Plasma polishing equipment

Abstract

The utility model discloses plasma polishing equipment, which relates to the technical field of metal polishing equipment and comprises a casing, the casing is provided with a reaction cavity, a solvent cavity and an electric appliance cavity, the solvent cavity is provided with at least one group of polishing liquid tanks, and the polishing liquid tanks are communicated with the reaction cavity through pipelines; the hanger lifting mechanism comprises a hanger assembly and a lifting assembly arranged in the electric appliance cavity; the pH probe mechanism is arranged in the electric appliance cavity and extends into the reaction cavity; and the door opening mechanism is slidably connected to the opening of the reaction cavity. According to the plasma polishing equipment, the reaction cavity, the solvent cavity and the electric appliance cavity are integrated in the machine shell, all electric appliance elements are installed in the electric appliance cavity, a workpiece is immersed in a solution of the reaction cavity through the hanging frame lifting mechanism, and efficient polishing operation of the workpiece is achieved in cooperation with the pH probe mechanism and the door opening mechanism. The whole process is low in energy consumption and high in safety coefficient, the whole equipment is manufactured in a miniaturized mode, the requirement for small-scale production can be well met, and market popularization is facilitated.

Description

Technical Field

[0001] The utility model relates to the technical field of metal polishing equipment, and particularly relates to a plasma polishing equipment. Background Art

[0002] Electrolyte plasma polishing is an efficient and environmentally friendly metal surface treatment technology. It applies an electric field in an electrolyte solution to make the metal surface react with the plasma in the electrolyte solution, thereby achieving surface polishing and removal. It is widely used in the fields of microelectronics, optics, semiconductors, etc. to improve the quality and smoothness of the metal surface and enhance the performance and reliability of materials.

[0003] The polishing liquid used in electrolyte plasma polishing is a low-concentration neutral salt solution. Compared with the acidic or alkaline solutions used in traditional electrolytic polishing, its waste liquid is easier to treat, reducing environmental pollution. The electrolyte plasma polishing technology has obvious advantages over traditional electrolytic polishing in terms of environmental protection, efficiency, material consumption, applicability, surface quality, and operation simplicity.

[0004] CN202311481979.4 discloses an electrolyte plasma polishing equipment and a polishing method for the inner wall of an open cylindrical body. The electrolyte plasma polishing equipment for the inner wall of an open cylindrical body has an adjustment mode, including: a conveying device; an electrolyte plasma polishing device, including a first clamping part and a cathode rod; a simulation electrode device, including a simulation rod with the same top surface height as the top surface of the cathode rod during polishing work; and a transfer device including a second clamping part.

[0005] Existing plasma polishing equipment is usually built as large-scale polishing equipment for use in large-scale production lines. However, large-scale equipment has a high cost, occupies a large area, and has high usage costs, and is only suitable for professional manufacturers with a certain production scale. For the small-batch production and factory building area of small enterprises, the existing plasma polishing equipment cannot meet the production and usage needs of small enterprises due to its usage costs and equipment floor area, etc., resulting in the incomplete popularization of environmental protection technology. Summary of the Utility Model

[0006] The utility model aims to at least solve the technical problem of "the existing equipment is large-scale polishing equipment for large-scale production lines, with high cost, large floor area, high usage costs, and unable to meet the production and usage needs of small enterprises" in the existing technology. For this reason, the utility model proposes a plasma polishing equipment, which adopts a highly integrated design to realize the miniaturization of the electrolyte plasma polishing machine, effectively reduce the equipment manufacturing cost, and the integrated design effectively reduces the floor area of the equipment. Lower costs and smaller volume meet the production needs of small enterprises, which is conducive to the popularization of environmental protection polishing technology.

