System for monitoring and controlling processing of microelectronic substrates

Abstract

The present disclosure relates to a system for monitoring and controlling the processing of microelectronic substrates. The system includes: a housing having sealing doors, each sealing door having a front side and a rear side; one or more wet part cabinets configured on a front side of each sealing door, where each wet part cabinet is divided into a plurality of clusters and occupies one or more chemical stations configured to execute one or more analytical applications; one or more electrical cabinets disposed on a rear side of each sealing door, where each electrical cabinet is configured to include electrical components for controlling operation of the workstation; one or more chemical cabinets for storing and providing chemicals required by analytical applications running through the workstation; and an interface for connection with one or more computing devices, whereby analytical applications can be monitored and controlled by the computing devices, whereby negative pressure is maintained in the wet part cabinet and overvoltage is maintained in the electrical cabinet. The system has the advantage of occupying less coverage area.

Description

Technical Field

[0001] The present disclosure relates to a system for controlling the manufacture of microelectronic substrates. Specifically, a system for monitoring and controlling the processing of substrates using electrolytic and electroless techniques is described. In particular, it is intended for applications in the semiconductor industry for analyzing / controlling the concentration of processing bath components. Background Art

[0002] Microelectronic devices are manufactured by depositing and removing multiple layers of material on a substrate, such as a silicon wafer, to produce a large number of individual devices. For example, layers of photoresist, conductive material, and dielectric material are deposited, patterned, etched, planarized, etc. to form features in and / or on the substrate. These features are arranged to form integrated circuits (ICs), MEMS, and other microelectronic structures.

[0003] Wet chemical processing is commonly used to form features on microelectronic substrates. Wet chemical processing is typically performed in a wet chemical processing tool that has multiple processing chambers for a combination of cleaning, etching, electrochemical deposition, and rinsing. Electrochemical deposition processes include electrolytic deposition, in which an electric current is applied to the substrate, and electroless deposition, in which no external current is supplied to the substrate.

[0004] The ability to monitor the chemical composition or chemical activity of the electrolyte used in one of the above processes is usually included. This is done to control the concentration of the chemical components of the electrolyte in such a way as to maintain consistent processing of multiple substrates when used throughout the life of the electrolyte. Typically, analytical techniques must be developed specifically for each component in the electrolyte for the specific combination and concentration of components present in a specific electrolyte. Methods for monitoring electrolyte composition particularly involve electroanalytical methods. Titration (also known as titration and volumetric analysis) is a very common absolute method of quantitative chemical analysis that determines the concentration of identified / known substances with very high accuracy. Electrochemical analysis uses potential / current to reduce / plating and oxidize / strip metal components onto / from a rotating disk electrode (RDE). Absorption spectrophotometers take advantage of the different optical characteristics of different chemicals. By transmitting light through a sample and analyzing the transmitted intensity over a wide wavelength range, the concentration of a specific substance can be determined. High performance liquid chromatography (HPLC) works by separating and detecting single tank components. It analyzes organic additives, complexing agents, decomposition products, and leachables in photoresist components.

[0005] Traditionally, separate analytical methods are used to represent the concentration of each known component in the electrolyte. Designing analytical techniques or methods for each component of the electrolyte using electroanalysis, HPLC, titration, NIR spectroscopy, etc. can be time consuming and expensive. In addition, some commercial additives contain two or more components, and it may be impossible to separate them if the chemical species are not known in advance. Monitoring of each chemical component of these electrolytes can be complicated because multiple interactions may occur between the components as their respective concentrations change and the electrolyte ages. Aging of the electrolyte may result in decomposition of one or more of its components due to oxidation, reduction, or catalytic activity, or it may involve interactions with hardware or substrates that come into contact with the electrolyte during its lifetime, or other contamination.

[0006] Therefore, a device or system is needed that can allow monitoring and controlling electrolyte composition during high volume manufacturing (HVM), in a clean room environment, and within a single structure. In addition, the device or system should be adaptable to different analytical techniques. The utility model described in this article solves the above needs. Utility Model Content

[0007] In one aspect of the utility model, a system for monitoring and controlling the quality of a solution for processing a microelectronic substrate is disclosed. The system is modular, flexible, scalable, and configured to connect with similar systems to form a larger system. The system allows comprehensive access to data collected and generated by measurement and analysis methods. This can enable better characterization, troubleshooting, and process improvements.

