Inert gas recovery system for semiconductor single crystal slicing workshop

Abstract

The utility model provides an inert gas recovery system for a semiconductor single crystal slicing workshop, which is characterized in that a tail gas output device comprises single crystal furnaces, a main pump set, an auxiliary pump set, a three-way valve and an electric adjusting pump, and the main pump set and the auxiliary pump set are sequentially arranged at the output ends of the single crystal furnaces; electric adjusting pumps are arranged among the output ends of the single crystal furnaces, the main pump set and the auxiliary pump set, a three-way valve is arranged at the output end of the main pump set, one output end of the three-way valve is connected with the input end of an exhaust unit through a first exhaust pipe, and the output end of the exhaust unit is connected with an exhaust chimney through a second exhaust pipe; the other end of the three-way valve is connected with the input end of the oxygen analysis module through a first recovery pipe, the output end of the oxygen analysis module is connected with the argon recovery station through a second recovery pipe, and the output end of the auxiliary pump set is connected with the first recovery pipe through a third recovery pipe. And full argon is not needed, the production cost is reduced, and the structure is simple.

Description

Technical Field

[0001] The utility model relates to the technical field of industrial tail gas, and more specifically, to an inert gas recovery system for a semiconductor single crystal slicing workshop. Background Art

[0002] The single crystal furnace is an important equipment in the single crystal silicon pulling process in the photovoltaic industry. In an inert gas (nitrogen or argon) environment, a graphite heater is used to melt polycrystalline materials such as polysilicon, and a dislocation-free single crystal is grown using the direct pulling method.

[0003] The inert gas recovery device in the prior art that is closest to the present application is the announcement number: CN207276777U, a single crystal furnace venting argon tail gas full recovery device, including a main vacuum pump, a secondary vacuum pump, a high-content recovery device, a low-content recovery device, a first oxygen content analyzer, a second oxygen content analyzer, a first control valve, a second control valve and a third control valve, the inlet of the secondary vacuum pump is connected to the single crystal furnace, and the outlet is connected to the first control valve, the first control valve is connected to the high-content recovery device, the inlet of the main vacuum pump is connected to the single crystal furnace, and the outlet is connected to the second control valve, the second control valve is connected to the low-content recovery device, the third control valve is connected to the outlet of the secondary vacuum pump and the low-content recovery device, the first oxygen content analyzer is arranged between the secondary vacuum pump and the first control valve, and the second oxygen content analyzer is arranged between the main vacuum pump and the second control valve.

[0004] The recovery device can only recover argon, so that the single crystal furnace can only use argon for production, which greatly increases the production cost. The recovery device has a low degree of compatibility with the inert gas, and the recovery process is complicated, which cannot meet the requirements of efficient recovery.

[0005] In view of this, the utility model proposes an inert gas recovery system for a semiconductor single crystal slicing workshop, which is flexible in switching and convenient in recovery. Utility Model Content

[0006] The purpose of the utility model is to provide an inert gas recovery system for a semiconductor single crystal slicing workshop which is flexible in switching and convenient in recovery.

[0007] An inert gas recovery system for a semiconductor single crystal slicing workshop, comprising a tail gas output device 1, an oxygen analysis module 2, an exhaust fan unit 3, an argon recovery station, an exhaust chimney 4, and a control console, characterized in that: the tail gas output device 1 has multiple groups, one output end of each group of tail gas output devices 1 is connected to the argon recovery station through the oxygen analysis module 2, and the other output end of each group of tail gas output devices 1 is connected to the exhaust chimney 4 through the exhaust fan unit 3, the tail gas output device 1 comprises a single crystal furnace 5, a main pump group 6, an auxiliary pump group 7, a three-way valve 8, and an electric regulating pump 9, the main pump group 6 and the auxiliary pump group 7 are arranged at the output ends of the multiple single crystal furnaces 5 in sequence, and the output ends of the multiple single crystal furnaces 5 are connected to the argon recovery station through the oxygen analysis module 2, and the output ends of the multiple single crystal furnaces 5 are connected to the exhaust chimney 4 through the exhaust fan unit 3. An electric regulating pump 9 is provided between the output end and the main pump group 6 and the auxiliary pump group 7. A three-way valve 8 is provided at the output end of the main pump group 6. One output end of the three-way valve 8 is connected to the input end of the exhaust fan group 3 through the first exhaust pipe 10, and the output end of the exhaust fan group 3 is connected to the exhaust chimney 4 through the second exhaust pipe 11. The other end of the three-way valve 8 is connected to the input end of the oxygen analysis module 2 through the first recovery pipe 12, and the output end of the oxygen analysis module 2 is connected to the argon recovery station through the second recovery pipe 13. The output end of the auxiliary pump group 7 is connected to the first recovery pipe 12 through the third recovery pipe 14, and the control console is electrically connected to the single crystal furnace 5, the electric regulating pump 9, the three-way valve 8, and the oxygen analysis module 2.

