Common metal mask plate with decomposable net stretching stress
By designing a decomposition structure of the tension mesh stress at the edge of the mask plate, the problem of uneven stress distribution in the OLED high-resolution process of traditional mask plate is solved, and a more stable and accurate process effect is achieved.
Patent Information
- Application Number
- CN202421611962.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-07-09
- Publication Date
- 2025-05-16
- Estimated Expiration
- 2034-07-09
AI Technical Summary
The traditional mask edge design is susceptible to interference from the web effect in the high-resolution process of OLED, resulting in uneven stress distribution in the edge area, affecting the stability and consistency of the pattern.
A common metal mask plate with decomposition of tension mesh stress is designed. By clamping the cavity between the clamping positions and setting up an upper clamping area and a lower clamping area in the edge area, an edge curve pattern is formed to reduce stress concentration and decompose stress through the buffer groove.
It effectively reduces the weight and stress concentration of the mask plate, improves the stability of the edge area and process accuracy, and meets the needs of OLED high-precision process.
Smart Images
Figure CN222878052U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to a mask plate, in particular to a common metal mask plate with decomposable tension stress. Background Art
[0002] In the field of OLED (Organic Light-Emitting Diode) display technology, mask edge design is crucial to ensuring process stability and pattern accuracy.
[0003] Traditional mask edge design in OLED high-resolution process is often affected by the following technical challenges:
[0004] 1. Tensioning effect: Traditional edge design is easily disturbed by the tensioning effect, resulting in uneven stress distribution in the edge area, which may cause deformation and inconsistency of the pattern.
[0005] 2. Limitations of traditional edge design: Traditional edge design methods are usually limited to simple shapes and structures, which are difficult to meet the needs of modern high-precision processes. This limits the performance of the edge area and may affect the quality and cost of the entire process.
[0006] 3. Limitations of existing improvement methods: Previous technologies have attempted to improve the stability and consistency of the edge area through different edge design strategies. However, these methods may not be sufficient to address complex process challenges such as the stretching effect, small cell size, and high-resolution process.
[0007] Therefore, an innovative method is urgently needed to improve the edge design of the mask, thereby increasing the stability of the edge area while meeting the requirements of the high-precision OLED process.
[0008] The above background technology is for facilitating the understanding of the present invention and is not a known technology disclosed to the general public before the application of the present invention. Utility Model Content
[0009] In view of the above-mentioned defects, the utility model provides a common metal mask plate with decomposable stress during mesh stretching, and the stress can be decomposed when the mesh is stretched.
[0010] The technical solution is: a common metal mask with decomposable tension stress, including a substrate, the substrate including an AA area and an edge area located outside the AA area and surrounding the AA area, the edge area including a left edge area, a right edge area, an upper edge area and a lower edge area, the edge portion of the upper edge area is an upper clamping area, the edge portion of the lower edge area is a lower clamping area, the upper clamping area and the lower clamping area each include a plurality of clamping positions, a cavity is clamped between two adjacent clamping positions, the cavity extends toward the AA area, the extension range is basically a hemispherical cavity, the edge line of the clamping position is connected with the edge line of the hemispherical cavity to form an edge curve pattern, and a first strip buffer area is respectively provided between the upper clamping area and the AA area and between the lower clamping area and the AA area.
[0011] Furthermore, the substrate material is Invar.
[0012] Furthermore, the substrate has a thickness of 100-200 μm.
[0013] Furthermore, the upper clamping zone has 4 clamping positions, and the lower clamping zone has 4 clamping positions.
[0014] Furthermore, the width of the clamping position is smaller than the maximum clamping width of the clamp.
