Vertically adjustable double-sided exposure platform and laser direct-writing exposure equipment

Abstract

The utility model discloses a double-sided exposure platform capable of being vertically adjusted and laser direct-writing exposure equipment. The double-sided exposure platform comprises a supporting base, a vertical adjusting mechanism and a vertical adjusting mechanism, the vertical adjusting assembly is arranged on the supporting base and comprises a moving part; and the exposure assembly comprises an exposure piece mounting plate arranged on the moving piece, and the exposure piece mounting plate can move along with the moving piece in the vertical direction. According to the utility model, the upper exposure piece and the lower exposure piece are arranged to realize double-sided exposure of the substrate, the substrate is positioned through the upper exposure piece according to the mark points on the outer layer of the substrate, and the positions of the upper exposure piece and the lower exposure piece in the horizontal direction are kept unchanged, so that the alignment precision of the substrate is only limited by the identification precision of an exposure system; secondly, the vertical adjusting mechanism is arranged to adjust the distance between the upper exposure piece and the outer layer of the substrate, so that the exposure platform can adapt to substrates with different thicknesses, and the application range of the laser direct writing exposure equipment provided with the exposure platform is expanded.

Description

Technical Field

[0001] The utility model relates to the technical field of lithography exposure, in particular to a vertically adjustable double-sided exposure platform and a laser direct writing exposure device. Background Art

[0002] A direct writing lithography exposure device is a high-precision and maskless microfabrication device, especially suitable for situations where complex patterns need to be directly generated on a substrate or for small-batch production. During its operation, a laser direct writing exposure requires an exposure platform to place the substrate coated with photoresist, and then the laser light source is moved along a predetermined path and irradiated on the photoresist point by point or in a scanning manner to achieve selective exposure of the photoresist. When the thickness of the substrate changes, the distance between the laser light source and the surface of the substrate also needs to change, so as to ensure that the laser focus just falls on the surface of the substrate that needs to be exposed.

[0003] In addition, there are three solutions for substrates that require double-sided exposure in existing exposure devices. One is a traditional double-sided exposure machine, which realizes the interlayer alignment accuracy of the exposed product through the graphic position accuracy of the positive and negative films themselves and the alignment accuracy of the films. The film is deformed due to environmental influence, and the film alignment accuracy directly affects the final alignment result of the positive and negative graphics of the product. The second is a single-sided digital exposure machine, which is provided with marking points on the outer layer of the substrate to be exposed to represent positioning information. The system grabs the marking points on the board for alignment exposure to achieve accurate position exposure of the graphics and the board. After the outer front graphic is exposed, the board is turned over and the inner back graphic is exposed in the same way. However, there are no marking points for marking positions on the inner layer of the substrate. In the actual production process, marking points are added to the inner layer additionally to achieve the alignment of the front graphic and the back graphic, and its alignment accuracy is affected by the accuracy of the motion control platform and the system's recognition of the marking points. The third is a double-sided laser direct writing exposure machine, which can realize double-sided exposure, but the positional relationship between the upper and lower exposure parts is fixed and cannot adapt to substrates of different thicknesses, so its application range is small. Summary of the Utility Model

[0004] In order to solve the problems of double-sided exposure and the double-sided exposure platform being able to adapt to substrates of different thicknesses, the utility model provides a vertically adjustable double-sided exposure platform and a laser direct writing exposure device, and the specific technical solutions are as follows:

[0005] A vertically adjustable double-sided exposure platform, characterized by comprising: a support base; a vertical adjustment component arranged on the support base, the vertical adjustment component including a moving part; an exposure component, the exposure component including an exposure part mounting plate arranged on the moving part, and the exposure part mounting plate can move vertically along with the moving part.

[0006] Further, the vertical adjustment component includes a driving member, which forms an integral structure with the moving member through an exposure member mounting plate, and the driving member can drive the moving member and the exposure member mounting plate to move in the vertical direction.

[0007] Further, it is characterized in that: the moving member includes: a high-precision guide rail arranged on the support base, the length direction of the high-precision guide rail is the moving direction of the upper exposure member mounting plate; a moving block arranged on the high-precision guide rail, the moving block can move along the length direction of the high-precision guide rail; an anti-collision block jointly arranged with the moving block on the exposure member mounting plate; at least two anti-collision fixing blocks arranged on the support base, the distance between the anti-collision fixing blocks is at least greater than the up and down stroke of the anti-collision block; and an anti-collision rubber with one end arranged on the anti-collision fixing block, the other end of the anti-collision rubber contacts the anti-collision block.

