A multi-strip exposure device with upper and lower tables

Abstract

The utility model discloses an upper and lower double-table multi-strip exposure device, wherein the exposure mechanism comprises: an x-axis motion component arranged on the top of the gantry, a moving table arranged above the x-axis motion component, a support frame fixedly connected to the top of the moving table, a data processor arranged on the top of the support frame, and an exposure lens fixedly installed on the outer wall of the moving table; the moving table is an L-shaped bending plate, and a water guide groove is opened in the inner cavity of the moving table; the exposure machine equipment supports multi-strip exposure, and the exposure parts on the substrate table are aligned by the visual motion component of the alignment mechanism to obtain the position information of the pattern, and the corresponding strip number is calculated by the data processor, and the exposure pattern is cut according to the strip number and transmitted to the exposure mechanism, and the exposure of the overall pattern is realized by combining the back-and-forth reciprocating motion of the y-axis motion component with the left-right motion of the x-axis motion component of the exposure mechanism.

Description

Technical Field

[0001] The utility model relates to the technical field of photolithography equipment, in particular to an upper and lower double-table multi-strip exposure equipment. Background Art

[0002] Laser direct writing exposure is used to print characteristic patterns on the surface of a substrate. Compared with traditional image direct transfer technologies such as mask plates and film negatives, direct writing exposure technology has high production capacity and high positioning accuracy, and plays a very important role in the field of semiconductor and PCB production.

[0003] Existing exposure equipment is mostly of the following types: single-table single-strip exposure equipment, single-table multi-strip exposure equipment, and upper and lower double-table single-strip exposure equipment. However, the existing single-table single-strip exposure equipment has a lower production capacity than the upper and lower double-table single-strip exposure equipment; the single-table multi-strip exposure equipment can save the number of core parts and reduce equipment costs, but the corresponding production efficiency is reduced; the double-table single-strip equipment, in which the exposure mechanism includes multiple exposure lenses arranged in the x direction fixed on the gantry mechanism, has high production efficiency, but the number of core parts is large, and the corresponding manufacturing cost is high.

[0004] Therefore, the utility model provides an upper and lower double-table multi-strip exposure device to solve the problems existing in the background technology. Utility Model Content

[0005] In order to achieve the above purpose, the utility model provides the following technical solutions:

[0006] A top and bottom double-table multi-strip exposure device, comprising a base, a gantry arranged on the base, an alignment mechanism and an exposure mechanism sequentially arranged on the front and rear sides of the gantry, two groups of y-axis motion components arranged in parallel above the base and extending along the y direction, a first workbench and a second workbench respectively arranged on the y-axis motion components, the first workbench and the second workbench both comprising a z-axis motion mechanism placed on the y-axis motion component, a substrate table connected to the z-axis motion mechanism, the z-axis motion mechanism drives the substrate table to slide up and down in the z-axis direction, and the exposure mechanism comprising: an x-axis motion component arranged on the top of the gantry, a moving table arranged above the x-axis motion component, a support frame fixedly connected to the top of the moving table, a data processor arranged on the top of the support frame, and an exposure lens fixedly mounted on the outer wall of the moving table.

[0007] As a further solution of the utility model: the movable platform is an L-shaped bent plate, the inner cavity of the movable platform is provided with a water guide groove, and the water inlet end and the water outlet end of the water guide groove are both provided with a water pipe joint.

[0008] As a further solution of the utility model: the x-axis motion assembly includes a linear motor arranged on the top of the gantry for driving the movable platform to move along the x-axis, a guide rail arranged on the outer wall of the gantry and parallel to the movement direction of the linear motor, anti-collision parts arranged at both ends of the guide rail, and a water-cooling pipe arranged inside the linear motor; the movable platform is clamped on the outer wall of the guide rail and is slidably connected to the guide rail.

[0009] As a further solution of the utility model: the anti-collision member includes a fixing seat fixedly connected to the top of the gantry, the fixing seat is a concave structure, a hydraulic telescopic rod is arranged at the recess of the fixing seat, the mobile platform is located between the two hydraulic telescopic rods, and rubber pads are arranged on both sides of the fixing seat close to the mobile platform.