[0007] The plasma polishing equipment according to some embodiments of the utility model includes:

[0008] A casing, the casing is provided with a reaction chamber, a solvent chamber and an electrical chamber, the solvent chamber is provided with at least one polishing liquid tank, the polishing liquid tank is communicated with the reaction chamber through a pipeline, and a liquid level sensor is arranged in the polishing liquid tank;

[0009] A hanging rack lifting mechanism, the hanging rack lifting mechanism includes a hanging rack assembly and a lifting assembly arranged in the electrical chamber, one end of the hanging rack assembly is connected with the lifting assembly, and the other end extends into the reaction chamber, and the lifting assembly is used to drive the hanging rack assembly to approach or move away from the liquid surface of the reaction chamber;

[0010] A pH probe mechanism, which is arranged in the electrical chamber and extends into the reaction chamber to detect the real-time pH value in the reaction chamber;

[0011] A door opening mechanism, which is slidably connected to the opening of the reaction chamber and is used to close or open the reaction chamber;

[0012] A control component, which is arranged at the electrical chamber, and the control component is used to control the overall electrical control components of the equipment.

[0013] According to some embodiments of the present invention, a lifting groove is arranged in the reaction chamber corresponding to the lifting range of the hanging rack assembly, and the hanging rack assembly passes through the lifting groove from the electrical chamber and extends to the upper part of the middle of the reaction chamber.

[0014] According to some embodiments of the present invention, an installation part is arranged at the bottom of the hanging rack assembly, and a fixture for fixing a workpiece is detachably connected to the installation part; the control component is electrically connected to the lifting component to adjust the lifting range of the hanging rack assembly.

[0015] According to some embodiments of the present invention, the reaction chamber is divided into upper and lower layers of a waiting area and a reaction area, and the polishing liquid tank and an external inlet and outlet water pipeline are respectively communicated with the reaction area.

[0016] According to some embodiments of the present invention, a heating component electrically connected to the control component is arranged in the reaction area, and the heating component is coiled at the bottom of the reaction area and is used to adjust the solution temperature in the reaction area.

[0017] According to some embodiments of the present invention, the bottom of the reaction area is inclined from the middle to the outside.

[0018] According to some embodiments of the present invention, the door opening mechanism includes a slide rail door and a driving component, the driving component is arranged in the electrical chamber, the guide rail of the driving component extends to the reaction chamber, the slide rail door is connected to the guide rail of the driving component, and the driving component drives the slide rail door to open or close the reaction chamber.

[0019] According to some embodiments of the present utility model, the sliding rail door is made of a transparent material.

[0020] According to some embodiments of the present utility model, a probe tube is provided on the side wall of the reaction chamber. One end of the probe tube extends into the solution in the reaction chamber, and the other end extends into the electrical chamber. The pH probe mechanism is detachably installed at the end of the probe tube.

[0021] According to some embodiments of the present utility model, the control assembly includes a control panel, and the control panel is arranged on the side wall of the machine shell.

[0022] The plasma polishing equipment according to some embodiments of the present utility model has at least the following beneficial effects: The reaction chamber, the solvent chamber and the electrical chamber are integrated inside the machine shell. All electrical components are installed in the electrical chamber. The workpiece is immersed in the solution in the reaction chamber through the hanging rack lifting mechanism, and the high-efficiency polishing operation of the workpiece is realized in cooperation with the pH probe mechanism and the door opening mechanism. The whole process has low energy consumption and high safety factor, and the whole machine of the equipment is manufactured in a small size, which can well meet the needs of small-scale production and is conducive to market promotion.

[0023] The additional aspects and advantages of the present utility model will be partly given in the following description, partly will become obvious from the following description, or will be understood through the practice of the present utility model. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] The above and / or additional aspects and advantages of the present utility model will become obvious and easy to understand from the description of the embodiments in conjunction with the following drawings, wherein:

[0025] Figure 1 is the first three-dimensional schematic diagram of the plasma polishing equipment according to the embodiment of the present utility model;

[0026] Figure 2 is the second three-dimensional schematic diagram of the plasma polishing equipment according to the embodiment of the present utility model;

[0027] Figure 3 is the top partial schematic diagram of the plasma polishing equipment according to the embodiment of the present utility model;

[0028] Figure 4 is the cross-sectional view of the plasma polishing equipment according to the embodiment of the present utility model;

[0029] Figure 5 is the back partial schematic diagram of the plasma polishing equipment according to the embodiment of the present utility model;

[0030] Figure 6 is the schematic diagram of the protection mechanism of the plasma polishing equipment according to the embodiment of the present utility model.

