Hydrogen production system

Abstract

The hydrogen production system comprises a gas-liquid separator, a liquid level sensing assembly and a flushing pipeline, the first end and the second end of the liquid level sensing assembly communicate with the gas-liquid separator through a first pipeline and a second pipeline correspondingly, the second pipeline is located at the downstream of the first pipeline, and the flushing pipeline is located at the downstream of the second pipeline. One end of the flushing pipeline is connected with the second pipeline, and the other end of the flushing pipeline is suitable for being connected with a flushing medium. Therefore, the flushing pipeline is arranged and can be used for flushing at least partial area of the second pipeline, so that the probability of blockage of the second pipeline can be reduced, the measurement precision and accuracy of the liquid level sensing assembly are improved, and the safety of the hydrogen production system is improved; and the manual flushing frequency can be reduced, and even manual flushing is not needed, so that the maintenance difficulty of the hydrogen production system is reduced, and the maintenance cost is reduced.

Description

Technical Field

[0001] The present invention relates to the technical field of hydrogen production, and in particular to a hydrogen production system. Background Art

[0002] In the related art, during the process of hydrogen production by electrolyzing water, nickel metal on the electrodes will fall off to generate metal powder, and a small amount of fiber tissue in the diaphragm will also fall off into the electrolyte. With the circulation of the electrolyte, the metal powder and the limiting tissue will deposit to form flocculent precipitates and accumulate in the pipeline, resulting in pipeline blockage, reducing the measurement accuracy of the instrument, affecting the system safety, and the operation of manually flushing the pipeline is difficult and has a large workload. Summary of the Invention

[0003] The present invention aims to at least solve one of the technical problems existing in the prior art. For this purpose, the object of the present invention is to provide a hydrogen production system, which can flush the pipeline, reduce the probability of pipeline blockage, improve the system safety, and at the same time, without manual flushing of the pipeline, reduce the workload and cost.

[0004] The hydrogen production system according to an embodiment of the present application includes: a gas-liquid separator, a liquid level sensing assembly, and a flushing pipeline. The first end and the second end of the liquid level sensing assembly are respectively connected to the gas-liquid separator through a first pipeline and a second pipeline. The second pipeline is located downstream of the first pipeline. One end of the flushing pipeline is connected to the second pipeline, and the other end of the flushing pipeline is adapted to access a flushing medium.

[0005] The hydrogen production system according to an embodiment of the present application, by setting a flushing pipeline and enabling the flushing pipeline to flush at least a part of the second pipeline, can not only reduce the probability of blockage of the second pipeline, improve the measurement accuracy and accuracy of the liquid level sensing assembly, thereby improving the safety of the hydrogen production system, but also reduce the number of manual flushes, or even eliminate the need for manual flushing, so as to reduce the maintenance difficulty of the hydrogen production system and reduce the maintenance cost.

[0006] According to some embodiments of the present application, the hydrogen production system further includes: a first valve, which is arranged on the second pipeline and is located between the flushing pipeline and the liquid level sensing assembly.

[0007] According to some embodiments of the present application, the hydrogen production system further includes: a first sewage pipeline, one end of which is connected to the second pipeline through a three-way valve, and the other end of the first sewage pipeline is configured as a first sewage outlet.

[0008] According to some embodiments of the present application, the hydrogen production system further includes: a second valve, which is arranged on the second pipeline and is located between the flushing pipeline and the liquid level sensing assembly.

[0009] According to some embodiments of the present application, the hydrogen production system further includes: a second blowdown pipeline, one end of the second blowdown pipeline is connected to the second pipeline, and the other end of the second blowdown pipeline is configured as a second blowdown port;

[0010] Or the hydrogen production system further includes: a third valve, the third valve is arranged on the second pipeline and is located between the gas-liquid separator and the flushing pipeline.

[0011] According to some embodiments of the present application, the liquid level sensing assembly includes a first liquid level sensing element and a second liquid level sensing element, the first liquid level sensing element is configured as a liquid level gauge, and the second liquid level sensing element is configured as a differential pressure liquid level gauge.