[0008] In one aspect of the utility model, the system includes a housing having sealed doors, each sealed door having a front side and a rear side. The system also includes one or more wet parts cabinets configured on the front side of each sealed door, wherein each wet parts cabinet is divided into a plurality of clusters and occupies one or more chemical workstations, which are configured to perform one or more analytical applications. The system also includes one or more electrical cabinets configured on the rear side of each sealed door, wherein each electrical cabinet is configured to include electrical components for controlling the operation of the workstation. The system also includes one or more chemical cabinets for storing and providing chemicals required for analytical applications run by the workstation, and interfaces for connecting to one or more computing devices, wherein the analytical applications can be monitored and controlled by the computing devices.

[0009] Suitably, the system is configured to maintain a negative pressure in the wet parts cabinet and an overpressure in the electrical cabinet.

[0010] Suitably, the system can flexibly increase or decrease the number of occupied clusters.

[0011] Suitably, the system is modular in nature and the ChemStation may be installed as a modular workstation for performing different analytical methods.

[0012] Suitably, the system is configured to connect with like systems to form a larger system for performing electroanalytical applications.

[0013] Suitably, the wet parts cabinet comprises a Lego-like structure on which standard chemical and analytical modules are mounted.

[0014] Suitably, the interface comprises a wired interface, a wireless interface or a combination of both.

[0015] Suitably, the execution process and analysis results of the analysis application run by the workstation may be displayed on the screen of the computing device.

[0016] Suitably, errors in the execution of the analytical application run by the workstation may be corrected by the computing device.

[0017] Suitably, the workstation may include one or more of a titration workstation, an electrochemical analysis-CVS workstation, a high pressure liquid chromatography (HPLC) workstation, and a spectrophotometer workstation.

[0018] According to another aspect of the present invention, the system includes a memory unit configured to store configurations and parameters of an analysis application executed by the workstation.

[0019] According to further aspects of the invention, the system includes a volume top tray configured to provide support to an upper structure of the modular system including a wet parts cabinet and an electrical cabinet.

[0020] According to yet another aspect of the present invention, the system includes a volumetric bottom tray configured to provide support to a bottom structure of the system including a chemical cabinet.

[0021] Suitably, the electrical cabinet is configured to control power supplied to the workstations to ensure controlled execution of the application.The electrical cabinet is also configured to provide interconnectivity between the workstations for executing the analytical application.

[0022] Suitably, each sealing door comprises a sealing strip at its outer edge for sealing the wet parts cabinet to the electrical cabinet when the sealing door is closed.

[0023] Suitably, the sealing strip is configured to maintain different pressure conditions in the wet parts cabinet and the corresponding electrical cabinet. The sealing strip maintains negative pressure in the wet parts cabinet to prevent chemicals from leaking into the electrical cabinet and from the system. The sealing strip also maintains overpressure in the electrical cabinet to avoid the intrusion of chemical vapors and dust.

[0024] Suitably, the overpressure is maintained in the electrical cabinet by means of a fan arranged on the upper side of the system.

[0025] According to another aspect of the invention, the system includes a ventilation exhaust device for drawing air from the wet parts cabinet and the chemical cabinet.

[0026] Suitably, the housing comprises a transparent or translucent door for an operator to observe the exterior of the wet parts cabinet, wherein the door is designed as a foldable double-section door to reduce the covered area when opened.

[0027] According to another aspect of the present invention, the system includes a pressure sensor configured to detect pressure values ​​in a wet parts cabinet and a chemical cabinet. The system also includes an operation indicator that displays the pressure sensor value in a color-coded format.

[0028] According to another aspect of the present invention, a pressure control system in a wet parts cabinet and a chemical cabinet is also included.

[0029] According to an additional aspect of the present invention, the system includes a leak sensor configured to detect leakage of liquid from a wet parts cabinet, and to display the leakage condition in a color-coded format via an optical indicator on the leak sensor.

[0030] Suitably, the chemical cabinet is provided with retractable shelves to facilitate convenient loading / unloading of chemicals. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] For a better understanding of the embodiments and to show how they may be carried into effect, reference will now be made, purely by way of example, to the accompanying drawings.

[0032] With specific reference now to the details of the drawings, it is emphasized that the details shown are presented only by way of example and for the purpose of illustrative discussion of selected embodiments, and are presented in order to provide what is considered to be the most useful and most easily understood description of the principles and conceptual aspects. In this regard, no attempt is made to show structural details in more detail than is necessary for a basic understanding; the description taken in conjunction with the drawings makes it apparent to those skilled in the art how various selected embodiments may be put into practice. In the drawings:

[0033] Figure 1 A front view of a system 100 configured to monitor and control electrochemical technology according to one aspect of the present invention is shown;

[0034] Figure 2A shows the external dimensions of a "dual cluster" device 200a according to an exemplary embodiment of the present invention;

[0035] Figure 2B and Figure 2CA schematic diagram showing dual cluster devices 200b and 200c according to other aspects of the present invention;