[0010] As a further solution of the utility model: the water cooling pipe is arranged inside the mover of the linear motor, and the water inlet end and the water outlet end of the water cooling pipe both penetrate the outer wall of the moving platform and are connected to the second water pipe joint.

[0011] As a further solution of the utility model: it also includes a grating ruler fixedly installed on the lower surface of the gantry and arranged parallel to the moving direction of the exposure lens, and a reading head fixedly connected to the bottom end of the moving platform.

[0012] Compared with the prior art, the beneficial effects of the utility model are:

[0013] 1. The exposure machine supports multi-strip exposure. The exposure parts on the substrate table are aligned through the visual motion component of the alignment mechanism to obtain the position information of the pattern. The corresponding number of strips is calculated by the data processor, and the exposure pattern is cut according to the number of strips and transmitted to the exposure mechanism. The exposure of the entire pattern is achieved by combining the reciprocating motion of the y-axis motion component and the left and right motion of the x-axis motion component of the exposure mechanism.

[0014] 2. The movable table is driven by the mover of the linear motor to move left and right along the x-axis to expose the exposure piece. The movable table slides on the outer wall of the guide rail to improve the stability of movement, and the water flow is introduced into a water pipe joint at the water inlet end of the water guide groove. The water flows through the inner wall of the movable table and flows out from a water pipe joint at the water outlet end of the water guide groove, thereby conducting heat from the exposure lens to the movable table to prevent the workpiece from being deformed due to thermal expansion and contraction, which may cause inaccurate exposure or offset during the movement of the exposure lens.

[0015] 3. Anti-collision parts can be set to prevent the mobile platform from leaving the guide rail when it moves too fast. Hydraulic telescopic rods and rubber pads can be set to buffer the mobile platform and improve exposure safety performance.

[0016] 4. Direct the water flow to the second water pipe joint at the water inlet end of the mover. The water flows through the inner wall of the mover and flows out from the second water pipe joint at the water outlet end of the outer wall of the mover, thereby improving the heat dissipation effect of the linear motor mover. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a schematic diagram of the structure of an upper and lower double-table multi-strip exposure device.

[0018] Figure 2 The figure is a schematic diagram of the installation position of the linear motor and the moving table in an upper and lower double-table multi-strip exposure device.

[0019] Figure 3 This is a schematic diagram of the structure of a water guide trough in an upper and lower double-table multi-strip exposure device.

[0020] Figure 4 The present invention is a schematic diagram of the structure of water pipe joint 1 and water pipe joint 2 in an upper and lower double-table multi-strip exposure device.

[0021] Figure 5 The schematic diagram is a structural diagram of an anti-collision component in an upper and lower double-table multi-strip exposure device.

[0022] Figure 6 The schematic diagram is a structural diagram of a grating ruler and a reading head in an upper and lower double-table multi-strip exposure device.

[0023] In the figure: 1. base; 2. gantry; 3. alignment mechanism; 4. exposure mechanism; 5. y-axis motion assembly; 6. z-axis motion mechanism; 7. substrate table; 8. moving table; 9. support frame; 10. data processor; 11. exposure lens; 12. water guide trough; 13. water pipe joint 1; 14. linear motor; 15. guide rail; 16. anti-collision part; 17. fixed seat; 18. hydraulic telescopic rod; 19. rubber pad; 20. water pipe joint 2; 21. grating ruler; 22. reading head. DETAILED DESCRIPTION

[0024] The present invention is further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0025] See also Figure 1 , an upper and lower double-table multi-strip exposure device, comprising a base 1, a gantry 2 arranged on the base 1, a positioning mechanism 3 and an exposure mechanism 4 sequentially arranged on the front and rear sides of the gantry 2, two groups of y-axis motion components 5 arranged in parallel and extending along the y direction above the base 1, a first workbench and a second workbench respectively arranged on the y-axis motion component 5, the first workbench and the second workbench both comprising a z-axis motion mechanism 6 placed on the y-axis motion component 5, and a substrate table 7 connected to the z-axis motion mechanism 6, the z-axis motion mechanism 6 drives the substrate table 7 to slide up and down in the z-axis direction;