[0012] According to some embodiments of the present application, the other end of the flushing pipeline is connected to a flushing source.

[0013] According to some embodiments of the present application, the flushing medium is deionized water or an inert gas.

[0014] According to some embodiments of the present application, a medium pump or a medium compressor is further arranged in the flushing pipeline, and the medium pump or the medium compressor is suitable for supplying the flushing medium to the second pipeline.

[0015] According to some embodiments of the present application, there are two gas-liquid separators, which are respectively configured as a hydrogen separator and an oxygen separator. The liquid level sensing assembly includes a first sensing group corresponding to the hydrogen separator and a second sensing group corresponding to the oxygen separator. The flushing pipeline includes a first flushing flow path corresponding to the hydrogen separator and a second flushing flow path corresponding to the oxygen separator.

[0016] Additional aspects and advantages of the present invention will be given in part in the following description, become apparent in part from the following description, or be learned through the practice of the present invention. Description of the Drawings

[0017] The above and / or additional aspects and advantages of the present invention will become apparent and be readily understood from the description of the embodiments in conjunction with the following drawings, wherein:

[0018] Figure 1 is a schematic diagram according to the first embodiment of the present application (using a liquid medium);

[0019] Figure 2 is another schematic diagram according to the first embodiment of the present application (using a gas medium);

[0020] Figure 3 is a schematic diagram according to the second embodiment of the present application (using a liquid medium);

[0021] Figure 4 Another schematic diagram (using a gas medium) according to the second embodiment of the present application.

[0022] Reference numerals:

[0023] Hydrogen production system 100,

[0024] Gas-liquid separator 10, mixture inlet 11,

[0025] Liquid level gauge 21, differential pressure liquid level gauge 22,

[0026] First pipeline 30, second pipeline 40, first sewage discharge pipeline 50, first sewage discharge port 51, three-way valve 60, flushing pipeline 70, second sewage discharge pipeline 80, second sewage discharge port 81,

[0027] First valve 101, second valve 102, third valve 103,

[0028] Gas source 201, liquid source 202, medium pump 203, medium compressor 204, fourth valve 205, check valve 206. Detailed implementation manners

[0029] To make the objectives, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly described below with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are some, but not all, of the embodiments of the present application. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present application without creative efforts shall fall within the scope of protection of the present application.

[0030] Unless otherwise defined, all technical and scientific terms used in the present application have the same meanings as those commonly understood by those skilled in the technical field to which the present application belongs; the terms used in the specification of the present application are only for the purpose of describing specific embodiments and are not intended to limit the present application; the terms "including" and "having" and any variations thereof in the specification and claims of the present application and the above accompanying drawings are intended to cover non-exclusive inclusion. The terms "first", "second", etc. in the specification and claims of the present application or the above accompanying drawings are used to distinguish different objects and are not used to describe a specific order or primary-secondary relationship.

[0031] Referring to "embodiment" in the present application means that a specific feature, structure or characteristic described in connection with the embodiment may be included in at least one embodiment of the present application. The phrase appears in various places in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment mutually exclusive with other embodiments.

[0032] In the description of the present application, it should be noted that unless otherwise clearly specified and defined, the terms "installed", "connected", "joined", and "attached" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the communication inside two components. For those of ordinary skill in the art, the specific meanings of the above terms in the present application can be understood according to specific circumstances.

[0033] The term "and / or" in the present application is merely an associative relationship describing the associated objects, indicating that three relationships can exist. For example, A and / or B can represent: A exists alone, A and B exist simultaneously, and B exists alone. In addition, the character " / " in the present application generally represents an "or" relationship between the associated objects before and after.

[0034] In the embodiments of the present application, the same reference numerals represent the same components, and for the sake of brevity, in different embodiments, the detailed descriptions of the same components are omitted. It should be understood that the thickness, length, width, etc. of various components in the embodiments of the present application shown in the drawings, as well as the overall thickness, length, width, etc. of the integrated device, are only illustrative and should not constitute any limitation to the present application.

