Wafer anti-tilting spin dryer

Abstract

The utility model discloses a wafer anti-tilting spin dryer, which comprises a shell, a rotary drum, a wafer box and clamping assemblies, the rotary drum is rotatably arranged in the shell, the clamping assemblies are arranged on the edge of the bottom of an inner cavity of the rotary drum in an annular array mode, each clamping assembly comprises a safety fence and two baffles, and the safety fences are arranged on the periphery of the bottom of the inner cavity of the rotary drum. The two baffles are parallel and vertically arranged on the inner wall of the rotary drum, the safety fence is arranged in front of the two baffles in a lifting mode, the two ends of the safety fence extend to the outer sides of the two baffles, vertical sliding grooves are formed in the outer sides of the baffles respectively, and sliding blocks located in the sliding grooves are arranged at the two ends of the safety fence. According to the wafer anti-tilting spin dryer, the number of wafers spin-dried at a time is increased, and the safety of the wafers spin-dried at a time is improved.

Description

Technical Field

[0001] The utility model relates to the field of wafer drying equipment, in particular to a wafer anti-tilt drying machine. Background Art

[0002] The preparation of the wafer requires processes such as forming and grinding and polishing to obtain the required surface flatness and smoothness, and cleaning after grinding and polishing. In order to avoid residual cleaning solution on the surface of the wafer, it also needs to be dried.

[0003] Wafers can be dried by centrifuging. Place the carrier containing the wafers in the centrifuge, and the rotation of the drum drives the carrier and the wafers to spin centrifugally to remove the surface moisture. Ordinary drums do not have a mechanism to fix the carrier, which makes the carrier unstable in the drum, and it cannot be stacked up and down, and it is easy to tip over, which affects the number of wafers that can be dried in a single time and the safety, which needs to be improved. Utility Model Content

[0004] The utility model aims to provide a wafer anti-tilt spin dryer to prevent wafers and carriers from tipping over, thereby increasing the number of wafers that can be spun dry at a single time and ensuring safety.

[0005] To achieve this purpose, the utility model adopts the following technical solutions:

[0006] A wafer anti-tilt spin dryer comprises: a shell, a rotating drum, a wafer box and a clamping assembly, wherein the rotating drum is rotatably arranged in the shell, the clamping assembly is arranged in a ring array at the bottom edge of the inner cavity of the rotating drum, the clamping assembly comprises a safety fence and two baffles, the two baffles are parallel and vertically arranged on the inner wall of the rotating drum, the wafer box is arranged between the two baffles, the safety fence is liftably arranged in front of the two baffles, both ends of the safety fence extend to the outside of the two baffles, the outsides of the baffles are respectively provided with vertical slide grooves, and both ends of the safety fence are provided with sliders located in the slide grooves.

[0007] Wherein, a cover plate is arranged on the top of the shell.

[0008] Wherein, a flat plate is arranged at the bottom of the shell, and a reduction box for driving the rotating drum to rotate is arranged in the flat plate.

[0009] Wherein, a motor is arranged at the bottom of the reduction box, and a bracket is arranged at the bottom of the flat plate.

[0010] Wherein, a liquid discharge pipe joint connected with the shell is arranged at the bottom of the flat plate.

[0011] Wherein, threaded holes are arranged in the upper and lower intervals in the slide groove, and screws are arranged in the threaded holes.

[0012] Wherein, the safety fence is a C-shaped bent plate structure.

[0013] The beneficial effects of the utility model include: a wafer anti-tilt spin dryer, which arranges wafers in a wafer box with upper and lower intervals, and places the wafer box in a rotating drum, which is positioned by a clamping assembly. The structure is stable and the tipping problem can be avoided. Multiple wafer boxes can also be stacked up and down to increase the number of wafers that can be dried at a single time. Safety bars are used for protection to improve the safety of the wafers during the drying process. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 It is a structural schematic diagram of the utility model;

[0015] Figure 2 yes Figure 1 Top view of the safety rail. DETAILED DESCRIPTION

[0016] Combine the following Figure 1 to Figure 2 The technical solution of the utility model is further illustrated by specific embodiments.