[0031] Reference numerals:

[0032] The casing 100, reaction chamber 110, lifting groove 111, waiting area 112, reaction area 113, probe tube 114, solvent chamber 120, polishing liquid tank 121, electrical chamber 130, control cabinet 131,

[0033] Hanging rack assembly 220, sliding rail door 310, drive assembly 320, control panel 410. Specific embodiments

[0034] The embodiments of the present utility model will be described in detail below. The examples of the embodiments are shown in the drawings, where the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the drawings are exemplary and are only used to explain the present utility model and should not be construed as a limitation of the present utility model.

[0035] In the description of the present utility model, it should be understood that with regard to the orientation description, such as the orientation or positional relationship indicated by up, down, front, back, left, right, top, bottom, etc. is based on the orientation or positional relationship shown in the drawings. It is only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as a limitation of the present utility model.

[0036] In the description of the present utility model, the meaning of several is one or more, the meaning of multiple is two or more, greater than, less than, exceeding, etc. are understood as not including the present number, and above, below, within, etc. are understood as including the present number. If there is a description of first and second, it is only for the purpose of distinguishing technical features and should not be understood as indicating or implying relative importance or implicitly indicating the quantity of the indicated technical features or the sequence relationship of the indicated technical features.

[0037] In the description of the present utility model, unless otherwise clearly defined, words such as setting, installing, connecting, etc. should be understood in a broad sense, and those skilled in the art can reasonably determine the specific meanings of the above words in the present utility model in combination with the specific content of the technical solution.

[0038] Next, refer to Figures 1-6 Describe a plasma polishing device according to an embodiment of the present utility model.

[0039] As Figures 1-6 shown, the plasma polishing device of the present utility model is mainly used for the electrolyte plasma polishing process. In the electrolyte polishing process, it is necessary to control the pH value and reaction temperature of the solution at the set value according to the metal type, and then immerse the metal and energize it to achieve plasma polishing. This process is a well-known technical solution in the art and will not be elaborated in detail in this embodiment.

[0040] The plasma polishing equipment includes a machine housing 100, a hanger lifting mechanism, a pH probe mechanism, a door opening mechanism and a control component. Specifically, the machine housing 100 is internally provided with three parts: a reaction chamber 110, a solvent chamber 120 and an electrical chamber 130. The reaction chamber 110 is used as the main area for electrolyte plasma polishing reaction. The solvent chamber 120 is arranged above the reaction chamber 110 and is provided with at least one group of polishing liquid tanks 121. In this embodiment, two groups of polishing liquid tanks 121 are provided, and each group of polishing liquid tanks 121 is communicated with the reaction chamber 110 through a pipeline. The polishing liquid in the polishing liquid tank 121 enters the reaction chamber 110 along the pipeline by gravity, which is more convenient for feeding and effectively reduces the number of pump bodies. And a liquid level sensor (not shown in the drawings) is arranged in each group of polishing liquid tanks 121. The liquid level sensor can detect the real-time liquid level of the polishing liquid in the polishing liquid tank 121. The liquid level sensor is electrically connected with the control component, and the control component can feed back information to enable the staff to supplement the polishing liquid in time. The liquid level sensor is a well-known technical solution to those skilled in the art and will not be described in detail in this embodiment.

[0041] The hanger lifting mechanism includes a hanger assembly 220 and a lifting component (not shown in the drawings) arranged in the electrical chamber 130. One end of the hanger assembly 220 is connected with the lifting component, and the other end extends into the reaction chamber 110. The lifting component is used to drive the hanger assembly 220 to approach or move away from the liquid surface in the reaction chamber 110, so that the hangers and workpieces on the hanger assembly 220 are immersed below the liquid surface in the reaction chamber 110 to realize the plasma polishing process. The lifting component lifts and lowers in the reaction chamber 110, thereby driving the workpieces to soak in the solution and then energizing to realize the electrolyte plasma polishing of the workpieces.

