Plasma activation fog disinfecting and killing equipment

Abstract

The utility model relates to the technical field of air sterilization, and discloses plasma activation fog sterilization equipment, which comprises an atomization device, a plasma activation device, a plasma activation device and a plasma activation device, the atomization device comprises a first shell, a semiconductor condenser and an atomizer, the semiconductor condenser is used for condensing air, and the atomizer is used for converting liquid water condensed by the semiconductor condenser into atomized gas; the reaction device comprises a second shell and a plasma generator used for generating plasmas, the second shell is provided with a reaction cavity, and the plasmas generated by the plasma generator and the atomization gas generated by the atomization device are mixed in the reaction cavity to generate plasma activation mist. By means of the semiconductor condenser, water vapor in air can be directly obtained and condensed to generate liquid water, air sterilization can be achieved without manual water adding, the user experience is better, the purpose of saving water can be achieved, and compared with a water tank, the semiconductor condenser is smaller in size and more convenient to use. And miniaturization of disinfection and killing equipment can be realized.

Description

Technical Field

[0001] The utility model relates to the technical field of air disinfection, in particular to plasma activated mist disinfection equipment. Background Art

[0002] As the quality of life continues to improve, users' requirements for products are getting higher and higher. This is especially true in the home appliance industry, where traditional functions can no longer meet user needs. For example, for indoor air disinfection, traditional air disinfection is carried out through circulating gas, but the sterilization efficiency is relatively low, and it can only disinfect the air in unmanned areas indoors, which is also prone to secondary pollution. Therefore, how to achieve a safe and efficient disinfection process without regional restrictions has become an urgent problem to be solved in the home appliance industry.

[0003] With the continuous breakthroughs in plasma technology, this technology is increasingly favored by various industries. Plasma technology has been applied to industries such as medical equipment, food preservation, and agricultural disinfection, and has played a very critical role. Since plasma-activated water has a strong disinfection function and can dynamically disinfect indoor air when people are present, it does not harm people and objects and does not cause secondary pollution to the environment. It has been increasingly used in the home appliance industry. However, the existing plasma-activated mist disinfection equipment usually has a larger water tank in the atomization device, which not only requires manual water addition, but also makes the entire equipment large and inconvenient to install. Utility Model Content

[0004] In view of this, the utility model provides a plasma activated mist disinfection device to solve the problem that the atomization device of the plasma activated mist preparation device in the prior art is usually provided with a large water tank, which not only requires manual water addition, but also causes the entire device to be large in size and inconvenient to install.

[0005] The utility model provides a plasma activated mist disinfection device, comprising:

[0006] The atomizing device comprises a first shell and a semiconductor condenser and an atomizer integrated in the first shell, wherein the semiconductor condenser is used to condense air, and the atomizer is used to convert liquid water condensed by the semiconductor condenser into atomized gas;

[0007] The reaction device comprises a second shell and a plasma generator for generating plasma. The second shell has a reaction chamber which is respectively connected with the atomizing device and the plasma generator. The plasma generated by the plasma generator and the atomizing gas generated by the atomizing device are mixed in the reaction chamber to generate plasma activated mist.

[0008] Beneficial effect: The semiconductor condenser can directly obtain water vapor in the air for condensation to generate liquid water, and then the liquid water is atomized by the atomizer to generate atomized gas. Air sterilization can be achieved without manual water addition, which provides a better user experience and can save water. The semiconductor condenser is smaller in size than a water tank, and the integrated design of the semiconductor condenser and the atomizer makes the structure more compact, which is more conducive to the miniaturization of the disinfection equipment and effectively solves the problem of the plasma activated mist preparation device in the prior art. The atomizer usually has a larger water tank, which not only requires manual water addition, but also causes the entire device to be large in size and inconvenient to install.

[0009] In an optional embodiment, the atomizing device further comprises:

[0010] The guide structure is arranged between the semiconductor condenser and the atomizer, and is used to guide the liquid water condensed by the semiconductor condenser to the atomizer.

[0011] Beneficial effect: The provided guide structure can conveniently guide the liquid water condensed by the semiconductor condenser to the atomizer for atomization.

[0012] In an optional embodiment, the atomizer is disposed obliquely below the semiconductor condenser, the guide structure is obliquely connected between the semiconductor condenser and the atomizer, and the guide structure includes a guide plate or a guide tube.

[0013] Beneficial effects: By arranging the atomizer obliquely below the semiconductor condenser and obliquely connecting the guide structure between the semiconductor condenser and the atomizer, the water flow can automatically converge into the atomizer along the guide structure under the action of gravity, and the obliquely arranged guide structure can also speed up the flow rate of the water flow and improve the guide effect. Moreover, the guide structure adopts the form of a guide plate or a guide tube, which has a simple structure and a good guide effect.

[0014] In an optional embodiment, the semiconductor condenser comprises:

[0015] A cooling end and a heating end, the cooling end is located inside the first shell, and the heating end is located outside the first shell;

[0016] The guide plate is connected between the refrigeration end of the semiconductor condenser and the atomizer.

[0017] Beneficial effects: The first shell is connected to the external space, and the cooling end of the semiconductor condenser is located inside the first shell, which can reduce the temperature of the surrounding air and thus achieve the effect of condensing the air. The heating end of the semiconductor condenser is located outside the first shell and will not affect the condensation effect. The guide plate is connected between the cooling end of the semiconductor condenser and the atomizer, and can guide the condensed water directly into the atomizer.

[0018] In an optional embodiment, a partition is provided in the first shell, and the partition divides the inner cavity of the first shell into a first chamber and a second chamber that are independent of each other;

[0019] The first chamber is connected to the external environment space, the second chamber is not connected to the external environment space, the semiconductor condenser is arranged in the first chamber, and the atomizer is arranged in the second chamber.

[0020] Beneficial effect: The partition design can ensure that the semiconductor condenser can directly obtain air for condensation, and can also prevent the atomized gas generated by the atomizer from diffusing into the external environment space, thereby affecting the preparation efficiency of the plasma activated mist.

[0021] In an optional embodiment, the first shell has an air inlet and an air outlet, wherein the air inlet is connected to the outside air, and the air outlet is connected to the reaction chamber;

[0022] The atomizing device also includes:

[0023] The airflow driving member is arranged in the first shell and is used for driving the atomized gas in the first shell to enter the reaction chamber.

[0024] Beneficial effect: Through the airflow driving member arranged in the first shell, the airflow driving member can drive the atomized gas generated by the atomizer to be quickly transmitted to the reaction chamber, thereby improving the preparation efficiency of the plasma activated mist.

[0025] In an optional embodiment, the airflow driving member includes an air guide fan arranged at the air outlet.

[0026] Beneficial effect: The air flow driving member adopts an air guide fan to guide the atomized gas generated by the atomizer into the reaction chamber in a direction, thereby improving the preparation efficiency of the plasma activated mist.

[0027] In an optional embodiment, the atomization device and the reaction device are connected through an air outlet pipeline.

[0028] Beneficial effect: By setting up an air outlet pipeline between the atomizing device and the reaction device, the atomized gas blown out from the air outlet of the atomizing device can be guided into the reaction device, so as to be conveniently mixed with the plasma in the reaction device to generate plasma activated mist.