[0035] In the description of the present invention, it should be understood that the orientation or positional relationship indicated by the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as a limitation to the present invention.

[0036] In the description of the present invention, the first feature being "above" or "below" the second feature may include the direct contact between the first and second features, or may include the situation where the first and second features are not in direct contact but in contact through other features therebetween.

[0037] In the description of the present invention, the first feature being "above", "over", and "on" the second feature includes the first feature being directly above and obliquely above the second feature, or merely indicating that the horizontal height of the first feature is higher than that of the second feature.

[0038] The term "a plurality of" appearing in the present application refers to two or more (including two).

[0039] Next, refer to Figures 1 - 4Describe the hydrogen production system 100 according to an embodiment of the present invention.

[0040] Refer to Figure 1 、 Figure 2 、 Figure 3 and Figure 4 As shown, the hydrogen production system 100 according to an embodiment of the present application includes: a gas-liquid separator 10, a liquid level sensing assembly, and a flushing pipeline 70.

[0041] Wherein, the first end and the second end of the liquid level sensing assembly are respectively communicated with the gas-liquid separator 10 through a first pipeline 30 and a second pipeline 40. The second pipeline 40 is located downstream of the first pipeline 30. One end of the flushing pipeline 70 is connected to the second pipeline 40, and the other end of the flushing pipeline 70 is adapted to access a flushing medium.

[0042] Specifically, the gas-liquid separator 10 has a mixture inlet 11. When the hydrogen production system 100 operates, the metal powder and diaphragm fibers in the electrolyte will circulate with the electrolyte and enter the gas-liquid separator 10 through the mixture inlet 11. For example, a hydrogen-alkali mixture or an oxygen-alkali mixture enters the gas-liquid separator 10 and deposits to form flocculent impurities in the gas-liquid separator 10. When flushing is required, the hydrogen production system 100 is controlled to stop and depressurize. After standing for a period of time, the flushing pipeline 70 can be opened. The flushing pipeline 70 is connected to the second pipeline 40, and the first pipeline 30 and the second pipeline 40 are respectively connected to the first end and the second end of the liquid level sensing assembly. The second pipeline 40 is located downstream of the first pipeline 30, so that the flushing pipeline 70 can be in the downstream area of the liquid level sensing assembly to flush at least part of the second pipeline 40 in the downstream area of the liquid level sensing assembly, thereby reducing the probability of blockage of the pipeline where the liquid level sensing assembly is located, ensuring the measurement accuracy of the liquid level sensing assembly, improving the safety of the hydrogen production system 100, and reducing the number of times of manual pipeline flushing. Even without manual pipeline flushing, the maintenance difficulty of the hydrogen production system 100 can be reduced, and the maintenance cost can be reduced.

[0043] According to the hydrogen production system 100 of the embodiment of the present application, by setting the flushing pipeline 70 and enabling the flushing pipeline 70 to flush at least part of the second pipeline 40, not only can the probability of blockage of the second pipeline 40 be reduced, the measurement accuracy and accuracy of the liquid level sensing assembly be improved, thereby improving the safety of the hydrogen production system 100, but also the number of manual flushing times can be reduced, or even no manual flushing is required, so as to reduce the maintenance difficulty of the hydrogen production system 100 and reduce the maintenance cost.

[0044] According to some embodiments of the present application, the hydrogen production system 100 further includes a first valve 101. The first valve 101 is disposed on the second pipeline 40 and is located between the flushing pipeline 70 and the liquid level sensor.

[0045] Thus, during the flushing process, the first valve 101 can be closed, thereby avoiding the probability of the medium entering the liquid level sensing component during the impurity flushing process, improving the flushing effect, and avoiding damage to the instrument or affecting the startup of the subsequent hydrogen production system 100 during the flushing process, further improving the safety and reliability of the hydrogen production system 100.

