A cleaning device with a collection structure

By designing cleaning equipment with collection structures, including rotary water spray cleaning and knocking jitter functions, the problems of small cleaning range and easy wafer accumulation in the prior art are solved, and the cleaning efficiency and practicality of the device are improved.

CN222739807UActive Publication Date: 2025-04-11YANGZHOU GRETECH SEMICON TECH CO LTD
View PDF 1 Cites 0 Cited by

Patent Information

Application Number
CN202421429284.1
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-06-21
Publication Date
2025-04-11
Estimated Expiration
2034-06-21

AI Technical Summary

Technical Problem

When cleaning the existing wafer cleaning device for semiconductor production, the cleaning range is small and the wafers are easily piled up together, resulting in some places that cannot be fully cleaned, reducing the practicality of the device.

Method used

A cleaning device with a collection structure is designed, including a cleaning box, a filter, a cleaning structure and a strike structure. The cleaning structure expands the cleaning range by cleaning the hollow shaft and the rotating water spray of the cleaning rack; the knocking structure makes it shake by tapping the filter to avoid wafer accumulation.

Benefits of technology

The cleaning range and practicality of the cleaning device are improved, ensuring that the semiconductor wafer is not easy to accumulate during the cleaning process, so that it can be fully cleaned to all areas.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN222739807U_ABST
    Figure CN222739807U_ABST
Patent Text Reader

Abstract

The utility model relates to the technical field of semiconductor manufacturing and processing, and discloses a cleaning device with a collection structure, including a cleaning box, a filter screen is arranged inside the cleaning box, a box door is hinged on the side wall of the cleaning box, a cleaning structure is arranged inside the cleaning box, and the cleaning structure includes: a hollow shaft, a cleaning frame, a nozzle, a one-way valve, a water tank, a liquid pipe, a motor, a driving wheel, and a driven wheel. Then, a user can start the motor to work, the motor increases the power for the rotation of the driving wheel, and the driving wheel is driven to rotate by the rotation of the motor output shaft. The driving wheel drives the driven wheel meshed with the driven wheel and the hollow shaft inside the driven wheel to rotate, and then drives the cleaning frame to rotate. At this time, the user can start multiple groups of nozzles to spray water for cleaning, thereby increasing the cleaning range of the nozzle, and then the filter screen can block larger impurities to a certain extent, and then the collection box is used to collect the cleaned liquid, thereby avoiding waste.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor manufacturing and processing, in particular to a cleaning device with a collection structure. Background Art

[0002] A wafer refers to the silicon chip used to make silicon semiconductor integrated circuits. Due to its round shape, it is called a wafer. Various circuit component structures can be processed on the silicon wafer to become IC products with specific electrical functions. The original material of the wafer is silicon. Existing wafers are cleaned one by one manually, and manual cleaning is relatively slow.

[0003] For example, a wafer cleaning device for semiconductor production disclosed in publication number CN214262949U inputs water from a first water tank into a connecting plate through a water pipe at both the output and input ends of a water pump, and then sprays the water through a cleaning head. When a servo motor is started, the output end of the servo motor drives the lead screw to rotate, thereby causing the movable plate on the surface of the lead screw to move from left to right, so as to lightly clean all wafers on the surface of the cleaning plate.

[0004] However, the practicability of the cleaning structure is poor when in use. When cleaning, the cleaning structure only moves from left to right by moving the movable plate to spray, and since the position of the nozzle is fixed, this results in a smaller cleaning range, and the wafers are easily piled up during cleaning, resulting in the stacked areas not being cleaned, thereby reducing the practicability of the device. In view of this, we propose a cleaning device with a collection structure. Utility Model Content

[0005] The purpose of the utility model is to provide a cleaning device with a collecting structure to solve the problems raised in the above background technology.

[0006] To achieve the above object, the utility model provides the following technical solution: a cleaning device with a collection structure, comprising a cleaning box, a filter screen is arranged inside the cleaning box, a box door is hinged on the side wall of the cleaning box, a cleaning structure is arranged inside the cleaning box, and the cleaning structure comprises:

[0007] A hollow shaft, the hollow shaft passes through the middle of the upper end of the cleaning box, a cleaning rack is fixedly installed at the lower end of the hollow shaft, a plurality of groups of nozzles are arranged at the lower end of the cleaning rack, and a one-way valve is fixedly installed at the upper end of the hollow shaft;

[0008] A water tank, the water tank is fixedly mounted on the upper end of the cleaning tank, one end of a liquid pipe is arranged inside the water tank, the other end of the liquid pipe is rotatably connected to a one-way valve, a motor is fixedly mounted on the upper end of the cleaning tank, a driving wheel is fixedly mounted on the surface of the motor output shaft, a driven wheel is fixedly mounted on the surface of the hollow shaft, and a knocking structure is arranged inside the cleaning tank.

