Chemical vapor deposition equipment

Abstract

The utility model belongs to the technical field of display device manufacturing, and discloses chemical vapor deposition equipment which comprises a deposition chamber, a feeding pipe, a ceramic piece, a sealing ring, a first electrode and a second electrode, the first electrode comprises a main body part and a connecting part, the main body part is connected with a radio frequency power supply, and the second electrode is used for supporting a workpiece to be plated; the feeding pipe is connected with an external air source, the ceramic part comprises a first ceramic pipe and a second ceramic pipe, the first ceramic pipe is connected with the feeding pipe, the second ceramic pipe is connected with the connecting part, the first ceramic pipe is inserted into the second ceramic pipe, and the sealing ring is arranged between the first ceramic pipe and the second ceramic pipe in a sleeving mode. According to the chemical vapor deposition equipment disclosed by the utility model, the ceramic piece is arranged into a combined structure that the first ceramic tube is inserted into the second ceramic tube, so that the situation that the ceramic piece is broken due to mutual extrusion or pulling on the ceramic piece by acting forces such as external gas source propulsion and vacuum negative pressure drawing in the deposition chamber can be effectively avoided; and the influence of stress impact on the ceramic piece is reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of display device manufacturing, in particular to a chemical vapor deposition device. Background Art

[0002] With the development of semiconductor technology, the development and use of Plasma Enhanced Chemical Vapor Deposition (PECVD) devices are becoming more and more widespread. The device uses two parallel and opposite electrode plates placed in a vacuum environment, one of which is connected to a radio frequency (RF) power supply and the other is grounded. A radio frequency electric field is generated between the two electrode plates, and the substrate to be film-formed is placed between the two electrode plates. The film-forming process gas enters between the two electrode plates and is excited to become plasma under the action of the radio frequency electric field. The plasma is adsorbed on the surface of the substrate or reacts with the surface of the substrate to form a thin film on the surface of the substrate.

[0003] Reference Figure 1 As shown, an existing chemical vapor deposition device includes a deposition chamber 1′, an upper electrode 2′, a lower electrode 3′ and an input tube 4′. A deposition chamber 11′ for accommodating a glass substrate 5′ is arranged in the deposition chamber 1′. The upper electrode 2′ and the lower electrode 3′ are arranged in the deposition chamber 11′ with intervals. The glass substrate 5′ is located between the upper electrode 2′ and the lower electrode 3′. The input tube 4′ is welded to the upper electrode 2′. When depositing a coating, the upper electrode 2′ ejects a gas containing plasma downward, and the gas is deposited on the surface of the glass substrate 5′ to form a thin film structure.

[0004] The prior art has the following deficiencies: during the use of the upper electrode 2′, there is a relatively high radio frequency current and a relatively high operating temperature, and the input tube 4′ is directly welded to the upper electrode 2′, and the charge and temperature of the upper electrode 2′ are easily transmitted to the input tube 4′, causing the process gas to be film-formed in the input tube 4′ to start reacting in the input tube 4′, resulting in a waste of materials and even the generation of other undesirable substances, which affects the coating quality of the glass substrate 5′. Utility Model Content

[0005] The utility model aims to provide a chemical vapor deposition device, which has a simple structure and a good ceramic component barrier effect, thereby effectively ensuring the safety of the use of the feed component.

[0006] To achieve this purpose, the utility model adopts the following technical solutions:

[0007] A chemical vapor deposition device is provided, comprising a deposition component and a feed component, wherein the deposition component comprises a deposition chamber, and a first electrode and a second electrode arranged in the deposition chamber at an interval in a vertical direction, wherein the first electrode comprises a main body and a connecting part, wherein the main body is connected to a radio frequency power supply, the connecting part is used to input a reaction gas, and the second electrode is used to support a workpiece to be plated; the feed component comprises a feed pipe, a ceramic part and a sealing ring, wherein the feed pipe is connected to an external gas source, the feed pipe is communicated with the connecting part through the ceramic part, the ceramic part comprises a first ceramic tube and a second ceramic tube, the first ceramic tube is connected to the feed pipe, the second ceramic tube is connected to the connecting part, and the first ceramic tube is inserted into the second ceramic tube, and the sealing ring is sleeved on the outer side wall of the first ceramic tube and abuts against the inner side wall of the second ceramic tube.