[0029] In an optional embodiment, the plasma generator comprises:

[0030] AC high voltage power supply;

[0031] The electrode structure is wound into a vortex shape, and the electrode structure is arranged in the reaction chamber and connected to an AC high voltage power supply. The electrode structure uses the high voltage AC to break down the air to form plasma.

[0032] Beneficial effects: Through the vortex-shaped electrode structure design, compared with traditional electrode structures, such as flat plates and cylinders, the spiral electrode structure is compact and has a larger effective processing area per unit time. The discharge area is increased, which can effectively improve the mixing efficiency of plasma and atomized gas, thereby improving the efficiency of preparing plasma activated mist.

[0033] In an optional embodiment, the plasma activated mist disinfecting device further comprises:

[0034] The automatic control device is electrically connected to the atomizing device and the reaction device respectively, and is used for controlling the operation of the semiconductor condenser, the atomizer and the plasma generator.

[0035] Beneficial effects: The automatic control device can be used to automatically control the semiconductor condenser, atomizer and plasma generator to achieve efficient disinfection. Air sterilization can be achieved without human operation, with a higher degree of automation.

[0036] In an optional embodiment, the automatic control device includes:

[0037] A collection module, comprising a first sensor for collecting atomization amount information, and a second sensor for detecting active particle content information in plasma activated mist;

[0038] A processing module, used for analyzing whether it is necessary to adjust the working power of the semiconductor condenser, the atomizer, and the plasma generator according to the received mode selection instruction, the atomization amount information collected by the first sensor, and the active particle content information in the plasma activated mist detected by the second sensor;

[0039] The execution module is used to adjust the working power of the semiconductor condenser, the atomizer and the plasma generator according to the analysis result of the processing module.

[0040] Beneficial effects: The automatic control device is equipped with an acquisition module and a processing module. The acquisition module can respectively collect atomization amount information and active particle content information in the plasma activated mist. The processing module can analyze whether it is necessary to adjust the operating power of the semiconductor condenser, atomizer, and plasma generator according to the received mode selection instruction, the atomization amount information collected by the first sensor, and the active particle content information in the plasma activated mist detected by the second sensor, so as to meet user needs. The entire disinfection process adopts automatic detection and identification control, and can achieve efficient air sterilization effect without human operation, which provides a better user experience. BRIEF DESCRIPTION OF THE DRAWINGS

[0041] In order to more clearly illustrate the specific implementation methods of the utility model or the technical solutions in the prior art, the drawings required for use in the specific implementation methods or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some implementation methods of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0042] Figure 1 This is a structural schematic diagram of the first embodiment of the plasma activated mist disinfection equipment in the embodiment of the utility model;

[0043] Figure 2 This is a structural schematic diagram of a second embodiment of the plasma activated mist disinfection equipment in the embodiment of the utility model;

[0044] Figure 3 It is a structural schematic diagram of a third embodiment of the plasma activated mist disinfection equipment in the embodiment of the utility model;

[0045] Figure 4 This is a schematic diagram of the structure of the reaction device in the embodiment of the utility model;

[0046] Figure 5 This is a schematic diagram of the structure of the electrode structure in the embodiment of the utility model;

[0047] Figure 6 for Figure 5 sectional view of

[0048] Figure 7 for Figure 6 Enlarged view of point A in the middle;

[0049] Figure 8 is a schematic plan view of the second electrode in an embodiment of the utility model;

[0050] Fig. 9 This is a schematic diagram of the structure of the electrode structure of the reaction device in the embodiment of the utility model in the first working position (that is, in the deep disinfection mode);

[0051] Fig.10 for Fig. 9 A cross-sectional view of the reaction device along the length direction of the second shell;

[0052] Fig.11 for Fig. 9 A cross-sectional view of the reaction device along the width direction of the second shell;

[0053] Fig.12 A schematic diagram of the structure of the electrode structure of the reaction device in the embodiment of the utility model in the second working position (i.e., in the normal disinfection mode);

[0054] Fig.13 for Fig.12 A cross-sectional view of the reaction device along the length direction of the second shell;

[0055] Fig.14 It is a schematic flow chart of an implementation method of the plasma air disinfection method in an embodiment of the utility model.

[0056] Description of reference numerals:

[0057] 10. Atomization device;

[0058] 11. first shell; 110. partition; 111. first chamber; 112. second chamber;

[0059] 12. Semiconductor condenser; 13. Atomizer; 14. Flow guide structure; 15. Air flow driving part; 16. Air outlet pipe;

[0060] 20. Reaction device;

[0061] 21, second housing; 210, barrier; 211, third chamber; 2111, first atomizing gas inlet; 2112, first activated mist outlet; 212, fourth chamber; 2121, second atomizing gas inlet; 2122, second activated mist outlet;

[0062] 22. Plasma generator;

[0063] 221, electrode structure; 2210, vortex channel; 2211, first electrode; 2212, second electrode; 22120, through hole; 2213, insulating medium layer; 222, electrode terminal plate;

[0064] 30. Automatic control device. DETAILED DESCRIPTION

[0065] In order to make the purpose, technical solution and advantages of the embodiment of the utility model clearer, the technical solution in the embodiment of the utility model will be clearly and completely described below in conjunction with the drawings in the embodiment of the utility model. Obviously, the described embodiment is a part of the embodiment of the utility model, not all the embodiments. Based on the embodiment of the utility model, all other embodiments obtained by those skilled in the art without creative work are within the scope of protection of the utility model.

[0066] As the quality of life continues to improve, users' requirements for products are getting higher and higher. This is especially true in the home appliance industry, where traditional functions can no longer meet user needs. For example, for indoor air disinfection, traditional air disinfection is carried out through circulating gas, but the sterilization efficiency is relatively low, and it can only disinfect the air in unmanned areas indoors, which is also prone to secondary pollution. Therefore, how to achieve a safe and efficient disinfection process without regional restrictions has become an urgent problem to be solved in the home appliance industry.

[0067] With the continuous breakthroughs in plasma technology, this technology is increasingly favored by various industries. Plasma technology has been applied to industries such as medical devices, food preservation, and agricultural disinfection, and has played a very critical role. Since plasma-activated water has a strong disinfection function and can dynamically disinfect indoor air when people are present, it does not harm people and objects, and does not cause secondary pollution to the environment, and is increasingly being used in the home appliance industry.

[0068] However, the atomization device of the related plasma activated mist disinfection equipment usually has a larger liquid storage tank, which not only requires manual water addition, but also makes the entire equipment large and inconvenient to install. In addition, its disclosed atomization module and electrode structure are very complex and large in size, which is not suitable for compact product structure and miniaturized design.

[0069] Combine the following Figures 1 to 14 , describing an embodiment of the utility model.

[0070] According to an embodiment of the present utility model, on the one hand, as Figures 1 to 3 As shown, the utility model provides a plasma activated mist disinfection equipment, including an atomizing device 10 and a reaction device 20, the atomizing device 10 includes a first shell 11 and a semiconductor condenser 12 and an atomizer 13 integrated in the first shell 11, the semiconductor condenser 12 is used to condense air, and the atomizer 13 is used to convert liquid water condensed by the semiconductor condenser 12 into atomized gas; the reaction device 20 includes a second shell 21 and a plasma generator 22 for generating plasma, the second shell 21 has a reaction chamber respectively connected to the atomizing device 10 and the plasma generator 22, the plasma generated by the plasma generator 22 and the atomized gas generated by the atomizing device 10 are mixed in the reaction chamber to generate plasma activated mist.