[0015] Furthermore, an anti-slip strip is provided on the clamping position. BRIEF DESCRIPTION OF THE DRAWINGS
[0016] Figure 1 This is a schematic diagram of the structure of a common metal mask in the background technology of the utility model;
[0017] Figure 2 yes Figure 1 Schematic diagram of the net-stretching process;
[0018] Figure 3 This is a schematic diagram of a common metal mask structure of the utility model;
[0019] Figure 4 yes Figure 3 Schematic diagram of the net-stretching process;
[0020] Figure 5 This is another schematic diagram of the structure of a common metal mask of the utility model;
[0021] Figure 6 yes Figure 5 Schematic diagram of the net-stretching process;
[0022] Figure 7 This is another schematic diagram of the structure of a common metal mask of the utility model;
[0023] Figure 8 yes Figure 7 Schematic diagram of the net-stretching process;
[0024] Fig. 9 This is another schematic diagram of the structure of a common metal mask of the utility model;
[0025] Fig.10 yes Fig. 9 Schematic diagram of the net-stretching process;
[0026] In the figure: 1, substrate, 2, AA area, 3, left edge area, 4, right edge area, 5, upper edge area, 6, lower edge area, 7, upper clamping area, 8, lower clamping area, 9, clamp, 10, clamping position, 11, cavity, 12, hemispherical cavity, 13, buffer groove, 14, first strip buffer area, 15, second strip buffer area, 16, anti-slip strip. DETAILED DESCRIPTION
[0027] The utility model will be further described below in conjunction with the accompanying drawings.
[0028] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected" and "connected" should be understood in a broad sense, for example, it can be a fixed connection, or it can be an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.
[0029] In the description of the present invention, it should be understood that the terms "upper", "lower", "front", "back", "vertical", "horizontal", "top", "bottom", "inside", "outside" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific position, be constructed and operated in a specific position, and therefore cannot be understood as a limitation on the present invention. In the description of the present invention, "multiple" means two or more, unless otherwise precisely and specifically specified.
[0030] The terms "first", "second", "third", "fourth", etc. (if any) in the specification and claims of the present application and the above-mentioned drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequence. It should be understood that the data used in this way can be interchangeable where appropriate, so that the embodiments of the present application described herein can be implemented in an order other than those illustrated or described herein, for example. In addition, the terms "including" and "having" and any of their variations are intended to cover non-exclusive inclusions, for example, a process, method, system, product or device comprising a series of steps or units is not necessarily limited to those steps or units clearly listed, but may include other steps or units that are not clearly listed or inherent to these processes, methods, products or devices.
[0031] In order to make the purpose, technical solution and advantages of the embodiments of the present application clearer, the technical solution in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.
[0032] The following specific embodiments are used to describe the technical solution of the utility model in detail. The following specific embodiments can be combined with each other, and the same or similar concepts or processes may not be described in detail in some embodiments.
[0033] Please refer to Figure 1 , Figure 1 It is a schematic diagram of the existing CMM (common metal mask) structure. Figure 1 In the figure, the substrate 1 consists of an AA area 2 and an edge area located outside the AA area 2 and surrounding the AA area 2. The edge area includes a left edge area 3, a right edge area 4, an upper edge area 5 and a lower edge area 6. The edge portion of the upper edge area 5 is an upper clamping area 7, and the edge portion of the lower edge area 6 is a lower clamping area 8.
[0034] Please refer to Figure 2 , Figure 2 for Figure 1 Schematic diagram of the net stretching process. Figure 1 When the ordinary metal mask is stretched, the clamp 2 of the clamping tool (Gripper) clamps the upper clamping area 7 and the lower clamping area 8 at the same time, and Figure 2 Spread the net in the direction of the arrow.
[0035] Figure 1 Ordinary metal masks are heavy and have concentrated stress, which leads to instability in the edge area.
[0036] Please refer to Figure 3-Figure 4 , Figure 3 This is a schematic diagram of the structure of a common metal mask of the utility model. Figure 4 for Figure 3 Schematic diagram of the net-stretching process.
[0037] A common metal mask comprises a substrate 1, wherein the substrate 1 comprises an AA region 2 and an edge region located outside the AA region 2 and surrounding the AA region 2, wherein the edge region comprises a left edge region 3, a right edge region 4, an upper edge region 5 and a lower edge region 6, wherein the edge portion of the upper edge region 5 is an upper clamping region 7, and the edge portion of the lower edge region 6 is a lower clamping region 8, wherein the upper clamping region 7 and the lower clamping region 8 each comprise a plurality of clamping positions 10, and a cavity 11 is clamped between two adjacent clamping positions 10.
