Mask cleaning device

Abstract

The utility model belongs to the technical field of photovoltaic cell manufacturing equipment, and discloses a mask cleaning device. The device includes a hanger, a cleaning mechanism, and a transfer mechanism. The hanger is used to detachably fix the mask, the cleaning mechanism is used to clean the mask after alkali cleaning, and the transfer mechanism is used to drive the hanger to perform lifting and lateral movements to perform alkali cleaning, cleaning, and drying of the mask. The device makes the loading and unloading and transfer processes of the mask faster and more accurate, thereby reducing the operation time and errors and improving the efficiency of the cleaning process. At the same time, it avoids the use of ultrasonic cleaning, reduces the possibility of damage to the mask during the cleaning process, and avoids the complex setting of the pipeline, which can greatly simplify the structure of the cleaning device and reduce the cost of the cleaning device.

Description

Technical Field

[0001] The utility model relates to the technical field of photovoltaic cell manufacturing equipment, in particular to a mask cleaning device. Background Art

[0002] In the process of photovoltaic cell manufacturing, the proximity exposure process is an important manufacturing step, which relies on the mask to filter the light and then realize the patterning of the cell. However, during the long-term use of the mask, dust is easily deposited on its surface, and there will be colloid residues during the patterning process, which may affect the accuracy of the patterning. Therefore, it is very important to clean the mask surface regularly.

[0003] Although the mask cleaning devices currently on the market can solve the cleaning problem to a certain extent, they still have many shortcomings. First, many devices use ultrasonic waves to assist in cleaning. However, due to the high frequency of ultrasonic waves, there is a risk of probabilistic damage to the mask. Secondly, most cleaning devices only support single-sided cleaning, which requires frequent flipping during the cleaning process. This not only increases the complexity of the process and reduces the cleaning efficiency, but also may cause damage to the mask during the flipping process. In addition, the existing cleaning process is usually more complicated and requires the configuration of multiple pipelines, making the structure of the cleaning device cumbersome and costly. At the same time, the way the mask is fixed is also a technical problem. Inappropriate fixing methods can easily cause bumps and damage to the mask during the cleaning process.

[0004] Based on the above, a mask cleaning device is urgently needed to solve at least one of the above technical problems. Utility Model Content

[0005] The utility model aims to provide a mask cleaning device, which can efficiently, safely and simply complete the mask cleaning operation.

[0006] To achieve this purpose, the utility model adopts the following technical solutions:

[0007] A mask cleaning device, comprising:

[0008] A hanger, the hanger is used to detachably fix the mask;

[0009] A cleaning mechanism, the cleaning mechanism at least comprising a cleaning tank and a drying tank, the cleaning tank being used to clean the mask after alkali cleaning, and the drying tank being used to dry the mask;

[0010] The transfer mechanism is used to move the hanger to a preset position, and the preset position at least includes a position in the cleaning tank for cleaning the mask and a position in the drying tank for drying the mask.

[0011] Preferably, the cleaning tank comprises at least a first cleaning tank, a second cleaning tank and a third cleaning tank, wherein the first cleaning tank is used for alkali cleaning of the mask, the second cleaning tank is used for cleaning the mask, and the third cleaning tank is used for cleaning the mask;

[0012] The first cleaning tank is provided with a reflux system to reflux the alkaline cleaning solution for reuse, and / or the second cleaning tank is provided with a reflux system to reflux the cleaning solution for reuse.

[0013] Preferably, the cleaning tank comprises at least a first cleaning tank and a second cleaning tank, wherein the first cleaning tank is used for alkali cleaning of the mask, and the second cleaning tank is used for cleaning the mask;

[0014] The first cleaning tank is provided with a reflux system to reflux the alkaline cleaning solution for reuse, and / or the second cleaning tank is provided with a reflux system to reflux the cleaning solution for reuse.