[0071] In the above embodiment, the semiconductor condenser 12 is provided to directly obtain water vapor in the air for condensation to generate liquid water, and then the liquid water is atomized by the atomizer 13 to generate atomized gas, so that air sterilization can be achieved without manual water addition, which provides a better user experience and can also achieve the purpose of saving water. In addition, the semiconductor condenser 12 is smaller in size than the water tank, and the semiconductor condenser 12 and the atomizer 13 are integrated into a structure that is more compact and more conducive to the miniaturization of the disinfection equipment, effectively solving the problem of the plasma activated mist preparation device in the prior art. The atomizer 10 is usually provided with a larger water tank, which not only requires manual water addition, but also causes the entire device to be large in size and inconvenient to install.

[0072] In this embodiment, the thermoelectric effect of semiconductor materials is used to achieve directional heat transfer through current control, thereby achieving the purpose of cooling or heating. The plasma activated mist disinfection equipment provided in this embodiment, through the semiconductor condenser 12, does not require any refrigerant in the process of condensing air, has no pollution source, can work continuously, and is different from traditional mechanical refrigeration devices. The thermoelectric cooler basically does not generate any electronic interference signals during operation, and does not generate any noise during operation, which is more suitable for home use and improves the user experience.

[0073] Specifically, the semiconductor condenser 12 is integrated on the first housing 11, and the atomizer 13 is integrated in the first housing 11. The atomizer 13 is formed in the first housing 11. The plasma generated by the plasma generator 22 and the atomized gas generated by the atomizing device 10 are both introduced into the reaction chamber, mixed in the reaction chamber to form a plasma activated mist, and then discharged.

[0074] Optionally, the plasma activated mist disinfection equipment also includes a nozzle, which is installed at the activation mist outlet of the reaction chamber so that the plasma activated mist is sprayed evenly.

[0075] In some embodiments, the atomization device 10 further includes a guide structure 14 , which is disposed between the semiconductor condenser 12 and the atomizer 13 and is used to guide the liquid water condensed by the semiconductor condenser 12 to the atomizer 13 .

[0076] In the above embodiment, the guide structure 14 is provided to facilitate guiding and converging the liquid water condensed by the semiconductor condenser 12 to the atomizer 13 for atomization.

[0077] In some embodiments, the atomizer 13 is disposed obliquely below the semiconductor condenser 12 , and the guide structure 14 is obliquely connected between the semiconductor condenser 12 and the atomizer 13 , and the guide structure 14 includes a guide plate or a guide tube.

[0078] In the above embodiment, by arranging the atomizer 13 obliquely below the semiconductor condenser 12, and obliquely connecting the guide structure 14 between the semiconductor condenser 12 and the atomizer 13, the water flow can automatically converge into the atomizer 13 along the guide structure 14 under the action of gravity, and the obliquely arranged guide structure 14 can also speed up the flow rate of the water flow and improve the guide effect. Moreover, the guide structure 14 adopts the form of a guide plate or a guide tube, which has a simple structure and a good guide effect.

[0079] Optionally, the guide plate may adopt a plate-shaped structure with a V-shaped or U-shaped cross-section. The guide plate can prevent water from overflowing while guiding the flow by adopting a V-shaped plate or a U-shaped plate.

[0080] Of course, in this embodiment, the guide structure 14 can also adopt a circumferentially closed guide tube, one end of which is connected to the outlet of the semiconductor condenser 12, and the other end is connected to the inlet of the atomizer 13. The guide structure 14 adopts a guide tube to better prevent water overflow and prevent impurities and dust from falling in.

[0081] In some embodiments, the semiconductor condenser 12 includes a cooling end and a heating end, the cooling end is located inside the first shell 11, and the heating end is located outside the first shell 11; the guide plate is connected between the cooling end of the semiconductor condenser 12 and the atomizer 13.

[0082] In the above embodiment, the first shell 11 is connected to the external space, and the cooling end of the semiconductor condenser 12 is located in the first shell 11, which can reduce the temperature of the surrounding air and thus achieve the effect of condensing the air. The heating end of the semiconductor condenser 12 is located outside the first shell 11 and will not affect the condensation effect. The guide plate is connected between the cooling end of the semiconductor condenser 12 and the atomizer 13, and can directly guide the condensed water into the atomizer 13.

[0083] In some optional embodiments, the semiconductor condenser 12 has two electrodes, a cooling electrode and a heating electrode. In this embodiment, only the cooling electrode is used, and the heating electrode is outside the system and is located outside the first shell 11.

[0084] In some optional embodiments, the semiconductor condenser 12 uses a semiconductor refrigeration plate, which is arranged in the first shell 11 and connected to the external air. The semiconductor condenser 12 not only has a good condensation effect by using the semiconductor refrigeration plate, but also has a small size, is easy to install, and is more conducive to miniaturized design.

[0085] In some embodiments, the first shell 11 has an air inlet and an air outlet, wherein the air inlet is connected to the outside air, and the air outlet is connected to the reaction chamber; the atomization device 10 also includes an airflow driving member 15, which is arranged in the first shell 11 and is used to drive the atomized gas in the first shell 11 into the reaction chamber.

[0086] In the above embodiment, the airflow driving member 15 is arranged in the first housing 11 , and the airflow driving member 15 can drive the atomized gas generated by the atomizer 13 to be quickly transferred to the reaction chamber, thereby improving the preparation efficiency of the plasma activated mist.

[0087] In some embodiments, the airflow driving member 15 includes an air guide fan disposed at the air outlet.

[0088] In the above embodiment, the airflow driving member 15 can direct the atomized gas generated by the atomizer 13 into the reaction chamber by using an air guide fan, thereby improving the preparation efficiency of the plasma activated mist.

[0089] Specifically, the inlet end of the air-guiding fan is connected to the inner cavity of the first shell 11, and the outlet end is connected to the air outlet. The atomizer 13 is located between the semiconductor condenser 12 and the air-guiding fan. The air-guiding fan can blow the atomized gas generated by the atomizer 13 into the reaction chamber through the air outlet.

[0090] In some alternative embodiments, the airflow driving member 15 may also be a fan, etc.

[0091] In some embodiments, the atomization device 10 is connected to the reaction device 20 via an air outlet pipe 16 .

[0092] In the above embodiment, the air outlet duct 16 is provided between the atomizing device 10 and the reaction device 20, so that the atomized gas blown out from the air outlet of the atomizing device 10 can be guided into the reaction device 20, so as to be mixed with the plasma in the reaction device 20 to generate plasma activated mist.

[0093] In some preferred embodiments, Figure 2 and Figure 3As shown, a partition 110 is arranged in the first shell 11, and the partition 110 divides the inner cavity of the first shell 11 into two independent first chambers 111 and second chambers 112, and the first chambers 111 and the second chambers 112 are not connected to each other, wherein the semiconductor condenser 12 is arranged in the first chamber 111, and the first chamber 111 is connected to the external environment space to ensure that external air can enter the first chamber 111 for condensation and liquefaction of the semiconductor condenser 12, and the atomizer 13 is arranged in the second chamber 112, and the second chamber 112 is not connected to the external environment space. Through the above design, it can be ensured that the semiconductor condenser 12 can directly obtain air for condensation, and the atomized gas generated by the atomizer 13 can be prevented from diffusing into the external environment space, affecting the preparation efficiency of the plasma activated mist.