[0036] Figure 2D A schematic diagram of a single cluster device 200d according to another aspect of the present invention is shown;

[0037] Figure 3A An open structure diagram of a dual-cluster process control device including a wet parts cabinet configuration according to an embodiment of the present invention is shown;

[0038] Figure 3B An open block diagram of a dual cluster process control device showing retractable shelves is shown;

[0039] Figure 4 An open block diagram of a process control device with an open module door is shown;

[0040] Figure 5A A schematic front view of a process control device 500 showing various structural components is shown;

[0041] Figure 5B A schematic top view of a process control device showing an electrical cabinet is shown;

[0042] Fig. 6A An open structure diagram of a process control device including a single cluster wet parts cabinet configuration according to an embodiment of the present invention is shown;

[0043] Figure 6B A schematic diagram showing a dual cluster wet parts cabinet configuration according to another embodiment of the present invention is shown;

[0044] Figure 7 An open structure diagram of a process control device including a single cluster wet parts cabinet configuration according to another embodiment of the present invention is shown;

[0045] Figure 8 An electrical cabinet 800 is shown behind a module door of a process control device;

[0046] Fig. 9 A multi-slot wafer level package (WLP) board arrangement connected to a dual cluster system according to an embodiment of the present invention is shown;

[0047] Fig.10 An operating indicator on a process control device is shown;

[0048] Fig.11 and Fig.12 A leak sensor in a wet parts cabinet is shown;

[0049] Fig.13 The fan is shown under a cover on top of the equipment frame;

[0050] Fig.14A , Fig. 14B and Fig. 14C The titration workstation, electrochemical analysis CVS workstation and high pressure liquid chromatography (HPLC) workstation are shown respectively;

[0051] Fig.15 A barcode / QR code reader on a process control device is shown; and

[0052] Fig.16 An exemplary system for implementing various aspects of the present invention is shown. DETAILED DESCRIPTION

[0053] Aspects of the present disclosure relate to a device or system that can monitor and control the composition of an electrolyte solution within a single structure. The system is flexible, scalable, and tailored to the application. The system includes a Lego-like structure that allows different chemical analysis modules to be installed on it. Various metering units can be installed as modular workstations for performing different analytical methods. Each workstation can perform defined tasks such as analysis, sampling, standard creation, etc. To simplify maintenance, these workstations can be equipped with the same equipment and components as often as possible. The system can be a wafer-level packaging (WLP) platform that is highly customizable and supports multiple metals.

[0054] In a particular embodiment of the system, the system can allow process control through liquid replenishment, solid replenishment (direct metal replenishment (DMR)), purging and feeding to keep decomposition products and / or impurities below desired ranges and can be used for purging and replenishment of ECP chemicals.

[0055] In other embodiments of the system, the system may include software for storing the configuration and parameters of the workstations. The processes of the workstations may be synchronized according to the application. The software may also enable independent updating, repair and maintenance of the workstations without affecting the operation of other modules.

[0056] As required, detailed embodiments of the present invention are disclosed herein; however, it should be understood that the disclosed embodiments are merely examples of the present invention and can be implemented in various and alternative forms. These figures are not necessarily to scale; some features may be exaggerated or minimized to show the details of specific components. Therefore, the specific structural and functional details disclosed herein should not be interpreted as limiting, but merely as a representative basis for teaching those skilled in the art to adopt the present invention in different ways.

[0057] It is particularly noted that the systems and methods disclosed herein may not be limited in their application to the details of the construction and arrangement of the components or methods set forth in the specification or shown in the drawings and examples. The systems and methods disclosed herein may be other embodiments or may be practiced and executed in various ways and technologies.

[0058] In the practice or testing of the embodiments of the present disclosure, alternative methods and materials similar or equivalent to the methods and materials described herein may be used. However, the specific methods and materials described herein are for illustrative purposes only. These materials, methods and examples are not intended to be restrictive. Therefore, various embodiments may appropriately omit, replace or add various programs or components. For example, these methods may be performed in a different order than described, and various steps may be added, omitted or combined. In addition, aspects and components described in certain embodiments may be combined in various other embodiments.