[0015] Preferably, the second cleaning tank is provided with the reflux system, and the reflux system comprises a cleaning liquid temporary storage tank and a first recovery pipe and a reflux pipe connected with the second cleaning tank, the first recovery pipe is used to flow the cleaning liquid in the second cleaning tank into the cleaning liquid temporary storage tank, and the reflux pipe is used to flow the cleaning liquid in the cleaning liquid temporary storage tank into the second cleaning tank;

[0016] The second cleaning tank also includes a drain pipe for discharging the cleaning liquid;

[0017] The cleaning mechanism includes a first cleaning state and a second cleaning state. In the first cleaning state, the valves on the first recovery pipe and the reflux pipe are both opened, and the valve on the discharge pipe is closed; in the second cleaning state, the valves on the first recovery pipe and the reflux pipe are both closed, and the valve on the discharge pipe is opened.

[0018] Preferably, the cleaning tank comprises at least a first cleaning tank, and the first cleaning tank is used for alkali cleaning and cleaning the mask;

[0019] The cleaning mechanism further comprises a first nozzle for cleaning the mask, wherein the first nozzle is respectively connected to an alkali solution tank and a first water storage tank through pipelines;

[0020] The cleaning mechanism includes a third cleaning state and a fourth cleaning state. In the third cleaning state, the first nozzle is connected to the alkali solution tank, and the first nozzle is not connected to the first water storage tank, so that the first nozzle can spray out the alkali cleaning solution. In the fourth cleaning state, the first nozzle is not connected to the alkali solution tank, and the first nozzle is connected to the first water storage tank, so that the first nozzle can spray out the cleaning solution.

[0021] Preferably, a first recovery pipe is provided between the first water storage tank and the first cleaning tank to recover the cleaning liquid;

[0022] The first nozzle is also connected to a second water storage tank via a pipeline, and the cleaning mechanism includes a fifth cleaning state. In the fifth cleaning state, the first nozzle is connected to the second water storage tank so that the first nozzle can spray cleaning liquid.

[0023] Preferably, the cleaning tank comprises at least a first cleaning tank and a second cleaning tank, wherein the first cleaning tank is used for cleaning the first surface of the mask plate, and the second cleaning tank is used for cleaning the second surface of the mask plate.

[0024] Preferably, a liquid level sensor is provided in the cleaning tank to detect the height of the liquid level in the cleaning tank.

[0025] Preferably, at least two air cutting air knives are arranged in the drying tank, and the air cutting air knives can blow air toward the mask from both sides of the mask;

[0026] The air outlet of the air cutting air knife is provided with a heater, and the heater is used to heat the air flow.

[0027] Preferably, the hanger is provided with a first positioning structure, and the cleaning mechanism is provided with a second positioning structure, and the first positioning structure and the second positioning structure are detachably connected to limit the position of the hanger so as to limit the position of the hanger to the cleaning mechanism;

[0028] The first positioning structure comprises a positioning piece, and the positioning piece is disposed at at least one end of the hanger along the length or width direction of the mask;

[0029] The second positioning structure comprises a positioning seat, which is fixedly arranged and has a positioning groove, and the positioning member can be inserted into the positioning groove in a limited position.

[0030] Beneficial effects of the utility model: the mask cleaning device makes the loading and unloading and transfer process of the mask faster and more accurate, thereby reducing the time and error of manual operation and improving the efficiency of the overall cleaning process. At the same time, the use of alkaline cleaning, cleaning and drying avoids the use of ultrasonic cleaning, reducing the possibility of damage to the mask during the cleaning process. The cleaning process is carried out in an orderly manner, avoiding the complex setting of the pipeline, which can greatly simplify the structure of the cleaning device and reduce the cost of the cleaning device. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] Figure 1 It is a three-dimensional diagram of the mask cleaning device in the first embodiment provided by the utility model;

[0032] Figure 2 It is a front view of the mask cleaning device in the first embodiment provided by the utility model;

[0033] Figure 3 is a partial structural schematic diagram of a drying tank in the mask cleaning device in the first embodiment;

[0034] Figure 4 It is a three-dimensional diagram of a mask cleaning device in a second embodiment provided by the utility model;

[0035] Figure 5 It is a front view of a mask cleaning device according to a second embodiment of the present invention;

[0036] Figure 6 This is a connection diagram of the reflux system in the second embodiment provided by the utility model;

[0037] Figure 7 It is a three-dimensional diagram of a mask cleaning device in a third embodiment provided by the utility model;

[0038] Figure 8 It is a front view of a mask cleaning device in a third embodiment provided by the utility model;

[0039] Fig. 9 This is a connection diagram of the first nozzle in the third embodiment provided by the utility model;

[0040] Fig.10 It is a front view of a mask cleaning device in a fourth embodiment provided by the utility model.