[0042] The pH probe mechanism is arranged in the electrical chamber 130 and extends into the reaction chamber 110 to detect the real-time pH value in the reaction chamber 110. The pH probe mechanism cooperates with the control component to be able to monitor the pH value in the reaction chamber 110 in real time, accurately adjust the pH value of the polishing solution according to the requirements of different workpiece materials, and improve the polishing efficiency and polishing effect of the equipment.

[0043] The door opening mechanism is slidably connected to the opening of the reaction chamber 110 and is used to close or open the reaction chamber 110. When there are workpieces in the reaction chamber 110 being polished, the door opening mechanism closes the open position of the reaction chamber 110, effectively controls the temperature in the reaction chamber 110, reduces the temperature error, and the door opening mechanism can isolate the staff from the reaction chamber 110 to provide a safer working environment.

[0044] The control component is arranged at the electrical appliance cavity 130 and is used to control the overall electrical control components of the device. The control component and the electrical component circuits of the whole device are bundled in the electrical appliance cavity 130. Specifically, a control cabinet 131 is arranged in the electrical appliance cavity 130, and all wire harnesses are arranged in the control cabinet 131, which is convenient for debugging and maintenance. The control cabinet 131 is provided with a cabinet door corresponding to the side wall of the casing 100, which is more convenient and fast for the staff to maintain the whole device later and improves the maintenance efficiency.

[0045] In some embodiments of the present utility model, as Figure 1 and Figure 4 shown, the reaction cavity 110 is provided with a lifting groove 111 corresponding to the lifting range of the hanging rack assembly 220, and the hanging rack assembly 220 passes through the lifting groove 111 from the electrical appliance cavity 130 and extends above the middle part of the reaction cavity 110.

[0046] Specifically, the extending path of the lifting groove 111 in the reaction cavity 110 is the same as the lifting path of the hanging rack assembly 220. The lifting assembly uses a rodless cylinder structure to drive the lifting of the hanging rack assembly 220. The rodless cylinder structure is a well-known technical solution to those skilled in the art and will not be described in detail in this embodiment. The hanging rack assembly 220 is fixed on the sliding seat of the lifting assembly, and the sliding seat is driven up and down by the lifting assembly to change the height of the hanging rack assembly 220 in the reaction cavity 110.

[0047] Furthermore, an installation part is arranged at the bottom of the hanging rack assembly 220, and the fixture for fixing the workpiece is detachably connected to the installation part. The control component is electrically connected to the lifting assembly for adjusting the lifting range of the hanging rack assembly 220.

[0048] Specifically, the hanging rack assembly 220 extends above the middle part of the reaction cavity 110, and an installation part is arranged corresponding to the position above the middle part of the reaction cavity 110. In this embodiment, the installation part is composed of a longitudinal installation hole and a locking hole that penetrates the side wall of the inner installation hole laterally, and the locking hole adopts an internal thread structure and is threadedly connected with a locking piece.

[0049] During the process of installing the fixture, first, the hanging rack assembly 220 is raised to the highest position, then the fixture is inserted into the installation hole and the locking piece is screwed tightly in the locking hole so that the end of the locking piece abuts against the fixture, thereby fixing the position of the fixture and the hanging rack assembly 220. Finally, the lifting assembly descends to immerse the product on the fixture in the solution of the reaction cavity 110. If the product on the fixture is still not completely immersed when the lifting assembly descends to the bottom, at this time, the staff can loosen the locking piece to finely adjust the height of the fixture.

[0050] In some embodiments of the present utility model, as Figure 4 and Figure 5As shown in the figure, the reaction chamber 110 is divided into an upper waiting area 112 and a lower reaction area 113. The polishing liquid tank 121 and the external inlet and outlet water pipelines are respectively communicated with the inside of the reaction area 113.