[0008] Preferably, the driving member includes: a servo motor arranged on the same side of the support base and the moving member; a ball screw with one end arranged on the power end of the servo motor, the ball screw is vertically placed and parallel to the length direction of the high-precision guide rail, the other end of the ball screw is arranged on the bottom surface of the exposure member mounting plate, and the ball screw can drive the exposure assembly to move vertically.

[0009] Preferably, the exposure assembly further includes: an upper exposure member connected to the moving member, the upper exposure member is composed of six exposure heads; and a lower exposure member arranged on the support base, the lower exposure member is composed of six exposure heads, the axis of the upper exposure member is parallel to the axis of the lower exposure member and the relative position of the projection on the bottom surface of the support base remains unchanged.

[0010] Preferably, a laser direct writing exposure device is equipped with the above double-sided exposure platform.

[0011] From the above technical solutions, the present utility model has the following beneficial effects:

[0012] The present utility model sets an upper exposure member and a lower exposure member to realize double-sided exposure of the substrate. By positioning the upper exposure member according to the outer layer marking points of the substrate, and the horizontal positions of the upper and lower exposure members remain unchanged, the alignment accuracy of the substrate is only limited by the recognition accuracy of the exposure system, greatly improving the alignment accuracy of the exposure platform. Secondly, the present utility model sets a vertical adjustment mechanism to adjust the distance between the upper exposure member and the outer layer of the substrate, so that the exposure platform can adapt to substrates of different thicknesses, expanding the applicable range of the laser direct writing exposure device equipped with this exposure platform. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 is a schematic structural diagram of an embodiment of the present utility model;

[0014] Figure 2 is a schematic structural diagram of an embodiment of the vertical adjustment component of the present utility model.

[0015] In the figure: 100. Support base, 200. Vertical adjustment component, 300. Exposure component, 400. Substrate;

[0016] 210. Moving part, 220. Driving part, 211. Moving block, 212. High-precision guide rail, 213. Anti-collision fixing block, 214. Anti-collision rubber, 215. Anti-collision block, 216. Oil receiving box, 221. Ball screw, 222. Ball screw nut bracket, 223. Motor fixing seat, 224. Servo motor, 225. Coupling, 310. Exposure part mounting plate, 320. Upper exposure part, 330. Lower exposure part. Detailed implementation mode

[0017] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present invention without creative efforts shall fall within the protection scope of the present invention.

[0018] In the description of the embodiments of the present invention, it should be noted that the orientation or positional relationship indicated by the terms "inside", "outside", "above", etc. is based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship in which the product of the present invention is usually placed during use. It is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation to the present invention.

[0019] Such as Figure 1As shown in the figure, the embodiment of the utility model includes a support base 100. The cross-sectional shape of the support base 100 is a horizontally placed U shape. Its bottom end is fixedly connected to the platform of the laser direct writing exposure device, and its top side is connected with a vertical adjustment component 200 by screws. The side of the vertical adjustment component 200 is connected with an exposure component 300 by screws. Specifically, the exposure part mounting plate 310 is connected with the vertical adjustment component 200 by screws. The exposure component 300 includes an upper exposure part 320 and a lower exposure part 330. The upper exposure part 320 is connected with the vertical adjustment component 200 through the exposure part mounting plate 310. The lower exposure part 330 is fixedly connected to the top surface of the bottom end of the support base 100. A substrate 400 is placed between the upper and lower exposure parts. The outer layer of the substrate 400 is provided with marking points. Both the upper and lower exposure parts are composed of six exposure heads and their axes are parallel. The exposure heads of the upper exposure part 320 position the substrate 400 through the outer layer marking points. Since the axis of the lower exposure part 330 is parallel to the axis of the upper exposure part 320 and their relative positions in the horizontal plane projection remain unchanged, after the upper exposure part 320 positions the outer layer of the substrate 400, the lower exposure part 330 can also position the inner layer of the substrate 400 accordingly and perform double-sided exposure processing on it.

[0020] As Figure 2 As shown in the figure, the embodiment of the vertical adjustment component 200 of the utility model includes two moving parts 210 fixedly connected to the top side of the support base 100, and a driving part 220 on the same side as the moving part 210. The driving part 220 includes a motor fixing seat 223 fixed on the support base 100. The motor fixing seat 223 can fix the servo motor 224 on the support base 100 and ensure that the axis of the servo motor 224 is always perpendicular to the substrate 400. The power end of the servo motor 224 faces upward, and it is connected to the top end of the ball screw 221 through a coupling 225. The top end of the ball screw 221 is fixedly connected with a ball screw nut bracket 222, so that the rotation of the servo motor 224 can be converted into the up and down movement of the ball screw nut bracket 222.

