Photovoltaic silicon wafer surface drying device

Abstract

The utility model discloses a photovoltaic silicon wafer surface drying device which comprises a base, the base is installed on a support, a motor is installed on the lower surface of the base, an output shaft of the motor penetrates through the base and then is connected with a rotating shaft, the rotating shaft is sleeved with an annular frame, a plurality of shelves are evenly distributed and connected to the upper circumference of the annular frame, the edge of the base is connected with the lower end of an annular shell, and the upper end of the annular shell is connected with a conical cover. Air boxes are evenly distributed on the circumference of the outer wall of the annular shell, the lower ends of the air boxes are connected with an annular pipe through air pipes, and the annular pipe is connected with an air heater which is installed on the lower surface of the base. The device is compact in structure, reasonable in design and novel and unique in idea, the silicon plate placed in the shelf is driven by the motor to rotate, hot air is supplied through the hot air blower, passes through the annular pipe, the air pipe and the air bellow and then is sprayed out of the air nozzles to dry the rotating silicon plate, and damp and hot gas generated in the drying process of the silicon plate is exhausted from the exhaust pipe, so that the drying efficiency is improved. Therefore, the air in the annular shell is dry.

Description

Technical Field

[0001] The utility model relates to the technical field of photovoltaics and new energy, in particular to a photovoltaic silicon wafer surface drying device. Background Art

[0002] Photovoltaic energy systems generally include solar cells or modules, charge and discharge control systems (or inverters), and load control.

[0003] At present, the silicon wafer production process must go through a cleaning process. After the silicon wafer is cleaned, the moisture on its surface must be removed to obtain a clean and dry silicon wafer. The silicon wafer dryer is the most commonly used equipment to remove the surface moisture after the silicon wafer is cleaned. At present, silicon wafer dryers are all manually operated, with low intelligence and automation, wasting a lot of time, manpower and material resources. Therefore, this application discloses a photovoltaic silicon wafer surface drying device. Utility Model Content

[0004] The utility model aims to solve the existing problems and provides a photovoltaic silicon wafer surface drying device.

[0005] The utility model is realized through the following technical scheme: a photovoltaic silicon wafer surface drying device, comprising a base, the base is installed on a bracket, a motor is installed on the lower surface of the base, the motor output shaft passes through the base and is connected to a rotating shaft, a ring frame is mounted on the rotating shaft, a plurality of shelves are evenly connected to the circumference of the ring frame, the edge of the base is connected to the lower end of the ring shell, the upper end of the ring shell is connected to a conical cover, the top of the conical cover is rotatably connected to the top of the rotating shaft, bellows are evenly arranged on the circumference of the outer wall of the ring shell, the lower end of the bellows is connected to the ring pipe through an air duct, the ring pipe is connected to a hot air blower, and the hot air blower is installed on the lower surface of the base.

[0006] As a further improvement to the above scheme, the frustum-shaped guide plate on the base can guide and converge the water droplets dripping on the silicon plate through the frustum-shaped guide plate to facilitate discharge.

[0007] As a further improvement to the above scheme, the ring frame includes a bottom ring seat, on which a number of support rods are evenly distributed around the circumference and vertically connected, the top ends of the support rods are connected to ring rods, and the inside of the ring rods are connected to ferrules via a number of connecting rods. The ring frame is mounted on a rotating shaft and then connected to a number of shelves, and the multiple shelves are tiltedly connected and rotated through the structure of the ring frame.

[0008] As a further improvement to the above scheme, the shelf includes a bottom rod, one end of which is obliquely connected to the outer curved surface of the bottom ring seat, a card holder with an opening upward is connected to the bottom rod at intervals, and a number of U-shaped baffles are connected to both sides of the card holder at intervals. A pull rod is arranged between the arc rings of the U-shaped baffle, the lower end of the pull rod is connected to the bottom rod, the upper end of the pull rod is connected to the ring rod, and the baffle is connected to the card holder on the outside. The silicon plate is clamped on the card holder and the U-shaped baffle by means of the bottom plate connected to the lower end of the ring frame and the inclined pull rod at the upper end, and the baffle is used to prevent the silicon plate from falling off during rotation.

