Heavy metal ion precipitation mechanism for semiconductor wastewater treatment

Abstract

The utility model relates to the field of semiconductor wastewater, in particular to a heavy metal ion precipitation mechanism for semiconductor wastewater treatment, which comprises a precipitation box body, the upper cover is mounted above the settling box body, and a discharge port is formed in the lower part of the settling box body. According to the heavy metal ion precipitation mechanism for semiconductor wastewater treatment disclosed by the utility model, the transmission rod, the frame, the movable shaft, the filter screen and the second filter plate are arranged, semiconductor wastewater, hydroxide and sulfide are added into the precipitation box body, and the transmission rod is utilized to drive the frame and the filter screen in the precipitation box body to rotate; according to the present invention, through the rotation of the frame, the internal filtration screen and the movable shaft automatically rotate under the stirring centrifugal force so as to adhere the precipitate in the wastewater to the filtration screen, such that the subsequent cleaning is convenient.

Description

Technical Field

[0001] The utility model relates to the field of semiconductor wastewater, in particular to a heavy metal ion precipitation mechanism for semiconductor wastewater treatment. Background Art

[0002] Electronic semiconductor wastewater is a type of wastewater generated during the semiconductor production process, mainly from wastewater discharge during the semiconductor grinding process and integrated circuit manufacturing process. These wastewaters contain acid-base wastewater, fluoride-containing wastewater, phosphorus-containing wastewater, ammonia nitrogen wastewater and other components. Among them, the heavy metal content in semiconductor wastewater is high, and the heavy metals contained in it need to be precipitated and removed.

[0003] In the above patent, heavy metal ion precipitation is used in the existing semiconductor wastewater treatment. Basically, a simple method is adopted to add reagents to the wastewater, and then the heavy metal ions are separated from the water by precipitation. However, simply adding reagents and waiting for the heavy metal ions to separate from the semiconductor wastewater is too inefficient.

[0004] Therefore, it is necessary to invent a heavy metal ion precipitation mechanism for semiconductor wastewater treatment to solve the above problems. Utility Model Content

[0005] The utility model aims to provide a heavy metal ion precipitation mechanism for semiconductor wastewater treatment, which adds semiconductor wastewater and hydroxides and sulfides into a precipitation box, and uses a transmission rod to drive a frame and an internal filter screen to rotate, so that the semiconductor wastewater and the hydroxides and sulfides undergo a sufficient fusion reaction, and the heavy metal ions are precipitated in the form of precipitates. When the frame rotates, the internal filter screen and a movable shaft automatically rotate under the stirring centrifugal force, so that the precipitates in the wastewater adhere to the filter screen, which is convenient for subsequent cleaning, so as to solve the problems raised in the above-mentioned background technology.

[0006] In order to achieve the above-mentioned purpose, the utility model provides the following technical solutions: a heavy metal ion precipitation mechanism for semiconductor wastewater treatment, comprising a precipitation box;

[0007] An upper cover is installed above the sedimentation box, a discharge port is provided at the bottom of the sedimentation box, a dosing port is provided at one side of the sedimentation box, bolts are passed through both sides of the upper cover, a water inlet is provided at the top of the upper cover, a first filter plate is provided inside the sedimentation box, a second filter plate is fixedly installed at the lower side of the interior of the sedimentation box, and the first filter plate is used for preliminary filtering of semiconductor wastewater;

[0008] A driving motor is installed above the upper cover and is used to drive the stirring and fusing of wastewater and medicine. A transmission rod is fixedly installed at the output end of the driving motor, and a fixed block is fixedly installed on the outside of the transmission rod. An insert block is fixedly installed on one side of the fixed block, and a frame is fixedly installed on one side of the insert block. A movable shaft is movably connected inside the frame, and a filter screen is fixedly installed on one end of the movable shaft.

[0009] The limiting mechanism is arranged inside the fixed block and is used for limiting the insertion block and the frame.

[0010] Preferably, slide grooves are provided on both side surfaces of the interior of the sedimentation box, and sliding blocks are fixedly connected to both sides of the first filter plate.

[0011] Preferably, a scraper is fixedly mounted on the outside of the transmission rod, and the scraper is in contact with the first filter plate.

