Liquid level measurement system arrangement structure for quartz preform corrosion cleaning equipment

Abstract

The utility model discloses a liquid level measuring system arrangement structure for quartz preform corrosion cleaning equipment. The liquid level measuring system arrangement structure for the quartz preform corrosion cleaning equipment comprises a controller, and a liquid-free liquid level sensor, a low working liquid level sensor and a high working liquid level sensor which are used for measuring the liquid level of a cleaning tank, and the output ends of the liquid-free liquid level sensor, the low working liquid level sensor and the high working liquid level sensor are electrically connected with the input end of the controller. According to the liquid level measuring system arrangement structure for the quartz preform corrosion cleaning equipment, through reasonable arrangement in the cleaning tank and reasonable arrangement of the controller, the liquid level measuring system arrangement structure is simple in overall structure, compact in arrangement and convenient to operate, use, install and maintain; the arrangement structure is safe, reliable, clear in logic, high in maintainability, capable of meeting the requirements of different liquids and different working liquid levels and wide in adaptability.

Description

Technical Field

[0001] The utility model relates to the technical field of quartz preform rod auxiliary equipment, in particular to a liquid level measurement system arrangement structure for quartz preform rod corrosion cleaning equipment. Background Art

[0002] As people's requirements for communication transmission speed and capacity become higher and higher, the market's requirements for optical fiber as a communication carrier are becoming more and more stringent. As the masterbatch for optical fiber production, manufacturers have increasingly stringent requirements on the geometric dimensions and cleanliness levels of quartz preform rods.

[0003] The quartz preform etching process is the core process for controlling the geometric dimensions of the quartz preform, and is also a key process for ensuring the cleanliness of the quartz preform.

[0004] The quartz preform etching process generally includes three main steps: concentrated alkali washing, pure water washing, and hydrofluoric acid pickling. The order and duration of the three steps will be slightly different according to the product process requirements. However, it is required that the liquid level during the cleaning / etching process exceeds the highest position of the preform. Generally, the quartz preform etching work is carried out in an acid- and alkali-resistant cleaning tank. Therefore, it is very important to accurately measure the liquid level in the cleaning tank. However, the existing cleaning tank does not have a liquid level measurement device. Utility Model Content

[0005] The main purpose of the utility model is to provide a liquid level measurement system arrangement structure for quartz preform rod corrosion cleaning equipment, aiming to provide a liquid level measurement system with a simple overall structure and compact arrangement.

[0006] To achieve the above-mentioned purpose, the utility model provides a liquid level measurement system arrangement structure for quartz preform corrosion cleaning equipment, including a controller and a liquid-free liquid level sensor, a low working liquid level sensor and a high working liquid level sensor for measuring the liquid level of the cleaning tank, wherein:

[0007] The output ends of the liquid-free liquid level sensor, the low working liquid level sensor and the high working liquid level sensor are all electrically connected to the input end of the controller.

[0008] Preferably, the liquid level measurement system arrangement structure for the quartz preform etching and cleaning equipment further includes a full liquid level sensor for measuring whether the liquid is full.

[0009] Preferably, the full liquid level sensor is a float sensor installed inside the cleaning tank.

[0010] Preferably, the liquid level measurement system arrangement structure for the quartz preform etching and cleaning equipment further comprises a display device electrically connected to the controller.

[0011] Preferably, the liquid level measurement system arrangement structure for the quartz preform corrosion cleaning equipment further includes an alarm device electrically connected to the controller.

[0012] Preferably, the liquid-free liquid level sensor is a constantly-on capacitive sensor, and the constantly-on capacitive sensor is closely attached to the outer wall at the lowest point of the bottom of the cleaning tank.

[0013] Preferably, the low working liquid level sensor is an editable differential pressure sensor, and the pressure sensing port of the low working liquid level sensor is installed on the bottom wall of the cleaning tank.

[0014] Preferably, the high working liquid level sensor is an editable differential pressure sensor, and the pressure sensing port of the high working liquid level sensor is installed on the bottom wall of the cleaning tank.

[0015] The liquid level measurement system arrangement structure for quartz preform corrosion cleaning equipment proposed in the utility model has the following beneficial effects:

[0016] 1. Through the reasonable arrangement inside the cleaning tank and the reasonable setting of the controller, the overall structure is simple, the layout is compact, the operation is convenient, and it is easy to install and maintain;

[0017] 2. This layout structure is safe and reliable, with clear logic and strong maintainability. It can meet the requirements of different liquids and different working liquid levels and has wide adaptability. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 The utility model is a schematic diagram of the structure of the liquid level measurement system layout for quartz preform rod corrosion cleaning equipment.

