Material stirring and dissolving tank for photoresist

Abstract

The utility model relates to the technical field of photoresist production equipment, in particular to a material stirring and dissolving tank for photoresist, which comprises a tank body, a stirring shaft is arranged in the tank body, and a paddle, a stirring rod and an inner wall cleaning brush are arranged on the stirring shaft; a plurality of filter screen structures are arranged in the tank body, so that the photoresist can be filtered while being stirred and dissolved, and the working procedures are reduced; residual materials on the inner side wall of the tank body can be synchronously cleaned through the inner wall cleaning brush, so that the cleaning and maintenance work is reduced; and scraped residual materials can be recycled in real time through a recycling pipe, so that material loss generated in the production process is reduced, and economic benefits in production are improved.

Description

Technical Field

[0001] The utility model relates to the technical field of photoresist production equipment, in particular to a material stirring and dissolving tank for photoresist. Background Art

[0002] Photoresist, also known as photoresist, is a material widely used in microelectronics technology. It is mainly composed of three main components: photosensitive resin sensitizer and solvent. Photoresist is currently mainly used in fields such as integrated circuit chip manufacturing. According to its properties, it is divided into positive photoresist and negative photoresist. In the production process of photoresist, it is inevitable to go through the mixing step of multiple materials. Usually, a stirring and dissolving tank is required to carry out this step so that various materials can be mixed evenly. Since the viscosity of photoresist is relatively high during the production process, it is easy for the semi-dissolved photoresist to adhere to the inner wall of the tank during the stirring and dissolving process, which not only causes a certain amount of material waste, but also causes errors in the material ratio of the photoresist due to insufficient material dissolution, which has an adverse effect on subsequent production.

[0003] There is a patent with application number CN202222036841.0, which discloses a stirring and dissolving device for negative photoresist production, including a supporting assembly, a stirring assembly and a cleaning assembly; the supporting assembly includes a bottom plate, a vertical plate, a bearing plate and a limit plate; the vertical plate is fixed to the bottom plate; the bearing plate and the limit plate are connected to the vertical plate from top to bottom; the stirring assembly includes a stirring drum, a stirring part, a transmission part and a driving part; the stirring drum is rotatably connected to the bottom plate by an axle; a gear ring is fixed to the outer peripheral surface of the stirring drum; the stirring part is arranged inside the stirring drum, the stirring part and the driving part are connected by the transmission part, and one end of the driving part is meshed with the gear ring; the patent sets up a tank inner wall cleaning mechanism, which can clean the inner wall of the stirring drum to remove residues adhering to the inner wall; however, the patent needs to be stopped for cleaning, and cannot be cleaned in real time during the photoresist production process to keep the inner wall of the tank clean. Utility Model Content

[0004] The utility model aims to provide a material stirring and dissolving tank for photoresist which can clean the inner wall of the tank body in real time during the production process.

[0005] Based on the above purpose, the utility model adopts the following technical solutions:

[0006] A photoresist material stirring and dissolving tank comprises a vertically arranged tank body, a material inlet is arranged at the top of the tank body, and a material outlet is arranged at the bottom of the tank body; a stirring shaft is coaxially arranged in the tank body, and a stirring arm is arranged on the stirring shaft; a stirring motor is arranged on the top of the tank body, and the output shaft of the stirring motor is fixedly connected to the stirring shaft; a multiple filter screen structure is arranged in the tank body, and an inner wall cleaning structure is also arranged in the tank body.

[0007] Preferably, the inner wall cleaning structure comprises a spiral inner wall cleaning brush, the central axis of which coincides with the central axis of the tank body; the inner side of the inner wall cleaning brush is fixedly connected to the stirring arm, and the outer edge contacts and cooperates with the inner wall of the tank body.

[0008] Preferably, a material recovery mechanism is provided outside the tank body, and the material recovery mechanism includes a recovery pipe; a recovery input port cooperating with the recovery pipe is provided at the top of the tank body, and a recovery output port cooperating with the recovery pipe is provided at the bottom of the tank body.

[0009] Preferably, a recovery pump is provided on the recovery pipe, and a temperature regulating device is connected to the middle section of the recovery pipe.

[0010] Preferably, the multiple filter screen structure includes multiple horizontally arranged filter screens, and the filter hole diameters of the filter screens decrease from top to bottom; an isolation plate is arranged along the edge of the bottom surface of the lowest filter screen, and the bottom of the isolation plate is fixedly connected to the inner wall of the tank body; the recovery outlet is arranged on the outside of the isolation plate, and the outlet is arranged on the inside of the isolation plate.

[0011] Preferably, a plurality of groups of blades are arranged on the stirring shaft, and the plurality of groups of blades are respectively arranged in cooperation with a plurality of filter screens; the inclination direction of the blades is the same as that of the inner wall cleaning brush.

