thereby avoiding the generation of fragments and ensuring the normal operation of the production process. In this way, the cost loss caused by silicon wafer breakage can be reduced. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required in the embodiments will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present application and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without creative work.

[0021] Figure 1 A schematic diagram of the structure of the loading chamber provided in this embodiment;

[0022] Figure 2 Schematic diagram of the silicon wafer provided in this embodiment not blocking light;

[0023] Figure 3 Schematic diagram of silicon wafer shielding light provided in this embodiment;

[0024] Figure 4 A schematic diagram of the connection relationship of the components of the loading chamber provided in this embodiment.

[0025] Icon: 100 - loading chamber; 110 - signal transmitter; 120 - signal receiver; 130 - controller; 140 - servo motor; 150 - brake; 160 - relay; 200 - sheet basket. DETAILED DESCRIPTION

[0026] In order to make the purpose, technical solution and advantages of the embodiments of the present application clearer, the technical solution in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, rather than all the embodiments. The components of the embodiments of the present application described and shown in the drawings here can be arranged and designed in various different configurations.

[0027] Therefore, the following detailed description of the embodiments of the present application provided in the accompanying drawings is not intended to limit the scope of the present application for which protection is sought, but merely represents selected embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in the field without creative work are within the scope of protection of the present application.

[0028] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, further definition and explanation thereof is not required in subsequent drawings.

[0029] In the description of this application, it should be noted that the terms "upper", "lower", etc. indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship in which the product of the application is usually placed when in use, which is only for the convenience of describing this application and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on this application. In addition, the terms "first", "second", etc. are only used to distinguish the description, and cannot be understood as indicating or implying relative importance.

[0030] In addition, the terms "horizontal", "vertical", "overhanging" and the like do not mean that the components are required to be absolutely horizontal or overhanging, but can be slightly tilted. For example, "horizontal" only means that its direction is more horizontal than "vertical", and does not mean that the structure must be completely horizontal, but can be slightly tilted.

[0031] In the description of this application, it should also be noted that, unless otherwise clearly specified and limited, the terms "set", "install", "connect", and "connect" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0032] It should be noted that, in the absence of conflict, different features in the embodiments of the present application may be combined with each other.

[0033] This embodiment provides a solution that can solve the above-mentioned problem. The specific implementation methods of this application are described in detail below in conjunction with the accompanying drawings.

[0034] This embodiment provides a sputtering station, which may include a loading chamber 100, a transfer chamber, and a process chamber. The transfer chamber may include a DCM chamber and a TM chamber, and the number of the process chambers may be three.

[0035] Exemplarily, the model of the sputtering station may be M2000.

[0036] The loading chamber 100 is provided with a signal transmitter 110 , a signal receiver 120 , a controller 130 and a servo motor 140 .

[0037] The signal transmitter 110 and the signal receiver 120 are respectively disposed on both sides of the moving direction of the silicon wafer. The signal transmitter 110 can be used to transmit an optical signal, and the signal receiver 120 can be used to receive the optical signal transmitted by the signal transmitter 110 .

[0038] For details, please refer to Figure 1 The signal transmitter 110 and the signal receiver 120 may be respectively disposed on both sides of the moving direction of the silicon wafer. For example, the signal transmitter 110 may be disposed above the loading chamber 100, and the signal receiver 120 may be disposed below the loading chamber 100. Figure 2The wafer basket 200 can move up and down in the loading chamber 100, the robot can control the silicon wafer to move horizontally in the loading chamber 100, and transfer the silicon wafer to the wafer basket 200, the signal transmitter 110 can be used to transmit an optical signal to the signal receiver 120, and the signal receiver 120 can be used to receive the optical signal transmitted by the signal transmitter 110, thereby forming a smooth optical path between the signal transmitter 110 and the signal receiver 120, and the signal transmitter 110 and the signal receiver 120 can detect the position of the silicon wafer. Please refer to Figure 3 When the silicon wafer passes through the optical path formed by the signal transmitter 110 and the signal receiver 120 , the optical path formed by the signal transmitter 110 and the signal receiver 120 is blocked, and the signal receiver 120 cannot receive the optical signal transmitted by the signal transmitter 110 .

[0039] Please refer to Figure 4 The controller 130 is connected to the signal receiver 120 , and the controller 130 can be used to determine whether to alarm according to the signal sent by the signal receiver 120 .

[0040] Specifically, when the signal receiver 120 does not receive the optical signal emitted by the signal transmitter 110 , the signal receiver 120 may send a low-level signal to the controller 130 , and the controller 130 may determine whether to alarm based on the low-level signal sent by the signal receiver 120 .

[0041] The servo motor 140 may be used to control the film basket 200 to move.

[0042] Specifically, when the film basket 200 is located in the loading chamber 100 , the servo motor 140 may start to work to control the film basket 200 to move up and down in the loading chamber 100 .

