Manipulator calibration jig for wafer boat position in wet etching equipment

Abstract

The utility model discloses a manipulator calibration jig aiming at the position of a wafer boat in wet etching equipment. The manipulator calibration jig comprises a main body frame and a plurality of supporting pieces, wherein a plurality of positioning columns are arranged at the lower end of the main body frame; right-angle placing grooves are formed in the upper ends of the inner sides of the supporting pieces, and chamfers are arranged at the upper ends of the right-angle placing grooves. According to the utility model, the trouble that the wafer taking and placing position of the first manipulator cannot be well observed in the installation and debugging process of the existing semiconductor equipment is solved, and the risk of damaging the wafer and the equipment is reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor equipment installation and debugging, and in particular to a manipulator calibration fixture for a crystal boat position in a wet etching device. Background Art

[0002] Among the many semiconductor wet process machines, there is a device that uses a spray cleaning system to batch process photoresist and other thin film stripping. The main layout of the device is as shown in the attached manual. Figure 2 As shown, its main workflow is as follows:

[0003] 1. The first robot moves the wafers in the front-opening wafer box on the workstation to the wafer boat and fills up 4 wafer boats in sequence;

[0004] 2. The six-axis robot moves the wafer boat into the wafer processing room;

[0005] 3. After the wafer processing is completed, the six-axis robot moves the wafer boat to the wafer boat stage;

[0006] 4. The first robot takes the wafer out of the wafer boat and moves it into the front-opening wafer box;

[0007] 5. Start the next cycle.

[0008] In the above steps, the wafer boat serves as a carrier for batch transfer of wafers. Its position on the wafer boat stage is related to the grasping accuracy of the six-axis robot and the accuracy of the first robot in placing the wafers. Therefore, it is necessary to set the starting position of the robot arm for picking up and placing wafers at each workstation during the installation and debugging phase.

[0009] There is a method for setting the starting position of the first robot to pick up and place the wafer on the wafer boat carrier (see the attached manual). Figure 3~4 As shown) are as follows:

[0010] 1. The installation and debugging personnel operate the first manipulator through the robot teaching pendant, and the first manipulator takes the wafer out of the front-opening wafer box on the workstation;

[0011] 2. The first robot adjusts its posture and delivers the wafer to the first layer of the wafer boat;

[0012] 3. The crystal boat is a semi-enclosed structure, and the installation and debugging personnel can observe the internal situation through the front of the crystal boat;

[0013] 4. Slowly move the robotic arm forward into the wafer boat, and the installation and debugging personnel will look through the front of the wafer boat to determine whether the position of the robotic arm meets the requirements;

[0014] 5. After determining the position of the robotic arm, the installation and debugging personnel can record the starting height of the robotic arm for picking up and placing wafers under the current wafer boat position.

[0015] Disadvantages of this method:

[0016] 1. The crystal boat is made of high-purity PFA material, which is opaque and the observation space provided by the front of the crystal boat is limited;

[0017] 2. When the installation and debugging personnel observe the position of the first robot to pick up and place the wafer through the front field of view of the wafer boat, they often cannot quickly determine the pick-up and placement position of the robot arm, which prolongs the installation and debugging time and reduces work efficiency;

[0018] 3. There are errors in squint visual observation, which may cause wafer scrapping or damage to equipment in severe cases. Summary of the invention

[0019] According to an embodiment of the utility model, a robot calibration fixture for the position of a wafer boat in a wet etching device is provided, comprising:

[0020] A main frame, wherein a plurality of positioning columns are arranged at the lower end of the main frame;

[0021] A plurality of support members are provided, wherein the upper inner ends of the support members are provided with right-angled placement grooves, and the upper ends of the right-angled placement grooves are provided with chamfers.

[0022] Furthermore, the number of the supporting members is 3.

[0023] Furthermore, the support member is made of self-lubricating material.

[0024] Furthermore, the middle portion of the main frame is hollowed out.

[0025] Furthermore, a plurality of positioning holes are arranged on the main frame, and the plurality of positioning holes correspond to the plurality of positioning columns one by one, and the plurality of positioning columns are installed at the lower end of the main frame through the corresponding positioning holes.

[0026] According to the robot calibration fixture for the position of the wafer boat in the wet etching equipment according to the embodiment of the utility model, the problem of not being able to well observe the position of the first robot to pick up and place the wafer during the installation and debugging of the existing semiconductor equipment is solved, and the risk of damaging the wafer and the equipment is reduced.

[0027] It is to be understood that both the foregoing general description and the following detailed description are exemplary, and are intended to provide further explanation of the technology as claimed. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 A schematic diagram of a semiconductor device provided with a wafer box;

[0029] Figure 2 It is a schematic diagram of the internal layout of the wet etching equipment;

[0030] Figure 3This is a schematic diagram of the crystal boat;

[0031] Figure 4 It is a schematic diagram of the first robot calibrating the position of the wafer boat in the wet etching equipment in the prior art;

[0032] Figure 5 It is a schematic diagram of a stereogram according to an embodiment of the utility model;

[0033] Figure 6 It is a schematic diagram of loading wafers according to an embodiment of the utility model;

[0034] Figure 7 It is a side view of a support member according to an embodiment of the utility model;

[0035] Figure 8 A schematic diagram of using the calibration fixture in the embodiment of the utility model to calibrate the position of the wafer boat in the wet etching equipment;

[0036] Fig. 9 It is a schematic diagram of using the calibration fixture in the embodiment of the utility model to calibrate the external workstation of the wet etching equipment;

[0037] Among them, 1. theme frame; 11. positioning column; 12. positioning hole; 2. support; 21. right-angle placement groove; 3. workstation; 4. first robot; 5. crystal boat; 7. wafer box; 8. wafer; 9. processing chamber; 10. six-axis robot. DETAILED DESCRIPTION

[0038] The preferred embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings to further illustrate the present invention.