[0008] Furthermore, the oxygen analysis module 2 includes an oxygen analyzer 21 and a cut-off valve 22. The other end of the three-way valve 8 is connected to the input end of the oxygen analyzer 21 through the first recovery pipe 12, and the output end of the oxygen analyzer 21 is connected to the second recovery pipe 13 through the fourth recovery pipe 15. A cut-off valve 22 is provided on the fourth recovery pipe 15 between the output end of the oxygen analyzer 21 and the second recovery pipe 13. The oxygen analyzer 21 is used to monitor the oxygen content of the input end gas, and the cut-off valve 22 is used to control the shutdown of the fourth recovery pipe 15.

[0009] Furthermore, a third exhaust duct 16 is provided between the oxygen analyzer 21 and the shut-off valve 22, one end of the third exhaust duct 16 is connected between the oxygen analyzer 21 and the shut-off valve 22, and the other end of the third exhaust duct 16 is connected to the first exhaust duct 10, and an exhaust valve 23 is provided at the end of the third exhaust duct 16 close to the oxygen analyzer 21 and the shut-off valve 22.

[0010] Furthermore, a first pressure sensor 24 is provided between the first recovery pipe 12 and the input end of the oxygen analysis module 2 for monitoring the gas pipeline pressure at the output end of the oxygen analysis module 2 .

[0011] Furthermore, the exhaust fan unit 3 is a variable frequency fan unit, and there are at least two variable frequency fan units, one of which is a common unit and the other is a standby unit.

[0012] Furthermore, a wind speed sensor 17, a first regulating valve 18, and a second pressure sensor 19 are provided in sequence on the first exhaust duct 10 near the input end of the exhaust fan unit 3. The wind speed sensor 17 is used to monitor the wind speed at the input end of the exhaust fan unit 3, the first regulating valve 18 is used to adjust the wind speed at the input end of the exhaust fan unit 3, and the second pressure sensor 19 is used to monitor the pipeline pressure at the input end of the exhaust fan unit 3.

[0013] Furthermore, the exhaust unit 3 includes a variable frequency fan 31, the first exhaust duct 10 is connected to the input end of the variable frequency fan 31, a first check valve 32 and a second regulating valve 33 are respectively provided between the first exhaust duct 10 and the input end of the variable frequency fan 31, the output end of the variable frequency fan 31 is connected to the exhaust chimney 4 through the second exhaust duct 11, and a second check valve 34 is provided near the output end of the variable frequency fan 31.

[0014] Furthermore, the smoke exhaust chimney 4 is at least twenty-five meters higher than the exhaust fan unit 3 to ensure exhaust safety.

[0015] Furthermore, the wind speed sensor 17, the second pressure sensor 19, and the first pressure sensor 24 are all electrically connected to the console.

[0016] The working principle of the utility model is as follows: the tail gas discharged by the main pump is an inert gas used for switching between nitrogen and argon. The frequency of switching between nitrogen and argon is set according to production demand. The tail gas discharged by the auxiliary pump is argon. When the production demand is small, only the auxiliary pump can be used. When the production demand is high, both the main pump and the auxiliary pump are used.