[0094] Furthermore, the air inlet is opened on the first chamber 111, and the air outlet is opened on the second chamber 112. The atomizer 13 is lower than the semiconductor condenser 12, and the partition 110 is provided with a through hole for the guide structure 14 to pass through. The through hole is provided to facilitate the guide structure 14 to pass through the partition 110 and connect with the atomizer 13.

[0095] In one example, if Figure 2 As shown, the partition 110 is a longitudinal plate-shaped structure, which divides the inner cavity of the first shell 11 into two left and right chambers, wherein the left one is the first chamber 111 and the right one is the second chamber 112 .

[0096] In another example, if Figure 3 As shown, the partition 110 is a transverse plate-shaped structure, which divides the inner cavity of the first shell 11 into two upper and lower chambers, wherein the upper side is the first chamber 111 and the lower side is the second chamber 112 .

[0097] In some optional embodiments, the atomizer 13 includes an atomizer body and a micro water storage structure disposed at the upper end of the atomizer body. The micro water storage structure has a water storage chamber, in which a small amount of spare water can be stored. Regardless of whether the plasma generator 22 is working or not, the amount of water in the water storage chamber is maintained at a set amount of water. For example, after the discharge work is completed, if the water level in the water storage chamber is lower than the set amount of water, the semiconductor condenser 12 is controlled to continue working until the water level in the water storage chamber reaches the set amount of water. When insufficient water is detected, the automatic control device 30 will increase the power of the semiconductor condenser 12 to increase the amount of condensed water to meet demand. In addition, the automatic control device 30 will also control the amount of water produced by the semiconductor condenser 12 by calculating the amount of water consumed by the atomizer 13 to achieve dynamic balance.

[0098] In this embodiment, the atomizing device 10 includes a semiconductor condenser 12, a flow guiding structure 14, an atomizer 13 and an airflow driving member 15. The present application adopts the integrated technology of semiconductor condensation and atomizer 13 to realize the productized miniaturized design. According to the principle of the semiconductor condenser 12, the air can be condensed quickly, and the air is collected on the atomizer 13 through the flow guiding structure 14. Under the action of the atomizer 13, the liquid water is converted into atomized gas. The main working process is as follows: the cooling end of the semiconductor condenser 12 will condense a certain amount of water droplets. When the water droplets accumulate to a certain amount, they are guided to the atomizer 13 along the flow guiding structure 14 under the action of gravity. The atomizer 13 then atomizes the water guided down to form atomized gas. Under the action of the airflow driving member 15, the atomized gas is transmitted to the air outlet pipe 16 and transferred to the reaction chamber of the reaction device 20.

[0099] In some embodiments, in combination Figure 1 , Figures 4 to 12 As shown, the plasma generator 22 includes an AC high-voltage power supply (not shown in the figure) and an electrode structure 221. The electrode structure 221 is wound into a vortex shape. The electrode structure 221 is arranged in the reaction chamber and connected to the AC high-voltage power supply. The electrode structure 221 uses high-voltage AC to break down air to form plasma.

[0100] In the above embodiment, by setting the electrode structure 221 of the plasma generator 22 to a vortex shape, the structure of the plasma generator 22 is made more compact, which is more conducive to the miniaturized design of the product. Compared with the traditional flat, cylindrical, and needle-shaped electrode structures, the spiral electrode structure 221 is not only more compact in structure, but also has a larger effective processing area per unit time and a larger discharge area, which can effectively improve the mixing efficiency of plasma and atomized gas, thereby improving the preparation efficiency of activated mist, thereby improving the sterilization efficiency, and effectively solving the problem that the reaction device 20 in the prior art has a non-compact structure, a relatively large volume, a relatively small discharge area, and a low preparation efficiency of plasma activated mist.

[0101] Specifically, the second shell 21 has a chamber, and the atomizing gas inlet and the activated mist outlet are respectively connected to the chamber of the second shell 21, wherein the atomizing gas inlet is used to supply atomizing gas to enter the second shell 21, and the electrode structure 221 can use high-voltage alternating current to break down the air in the second shell 21 to form plasma. The plasma generated by the discharge of the electrode structure 221 can be mixed with the atomizing gas entering from the atomizing gas inlet to generate activated mist, which is then discharged from the activated mist outlet for disinfecting the air.

[0102] In some embodiments, in combination Figures 4 to 9As shown, the electrode structure 221 includes a first electrode 2211 , a second electrode 2212 , and an insulating dielectric layer 2213 . There are two second electrodes 2212 , and the two second electrodes 2212 are distributed on both sides of the first electrode 2211 . The insulating dielectric layer 2213 is disposed between the first electrode 2211 and the second electrode 2212 .

[0103] In the above embodiment, the electrode structure 221 can form a dielectric barrier discharge by adopting the design of the first electrode 2211, the second electrode 2212, and the insulating dielectric layer 2213, and after applying a certain voltage between the first electrode 2211 and the second electrode 2212, a large amount of strong electric field will be generated between the two electrodes, thereby ionizing and breaking down the air, and then generating plasma. In addition, according to the dielectric barrier discharge, the discharge area is proportional to the concentration of the generated plasma, that is, the larger the discharge area, the more plasma is generated under the same conditions. The present application can maximize the discharge area of ​​the electrode structure 221 within a limited space by setting the electrode structure 221 in a vortex shape, and by setting two second electrodes 2212 on both sides of the first electrode 2211, discharge can be performed on both sides of the electrode structure 221, and the discharge area is doubled, thereby doubling the preparation efficiency of the activated mist.

[0104] Specifically, the electrode structure 221 includes a first electrode 2211, two second electrodes 2212 and an insulating dielectric layer 2213, and there is a set potential difference between the first electrode 2211 and the second electrode 2212. One of the first electrode 2211 and the second electrode 2212 is connected to the high voltage end of the AC high voltage power supply, and the other is connected to the low voltage end, or, it can also be said that one of the first electrode 2211 and the second electrode 2212 is connected to the positive pole of the AC high voltage power supply and the other is connected to the negative pole, or, it can also be said that one of the first electrode 2211 and the second electrode 2212 is connected to the high voltage end of the AC high voltage power supply and the other is grounded. Optionally, the first electrode 2211 is connected to the low voltage end of the AC high voltage power supply, and the second electrode 2212 is connected to the high voltage end of the AC high voltage power supply.

[0105] Furthermore, since the second electrode 2212 is exposed to the environment for a long time during operation and the discharge process will produce highly oxidizing particles, the second electrode 2212 should consider using a conductive material with high corrosion resistance and not easy to oxidize when selecting the material, such as stainless steel or titanium alloy. The first electrode 2211 is hidden in the insulating dielectric layer 2213, and the material performance requirements of the first electrode 2211 are conductive metals, such as copper and aluminum. Of course, the first electrode 2211 can also use metal materials such as stainless steel or titanium alloy. The insulating dielectric layer 2213 is the dielectric layer required for discharge, and its material can be selected from a flexible insulating material with strong electrical breakdown resistance, high corrosion resistance and not easy to oxidize.

[0106] In some embodiments, in combination Figures 6 to 8 As shown, a plurality of through holes 22120 are defined on the second electrode 2212 .