[0041] In the figure:

[0042] 1. Hanger; 11. Positioning piece;

[0043] 21. First cleaning tank; 211. First nozzle; 212. First liquid level sensor; 22. Second cleaning tank; 221. Second nozzle; 222. Second liquid level sensor; 23. Third cleaning tank; 231. Third nozzle; 24. Drying tank; 241. Air cutting wind knife; 25. Tank cover; 26. Positioning seat;

[0044] 31. Cleaning liquid temporary storage tank; 32. First recovery pipeline; 33. Reflux pipeline; 34. Alkaline solution tank; 35. First water storage tank; 36. Second water storage tank. DETAILED DESCRIPTION

[0045] The present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. It is to be understood that the specific embodiments described herein are only used to explain the present invention, rather than to limit the present invention. It should also be noted that, for ease of description, only the parts related to the present invention, rather than all structures, are shown in the accompanying drawings.

[0046] In the description of the present invention, unless otherwise clearly specified and limited, the terms "connected", "connected", and "fixed" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0047] In the present utility model, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may include that the first and second features are in direct contact, or may include that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, a first feature being "above", "above" and "above" a second feature includes that the first feature is directly above and obliquely above the second feature, or simply indicates that the first feature is higher in level than the second feature. A first feature being "below", "below" and "below" a second feature includes that the first feature is directly below and obliquely below the second feature, or simply indicates that the first feature is lower in level than the second feature.

[0048] In the description of this embodiment, the terms "upper", "lower", "right", etc., are based on the directions or positions shown in the drawings, and are only for the convenience of description and simplified operation, rather than indicating or implying that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore cannot be understood as a limitation of the present invention. In addition, the terms "first" and "second" are only used to distinguish in the description and have no special meaning.

[0049] The following is based on the attached Figure 1 To Attachment Fig.10 , three embodiments are used to introduce the mask cleaning device provided by the utility model.

[0050] Embodiment 1

[0051] Specifically, in the first embodiment of the present utility model, Figure 1 , Figure 2As shown, the mask cleaning device mainly includes a hanger 1, a cleaning mechanism and a transfer mechanism. The hanger 1 is used to detachably fix the mask. The cleaning mechanism includes a cleaning tank and a drying tank, wherein the cleaning tank includes at least a first cleaning tank 21, a second cleaning tank 22 and a third cleaning tank 23. The first cleaning tank 21 is used for alkali cleaning of the mask, the second cleaning tank 22 is used for spray cleaning and immersion cleaning of the mask, the third cleaning tank 23 is used for discharge cleaning of the mask, and the drying tank 24 is used for drying the mask, and each tank body undertakes different tasks. The transfer mechanism is used to drive the hanger 1 to perform lifting and lateral movements and reach a preset position, so that the mask can enter the first cleaning tank 21, the second cleaning tank 22, the third cleaning tank 23 and the drying tank 24 in turn for processing.

[0052] In a specific implementation, the mask is first fixed in the cleaning device by the hanger 1. The design of the hanger 1 should ensure that the mask can be firmly clamped while avoiding damage to it. Then, under the control of the transfer mechanism, the mask will be sent to the first cleaning tank 21, the second cleaning tank 22, the third cleaning tank 23 and the drying tank 24 for processing.

[0053] The mask cleaning device makes the loading, unloading and transfer process of the mask faster and more accurate, thereby reducing the time and error of manual operation and improving the efficiency of the overall cleaning process. At the same time, the use of alkaline cleaning, cleaning and drying avoids the use of ultrasonic cleaning and reduces the possibility of damage to the mask during the cleaning process. The cleaning process is carried out in the first cleaning tank 21, the second cleaning tank 22, the third cleaning tank 23 and the drying tank 24 in order, avoiding the complex setting of the pipeline, which can greatly simplify the structure of the cleaning device and reduce the cost of the cleaning device.