[0026] Both groups of substrate tables 7 slide up and down in the z-axis direction through the corresponding z-axis motion mechanism 6. When the two groups of substrate tables 7 are in the same position in the y direction of the y-axis motion component 5, the two groups of substrate tables 7 are arranged up and down without interfering with each other. By setting the alignment mechanism 3, the exposure parts on the substrate table 7 are aligned to improve the subsequent exposure accuracy, and then they are transmitted to the bottom of the exposure mechanism 4 through the y-axis motion component 5 for exposure. The exposure equipment adopts an upper and lower double-table layout, each moving independently, sharing a set of alignment mechanism 3 and exposure mechanism 4. During the reciprocating exposure process of one group of substrate tables 7, the other group of substrate tables 7 is located at the upper plate position, and manual loading and unloading operations and advance alignment processes can be performed, thereby shortening the exposure waiting time and improving production efficiency.

[0027] See also Figure 2 The exposure mechanism 4 includes: an x-axis motion component arranged on the top of the gantry 2, a moving table 8 arranged above the x-axis motion component, a support frame 9 fixedly connected to the top of the moving table 8, a data processor 10 arranged on the top of the support frame 9, and an exposure lens 11 fixedly installed on the outer wall of the moving table 8.

[0028] The exposure machine equipment supports multi-strip exposure. The exposure parts on the substrate table 7 are aligned through the visual motion component of the alignment mechanism 3 to obtain the position information of the pattern. The corresponding number of strips is calculated by the data processor 10, and the exposure pattern is cut according to the number of strips and transmitted to the exposure mechanism 4. The back-and-forth reciprocating motion of the y-axis motion component 5 is combined with the left-right motion of the x-axis motion component of the exposure mechanism 4 to realize the exposure of the entire pattern.

[0029] See also Figure 3-Figure 4 The movable platform 8 is an L-shaped bent plate, and a water guide groove 12 is provided in the inner cavity of the movable platform 8. A water pipe joint 13 is provided at the water inlet end and the water outlet end of the water guide groove 12.

[0030] The x-axis motion assembly includes a linear motor 14 disposed on the top of the gantry 2 for driving the movable table 8 to move along the x-axis, a guide rail 15 disposed on the outer wall of the gantry 2 and parallel to the movement direction of the linear motor 14, anti-collision parts 16 disposed at both ends of the guide rail 15, and a water-cooling pipe disposed inside the linear motor 14. The movable table 8 is clamped on the outer wall of the guide rail 15 and is slidably connected to the guide rail 15.

[0031] The movable table 8 is driven by the mover of the linear motor 14 to move left and right along the x-axis to expose the exposure piece. The movable table 8 slides on the outer wall of the guide rail 15 to improve the stability of the movement. Since the exposure lens 11 generates a large amount of heat in the process of exposing the exposure piece, if the heat is not dissipated in time, it is easy to cause the workpiece to expand and contract due to heat, and then cause the exposure lens 11 to appear inaccurate or offset during the movement process, which is easy to affect the exposure accuracy. Therefore, water is introduced into the water pipe joint 13 at the water inlet end of the water guide groove 12, and the water flows through the inner wall of the movable table 8 and flows out from the water pipe joint 13 at the water outlet end of the water guide groove 12, thereby conducting the heat conducted to the movable table 8 by the exposure lens 11 to be discharged, so as to prevent the workpiece from expanding and contracting due to heat, and then causing the exposure lens 11 to appear inaccurate or offset during the movement process.

[0032] The water cooling pipe is arranged inside the mover of the linear motor 14 , and the water inlet and outlet of the water cooling pipe both penetrate the outer wall of the moving platform 8 and are connected to a water pipe joint 20 .

[0033] Since the rotor of the linear motor 14 generates a magnetic field and emits a large amount of heat after being energized, if the heat is not dissipated in time during long-term operation, it will affect the operation of the linear motor 14 and even affect the exposure accuracy of the exposure lens 11. Therefore, water is introduced into the water pipe joint 20 at the water inlet end of the rotor, and the water flows through the inner wall of the rotor and flows out from the water pipe joint 20 at the water outlet end of the outer wall of the rotor, thereby improving the heat dissipation effect of the rotor of the linear motor 14.