[0009] Preferably, the knocking structure includes a directional cylinder passing through both sides of the inner wall of the cleaning box, the inner wall of the directional cylinder is slidably connected with a moving rod, the side wall of the moving rod is fixedly installed with a striking plate, a return spring is arranged on the surface of the moving rod, both sides of the inner wall of the cleaning box are slidably connected with sliders, the side wall of the slider is hinged with one end of a connecting rod, the other end of the connecting rod is hinged to the side wall of the striking plate, a knocking block is fixedly installed at the lower end of the slider, and arc-shaped knocking blocks are fixedly installed on both sides of the cleaning rack.

[0010] Preferably, the knocking block is provided with an arc-shaped structure and is in contact with the inner wall of the cleaning box.

[0011] Preferably, one end of the return spring is fixedly connected to the side wall of the directional tube, and the other end of the return spring is fixedly connected to the side wall of the striking plate.

[0012] Preferably, fixed plates are fixedly installed on both sides of the inner wall of the cleaning box, a shaking spring is fixedly installed on the upper end of the fixed plate, and the upper end of the shaking spring is fixedly connected to the lower end of the filter.

[0013] Preferably, a collection box is provided on the inner wall of the cleaning box.

[0014] Compared with the prior art, the utility model provides a cleaning device with a collection structure, which has the following beneficial effects:

[0015] 1. The cleaning device with a collection structure is provided with a cleaning structure so as to facilitate the cleaning of multiple semiconductor wafers placed on the surface of the filter screen. Water is supplied to the center shaft and the inside of the cleaning rack through a water tank, and then the center shaft is driven to rotate by a mobile motor, thereby driving the cleaning rack to rotate and spray water for cleaning, thereby increasing the cleaning range of the device, and a collection box is provided to collect the waste water after cleaning, so as to facilitate subsequent filtration.

[0016] 2. The cleaning device with a collection structure is provided with a knocking structure so that it is convenient to knock on the filter to make the filter shake, and the cleaning rack is rotated. At this time, the arc-shaped knocking block on the side wall of the cleaning rack contacts the struck plate, so that the struck plate moves inward, and then drives the slider and the knocking block to move downward to knock and shake the filter, thereby preventing the semiconductor chips from being easily piled up during cleaning, resulting in the stacked area not being cleaned. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a schematic diagram of the three-dimensional structure of the utility model;

[0018] Figure 2 This is a schematic diagram of the sectional three-dimensional structure of the utility model;

[0019] Figure 3 It is a three-dimensional structural diagram of the striking structure of the utility model;

[0020] Figure 4 This is an enlarged structural diagram of part A of the utility model.

[0021] In the figure: 1. cleaning box; 2. filter screen; 3. cleaning structure; 4. knocking structure; 5. box door; 6. fixing plate; 7. shaking spring; 31. hollow shaft; 32. cleaning rack; 33. nozzle; 34. one-way valve; 35. water tank; 36. liquid pipe; 37. motor; 38. driving wheel; 39. driven wheel; 41. directional cylinder; 42. moving rod; 43. impact plate; 44. reset spring; 45. slider; 46. connecting rod; 47. knocking block; 48. arc knocking block; 8. collecting box. DETAILED DESCRIPTION

[0022] like Figure 1-Figure 4 As shown, the utility model provides a technical solution: a cleaning device with a collection structure, including a cleaning box 1, a filter screen 2 is arranged inside the cleaning box 1, a box door 5 is hinged on the side wall of the cleaning box 1, a cleaning structure 3 is arranged inside the cleaning box 1, and the cleaning structure 3 includes a hollow shaft 31 that passes through the middle of the upper end of the cleaning box 1, a cleaning frame 32 is fixedly installed at the lower end of the hollow shaft 31, and a plurality of groups of nozzles 33 are arranged at the lower end of the cleaning frame 32, a one-way valve 34 is fixedly installed at the upper end of the hollow shaft 31, and a water tank 35 is fixedly installed at the upper end of the cleaning box 1. One end of a liquid pipe 36 is provided inside the water tank 35, and the other end of the liquid pipe 36 is rotatably connected to the one-way valve 34. A motor 37 is fixedly installed on the upper end of the cleaning box 1, and a driving wheel 38 is fixedly installed on the surface of the output shaft of the motor 37. A driven wheel 39 is fixedly installed on the surface of the hollow shaft 31. A knocking structure 4 is provided inside the cleaning box 1. Fixed plates 6 are fixedly installed on both sides of the inner wall of the cleaning box 1. A shaking spring 7 is fixedly installed on the upper end of the fixed plate 6. The upper end of the shaking spring 7 is fixedly connected to the lower end of the filter screen 2. A collecting box 8 is provided on the inner wall of the cleaning box 1.