[0054] The first cleaning tank 21 is mainly used for alkali washing of the mask to remove stubborn stains and colloid residues on its surface. In order to achieve this purpose, a first nozzle 211 and a first liquid level sensor 212 are provided in the first cleaning tank 21. When the mask is placed in the first cleaning tank 21, at least one first nozzle 211 is provided on both sides of the mask. The first nozzle 211 can spray alkali washing solution (containing sodium hydroxide) toward the mask from both sides of the mask to ensure that the alkali washing solution can spray both sides of the mask at the same time. At the same time, as the liquid level of the alkali washing solution in the first cleaning tank 21 gradually increases, both sides of the mask can also be immersed and cleaned. At the same time, the first liquid level sensor 212 is used to monitor the liquid level of the alkali washing solution in the first cleaning tank 21 in real time to ensure the smooth progress of the cleaning process and avoid the overflow of the alkali washing solution.

[0055] For example, in the first cleaning tank 21, four first nozzles 211 are arranged on each side of the mask, and the four first nozzles 211 can spray the alkaline cleaning solution evenly and fully to both sides of the mask at the same time to achieve alkaline cleaning, effectively removing the colloid and other stubborn stains on the mask. At the same time, the immersion method allows the alkaline cleaning solution to have enough time to react with the stains, thereby achieving a better cleaning effect.

[0056] After the alkali cleaning is completed, the mask will be sent to the second cleaning tank 22 for further cleaning. Similar to the first cleaning tank 21, a second nozzle 221 and a second liquid level sensor 222 are also provided in the second cleaning tank 22. When the mask is placed in the second cleaning tank 22, at least one second nozzle 221 is provided on both sides of the mask. The second nozzle 221 can spray the cleaning liquid toward the mask from both sides of the mask, thereby spraying and cleaning both sides of the mask at the same time. The cleaning liquid uses pure water or a specific cleaning agent, and the cleaning liquid can accumulate in the second cleaning tank 22 to soak and clean the mask. Through spray cleaning and soaking cleaning, the alkali solution and stains remaining on the surface of the mask can be quickly washed away in the second cleaning tank 22. Similar to the first liquid level sensor 212, the second liquid level sensor 222 is used to monitor the liquid level in the second cleaning tank 22 in real time to ensure the smooth progress of the cleaning process and avoid overflow.

[0057] For example, in the second cleaning tank 22, four second nozzles 221 are arranged on each side of the mask, and the four second nozzles 221 can spray the cleaning liquid uniformly and fully to both sides of the mask at the same time, so that the cleaning liquid can evenly cover every corner of the mask to ensure the cleaning effect. At the same time, the immersion method allows the alkaline cleaning liquid remaining on the mask surface and the cleaned stains to be fully separated from the mask surface.

[0058] Optionally, in this embodiment, both the first cleaning tank 21 and the second cleaning tank 22 are provided with a reflux system. The reflux system connected to the first cleaning tank 21 can collect and store the used alkaline washing liquid, and can input the stored alkaline washing liquid into the first nozzle 211 again to realize the reflux and reuse of the alkaline washing liquid. Similarly, the reflux system connected to the second cleaning tank 22 can collect and store the used cleaning liquid, and can input the stored cleaning liquid into the second nozzle 221 again to realize the reflux and reuse of the cleaning liquid.

[0059] Next is the third cleaning tank 23, which mainly performs discharge cleaning. The third cleaning tank 23 is provided with a third nozzle 231, which will spray pure water from both sides of the mask to both sides of the mask at a flow rate greater than the second nozzle 221. In this process, pure water will be sprayed directly onto the mask and then flow away without being reused. Compared with immersion cleaning, discharge cleaning can ensure that fresh water is used during cleaning to avoid secondary contamination.

[0060] Finally, there is a drying tank 24, in which at least two air cutting air knives 241 are arranged. These air cutting air knives 241 can blow air from both sides of the mask toward the mask, quickly and evenly removing moisture from the surface of both sides. In order to further improve the efficiency, a heater is also provided at the air outlet of the air cutting air knife 241 to heat the air flow. In this way, not only can the drying speed be accelerated, but also the generation of problems such as watermarks can be avoided.

[0061] Exemplarily, after the discharge cleaning, the mask is moved to the drying tank 24 for drying. The drying tank 24 uses an air-cutting air knife 241 for drying. A heater is provided at the front end of the air knife, which can generate hot air to quickly dry the moisture on the surface of the mask. The drying temperature is controlled between 30°C and 50°C. This temperature range can ensure that the moisture is evaporated quickly without causing thermal damage to the mask. At the same time, the design of the air-cutting air knife 241 also makes the drying process more uniform and efficient.