[0107] In the above embodiment, since a large amount of air is required to participate in the reaction during the discharge of the plasma generator 22 to generate plasma, that is, the larger the contact area between the second electrode 2212 and the air, the more plasma is generated. Therefore, the present application forms a porous structure of the second electrode 2212 by opening a plurality of through holes 22120 on the second electrode 2212, which can further increase its discharge area, thereby increasing the plasma output and further improving the preparation efficiency of the activated mist.

[0108] In some embodiments, the first electrode 2211 and the second electrode 2212 are both strip-shaped conductive sheets; the insulating dielectric layer 2213 wraps around the first electrode 2211 , and the two second electrodes 2212 are correspondingly attached to and fixed on the outside of the insulating dielectric layer 2213 on both sides of the first electrode 2211 .

[0109] In the above embodiment, the first electrode 2211 and the second electrode 2212 are configured as strip-shaped conductive sheets for easy winding, and the two second electrodes 2212 are fitted and fixed to the outside of the insulating medium layer 2213 located on both sides of the first electrode 2211, so that the entire electrode structure 221 forms a sandwich structure, i.e., the first electrode 2211-insulating medium layer 2213-second electrode 2212, and the structure is more compact.

[0110] Specifically, the first electrode 2211 and the second electrode 2212 are both strip-shaped metal sheets. The insulating dielectric layer 2213 can completely wrap the first electrode 2211, and then the first electrode 2211 is connected through one end of the lead, and the other end passes through the insulating dielectric layer 2213 and is connected to the low voltage end of the AC high voltage power supply or is grounded.

[0111] Furthermore, the first electrode 2211 has two shaped side surfaces that are opposite to each other, and the two second electrodes 2212 are fixed outside the insulating medium layer 2213 outside the two shaped side surfaces of the first electrode 2211 .

[0112] Optionally, the second electrode 2212 is bonded and fixed on the outer surface of the insulating dielectric layer 2213 .

[0113] In some embodiments, in combination Figure 4 , Figures 9 to 13As shown, the inner cavity of the second shell 21 is divided into two chambers, and the electrode structure 221 is movably arranged between the two chambers; the chamber includes a third chamber 211 and a fourth chamber 212, and the atomization gas inlet includes a first atomization gas inlet 2111 arranged on the third chamber 211 and a second atomization gas inlet 2121 arranged on the fourth chamber 212; the activated mist outlet includes a first activated mist outlet 2112 arranged on the third chamber 211 and a second activated mist outlet 2122 arranged on the fourth chamber 212; the first atomization gas inlet 2111 is arranged at the top or bottom of the third chamber 211, and the first activated mist outlet 2112 is arranged on the side of the third chamber 211; one of the second atomization gas inlet 2121 and the second activated mist outlet 2122 is arranged at the top of the fourth chamber 212, and the other is arranged at the bottom of the fourth chamber 212.

[0114] In the above embodiment, by dividing the inner cavity of the second shell 21 into a third chamber 211 and a fourth chamber 212, and different chambers adopt the above-mentioned design of atomizing gas inlet and activated mist outlet at different positions, the flow path lengths of the atomizing gas in the two chambers can be made different, so that activated mist with different mixing efficiency and sterilization efficiency can be prepared to meet the needs of different scenarios, and by movably setting the electrode structure 221 between the two chambers, switching between different modes is convenient, so that a balance between efficient sterilization and low energy consumption can be taken into account, and the purpose of efficient energy saving can be achieved while meeting the sterilization efficiency.

[0115] Specifically, in this embodiment, the first atomizing gas inlet 2111 is arranged at the top or bottom of the third chamber 211, and the first activated mist outlet 2112 is arranged on the side of the fourth chamber 212. When the vortex-shaped electrode structure 221 is located in the third chamber 211, after the atomizing gas enters from the first atomizing gas inlet 2111, it can enter the vortex channel from the upper and lower ends of the vortex channel formed by the vortex-shaped electrode structure 221, and follow the vortex trajectory of the vortex channel. After fully contacting and mixing with the plasma in the vortex channel, it flows from the end of the vortex channel to the first activated mist outlet 2112, and then is discharged from the first activated mist outlet 2112. The atomizing gas has a spiral flow trajectory in the third chamber 211, with a longer residence reaction time and more complete mixing with the plasma, so that the prepared plasma activated mist has a higher concentration, a better sterilization effect, and is more suitable for deep disinfection mode.

[0116] Furthermore, the second atomizing gas inlet 2121 and the second activated mist outlet 2122 located in the fourth chamber 212 adopt a vertical straight-through design. After entering the fourth chamber 212, the atomizing gas directly passes through the upper and lower ends of the vortex channel of the electrode structure 221. The atomizing gas goes straight in and out, and the reaction time with the plasma generated by the electrode structure 221 is short, so the concentration of the prepared plasma activated mist is relatively low, which is more suitable for ordinary disinfection mode.

[0117] Preferably, in this embodiment, the third chamber 211 and the fourth chamber 212 are arranged left and right.

[0118] In some embodiments, in combination Figure 4 , Figure 5 , Figures 9 to 11 As shown, the electrode structure 221 forms a vortex channel 2210, and the vortex channel 2210 has a rolling end located in the center and a tail end located on the periphery; the electrode structure 221 has a first working position located in the third chamber 211 and a second working position located in the fourth chamber 212; when the electrode structure 221 is located in the first working position, the first atomizing gas inlet 2111 corresponds to the rolling end in the center of the vortex channel 2210, and the tail end of the vortex channel 2210 faces the first activated mist outlet 2112.

[0119] In the above embodiment, the first atomizing gas inlet 2111 is arranged at the center position of the top or bottom of the third chamber 211, and corresponds to the rolling end in the center of the vortex channel 2210, so that when the vortex-shaped electrode structure 221 is located in the third chamber 211, the entering atomizing gas can enter the vortex channel from the rolling end in the center of the electrode structure 221, and then be discharged from the tail end of the vortex channel 2210 to the first activated mist outlet 2112, and be discharged from the first activated mist outlet 2112. Through the above design, the atomizing gas can flow from the rolling end to the end of the vortex channel, through the entire vortex channel, and the flow path is the longest, thereby maximizing the reaction time between the atomizing gas and the plasma and increasing the concentration of the plasma activated mist.

[0120] Preferably, in this embodiment, the first atomizing gas inlet 2111 and the second atomizing gas inlet 2121 are located on the same side of the second shell 21. For example, when the first atomizing gas inlet 2111 is set at the top of the third chamber 211, the second atomizing gas inlet 2121 is also set at the top of the fourth chamber 212; when the first atomizing gas inlet 2111 is set at the bottom of the third chamber 211, the second atomizing gas inlet 2121 is also set at the bottom of the fourth chamber 212. By arranging the first atomizing gas inlet 2111 and the second atomizing gas inlet 2121 on the same side, it is convenient to connect with the outlet end of the atomizing device 10 later.

[0121] In some embodiments, the plasma generator 22 is slidably connected in the second shell 21, and the reaction device 20 also includes a first driving mechanism, which is connected to the electrode structure 221 and is suitable for driving the electrode structure 221 to move between the first working position and the second working position.

[0122] In the above embodiment, the design of the sliding plasma generator 22 facilitates the adjustment of its position in the second shell 21, and the first driving mechanism is provided to facilitate the automatic switching of the reaction device 20 between different disinfection modes, which has a higher degree of automation and intelligence.