[0008] As a preferred solution of the chemical vapor deposition equipment, the chemical vapor deposition equipment also includes an elastic member, the outer wall of the first ceramic tube is provided with a first stop portion protruding around its own central axis, the inner wall of the second ceramic tube is provided with a second stop portion protruding around its own central axis, and the first stop portion is connected to the second stop portion through the elastic member.

[0009] As a preferred solution for chemical vapor deposition equipment, the outer wall of the first ceramic tube is provided with two first stop parts spaced apart along the direction of its own central axis, the two first stop parts are both located on the side of the second stop part adjacent to the connecting part, and the sealing ring is arranged between the two first stop parts.

[0010] As a preferred solution of the chemical vapor deposition equipment, the feed pipe is provided with a first flange, the first ceramic tube is provided with a second flange, and the first flange and the second flange are detachably connected; a third flange is provided at one end of the connecting part away from the main body, the second ceramic tube is provided with a fourth flange, and the third flange and the fourth flange are detachably connected.

[0011] As a preferred solution of the chemical vapor deposition equipment, the feed assembly also includes a sealing sleeve, one end of the sealing sleeve is sleeved on the outer wall of the first flange, the other end of the sealing sleeve is sleeved on the outer wall of the third flange, and the ceramic part is arranged in the sealing sleeve.

[0012] As a preferred solution for chemical vapor deposition equipment, the sealing sleeve includes a corrugated section and a first connecting section and a second connecting section that are spaced apart and arranged opposite to each other, the first connecting section is connected to the first flange, the second connecting section is connected to the third flange, and the first connecting section is connected to the second connecting section through the corrugated section.

[0013] As a preferred solution of the chemical vapor deposition equipment, one of the outer side wall of the first flange and the inner side wall of the sealing sleeve is protrudingly provided with a first clamping portion, and the other is recessedly provided with a first clamping groove, and the first clamping portion is clamped with the first clamping groove; and / or one of the outer side wall of the third flange and the inner side wall of the sealing sleeve is protrudingly provided with a second clamping portion, and the other is recessedly provided with a second clamping groove, and the second clamping portion is clamped with the second clamping groove.

[0014] As a preferred solution of the chemical vapor deposition equipment, one of the two flanges connected to each other is provided with a guide portion, and the other is provided with a guide groove, the guide portion is inserted into the guide groove, one of the guide portion and the guide groove is provided with a first magnet, and the other is provided with a second magnet, and the first magnet and the second magnet attract each other.

[0015] As a preferred solution of the chemical vapor deposition equipment, the feed pipe has a feed channel arranged through and a cooling cavity arranged around the feed channel, the cooling cavity is spaced apart from the feed channel, the feed channel is communicated with the first ceramic tube, and the outer wall of the feed pipe is also provided with a cooling inlet and a cooling outlet communicated with the cooling cavity.

[0016] As a preferred solution of the chemical vapor deposition equipment, the chemical vapor deposition equipment also includes an adjustment bracket, the adjustment bracket includes a first support tube and a second support tube, the first support tube is connected to the feed tube, the second support tube is used to provide supporting force, the first support tube is inserted into the second support tube, the outer side wall of the second support tube is provided with a threaded hole, the bolt passes through the threaded hole and is tightened to the first support tube to fix the first support tube and the second support tube after the adjustment position.

[0017] The beneficial effects of the utility model are as follows: by arranging a ceramic part between the connecting part of the feed pipe and the first electrode, the ceramic part can effectively block the conduction of radio frequency current and temperature on the connecting part, avoid premature reaction of the reaction gas in the feed pipe, improve the safety of the use of the feed assembly, thereby ensuring the utilization rate of the reaction gas and the coating quality of the workpiece to be plated; by arranging the ceramic part as a combined structure in which the first ceramic tube is inserted into the second ceramic tube, it can effectively avoid the external gas source push and the vacuum negative pressure pulling in the deposition chamber and other forces squeezing or pulling the ceramic part to cause the ceramic part to break. Under the action of external force, the first ceramic tube can slide relative to the second ceramic tube, reducing the influence of stress shock on the ceramic part, and effectively improving the service life of the ceramic part. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The utility model is further described in detail below based on the drawings and embodiments.

