Device for moving vacuum magnetron sputtering source target material in vacuum

Abstract

The utility model relates to a device for moving a vacuum magnetron sputtering source target material in vacuum, which comprises a vacuum separator for separating the vacuum from the atmosphere; the first support is arranged on the side, located in the atmosphere, of the vacuum isolation piece; one end of the air pressure balance assembly is mounted on the vacuum isolation piece, and the other end is mounted on the first bracket; the displacement power assembly is mounted on the first bracket; the second support is installed on the displacement power assembly and embedded in the vacuum isolation piece at the same time; a sealing piece is arranged between the second bracket and the vacuum isolation piece; the second bracket is provided with a target material; the displacement power assembly is used for driving the second support and the target installed on the second support to move in a reciprocating mode, and therefore the distance between the target and the coating workpiece to be machined is changed. The displacement power assembly drives the target material to reciprocate in the vacuum environment, so that the distance between the target material and a coating workpiece can be effectively changed, more uniform material deposition is realized, and the coating quality, the film layer uniformity and the comprehensive utilization rate of the target material are improved.

Description

Technical Field

[0001] The utility model relates to the technical field of magnetron sputtering, in particular to a device for moving a vacuum magnetron sputtering source target in a vacuum. Background Art

[0002] Vacuum magnetron sputtering coating technology is one of the key technologies in the manufacture of microelectronic products. It is widely used in the production of integrated circuits, liquid crystal displays, thin-film solar cells and LED products. This technology uses energetic particles (such as argon ions) to bombard the target material, causing the atoms on its surface to fall off and deposit on the surface of the workpiece to form the required film layer. However, traditional vacuum magnetron sputtering coating equipment has the following problems:

[0003] 1. The distance between the target and the workpiece cannot be adjusted: In a vacuum environment, the distance between the target and the workpiece to be coated is often difficult to adjust due to limitations such as sealing, equipment space, and atmospheric pressure. This makes it difficult to optimize the coating process parameters at different stages of target use (early, middle, and late stages), affecting the consistency of the film layer and product quality.

[0004] Therefore, the prior art has deficiencies and needs further improvement. Utility Model Content

[0005] In view of the problems existing in the prior art, the utility model provides a device for moving a vacuum magnetron sputtering source target in a vacuum.

[0006] To achieve the above purpose, the specific scheme of the utility model is as follows:

[0007] The utility model provides a device for moving a vacuum magnetron sputtering source target in a vacuum, comprising:

[0008] A vacuum isolator is used to separate the vacuum from the atmosphere;

[0009] A first bracket is arranged on the side of the vacuum isolation member facing the atmosphere;

[0010] An air pressure balance assembly, one end of which is mounted on the vacuum isolation member and the other end of which is mounted on the first bracket;

[0011] A displacement power assembly is mounted on the first bracket;

[0012] A second bracket is mounted on the displacement power assembly and is embedded in the vacuum isolation member;

[0013] A sealing member is provided between the second bracket and the vacuum isolation member;

[0014] A target material is also arranged on the second bracket at the vacuum side;

[0015] The displacement power component is used to drive the second bracket and the target mounted on the second bracket to reciprocate, so as to change the distance between the target and the coating workpiece to be processed. The seal is used to maintain the airtightness between the second bracket and the vacuum isolation part during the movement.

[0016] Further, a rotating magnetic field component is also provided on the side of the second bracket facing the atmosphere;

[0017] The rotating magnetic field component includes a rotating motor, a speed reducer, and a rotating magnetic field;

[0018] The rotating motor is mounted on the second bracket. A speed reducer is provided on the output shaft of the rotating motor, and a rotating magnetic field is provided on the output shaft of the speed reducer.

[0019] Further, the second bracket is cylindrical, and an opening is provided on the side of the second bracket facing the atmosphere;

[0020] The rotating magnetic field is disc-shaped;

[0021] The rotating magnetic field is arranged in the cylindrical second bracket.