[0059] Reference now Figure 1 , which shows a front view of a system 100 configured to monitor and control electrochemical technology according to one aspect of the utility model. System 100 includes a process control device having a housing / frame 101 divided into a plurality of compartments / cabinets, and including an (analysis) cluster (in this example, a dual cluster configuration). Housing 101 has two transparent or translucent external protective doors 102 and 102', which can be designed as foldable double-section doors (102a, 102b, 102'a and 102'b) to reduce the coverage area when opened. The protective door is preferably not sealed and allows limited air circulation from the environment. Each cluster is configured to occupy a plurality of modular workstations for performing different analytical methods, which will be further described below. Housing 101 is flexible and expandable and can occupy fewer or more analytical clusters (additional clusters). Protective doors (102a, 102b, 102'a and 102'b) can be removed from their hinges for repair / maintenance procedures. The protection doors (102a, 102b, 102'a and 102'b) may be set by opening a detector (switch) which completely or partially shuts down the system operation for safety reasons.

[0060] Figure 2A The external dimensions of the housing of a dual cluster device 200a according to an exemplary embodiment of the present invention are shown. The device 200a is shown to have a structural dimension of 1.27×0.56 meters. Figure 2B and Figure 2C Schematic diagrams of dual cluster devices 200b and 200c with opened external protection doors according to other aspects of the present invention are shown. Figure 2DA schematic diagram of a single cluster device 200d according to another aspect of the present invention is shown. It should be clearly understood that the above dimensions and structural components are exemplary in nature and should not limit the scope of the present invention. The device 101 is flexible to occupy any desired number of clusters depending on the application.

[0061] Refer to Figure 1 , the device 101 is connected to a human-machine (HM) interface 103 via a connection medium 104. The HM interface 103 may be a communication device, such as a personal computer, a laptop, a mobile phone, a tablet computer, a paging device, etc. The communication device 103 may be connected to the process control device 101 via a wired or wireless connection medium 104. The wired medium may include an Ethernet cable, a fiber optic cable, etc. The wireless medium may include one or more of the Internet, a Bluetooth network, a wired LAN, a wireless LAN, a WiFi network, a Zigbee network, a Z-Wave network, or an Ethernet network. The HM interface 103 may be placed near the process control device 101, such as Figure 1 Alternatively, the HM interface 103 can be placed at a location away from the process control device 101. The HM interface can be connected to more than one process control device, allowing a user to control different process control devices through the same communication device. In other embodiments, two or more HM interfaces can be connected to a single process control device, allowing multiple operators to monitor and control the operation of the process control device.

[0062] Data from the various electrochemical and analytical processes performed in the workstations (their chemical compositions and concentrations, expected and actual ranges, operating conditions including errors and failures, replenishment requirements, process times (elapsed and remaining), analytical results, etc.) are transferred from the process control device 101 to the communication device 103. The communication device 103 can be configured to include a display screen that enables an operator to fully access the data collected and generated by the measurement and analytical methods running in the various workstations of the process control device 101. For example, the screen can provide information on the liquids used in the electrochemical process, including their current levels, lower and upper threshold limits, deviations from expected ranges, contamination levels, etc. The communication device 103 is also capable of controlling the process directly through commands from the communication device 103 or through access to the workstation of the process control device 101. The communication device 103 can also enable characterization, troubleshooting, and process improvements.

[0063] According to one aspect of the present invention, the system 100 provides the advantage of occupying less footprint because it can be mounted close to a wall and is fully accessible from the front during operation. All internal compartments / modules of the device 101 can be accessed from the front. The rear side of the device 101 can be closed after assembly or repair of the workstation. The device can also be repaired or inspected from the front, providing convenient access for the operator.

[0064] refer to Figure 3A , which shows an open structural diagram 300a of a process control device 301 including a dual cluster or dual wet parts cabinet configuration according to an embodiment of the present invention. The device 301 includes two (analysis) clusters formed by module doors 302a and 302b. The module doors 302a and 302b include a frame divided into a plurality of sub-clusters 303 with standard dimensions (e.g., 10×10 cm). Specific metrology or operating units can occupy the area of ​​one or more of these sub-clusters 303. These metrology units can be formed as "separate" workstations from standard sub-modules, which have the dimensions of a single or multiple sub-clusters and can be assembled on the frames of the module doors 302a and 302b. In a specific embodiment of the present invention, the weight of each single sub-cluster module is limited to 1KG—the total weight of the metrology module does not exceed, for example, 60KG for a 6×10 cluster (to maintain a stable center of mass for the entire system). The empty sub-cluster 304 is covered by a removable plate made of a chemically resistant material (e.g., plastic), assembled on the frame of the module door and sealed.

[0065] refer to Figure 4 , which shows an open block diagram 400 of a process control device 401 with an open module door 402. Behind the module door 402 of the wet parts cabinet - the compartment containing the chemical modules is located an electrical cabinet 407, which mainly includes low voltage electronic / electrical modules (controllers, etc.) - shown as partially assembled low voltage modules.

[0066] The module door 402 has a (rubber / silicone) sealing strip 409 on its outer edge, providing a seal between the wet parts cabinet and the electrical cabinet when the module door 402 is closed.