[0017] The auxiliary pump is argon gas, which is connected to the first recovery pipe 12 through the third recovery pipe 14 and then output to the argon recovery station through the oxygen analysis module 2.

[0018] When the main pump is switched to nitrogen, the three-way valve closes the end of the first recovery pipe 12 and opens the first exhaust pipe 10 to output the nitrogen gas from the exhaust unit 3 to the chimney 4 through the first exhaust pipe 10.

[0019] When the main pump switches to argon, the three-way valve closes the first exhaust pipe 10 and opens the first recovery pipe 12, and outputs the nitrogen gas from the oxygen analysis module 2 to the argon recovery station through the first recovery pipe 120. The oxygen analysis module 2 detects that the oxygen content of the argon is too high, and the shut-off valve 22 cuts off the fourth recovery pipe 15, and the exhaust valve 23 opens the third exhaust pipe 16, and outputs the argon with too high oxygen content from the exhaust unit 3 to the chimney 4.

[0020] Beneficial effects of the utility model: The utility model proposes an inert gas recovery system for a semiconductor single crystal slicing workshop, wherein the tail gas output device 1 comprises a single crystal furnace 5, a main pump group 6, an auxiliary pump group 7, a three-way valve 8, and an electric regulating pump 9. The output ends of the plurality of single crystal furnaces 5 are sequentially provided with a main pump group 6 and an auxiliary pump group 7, and an electric regulating pump 9 is provided between the output ends of the plurality of single crystal furnaces 5 and the main pump group 6 and the auxiliary pump group 7. The output ends of the main pump group 6 are all provided with a three-way valve 8, and one output end of the three-way valve 8 is connected to the first exhaust pipe. 10 is connected to the input end of the exhaust fan unit 3, the output end of the exhaust fan unit 3 is connected to the exhaust chimney 4 through the second exhaust pipe 11, the other end of the three-way valve 8 is connected to the input end of the oxygen analysis module 2 through the first recovery pipe 12, the output end of the oxygen analysis module 2 is connected to the argon recovery station through the second recovery pipe 13, and the output end of the auxiliary pump group 7 is connected to the first recovery pipe 12 through the third recovery pipe 14. Nitrogen or argon can be used according to production needs. The matching degree of the recovered tail gas is high, there is no need to use all argon, the production cost is reduced, and the structure is simple. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 This is a schematic structural diagram of an inert gas recovery system for a semiconductor single crystal slicing workshop according to the present application.

[0022] Main component symbols

[0023]

[0024]

[0025] The following specific implementation manner will further illustrate the present utility model in conjunction with the above-mentioned drawings. DETAILED DESCRIPTION

[0026] The following examples are described to assist the understanding of the present application, and the examples are not and should not be interpreted in any way as limiting the scope of protection of the present application.

[0027] In the following description, those skilled in the art will recognize that throughout this discussion, components may be described as separate functional units (which may include sub-units), but those skilled in the art will recognize that various components or portions thereof may be divided into separate components or may be integrated together (including within a single system or component).

[0028] At the same time, the connections between components or systems are not intended to be limited to direct connections, rather, the data between these components may be modified, reformatted, or otherwise changed by intermediate components. In addition, additional or fewer connections may be used. It should also be noted that the terms "coupled," "connected," or "input" should be understood to include direct connections, indirect connections through one or more intermediate devices, and wireless connections.

[0029] Embodiment 1:

[0030] like Figure 1 Shown is a schematic structural diagram of an inert gas recovery system for a semiconductor single crystal slicing workshop according to the present application.