[0009] As a further improvement to the above scheme, the bellows is connected with a wind nozzle, which is connected with the annular shell, and the hot air flow in the bellows is ejected into the annular shell through the slit of the wind nozzle.

[0010] As a further improvement to the above scheme, the top of the conical cover is evenly distributed around the circumference and connected to a discharge pipe, through which the hot and humid gas in the annular shell is discharged to ensure that the air in the annular shell is dry.

[0011] As a further improvement to the above scheme, a door hole is provided through the ring shell, a door panel is rotatably connected to the door hole, a handle is provided on the side of the door panel away from the rotating side, the silicon wafer is placed and taken out through the door hole, and the door panel is used to seal the ring shell to ensure the temperature and wind speed flow in the ring shell, so as to facilitate the rapid drying of the silicon wafer.

[0012] Compared with the prior art, the utility model has the following advantages: compact structure, reasonable design, novel and unique concept, using a motor to drive the silicon plate placed in the shelf to rotate, and the hot air is supplied by the hot air blower through the ring pipe, the air duct, and the bellows, and the hot air is sprayed from the air nozzle to dry the rotating silicon plate, and the hot and humid gas generated by the silicon plate during the drying process is discharged from the exhaust pipe to ensure that the air in the ring shell is dry. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 It is a structural schematic diagram of the utility model.

[0014] Figure 2 It is a schematic diagram of the structure of installing the guide plate on the base.

[0015] Figure 3 This is a schematic diagram of the structure in which a shelf is arranged in the ring shell.

[0016] Figure 4 This is a structural schematic diagram of a hot air blower arranged on a bracket to supply hot air.

[0017] Figure 5 Schematic diagram of the structure of installing the shelf on the ring rack. DETAILED DESCRIPTION

[0018] The utility model is further described below in conjunction with the accompanying drawings.

[0019] like Figures 1 to 5 As shown in, a photovoltaic silicon wafer surface drying device includes a base 1, the base 1 is installed on a bracket 17, a motor 7 is installed on the lower surface of the base 1, the output shaft of the motor 7 passes through the base 1 and is connected to a rotating shaft 4, a ring frame 5 is mounted on the rotating shaft 4, and a plurality of shelves 6 are evenly connected to the circumference of the ring frame 5, the edge of the base 1 is connected to the lower end of the ring shell 2, the upper end of the ring shell 2 is connected to a conical cover 3, the top of the conical cover 3 is rotatably connected to the top of the rotating shaft 4, and no less than three bellows 9 are evenly distributed on the circumference of the outer wall of the ring shell 2, the lower end of the bellows 9 is connected to a ring pipe 12 through an air duct 11, the ring pipe 12 is connected to a hot air blower 13, and the hot air blower 13 is installed on the lower surface of the base 1.

[0020] As a further improvement to the above solution, the base 1 is provided with a frustum-shaped guide plate 14, which guides and converges the water droplets dripping on the silicon plate to facilitate discharge.

[0021] As a further improvement to the above scheme, the ring frame 5 includes a bottom ring seat 51, on which a plurality of support rods 52 are evenly distributed and vertically connected. The top of the support rod 52 is connected to a ring rod 53, and the ring rod 53 is connected to a plurality of rings 55 through a plurality of connecting rods 54. The ring frame 5 is mounted on the rotating shaft 4 and then connected to a plurality of shelves 6. The plurality of shelves 6 are connected obliquely and rotated through the structure of the ring frame 5.

[0022] As a further improvement to the above scheme, the shelf 6 includes a bottom rod 61, one end of which is obliquely connected to the outer curved surface of the bottom ring seat 51, and a tray 62 with an opening upward is connected to the bottom rod 61 at intervals, and a number of U-shaped baffles 63 are connected to the two sides of the tray 62 at intervals. A pull rod 65 is arranged between the arc rings of the U-shaped baffles 63, and the lower end of the pull rod 65 is connected to the bottom rod 61, and the upper end of the pull rod 65 is connected to the ring rod 53. A baffle 64 is connected to the outer tray 62, and the silicon plate is clamped on the tray 62 and the U-shaped baffle 63 by connecting the bottom rod at the lower end of the ring frame 5 and the inclined pull rod 65 at the upper end, and the baffle 64 is used to prevent the silicon plate from falling off during rotation.