[0046] In some embodiments, such as Figure 1 and Figure 2 shown, in the first and second embodiments, the hydrogen production system 100 further includes: a first sewage pipeline 50, one end of the first sewage pipeline 50 is connected to the second pipeline 40 through a three-way valve 60, and the other end of the first sewage pipeline 50 is configured as a first sewage outlet 51.

[0047] Thus, the first sewage pipeline 50, the second pipeline 40, the three-way valve 60, and the first sewage outlet 51 can define an impurity discharge path, and the impurities in the second pipeline 40 can be discharged through this impurity discharge path, improving the impurity discharge efficiency.

[0048] Such as Figure 3 and Figure 4 shown, further, the hydrogen production system 100 further includes a second valve 102 and a second sewage pipeline 80. The second valve 102 is arranged on the second pipeline 40 and is located between the flushing pipeline 70 and the liquid level sensing component. One end of the second sewage pipeline 80 is connected to the second pipeline 40, and the other end of the second sewage pipeline 80 is configured as a second sewage outlet 81.

[0049] Thus, the impurities deposited in the second pipeline 40 of the liquid level sensing component can also be discharged through the impurity discharge path formed by the second sewage pipeline 80, the second sewage outlet 81, and the second pipeline 40. While improving the impurity discharge efficiency, it can also avoid impurities entering the liquid level sensing component during the impurity flushing process, improve the flushing effect, and avoid damage to the instrument or affecting the startup of the subsequent hydrogen production system 100 during the flushing process, further improving the safety and reliability of the hydrogen production system 100.

[0050] It can be understood that the liquid level sensing assembly may include a first liquid level sensing element and a second liquid level sensing element. In some specific embodiments, the first liquid level sensing element may be configured as a liquid level gauge 21, and the second liquid level sensing element may be configured as a differential pressure liquid level gauge 22. Both the liquid level gauge 21 and the differential pressure liquid level gauge 22 can achieve impurity flushing through the second pipeline 40. The second pipeline 40 of the liquid level gauge 21 can be connected to the gas-liquid separator 10 so that impurities in the second pipeline 40 of the liquid level gauge 21 can be discharged into the gas-liquid separator 10 to reduce the probability of blockage and failure of the liquid level gauge 21. The second pipeline 40 of the differential pressure liquid level gauge 22 can be connected to the first sewage discharge pipeline 50 to achieve impurity discharge through the first sewage discharge pipeline 50. The second sewage discharge pipeline 80 is an existing sewage discharge pipeline of the hydrogen production system 100, which can achieve flushing and impurity discharge of the gas-liquid separator 10. The impurities discharged from the liquid level gauge 21 into the gas-liquid separator 10 can be discharged together when the gas-liquid separator 10 is flushed through the second sewage discharge pipeline 80, or can be stored in the gas-liquid separator 10 first.

[0051] It should be noted that in some embodiments, the differential pressure liquid level gauge 22 can achieve impurity discharge through the first sewage discharge pipeline 50. In other embodiments, the differential pressure liquid level gauge 22 can achieve impurity discharge through the second sewage discharge pipeline 80, that is, the second sewage discharge pipeline 80 can be reused to reduce the cost of the hydrogen production system 100.

[0052] Specifically, as Figure 1 and Figure 2 shown in the first embodiment, the differential pressure liquid level gauge 22 achieves impurity flushing through the first sewage discharge pipeline 50 and the first sewage discharge port 51. As Figure 3 and Figure 4 shown, in the second embodiment, the hydrogen production system 100 is further provided with a third valve 103. The third valve 103 is arranged on the second pipeline 40 of the differential pressure liquid level gauge 22 and is located between the gas-liquid separator 10 and the flushing pipeline 70, so that impurities in the second pipeline 40 of the differential pressure liquid level gauge 22 can be discharged through the second sewage discharge port 81, and at the same time, impurities in the second pipeline 40 of the differential pressure liquid level gauge 22 can be prevented from flowing back into the interior of the gas-liquid separator 10 to improve the flushing effect.