[0031] An inert gas recovery system for a semiconductor single crystal slicing workshop, comprising a tail gas output device 1, an oxygen analysis module 2, an exhaust fan unit 3, an argon recovery station, an exhaust chimney 4, and a control console, characterized in that: the tail gas output device 1 has multiple groups, one output end of each group of tail gas output devices 1 is connected to the argon recovery station through the oxygen analysis module 2, and the other output end of each group of tail gas output devices 1 is connected to the exhaust chimney 4 through the exhaust fan unit 3, the tail gas output device 1 comprises a single crystal furnace 5, a main pump group 6, an auxiliary pump group 7, a three-way valve 8, and an electric regulating pump 9, the main pump group 6 and the auxiliary pump group 7 are arranged at the output ends of the multiple single crystal furnaces 5 in sequence, and the output ends of the multiple single crystal furnaces 5 are connected to the argon recovery station through the oxygen analysis module 2, and the output ends of the multiple single crystal furnaces 5 are connected to the exhaust chimney 4 through the exhaust fan unit 3. An electric regulating pump 9 is provided between the output end and the main pump group 6 and the auxiliary pump group 7. A three-way valve 8 is provided at the output end of the main pump group 6. One output end of the three-way valve 8 is connected to the input end of the exhaust fan group 3 through the first exhaust pipe 10, and the output end of the exhaust fan group 3 is connected to the exhaust chimney 4 through the second exhaust pipe 11. The other end of the three-way valve 8 is connected to the input end of the oxygen analysis module 2 through the first recovery pipe 12, and the output end of the oxygen analysis module 2 is connected to the argon recovery station through the second recovery pipe 13. The output end of the auxiliary pump group 7 is connected to the first recovery pipe 12 through the third recovery pipe 14, and the control console is electrically connected to the single crystal furnace 5, the electric regulating pump 9, the three-way valve 8, and the oxygen analysis module 2.

[0032] The oxygen analysis module 2 includes an oxygen analyzer 21 and a cut-off valve 22. The other end of the three-way valve 8 is connected to the input end of the oxygen analyzer 21 through the first recovery pipe 12. The output end of the oxygen analyzer 21 is connected to the second recovery pipe 13 through the fourth recovery pipe 15. A cut-off valve 22 is provided on the fourth recovery pipe 15 between the output end of the oxygen analyzer 21 and the second recovery pipe 13. The oxygen analyzer 21 is used to monitor the oxygen content of the input end gas, and the cut-off valve 22 is used to control the shutdown of the fourth recovery pipe 15.

[0033] A third exhaust duct 16 is also provided between the oxygen analyzer 21 and the shut-off valve 22. One end of the third exhaust duct 16 is connected between the oxygen analyzer 21 and the shut-off valve 22, and the other end of the third exhaust duct 16 is connected to the first exhaust duct 10. An exhaust valve 23 is provided at the end of the third exhaust duct 16 close to the oxygen analyzer 21 and the shut-off valve 22.

[0034] A first pressure sensor 24 is also provided between the first recovery pipe 12 and the input end of the oxygen analysis module 2 , for monitoring the gas pipeline pressure at the output end of the oxygen analysis module 2 .

[0035] The exhaust fan unit 3 is a variable frequency fan unit, and there are at least two variable frequency fan units, one of which is a common unit and the other is a standby unit.

[0036] A wind speed sensor 17, a first regulating valve 18, and a second pressure sensor 19 are provided in sequence on the first exhaust duct 10 near the input end of the exhaust fan unit 3. The wind speed sensor 17 is used to monitor the wind speed at the input end of the exhaust fan unit 3, the first regulating valve 18 is used to adjust the wind speed at the input end of the exhaust fan unit 3, and the second pressure sensor 19 is used to monitor the pipeline pressure at the input end of the exhaust fan unit 3.

[0037] The exhaust unit 3 includes a variable frequency fan 31, the first exhaust duct 10 is connected to the input end of the variable frequency fan 31, a first check valve 32 and a second regulating valve 33 are provided between the first exhaust duct 10 and the input end of the variable frequency fan 31 in sequence, the output end of the variable frequency fan 31 is connected to the exhaust chimney 4 through the second exhaust duct 11, and a second check valve 34 is provided near the output end of the variable frequency fan 31 on the second exhaust duct 11.

[0038] The smoke exhaust chimney 4 is at least 25 meters higher than the exhaust fan unit 3 to ensure exhaust safety.

[0039] The wind speed sensor 17 , the second pressure sensor 19 , and the first pressure sensor 24 are all electrically connected to the control console.

