Ultrasonic particle magnetron sputtering instrument

Abstract

The utility model relates to the technical field of particle surface coating, in particular to an ultrasonic particle magnetron sputtering instrument which comprises a vacuum chamber, an ultrasonic vibration sample table and a magnetron sputtering target head are arranged in the vacuum chamber, one end of the magnetron sputtering target head is connected with liquid cooling equipment, a resonator is arranged below the ultrasonic vibration sample table, and the other end of the magnetron sputtering target head is connected with the liquid cooling equipment. The resonator is connected with the ultrasonic generator through a wire. And a circuit control system. Particles are placed on the ultrasonic vibration sample table, the vacuum chamber is closed, the air pump pumps out air in the vacuum chamber, the protective gas is introduced, and the liquid cooling equipment is started to take away heat generated on a sputtering target material through the cooling plate; an ultrasonic generator is started, the ultrasonic frequency is adjusted, the particles are promoted to roll continuously in the sputtering process, and uniform plating of the surfaces of the particles is achieved; the circuit control system can set technological parameters (sputtering power, sputtering air pressure and sputtering time) in the sputtering process, and precise plating of particle surfaces is achieved.

Description

Technical Field

[0001] The utility model relates to the technical field of particle surface coating, in particular to an ultrasonic particle magnetron sputtering instrument. Background Art

[0002] At present, magnetron sputtering technology is the most commonly used coating technology in physical vapor deposition. It can be used to prepare thin films of insulators, semiconductors, and non-metallic materials. The coating process is easy to operate, the film forming area is large, and the coating quality is good.

[0003] Particles are common materials in industrial production. In order to change the inherent properties of particles, they are usually coated on the surface of particles. Compared with the ordinary solid plate coating process, the surface area and surface energy between particles are relatively large, agglomerates are easily generated, and the radius of curvature is relatively small. The coating uniformity is not ideal under the existing equipment and technology. Utility Model Content

[0004] The utility model aims to provide an ultrasonic particle magnetron sputtering apparatus to solve the problems raised in the above background technology.

[0005] In order to solve the above technical problems, the utility model provides the following technical solutions: an ultrasonic particle magnetron sputtering instrument, comprising a vacuum chamber and a circuit control system, an ultrasonic vibration sample stage is provided inside the vacuum chamber, a magnetron sputtering target head is provided above the ultrasonic vibration sample stage, one end of the magnetron sputtering target head is connected to a liquid cooling device, a resonator is provided below the ultrasonic vibration sample stage, the resonator is installed on a rotating shaft, and the resonator is connected to an ultrasonic generator through a wire; the circuit control system is used to set coating parameters.

[0006] Furthermore, two magnetron sputtering target heads are symmetrically arranged, and a baffle is arranged in front of the end of the magnetron sputtering target head inside the vacuum chamber.

[0007] Furthermore, the magnetron sputtering target head comprises a heater, a cooling plate and a target material, the heater is connected to the cooling plate, and the cooling plate is connected to the target material.

[0008] Furthermore, an observation window and a camera are arranged on the outer wall of the vacuum chamber; the observation window is used to directly observe the magnetron sputtering process; and the camera is used to monitor the vibration law of particles under ultrasonic vibration.

[0009] Furthermore, the vacuum chamber is connected to an air pump via an air pipe, and the air pump is used to extract air from the vacuum chamber.

[0010] Furthermore, the ultrasonic vibration sample stage is connected to the resonator via screws.

[0011] Furthermore, the coating parameters include sputtering frequency, sputtering time and sputtering gas pressure.

[0012] Furthermore, the liquid cooling device is provided with a liquid cooling source.

[0013] Compared with the prior art, the beneficial effects achieved by the utility model are:

[0014] 1. The utility model places particles on a vibrating ultrasonic vibration sample table, closes the vacuum chamber, uses an air pump to extract the air in the vacuum chamber, introduces protective gas, turns on the liquid cooling device to remove the heat generated on the sputtering target through the cooling plate; turns on the ultrasonic generator, adjusts the ultrasonic frequency, causes the particles to continuously roll during the sputtering process, and achieves uniform coating on the particle surface; the circuit control system can set the process parameters (sputtering power, sputtering gas pressure, sputtering time) during the sputtering process to achieve precise coating on the particle surface. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] The accompanying drawings are used to provide a further understanding of the present invention and constitute a part of the specification. Together with the embodiments of the present invention, they are used to explain the present invention and do not constitute a limitation of the present invention. In the accompanying drawings:

[0016] Figure 1 This is a schematic diagram of the structure of the ultrasonic particle magnetron sputtering apparatus of the utility model;

[0017] Figure 2 This is a schematic diagram of the structure of the target head of the ultrasonic particle magnetron sputtering instrument of the utility model;

[0018] In the figure: 1. target head; 2. observation window; 3. vacuum chamber; 4. camera; 5. ultrasonic vibration sample stage; 6. resonator; 7. rotating axis; 8. air pump; 9. ultrasonic generator; 10. circuit control system; 11. liquid cooling equipment; 12. cooling plate; 13. target material; 14. baffle. DETAILED DESCRIPTION