[0067] Seal 409 prevents chemicals from contaminating the electronic / electrical modules by creating different pressure conditions in the two compartments - underpressure (relative to ambient) in the wet parts cabinet and overpressure in the electrical cabinet.

[0068] The electrical cabinet 407 includes low voltage electronic / electrical modules (controllers, etc.), electrical connectors in the form of copper or optical cables, voltage / current stabilizers, regulators, protection circuits, switches, temperature and pressure controllers, etc. The electrical cabinet 407 is configured to interconnect various clusters of workstations. The electrical cabinet 407 also provides interconnectivity between different workstations for executing applications. The electrical cabinet 407 controls the power provided to the various workstations to ensure controlled execution of the application.

[0069] The wet parts cabinet may preferably contain a negative pressure relative to the environment to avoid leakage of chemicals into the electrical cabinet and from the system to the environment. During operation, the operator is protected from chemical leakage by a monitored protective door. As shown in FIG5 , in the event of a leak, the liquid is collected in a monitored secondary container of the chemical cabinet 503 for further emptying.

[0070] The air in the wet parts cabinet is continuously sucked out and replaced by outside air through the exhaust on the equipment. Figure 5A An exhaust device (also called a ventilation exhaust device, an exhaust ventilation device or a ventilation device) 506 ( Fig.10 The arrows in the figure show the side and bottom positions of the exhaust device. The exhaust device of this system can be connected to the exhaust system of the FAB. The exhaust ventilation device 506 is connected to the wet parts cabinet 501 and the chemical cabinet 503. In a preferred embodiment, the air in these cabinets is exchanged at least three times per minute. The pressure in the exhaust pipe of the ventilation device 506 is detected by a pressure sensor. In a specific embodiment, 75-120m is usually maintained at the sensor. 3 / h (60-150 Pascal). If the pressure difference between the ambient pressure and the pressure in the exhaust pipe of the ventilation device 506 is out of range, the pressure sensor detects it and displays it on the operation indicator 505.

[0071] Figure 6B A schematic diagram of a dual cluster or dual wet parts cabinet configuration having 6×12 clusters 602 is shown. Fig. 6A and Figure 7 Open block diagrams 600A and 700 of process control equipment including a single wet parts cabinet configuration with 6×12 clusters 601 and 701 are shown, respectively, according to other embodiments of the present invention.

[0072] Workstations can be formed on various subclusters to perform different electrochemical and analytical processes, such as Fig.14A , Fig. 14B and Fig. 14CEach workstation performs a defined task such as analysis, sampling, standard creation, etc., depending on the application. For example, a titration workstation 1400A can be formed by a cluster on the module door. Titration is a very common absolute method of quantitative chemical analysis to determine the concentration of an identified / known substance with very high accuracy. The various titration workstations can include acid-base titration workstations, photometric titration (PHT) workstations, stability index workstations, reduction / oxidation workstations, etc.

[0073] In an alternative embodiment, the electrochemical analysis-CVS workstation 1400B can be formed by a cluster on the module door. The electrochemical analysis technique uses potential / current to reduce / plating and oxidize / strip metal components onto / from a rotating disk electrode (RDE). The current-voltage curve is measured and evaluated to obtain the analysis results. Various electrochemical analysis workstations can include accelerator / leveler workstations, suppressor workstations, inorganic stability (Pb) workstations, etc.

[0074] In another embodiment, the high pressure liquid chromatography workstation 1400C can be formed by a cluster on the module door. HPLC works by separating and detecting single tank components. It analyzes organic additives, complexing agents, decomposition products, and leachables in photoresists.

[0075] During operation, liquids (chemicals, water, etc.) are moved into / out of the wet parts cabinet, depending on the respective workstation. Liquids can be temporarily stored in containers, mixed, heated or cooled as required. All liquids can be monitored and analyzed via various sensors located in the process control equipment. To simplify maintenance, different workstations can be equipped with standard identical equipment and components as often as possible. The process control equipment may also include software for executing, controlling and modifying processes on the process control equipment. The equipment configuration / parameters are stored in the memory of the process control equipment. The software also synchronizes sequences within the cluster of each workstation and within different workstations. The software also allows operators to add, delete and modify sequences executed in a workstation. The software may also allow operators to add, delete and modify applications executed in a workstation.