[0062] During the entire cleaning process, the transfer mechanism controls the movement of the hanger 1, thereby realizing the automatic transfer of the mask between the various slots. This automated design greatly improves the cleaning efficiency, reduces the complexity and uncertainty of manual operation, and greatly facilitates the cleaning of both sides of the mask at the same time, which not only improves the cleaning efficiency but also simplifies the cleaning operation.

[0063] In addition, the mask cleaning device of the utility model also has the feature of open settings. This means that the user can adjust the operating parameters in each tank according to actual needs, such as cleaning time, temperature, spray pressure, etc., to meet the cleaning needs of different masks. This flexibility enables the device of the utility model to be widely used in various types of mask cleaning tasks.

[0064] In addition, in order to ensure the safety and stability of the cleaning process, the third cleaning tank 23 and the drying tank 24 are both provided with tank covers 25. These tank covers 25 have a through slot for the hanger 1 to enter, ensuring that no external pollutants enter during the cleaning and drying process, and also preventing the cleaning liquid from splashing during the discharge cleaning and drying, thereby ensuring a clean environment.

[0065] Optionally, the hanger 1 is also provided with a first positioning structure, and the cleaning mechanism is provided with a second positioning structure matching the first positioning structure. This detachable limiting connection mode not only facilitates the installation and removal of the mask, but also ensures the accuracy and stability of the cleaning process. Specifically, the first positioning structure includes a positioning member 11, and the second positioning structure includes a positioning seat 26 with a positioning groove. When the hanger 1 enters the cleaning mechanism, the positioning member 11 will be limitedly inserted into the positioning groove, thereby achieving accurate positioning and stable connection.

[0066] For example, in the present embodiment, a positioning member 11 is provided at both ends of the hanger 1 along the length direction of the mask. In the horizontal direction, the outer contour of the positioning member 11 is a triangle, and the inner contour of the positioning groove is a V-shape. When the positioning member 11 is inserted into the positioning groove, the hanger 1 can be fixed in a limited position to prevent it from rotating, thereby improving the stability of the mask during discharge cleaning and drying. Of course, depending on the different fixing methods of the mask, in some other embodiments, the positioning member 11 can also be provided at one or both ends of the hanger 1 along the width direction of the mask. This is not specifically limited in the present invention, as long as it can achieve the effect of limiting and fixing.

[0067] Embodiment 2

[0068] In the second embodiment of the present utility model, Figure 4 , Figure 5 As shown, the mask cleaning device also includes a hanger 1, a cleaning mechanism and a transfer mechanism. The hanger 1 is used to detachably fix the mask. The cleaning mechanism includes a cleaning tank and a drying tank, wherein the cleaning tank includes at least a first cleaning tank 21 and a second cleaning tank 22. The first cleaning tank 21 is used for alkali cleaning of the mask, the second cleaning tank 22 is used to clean the mask by at least one of spray cleaning, immersion cleaning and discharge cleaning, and the drying tank 24 is similar to that in the first embodiment, and is also used to dry the mask and has the same structure. The transfer mechanism is used to drive the hanger 1 to perform lifting and lateral movements and reach a preset position, so that the mask can enter the first cleaning tank 21, the second cleaning tank 22 and the drying tank 24 in turn for processing.

[0069] In a specific implementation, the mask is first fixed in the cleaning device by the hanger 1. The design of the hanger 1 should ensure that the mask can be firmly clamped while avoiding damage to it. Then, under the control of the transfer mechanism, the mask will be sent to the first cleaning tank 21, the second cleaning tank 22 and the drying tank 24 for processing.

[0070] The mask cleaning device in this embodiment also makes the loading, unloading and transfer process of the mask faster and more accurate, thereby reducing the time and error of manual operation and improving the efficiency of the overall cleaning process. At the same time, the use of alkaline cleaning, cleaning and drying avoids the use of ultrasonic cleaning, reducing the possibility of damage to the mask during the cleaning process. The cleaning process is carried out in the first cleaning tank 21, the second cleaning tank 22 and the drying tank 24 in order, avoiding the complex setting of the pipeline, which can greatly simplify the structure of the cleaning device and reduce the cost of the cleaning device.