[0019] Figure 1 It is a structural schematic diagram of an existing chemical vapor deposition device;

[0020] Figure 2 It is a structural schematic diagram of a chemical vapor deposition device according to an embodiment of the utility model;

[0021] Figure 3 yes Figure 2 An enlarged schematic diagram of point A;

[0022] Figure 4 It is a schematic diagram of the cooperation between the feed tube and the first ceramic tube in an embodiment of the utility model.

[0023] Figure 1 middle:

[0024] 1′, deposition chamber; 2′, upper electrode; 3′, lower electrode; 4′, input tube; 5′, glass substrate.

[0025] Figures 2 to 4 middle:

[0026] 1. Deposition assembly; 11. Deposition chamber; 12. First electrode; 121. Main body; 122. Connecting part; 1221. Third flange; 13. Second electrode; 2. Feed assembly; 21. Feed pipe; 211. First flange; 2111. First clamping groove; 2112. Guide groove; 212. Feed channel; 213. Cooling chamber; 214. Cooling inlet; 215. Cooling outlet; 22. Ceramic part; 221. First ceramic tube; 2211. First stopper; 2212. Second flange; 2213. Guide; 222. Second ceramic tube; 2221. Second stopper; 2222. Fourth flange; 23. Sealing ring; 3. Elastic part; 4. Sealing sleeve; 41. Corrugated section; 42. First connecting section; 43. Second connecting section; 44. Second clamping part; 5. Adjustment bracket; 51. First support tube; 52. Second support tube. DETAILED DESCRIPTION

[0027] The advantages and features of the present invention and the methods for achieving them will become apparent with reference to the embodiments described in detail below in conjunction with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but can be implemented in various forms. The present embodiments are provided only to complete the disclosure of the present invention and to enable those skilled in the art to fully understand the scope of the present invention, and the present invention is limited only by the scope of the claims. The same reference numerals represent the same constituent elements throughout the specification.

[0028] Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

[0029] like Figure 2 and Figure 3As shown, the chemical vapor deposition device of the embodiment of the utility model comprises a deposition assembly 1 and a feed assembly 2, the deposition assembly 1 comprises a deposition chamber 11, and a first electrode 12 and a second electrode 13 which are arranged in the deposition chamber 11 in a vertical direction and are spaced relative to each other, the first electrode 12 comprises a main body 121 and a connecting part 122, the main body 121 is connected to a radio frequency power supply, the connecting part 122 is used for inputting reaction gas, and the second electrode 13 is used for supporting a workpiece to be plated; the feed assembly 2 comprises a feed pipe 21, a ceramic Ceramic part 22 and sealing ring 23, feed pipe 21 is connected to external gas source, feed pipe 21 is connected to connection part 122 through ceramic part 22, ceramic part 22 includes first ceramic tube 221 and second ceramic tube 222, first ceramic tube 221 is connected to feed pipe 21, second ceramic tube 222 is connected to connection part 122, and first ceramic tube 221 is inserted in second ceramic tube 222, sealing ring 23 is sleeved on the outer wall of first ceramic tube 221 and abuts against the inner wall of second ceramic tube 222. In the present embodiment, the workpiece to be plated is a glass substrate, that is, a corresponding chamber door is provided on deposition chamber 11 for loading and unloading of glass substrates, during loading and unloading, deposition chamber 11 will contact with external air and lose pressure, therefore, after placing the workpiece to be plated on second electrode 13, it is necessary to use external exhaust mechanism to evacuate deposition chamber 11 so that deposition chamber 11 has vacuum condition for coating treatment.