[0021] In addition, the moving member 210 includes two high-precision guide rails 212 fixedly connected to the side surfaces of the top end of the support base 100. The length direction of the high-precision guide rails 212 is perpendicular to the substrate 400, and an oil receiving box 216 is fixed to the bottom thereof to prevent the lubricating oil of the high-precision guide rails 212 from dripping onto the substrate 400. Secondly, a moving block 211 is slidably connected to the high-precision guide rails 212. Two anti-collision fixing blocks 213 are arranged at the middle position between the two moving blocks 211. The distance between the two anti-collision fixing blocks 213 is greater than the limit position distance formed up and down by the ball screw nut bracket 222. Anti-collision rubbers 214 are fixedly connected to the opposite surfaces of the two anti-collision fixing blocks 213 respectively. The anti-collision rubbers 214 are arranged in a cylindrical shape to facilitate absorbing impacts. An anti-collision block 215 is placed at the middle position of the anti-collision rubbers 214. The anti-collision block 215 and the moving block 211 are fixed into an integral structure through the exposure member mounting plate 310, so that the driving member 220 can drive the upper exposure member 320 to move up and down along the high-precision guide rails 212, and further adjust the distance between the upper exposure member 320 and the outer layer of the substrate 400, so as to adapt to substrates 400 of different thicknesses.

[0022] Although the embodiments of the present invention have been shown and described, those of ordinary skill in the art can understand that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principle and spirit of the present invention. The scope of the present invention is defined by the appended claims and their equivalents.

[0023] The technologies, shapes and structures not described in detail in the present invention are all well-known technologies.

Claims

1. A vertically adjustable double-sided exposure platform, characterized in that: include: Support base (100); A vertical adjustment assembly (200) disposed on the support base (100), the vertical adjustment assembly (200) comprising a moving part (210); An exposure component (300) comprises an exposure component mounting plate (310) arranged on the moving component (210), and the exposure component mounting plate (310) can follow the moving component (210) to move in a vertical direction.

2. The double-sided exposure platform according to claim 1, characterized in that: The vertical adjustment assembly (200) further comprises a driving member (220), wherein the driving member (220) and the movable member (210) form an integral structure via the exposure member mounting plate (310), and the driving member (220) can drive the movable member (210) and the exposure member mounting plate (310) to move in a vertical direction.

3. The double-sided exposure platform according to claim 2, characterized in that: The moving member (210) comprises: A high-precision guide rail (212) is arranged on the support base (100), wherein the length direction of the high-precision guide rail (212) is the moving direction of the upper exposure component mounting plate (310); A moving block (211) disposed on the high-precision guide rail (212), the moving block (211) being capable of moving along the length direction of the high-precision guide rail (212); an anti-collision block (215) disposed together with the moving block (211) on the exposure component mounting plate (310); at least two anti-collision fixing blocks (213) arranged on the support base (100), the distance between the anti-collision fixing blocks (213) being at least greater than the up and down travel of the anti-collision block (215); and An anti-collision rubber (214) is arranged at one end on the anti-collision fixing block (213), and the other end of the anti-collision rubber (214) is in contact with the anti-collision block (215).

4. The double-sided exposure platform according to claim 3, characterized in that: The driving member (220) comprises: a servo motor (224) disposed on the same side of the support base (100) and the moving member (210); A ball screw (221) is arranged at one end of the power end of the servo motor (224), and the ball screw (221) is placed vertically and parallel to the length direction of the high-precision guide rail (212).

5. The double-sided exposure platform according to claim 4, characterized in that: The other end of the ball screw (221) is arranged on the bottom surface of the exposure component mounting plate (310), and the ball screw (221) can drive the exposure component (300) to move vertically.

6. The double-sided exposure platform according to claim 1, characterized in that: The exposure assembly (300) further comprises: an upper exposure member (320) connected to the moving member (210), the upper exposure member (320) being composed of six exposure heads; and A lower exposure unit (330) is arranged on the support base (100), and the lower exposure unit (330) is composed of six exposure heads.

7. The double-sided exposure platform according to claim 6, characterized in that: The axis of the upper exposure member (320) is parallel to the axis of the lower exposure member (330), and the relative positions of their projections on the bottom surface of the support base (100) remain unchanged.

8. A laser direct writing exposure device, characterized in that: The laser direct writing exposure device is equipped with the double-sided exposure platform described in any one of claims 1 to 7.

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