[0053] As Figure 1 、 Figure 2 、 Figure 3 and Figure 4 shown, according to some embodiments of the present application, the other end of the flushing pipeline 70 is provided with a flushing source. The flushing source can be configured as a gas source 201 or a liquid source 202 to provide a liquid medium or a gas medium, and is supplied to the first branch of the corresponding differential pressure liquid level gauge 22 and the second branch of the corresponding liquid level gauge 21 through a medium pump 203 or a medium compressor 204.

[0054] Specifically, inFigure 1 and Figure 3 In the embodiment shown, the flushing source is configured as the liquid source 202, and the liquid medium is supplied to the first branch and the second branch through the medium pump 203, and the reverse flushing of the second pipeline 40 where the liquid level sensing assembly is located is realized through the liquid medium. While in Figure 2 and Figure 4 In the embodiment shown, the flushing source is configured as the gas source 201, and it can be supplied to the first branch and the second branch through the medium compressor 204, and the reverse purging of the second pipeline 40 where the liquid level sensing assembly is located is realized through the gas medium.

[0055] According to some embodiments of the present application, the flushing pipeline 70 further includes a fourth valve 205 and a check valve 206. The fourth valve 205 and the check valve 206 are connected in sequence. The fourth valve 205 controls the connection between the check valve 206 and the medium pump 203 or the medium compressor 204. The check valve 206 prevents backflow to improve the flushing effect of the flushing pipeline 70 and improve its flushing stability, and prevent the medium compressor 204 and the medium source from being contaminated.

[0056] It can be understood that the liquid level sensing assembly includes a differential pressure liquid level gauge 22 and a liquid level gauge 21. The gas-liquid separator 10 has a mixture inlet 11. Both the first pipeline 30 and the second pipeline 40 of the differential pressure liquid level gauge 22 are connected to the gas-liquid separator 10. Both the first pipeline 30 and the second pipeline 40 of the liquid level gauge 21 are also connected to the gas-liquid separator 10. The flushing pipeline 70 can have a first branch and a second branch. The first branch is arranged between the second pipeline 40 of the liquid level gauge 21 and the gas-liquid separator 10 and is connected to the second pipeline 40, and is adapted to flush impurities in the pipeline (i.e., at least part of the pipe section in the second pipeline 40) where the liquid level gauge 21 is connected to the gas-liquid separator 10. The second branch is arranged between the second pipeline 40 of the differential pressure liquid level gauge 22 and the gas-liquid separator 10, and is adapted to flush impurities in the pipeline (i.e., at least part of the pipe section of the second pipeline 40) where the differential pressure liquid level gauge 22 and the liquid level gauge 21 are connected to the gas-liquid separator 10.

[0057] It can be understood that the hydrogen production system 100 includes a hydrogen side and an oxygen side, and the above structure correspondingly includes a hydrogen side structure and an oxygen side structure. For example, the gas-liquid separator 10 is configured as an oxygen separator or a hydrogen separator, the differential pressure liquid level gauge 22 is configured as an oxygen side differential pressure liquid level gauge and a hydrogen side differential pressure liquid level gauge, and the liquid level gauge 21 is configured as an oxygen side liquid level gauge or a hydrogen side liquid level gauge. That is, the second sensing group on the oxygen side includes: an oxygen side differential pressure liquid level gauge and an oxygen side liquid level gauge, and the first sensing group on the hydrogen side includes: a hydrogen side differential pressure liquid level gauge and a hydrogen side liquid level gauge. And the first flushing flow path is the flushing pipeline 70 on the hydrogen side, and the second flushing flow path is the flushing pipeline 70 on the oxygen side.

[0058] Next, with reference to Figures 1 - 4 The working process of the hydrogen production system 100 according to the embodiments of the present application will be specifically described.