[0022] Further, the seal is a rubber sealing ring.

[0023] Further, the first bracket is in a shape of a Chinese character 'hui';

[0024] Further, a first side plate is also provided on the outer side of the second bracket.

[0025] Further, the air pressure balance component includes: two or more pairs of double-rod cylinders, double-rod hydraulic cylinders or double-rod synchronous hydraulic cylinders arranged in pairs;

[0026] One end of the double-rod cylinder, double-rod hydraulic cylinder or double-rod synchronous hydraulic cylinder is mounted on the vacuum isolation part, and the other end is mounted on the first bracket, which is used to provide support for the first bracket and balance the air pressure.

[0027] Further, the displacement power component includes: a displacement motor, a lead screw, a nut, a first mounting bracket, and a second mounting bracket;

[0028] The first mounting bracket is mounted on the first side plate, the second mounting bracket is mounted on the first bracket, the displacement motor is mounted on the second mounting bracket, the nut is mounted on the first mounting bracket, and one end of the lead screw is connected to the displacement motor through a coupling, and the other end is connected to the nut through a thread;

[0029] The displacement motor drives the lead screw to rotate, the rotation of the lead screw drives the nut to move, and then drives the first side plate to move, and then drives the second bracket and the target arranged on the second bracket to move.

[0030] Furthermore, the displacement motor includes: a DC motor, a stepper motor, and a servo motor;

[0031] The coupling comprises: a first clamp, an X-shaped connecting block, and a second clamp;

[0032] The first clamp and the second clamp are clamped on the X-shaped connecting block by bolts;

[0033] The first chuck also clamps the lead screw, and the second chuck also clamps the output shaft of the displacement motor.

[0034] Furthermore, a displacement sensor is also provided on the side of the second bracket for sensing the displacement of the second bracket and the target material mounted on the second bracket.

[0035] The technical solution of the utility model has the following beneficial effects:

[0036] 1. Improved coating uniformity and quality: The displacement power assembly drives the target to move back and forth in a vacuum environment, which can effectively change the distance between the target and the coating workpiece, achieve more uniform material deposition, and improve coating quality and uniformity.

[0037] 2. Optimized magnetic field distribution: By arranging a rotating magnetic field assembly on the second bracket, a rotating magnetic field can be generated, which further improves the sputtering efficiency and uniformity of the material and optimizes the coating effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0038] Figure 1 It is a three-dimensional diagram of the utility model;

[0039] Figure 2 It is a three-dimensional diagram of the utility model from a rear-view angle;

[0040] Figure 3 It is a stereogram of the utility model from a side view angle;

[0041] Figure 4 It is an exploded view of the utility model;

[0042] Figure 5 It is a cross-sectional view of the utility model;

[0043] Figure 6 It is a three-dimensional diagram of the displacement power assembly of the utility model;

[0044] Figure 7 It is an exploded view of the displacement power component of the utility model.

[0045] In the figure:

[0046] 1. Vacuum insulation;

[0047] 2. The first bracket;

[0048] 3. Air pressure balance assembly;

[0049] 4. Displacement power assembly;

[0050] 401, displacement motor; 402, lead screw; 403, nut; 404, first mounting frame; 405, second mounting frame;

[0051] 406. Coupling;

[0052] 4061, first clamp; 4062, X-shaped connecting block; 4063, second clamp;

[0053] 5. second bracket; 501. first side plate;

[0054] 6. Seals;

[0055] 7. Target material;

[0056] 8. Rotating magnetic field assembly;

[0057] 801. Rotating motor; 802. Reducer; 803. Rotating magnetic field. DETAILED DESCRIPTION

[0058] The present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. It is to be understood that the specific embodiments described herein are only used to explain the present invention, rather than to limit the present invention. It should also be noted that, for ease of description, only the parts related to the present invention, rather than all structures, are shown in the accompanying drawings.