[0040] The working principle of the utility model is as follows: the tail gas discharged by the main pump is an inert gas used for switching between nitrogen and argon. The frequency of switching between nitrogen and argon is set according to production demand. The tail gas discharged by the auxiliary pump is argon. When the production demand is small, only the auxiliary pump can be used. When the production demand is high, both the main pump and the auxiliary pump are used.

[0041] The auxiliary pump is argon gas, which is connected to the first recovery pipe 12 through the third recovery pipe 14 and then output to the argon recovery station through the oxygen analysis module 2.

[0042] When the main pump is switched to nitrogen, the three-way valve closes the end of the first recovery pipe 12 and opens the first exhaust pipe 10 to output the nitrogen gas from the exhaust unit 3 to the chimney 4 through the first exhaust pipe 10.

[0043] When the main pump switches to argon, the three-way valve closes the first exhaust pipe 10 and opens the first recovery pipe 12, and outputs the nitrogen gas from the oxygen analysis module 2 to the argon recovery station through the first recovery pipe 120. The oxygen analysis module 2 detects that the oxygen content of the argon is too high, and the shut-off valve 22 cuts off the fourth recovery pipe 15, and the exhaust valve 23 opens the third exhaust pipe 16, and outputs the argon with too high oxygen content from the exhaust unit 3 to the chimney 4.

[0044] Beneficial effects of the utility model: The utility model proposes an inert gas recovery system for a semiconductor single crystal slicing workshop, wherein the tail gas output device 1 comprises a single crystal furnace 5, a main pump group 6, an auxiliary pump group 7, a three-way valve 8, and an electric regulating pump 9. The output ends of the plurality of single crystal furnaces 5 are sequentially provided with a main pump group 6 and an auxiliary pump group 7, and an electric regulating pump 9 is provided between the output ends of the plurality of single crystal furnaces 5 and the main pump group 6 and the auxiliary pump group 7. The output ends of the main pump group 6 are all provided with a three-way valve 8, and one output end of the three-way valve 8 is connected to the first exhaust pipe. 10 is connected to the input end of the exhaust fan unit 3, the output end of the exhaust fan unit 3 is connected to the exhaust chimney 4 through the second exhaust pipe 11, the other end of the three-way valve 8 is connected to the input end of the oxygen analysis module 2 through the first recovery pipe 12, the output end of the oxygen analysis module 2 is connected to the argon recovery station through the second recovery pipe 13, and the output end of the auxiliary pump group 7 is connected to the first recovery pipe 12 through the third recovery pipe 14. Nitrogen or argon can be used according to production needs. The matching degree of the recovered tail gas is high, there is no need to use all argon, the production cost is reduced, and the structure is simple.

[0045] Although the present application has disclosed multiple aspects and embodiments, other aspects and embodiments will be obvious to those skilled in the art, and several modifications and improvements may be made without departing from the concept of the present application, all of which belong to the protection scope of the present application. The multiple aspects and embodiments disclosed in the present application are only for illustration and are not intended to limit the present application. The actual protection scope of the present application shall be subject to the claims.

Claims

1. An inert gas recovery system for a semiconductor single crystal slicing workshop, comprising an exhaust gas output device (1), an oxygen analysis module (2), an exhaust fan unit (3), an argon gas recovery station, an exhaust chimney (4), and a control console, characterized in that: The tail gas output device (1) comprises a plurality of groups, one output end of each group of tail gas output devices (1) is connected to an argon recovery station via an oxygen analysis module (2), and the other output end of each group of tail gas output devices (1) is connected to an exhaust chimney (4) via an exhaust fan unit (3). The tail gas output device (1) comprises a single crystal furnace (5), a main pump unit (6), an auxiliary pump unit (7), a three-way valve (8), and an electric regulating pump (9). The main pump unit (6) and the auxiliary pump unit (7) are arranged at the output ends of the plurality of single crystal furnaces (5) in sequence. An electric regulating pump (9) is arranged between the output ends of the plurality of single crystal furnaces (5) and the main pump unit (6) and the auxiliary pump unit (7). The output end of the main pump unit (6) A three-way valve (8) is provided at each location, one output end of the three-way valve (8) is connected to the input end of the exhaust fan unit (3) through a first exhaust pipe (10), the output end of the exhaust fan unit (3) is connected to the exhaust chimney (4) through a second exhaust pipe (11), the other end of the three-way valve (8) is connected to the input end of the oxygen analysis module (2) through a first recovery pipe (12), the output end of the oxygen analysis module (2) is connected to the argon recovery station through a second recovery pipe (13), the output end of the auxiliary pump unit (7) is connected to the first recovery pipe (12) through a third recovery pipe (14), and the control console is electrically connected to the single crystal furnace (5), the electric regulating pump (9), the three-way valve (8), and the oxygen analysis module (2).