[0012] Preferably, the limiting mechanism includes a limiting rod, a fixing sleeve, a spring, and a handle, the limiting rod is arranged inside the upper and lower parts of the fixing block, the fixing sleeve is fixedly installed on the outside of the limiting rod, a spring is arranged above the fixing sleeve and on the outside of the limiting rod, and a handle is fixedly installed on one end of the limiting rod.

[0013] Preferably, upper and lower side surfaces of the insert block are provided with limiting grooves which are engaged with limiting rods inside the fixing block, and the limiting rods are used in conjunction with the limiting grooves.

[0014] Preferably, the filter screen is movably connected to the frame via a movable shaft, and the filter screen is provided in a plurality of groups, and the plurality of groups of filter screens are installed on the upper and lower inner sides of the frame.

[0015] In the above technical solution, the technical effects and advantages provided by the utility model are:

[0016] Through the arrangement of the transmission rod, the frame, the movable shaft, the filter screen and the second filter plate, not only can the rapid fusion reaction of the reagent and the semiconductor wastewater be improved, but also the sediment in the wastewater can be adhered to the filter screen. By adding the semiconductor wastewater and the hydroxide and sulfide into the sedimentation box, the transmission rod is used to drive the frame and the internal filter screen to rotate, so that the semiconductor wastewater and the hydroxide and sulfide are fully fused and reacted, and the heavy metal ions are precipitated in the form of sediment. When the frame rotates, the internal filter screen and the movable shaft are automatically rotated under the stirring centrifugal force, and the sediment in the wastewater is adhered to the filter screen, which is convenient for subsequent cleaning;

[0017] Through the arrangement of the fixed block, the plug-in block, the limit groove, the limit mechanism, the frame and the filter screen, when there is a lot of sediment remaining on the surface of the filter screen, it needs to be taken out regularly for cleaning. The limit rod is extended and retracted by pulling the handle, and then the plug-in block and the frame are pulled out, and then each frame and the internal filter screen are cleaned. After cleaning, the frame and the plug-in block are inserted into the fixed block, and the limit rod is inserted into the limit groove opened on the upper and lower surfaces of the plug-in block through the rebound ability of the spring to limit and fix the frame. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present invention. For ordinary technicians in this field, other drawings can also be obtained based on these drawings.

[0019] Figure 1 It is a schematic diagram of the overall structure of the utility model;

[0020] Figure 2 This is a schematic diagram of the internal structure of the sedimentation box of the utility model;

[0021] Figure 3 This is a schematic diagram of the upper cover structure of the utility model;

[0022] Figure 4 This is a schematic diagram of the structure of the sedimentation and stirring assembly of the utility model;

[0023] Figure 5 This is a schematic diagram of the frame and filter structure of the utility model;

[0024] Figure 6 For the utility model Figure 5 A is an enlarged diagram of the structure.

[0025] Description of reference numerals:

[0026] 1. Sedimentation box; 2. Discharge port; 3. Dosing port; 4. Upper cover; 5. Bolts; 6. Water inlet; 7. Slide; 8. Slider; 9. First filter plate; 10. Driving motor; 11. Transmission rod; 12. Scraper; 13. Fixed block; 14. Insert block; 15. Limiting groove; 16. Limiting mechanism; 1601. Limiting rod; 1602. Fixed sleeve; 1603. Spring; 1604. Handle; 17. Frame; 18. Movable shaft; 19. Filter screen; 20. Second filter plate. DETAILED DESCRIPTION

[0027] In order to enable those skilled in the art to better understand the technical solution of the present invention, the present invention will be further described in detail below in conjunction with the accompanying drawings.

[0028] The utility model provides Figure 1-6 The heavy metal ion precipitation mechanism for semiconductor wastewater treatment shown includes a precipitation box 1;

[0029] The upper cover 4 is installed above the sedimentation box 1, a discharge port 2 is provided at the bottom of the sedimentation box 1, a dosing port 3 is provided at one side of the sedimentation box 1, bolts 5 are passed through both sides of the upper cover 4, a water inlet 6 is provided at the top of the upper cover 4, a first filter plate 9 is provided inside the sedimentation box 1, and a second filter plate 20 is fixedly installed at the lower side of the interior of the sedimentation box 1, and the first filter plate 9 is used for preliminary filtering of semiconductor wastewater;

[0030] A driving motor 10 is installed above the upper cover 4 and is used to drive the mixing and fusing of wastewater and medicine. A transmission rod 11 is fixedly installed at the output end of the driving motor 10. A fixed block 13 is fixedly installed outside the transmission rod 11. An insert block 14 is fixedly installed on one side of the fixed block 13. A frame 17 is fixedly installed on one side of the insert block 14. A movable shaft 18 is movably connected inside the frame 17. A filter screen 19 is fixedly installed at one end of the movable shaft 18.