[0071] Optionally, in this embodiment, the first cleaning tank 21 and the second cleaning tank 22 are also provided with a reflux system. Taking the reflux system connected to the second cleaning tank 22 as an example, Figure 6 As shown, the reflux system includes a cleaning liquid temporary storage tank 31, a first recovery pipe 32 and a reflux pipe 33 connected to the second cleaning tank 22. The first recovery pipe 32 is used to flow the cleaning liquid in the second cleaning tank 22 into the cleaning liquid temporary storage tank 31, and the reflux pipe 33 is used to flow the cleaning liquid in the cleaning liquid temporary storage tank 31 into the second cleaning tank 22. Specifically, the reflux system can be driven and controlled by a pump and a valve to determine whether the cleaning liquid flows. Since the pump and the valve are common parts, they will not be described in detail in the present invention.

[0072] Furthermore, the second cleaning tank 22 also includes a drain pipe for discharging the cleaning liquid, and the drain pipe is also provided with a switch valve. The second cleaning tank 22 can work in the first cleaning state and the second cleaning state. Among them, in the first cleaning state, the valves on the first recovery pipe 32 and the reflux pipe 33 are both open, and the valve on the drain pipe is closed, and the cleaning liquid circulates between the second cleaning tank 22 and the cleaning liquid temporary storage tank 31. In the second cleaning state, the valves on the first recovery pipe 32 and the reflux pipe 33 are both closed, and the valve on the drain pipe is opened, and the cleaning liquid is directly discharged after being used in the second cleaning tank 22 without being reused.

[0073] Embodiment 3

[0074] In the third embodiment of the present utility model, Figure 7 , Figure 8As shown, the mask cleaning device also includes a hanger 1, a cleaning mechanism and a transfer mechanism. The hanger 1 is used to detachably fix the mask. The cleaning mechanism includes a cleaning tank and a drying tank, wherein the cleaning tank at least includes a first cleaning tank 21, and the first cleaning tank 21 is used to clean the mask by alkaline cleaning and at least one of spray cleaning, immersion cleaning and discharge cleaning. The drying tank 24 is similar to that in the first embodiment, and is also used to dry the mask and has the same structure. The transfer mechanism is used to drive the hanger 1 to perform lifting and lateral movements and reach a preset position, so that the mask can enter the first cleaning tank 21 and the drying tank 24 in turn for processing.

[0075] In a specific implementation, the mask is first fixed in the cleaning device by the hanger 1. The design of the hanger 1 should ensure that the mask can be firmly clamped while avoiding damage to it. Then, under the control of the transfer mechanism, the mask will be sent to the first cleaning tank 21 and the drying tank 24 for processing.

[0076] The mask cleaning device in this embodiment also makes the loading and unloading and transfer process of the mask faster and more accurate, thereby reducing the time and error of manual operation and improving the efficiency of the overall cleaning process. At the same time, the use of alkaline cleaning, cleaning and drying avoids the use of ultrasonic cleaning, reducing the possibility of damage to the mask during the cleaning process. The cleaning process is carried out in the first cleaning tank 21 and the drying tank 24 in an orderly manner, avoiding the complex setting of the pipeline, which can greatly simplify the structure of the cleaning device and reduce the cost of the cleaning device.

[0077] like Fig. 9 As shown, specifically, in order to realize the above-mentioned alkali cleaning and at least one cleaning method in the first cleaning tank 21, the first nozzle 211 in the first cleaning tank 21 is also connected to the alkali liquid tank 34 and the first water storage tank 35 through a pipeline and a switch valve. In addition, the cleaning mechanism also includes a third cleaning state and a fourth cleaning state. In the third cleaning state, by adjusting the switch valve so that the first nozzle 211 is connected to the alkali liquid tank 34, and the first nozzle 211 is not connected to the first water storage tank 35, the first nozzle 211 can only spray the alkali cleaning solution to realize alkali cleaning in the first cleaning tank 21. In the fourth cleaning state, by adjusting the switch valve so that the first nozzle 211 is not connected to the alkali liquid tank 34, and the first nozzle 211 is connected to the first water storage tank 35, the first nozzle 211 can only spray the cleaning solution to realize at least one cleaning method among spray cleaning, immersion cleaning and discharge cleaning.