[0030] It can be understood that by arranging the ceramic part 22 between the feed pipe 21 and the connecting portion 122 of the first electrode 12, the ceramic part 22 can effectively block the conduction of the RF current and temperature on the connecting portion 122, avoid the reaction gas from reacting in advance in the feed pipe 21, and improve the safety of the feed assembly 2, thereby ensuring the utilization rate of the reaction gas and the coating quality of the workpiece to be plated; negative pressure will be formed during the vacuum treatment of the deposition chamber 11, thereby causing a certain pulling stress on the connecting portion 122 and the ceramic part 22 connected to the connecting portion 122, or when the external gas source inputs the reaction gas, the feed pipe 21 and the ceramic part 22 will be subjected to a certain pulling stress. There is a certain driving stress. Therefore, by setting the ceramic part 22 as a sleeve combination structure in which the first ceramic tube 221 is inserted into the second ceramic tube 222, it can effectively avoid the external gas source push and the vacuum negative pressure pulling in the deposition chamber 11 and other forces squeezing or pulling each other on the ceramic part 22 and causing the ceramic part 22 to break. Under the action of external force, the first ceramic tube 221 can slide relative to the second ceramic tube 222, reducing the impact of stress shock on the ceramic part 22, effectively improving the service life of the ceramic part 22, and the sleeve combination structure has a certain gap, which has better insulation and lower thermal conductivity than the one-piece ceramic structure.

[0031] Furthermore, the chemical vapor deposition equipment also includes an elastic member 3, the outer wall of the first ceramic tube 221 is provided with a first stop portion 2211 protruding around its own central axis, the inner wall of the second ceramic tube 222 is provided with a second stop portion 2221 protruding around its own central axis, and the first stop portion 2211 is connected to the second stop portion 2221 through the elastic member 3. The elastic member 3 can directly adopt a spring structure, that is, a plurality of springs are evenly distributed along the central axis of the first ceramic tube 221, and the length of each spring extends along the central axis direction of the first ceramic tube 221. By fixing the two ends of the spring to the first stop portion 2211 and the second stop portion 2221 respectively, when the first ceramic tube 221 is forced to move toward the connecting portion 122, the first stop portion 2211 moves away from the second stop portion 2221. The force in the opposite direction formed by pulling the spring can offset part of the stress pushing the first ceramic tube 221, reduce the movement of the first ceramic tube 221, and ensure the relative stability between the first ceramic tube 221 and the second ceramic tube 222. Similarly, when the second ceramic tube 222 is forced to move in a direction away from the feeding tube 21, the second stopping portion 2221 approaches the first stopping portion 2211, and forms a force in the opposite direction by squeezing the spring to offset part of the stress pulling the second ceramic tube 222, thereby reducing the movement of the second ceramic tube 222 and ensuring the relative stability between the first ceramic tube 221 and the second ceramic tube 222.

[0032] Furthermore, the outer wall of the first ceramic tube 221 is provided with two first stoppers 2211 at intervals along the direction of its own central axis, and the two first stoppers 2211 are both located on the side of the second stopper 2221 adjacent to the connecting portion 122, and the sealing ring 23 is provided between the two first stoppers 2211. That is, the two first stoppers 2211 are spaced to form a limiting groove, and the sealing ring 23 is provided in the limiting groove to ensure the position stability of the sealing ring 23, thereby ensuring the sealing between the first ceramic tube 221 and the second ceramic tube 222, and preventing the sealing ring 23 from falling off from the outer wall of the first ceramic tube 221 or the inner wall of the second ceramic tube 222 during the relative movement of the first ceramic tube 221 or the second ceramic tube 222. It can be understood that at this time, the elastic member 3 is connected between the second stopper 2221 and the first stopper 2211 adjacent to the second stopper 2221.