[0031] The limiting mechanism 16 is arranged inside the fixed block 13 and is used to limit the plug block 14 and the frame 17. By adding semiconductor wastewater and hydroxides and sulfides into the sedimentation box 1, the transmission rod 11 is used to drive the frame 17 and the internal filter screen 19 to rotate, so that the semiconductor wastewater and the hydroxides and sulfides are fully fused and reacted, and the heavy metal ions are precipitated in the form of precipitates. When the frame 17 rotates, the internal filter screen 19 and the movable shaft 18 automatically rotate under the stirring centrifugal force, and the precipitate in the wastewater adheres to the filter screen 19, which is convenient for subsequent cleaning.

[0032] like Figure 1 , Figure 2 and Figure 3 As shown, slide grooves 7 are provided on both sides of the inner surface of the sedimentation box 1, and sliders 8 are fixedly connected to both sides of the first filter plate 9. The first filter plate 9 can pre-treat and filter semiconductor wastewater to filter out some large particles of impurities.

[0033] like Figure 2 and Figure 4 As shown, a scraper 12 is fixedly installed on the outside of the transmission rod 11, and the scraper 12 is in contact with the first filter plate 9. The scraper 12 can prevent the first filter plate 9 from being blocked and affecting the pre-treatment filtration.

[0034] like Figure 5 and Figure 6As shown, the limiting mechanism 16 includes a limiting rod 1601, a fixing sleeve 1602, a spring 1603, and a handle 1604. The limiting rod 1601 is arranged inside the upper and lower parts of the fixing block 13. The fixing sleeve 1602 is fixedly installed on the outside of the limiting rod 1601. The spring 1603 is arranged above the fixing sleeve 1602 and on the outside of the limiting rod 1601. A handle 1604 is fixedly installed on one end of the limiting rod 1601. By pulling the handle 1604, the limiting rod 1601 is driven to retract and retract, and then the insert block 14 and the frame 17 are pulled out, and then each frame 17 and the internal filter screen 19 are cleaned.

[0035] like Figure 5 and Figure 6 As shown, the upper and lower surfaces of the insert block 14 are provided with limit grooves 15 which are engaged with the limit rod 1601 inside the fixed block 13. The limit rod 1601 is used in conjunction with the limit grooves 15. After cleaning, the frame 17 and the insert block 14 are inserted into the fixed block 13, and the limit rod 1601 is inserted into the limit grooves 15 provided on the upper and lower surfaces of the insert block 14 through the rebound ability of the spring 1603 to limit and fix the frame 17.

[0036] like Figure 4 and Figure 5 As shown, the filter screen 19 is movably connected to the frame 17 through a movable shaft 18. The filter screen 19 is provided with multiple groups of two. The multiple groups of two filter screens 19 are installed on the upper and lower inner sides of the frame 17. The multiple filter screens 19 are rotated in several frames 17 to collect the sediment in the wastewater, and at the same time, the fusion reaction of the wastewater and the reagent is also improved.