[0078] Optionally, a second recovery pipe is provided between the first water storage tank 35 and the first cleaning tank 21 to recover the cleaning liquid and reuse the cleaning liquid. Further, optionally, the first nozzle 211 is also connected to the second water storage tank 36 through a pipe, and the cleaning mechanism also has a fifth cleaning state. In the fifth cleaning state, the first nozzle 211 is connected to the second water storage tank 36, so that the first nozzle 211 can spray a cleaning liquid of a different type from that in the first water storage tank 35 to fully clean the mask. Of course, a third recovery pipe can also be provided between the first cleaning tank 21 and the second water storage tank 35 to reuse the cleaning liquid.

[0079] Embodiment 4

[0080] In the fourth embodiment of the present utility model, Fig.10 As shown, the mask cleaning device also includes a hanger 1, a cleaning mechanism and a transfer mechanism. The hanger 1 is used to detachably fix the mask. The cleaning mechanism includes a cleaning tank and a drying tank, wherein the cleaning tank includes at least a first cleaning tank 21 and a second cleaning tank 22. The first cleaning tank 21 is used for alkali cleaning and / or cleaning the first side of the mask, and the second cleaning tank 22 is used for alkali cleaning and / or cleaning the second side of the mask. The drying tank 24 is similar to that in the first embodiment, and is also used to dry the mask, and has the same structure. The transfer mechanism is used to drive the hanger 1 to perform lifting and lateral movements and reach a preset position, so that the mask can enter the first cleaning tank 21, the second cleaning tank 22 and the drying tank 24 in turn for processing.

[0081] In a specific implementation, the mask is first fixed in the cleaning device by the hanger 1. The design of the hanger 1 should ensure that the mask can be firmly clamped while avoiding damage to it. Then, under the control of the transfer mechanism, the mask will be sent to the first cleaning tank 21, the second cleaning tank 22 and the drying tank 24 for processing.

[0082] The mask cleaning device in this embodiment also makes the loading, unloading and transfer process of the mask faster and more accurate, thereby reducing the time and error of manual operation and improving the efficiency of the overall cleaning process. At the same time, the use of alkaline cleaning, cleaning and drying avoids the use of ultrasonic cleaning, reducing the possibility of damage to the mask during the cleaning process. The cleaning process is carried out in the first cleaning tank 21, the second cleaning tank 22 and the drying tank 24 in order, avoiding the complex setting of the pipeline, which can greatly simplify the structure of the cleaning device and reduce the cost of the cleaning device.

[0083] Obviously, the above embodiments of the present invention are merely examples for the purpose of clearly illustrating the present invention, and are not intended to limit the implementation methods of the present invention. For those skilled in the art, various obvious changes, readjustments and substitutions can be made without departing from the scope of protection of the present invention. It is not necessary and impossible to list all implementation methods here. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention shall be included in the scope of protection of the claims of the present invention.

Claims

1. A mask cleaning device, characterized in that: include: A hanger (1), the hanger (1) being used for detachably fixing the mask; A cleaning mechanism, the cleaning mechanism comprising at least a cleaning tank and a drying tank (24), the cleaning tank being used to clean the mask after alkali cleaning, and the drying tank (24) being used to dry the mask; A transfer mechanism, the transfer mechanism is used to move the hanger (1) to a preset position, the preset position at least including a position in the cleaning tank for cleaning the mask and a position in the drying tank (24) for drying the mask.

2. The mask cleaning device according to claim 1, characterized in that: The cleaning tank at least comprises a first cleaning tank (21), a second cleaning tank (22) and a third cleaning tank (23), wherein the first cleaning tank (21) is used for alkali cleaning of the mask, the second cleaning tank (22) is used for cleaning the mask, and the third cleaning tank (23) is used for cleaning the mask; The first cleaning tank (21) is provided with a reflux system to reflux the alkaline cleaning solution for reuse, and / or the second cleaning tank (22) is provided with a reflux system to reflux the cleaning solution for reuse.