[0017] like Figure 1 The wafer anti-tilt spin dryer shown includes: a shell 1, a rotating drum 2, a wafer box 6 and a clamping assembly. The rotating drum 2 is rotatably arranged in the shell 1. In this embodiment, a flat plate 10 is arranged at the bottom of the shell 1, and a bracket 14 is arranged at the bottom of the flat plate 10 to ensure a certain height from the ground.

[0018] The flat plate 10 is provided with a reduction box 13 for driving the rotating drum 2 to rotate, and a motor 12 is provided at the bottom of the reduction box 13 to drive the rotating drum 2 to rotate. The motor 12 can be controlled by a PLC to adjust the rotation speed.

[0019] A cover plate 5 is provided on the top of the housing 1, which can be opened and closed to facilitate the placement of the wafer box 6, and closed for safety protection when the drum 2 rotates. A drainage pipe joint 11 connected to the housing 1 is provided at the bottom of the flat plate 10 to facilitate the discharge of waste liquid.

[0020] The clamping assembly is arranged in a circular array at the bottom edge of the inner cavity of the drum 2. The clamping assembly includes a safety fence 4 and two baffles 3. The two baffles 3 are arranged parallel and vertically on the inner wall of the drum 2. The wafer box 6 is arranged between the two baffles 3. The interval between the two baffles 3 corresponds to the width of the wafer box 6, and the positioning is precise.

[0021] The safety fence 4 is arranged in front of the two baffles 3 in a liftable manner, and both ends of the safety fence 4 extend to the outside of the two baffles 3. Figure 2 As shown, the safety fence 4 is a C-shaped bent plate structure, which can limit the tail of the wafer box 6, avoid the tilting problem of the wafer box 6, and improve the safety of the wafers during the spin-drying process.

[0022] like Figure 1 As shown, vertical slide grooves 7 are respectively provided on the outer sides of the baffles 3, and sliders 9 located in the slide grooves 7 are provided at both ends of the safety fence 4 to facilitate the up and down adjustment of the safety fence 4 and prevent the safety fence 4 from detaching.

[0023] In order to increase the number of wafers that can be dried at a single time, multiple wafer boxes 6 can be stacked between two baffles 3. In addition, in order to achieve protection after multiple wafer boxes 6 are stacked, multiple safety fences 4 at intervals above and below are required to correspond one to one.

[0024] In this embodiment, threaded holes are provided at intervals in the upper and lower parts of the slide slot 7 , and screws 8 are provided in the threaded holes. The downward movement of each safety fence 4 is limited by the screws 8 to maintain a high degree of uniformity with the position of the corresponding wafer box 6 .

[0025] The above contents are only preferred embodiments of the present invention. For ordinary technicians in this field, according to the concept of the present invention, there will be changes in the specific implementation methods and application scopes. The contents of this specification should not be understood as limiting the present invention.

Claims

1. A wafer anti-tilt drying machine, characterized in that: include: A shell, a rotating drum, a wafer box and a clamping assembly, wherein the rotating drum is rotatably arranged in the shell, the clamping assembly is arranged in a ring array at the bottom edge of the inner cavity of the rotating drum, the clamping assembly includes a safety fence and two baffles, the two baffles are parallel and vertically arranged on the inner wall of the rotating drum, the wafer box is arranged between the two baffles, the safety fence is liftably arranged in front of the two baffles, the two ends of the safety fence extend to the outside of the two baffles, the outsides of the baffles are respectively provided with vertical slide grooves, and the two ends of the safety fence are provided with sliders located in the slide grooves.

2. The wafer anti-tilt drying machine according to claim 1, characterized in that: A cover plate is arranged on the top of the shell.

3. The wafer anti-tilt drying machine according to claim 1, characterized in that: A flat plate is arranged at the bottom of the shell, and a reduction box for driving the rotating drum to rotate is arranged in the flat plate.

4. The wafer anti-tilt drying machine according to claim 3, characterized in that: A motor is arranged at the bottom of the reduction box, and a bracket is arranged at the bottom of the flat plate.

5. The wafer anti-tilt drying machine according to claim 3, characterized in that: The bottom of the flat plate is provided with a liquid discharge pipe joint which is connected with the shell.

6. The wafer anti-tilt drying machine according to claim 1, characterized in that: The slide groove is provided with threaded holes at intervals up and down, and screws are provided in the threaded holes.

7. The wafer anti-tilt drying machine according to claim 1, characterized in that: The safety fence is a C-shaped bent plate structure.

Images