[0051] Specifically, in order to utilize the longitudinal space of the equipment and enable the polishing liquid in the solvent chamber 120 to enter the reaction chamber 110 under the action of gravity, the reaction chamber 110 adopts a longitudinal layout. The reaction chamber 110 is divided into a waiting area 112 and a reaction area 113 along the vertical direction. The waiting area 112 is the main activity area of the hanging rack assembly 220. By setting one side of the waiting area 112 to be open, it is convenient for the staff to install the hanging tools and products on the hanging rack assembly 220 in the waiting area 112.

[0052] The side wall of the lower reaction chamber 110 is communicated with the polishing liquid tank 121 through a pipeline, the bottom is communicated with the inlet and outlet water pipe, and the top is communicated with the waiting area 112. Reasonably using the longitudinal space to arrange the equipment components and reducing the horizontal floor area of the equipment are beneficial to reducing the volume of the equipment.

[0053] In some embodiments of the present utility model, a heating component (not shown in the drawings) electrically connected to the control component is provided in the reaction area 113. The heating component is arranged in a coil shape at the bottom of the reaction area 113 and is used to adjust the solution temperature in the reaction area 113.

[0054] Specifically, the heating component adopts a heating tube structure, which is a well-known technical solution to those skilled in the art and will not be described in detail in this embodiment. The heating component is laid in the bottom area of the reaction area 113, which can better heat the reaction solution. The control component can control the heating component to preheat the solution in the reaction area 113, improving the working efficiency of the polishing equipment.

[0055] In some embodiments of the present utility model, as Figure 4 and Figure 5 shown, the bottom of the reaction area 113 is inclined towards the middle. Specifically, the bottom cross-section of the reaction area 113 is wedge-shaped, which can make the solution gather under the action of gravity. The inlet and outlet water pipe is connected to the bottom of the reaction area 113 to ensure that the solution in the reaction area 113 can be completely discharged after the equipment stops.

[0056] In some embodiments of the present utility model, as Figure 1 、 Figure 2 and Figure 6 shown, the door opening mechanism includes a sliding rail door 310 and a driving component 320. The driving component 320 is arranged in the electrical cavity 130. The guide rail of the driving component 320 extends to the reaction chamber 110. The sliding rail door 310 is connected to the guide rail of the driving component 320. The driving component 320 drives the sliding rail door 310 to open or close the reaction chamber 110.

[0057] Specifically, the driving component 320 adopts the structure of a motor and a conveying guide rail. The sliding rail door 310 is connected to the conveying guide rail. The motor drives the conveying guide rail to rotate, so that the sliding rail door 310 moves to the waiting area 112 to close the opening of the reaction chamber 110 or reset to open the reaction chamber 110. When the device is working, the sliding rail door 310 is in a closed state. When the polishing process is over, the sliding rail door 310 opens, which can effectively protect the staff and prevent the liquid in the reaction chamber 110 from splashing out to the outside.

[0058] Furthermore, the sliding rail door 310 is made of a transparent material. Specifically, the sliding rail door 310 can be made of a transparent acrylic board or a tempered glass panel, which is convenient for the staff to observe the working condition of the reaction chamber 110 through the sliding rail door 310.

[0059] In some embodiments of the present invention, as Figure 4 and Figure 5 shown, a probe tube 114 is provided on the side wall of the reaction chamber 110. One end of the probe tube 114 extends into the solution in the reaction chamber 110, and the other end extends into the electrical chamber 130. The pH probe mechanism is detachably installed at the end of the probe tube 114.

[0060] Specifically, when the device is not used for a long time, the staff needs to detach the pH probe mechanism from the probe tube 114 and hang it on a set hanging part (not shown in the drawings) inside the machine shell 100. The hanging part is installed at the gap position of the electrical chamber 130. During the storage process of the pH probe mechanism, the probe needs to be immersed in pure water to keep it moist.