[0019] In the figure, 1-cleaning tank, 2-liquid-free liquid level sensor, 3-low working liquid level sensor, 4-high working liquid level sensor, 5-controller, 6-display device, 7-alarm device, 8-full liquid level sensor.

[0020] The realization of the purpose, functional features and advantages of the utility model will be further explained in conjunction with embodiments and with reference to the accompanying drawings. DETAILED DESCRIPTION

[0021] It should be understood that the specific embodiments described herein are only used to explain the present invention and are not used to limit the present invention.

[0022] It should be noted that in the description of the present invention, the terms "lateral", "longitudinal", "upper", "lower", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside" and the like indicate directions or positional relationships based on the directions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second" and the like are only used for descriptive purposes and cannot be understood as indicating or implying relative importance.

[0023] Reference Figure 1 In this preferred embodiment, a liquid level measurement system arrangement structure for a quartz preform rod etching cleaning device includes a controller 5 and a liquid-free liquid level sensor 2, a low working liquid level sensor 3, and a high working liquid level sensor 4 for measuring the liquid level of a cleaning tank 1, wherein:

[0024] The output ends of the liquid-free liquid level sensor 2 , the low working liquid level sensor 3 and the high working liquid level sensor 4 are all electrically connected to the input end of the controller 5 .

[0025] The liquid-free level indicates that there is no liquid in the cleaning tank 1. It is generally used when draining the liquid in the cleaning tank 1 or replacing different cleaning liquids. Therefore, the liquid-free level signal is very important. The liquid-free level sensor 2 is a always-on capacitive level sensor, which is installed on the bottom wall of the cleaning tank 1 of the cleaning equipment, close to the outer surface of the tank body. When the liquid-free level sensor 2 detects that there is liquid in the tank, the sensor remains always on and does not output a signal to the controller 5; when the liquid-free level sensor 2 detects that there is no liquid in the tank, the sensor is turned off and outputs a signal to the controller 5. The controller 5 detects the signal and displays on the display device 6 that there is no liquid in the cleaning tank 1.

[0026] The low working liquid level refers to the minimum liquid level required for the cleaning tank 1 during normal cleaning, and the high working liquid level refers to the maximum liquid level required for the cleaning tank 1 during normal cleaning. Generally, the liquid in the cleaning tank 1 is first added to the high working liquid level during cleaning. However, due to factors such as liquid volatilization, the liquid level will drop and must not be lower than the low working liquid level. Both the low working liquid level and the high working liquid level require that the quartz preform in the cleaning tank 1 is completely submerged.

[0027] The reasons why the liquid-free liquid level sensor 2 uses a capacitive sensor are as follows: Generally, the volume of the cleaning tank 1 of the quartz preform corrosion / cleaning equipment is relatively large, and the cross-sectional area is also relatively large. It is difficult to drain the liquid quickly during drainage. The final liquid will form a water film attached to the inner wall of the cleaning tank 1. Generally, it needs to be still for a period of time, waiting for the liquid to flow to the lowest position of the tank body through its own gravity, and then slowly drain.

[0028] Furthermore, the liquid level measurement system arrangement structure for the quartz preform etching cleaning equipment also includes a full liquid level sensor 8 for measuring whether the liquid is full. The full liquid level refers to the maximum liquid level allowed by the cleaning tank 1, which is also the last set of protection for the reliability of the equipment.

[0029] Furthermore, the liquid level measurement system arrangement structure for the quartz preform etching and cleaning equipment also includes a display device 6 electrically connected to the controller 5. By providing the display device 6, it is convenient for the user to intuitively see the current liquid level value.

[0030] Furthermore, the liquid level measurement system arrangement structure for the quartz preform etching and cleaning equipment also includes an alarm device 7 (which can use a sound alarm to remind the user) electrically connected to the controller 5. When the liquid level is too high, the alarm device 7 reminds the user.

[0031] Specifically, in this embodiment, the full liquid level sensor 8 is a float type sensor installed inside the cleaning tank 1. When the liquid level reaches the float position, the float rises, and the float type sensor outputs a signal to the controller 5, which determines that it is a full liquid level and issues an alarm.

[0032] A capacitive sensor is a sensor that reflects the change of liquid level by measuring the change of capacitance value. Its working principle is based on the capacitance formula of capacitor:

[0033] C = εA / d.

[0034] Among them, C is the capacitance value, ε is the dielectric constant of the medium, A is the area of ​​the electrode, and d is the distance between the electrodes. For a certain capacitive sensor, the electrode area A and the distance d between the electrodes are fixed. Only when the medium changes, the dielectric constant ε changes, and the capacitance C changes.