[0076] Refer to Figure 5A, which shows a schematic diagram of a process control device 500 showing various structural components. The wet parts cabinet 501 is located behind the front door and includes chemical modules (workstations), pipes, etc. assembled on a frame divided into standard sub-clusters. The device 500 includes a chemical cabinet 503, which stores various chemicals required for different processes run and / or replenished through the workstations. The chemical cabinet 503 supplies chemicals to the workstations according to the required application and schedule. As shown in Figure 3, the chemical cabinet 503 stores the required chemicals in holding devices (e.g., containers, bottles). These holding devices can be any suitable material, including but not limited to plastic, glass, steel or any other metal that will not react with and contaminate the stored chemicals. Preferably, in order to facilitate convenient loading / unloading, the chemical cabinet is provided as retractable shelves 306 and 307, which allow convenient access and organization, such as Figure 3B as shown in .

[0077] Figure 8 An electrical cabinet 800 is shown behind the module door of a process control device. The electrical cabinet 800 includes low voltage electronic / electrical modules (controllers, etc.), electrical connectors in the form of copper or optical cables, voltage / current stabilizers, regulators, protection circuits, switches, temperature and pressure controllers, etc. The electrical cabinet 800 is configured to interconnect various clusters of workstations. The electrical cabinet 800 also provides interconnectivity between different workstations for executing applications. The electrical cabinet 800 controls the power provided to the various workstations to ensure controlled execution of the application.

[0078] Fig. 9 A multi-slot wafer level packaging (WLP) board setup 901 connected to a dual cluster system 902 is shown. The WLP board setup 901 may include various tanks for performing the process of sampling and optionally replenishing with the system 902. The setup 901 may contain pre-wet tanks, rinse tanks, tin-silver, nickel, copper, and gold plating units (tanks). The system 900 enables fully automated process control, analysis, and integrated dosing. The system 900 also enables running four STDs and slipstream multiple metals on the same board.

[0079] refer to Fig.10 , the exhaust value information is displayed on an operation indicator 1001, which can display the information in a color-coded format. For example, exhaust values ​​within the range are displayed by a "green" color 1002, while exhaust values ​​outside the range are displayed by a "red" color 1003. Negative pressure monitoring is accomplished by a pressure sensor located in the exhaust pipe.

[0080] Reference now Fig.11, which shows a leak sensor 1101 in a wet parts cabinet. The leak sensor 1101 detects the leakage of liquid (chemicals, water, etc.) from the wet parts cabinet. As long as the leak sensor 1101 does not detect liquid, a "green" optical signal is displayed. If the leak sensor 1101 responds, then Fig.12 As shown in the figure, the optical signal is "red". When the "red" signal is displayed, one or more of the following action points may be automatically executed;

[0081] The actuator circuit is closed immediately.

[0082] The workstations in the wet parts cabinet do not pump any chemicals.

[0083] External supply lines used to fill bulk containers are closed.

[0084] Abort all current analysis and replenishment jobs.

[0085] The signal light turns red and the horn sounds.

[0086] The signal output informs an external receiver that the process control device is no longer ready for use. The signal output can be displayed on a connected communication device.

[0087] In a particular embodiment of the invention, a fan may be provided on the device to create an overpressure in the electrical cabinet. Fig.13 The location 1301 of the fan is shown under the cover on the top of the device 1300 frame. The fan provides overpressure in the electrical cabinet to avoid the intrusion of chemical vapors / dust. The rotational speed of the fan can be displayed on the device 1300 screen or the communication device screen, or on a separate indicator. Faults in the fan can also be displayed on the device 1300 or communication device screen or alarm signal light. A protective cover prevents contact with the fan in operation. The CDA pressure control (detector / control electronics) can be located in the cabinet. In a specific embodiment of the system, the system can allow process control through various steps, including but not limited to liquid replenishment, solid replenishment (direct metal replenishment (DMR)), discharge and feed to keep decomposition products and / or impurities below the desired range, as well as discharge and replenishment of ECP chemicals.

[0088] Process control equipment may include Fig.15 A barcode / QR code reader 1501 as shown in the communication device is provided to identify each chemical container before connecting the device to an analysis and / or dosage system. The chemicals may be used for analysis or replenishment purposes. The status of the chemical containers may be displayed on a screen 1502 of the communication device. The expiration date of each chemical may be read and stored in a chemical manager and may be displayed on a screen 1502 of the communication device. The system may also include level sensors for minimum and below minimum levels for each chemical container.

[0089] In case of replenishment, the desired replenishment amount of the chemical is correctly determined to achieve the target concentration in the tank. Liquid and solid replenishment (direct metal replenishment (DMR)) is performed based on ampere time, product-wafer pass, elapsed time and analytical results. Bleeding and feeding are performed to keep decomposition products and / or impurities below the desired range. It can be performed based on ampere time, product-wafer pass, elapsed time and analytical results just like replenishment. Bleeding and replenishment of ECP chemicals (low alpha solder, copper, nickel) are also performed based on ampere time, product-wafer pass, elapsed time and analytical results.