[0059] In the description of the present invention, unless otherwise clearly specified and limited, the terms "connected", "connected", and "fixed" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0060] In the present utility model, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may include that the first and second features are in direct contact, or may include that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, a first feature being "above", "above" and "above" a second feature includes that the first feature is directly above and obliquely above the second feature, or simply indicates that the first feature is higher in level than the second feature. A first feature being "below", "below" and "below" a second feature includes that the first feature is directly below and obliquely below the second feature, or simply indicates that the first feature is lower in level than the second feature.

[0061] In the description of this embodiment, the terms "upper", "lower", "front", "back", "left", "right" and other directions or positional relationships are based on the directions or positional relationships shown in the drawings, and are only for the convenience of description and simplified operation, rather than indicating or implying that the device or element referred to must have a specific direction, be constructed and operate in a specific direction, and therefore cannot be understood as a limitation of the present invention. In addition, the terms "first" and "second" are only used to distinguish in the description and have no special meaning.

[0062] Combination Figure 1-Figure 7 As shown, the utility model provides a device for moving a vacuum magnetron sputtering source target 7 in a vacuum, comprising: a vacuum isolation member 1 for separating the vacuum from the atmosphere;

[0063] A first bracket 2 is arranged on the side of the vacuum isolation member 1 facing the atmosphere;

[0064] An air pressure balance component 3, one end of which is mounted on the vacuum isolation component 1 and the other end of which is mounted on the first bracket 2;

[0065] A displacement power assembly 4 is mounted on the first bracket 2;

[0066] The second bracket 5 is mounted on the displacement power assembly 4 and is embedded in the vacuum isolation element 1;

[0067] A sealing member 6 is provided between the second bracket 5 and the vacuum isolation member 1;

[0068] A target material 7 is also provided on the second support 5 at the vacuum side;

[0069] The displacement power assembly 4 is used to drive the second bracket 5 and the target material 7 mounted on the second bracket 5 to move back and forth, thereby changing the distance between the target material 7 and the coated workpiece to be processed, and the sealing member 6 is used to maintain the airtightness between the second bracket 5 and the vacuum isolation member 1 during the movement.

[0070] The second bracket 5 is also provided with a rotating magnetic field component 8 on the side facing the atmosphere;

[0071] The rotating magnetic field assembly 8 includes a rotating motor 801, a reduction gearbox 802, and a rotating magnetic field 803;

[0072] The rotating motor 801 is mounted on the second bracket 5 , a reduction box 802 is disposed on the output shaft of the rotating motor 801 , and a rotating magnetic field 803 is disposed on the output shaft of the reduction box 802 .

[0073] The second bracket 5 is cylindrical, and an opening is provided on the atmosphere side of the second bracket 5;

[0074] The rotating magnetic field 803 is in the shape of a disk;

[0075] The rotating magnetic field 803 is disposed in the cylindrical second bracket 5 .

[0076] The sealing member 6 is a rubber sealing ring, the first bracket 2 is in the shape of a Chinese numeral 504 , and a first side plate 501 is further provided on the outer side of the second bracket 5 .

[0077] The air pressure balance assembly 3 includes: two or more double-rod air cylinders, double-rod hydraulic cylinders or double-rod synchronous hydraulic cylinders arranged in pairs;

[0078] One end of the double-rod air cylinder, double-rod hydraulic cylinder or double-rod synchronous hydraulic cylinder is installed on the vacuum isolation member 1 and the other end is installed on the first bracket 2, so as to provide support for the first bracket 2 and balance the air pressure.

[0079] The displacement power assembly 4 includes: a displacement motor 401, a lead screw 402, a nut 403, a first mounting frame 404, and a second mounting frame 405;

[0080] The first mounting frame 404 is mounted on the first side plate 501, the second mounting frame 405 is mounted on the first bracket 2, the displacement motor 401 is mounted on the second mounting frame 405, the nut 403 is mounted on the first mounting frame 404, one end of the lead screw 402 is connected to the displacement motor 401 through a coupling 406, and the other end is connected to the nut 403 through a thread;

[0081] The displacement motor 401 drives the lead screw 402 to rotate, and the rotation of the lead screw 402 drives the nut 403 to move, thereby driving the first side plate 501 to move, thereby driving the second bracket 5 and the target material 7 disposed on the second bracket 5 to move.