[0033] In some embodiments, the feed pipe 21 is provided with a first flange 211, the first ceramic tube 221 is provided with a second flange 2212, and the first flange 211 and the second flange 2212 are detachably connected; the end of the connecting part 122 away from the main body 121 is provided with a third flange 1221, the second ceramic tube 222 is provided with a fourth flange 2222, and the third flange 1221 and the fourth flange 2222 are detachably connected. The detachable connection through the flange is convenient for improving the connection convenience of the ceramic part 22, and the flanges can be connected by bolts. For example, a plurality of second threaded holes are provided on the first flange 211, and a plurality of first through holes are provided on the second flange 2212 corresponding to the second threaded holes. The bolts pass through the first through holes and are screwed into the second threaded holes to connect the first flange 211 with the second flange 2212; a plurality of third threaded holes are provided on the third flange 1221, and a plurality of second through holes are provided on the fourth flange 2222 corresponding to the third threaded holes. The second bolts pass through the second through holes and are screwed into the third threaded holes to connect the third flange 1221 with the fourth flange 2222; of course, the second threaded hole can be provided on the second flange 2212, the first through hole is provided on the first flange 211, the third threaded hole is provided on the fourth flange 2222, and the second through hole is provided on the third flange 1221. The connection strength is high and the disassembly and assembly are convenient, which is convenient for the subsequent maintenance, cleaning or replacement of the ceramic part 22.

[0034] Further, the feed assembly 2 also includes a sealing sleeve 4, one end of which is sleeved on the outer wall of the first flange 211, and the other end of the sealing sleeve 4 is sleeved on the outer wall of the third flange 1221, and the ceramic part 22 is arranged in the sealing sleeve 4. Through the arrangement of the sealing sleeve 4, the ceramic part 22 can be arranged in the sealing sleeve 4 as a whole, and the ceramic part 22 is sealed twice, so as to further enhance the sealing of the ceramic part 22. The sealing sleeve 4 is sleeved on the outer sides of the two flanges connected to each other at the same time, and the sealing between the flange connections can also be ensured. Of course, sealing gaskets can be arranged between the first flange 211 and the second flange 2212, and between the third flange 1221 and the fourth flange 2222, to further ensure the sealing between the flange connections, thereby ensuring the overall sealing of the ceramic part 22.

[0035] Furthermore, under the action of stress, the first ceramic tube 221 and the second ceramic tube 222 will have a certain relative displacement, therefore, the sealing sleeve 4 includes a corrugated section 41 and a first connecting section 42 and a second connecting section 43 which are arranged opposite to each other at intervals, the first connecting section 42 is connected to the first flange 211, the second connecting section 43 is connected to the third flange 1221, and the first connecting section 42 is connected to the second connecting section 43 through the corrugated section 41. By setting the corrugated section 41, when the first ceramic tube 221 and the second ceramic tube 222 are relatively displaced, the sealing sleeve 4 on the outside of the ceramic pipe can be deformed through the corrugated section 41 to offset the movement of the sealing sleeve 4, thereby ensuring the structural stability of the sealing sleeve 4 and the relative position stability between the sealing sleeve 4 and the flange.

[0036] Furthermore, if Figure 2 , Figure 3 and Figure 4 As shown, the outer wall of the first flange 211 is recessed with a first clamping groove 2111, the inner wall of one end of the sealing sleeve 4 is protruding with a first clamping portion, and the first clamping portion is clamped in the first clamping groove 2111, the outer wall of the third flange 1221 is recessed with a second clamping groove, and the inner wall of the other end of the sealing sleeve 4 is protruding with a second clamping portion 44, and the second clamping portion 44 is clamped in the second clamping groove, that is, the sealing sleeve 4 is connected to the flange by the clamping portion and the clamping groove. On the one hand, the clamping and disassembly are convenient, and on the other hand, the setting of the clamping portion and the clamping groove can strengthen the contact surface between the sealing sleeve 4 and the flange, and further improve the sealing between the sealing sleeve 4 and the flange. In addition, the first clamping groove 2111 can be set on the inner wall of the sealing sleeve 4, the first clamping portion is set on the outer wall of the first flange 211, the second clamping groove is set on the inner wall of the sealing sleeve 4, and the second clamping portion 44 is set on the outer wall of the third flange 1221, and no excessive restrictions are made here.

[0037] Optionally, the chemical vapor deposition equipment further comprises a clamp, which is disposed on the outer wall of the sealing sleeve 4 and can be used to lock the sealing sleeve 4 tightly against the flange, further improving the connection strength and connection sealing between the sealing sleeve 4 and the flange.