[0043] In the above structure, the position of the silicon wafer can be effectively detected during the transmission process of the silicon wafer through the signal transmitter 110 and the signal receiver 120, and the deviation of the transmission position can be discovered in time. The controller 130 can determine whether to issue an alarm, and the transmission process of the silicon wafer can be adjusted in time to ensure the accurate transmission of the silicon wafer, thereby avoiding the generation of fragments and ensuring the normal operation of the production process. In this way, the cost loss caused by silicon wafer breakage can be reduced.

[0044] In a possible implementation, the controller 130 is provided with a timer, and the timer is used to record the time when the signal sent by the signal receiver 120 is received. The controller 130 is used to determine whether to alarm according to the time recorded by the timer.

[0045] In this embodiment, the controller 130 is connected to the signal receiver 120, and the timer is provided in the controller 130. When the robot controls the silicon wafer to move laterally in the loading chamber 100 and transfers the silicon wafer to the wafer basket 200, if the signal receiver 120 does not receive the optical signal sent by the signal transmitter 110, it sends a low-level signal to the controller 130. The timer in the controller 130 can record the time when the low-level signal sent by the signal receiver 120 is received. If the time recorded by the timer exceeds a preset threshold, it can be determined that an error occurs in the movement of the silicon wafer in the loading chamber 100. At this time, an alarm can be issued.

[0046] Specifically, when the wafer basket 200 moves up and down in the loading chamber 100, the robot can control the silicon wafer to move horizontally in the loading chamber 100 and transfer the silicon wafer to the wafer basket 200. In this case, the robot may block the optical signal emitted by the signal transmitter 110, thereby causing the signal receiver 120 to be unable to receive the optical signal. Therefore, when judging whether an error occurs in the movement of the silicon wafer in the loading chamber 100, a preset threshold value can be set. The preset threshold value can be slightly greater than the time it takes for the robot to transfer the silicon wafer, for example, 3s. In this way, incorrect judgments caused by the robot transferring the silicon wafer can be avoided.

[0047] Exemplarily, the controller 130 may be a programmable controller 130 .

[0048] In one possible implementation, please refer again to Figure 4 The loading chamber 100 is further provided with a brake 150, and the brake 150 can be used to control the film basket 200 not to move.

[0049] In this embodiment, the loading chamber 100 is further provided with the brake 150. When the brake 150 is working, the brake 150 can lock the position of the film basket 200 and control the film basket 200 not to move.

[0050] In one possible implementation, please refer again to Figure 4 The loading chamber 100 is further provided with a relay 160 , and the relay 160 is connected to the controller 130 , and the relay 160 is used to output an alarm signal according to a signal sent by the controller 130 .

[0051] Specifically, the relay 160 is connected to the controller 130. When the controller 130 determines that an alarm is needed based on the signal sent by the signal receiver 120, the controller 130 can send a low-level signal to the relay 160 to control the relay 160 to be energized. At the same time, the relay 160 can output an alarm signal.

[0052] Exemplarily, the relay 160 may be a 24V relay 160 .

[0053] The relay 160 is connected to the servo motor 140 and the brake 150 respectively, and the relay 160 is used to control the working states of the servo motor 140 and the brake 150 .

[0054] Specifically, the relay 160 can be connected to the servo motor 140 and the brake 150 respectively, and the relay 160 can control the working status of the servo motor 140 and the brake 150. When the relay 160 receives the low-level signal sent by the controller 130, the relay 160 can control the servo motor 140 to stop working, and at the same time, control the brake 150 to start working. In this way, the servo motor 140 and the brake 150 can cooperate with each other to lock the position of the wafer basket 200 and control the wafer basket 200 not to move, thereby avoiding the fragmentation caused by the silicon wafer not being correctly transferred to the wafer basket 200.

[0055] In a possible implementation, the relay 160 may include a first contact and a second contact. The relay 160 may be connected in series with the servo motor 140 via the first contact, and the relay 160 may be connected in series with the brake 150 via the second contact.

[0056] In this embodiment, the relay 160 can be connected in series with the power circuit of the servo motor 140 through the first contact, so as to control the working state of the servo motor 140 through the first contact; the relay 160 can be connected in series with the power circuit of the brake 150 through the second contact, so as to control the working state of the brake 150 through the second contact.

[0057] In a possible implementation, the first contact is a normally closed contact, and the second contact is a normally open contact.

[0058] Specifically, a normally closed contact refers to a contact that is in a closed state under normal circumstances (no power), and a normally open contact refers to a contact that is in an open state under normal circumstances (no power). When the relay 160 receives a low-level signal sent by the controller 130, the coil of the relay 160 is energized, causing the contacts to be attracted, the normally open contact to close, and the normally closed contact to open. Since the first contact is a normally closed contact and the second contact is a normally open contact, the servo motor 140 is powered off, thereby causing the servo motor 140 to stop working; the brake 150 is energized, and the brake 150 controls the film basket 200 not to move.