[0012] The beneficial effects of the utility model are:

[0013] The utility model has a multiple filter screen structure built into the tank body, which can complete the filtering process simultaneously during the stirring and dissolving process, thus saving steps in the photoresist production process, streamlining the number of equipment, and improving production efficiency; at the same time, an inner wall cleaning brush is arranged on the inner side of the tank body, which can clean the residual materials on the inner wall of the tank body in real time during the production process, and recycle this part of the materials through the material recovery mechanism, which can not only realize the real-time cleaning of the inner wall of the tank body to improve production efficiency and maintain product quality, but also can timely recycle the residual materials, thus avoiding the waste of materials and improving economic benefits.

[0014] The utility model uses a spiral inner wall cleaning brush and is driven by being fixedly connected to a stirring arm; the inner side of the inner wall cleaning brush is gap-matched with the edge of the filter screen, and the outer side is in contact with the inner wall of the tank body. When the inner wall cleaning brush starts to rotate under the action of the stirring shaft, the material remaining on the inner wall of the tank body can be brushed off and pushed to the recovery outlet at the bottom, and enter the recovery pipe for recovery; an isolation plate is provided on the bottom edge of the lowest filter screen, which can isolate the outlet from the recovery outlet, so as to prevent photoresist that has not undergone multiple filtrations from being discharged from the outlet and affecting product quality.

[0015] The utility model provides a material recovery mechanism outside the tank body, which receives residual materials brushed off by the inner wall cleaning brush through a recovery pipe connected to the bottom of the tank body, and is driven by a recovery pump. After the temperature is adjusted by a temperature control device, the residual materials are re-introduced into the tank body from a recovery receiving port at the top of the tank body. A pressure valve can also be provided at the recovery outlet to limit the start threshold of the recovery pipe, so as to avoid affecting the efficiency of normal filtering and discharging due to the provision of the recovery pipe. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 It is a schematic diagram of the overall structure of the utility model;

[0017] Figure 2 It is the front view of the utility model;

[0018] Figure 3 This is a schematic diagram of the internal structure of the utility model;

[0019] Figure 4 It is a cutaway front view of the internal structure of the utility model.

[0020] In the figure: tank body 1; feed inlet 11; recycling feed inlet 12; discharge port 13; recycling discharge port 14; multiple filter screen structure 15; isolation plate 16; stirring motor 2; stirring shaft 21; stirring arm 22; paddle 23; inner wall cleaning brush 24; recovery pipe 3; temperature control device 31; recovery pump 32. DETAILED DESCRIPTION

[0021] The following is a further explanation of the present invention in conjunction with specific embodiments. Figure 1 As shown, this embodiment is a photoresist material stirring and dissolving tank, including a vertically arranged tank body 1, and a material recovery mechanism is arranged on the outer side of the tank body 1, mainly including a recovery pipe 3.

[0022] like Figure 2 As shown, a feed inlet 11 is provided at the top of the tank body 1, and a discharge port 13 is provided at the center position of the bottom; materials can be put into the feed inlet 11, and the materials are discharged from the discharge port 13 after stirring, dissolving and filtering inside the tank body 1; a recycling feed inlet 12 is also provided at the top of the tank body 1, and a recycling discharge port 14 is also provided at the bottom, which are respectively connected to the two ends of the recovery pipe 3, and are used to recover the residual materials brushed off by the inner wall cleaning structure in the tank body 1.

[0023] The internal structure of the tank 1 is as follows: Figure 3 and Figure 4As shown, it includes a stirring shaft 21 coaxially arranged with the tank body 1; the top of the stirring shaft 21 is connected to the stirring motor 2, and the stirring motor 2 can drive the stirring shaft 21 to rotate around the axis; a plurality of horizontally arranged stirring arms 22 and paddles 23 are evenly distributed on the stirring shaft 21, and can rotate around the axis together with the rotation of the stirring shaft 21; a plurality of filter screens are equidistantly arranged in the tank body 1, forming a multiple filter screen structure 15; the filter screens of the multiple filter screen structure 15 have apertures that decrease from top to bottom, and the aperture of the bottom filter screen meets the production specification requirements of the photoresist; the paddles 23 are arranged in conjunction with the filter screens, and at least one group of paddles 23 is arranged above each filter screen to provide power for the material to pass through the filter screen.

[0024] There is a gap between the filter screen and the tank body 1, and an inner wall cleaning brush 24 is arranged in the gap; the inner wall cleaning brush 24 is a spiral structure, and its outer edge contacts and cooperates with the inner wall of the tank body 1, and the inner side is fixedly connected to the stirring arm 22; the inner wall cleaning brush 24 can rotate together with the stirring arm 22, and because the inner wall cleaning brush 24 is a spiral structure, when it rotates around the central axis, it can brush the residual material on the inner wall of the tank body 1 downward; the inclination direction of the inner wall cleaning brush 24 is the same as that of the paddle 23, so that when the two rotate with the stirring shaft 21 at the same time, they push the material in the same direction; Figure 3 As shown in FIG. 2 , when the stirring shaft 21 rotates counterclockwise, the paddles 23 and the inner wall cleaning brush 24 can both push the material to move downward.