[0123] Specifically, the plasma generator 22 can be slidably connected to the second shell 21 by means of a slide rail or a slide groove. Preferably, it can also be guided and limited by structures such as balls and guide wheels. The first drive mechanism can adopt a motor or an electric push rod. The first drive mechanism can be installed inside the second shell 21 or outside the second shell 21. Preferably, the first drive mechanism is installed outside the second shell 21 and will not occupy the internal space of the second shell 21.

[0124] Optionally, in this embodiment, the plasma generator 22 also includes an electrode terminal plate 222, and there are two electrode terminal plates 222, which are arranged on both sides of the electrode structure 221. The electrode terminal plates 222 are formed as one piece with the electrode structure 221, and the electrode terminal plates 222 are slidably connected in the second shell 21, thereby ensuring that the plasma generator 22 remains connected to the second shell 21 when switching modes.

[0125] In some embodiments, in combination Figure 4 , Fig.12 , Fig.13 As shown, the top or bottom of the fourth chamber 212 is open to form a second atomizing gas inlet 2121 ; the second activated mist outlet 2122 includes a plurality of gas outlet holes opened on the bottom or top of the fourth chamber 212 .

[0126] In the above embodiment, the second atomization gas inlet 2121 is formed by opening the top or bottom of the fourth chamber 212. The opening area of ​​the second atomization gas inlet 2121 is larger, which is convenient for more atomization gas to enter. The second activated mist outlet 2122 adopts a design of several small air outlet holes, which can make the plasma activated mist spray out evenly in a mist form, and the sterilization effect is better.

[0127] Specifically, in the present embodiment, the second shell 21 is a rectangular box body, and a barrier member 210 is arranged in the middle of the rectangular box body to separate it into a third chamber 211 and a fourth chamber 212. The first electrode 2211 and the second electrode 2212 are both strip-shaped conductive sheets, and the widths of the first electrode 2211 and the second electrode 2212 match the height of the rectangular second shell 21. The axial direction of the vortex-shaped electrode structure 221 is consistent with the height direction of the second shell 21. When the electrode structure 221 is in the second working position, the upper and lower ends of the vortex channel of the electrode structure 221 are respectively connected to the second atomization gas inlet 2121 and the second activated mist outlet 2122 on the upper and lower sides of the fourth chamber 212, and a plurality of air outlets can be opened on the top wall or bottom wall of the fourth chamber 212 along the vortex trajectory of the vortex channel to facilitate the discharge of activated mist.

[0128] Optionally, in this embodiment, the first atomizing gas inlet 2111 is arranged on the bottom wall of the third chamber 211 , the second atomizing gas inlet 2121 is arranged on the bottom wall of the fourth chamber 212 , and the second activated mist outlet 2122 is arranged on the top wall of the fourth chamber 212 .

[0129] In other more preferred embodiments, the first atomizing gas inlet 2111 is arranged on the top wall of the third chamber 211, the second atomizing gas inlet 2121 is arranged on the top wall of the fourth chamber 212, and the second activated mist outlet 2122 is arranged on the bottom wall of the fourth chamber 212. With such a design, the plasma generator 22 can be slidably connected to the bottom walls of the third chamber 211 and the fourth chamber 212, thereby avoiding the second atomizing gas inlet 2121 being arranged on the bottom wall of the fourth chamber 212, which has a larger opening and will cause the plasma generator 22 to appear suspended.

[0130] Optionally, the air outlet pipeline 16 of the atomizing device 10 includes a first air outlet pipeline and a second air outlet pipeline, the first air outlet pipeline is connected to the first atomizing gas inlet 2111, and the second air outlet pipeline is connected to the second atomizing gas inlet 2121, and the first air outlet pipeline and the second air outlet pipeline are respectively provided with switch valves.

[0131] In some embodiments, the AC high voltage power supply is located in the second shell 21 , the electrode structure 221 is connected to the AC high voltage power supply, and the AC high voltage power supply and the electrode structure 221 are integrated.

[0132] In the above embodiment, the AC high-voltage power supply is arranged in the second shell 21 and integrated with the electrode structure 221. When the driving mechanism adjusts the position of the electrode structure 221, the AC high-voltage power supply can move with the electrode structure 221, thereby avoiding the problem that the AC high-voltage power supply does not move, the line between it and the electrode structure 221 is pulled, and it is easy to be damaged, or it causes friction interference with other components, which poses a high safety hazard.

[0133] Optionally, in some specific embodiments, the AC high voltage power supply and the electrode structure 221 are fixed on the same mounting plate, and the mounting plate is slidably connected to the second shell 21. Alternatively, in other embodiments, the AC high voltage power supply and the electrode structure 221 can be integrated in the same box body, and the box body is slidably connected to the second shell 21. This embodiment does not limit the specific integration method of the AC high voltage power supply and the electrode structure 221, as long as the two can move synchronously.

[0134] In some embodiments, the reaction device 20 also includes a barrier 210 and a second driving mechanism, the barrier 210 has a barrier position that divides the inner cavity of the second shell 21 into two chambers and an open position that connects the two chambers; the second driving mechanism is connected to the barrier 210 and is suitable for driving the barrier 210 to switch between the barrier position and the open position.

[0135] In the above embodiment, the second shell 21 is divided into two chambers by the setting of the partition 210, which can realize the spatial independence of the two areas and ensure the independent airtightness of each chamber in different modes. In addition, the setting of the second driving mechanism can realize the driving of the partition 210 to move between the partition position and the open position, so as to facilitate the adjustment of the position of the plasma generator 22 in the second shell 21 to realize the switching of different modes according to different sterilization requirements.

[0136] For example, when it is necessary to switch from the normal disinfection mode to the deep disinfection mode, the second driving mechanism drives the barrier 210 to move to the open position, and then the first driving mechanism drives the plasma generator 22 to move from the fourth chamber 212 to the third chamber 211.

[0137] Optionally, the baffle 210 can be a sliding baffle, a pull-out baffle, a telescopic plate or a rolling baffle, and the second driving mechanism can be a motor, an electric push rod, a hydraulic cylinder, etc. Preferably, the second driving mechanism is installed outside the second shell 21.

[0138] In some specific examples, combined with Figure 4 , Figures 9 to 13 As shown, the second shell 21 is divided into two left and right areas, namely the third chamber 211 and the fourth chamber 212. The bottom surface of the third chamber 211 with the first atomizing gas inlet 2111 is set as surface a, and the side surface of the third chamber 211 with the first activated mist outlet 2112 is set as surface b. The bottom surface of the fourth chamber 212 with the second atomizing gas inlet 2121 is set as surface c, and the side surface of the fourth chamber 212 with the second activated mist outlet 2122 is set as surface d. The efficiency of the activated mist generated by the electrode structure 221 in different areas is different.

[0139] like Figures 9 to 11As shown, in the high-efficiency disinfection mode, when the electrode structure 221 is in the third chamber 211, the electrode structure 221 discharges in the third chamber 211 to generate plasma, and the atomized gas enters from the first atomized gas inlet 2111, and then flows from the center of the vortex-shaped electrode structure 221 along the vortex channel from the starting end to the tail end, and then is discharged from the first activated mist outlet 2112. The atomized gas flows in a vortex shape in the third chamber 211, and the flow path and residence time are longer, so it can be fully mixed with the plasma, and the prepared activated mist has a higher concentration and a better sterilization effect.