[0039] First, combine Figures 5 to 9 A robot arm calibration fixture for the position of a wafer boat in a wet etching device according to an embodiment of the utility model is described, which is used in the technical field of semiconductor device installation and debugging and has a wide range of application scenarios.

[0040] like Figures 5 to 9 As shown, the robot arm calibration fixture for the position of the wafer boat in the wet etching equipment according to the embodiment of the utility model comprises:

[0041] A main frame 1, wherein a plurality of positioning columns 11 are arranged at the lower end of the main frame 1;

[0042] A plurality of support members 2 are provided, wherein a right-angle placement groove 21 is provided at the inner upper end of the support member 2, and a chamfer is provided at the upper end of the right-angle placement groove 21.

[0043] Further, if Figures 5 and 6 As shown, in this embodiment, the number of the supporting members 2 is three.

[0044] Furthermore, in this embodiment, the support member 2 is made of self-lubricating material.

[0045] Further, if Figure 5 As shown, in this embodiment, the middle part of the main frame 1 is hollowed out.

[0046] Further, if Figure 5 As shown, in this embodiment, a plurality of positioning holes 12 are provided on the main frame 1 , and the plurality of positioning holes 12 correspond one-to-one to the plurality of positioning columns 11 , and the plurality of positioning columns 11 are installed at the lower end of the main frame 1 through the corresponding positioning holes 12 .

[0047] Structure Description:

[0048] A. The calibration fixture is divided into three layers: upper, middle and lower. The upper support 2 can be used to place wafers used for debugging the first manipulator 4. The middle layer is the main frame 1 of the fixture, and the lower layer is the positioning column 11 of the fixture.

[0049] B. When a 300 mm diameter wafer is placed on the upper layer of the fixture, the wafer is completely fixed by the three support members 2 on the upper layer of the fixture. At this time, the relative position relationship between the wafer and the wafer boat carrier is consistent with the position relationship when the wafer is on the first layer in the wafer boat; (e.g. Figure 5 shown)

[0050] C. The three upper support members 2 are made of self-lubricating material, and the part that receives the wafer is chamfered to ensure that the support members 2 will not damage the wafer; (such as Figure 6 shown)

[0051] D. The main frame 1 of the middle layer adopts a partially hollow structure, which reduces the overall weight while ensuring the rigidity and strength of the main body, making it convenient for installation and commissioning personnel to carry;

[0052] E. The positioning columns 11 on the lower layer are consistent with the wafer boat positioning columns 11 to simulate the positioning relationship of the wafer boat on the wafer boat stage.

[0053] Working principle: Place the calibration jig on the wafer boat stage, and under the guidance of the positioning hole, make the calibration jig consistent with the position of the wafer boat when the robot takes and places the wafer; move the first robot 4 to the position of the wafer boat jig, so that the first robot 4 takes and places the wafer; slowly lift the first robot 4 so that the wafer can be taken out by the first robot 4; slowly lower the first robot 4 so that the wafer can accurately fall into the upper layer of the jig; at the same time, record the pick-up and placement position of the arm on the robot teaching device, and the above completes the position login of the first robot 4 on a single wafer boat on the wafer boat stage.

[0054] Above, refer to Figures 5 to 9A robot calibration fixture for the position of a wafer boat in a wet etching device according to an embodiment of the utility model is described, which solves the problem that the position of the first robot 4 for picking up and placing wafers cannot be well observed during the installation and debugging of existing semiconductor equipment, and reduces the risk of damaging the wafer and the equipment.

[0055] It should be noted that, in this specification, the terms "include", "comprises" or any other variations thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprises..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0056] Although the content of the utility model has been described in detail through the above preferred embodiments, it should be appreciated that the above description should not be considered as a limitation of the utility model. After reading the above content, various modifications and substitutions of the utility model will be obvious to those skilled in the art. Therefore, the protection scope of the utility model should be limited by the attached claims.

Claims

1. A robot calibration fixture for the position of a wafer boat in a wet etching device, characterized in that: Include: A main frame, wherein a plurality of positioning columns are arranged at the lower end of the main frame; A plurality of support members, wherein the upper inner end of each support member is provided with a right-angle placement groove, and the upper end of each right-angle placement groove is provided with a chamfer; The main frame is provided with a plurality of positioning holes, the plurality of positioning holes correspond to the plurality of positioning posts one by one, and the plurality of positioning posts are installed at the lower end of the main frame through the corresponding positioning holes.

2. The robot arm calibration fixture for the wafer boat position in the wet etching equipment according to claim 1, characterized in that: The supporting member is made of self-lubricating material.

3. The robot arm calibration fixture for the wafer boat position in the wet etching equipment as claimed in claim 1, characterized in that: The middle part of the main frame is hollowed out.

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