2. The inert gas recovery system for a semiconductor single crystal slicing workshop according to claim 1, characterized in that: The oxygen analysis module (2) comprises an oxygen analyzer (21) and a cut-off valve (22); the other end of the three-way valve (8) is connected to the input end of the oxygen analyzer (21) via a first recovery pipe (12); the output end of the oxygen analyzer (21) is connected to the second recovery pipe (13) via a fourth recovery pipe (15); a cut-off valve (22) is provided on the fourth recovery pipe (15) between the output end of the oxygen analyzer (21) and the second recovery pipe (13); the oxygen analyzer (21) is used to monitor the oxygen content of the gas at the input end; and the cut-off valve (22) is used to control the shutoff of the fourth recovery pipe (15).

3. The inert gas recovery system for a semiconductor single crystal slicing workshop according to claim 2, characterized in that: A third exhaust pipe (16) is also provided between the oxygen analyzer (21) and the shut-off valve (22); one end of the third exhaust pipe (16) is connected between the oxygen analyzer (21) and the shut-off valve (22); the other end of the third exhaust pipe (16) is connected to the first exhaust pipe (10); and an exhaust valve (23) is provided at the end of the third exhaust pipe (16) close to the oxygen analyzer (21) and the shut-off valve (22).

4. The inert gas recovery system for a semiconductor single crystal slicing workshop according to claim 1, characterized in that: A first pressure sensor (24) is also provided at the first recovery pipe (12) and the input end of the oxygen analysis module (2) for monitoring the gas pipeline pressure at the output end of the oxygen analysis module (2).

5. The inert gas recovery system for a semiconductor single crystal slicing workshop according to claim 1, characterized in that: The exhaust fan unit (3) is a variable frequency fan unit, and there are at least two variable frequency fan units, one of which is a common unit and the other is a standby unit.

6. The inert gas recovery system for a semiconductor single crystal slicing workshop according to claim 1, characterized in that: A wind speed sensor (17), a first regulating valve (18), and a second pressure sensor (19) are also provided in sequence on the first exhaust pipe (10) near the input end of the exhaust fan unit (3); the wind speed sensor (17) is used to monitor the wind speed at the input end of the exhaust fan unit (3); the first regulating valve (18) is used to adjust the wind speed at the input end of the exhaust fan unit (3); and the second pressure sensor (19) is used to monitor the pipe pressure at the input end of the exhaust fan unit (3).

7. The inert gas recovery system for a semiconductor single crystal slicing workshop according to claim 1, characterized in that: The exhaust fan unit (3) comprises a variable frequency fan (31); the first exhaust duct (10) is connected to the input end of the variable frequency fan (31); a first check valve (32) and a second regulating valve (33) are provided in sequence between the first exhaust duct (10) and the input end of the variable frequency fan (31); the output end of the variable frequency fan (31) is connected to the exhaust chimney (4) via the second exhaust duct (11); and a second check valve (34) is provided near the output end of the variable frequency fan (31) on the second exhaust duct (11).

8. The inert gas recovery system for a semiconductor single crystal slicing workshop according to claim 1, characterized in that: The smoke exhaust chimney (4) is at least twenty-five meters higher than the exhaust fan unit (3).

9. The inert gas recovery system for a semiconductor single crystal slicing workshop according to claim 6, characterized in that: The wind speed sensor (17), the second pressure sensor (19), and the first pressure sensor (24) are all electrically connected to the control console.

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