[0140] like Fig.12 , Fig.13 As shown, in the normal disinfection mode, when the electrode structure 221 is in the fourth chamber 212, the atomized gas enters the fourth chamber 212 from the second atomized gas inlet 2121 on the c side, and then enters the vortex channel from the lower end of the vortex channel of the electrode structure 221, where the atomized gas mixes with the plasma to form an activated mist, and then is discharged from the upper end of the vortex channel, the second activated mist outlet 2122 on the d side, in a straight line.

[0141] It should be explained that the factors affecting the efficiency of preparing activated mist include the residence time of the activated mist in the discharge area and the mixing efficiency. The activated mist preparation efficiency and the activated mist concentration in the third chamber 211 are higher than those in the fourth chamber 212. However, since the flow path of the atomized gas in the third chamber 211 is spiral and the flow path in the fourth chamber 212 is straight, the resistance in the third chamber 211 is greater than that in the fourth chamber 212, and more energy is required to overcome the resistance. Therefore, the resistance can be overcome by increasing the power of the atomized gas in the third chamber 211. For example, the power of the airflow driving member 15 in the atomizing device 10 can be increased to increase the power of the atomized gas. In other alternative embodiments, an exhaust fan can also be set at the first activated mist outlet 2112. The preparation efficiency and concentration of activated mist in the high-efficiency disinfection mode are higher, and the sterilization effect is better. The sterilization effect of the ordinary disinfection mode is slightly lower than that of the high-efficiency disinfection mode, but the energy consumption required is less. Therefore, different modes can be switched according to the needs of different places, taking into account the efficiency and low energy consumption of activated mist preparation, so as to achieve the purpose of high efficiency and energy saving.

[0142] This embodiment provides a miniature and compact multi-mode reaction device 20, which can effectively improve the sterilization efficiency by adopting a spiral porous electrode structure 221 design. At the same time, different modes can be adjusted according to needs to achieve the purpose of improving the sterilization efficiency and saving energy consumption.

[0143] In some embodiments, the plasma-activated mist disinfection equipment also includes an automatic control device 30, which is electrically connected to the atomization device 10 and the reaction device 20 respectively, and is used to control the operation of the semiconductor condenser 12, the atomizer 13, and the plasma generator 22.

[0144] In the above embodiment, the semiconductor condenser 12, the atomizer 13, and the plasma generator are automatically controlled by the automatic control device 30 to achieve efficient disinfection, and air sterilization can be achieved without human operation, with a higher degree of automation.

[0145] In some embodiments, the automatic control device 30 includes: an acquisition module, a processing module, and an execution module, wherein the acquisition module includes a first sensor for acquiring atomization amount information, and a second sensor for detecting active particle content information in plasma activated mist; the processing module is used to analyze whether it is necessary to adjust the operating power of the semiconductor condenser 12, the atomizer 13, and the plasma generator 22 according to the received mode selection instruction, the atomization amount information acquired by the first sensor, and the active particle content information in the plasma activated mist detected by the second sensor; the execution module is used to adjust the operating power of the semiconductor condenser 12, the atomizer 13, and the plasma generator 22 according to the analysis results of the processing module.

[0146] In the above embodiment, the automatic control device 30 is equipped with an acquisition module and a processing module. The acquisition module can respectively collect atomization amount information and active particle content information in the plasma activated mist. The processing module can analyze whether it is necessary to adjust the operating power of the semiconductor condenser 12, the atomizer 13, and the plasma generator 22 according to the received mode selection instruction, the atomization amount information collected by the first sensor, and the active particle content information in the plasma activated mist detected by the second sensor, so as to meet user needs. The entire disinfection process adopts automatic detection and identification control, and can achieve efficient air sterilization effect without human operation, and the user experience is better.

[0147] Optionally, the first sensor may be a particle detection sensor, which is installed in the air outlet duct 16 and obtains atomization amount information by detecting the concentration of atomized gas.

[0148] Optionally, the second sensor can be a pH sensor or a redox potential sensor, which is installed at the activation mist outlet of the reaction chamber to detect the concentration of active particles in the plasma activated mist. Since the prepared plasma activated mist contains a large amount of -OH, H2O2, NO2-, NO3-, and ONOO-, the pH value can be tested by the pH sensor to analyze and determine the content of active particles. When the user selects the normal disinfection mode, the power of the semiconductor condenser 12, the atomizer 13, and the plasma generator 22 can be controlled to make the pH value less than 3. When the user selects the deep disinfection mode, the power of the semiconductor condenser 12, the atomizer 13, and the plasma generator 22 can be controlled to make the pH value greater than 3. The concentration of the activated mist generated by the detection is automatically fed back to the automatic control device 30, thereby realizing automatic control of the disinfection mode.

[0149] When the deep disinfection mode is started, the first driving mechanism drives the electrode structure 221 to move to the first working position located in the third chamber 211; when the normal disinfection mode is started, the first driving mechanism drives the electrode structure 221 to move to the second working position located in the fourth chamber 212.

[0150] According to an embodiment of the present utility model, on the other hand, a plasma air disinfection method is provided, which is applicable to the plasma activated mist disinfection device of any of the above embodiments, such as Fig.14 As shown, the disinfecting method comprises the following steps:

[0151] Step S101: responding to a disinfection start instruction;

[0152] Step S102: Control the semiconductor condenser 12, the atomizer 13 and the plasma generator 22 to start working, and simultaneously obtain information on the amount of atomization and the content of active particles in the plasma activated mist;

[0153] Step S103: according to the disinfection mode selected by the user, determine whether the atomization amount information and the active particle content information in the plasma activated mist meet the corresponding disinfection conditions;

[0154] If yes, execute step S104; if no, execute step S105;

[0155] Step S104: Control the semiconductor condenser 12, the atomizer 13, and the plasma generator 22 to keep operating at the current power;

[0156] Step S105 : adjusting the power of the semiconductor condenser 12 , the atomizer 13 , and the plasma generator 22 .

[0157] When the user selects a different mode, the automatic control device 30 can adjust the power of the semiconductor condenser 12, the atomizer 13, and the plasma generator 22 according to the received mode selection instruction and after collecting and analyzing a series of data to ensure the air disinfection effect to meet user needs.

[0158] Specifically, in step S103, different disinfection modes correspond to different disinfection conditions, and the disinfection conditions include information on atomization gas concentration and active particle content in plasma activated mist.

[0159] Optionally, the disinfection mode includes a general disinfection mode and a deep disinfection mode, wherein the general disinfection mode corresponds to the first disinfection condition, the first disinfection condition is that the concentration of atomized gas is greater than the first atomized gas concentration threshold m1 and less than the first atomized gas concentration threshold m2, and the content of active particles in the first plasma activated mist is greater than the first plasma activated mist active particle content threshold n1 and less than the second plasma activated mist active particle content threshold n2; the deep disinfection mode corresponds to the second disinfection condition, the second disinfection condition is that the second atomized gas concentration threshold is greater than m2, and the active particle content threshold in the second plasma activated mist is greater than n2. Wherein, m1<m2, n1<n2.