[0019] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0020] See also Figure 1-Figure 2The utility model provides a technical solution: an ultrasonic particle magnetron sputtering instrument, comprising a vacuum chamber 3, an ultrasonic vibration sample stage 5 is arranged inside the vacuum chamber 3, a magnetron sputtering target head 1 is arranged above the ultrasonic vibration sample stage 5, one end of the magnetron sputtering target head 1 is connected to a liquid cooling device 11, a resonator 6 is arranged below the ultrasonic vibration sample stage 5, the resonator 6 is installed on a rotating shaft 7, and the resonator 6 is connected to an ultrasonic generator 9 through a wire;

[0021] And a circuit control system 10, wherein the circuit control system 10 is used to set coating parameters.

[0022] In the embodiment, two magnetron sputtering target heads 1 are symmetrically arranged, and a baffle 14 is arranged in front of the end of the magnetron sputtering target head 1 inside the vacuum chamber 3 .

[0023] In an embodiment, the magnetron sputtering target head 1 includes a heater, a cooling plate 12 and a target material 13 , wherein the heater is connected to the cooling plate 12 , and the cooling plate 12 is connected to the target material 13 .

[0024] In the embodiment, an observation window 2 and a camera 4 are provided on the outer wall of the vacuum chamber 3 .

[0025] In the embodiment, the vacuum chamber 3 is connected to the air pump 8 via an air pipe.

[0026] In the embodiment, the ultrasonic vibration sample stage 5 is connected to the resonator 6 by screws.

[0027] In an embodiment, the coating parameters include sputtering frequency, sputtering time and sputtering gas pressure.

[0028] The working principle of the utility model is as follows: when working, the particles are placed on the ultrasonic vibration sample table 5, the air pump 8 is turned on to extract the air in the vacuum chamber 3, and the working gas is introduced, the circuit control system is started, the sputtering frequency, sputtering time, sputtering pressure and other parameters are set, and the precise control of the magnetron sputtering process is realized, the liquid cooling device 11 is turned on to take away the heat generated by the target material 13 during the sputtering process through the cooling plate 12, and after the sputtering process is stable, the baffle 14 in front of the magnetron sputtering target head 1 is removed, and the ultrasonic generator 9 is turned on, and the ultrasonic vibration sample table 5 is driven to vibrate through the resonator 6. At the same time, the rotating shaft 7 rotates to realize continuous flipping of the particles, so as to achieve uniform coating on the particle surface, the sputtering process can be visually observed through the observation window 2, the camera 4 can regularly record the rolling state of the particles, and the operator adjusts the sputtering parameters according to the pictures taken by the camera to achieve uniform and dense coating on the particle surface.

[0029] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device.

[0030] Finally, it should be noted that the above description is only a preferred embodiment of the utility model and is not intended to limit the utility model. Although the utility model is described in detail with reference to the above embodiments, those skilled in the art can still modify the technical solutions recorded in the above embodiments or replace some of the technical features therein by equivalents. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the utility model shall be included in the protection scope of the utility model.

Claims

1. An ultrasonic particle magnetron sputtering apparatus, characterized in that: The invention comprises a vacuum chamber (3) and a circuit control system (10), wherein an ultrasonic vibration sample table (5) is provided inside the vacuum chamber (3), a magnetron sputtering target head (1) is provided above the ultrasonic vibration sample table (5), one end of the magnetron sputtering target head (1) is connected to a liquid cooling device (11), a resonator (6) is provided below the ultrasonic vibration sample table (5), the resonator (6) is mounted on a rotating shaft (7), and the resonator (6) is connected to an ultrasonic generator (9) via a wire; the circuit control system (10) is used to set coating parameters.

2. The ultrasonic particle magnetron sputtering apparatus according to claim 1, characterized in that: Two magnetron sputtering target heads (1) are symmetrically arranged, and a baffle (14) is arranged inside the vacuum chamber (3) in front of the end of the magnetron sputtering target head (1).

3. The ultrasonic particle magnetron sputtering apparatus according to claim 1, characterized in that: The magnetron sputtering target head (1) comprises a heater, a cooling plate (12) and a target material (13); the heater is connected to the cooling plate (12), and the cooling plate (12) is connected to the target material (13).

4. The ultrasonic particle magnetron sputtering apparatus according to claim 1, characterized in that: An observation window (2) and a camera (4) are provided on the outer wall of the vacuum chamber (3).

5. The ultrasonic particle magnetron sputtering apparatus according to claim 1, characterized in that: The vacuum chamber (3) is connected to the air pump (8) via an air pipe.

6. The ultrasonic particle magnetron sputtering apparatus according to claim 1, characterized in that: The ultrasonic vibration sample platform (5) is connected to the resonator (6) via screws.

7. The ultrasonic particle magnetron sputtering apparatus according to claim 1, characterized in that: The coating parameters include sputtering frequency, sputtering time and sputtering gas pressure.

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