[0082] The displacement motor 401 includes: a DC motor, a stepping motor, and a servo motor;

[0083] The coupling 406 includes: a first clamp 4061, an X-shaped connecting block 4062, and a second clamp 4063;

[0084] The first clamp 4061 and the second clamp 4063 are clamped on the X-shaped connection block 4062 by bolts;

[0085] The first clamp 4061 also clamps the lead screw 402 , and the second clamp 4063 also clamps the output shaft of the displacement motor 401 .

[0086] A displacement sensor is also disposed on the side of the second bracket 5 for sensing the displacement of the second bracket 5 and the target material 7 mounted on the second bracket 5 .

[0087] The principle of this utility model is as follows:

[0088] 1. Establishment and isolation of vacuum environment

[0089] The internal vacuum environment is completely isolated from the external atmospheric environment by the vacuum isolation member 1, ensuring that the sputtering process is carried out in a high vacuum state, which is the basic condition for sputtering coating.

[0090] 2. Air pressure balance and support

[0091] It is composed of a double-rod air cylinder, a double-rod hydraulic cylinder or a double-rod synchronous hydraulic cylinder, one end of which is fixed on the vacuum isolation member 1, and the other end is fixed on the first bracket 2. When the second bracket 5 moves, these components can automatically adjust the internal and external pressure difference to avoid deformation or damage of the equipment due to pressure imbalance, and provide stable support for the first bracket 2.

[0092] 3. Movement and control of target 7

[0093] Components include a displacement motor 401 (such as a DC motor, a stepper motor, or a servo motor), a lead screw 402, a nut 403, a first mounting bracket 404, a second mounting bracket 405, etc.; the displacement motor 401 is connected to the lead screw 402 via a coupling 406 (a first chuck 4061, an X-shaped connecting block 4062, and a second chuck 4063), driving the lead screw 402 to rotate; the lead screw 402 cooperates with the nut 403, and the linear motion of the nut 403 drives the first side plate 501, thereby moving the second bracket 5 and the target material 7 thereon along a predetermined trajectory in the vacuum chamber, thereby realizing relative movement between the target material 7 and the coated workpiece, changing the sputtering distance and angle, and optimizing the coating uniformity and quality.

[0094] 4. Rotation and enhancement of magnetic field

[0095] It is composed of a rotating motor 801, a reduction box 802 and a rotating magnetic field 803, and is installed on the atmosphere side of the second bracket 5. The rotating motor 801 drives the rotating magnetic field 803 through the reduction box 802 to generate a rotating magnetic field, enhance the magnetic field distribution on the surface of the target material 7, and improve the sputtering efficiency and material utilization.

[0096] 5. Sealing and positioning

[0097] A rubber sealing ring is used for sealing, and is located between the second bracket 5 and the vacuum isolation member 1, to ensure that the airtightness in the vacuum chamber is not destroyed during the movement of the second bracket 5.

[0098] Displacement sensor: installed on the side of the second bracket 5, monitors the position changes of the second bracket 5 and the target material 7 in real time, and feeds back to the control system to achieve precise control of the movement of the target material 7.

[0099] Through precise mechanical structure design and control strategy, the device achieves efficient and stable movement of the target 7 in a vacuum environment. Combined with the use of the rotating magnetic field 803, it significantly improves the uniformity and production efficiency of sputtering coating, and is suitable for the preparation of a variety of high-precision thin film materials.

[0100] The above description is only a preferred embodiment of the present invention, and does not limit the scope of the present invention. All equivalent structural changes made by using the contents of the present invention specification and drawings under the concept of the present invention, or directly / indirectly applied in other related technical fields are included in the protection scope of the present invention.