[0160] Further, when the user selects the normal disinfection mode, if it is judged that the concentration of the atomized gas is less than m1, the power of the semiconductor condenser 12 and the atomizer 13 is increased, if it is judged that the concentration of the atomized gas is greater than m2, the power of the semiconductor condenser 12 and the atomizer 13 is reduced, if it is judged that the content of active particles in the second plasma activated mist is less than n1, the power of the plasma generator 22 is increased, if it is judged that the concentration of the atomized gas is greater than n2, the power of the plasma generator 22 is reduced. When the user selects the deep disinfection mode, if it is judged that the concentration of the atomized gas is less than m2, the power of the semiconductor condenser 12 and the atomizer 13 is increased, if it is judged that the content of active particles in the second plasma activated mist is less than n2, the power of the plasma generator 22 is increased.

[0161] The plasma activated mist disinfection equipment provided in this embodiment includes an atomization device 10, a reaction device 20, and an automatic control device 30. It combines the first sensor to detect the atomization amount, the second sensor to detect the active particle content information in the plasma activated mist, and the corresponding control logic, and selects different disinfection modes according to user needs to achieve air disinfection effects. It uses a semiconductor condenser 12 to directly condense air, has the advantages of low energy consumption and low noise, quiet operation, and no noise pollution to the environment, and is suitable for home use. It also provides a compact and commercializable air disinfection technology, provides technical support for products, and can improve the competitiveness of products.

[0162] In this embodiment, an efficient plasma activated mist disinfection device with automatic feedback is provided. The plasma generator 22 uses high-voltage AC to break through the air to form a series of physical and chemical reactions to generate plasma. The atomized gas enters the reaction chamber from the air outlet duct 16 to further react with the plasma and generate plasma activated mist. The plasma activated mist has a strong bactericidal effect. The bactericidal effect of the plasma activated mist depends on the amount of atomization and the mixing efficiency of the atomized gas and the plasma. The greater the power, the greater the atomization amount, and vice versa. The reaction chamber path is one of the factors affecting the mixing efficiency, such as extending the mixing time of the atomized gas and the plasma. According to the literature, the atomization amount is not the larger the better or the smaller the better. There is a certain peak value between the atomization amount and the bactericidal efficiency, which means that the efficiency is optimal when the atomization amount is set at a certain value period.

[0163] Therefore, in order to further achieve high efficiency, the utility model adds an automatic system, that is, an automatic control device 30, which includes an acquisition module for collecting data, a processing module for processing and analyzing data, and an execution module. Data acquisition is to collect atomization volume data and feed it back to the data processing center for processing according to the user's demand mode, such as ordinary disinfection and deep disinfection mode. Normally, the ordinary disinfection mode is used by default. In this mode, the power of the atomization system is relatively low, and the amount of atomization is relatively small. At the same time, the mixing efficiency of the atomization gas and the plasma is low, resulting in a relatively low efficiency in generating plasma activated fog. In the deep disinfection mode, the atomization power is relatively high, resulting in a large amount of atomization, and the mixing efficiency of the atomizer 13 and the plasma is relatively high, which can effectively improve the efficiency of preparing plasma activated fog.

[0164] Although the embodiments of the present invention are described in conjunction with the accompanying drawings, those skilled in the art may make various modifications and variations without departing from the spirit and scope of the present invention, and such modifications and variations are all within the scope defined by the appended claims.

Claims

1. A plasma activated mist disinfection device, characterized in that: include: An atomizing device (10) comprises a first housing (11) and a semiconductor condenser (12) and an atomizer (13) integrated in the first housing (11), wherein the semiconductor condenser (12) is used to condense air, and the atomizer (13) is used to convert liquid water condensed by the semiconductor condenser (12) into atomized gas; The reaction device (20) comprises a second shell (21) and a plasma generator (22) for generating plasma, wherein the second shell (21) has a reaction chamber which is respectively connected to the atomization device (10) and the plasma generator (22), and the plasma generated by the plasma generator (22) and the atomization gas generated by the atomization device (10) are mixed in the reaction chamber to generate plasma-activated mist.

2. The plasma activated mist disinfection equipment according to claim 1, characterized in that: The atomizing device (10) further comprises: A flow guiding structure (14) is arranged between the semiconductor condenser (12) and the atomizer (13) and is used to guide liquid water condensed by the semiconductor condenser (12) to the atomizer (13).

3. The plasma activated mist disinfection equipment according to claim 2, characterized in that: The atomizer (13) is arranged obliquely below the semiconductor condenser (12), the flow guide structure (14) is obliquely connected between the semiconductor condenser (12) and the atomizer (13), and the flow guide structure (14) comprises a flow guide plate or a flow guide pipe.

4. The plasma activated mist disinfection equipment according to claim 3, characterized in that: The semiconductor condenser (12) comprises: A cooling end and a heating end, the cooling end being located inside the first shell (11), and the heating end being located outside the first shell (11); The guide plate is connected between the refrigeration end of the semiconductor condenser (12) and the atomizer (13).

5. The plasma activated mist disinfection equipment according to any one of claims 1 to 4, characterized in that: A partition (110) is provided in the first shell (11), and the partition (110) divides the inner cavity of the first shell (11) into a first chamber (111) and a second chamber (112) which are independent of each other; The first chamber (111) is connected to the external environment space, the second chamber (112) is not connected to the external environment space, the semiconductor condenser (12) is arranged in the first chamber (111), and the atomizer (13) is arranged in the second chamber (112).

6. The plasma activated mist disinfection equipment according to any one of claims 1 to 4, characterized in that: The first shell (11) has an air inlet and an air outlet, wherein the air inlet is connected to the outside air, and the air outlet is connected to the reaction chamber; The atomizing device (10) further comprises: An airflow driving member (15) is arranged in the first shell (11) and is used to drive the atomized gas in the first shell (11) to enter the reaction chamber.

7. The plasma activated mist disinfection equipment according to claim 6, characterized in that: The airflow driving member (15) comprises an air guide fan arranged at the air outlet; And / or, the atomization device (10) and the reaction device (20) are connected via an air outlet pipeline (16).

8. The plasma activated mist disinfection equipment according to any one of claims 1 to 4, characterized in that: The plasma generator (22) comprises: AC high voltage power supply; The electrode structure (221) is wound into a vortex shape, and the electrode structure (221) is arranged in the reaction chamber and connected to the AC high-voltage power supply. The electrode structure (221) uses the high-voltage AC to break through the air to form plasma.

9. The plasma activated mist disinfection equipment according to any one of claims 1 to 4, characterized in that: The plasma activated mist disinfecting equipment also includes: The automatic control device (30) is electrically connected to the atomizing device (10) and the reaction device (20) respectively, and is used to control the operation of the semiconductor condenser (12), the atomizer (13), and the plasma generator (22).

10. The plasma activated mist disinfection equipment according to claim 9, characterized in that: The automatic control device (30) comprises: A collection module, comprising a first sensor for collecting atomization amount information, and a second sensor for detecting active particle content information in plasma activated mist; A processing module, used for analyzing whether it is necessary to adjust the working power of the semiconductor condenser (12), the atomizer (13), and the plasma generator (22) according to the received mode selection instruction, the atomization amount information collected by the first sensor, and the active particle content information in the plasma activated mist detected by the second sensor; An execution module is used to adjust the operating power of the semiconductor condenser (12), the atomizer (13), and the plasma generator (22) according to the analysis result of the processing module.

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