[0035] It is for this reason that capacitive sensors can measure changes in residual liquid water film and are very suitable for measuring liquid level without liquid.

[0036] In this embodiment, the low working liquid level sensor 3 is an editable differential pressure sensor, and the pressure sensing port of the low working liquid level sensor 3 is installed on the inner bottom wall of the cleaning tank 1. The high working liquid level sensor 4 is an editable differential pressure sensor, and the pressure sensing port of the high working liquid level sensor 4 is installed on the inner bottom wall of the cleaning tank 1. In the actual working process, due to the different types and quantities of quartz preform rods placed in the equipment in a single batch, the highest position distance of each batch of cleaned quartz preform rods and the distance H0 from the bottom of the tank will change, so the required low working liquid level H1 and high working liquid level H2 will also change. Therefore, both the low working liquid level sensor 3 and the high working liquid level sensor 4 adopt editable differential pressure sensors, and the two pressure sensing ports are installed at the lowest end of the cleaning tank 1. The editable differential pressure sensor confirms the liquid level change by sensing the pressure change at the end of the sensor, refer to the formula: F = ρgHS.

[0037] Among them, F is the pressure value at the pressure sensing port, ρ is the medium density, g is the acceleration of gravity, H is the distance between the pressure sensing port and the liquid surface, that is, the liquid level value, and S is the area of ​​the pressure sensing port.

[0038] It can be seen from the formula that the pressure value of the pressure sensor in the liquid level measurement device is only related to the liquid level and the type of medium. The type of medium can be identified by the controller 5. Therefore, for different liquids, the controller 5 will give different signals to the pressure sensor, select different medium density setting values ​​of the pressure sensor, and then measure the pressure value through the sensing port to calculate the liquid level value. When the liquid level reaches the sensor set liquid level, that is, the sensor output value is equal to the set value, then the controller 5 determines that the liquid level value has reached the set value.

[0039] The arrangement structure of the liquid level measurement system for the quartz preform etching and cleaning equipment proposed in this embodiment has the following beneficial effects:

[0040] 1. Through the reasonable arrangement inside the cleaning tank 1 and the reasonable setting of the controller 5, the overall structure is simple, the layout is compact, the operation is convenient, and the installation and maintenance are convenient;

[0041] 2. This layout structure is safe and reliable, with clear logic and strong maintainability. It can meet the requirements of different liquids and different working liquid levels and has wide adaptability.

[0042] The above are only preferred embodiments of the present invention, and are not intended to limit the patent scope of the present invention. Any equivalent structural transformations made using the contents of the specification and drawings of the present invention, or directly or indirectly applied in other related technical fields, are also included in the patent protection scope of the present invention.

Claims

1. A liquid level measurement system arrangement structure for a quartz preform corrosion cleaning device, characterized in that: It includes a controller and a liquid-free level sensor, a low working level sensor, and a high working level sensor for measuring the liquid level in the cleaning tank, wherein: The output ends of the liquid-free liquid level sensor, the low working liquid level sensor and the high working liquid level sensor are all electrically connected to the input end of the controller.

2. The liquid level measurement system arrangement structure for the quartz preform etching and cleaning equipment according to claim 1, characterized in that: A full liquid level sensor is also included for measuring whether the liquid is full.

3. The liquid level measurement system arrangement structure for the quartz preform etching and cleaning equipment according to claim 2, characterized in that: The full liquid level sensor is a float type sensor installed inside the cleaning tank.

4. The liquid level measurement system arrangement structure for the quartz preform etching and cleaning equipment according to claim 1, characterized in that: Also included is a display device electrically connected to the controller.

5. The liquid level measurement system arrangement structure for the quartz preform etching and cleaning equipment according to claim 1, characterized in that: Also included is an alarm device electrically connected to the controller.

6. The liquid level measurement system arrangement structure for the quartz preform etching and cleaning equipment according to claim 1, characterized in that: The liquid-free liquid level sensor is a constantly-on capacitive sensor, which is closely attached to the outer wall at the lowest point of the bottom of the cleaning tank.

7. The liquid level measurement system arrangement structure for the quartz preform etching and cleaning equipment according to claim 1, characterized in that: The low working liquid level sensor is an editable differential pressure sensor, and the pressure sensing port of the low working liquid level sensor is installed on the bottom wall of the cleaning tank.

8. The arrangement structure of the liquid level measurement system for the quartz preform etching and cleaning equipment according to any one of claims 1 to 7, characterized in that: The high working liquid level sensor is an editable differential pressure sensor, and the pressure sensing port of the high working liquid level sensor is installed on the bottom wall of the cleaning tank.

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