[0034] See also Figure 5 The anti-collision member 16 includes a fixed seat 17 fixedly connected to the top of the gantry 2. The fixed seat 17 is a concave structure. A hydraulic telescopic rod 18 is arranged at the concave part of the fixed seat 17. The moving platform 8 is located between the two hydraulic telescopic rods 18. Rubber pads 19 are arranged on both sides of the fixed seat 17 close to the moving platform 8. By arranging the anti-collision member 16, the moving platform 8 is prevented from detaching from the guide rail 15 when moving too fast. By arranging the hydraulic telescopic rod 18 and the rubber pad 19, the moving platform 8 can be buffered to improve the exposure safety performance.

[0035] See also Figure 6 , and also includes a grating ruler 21 fixedly mounted on the lower surface of the gantry 2 and arranged parallel to the moving direction of the exposure lens 11, and a reading head 22 fixedly connected to the bottom end of the moving platform 8.

[0036] When the movable stage 8 drives the exposure lens 11 to move, it also drives the reading head 22 to slide across the grating scale 21. Through the principle of optics, the displacement of the movable stage 8 and the exposure lens 11 is converted into an electrical signal, which is then processed by a signal processing circuit to finally obtain the displacement data of the exposure lens 11.

[0037] The grating ruler 21 is installed on the lower surface of the gantry 2 and is separated from the linear motor 14 above the gantry 2 , thereby reducing the influence of the heat generated by the linear motor 14 on the measurement accuracy of the grating ruler 21 .

[0038] The above description is only a preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes within the technical scope disclosed by the present invention according to the technical scheme and the utility model concept of the present invention, which should be covered by the protection scope of the present invention.

Claims

1. An upper and lower double-table multi-strip exposure device, comprising a base, a gantry arranged on the base, an alignment mechanism and an exposure mechanism sequentially arranged on the front and rear sides of the gantry, two groups of y-axis motion components arranged above the base and extending in parallel along the y direction, a first workbench and a second workbench respectively arranged on the y-axis motion components, the first workbench and the second workbench both comprising a z-axis motion mechanism placed on the y-axis motion component, and a substrate table connected to the z-axis motion mechanism, the z-axis motion mechanism drives the substrate table to slide up and down in the z-axis direction, characterized in that: The exposure mechanism includes: an x-axis motion component arranged on the top of the gantry, a moving platform arranged above the x-axis motion component, a support frame fixedly connected to the top of the moving platform, a data processor arranged on the top of the support frame, and an exposure lens fixedly installed on the outer wall of the moving platform.

2. The upper and lower double-stage multi-strip exposure device according to claim 1, characterized in that: The movable platform is an L-shaped bent plate, the inner cavity of the movable platform is provided with a water guide groove, and the water inlet end and the water outlet end of the water guide groove are both provided with a water pipe joint.

3. The upper and lower double-stage multi-strip exposure device according to claim 1, characterized in that: The x-axis motion assembly includes a linear motor arranged on the top of the gantry for driving the movable platform to move along the x-axis, a guide rail arranged on the outer wall of the gantry and parallel to the movement direction of the linear motor, anti-collision parts arranged at both ends of the guide rail, and a water cooling pipe arranged inside the linear motor. The movable platform is clamped on the outer wall of the guide rail and is slidably connected to the guide rail.

4. The upper and lower double-stage multi-strip exposure device according to claim 3, characterized in that: The anti-collision component includes a fixing seat fixedly connected to the top of the gantry, the fixing seat is a concave structure, a hydraulic telescopic rod is arranged at the concave part of the fixing seat, the moving platform is located between two hydraulic telescopic rods, and rubber pads are arranged on both sides of the fixing seat close to the moving platform.

5. The upper and lower double-stage multi-strip exposure device according to claim 3, characterized in that: The water cooling pipe is arranged inside the mover of the linear motor, and the water inlet end and the water outlet end of the water cooling pipe both penetrate the outer wall of the moving platform and are connected with a second water pipe joint.

6. The upper and lower double-stage multi-strip exposure device according to claim 1, characterized in that: It also includes a grating ruler fixedly mounted on the lower surface of the gantry and arranged parallel to the moving direction of the exposure lens, and a reading head fixedly connected to the bottom end of the moving platform.

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