[0059] In a possible implementation, the loading chamber 100 may further include a power supply, and the power supply is respectively connected to the signal transmitter 110 , the signal receiver 120 , the controller 130 , and the servo motor 140 .

[0060] Exemplarily, the power supply may be a 24V power supply.

[0061] In a possible implementation, the loading chamber 100 may further include a switch, and the switch may be used to control whether the detection logic is effective.

[0062] In this embodiment, when the wafer basket 200 is placed in the loading chamber 100, the door of the loading chamber 100 is closed. At this time, the switch can be used to control the detection logic to become effective, and the signal transmitter 110 and the signal receiver 120 can start working to detect the position of the silicon wafer.

[0063] Exemplarily, the switch may be a 3V relay 160 .

[0064] In a possible implementation, the signal transmitter 110 and the signal receiver 120 are through-beam photoelectric sensors.

[0065] The inventor has found that, at present, when detecting the position of the silicon wafer, it is usually detected by a reflective distance measuring sensor. The reflective distance measuring sensor usually works based on the reflection principle of infrared laser. The characteristic of semiconductor silicon wafer is that its surface has an ultra-high reflectivity. By reflecting the infrared laser on the surface of the semiconductor silicon wafer, the real-time distance of the semiconductor silicon wafer during the transmission process can be measured. However, during the transmission of the semiconductor silicon wafer, there are also other devices with high reflectivity. These devices will also reflect the infrared laser, thereby affecting the measurement accuracy. Therefore, in this embodiment, the signal transmitter 110 and the signal receiver 120 can be a through-beam photoelectric sensor. Compared with the reflective distance measuring sensor, the through-beam photoelectric sensor can determine whether the light emitted by the signal transmitter 110 is blocked, thereby determining the position of the silicon wafer in the loading chamber 100, which can effectively improve the measurement accuracy.

[0066] In a possible implementation, the sputtering table is further provided with a display screen, and the display screen is provided with a reset button.

[0067] In this embodiment, the sputtering station may further include the display screen, which includes timing display information, timing setting information, alarm number information, etc. The display screen is also provided with an alarm reset button and an alarm number reset button.

[0068] In summary, this embodiment provides a sputtering table, which can effectively detect the position of the silicon wafer during the transmission process of the silicon wafer through a signal transmitter and a signal receiver, and promptly discover the deviation of the transmission position, and determine whether to alarm through a controller. The transmission process of the silicon wafer can be adjusted in time to ensure the accurate transmission of the silicon wafer, thereby avoiding the generation of fragments and ensuring the normal operation of the production process. In this way, the cost loss caused by silicon wafer breakage can be reduced.

[0069] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprise a ..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0070] The above description is only the preferred embodiment of the present application and is not intended to limit the present application. For those skilled in the art, the present application may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A sputtering station, characterized in that: include: Loading chamber, transfer chamber and process chamber; The loading chamber is provided with a signal transmitter, a signal receiver, a controller and a servo motor; The signal transmitter and the signal receiver are respectively arranged on both sides of the moving direction of the silicon wafer, the signal transmitter is used to transmit the optical signal, and the signal receiver is used to receive the optical signal transmitted by the signal transmitter; The controller is connected to the signal receiver, and the controller is used to determine whether to alarm according to the signal sent by the signal receiver; The servo motor is used to control the film basket to move.

2. The sputtering station according to claim 1, characterized in that The controller is provided with a timer, and the timer is used to record the time when the signal sent by the signal receiver is received. The controller is used to determine whether to alarm according to the time recorded by the timer.

3. The sputtering station according to claim 1, characterized in that: The loading chamber is also provided with a brake, and the brake is used to control the film basket not to move.

4. The sputtering station according to claim 3, characterized in that: The loading chamber is also provided with a relay, the relay is connected to the controller, and the relay is used to output an alarm signal according to a signal sent by the controller; The relay is connected to the servo motor and the brake respectively, and the relay is used to control the working states of the servo motor and the brake.

5. The sputtering station according to claim 4, characterized in that: The relay includes a first contact and a second contact. The relay is connected in series with the servo motor via the first contact, and the relay is connected in series with the brake via the second contact.

6. The sputtering station according to claim 5, characterized in that: The first contact is a normally closed contact, and the second contact is a normally open contact.

7. The sputtering station according to claim 1, characterized in that: The loading chamber further includes a power supply, which is respectively connected to the signal transmitter, the signal receiver, the controller and the servo motor.

8. The sputtering station according to claim 1, characterized in that: The loading chamber further comprises a switch, and the switch is used to control whether the detection logic is effective.

9. The sputtering station according to claim 1, characterized in that: The signal transmitter and the signal receiver are through-beam photoelectric sensors.

10. The sputtering station according to claim 1, characterized in that: The sputtering platform is also provided with a display screen, and the display screen is provided with a reset button.

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