[0038] By clamping a cavity 11 between two adjacent clamping positions 10, the edge of the ordinary metal mask is divided into several sections, which reduces the weight of the ordinary metal mask, helps to more evenly transmit the tensioning force to the cell, reduces stress concentration, and under the action of the tensioning force of the same size and position, the cell moves more, which means that less force can be used to achieve the same tensioning effect, thereby improving the efficiency and accuracy of the operation.
[0039] Furthermore, the width of the clamping position 10 is smaller than the maximum clamping width of the clamp 9 .
[0040] By designing the width of the clamping position 10 to be smaller than the maximum clamping width of the clamp 9, the weight of the ordinary metal mask is further reduced, and the overall burden of the entire mask is more effectively reduced. The width of the clamping position 10 is smaller than the maximum clamping width of the clamp 9, which is more conducive to more evenly transmitting the tensioning force to the cell, reducing stress concentration, and increasing the cell movement. Less force can be used to achieve the same tensioning effect, further improving the efficiency and accuracy of the operation.
[0041] Figure 3 Although the common metal mask structure has obtained a better performance than the existing common metal mask ( Figure 1 )Better edge stability, however, there is still room for further improvement in edge stability.
[0042] Please refer to Figure 5-Figure 6 , Figure 5 This is a schematic diagram of another common metal mask structure of the utility model. Figure 6 for Figure 5 Schematic diagram of the net-stretching process.
[0043] A common metal mask comprises a substrate 1, wherein the substrate 1 comprises an AA area 2 and an edge area located outside the AA area 2 and surrounding the AA area 2, wherein the edge area comprises a left edge area 3, a right edge area 4, an upper edge area 5 and a lower edge area 6, wherein the edge portion of the upper edge area 5 is an upper clamping area 7, and the edge portion of the lower edge area 6 is a lower clamping area 8, wherein the upper clamping area 7 and the lower clamping area 8 each comprise a plurality of clamping positions 10, wherein a cavity 11 is clamped between two adjacent clamping positions 10, wherein the cavity 11 extends toward the AA area 2, wherein the extension range is substantially a hemispherical cavity 12, wherein the edge line of the clamping position 10 is connected with the edge line of the hemispherical cavity 12 to form an edge curve pattern.
[0044] By clamping a cavity 11 between two adjacent clamping positions 10, the edge of the ordinary metal mask is divided into several sections, which reduces the weight of the ordinary metal mask and helps to transfer the tensioning force to the cell more evenly, reducing stress concentration. Under the action of the tensioning force of the same size and position, the cell moves more, which means that less force can be used to achieve the same tensioning effect, thereby improving the efficiency and accuracy of the operation.
[0045] The edge curve pattern helps to evenly transmit the tension force, further reducing stress concentration, thereby further improving the stability of the edge area; it also further reduces the weight of ordinary metal masks and reduces the overall burden of the entire mask.
[0046] Furthermore, the width of the clamping position 10 is smaller than the maximum clamping width of the clamp 9 .
[0047] By designing the width of the clamping position 10 to be smaller than the maximum clamping width of the clamp 9, the weight of the ordinary metal mask is further reduced, and the overall burden of the entire mask is more effectively reduced. The width of the clamping position 10 is smaller than the maximum clamping width of the clamp 9, which is more conducive to more evenly transmitting the tensioning force to the cell, reducing stress concentration, and increasing the cell movement. Less force can be used to achieve the same tensioning effect, further improving the efficiency and accuracy of the operation.
[0048] Figure 5 Although the common metal mask structure has obtained a better performance than the existing common metal mask ( Figure 3 )Better edge stability, however, there is still room for further improvement in edge stability.
[0049] Please refer to Figure 7-Figure 8 , Figure 7 This is a schematic diagram of another common metal mask structure of the utility model. Figure 8 for Figure 7 Schematic diagram of the net-stretching process.