[0023] Specifically, the cleaning structure 3 of the technical solution of the utility model includes: a hollow shaft 31, a cleaning frame 32, a nozzle 33, a one-way valve 34, a water tank 35, a liquid pipe 36, a motor 37, a driving wheel 38, and a driven wheel 39.

[0024] In one embodiment of the utility model, a cleaning structure 3 is provided to facilitate cleaning of multiple semiconductor wafers placed on the surface of the filter screen 2. A cleaning box 1 is provided to place and clean the semiconductor wafers. The cleaning box 1 can be opened through the box door 5. When cleaning, the user can open the box door 5, and then the user places the semiconductor wafers to be cleaned on the surface of the filter screen 2, and then the user closes the box door 5. A water pump is provided inside the water tank 35 to move the water flow. The user can use the water pump to circulate the water inside the water tank 35 through the liquid pipe 36. At this time, the water passes through the one-way valve 34 and then enters the middle-mouth shaft 31. The water entering the middle-mouth shaft 31 will move downward into the cleaning rack 32 for cleaning. Water is supplied and stored, and a liquid inlet is provided on the side wall of the water tank 35 for connecting to an external pipeline. Then the user can start the motor 37 to work. The model of the motor 37 is HG-JR353BK. The motor 37 increases the power for the rotation of the driving wheel 38. The output shaft of the motor 37 drives the driving wheel 38 to rotate. The driving wheel 38 rotates to drive the driven wheel 39 meshing with it and the hollow shaft 31 inside it to rotate, thereby driving the cleaning rack 32 to rotate. At this time, the user can start multiple groups of nozzles 33 to spray water for cleaning, thereby increasing the cleaning range of the nozzle 33. Then, the filter 2 will block larger impurities to a certain extent, and then the collection box 8 is used to collect the cleaned liquid to avoid waste.

[0025] Please continue reading Figure 1-Figure 4The knocking structure 4 includes a directional cylinder 41 that passes through both sides of the inner wall of the cleaning box 1, a moving rod 42 is slidably connected to the inner wall of the directional cylinder 41, a striking plate 43 is fixedly installed on the side wall of the moving rod 42, and a return spring 44 is arranged on the surface of the moving rod 42. Slide blocks 45 are slidably connected to both sides of the inner wall of the cleaning box 1, one end of a connecting rod 46 is hinged to the side wall of the slider 45, and the other end of the connecting rod 46 is hinged to the side wall of the striking plate 43, and a knocking block 47 is fixedly installed at the lower end of the slider 45. Arc-shaped knocking blocks 48 are fixedly installed on both sides of the cleaning rack 32. The knocking block 47 is provided with an arc structure and contacts the inner wall of the cleaning box 1, one end of the return spring 44 is fixedly connected to the side wall of the directional cylinder 41, and the other end of the return spring 44 is fixedly connected to the side wall of the striking plate 43. By setting the knocking structure 4, so that the filter screen 2 can be knocked to make it shake, and the cleaning rack 32 is rotated. At this time, the arc-shaped knocking block 48 on the side wall of the cleaning rack 32 contacts the struck plate 43 after rotation, so that the struck plate 43 moves inward. At this time, the struck plate 43 moves through the moving rod 42 on its side wall and squeezes the return spring 44. When the struck plate 43 moves, it drives the connecting rod 46 on its side wall to move. The movement of the connecting rod 46 drives the slider 45 hinged thereto to move downward. The downward movement of the slider 45 drives the knocking block 47 to knock and shake the surface of the filter screen 2, so that the Shudie semiconductor wafer moves, thereby preventing the semiconductor wafers from being easily piled up during cleaning, so that the stacked places cannot be cleaned.