[0038] Furthermore, if Figure 4As shown, one of the two flanges connected to each other is provided with a guide portion 2213, and the other is provided with a guide groove 2112, the guide portion 2213 is inserted into the guide groove 2112, one of the guide portion 2213 and the guide groove 2112 is provided with a first magnet, and the other is provided with a second magnet, and the first magnet and the second magnet attract each other. For example, the first flange 211 and the third flange 1221 are provided with a guide portion 2213, and the second flange 2212 and the fourth flange 2222 are provided with a guide groove 2112. By inserting the guide portion 2213 into the guide groove 2112, the connection guide between the first flange 211 and the second flange 2212 can be strengthened, and the connection guide between the third flange 1221 and the fourth flange 2222 can be strengthened, thereby improving the convenience of flange connection. In addition, the guide portion 2213 can be provided on the second flange 2212 and the fourth flange 2222, and the guide groove 2112 can be provided on the first flange 211 and the third flange 1221. The first magnet and the second magnet are two magnets with opposite magnetic properties. The connection of the flanges requires the cooperation of multiple people, that is, one person holds the flange to prevent the two flanges from separating, and the other person tightens the bolts. Therefore, through the setting of the first magnet and the second magnet, the two flanges can be pre-fixed when connected. At this time, the operator uses one hand to hold the flange and the other hand to tighten the bolt to complete the connection of the flanges, which reduces the input of the operators and facilitates the connection.

[0039] In other embodiments, the feed pipe 21 has a feed channel 212 that is arranged through and a cooling cavity 213 that is arranged around the feed channel 212. The cooling cavity 213 is arranged at intervals from the feed channel 212. The feed channel 212 is communicated with the first ceramic tube 221. The outer wall of the feed pipe 21 is also provided with a cooling inlet 214 and a cooling outlet 215 that are communicated with the cooling cavity 213. The external cooling liquid enters the cooling cavity 213 through the cooling inlet 214 to exchange heat with the tube wall of the feed pipe 21. The cooling liquid after heat exchange is only discharged from the cooling outlet 215. On the one hand, this structural setting can further ensure the stability of the feed pipe 21, prevent the chemical gas from reacting prematurely in the feed pipe 21, and avoid the temperature from being transmitted to the external gas source along with the guide pipe, thereby ensuring the stability of the external gas source; on the other hand, reducing the temperature of the feed pipe 21 can reduce safety hazards such as scalding the operator and reduce the influence of the temperature difference on the feed pipe 21, thereby ensuring the structural stability of the feed pipe 21, thereby ensuring the service life of the feed pipe 21.

[0040] Furthermore, the chemical vapor deposition equipment also includes an adjustment bracket 5, which includes a first support tube 51 and a second support tube 52. The first support tube 51 is connected to the feed tube 21, and the second support tube 52 is used to provide a supporting force. The first support tube 51 is inserted into the second support tube 52, and the outer wall of the second support tube 52 is provided with a threaded hole. The bolt passes through the threaded hole and is tightened to the first support tube 51, so that the first support tube 51 and the second support tube 52 after the adjustment position are fixed. Since the feed tube 21 and the first ceramic tube 221 are not fixed to the connecting portion 122, it is necessary to install and fix the feed tube 21, install the second support tube 52 to the workbench or the ground, and lock it with bolts after adjusting the height of the first support tube 51 relative to the second support tube 52, so as to ensure the fitting accuracy of the feed tube 21 and the first ceramic tube 221 and the second ceramic tube 222 on the first support tube 51, and improve the installation convenience of the feed tube 21 and the first ceramic tube 221.

[0041] Although the embodiments of the present invention have been described above with reference to the accompanying drawings, the present invention is not limited to the above embodiments, but can be manufactured in various forms, and those skilled in the art will understand that the present invention can be implemented in other specific forms without changing the technical spirit or basic features of the present invention. Therefore, it should be understood that the above embodiments are exemplary and not restrictive in all aspects.