[0050] A common metal mask comprises a substrate 1, wherein the substrate 1 comprises an AA area 2 and an edge area located outside the AA area 2 and surrounding the AA area 2, wherein the edge area comprises a left edge area 3, a right edge area 4, an upper edge area 5 and a lower edge area 6, wherein the edge portion of the upper edge area 5 is an upper clamping area 7, and the edge portion of the lower edge area 6 is a lower clamping area 8, wherein the upper clamping area 7 and the lower clamping area 8 each comprise a plurality of clamping positions 10, wherein a cavity 11 is clamped between two adjacent clamping positions 10, wherein the cavity 11 extends toward the AA area 2, wherein the extension range is substantially a hemispherical cavity 12, wherein the edge line of the clamping position 10 is connected with the edge line of the hemispherical cavity 12 to form an edge curve pattern, wherein a buffer groove 13 is respectively arranged between the upper clamping area 7 and the AA area 2 and between the lower clamping area 8 and the AA area 2, and wherein the buffer groove 13 is located between the hemispherical cavity 12 and the AA area 2.
[0051] By clamping a cavity 11 between two adjacent clamping positions 10, the edge of the ordinary metal mask is divided into several sections, which reduces the weight of the ordinary metal mask and helps to transfer the tensioning force to the cell more evenly, reducing stress concentration. Under the action of the tensioning force of the same size and position, the cell moves more, which means that less force can be used to achieve the same tensioning effect, thereby improving the efficiency and accuracy of the operation.
[0052] The edge curve pattern helps to evenly transmit the tension force, further reducing stress concentration, thereby further improving the stability of the edge area; it also further reduces the weight of ordinary metal masks and reduces the overall burden of the entire mask.
[0053] By setting the buffer groove 13, on the one hand, the weight of the mask is further reduced, and on the other hand, a certain amount of deformation is allowed in this area, thereby improving the flatness of the mask, thereby reducing stress transfer, making it more uniform, and further improving the overall process stability and pattern accuracy.
[0054] Furthermore, the width of the clamping position 10 is smaller than the maximum clamping width of the clamp 9 .
[0055] By designing the width of the clamping position 10 to be smaller than the maximum clamping width of the clamp 9, the weight of the ordinary metal mask is further reduced, and the overall burden of the entire mask is more effectively reduced. The width of the clamping position 10 is smaller than the maximum clamping width of the clamp 9, which is more conducive to more evenly transmitting the tensioning force to the cell, reducing stress concentration, and increasing the cell movement. Less force can be used to achieve the same tensioning effect, further improving the efficiency and accuracy of the operation.
[0056] Furthermore, the buffer groove 13 is rectangular to obtain better flatness.
[0057] Figure 7Although the common metal mask structure has obtained a better performance than the existing common metal mask ( Figure 5 )Better edge stability, however, there is still room for further improvement in edge stability.
[0058] Please refer to Figure 9-10 , Fig. 9 This is a schematic diagram of another common metal mask structure of the utility model. Fig.10 for Fig. 9 Schematic diagram of the net-stretching process.
[0059] A common metal mask includes a substrate 1, the substrate 1 includes an AA area 2 and an edge area located outside the AA area 2 and surrounding the AA area 2, the edge area includes a left edge area 3, a right edge area 4, an upper edge area 5 and a lower edge area 6, the edge portion of the upper edge area 5 is an upper clamping area 7, the edge portion of the lower edge area 6 is a lower clamping area 8, the upper clamping area 7 and the lower clamping area 8 each include a plurality of clamping positions 10, a cavity 11 is clamped between two adjacent clamping positions 10, and the cavity 11 extends toward the AA area 2 The edge line of the clamping position 10 is connected with the edge line of the hemispherical cavity 12 to form an edge curve pattern. A first strip buffer 14 is respectively arranged between the upper clamping area 7 and the AA area 2 and between the lower clamping area 8 and the AA area 2. A buffer groove 13 is respectively arranged between the upper clamping area 7 and the corresponding first strip buffer 14 and between the lower clamping area 8 and the corresponding first strip buffer 14. The buffer groove 13 is located between the hemispherical cavity 12 and the AA area 2.
[0060] The first strip-shaped buffer zone 14 is formed by a half-etched strip (ie, in an etching process such as etching to form an opening portion such as the AA region 2, the metal of the opening portion is completely etched, while the metal of the half-etched strip is etched away by half its thickness).
[0061] By clamping a cavity 11 between two adjacent clamping positions 10, the edge of the ordinary metal mask is divided into several sections, which reduces the weight of the ordinary metal mask and helps to transfer the tensioning force to the cell more evenly, reducing stress concentration. Under the action of the tensioning force of the same size and position, the cell moves more, which means that less force can be used to achieve the same tensioning effect, thereby improving the efficiency and accuracy of the operation.
