Polaroid with high extinction ratio
By plating a multi-layer structure of 60 layers on the polarizer, the Brewster angle is optimized, and the problem of the existing polarizer's unsatisfactory extinction ratio in a specific optical band is solved, achieving high extinction ratio and improved lens damage threshold and mechanical properties.
Patent Information
- Application Number
- CN202422118201.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-30
- Publication Date
- 2025-06-13
- Estimated Expiration
- 2034-08-30
AI Technical Summary
The extinction ratio of existing polarizers in specific optical bands (1050-1085nm) is not ideal, the lens damage threshold is low, and the mechanical properties are not high.
A polarizer with high extinction ratio was designed. By plating a multi-layer structure of 60 layers on an optical glass substrate, the high-refractive index tantalum oxide material layer and the low-refractive index silicon oxide material layer were alternately sequentially, optimizing the Brewster angle and improving the mechanical properties of the lens.
A high extinction ratio in a specific optical band (1050-1085nm) is achieved, the lens damage threshold is improved, the mechanical performance is improved, and the beam extinction ratio TP:TS is greater than or equal to 1500:1.
Smart Images

Figure CN222979825U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of optical lenses, and particularly relates to a polarizer with a high extinction ratio. Background Art
[0002] As an optical basic component, the function of a polarizer is to convert incident light with any polarization state into linearly polarized light. There are many optical methods to achieve such a simple function. The most commonly used methods are to utilize Brewster's angle, birefringence, and the optimization of metal wire grids. Specifically, a multilayer dielectric film is deposited on the surface of an optical glass substrate to reduce light loss and effectively separate polarized light.
[0003] However, in the current prior art, the film system design is complex, the extinction ratio (TP:TS) is not ideal in a specific optical band (1050 - 1085 nm band), the damage threshold of the lens is low, and the mechanical properties are not high. Content of the Utility Model
[0004] The purpose of the utility model is to provide a polarizer with a high extinction ratio, optimize the film layer structure, optimize the TP and TS values in a specific optical band (1050 - 1085 nm band) for Brewster's angle, improve the damage threshold of the lens, enhance the mechanical properties, effectively obtain a single-piece polarizing film layer structure, and without predicting the reflection band, the actual process detection result of the extinction ratio (TP:TS) is greater than or equal to 1500:1.
[0005] To achieve the above purpose, the solution of the utility model is: a polarizer with a high extinction ratio, comprising: an optical glass substrate, and a high extinction ratio film layer deposited on the surface of the optical glass substrate. The high extinction ratio film layer includes a multilayer structure sequentially stacked from the surface of the optical glass substrate outward. The total number of layers of the multilayer structure is 60 layers, which is a multilayer structure formed by alternately depositing high refractive index tantalum oxide material layers and low refractive index silicon oxide material layers. Among them, the high refractive index tantalum oxide material layer is deposited on the surface of the optical glass substrate, and the low refractive index silicon oxide material layer and the high refractive index tantalum oxide material layer are alternately deposited on the high refractive index tantalum oxide material layer to form a multilayer structure.
[0006] Further, the first five layers and the last five layers of the multilayer structure are lens optimization layers, and the middle is a regular layer with a total of 50 layers.
[0007] Further, the physical film thickness of the regular layer is: 1 / 4λ, where λ is the wavelength of the incident light of the regular layer.
[0008] After adopting the above solution, the beneficial effects of the present utility model are as follows: The film layer structure is optimized. The total number of layers of the film layer structure is 60 layers, which is a multi-layer structure formed by alternately depositing high refractive index tantalum oxide material layers and low refractive index silicon oxide material layers. The TP and TS values in a specific optical band (1050 - 1085 nm band) are optimized for the Brewster angle (by reflecting S light and transmitting P light through the dielectric film to separate polarized light and P polarized light), so that the damage threshold of the lens is increased and the mechanical properties are improved. An effective single-chip polarization film layer structure can be obtained, and the reflection band and the beam extinction ratio TP:TS do not need to be estimated. The actual detection result shows that TP:TS is greater than or equal to 1500:1. Description of the Drawings
[0009] Figure 1 Schematic diagram of a polarizer with a high extinction ratio according to an embodiment of the present utility model;
[0010] Reference numerals: optical glass substrate - 1, tantalum oxide material layer - 2, silicon oxide material layer - 3. Detailed Embodiments
[0011] The following will describe the present utility model in detail with reference to the drawings and specific embodiments.
[0012] As Figure 1 shown, a polarizer with a high extinction ratio includes: an optical glass substrate 1, and a high extinction ratio film layer deposited on the surface of the optical glass substrate. The high extinction ratio film layer includes a multi-layer structure stacked in sequence from the surface of the optical glass substrate outward. The total number of layers of the multi-layer structure is 60 layers, which is a multi-layer structure formed by alternately depositing high refractive index tantalum oxide material layers and low refractive index silicon oxide material layers. Among them, a high refractive index tantalum oxide material layer 2 is deposited on the surface of the optical glass substrate, and a low refractive index silicon oxide material layer 3 and a high refractive index tantalum oxide material layer are alternately deposited on the high refractive index tantalum oxide material layer to form a multi-layer structure.
[0013] Among them, the total number of layers of the film layer is 60 layers. The first five layers and the last five layers are lens optimization layers with no fixed thickness and are specifically optimized according to the refractive index of the lens. There are 50 regular layers in the middle. The physical film thickness of the regular layer is: 1 / 4λ, where λ is the wavelength of the incident light of this regular layer.
[0014] In a specific embodiment of the present utility model, the production process: Use a box-type vacuum coating machine to perform optical coating work under a vacuum condition of 3.0×10 -3 Pa. Debug the Kaufman ion source equipment to a suitable state. After pre-melting the film material, start coating. The film material SiO 2 (evaporation rate: 8 Å / s) is a low refractive index material with stable refractive index and good mechanical properties. The film material Ta 2 O 5(Evaporation rate: 2.5 Å / s) is a high refractive index material, which can improve the damage threshold of the coated lens and reduce the surface loss rate.
[0015] After testing, the prepared polarizer with a high extinction ratio has a beam extinction ratio of TP:TS, and the actual test result shows that TP:TS is greater than or equal to 1500:1.
Claims
1. A polarizer with a high extinction ratio, comprising: An optical glass substrate, and a high extinction ratio film layer coated on the surface of the optical glass substrate, characterized in that the high extinction ratio film layer includes a multilayer structure stacked in sequence from the surface of the optical glass substrate to the outside, the total number of layers of the multilayer structure is 60, and the multilayer structure is formed by alternately coating high-refractive index tantalum oxide material layers and low-refractive index silicon oxide material layers in sequence, wherein the surface of the optical glass substrate is coated with a high-refractive index tantalum oxide material layer, and low-refractive index silicon oxide material layers and high-refractive index tantalum oxide material layers are alternately coated on the high-refractive index tantalum oxide material layer in sequence to form a multilayer structure.
2. A polarizer with a high extinction ratio according to claim 1, characterized in that: The first five layers and the last five layers of the multi-layer structure are lens optimization layers, and the middle layer is a regular layer, totaling 50 layers.
3. A polarizer with a high extinction ratio according to claim 2, characterized in that: The physical film thickness of the regular layer is: 1 / 4λ, where λ is the wavelength of the incident light of the regular layer.