Stirring device for silicon wafer texturing groove

Abstract

The utility model discloses a stirring device for a silicon wafer texturing groove, which comprises the texturing groove, a lifting device is mounted on one side of the texturing groove, a bearing plate is mounted at the lifting end of the lifting device, a movable U-shaped frame is arranged in an inner cavity of the texturing groove, a rotatable shaft rod is arranged on one side of the U-shaped frame in a penetrating manner, and the shaft rod is arranged on the other side of the U-shaped frame. The surface of the shaft rod is fixedly connected with a stirring plate located in an inner cavity of the U-shaped frame. According to the utility model, the wafer box filled with silicon wafers is arranged above the bearing plate, the lifting device drives the bearing plate to be placed in the corrosive liquid in the texturing groove, the reciprocating driving assembly drives the U-shaped frame to move left and right in the inner cavity of the texturing groove during the period, and the gear on the surface of the shaft rod rolls above the rack to drive the shaft rod to rotate; the shaft rod can drive the stirring plate to rotate to stir the corrosion liquid, so that the corrosion liquid is in full contact with the silicon wafer, and the purposes of stirring the corrosion liquid and improving the silicon wafer texturing effect by adopting the cooperation of a reciprocating structure and the autorotation of the spoiler can be achieved.

Description

Technical Field

[0001] The utility model belongs to the technical field of silicon wafer texturing, and particularly relates to a stirring device for a silicon wafer texturing tank. Background Technique

[0002] The texturing process of battery silicon wafers is the most important link in the battery production line. By using chemical and etching methods, the surface of the silicon wafer is textured, the surface damage layer of the silicon wafer after cutting is removed, a good light trapping effect is formed, and the surface emissivity of the battery silicon wafer is reduced.

[0003] During the production process, the silicon wafers need to be placed in a wafer cassette, and then the wafer cassette is placed in the texturing tank through a lifting device and immersed in the etching solution. When the silicon wafers come into contact with the etching liquid, gas will be generated, which affects the texturing effect. Therefore, we propose a stirring device for a silicon wafer texturing tank, which uses the cooperation of a reciprocating structure and the self-rotation of a spoiler to stir the etching solution and improve the texturing effect of the silicon wafers. Content of the Utility Model

[0004] The purpose of the utility model is to provide a stirring device for a silicon wafer texturing tank, which has the advantages of using the cooperation of a reciprocating structure and the self-rotation of a spoiler to stir the etching solution and improve the texturing effect of the silicon wafers, so as to solve the above-mentioned background technical problems.

[0005] The technical solution of the utility model to solve the above technical problems is as follows: a stirring device for a silicon wafer texturing tank, which includes a texturing tank: a lifting device is installed on one side of the texturing tank, a supporting plate is installed at the lifting end of the lifting device, a movable U-shaped frame is arranged in the inner cavity of the texturing tank, a rotatable shaft rod penetrates through one side of the U-shaped frame, a stirring plate located in the inner cavity of the U-shaped frame is fixedly connected to the surface of the shaft rod, a rack is fixedly connected to the bottom of the inner cavity of the texturing tank, and a gear meshing with the rack is fixedly connected to the surface of the shaft rod. A reciprocating driving assembly is arranged between the U-shaped frame and the texturing tank.

[0006] Preferably, the reciprocating driving assembly includes a square vertical rod fixed on the front side of the U-shaped frame, and the square vertical rod is located in front of the texturing tank.

[0007] Preferably, a motor is fixedly installed on the front side of the texturing tank, a turntable is fixedly installed on the output shaft of the motor, a movable pin is fixedly connected to one end of the rear side of the turntable, and the end of a push rod is rotatably connected to the surface of the movable pin.

[0008] Preferably, two symmetrical guide rods are fixedly connected to the front side of the texturing tank, the square vertical rod is slidably connected to the surfaces of the two guide rods, and a through hole is formed on the square vertical rod on the surface of the square vertical rod.

[0009] Preferably, the gear is located inside the U-shaped frame.

[0010] 1. The beneficial effects of the present utility model are as follows: In the present utility model, a cassette containing silicon wafers is installed above a supporting plate, and a lifting device drives the supporting plate into the etching liquid in an etching tank. During this period, a reciprocating driving component drives a U-shaped frame to move left and right in the inner cavity of the etching tank. A gear on the surface of a shaft rod rolls above a rack, which will drive the shaft rod to rotate. The shaft rod will drive a stirring plate to rotate to stir the etching liquid, so that the etching liquid is in full contact with the silicon wafers, thereby achieving the purpose of stirring the etching liquid by using the cooperation of a reciprocating structure and the self-rotation of a flow disturbing plate, and improving the texturing effect of the silicon wafers.

[0011] 2. By the cooperative use of a guiding rod and a rectangular hole in the present utility model, during the left and right movement of a square vertical rod, the rectangular hole will slide on the surface of the guiding rod, providing guidance and limitation for the movement of the square vertical rod, improving the stability of the movement of the square vertical rod, and further improving the stability of the movement of the U-shaped frame. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Wherein:

[0013] Figure 1 is a three-dimensional schematic diagram of an embodiment of the present utility model;

[0014] Figure 2 is a three-dimensional schematic diagram of a partial structure of an embodiment of the present utility model;

[0015] Figure 3 is a three-dimensional exploded schematic diagram of a shaft rod and a gear of an embodiment of the present utility model.