[0090] Fig.16 An exemplary system 1600 for implementing various aspects of the present invention is shown. System 1600 includes a data processor 1602, a system memory 1604, and a system bus 1616. System bus 1616 couples system components including but not limited to system memory 1604 to data processor 1602. Data processor 1602 can be any of a variety of available processors. Data processor 1602 refers to any integrated circuit or other electronic device (or set of devices) capable of performing operations on at least one instruction, including but not limited to a reduced instruction set core (RISC) processor, a CISC microprocessor, a microcontroller unit (MCU), a CISC-based central processing unit (CPU), and a digital signal processor (DSP). In addition, various functional aspects of data processor 1602 can be implemented separately as software or firmware associated with the processor. Dual microprocessors and other multi-processor architectures can also be used as data processor 1602.

[0091] The system bus 1616 may be any of several types of bus structures including a memory bus or memory controller, a peripheral bus or external bus, and / or a local bus using any of a variety of available bus architectures known to those of ordinary skill in the art.

[0092] The system memory 1604 may include computer-readable storage media including volatile memory and non-volatile memory. The non-volatile memory stores the basic input / output system (BIOS), which contains the basic routines for transferring information between elements within the system 1600. The non-volatile memory may include, but is not limited to, read-only memory (ROM), programmable ROM (PROM), electrically programmable ROM (EPROM), electrically erasable programmable ROM (EEPROM), or flash memory. The volatile memory includes random access memory (RAM) used as external cache memory. RAM is available in many forms, such as static RAM (SRAM), dynamic RAM (DRAM), synchronous DRAM (SDRAM), double data rate SDRAM (DDR SDRAM), enhanced SDRAM (ESDRAM), SynchLink TM DRAM (SLDRAM), Direct RAM (RDRAM), direct Dynamic RAM (DRDRAM) and Dynamic RAM (RDRAM).

[0093] System memory 1604 includes operating system 1606, which performs functions of managing system 1600 resources, establishing user interfaces, and executing and servicing application software. System applications 1608, modules 1610, and data 1612 provide various functions to system 1600.

[0094] The system 1600 also includes disk storage 1614. The disk storage 1614 includes, but is not limited to, devices such as a disk drive, a floppy disk drive, a tape drive, a Jaz drive, a Zip drive, an LS-100 drive, a flash memory card, or a memory stick. In addition, the disk storage 1614 may include storage media, either independently or in combination with other storage media, including but not limited to optical disk drives, such as a compact disk ROM device (CD-ROM), a CD recordable drive (CD-R drive), a CD rewritable drive (CD-RW drive), or a digital versatile disk ROM drive (DVD-ROM).

[0095] The user inputs commands or information to the system 1600 through input devices 1624. Input devices 1624 include, but are not limited to, pointing devices (e.g., mice, trackballs, styluses, etc.), keyboards, microphones, joysticks, satellite dishes, scanners, TV tuner cards, digital cameras, digital video cameras, web cameras, etc. Input devices 1624 are connected to the data processor 1602 through the system bus 1616 via interface ports 1622. For example, interface ports 1622 include serial ports, parallel ports, game ports, and universal serial buses (USB).

[0096] Output devices 1620, such as monitors, speakers, and printers, are used to provide output from the data processor 1602 to a user. As another example, a USB port can be used as an input device 1624 to provide input to the system 1600 and output information from the system 1600 to an output device 1620. The output device 1620 is connected to the data processor 1602 via an output adapter 1618 through the system bus 1616. For example, the output adapter 1632 may include a video card and a sound card that provide a means of connection between the output device 1620 and the system bus 1616.

[0097] The system 1600 can communicate with a telecommunication device 1628 to exchange information. The telecommunication device 1628 can be a personal computer, server, router, network PC, workstation, microprocessor-based device, mobile phone, laptop, tablet computer, paging device, peer device or other public network node, etc.

[0098] The network interface 1626 includes wired and / or wireless communication networks, such as local area networks (LANs) and wide area networks (WANs). Local area network technologies include fiber distributed data interface (FDDI), copper distributed data interface (CDDI), Ethernet, token ring, etc. WAN technologies include, but are not limited to, point-to-point links, circuit switching networks, such as integrated services digital networks (ISDN) and their variants, packet switching networks, and digital subscriber lines (DSL).

[0099] Although the preferred embodiments of the present invention and its advantages have been disclosed in the above detailed description, the present invention is not limited thereto but only within the scope of the appended claims.