[0059] First, the hydrogen-alkali mixture enters the hydrogen-side gas-liquid separator 10 through the hydrogen-side mixture inlet 11, and the oxygen-alkali mixture enters the oxygen-side gas-liquid separator 10 through the oxygen-side mixture inlet 11, and flocculent impurities are deposited therein.

[0060] As Figure 1 shown, when the hydrogen production system shuts down and depressurizes and stands for a period of time, the first oxygen-side valve, the second oxygen-side valve, the first hydrogen-side valve, and the second hydrogen-side valve are closed, and the fourth oxygen-side valve, the fourth hydrogen-side valve are opened, and the medium pump is started. The flushing medium can be deionized water. Driven by the medium pump, the deionized water flushes the flocculent metal powder and other impurities deposited in the pipelines where the hydrogen-side differential pressure liquid level gauge and the oxygen-side differential pressure liquid level gauge are located into the first hydrogen-side sewage pipeline and the first oxygen-side sewage pipeline respectively. At the same time, the flocculent metal powder impurities deposited in the pipelines of the hydrogen-side liquid level gauge and the oxygen-side liquid level gauge can be flushed into the hydrogen-side gas-liquid separator and the oxygen-side gas-liquid separator to complete the flushing operation.

[0061] Among them, the deionized water source and the medium pump can be set separately or the makeup water branch pipeline of the hydrogen production system can be used.

[0062] As Figure 2 shown, when the hydrogen production system shuts down and depressurizes and stands for a period of time, the first oxygen-side valve, the second oxygen-side valve, the first hydrogen-side valve, and the second hydrogen-side valve are closed, and the fourth oxygen-side valve, the fourth hydrogen-side valve are opened, and the medium compressor is started. The flushing medium can be inert gas. Driven by the medium compressor, the inert gas flushes the flocculent metal powder and other impurities deposited in the pipelines where the hydrogen-side differential pressure liquid level gauge and the oxygen-side differential pressure liquid level gauge are located into the first hydrogen-side sewage pipeline and the first oxygen-side sewage pipeline respectively. At the same time, the flocculent metal powder impurities deposited in the pipelines of the hydrogen-side liquid level gauge and the oxygen-side liquid level gauge can be flushed into the hydrogen-side gas-liquid separator and the oxygen-side gas-liquid separator to complete the flushing operation.

[0063] As Figure 3 shown, when the hydrogen production system shuts down and depressurizes and stands for a period of time, the first oxygen-side valve, the second oxygen-side valve, the third oxygen-side valve, the first hydrogen-side valve, the second hydrogen-side valve, and the third hydrogen-side valve are closed, and the fourth oxygen-side valve, the fourth hydrogen-side valve are opened, and the medium pump is started. The flushing medium can be deionized water. Driven by the medium pump, the deionized water flushes the flocculent metal powder and other impurities deposited in the pipelines where the hydrogen-side differential pressure liquid level gauge and the oxygen-side differential pressure liquid level gauge are located into the second hydrogen-side sewage pipeline and the second oxygen-side sewage pipeline respectively. At the same time, the flocculent metal powder impurities deposited in the pipelines of the hydrogen-side liquid level gauge and the oxygen-side liquid level gauge can be flushed into the hydrogen-side gas-liquid separator and the oxygen-side gas-liquid separator to complete the flushing operation.

[0064] Among them, the deionized water source and the medium pump can be set separately or the makeup water branch pipeline of the hydrogen production system can be used.

[0065] As Figure 4 shown, when the hydrogen production system shuts down and depressurizes, and stands still for a period of time, close the first oxygen-side valve, the second oxygen-side valve, the third oxygen-side valve, the first hydrogen-side valve, the second hydrogen-side valve, and the third hydrogen-side valve, and open the fourth oxygen-side valve, the fourth hydrogen-side valve, and start the medium compressor. The flushing medium can be an inert gas. Driven by the medium pump, the inert gas flushes the flocculent metal powder and other impurities deposited in the pipelines where the differential pressure liquid level gauges on the hydrogen side and the oxygen side are located into the second hydrogen-side sewage pipeline and the second oxygen-side sewage pipeline respectively. At the same time, the flocculent metal powder impurities deposited in the pipelines of the hydrogen-side liquid level gauge and the oxygen-side liquid level gauge can be flushed into the hydrogen-side gas-liquid separator and the oxygen-side gas-liquid separator to complete the flushing operation.