Claims

1. A chemical vapor deposition device, characterized in that: include: A deposition assembly, the deposition assembly comprising a deposition chamber, and a first electrode and a second electrode arranged in the deposition chamber in a vertical direction and spaced relative to each other, the first electrode comprising a main body and a connecting part, the main body being connected to a radio frequency power source, the connecting part being used to input a reaction gas, and the second electrode being used to support a workpiece to be plated; A feed assembly, the feed assembly includes a feed pipe, a ceramic part and a sealing ring, the feed pipe is connected to an external gas source, the feed pipe is communicated with the connecting part through the ceramic part, the ceramic part includes a first ceramic tube and a second ceramic tube, the first ceramic tube is connected to the feed pipe, the second ceramic tube is connected to the connecting part, and the first ceramic tube is inserted in the second ceramic tube, the sealing ring is sleeved on the outer wall of the first ceramic tube and abuts against the inner wall of the second ceramic tube.

2. The chemical vapor deposition equipment according to claim 1, characterized in that: It also includes an elastic member, the outer wall of the first ceramic tube is provided with a first stopper protruding around its own central axis, the inner wall of the second ceramic tube is provided with a second stopper protruding around its own central axis, and the first stopper is connected to the second stopper through the elastic member.

3. The chemical vapor deposition equipment according to claim 2, characterized in that: The outer wall of the first ceramic tube is provided with two first stop parts at intervals along the central axis direction thereof, the two first stop parts are both located on the side of the second stop part adjacent to the connecting part, and the sealing ring is arranged between the two first stop parts.

4. The chemical vapor deposition device according to any one of claims 1 to 3, characterized in that: The feed pipe is provided with a first flange, the first ceramic tube is provided with a second flange, and the first flange and the second flange are detachably connected; a third flange is provided at one end of the connecting part away from the main body, the second ceramic tube is provided with a fourth flange, and the third flange and the fourth flange are detachably connected.

5. The chemical vapor deposition equipment according to claim 4, characterized in that: The feed assembly further comprises a sealing sleeve, one end of which is sleeved on the outer side wall of the first flange, the other end of which is sleeved on the outer side wall of the third flange, and the ceramic component is arranged in the sealing sleeve.

6. The chemical vapor deposition equipment according to claim 5, characterized in that: The sealing sleeve comprises a corrugated section and a first connecting section and a second connecting section which are arranged opposite to each other at an interval, wherein the first connecting section is connected to the first flange, the second connecting section is connected to the third flange, and the first connecting section is connected to the second connecting section via the corrugated section.

7. The chemical vapor deposition equipment according to claim 5, characterized in that: One of the outer side wall of the first flange and the inner side wall of the sealing sleeve is protrudingly provided with a first clamping portion, and the other is recessedly provided with a first clamping groove, and the first clamping portion is clamped with the first clamping groove; and / or one of the outer side wall of the third flange and the inner side wall of the sealing sleeve is protrudingly provided with a second clamping portion, and the other is recessedly provided with a second clamping groove, and the second clamping portion is clamped with the second clamping groove.

8. The chemical vapor deposition equipment according to claim 4, characterized in that: One of the two flanges connected to each other is provided with a guide portion, and the other is provided with a guide groove, the guide portion is inserted into the guide groove, one of the guide portion and the guide groove is provided with a first magnet, and the other is provided with a second magnet, and the first magnet and the second magnet attract each other.

9. The chemical vapor deposition device according to any one of claims 1 to 3, characterized in that: The feed pipe has a feed channel that is arranged through and a cooling cavity that is arranged around the feed channel. The cooling cavity is arranged at an interval from the feed channel. The feed channel is communicated with the first ceramic tube. The outer wall of the feed pipe is also provided with a cooling inlet and a cooling outlet that are communicated with the cooling cavity.

10. The chemical vapor deposition device according to any one of claims 1 to 3, characterized in that: It also includes an adjustment bracket, which includes a first support tube and a second support tube, the first support tube is connected to the feed tube, the second support tube is used to provide supporting force, the first support tube is inserted into the second support tube, and the outer wall of the second support tube is provided with a threaded hole, and a bolt passes through the threaded hole and is tightened to the first support tube to fix the first support tube and the second support tube after the adjustment position.

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