[0026] During operation, the user can open the box door 5, and then the user places the semiconductor wafer to be cleaned on the surface of the filter screen 2, and then close the box door 5, and then the water in the water tank 35 is circulated through the liquid pipe 36 through the water pump. At this time, the water passes through the one-way valve 34 and then enters the middle shaft 31. The water entering the middle shaft 31 will move downward into the cleaning rack 32 for water supply and storage. Then the user can start the motor 37 to work, and the output shaft of the motor 37 rotates to drive the driving wheel 38 to rotate. The driving wheel 38 rotates to drive the driven wheel 39 meshing with it and the hollow shaft 31 inside it to rotate, thereby driving the cleaning rack 32 to rotate. At this time, the user can start the multiple groups of nozzles 33 to spray water for cleaning. , thereby increasing the cleaning range of the nozzle 33, and the arc-shaped knocking block 48 on the side wall of the cleaning rack 32 contacts the impact plate 43 after rotation, so that the impact plate 43 moves inward, and at this time the impact plate 43 moves through the moving rod 42 on its side wall and squeezes the reset spring 44. When the impact plate 43 moves, it will drive the connecting rod 46 on its side wall to move, and the movement of the connecting rod 46 drives the slider 45 hinged thereto to move downward, and the downward movement of the slider 45 drives the knocking block 47 to knock and shake the surface of the filter 2, so that the semiconductor wafers move, thereby preventing the semiconductor wafers from being easily piled up during cleaning, resulting in the stacked area not being cleaned, thereby further improving the practicality of the device.

[0027] The above generally describes the present invention in detail, but it is obvious to a person skilled in the art that some modifications or improvements can be made to the present invention. Therefore, modifications or improvements that do not deviate from the spirit of the present invention are within the scope of protection of the present invention.

Claims

1. A cleaning device with a collection structure, comprising a cleaning box (1), wherein a filter screen (2) is arranged inside the cleaning box (1), characterized in that: The cleaning box (1) has a door (5) hingedly connected to the side wall thereof. A cleaning structure (3) is arranged inside the cleaning box (1). The cleaning structure (3) comprises: A hollow shaft (31), the hollow shaft (31) passes through the middle of the upper end of the cleaning box (1), a cleaning frame (32) is fixedly installed at the lower end of the hollow shaft (31), a plurality of groups of nozzles (33) are arranged at the lower end of the cleaning frame (32), and a one-way valve (34) is fixedly installed at the upper end of the hollow shaft (31); A water tank (35) is fixedly mounted on the upper end of the cleaning box (1); one end of a liquid pipe (36) is arranged inside the water tank (35); the other end of the liquid pipe (36) is rotatably connected to a one-way valve (34); a motor (37) is fixedly mounted on the upper end of the cleaning box (1); a driving wheel (38) is fixedly mounted on the surface of the output shaft of the motor (37); a driven wheel (39) is fixedly mounted on the surface of the hollow shaft (31); and a knocking structure (4) is arranged inside the cleaning box (1).

2. A cleaning device with a collection structure according to claim 1, characterized in that: The knocking structure (4) comprises a directional cylinder (41) penetrating through both sides of the inner wall of the cleaning box (1); the inner wall of the directional cylinder (41) is slidably connected to a moving rod (42); a striking plate (43) is fixedly installed on the side wall of the moving rod (42); a return spring (44) is arranged on the surface of the moving rod (42); both sides of the inner wall of the cleaning box (1) are slidably connected to sliders (45); the side wall of the slider (45) is hinged with one end of a connecting rod (46); the other end of the connecting rod (46) is hinged to the side wall of the striking plate (43); a knocking block (47) is fixedly installed at the lower end of the slider (45); and arc-shaped knocking blocks (48) are fixedly installed on both sides of the cleaning rack (32).

3. A cleaning device with a collection structure according to claim 2, characterized in that: The knocking block (47) is provided with an arc-shaped structure and is in contact with the inner wall of the cleaning box (1).

4. The cleaning device with a collection structure according to claim 3, characterized in that: One end of the return spring (44) is fixedly connected to the side wall of the directional tube (41), and the other end of the return spring (44) is fixedly connected to the side wall of the striking plate (43).

5. The cleaning device with a collection structure according to claim 1, characterized in that: Fixed plates (6) are fixedly mounted on both sides of the inner wall of the cleaning box (1), a shaking spring (7) is fixedly mounted on the upper end of the fixed plate (6), and the upper end of the shaking spring (7) is fixedly connected to the lower end of the filter screen (2).

6. The cleaning device with a collection structure according to claim 1, characterized in that: The inner wall of the cleaning box (1) is provided with a collecting box (8).

Citation Information

Patent Citations

  • Wafer cleaning device for semiconductor production

    CN214262949U