[0066] Other components and operations of the hydrogen production system 100 according to the embodiments of the present invention are known to those of ordinary skill in the art and will not be described in detail here.

[0067] In the description of this specification, the descriptions referring to terms such as "one embodiment", "some embodiments", "schematic embodiments", "examples", "specific examples", or "some examples" etc. mean that the specific features, structures, materials, or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic descriptions of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described can be combined in a suitable manner in any one or more embodiments or examples.

[0068] Although the embodiments of the present invention have been shown and described, those of ordinary skill in the art can understand that various changes, modifications, substitutions, and variations can be made to these embodiments without departing from the principles and spirit of the present invention. The scope of the present invention is defined by the claims and their equivalents.

Claims

1. A hydrogen production system, characterized in that: include: Gas-liquid separator (10); a liquid level sensor assembly, wherein a first end and a second end of the liquid level sensor assembly are connected to the gas-liquid separator (10) through a first pipeline (30) and a second pipeline (40) respectively, and the second pipeline (40) is located downstream of the first pipeline (30); A flushing pipeline (70), one end of which is connected to the second pipeline (40), and the other end of which is suitable for receiving a flushing medium.

2. The hydrogen production system according to claim 1, characterized in that: Also includes: A first valve (101), the first valve (101) is arranged in the second pipeline (40), and is located between the flushing pipeline (70) and the liquid level sensor assembly.

3. The hydrogen production system according to claim 2, characterized in that: Also includes: A first sewage discharge pipeline (50), one end of which is connected to the second pipeline (40) via a three-way valve (60), and the other end of which is configured as a first sewage discharge port (51).

4. The hydrogen production system according to claim 3, characterized in that: Also includes: A second valve (102), wherein the second valve (102) is arranged in the second pipeline (40) and is located between the flushing pipeline (70) and the liquid level sensing assembly.

5. The hydrogen production system according to claim 4, characterized in that: Also includes: a second sewage discharge pipeline (80), one end of the second sewage discharge pipeline (80) being connected to the second pipeline (40), and the other end of the second sewage discharge pipeline (80) being configured as a second sewage discharge port (81); Or it further comprises: a third valve (103), wherein the third valve (103) is arranged in the second pipeline (40) and is located between the gas-liquid separator (10) and the flushing pipeline (70).

6. The hydrogen production system according to claim 2, characterized in that: The liquid level sensing assembly comprises a first liquid level sensing component and a second liquid level sensing component, wherein the first liquid level sensing component is configured as a liquid level gauge (21), and the second liquid level sensing component is configured as a differential pressure liquid level gauge (22).

7. The hydrogen production system according to claim 1, characterized in that: The other end of the flushing pipeline (70) is connected to a flushing source.

8. The hydrogen production system according to any one of claims 1 to 7, characterized in that: The flushing medium is deionized water or inert gas.

9. The hydrogen production system according to claim 8, characterized in that: A medium pump (203) or a medium compressor (204) is also provided in the flushing pipeline (70), and the medium pump (203) or the medium compressor (204) is suitable for supplying the flushing medium to the second pipeline (40).

10. The hydrogen production system according to claim 1, characterized in that: There are two gas-liquid separators (10), which are respectively configured as a hydrogen separator and an oxygen separator; the liquid level sensor assembly comprises a first sensor group corresponding to the hydrogen separator and a second sensor group corresponding to the oxygen separator; and the flushing pipeline (70) comprises a first flushing flow path corresponding to the hydrogen separator and a second flushing flow path corresponding to the oxygen separator.

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