[0100] As is apparent to those skilled in the art, the utility model can be easily produced in other specific forms without departing from its essential features. Therefore, the present embodiment is considered to be merely illustrative and not restrictive, the scope of the utility model is indicated by the claims rather than the foregoing description, and therefore all changes therein are intended to be included therein.

Claims

1. A system (100, 500) for monitoring and controlling processing of a microelectronic substrate, the system comprising: A housing (101) having sealing doors (102, 102'), each of the sealing doors having a front side and a rear side; One or more wet parts cabinets (501) arranged on the front side of each of the sealed doors, wherein each of the wet parts cabinets is divided into a plurality of clusters and occupies one or more chemical workstations (1400A, 1400B, 1400C), the chemical workstations being configured to perform one or more analytical applications; One or more electrical cabinets (507, 800) disposed on the rear side of each of the sealed doors, wherein each of the electrical cabinets is configured to include electrical components for controlling the operation of the workstation; one or more chemical cabinets (503) for storing and providing chemicals required for analytical applications run by the workstation; and an interface (104) for connecting to one or more computing devices (103), wherein the analysis application can be monitored and controlled by the computing devices, Therein, a negative pressure is maintained in the wet parts cabinet and an overpressure is maintained in the electrical cabinet.

2. The system according to claim 1, wherein: The system can flexibly increase or decrease the number of occupied clusters through an expandable modular design.

3. The system according to claim 1, wherein: The system is modular in nature and the ChemStation can be installed as a modular workstation for performing different electrochemical applications.

4. The system according to claim 1, wherein: The system is configured to connect with similar systems to form a larger system for performing the analytical application.

5. The system according to claim 1, wherein: The wet parts cabinet consists of a Lego-like structure mounted with standard chemical and analytical modules.

6. The system according to claim 1, wherein: The interface includes a wired interface, a wireless interface, or a combination of the wired interface and the wireless interface.

7. The system according to claim 1, wherein: The execution process and analysis results of the analysis application run by the workstation can be displayed on the screen of the computing device.

8. The system according to claim 1, wherein: The workstation includes one or more of a titration workstation, an electrochemical analysis-CVS workstation, a high pressure liquid chromatography HPLC workstation and a spectrophotometer workstation. 9 . The system of claim 1 , further comprising a memory unit configured to store configurations and parameters of the analysis application executed by the workstation.

10. The system of claim 1, further comprising a capacity top tray (502) configured to provide support to an upper structure of the system including the wet parts cabinet and the electrical cabinet.

11. The system of claim 1, further comprising a volume bottom tray (504) configured to provide support to a bottom structure of the system including the chemical cabinet.

12. The system of claim 1, wherein: The electrical cabinet is configured to control power provided to the workstation to ensure controlled execution of an application.

13. The system of claim 1, wherein: The electrical cabinet is also configured to provide interconnectivity between the workstations for performing the analytical application.

14. The system of claim 1, wherein: Each of the sealing doors comprises a sealing strip (409) at an outer edge for sealing the wet parts cabinet with the electrical cabinet when the sealing door is closed.

15. The system of claim 14, wherein: The sealing strip is configured to maintain different pressure conditions in the wet parts cabinet and a corresponding electrical cabinet.

16. The system of claim 15, wherein: The negative pressure is maintained in the wet parts cabinet to prevent chemicals from leaking into the electrical cabinet and out of the system.

17. The system of claim 15, wherein: The overpressure is maintained in the electrical cabinet to avoid the intrusion of chemical vapors and dust.

18. The system of claim 17, wherein: The overpressure is maintained in the electrical cabinet by means of a fan arranged on the upper side of the system.

19. The system of claim 1, further comprising a ventilation exhaust device (506) for drawing air from the wet parts cabinet and the chemical cabinet.

20. The system of claim 1, wherein: The housing includes a transparent or translucent door for an operator to observe the exterior of the wet parts cabinet, wherein the door is designed as a foldable double-section door to reduce the coverage area when opened.

21. The system of claim 1, further comprising a pressure sensor configured to detect pressure values ​​in the wet parts cabinet and the chemical cabinet.

22. The system of claim 21, further comprising an operation indicator (505) for displaying the pressure sensor value in a color-coded format.

23. The system of claim 1 further comprising a pressure control system in the wet parts cabinet and the chemical cabinet.

24. The system of claim 1, wherein: The wet parts cabinet comprises a leakage sensor (1101) configured to detect leakage of liquid from the wet parts cabinet.

25. The system of claim 24, wherein: Leak conditions are displayed in a color-coded format via an optical indicator on the leak sensor.

26. The system of claim 1, wherein: The chemical cabinet is configured as a retractable shelf to facilitate convenient loading / unloading of the chemicals.

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