3. The mask cleaning device according to claim 1, characterized in that: The cleaning tank at least comprises a first cleaning tank (21) and a second cleaning tank (22), wherein the first cleaning tank (21) is used for alkali cleaning of the mask, and the second cleaning tank (22) is used for cleaning the mask; The first cleaning tank (21) is provided with a reflux system to reflux the alkaline cleaning solution for reuse, and / or the second cleaning tank (22) is provided with a reflux system to reflux the cleaning solution for reuse.

4. The mask cleaning device according to claim 3, characterized in that: The second cleaning tank (22) is provided with the reflux system, the reflux system comprising a cleaning liquid temporary storage tank (31) and a first recovery pipe (32) and a reflux pipe (33) connected to the second cleaning tank (22), the first recovery pipe (32) being used for flowing the cleaning liquid in the second cleaning tank (22) into the cleaning liquid temporary storage tank (31), and the reflux pipe (33) being used for flowing the cleaning liquid in the cleaning liquid temporary storage tank (31) into the second cleaning tank (22); The second cleaning tank (22) also includes a drainage pipe for discharging the cleaning liquid; The cleaning mechanism comprises a first cleaning state and a second cleaning state. In the first cleaning state, the valves on the first recovery pipe (32) and the return pipe (33) are both opened, and the valve on the discharge pipe is closed; in the second cleaning state, the valves on the first recovery pipe (32) and the return pipe (33) are both closed, and the valve on the discharge pipe is opened.

5. The mask cleaning device according to claim 1, characterized in that: The cleaning tank at least comprises a first cleaning tank (21), and the first cleaning tank (21) is used for alkali cleaning and cleaning the mask; The cleaning mechanism further comprises a first nozzle (211) for cleaning the mask plate, wherein the first nozzle (211) is respectively connected to an alkali solution tank (34) and a first water storage tank (35) through pipelines; The cleaning mechanism comprises a third cleaning state and a fourth cleaning state. In the third cleaning state, the first nozzle (211) is connected to the alkali solution tank (34), and the first nozzle (211) is not connected to the first water storage tank (35), so that the first nozzle (211) can spray out the alkali cleaning solution. In the fourth cleaning state, the first nozzle (211) is not connected to the alkali solution tank (34), and the first nozzle (211) is connected to the first water storage tank (35), so that the first nozzle (211) can spray out the cleaning solution.

6. The mask cleaning device according to claim 5, characterized in that: A second recovery pipe is also provided between the first water storage tank (35) and the first cleaning tank (21) to recover the cleaning liquid; The first nozzle (211) is also connected to a second water storage tank (36) via a pipeline, and the cleaning mechanism includes a fifth cleaning state. In the fifth cleaning state, the first nozzle (211) is connected to the second water storage tank (36) so that the first nozzle (211) can spray cleaning liquid.

7. The mask cleaning device according to claim 1, characterized in that: The cleaning tank at least comprises a first cleaning tank (21) and a second cleaning tank (22), wherein the first cleaning tank (21) is used for alkali cleaning and / or cleaning the first surface of the mask, and the second cleaning tank (22) is used for alkali cleaning and / or cleaning the second surface of the mask.

8. The mask cleaning device according to claim 1, characterized in that: A liquid level sensor is arranged in the cleaning tank to detect the height of the liquid level in the cleaning tank.

9. The mask cleaning device according to claim 1, characterized in that: At least two air-cutting air knives (241) are arranged in the drying tank (24), and the air-cutting air knives (241) are capable of blowing air toward the mask from both sides of the mask; The air outlet of the gas cutting air knife (241) is provided with a heater, and the heater is used to heat the air flow.

10. The mask cleaning device according to claim 1, characterized in that: The hanger (1) is provided with a first positioning structure, and the cleaning mechanism is provided with a second positioning structure, and the first positioning structure and the second positioning structure are detachably connected to limit the position, so as to limit the position of the hanger (1) to the cleaning mechanism; The first positioning structure comprises a positioning piece (11), and the positioning piece (11) is arranged on at least one end of the hanger (1) along the length or width direction of the mask; The second positioning structure comprises a positioning seat (26), the positioning seat (26) is fixedly arranged and has a positioning groove, and the positioning member (11) can be inserted into the positioning groove in a limited manner.

Images