[0062] The edge curve pattern helps to evenly transmit the tension force, further reducing stress concentration, thereby further improving the stability of the edge area; it also further reduces the weight of ordinary metal masks and reduces the overall burden of the entire mask.
[0063] The provision of the first strip buffer 14 can further reduce the weight of the common metal mask on the one hand, and more importantly, further decompose the stress originally concentrated in the buffer area to prevent sheet distortion at the through opening position, and more evenly transmit the stress to the AA area.
[0064] By setting the buffer groove 13, on the one hand, the weight of the mask is further reduced, and on the other hand, a certain amount of deformation is allowed in this area, thereby improving the flatness of the mask, thereby reducing stress transfer, making it more uniform, and further improving the overall process stability and pattern accuracy.
[0065] Furthermore, the width of the clamping position 10 is smaller than the maximum clamping width of the clamp 9 .
[0066] By designing the width of the clamping position 10 to be smaller than the maximum clamping width of the clamp 9, the weight of the ordinary metal mask is further reduced, and the overall burden of the entire mask is more effectively reduced. The width of the clamping position 10 is smaller than the maximum clamping width of the clamp 9, which is more conducive to more evenly transmitting the tensioning force to the cell, reducing stress concentration, and increasing the cell movement. Less force can be used to achieve the same tensioning effect, further improving the efficiency and accuracy of the operation.
[0067] Furthermore, the buffer groove 13 is rectangular to obtain better flatness.
[0068] Furthermore, a second strip buffer zone 15 is provided between the buffer groove 13 and the corresponding hemispherical cavity 12. The second strip buffer zone 15 is formed by a half-etched strip. The second strip buffer zone 15 further decomposes the stress originally concentrated in the buffer area, prevents sheet distortion at the through opening position, and transmits stress to the AA area more evenly.
[0069] Furthermore, an anti-slip strip 16 is provided on the clamping position 10. The anti-slip strip 16 is formed by a semi-etched strip. On the one hand, it further reduces the weight of the ordinary metal mask. More importantly, the anti-slip strip 16 increases the friction between the clamp 9 and the mask, preventing the mask from sliding during the stretching process, thereby improving the process stability.
[0070] The above description is only the preferred embodiment of the utility model, and is not intended to limit the utility model. For those skilled in the art, the utility model can have various modifications and changes. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the utility model shall be included in the protection scope of the utility model.
Claims
1. A common metal mask with decomposable tension stress, comprising a substrate (1), the substrate (1) comprising an AA region (2) and an edge region located outside the AA region (2) and surrounding the AA region (2), the edge region comprising a left edge region (3), a right edge region (4), an upper edge region (5) and a lower edge region (6), the edge portion of the upper edge region (5) being an upper clamping region (7), the edge portion of the lower edge region (6) being a lower clamping region (8), characterized in that: The upper clamping area (7) and the lower clamping area (8) each include a plurality of clamping positions (10), a cavity (11) is clamped between two adjacent clamping positions (10), the cavity (11) extends in the direction of the AA area (2), the extension range is basically the same as the hemispherical cavity (12), the edge line of the clamping position (10) is connected with the edge line of the hemispherical cavity (12) to form an edge curve pattern, and a first strip buffer zone (14) is respectively arranged between the upper clamping area (7) and the AA area (2) and between the lower clamping area (8) and the AA area (2).
2. The common metal mask with decomposable tension stress according to claim 1, characterized in that: The substrate (1) is made of Invar.
3. The common metal mask with decomposable tension stress according to claim 1, characterized in that: The thickness of the substrate (1) is 100 to 200 μm.
4. The common metal mask with decomposable tension stress according to claim 3, characterized in that: The upper clamping area (7) has four clamping positions (10), and the lower clamping area (8) has four clamping positions (10).
5. The common metal mask with decomposable tension stress according to claim 1, characterized in that: The width of the clamping position (10) is smaller than the maximum clamping width of the clamp (9).
6. The common metal mask with decomposable tension stress according to any one of claims 1 to 5, characterized in that: The clamping position (10) is provided with an anti-slip strip (16).