[0037] The working principle of the utility model is as follows: firstly, the external power supply is turned on, and then the semiconductor wastewater is poured in from the water inlet 6 above the upper cover 4, and the semiconductor wastewater preferentially falls on the first filter plate 9 for pre-treatment and filtration. At this time, the switch of the first filter plate 9 is turned on to drive the transmission rod 11 to rotate, and the rotation of the transmission rod 11 drives the external scraper 12 to rotate, and cleans the first filter plate 9 to avoid blockage of the first filter plate 9. After that, the wastewater is initially filtered by the first filter plate 9 and falls into the sedimentation box 1. Then, the hydroxide and sulfide are poured in from the dosing port 3 on one side of the sedimentation box 1 to merge the hydroxide and sulfide with the wastewater. As the rotation of the transmission rod 11 drives the multiple frames 17 and the inner frame 17 below, the wastewater is filtered by the first filter plate 9 and then poured into the sedimentation box 1. The filter screen 19 at the bottom rotates, so that the semiconductor wastewater and the hydroxide and sulfide fully fuse and react, so that the heavy metal ions are precipitated in the form of precipitates. When the frame 17 rotates, the internal filter screen 19 and the movable shaft 18 automatically rotate under the stirring centrifugal force, and the precipitates in the wastewater adhere to the filter screen 19, which is convenient for subsequent cleaning. After precipitation, the wastewater enters the second filter plate 20 at the bottom for filtration again, and the remaining precipitates are filtered out and finally discharged from the discharge port 2. When the device is not in use, turn off the drive motor 10 switch and cut off the external power supply. In this way, the use process of the heavy metal ion precipitation mechanism for semiconductor wastewater treatment is completed.

[0038] The above only describes some exemplary embodiments of the present invention by way of illustration. It is undoubted that those skilled in the art can modify the described embodiments in various ways without departing from the spirit and scope of the present invention. Therefore, the above drawings and descriptions are illustrative in nature and should not be construed as limiting the scope of protection of the claims of the present invention.

Claims

1. A heavy metal ion precipitation mechanism for semiconductor wastewater treatment, characterized in that: It includes a sedimentation box (1); An upper cover (4) is installed above the sedimentation box (1); a discharge port (2) is provided at the bottom of the sedimentation box (1); a drug addition port (3) is provided at one side of the sedimentation box (1); bolts (5) are passed through both sides of the upper cover (4); a water inlet (6) is provided at the top of the upper cover (4); a first filter plate (9) is provided inside the sedimentation box (1); a second filter plate (20) is fixedly installed at the lower side of the interior of the sedimentation box (1); the first filter plate (9) is used for preliminary filtering of semiconductor wastewater; A drive motor (10) is installed above the upper cover (4) and is used to drive the mixing and fusing of wastewater and chemicals. A transmission rod (11) is fixedly installed on the output end of the drive motor (10). A fixed block (13) is fixedly installed on the outside of the transmission rod (11). An insert block (14) is fixedly installed on one side of the fixed block (13). A frame (17) is fixedly installed on one side of the insert block (14). A movable shaft (18) is movably connected inside the frame (17). A filter screen (19) is fixedly installed on one end of the movable shaft (18). The limiting mechanism (16) is arranged inside the fixed block (13) and is used to limit the insertion block (14) and the frame (17).

2. A heavy metal ion precipitation mechanism for semiconductor wastewater treatment according to claim 1, characterized in that: Slide grooves (7) are provided on both sides of the inner surface of the sedimentation box (1), and sliding blocks (8) are fixedly connected to both sides of the first filter plate (9).

3. The heavy metal ion precipitation mechanism for semiconductor wastewater treatment according to claim 1, characterized in that: A scraper (12) is fixedly mounted on the outside of the transmission rod (11), and the scraper (12) is in contact with the first filter plate (9).

4. The heavy metal ion precipitation mechanism for semiconductor wastewater treatment according to claim 1, characterized in that: The limiting mechanism (16) comprises a limiting rod (1601), a fixing sleeve (1602), a spring (1603), and a handle (1604); the limiting rod (1601) is arranged inside the upper and lower parts of the fixing block (13); the fixing sleeve (1602) is fixedly installed on the outside of the limiting rod (1601); the spring (1603) is arranged above the fixing sleeve (1602) and on the outside of the limiting rod (1601); and the handle (1604) is fixedly installed on one end of the limiting rod (1601).

5. A heavy metal ion precipitation mechanism for semiconductor wastewater treatment according to claim 4, characterized in that: The upper and lower surfaces of the insert block (14) are provided with limiting grooves (15) which are engaged with limiting rods (1601) inside the fixed block (13), and the limiting rods (1601) are used in conjunction with the limiting grooves (15).

6. A heavy metal ion precipitation mechanism for semiconductor wastewater treatment according to claim 1, characterized in that: The filter screen (19) is movably connected to the frame (17) via a movable shaft (18), and the filter screen (19) is provided in a plurality of groups, wherein the plurality of groups of filter screens (19) are mounted on the upper and lower inner sides of the frame (17).

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