[0023] As a further improvement to the above scheme, the bellows 9 is connected through a tuyere 10, and the tuyere 10 is connected through the annular shell 2, so that the hot air flow in the bellows 9 is ejected into the annular shell 2 through the slit of the tuyere 10.

[0024] As a further improvement to the above scheme, the top of the conical cover 3 is evenly distributed around the circumference and connected to the discharge pipe 8, and the hot and humid gas in the annular shell 2 is discharged through the discharge pipe 8 to ensure that the air in the annular shell 2 is dry.

[0025] As a further improvement to the above scheme, a door hole is set through the annular shell 2, and a door panel 15 is rotatably connected to the door hole. A handle 16 is set on the side of the door panel 15 away from the rotating side. Silicon wafers are placed and taken out through the door hole, and the door panel 15 is used to seal the annular shell 2 to ensure the temperature and wind speed flow in the annular shell 2, so as to facilitate the rapid drying of the silicon wafers.

[0026] As a further improvement to the above solution, a drain pipe is provided at the edge of the base 1 for draining water.

[0027] The working principle of a photovoltaic silicon wafer surface drying device is as follows: open the door panel 15, place the silicon plate vertically in the shelf 6 through the door hole, and use the blocking rod at the outer end of the shelf 6 to prevent the silicon plate from leaving the shelf 6 during rotation, close the door panel 15, and then turn on the hot air blower 13. In addition, use the motor 7 to drive the silicon plate placed in the shelf 6 to rotate, and the hot air supplied by the hot air blower 13 passes through the ring pipe 12, the air duct 11, and the bellows 9, and then the hot air is sprayed from the air nozzle 10 to dry the rotating silicon plate, and the humid hot gas generated by the silicon plate during the drying process is discharged from the exhaust pipe 8 to ensure that the air in the ring shell 2 is dry.

[0028] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A photovoltaic silicon wafer surface drying device, comprising a base, the base being mounted on a bracket, characterized in that: A motor is installed on the lower surface of the base, and the motor output shaft is connected to the rotating shaft after passing through the base. A ring frame is installed on the rotating shaft, and a plurality of shelves are evenly connected to the circumference of the ring frame. The edge of the base is connected to the lower end of the ring shell, and the upper end of the ring shell is connected to a conical cover. The top of the conical cover is rotatably connected to the top of the rotating shaft. Bellows are evenly arranged on the circumference of the outer wall of the ring shell, and the lower end of the bellows is connected to the ring pipe through an air duct, and the ring pipe is connected to a hot air blower, which is installed on the lower surface of the base.

2. A photovoltaic silicon wafer surface drying device according to claim 1, characterized in that: The base is provided with a frustum-shaped guide plate.

3. A photovoltaic silicon wafer surface drying device according to claim 1, characterized in that: The ring frame comprises a bottom ring seat, on which a plurality of support rods are evenly distributed and vertically connected, the top ends of the support rods are connected to the ring rods, and the ring rods are connected to the ferrules through a plurality of connecting rods.

4. The photovoltaic silicon wafer surface drying device according to claim 1, characterized in that: The shelf includes a bottom rod, one end of which is obliquely connected to the outer curved surface of the bottom ring seat, the bottom rod is connected to a card holder with an opening facing upward at intervals, a number of U-shaped baffle rods are connected to both sides of the card holder at intervals, a pull rod is arranged between the arc rings of the U-shaped baffle rod, the lower end of the pull rod is connected to the bottom rod, the upper end of the pull rod is connected to the ring rod, and the baffle rod is connected to the card holder on the outside.

5. The photovoltaic silicon wafer surface drying device according to claim 1, characterized in that: The bellows is connected with a wind nozzle, and the wind nozzle is connected with the ring shell.

6. The photovoltaic silicon wafer surface drying device according to claim 1, characterized in that: The top of the conical cover is evenly distributed around the circumference and is connected to the discharge pipe.

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