Claims

1. A device for moving a vacuum magnetron sputtering source target in a vacuum, characterized in that: Comprising: A vacuum isolation member for separating between vacuum and atmosphere; A first bracket disposed on the atmosphere side of the vacuum isolation member; A pneumatic balance assembly, one end of which is mounted on the vacuum isolation member and the other end is mounted on the first bracket; A displacement driving assembly mounted on the first bracket; A second bracket mounted on the displacement driving assembly and simultaneously embedded in the vacuum isolation member; A seal is provided between the second bracket and the vacuum isolation member; A target is further provided on the vacuum side of the second bracket; The displacement driving assembly is used to drive the second bracket and the target mounted on the second bracket to reciprocate, thereby changing the distance between the target and the coating workpiece to be processed, and the seal is used to maintain the airtightness between the second bracket and the vacuum isolation member during the movement.

2. The device for moving the vacuum magnetron sputtering source target in vacuum according to claim 1, characterized in that A rotating magnetic field assembly is further provided on the atmosphere side of the second bracket; The rotating magnetic field assembly includes a rotating motor, a reduction gearbox, and a rotating magnetic field; The rotating motor is mounted on the second bracket, a reduction gearbox is provided on the output shaft of the rotating motor, and a rotating magnetic field is provided on the output shaft of the reduction gearbox.

3. The device for moving the vacuum magnetron sputtering source target in vacuum according to claim 2, characterized in that The second bracket is cylindrical, and an opening is provided on the atmosphere side of the second bracket; The rotating magnetic field is disc-shaped; The rotating magnetic field is disposed in the cylindrical second bracket.

4. The device for moving a vacuum magnetron sputtering source target in a vacuum according to claim 1, characterized in that: The seal is a rubber sealing ring.

5. The device for moving a vacuum magnetron sputtering source target in a vacuum according to claim 1, characterized in that: The first bracket is in a shape of a Chinese character "hui".

6. The device for moving a vacuum magnetron sputtering source target in a vacuum according to claim 3, characterized in that: A first side plate is further provided on the outer side of the second bracket.

7. The device for moving the vacuum magnetron sputtering source target in vacuum according to claim 1, characterized in that The pneumatic balance assembly includes: two or more pairs of double-rod cylinders, double-rod hydraulic cylinders or double-rod synchronous hydraulic cylinders arranged in pairs; One end of the double-rod cylinder, double-rod hydraulic cylinder or double-rod synchronous hydraulic cylinder is mounted on the vacuum isolation member and the other end is mounted on the first bracket, for providing support for the first bracket and balancing the air pressure.

8. The device for moving the vacuum magnetron sputtering source target in vacuum according to claim 6, characterized in that The displacement driving assembly includes: a displacement motor, a lead screw, a nut, a first mounting bracket, and a second mounting bracket; The first mounting bracket is mounted on the first side plate, the second mounting bracket is mounted on the first bracket, the displacement motor is mounted on the second mounting bracket, the nut is mounted on the first mounting bracket, and one end of the lead screw is connected to the displacement motor through a coupling and the other end is connected to the nut through a thread; The displacement motor drives the lead screw to rotate, the rotation of the lead screw drives the nut to move, thereby driving the first side plate to move, and further driving the second bracket and the target provided on the second bracket to move.

9. The device for moving the vacuum magnetron sputtering source target in vacuum according to claim 8, characterized in that The displacement motor includes: a DC motor, a stepper motor, a servo motor; The coupling includes: a first chuck, an X-shaped connecting block, and a second chuck; The first chuck and the second chuck are clamped on the X-shaped connecting block through bolts; The first chuck also clamps the lead screw, and the second chuck also clamps the output shaft of the displacement motor.

10. The device for moving a vacuum magnetron sputtering source target in a vacuum according to claim 1, characterized in that: A displacement sensor is also provided on the side of the second bracket for sensing the displacement of the second bracket and the target material mounted on the second bracket.

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