[0025] like Figure 4 As shown, an isolation plate 16 is arranged on the bottom surface of the bottom filter screen. The isolation plate 16 is an annular baffle structure arranged along the edge of the filter screen, and its bottom end is connected to the inner wall of the tank body 1, so that the space between the discharge port 13 and the recovery discharge port 14 is isolated, which can prevent the material that has not been filtered by the bottom filter screen from entering the discharge port 13; the material brushed off by the inner wall cleaning brush 24 can enter the recovery pipe 3 from the recovery discharge port 14, and the recovery pipe 3 is provided with a recovery pump 32, which can provide power for the material in the recovery pipe, so that it can return to the tank body 1 upward from the recovery feed port 12; the recovery pump 32 can be a colloid pump or other pump suitable for high-viscosity liquid materials; a temperature control device 31 is also arranged in the middle section of the recovery pipe 3, and the temperature control device 31 is used to adjust the recovered material to a suitable temperature, such as heating to reduce the viscosity; the suitable temperature can be set according to the type and performance of the material.

[0026] The present embodiment can be used for the stirring and dissolving step in the production of photoresist, or the stirring and dissolving step of recycling photoresist, etc.; the feed port 11 is connected to the upper-level processing equipment, and the material to be stirred and dissolved is added from the upper-level processing equipment, or the material is directly poured into the tank body 1 from the feed port 11; at the same time, the stirring motor 2 is turned on, the stirring shaft 21 rotates counterclockwise, and the stirring arm 22 rotates accordingly to stir and mix the various materials; at this time, under the action of the paddle 23, the material will be pushed downward, and pass through the multiple filter screens 15 layer by layer for multiple filtration, and the qualified material after being filtered by the bottom filter screen can be discharged from the discharge port 13; in this process, the material remaining on the inner wall of the tank body 1 will also be scraped off by the inner wall cleaning brush 24 and pushed downward, and after falling to the bottom of the tank body 1, it can enter the recovery pipe 3 from the recovery discharge port 14; it moves upward under the action of the recovery pump 32, and after being adjusted to a suitable temperature by the temperature control device 31, it is thrown back into the tank body 1 through the recovery feed port 12.

[0027] The above description is only a further explanation of the present invention in combination with specific embodiments. All descriptions do not limit the protection scope of the present invention. Any changes or replacement solutions that can be easily thought of by technicians in this field within the technical scope disclosed by the present invention should be included in the protection scope of the present invention. Therefore, the protection scope of the present invention should be based on the protection scope of the claims.

Claims

1. A photoresist material stirring and dissolving tank, comprising a vertically arranged tank body, characterized in that: A feed inlet is provided at the top of the tank body, and a feed outlet is provided at the bottom of the tank body; a stirring shaft is coaxially provided in the tank body, and a stirring arm is provided on the stirring shaft; a stirring motor is provided at the top of the tank body, and the output shaft of the stirring motor is fixedly connected to the stirring shaft; a multiple filter screen structure is provided in the tank body, and an inner wall cleaning structure is also provided in the tank body; the inner wall cleaning structure includes a spiral inner wall cleaning brush, and the central axis of the inner wall cleaning brush coincides with the central axis of the tank body; the inner side of the inner wall cleaning brush is fixedly connected to the stirring arm, and the outer edge contacts and cooperates with the inner wall of the tank body; a material recovery mechanism is provided outside the tank body, and the material recovery mechanism includes a recovery pipe; a recovery feed inlet cooperating with the recovery pipe is provided at the top of the tank body, and a recovery discharge port cooperating with the recovery pipe is provided at the bottom of the tank body; a recovery pump is provided on the recovery pipe, and a temperature control device is connected to the middle section of the recovery pipe.

2. The material stirring and dissolving tank for photoresist according to claim 1, characterized in that: The multiple filter screen structure includes multiple horizontally arranged filter screens, and the filter hole diameters of the filter screens decrease from top to bottom; an isolation plate is arranged along the edge of the bottom surface of the lowest filter screen, and the bottom of the isolation plate is fixedly connected to the inner wall of the tank body; the recovery outlet is arranged on the outside of the isolation plate, and the outlet is arranged on the inside of the isolation plate.

3. The material stirring and dissolving tank for photoresist according to claim 2, characterized in that: The stirring shaft is provided with a plurality of groups of blades, and the plurality of groups of blades are respectively arranged in cooperation with a plurality of filter screens; the inclination direction of the blades is the same as that of the inner wall cleaning brush.

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