[0016] In the drawings, the list of components represented by each reference numeral is as follows:

[0017] 1. Etching tank, 2. Lifting device, 3. Supporting plate, 4. U-shaped frame, 5. Shaft rod, 6. Stirring plate, 7. Rack, 8. Gear, 9. Reciprocating driving component, 91. Square vertical rod, 92. Push rod, 93. Motor, 94. Turntable, 95. Movable pin, 96. Guiding rod, 97. Rectangular hole. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0018] Hereinafter, embodiments of the stirring device for a silicon wafer etching tank of the present utility model will be described with reference to the drawings.

[0019] Figures 1-3A stirring device for a silicon wafer texturing tank according to an embodiment of the present invention is shown, which includes a texturing tank 1. A lifting device 2 is installed on one side of the texturing tank 1. A supporting plate 3 is installed at the lifting end of the lifting device 2. An activatable U-shaped frame 4 is arranged in the inner cavity of the texturing tank 1. A rotatable shaft rod 5 penetrates through one side of the U-shaped frame 4. A stirring plate 6 located in the inner cavity of the U-shaped frame 4 is fixedly connected to the surface of the shaft rod 5. A rack 7 is fixedly connected to the bottom of the inner cavity of the texturing tank 1. A gear 8 meshing with the rack 7 is fixedly connected to the surface of the shaft rod 5. The gear 8 is located inside the U-shaped frame 4. A reciprocating driving assembly 9 is arranged between the U-shaped frame 4 and the texturing tank 1. The reciprocating driving assembly 9 includes a square vertical rod 91 fixed to the front side of the U-shaped frame 4. The square vertical rod 91 is located in front of the texturing tank 1. A motor 93 is fixedly installed on the front side of the texturing tank 1. A turntable 94 is fixedly installed on the output shaft of the motor 93. One end of the rear side of the turntable 94 is fixedly connected to a movable pin 95. The end of a push rod 92 is rotatably connected to the surface of the movable pin 95. Two symmetrical guide rods 96 are fixedly connected to the front side of the texturing tank 1. The square vertical rod 91 is slidably connected to the surfaces of the two guide rods 96. An opening is provided on the surface of the square vertical rod 91 on the surface of the square vertical rod 91.

[0020] Working principle: When the present invention is in use, the user installs a wafer cassette containing silicon wafers above the supporting plate 3. The lifting device 2 drives the supporting plate 3 into the etching liquid in the texturing tank 1, so that the silicon wafers are in contact with the etching liquid to achieve texturing. During the texturing process, the motor 93 works to drive the turntable 94 and the movable pin 95 to rotate. When the push rod 92 rotates on the surface of the movable pin 95, it will push the push rod 92 to form a thrust and a pull force. The push rod 92 will drive the square vertical rod 91 to move left and right. The square vertical rod 91 will drive the U-shaped frame 4 and the shaft rod 5 to move left and right in the inner cavity of the texturing tank 1. During the movement of the shaft rod 5, the gear 8 on its surface will roll above the rack 7, which will drive the shaft rod 5 to rotate. The shaft rod 5 will rotate and move, and the shaft rod 5 will drive the stirring plate 6 to move and rotate to stir the etching liquid, so that the etching liquid is in full contact with the silicon wafers.

[0021] In summary: For this stirring device for a silicon wafer texturing tank, by installing a wafer cassette containing silicon wafers above the supporting plate 3, the lifting device 2 drives the supporting plate 3 into the etching liquid in the texturing tank 1. During this period, the reciprocating driving assembly 9 drives the U-shaped frame 4 to move left and right in the inner cavity of the texturing tank 1. The gear 8 on the surface of the shaft rod 5 rolls above the rack 7, which will drive the shaft rod 5 to rotate. The shaft rod 5 will drive the stirring plate 6 to rotate to stir the etching liquid, so that the etching liquid is in full contact with the silicon wafers, and the purpose of stirring the etching liquid by using the cooperation of the reciprocating structure and the self-rotation of the spoiler to improve the texturing effect of the silicon wafers can be achieved.

Claims

1. A stirring device for a silicon wafer texturing tank, characterized in that: The invention comprises a texturing trough (1): a lifting device (2) is installed on one side of the texturing trough (1), a supporting plate (3) is installed on the lifting end of the lifting device (2), a movable U-shaped frame (4) is arranged in the inner cavity of the texturing trough (1), a rotatable shaft (5) is penetrated through one side of the U-shaped frame (4), a stirring plate (6) located in the inner cavity of the U-shaped frame (4) is fixedly connected to the surface of the shaft (5), a rack (7) is fixedly connected to the bottom of the inner cavity of the texturing trough (1), a gear (8) meshing with the rack (7) is fixedly connected to the surface of the shaft (5), and a reciprocating drive assembly (9) is arranged between the U-shaped frame (4) and the texturing trough (1).

2. The stirring device for silicon wafer texturing tank according to claim 1, characterized in that: The reciprocating drive assembly (9) comprises a square upright pole (91) fixed on the front side of the U-shaped frame (4), and the square upright pole (91) is located on the front side of the texturing groove (1).

3. A stirring device for a silicon wafer texturing tank according to claim 2, characterized in that: A motor (93) is fixedly mounted on the front side of the velvet making groove (1), a turntable (94) is fixedly mounted on the output shaft of the motor (93), a movable pin (95) is fixedly connected to one end of the rear side of the turntable (94), and the end of the push rod (92) is rotatably connected to the surface of the movable pin (95).

4. The stirring device for a silicon wafer texturing tank according to claim 3, characterized in that: The front side of the velvet making groove (1) is fixedly connected to two symmetrical guide rods (96), the square upright rod (91) is slidably connected to the surfaces of the two guide rods (96), and the square upright rod (91) is provided with a surface of the square upright rod (91).

5. The stirring device for silicon wafer texturing tank according to claim 4, characterized in that: The gear (8) is located on the inner side of the U-shaped frame (4).

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