[0061] In some embodiments of the present invention, as Figure 1 and Figure 2 shown, the control component includes a control panel 410, and the control panel 410 is arranged on the side wall of the machine shell 100. Specifically, the control surface is installed on the same side as the sliding rail door 310, which is convenient for the staff to quickly operate the device after installing the hanging tool and is easy to operate.

[0062] In the description of this specification, the description of reference terms such as "one embodiment", "some embodiments", "illustrative embodiments", "examples", "specific examples", or "some examples" etc. means that the specific features, structures, materials or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in a suitable manner in any one or more embodiments or examples.

[0063] Although embodiments of the present utility model have been shown and described, those of ordinary skill in the art can understand that various changes, modifications, substitutions, and variations can be made to these embodiments without departing from the principles and spirit of the present utility model. The scope of the present utility model is defined by the claims and their equivalents.

Claims

1. A plasma polishing device, characterized in that: include: A housing (100), wherein the housing (100) is provided with a reaction chamber (110), a solvent chamber (120) and an electrical chamber (130), wherein the solvent chamber (120) is provided with at least one group of polishing liquid tanks (121), wherein the polishing liquid tanks (121) are connected to the reaction chamber (110) via a pipeline, and wherein a liquid level sensor is provided in the polishing liquid tanks (121); A rack lifting mechanism, the rack lifting mechanism comprising a rack assembly (220) and a lifting assembly arranged in the electrical chamber (130), one end of the rack assembly (220) being connected to the lifting assembly and the other end extending into the reaction chamber (110), the lifting assembly being used to drive the rack assembly (220) to approach or move away from the liquid surface of the reaction chamber (110); A pH probe mechanism, disposed in the electrical chamber (130) and extending into the reaction chamber (110) for detecting a real-time pH value in the reaction chamber (110); A door opening mechanism, slidably connected to the opening of the reaction chamber (110), and used for closing or opening the reaction chamber (110); A control component is arranged in the electrical cavity (130), and is used to control the overall electrical control components of the device.

2. The plasma polishing equipment according to claim 1, characterized in that: The reaction chamber (110) is provided with a lifting slot (111) corresponding to the lifting range of the rack assembly (220); the rack assembly (220) passes through the lifting slot (111) from the electrical chamber (130) and extends to the upper middle portion of the reaction chamber (110).

3. The plasma polishing equipment according to claim 2, characterized in that: The bottom of the hanger assembly (220) is provided with a mounting portion, and a hanger for fixing a workpiece is detachably connected to the mounting portion; the control assembly is electrically connected to the lifting assembly for adjusting the lifting range of the hanger assembly (220).

4. The plasma polishing equipment according to claim 1, characterized in that: The reaction chamber (110) is divided into two layers, a waiting area (112) and a reaction area (113), and the polishing liquid tank (121) and the external water inlet and outlet pipes are respectively connected to the reaction area (113).

5. The plasma polishing equipment according to claim 4, characterized in that: A heating component electrically connected to the control component is disposed in the reaction zone (113); the heating component is disposed at the bottom of the reaction zone (113) and is used to adjust the temperature of the solution in the reaction zone (113).

6. The plasma polishing equipment according to claim 5, characterized in that: The bottom of the reaction zone (113) is inclined toward the middle.

7. The plasma polishing equipment according to claim 1, characterized in that: The door opening mechanism comprises a sliding rail door (310) and a driving component (320); the driving component (320) is arranged in the electrical chamber (130); a guide rail of the driving component (320) extends to the reaction chamber (110); the sliding rail door (310) is connected to the guide rail of the driving component (320); and the driving component (320) drives the sliding rail door (310) to open or close the reaction chamber (110).

8. The plasma polishing equipment according to claim 7, characterized in that: The sliding rail door (310) is made of a transparent material.

9. The plasma polishing equipment according to claim 1, characterized in that: A probe tube (114) is provided on the side wall of the reaction chamber (110), one end of the probe tube (114) extends into the solution in the reaction chamber (110), and the other end extends into the electrical chamber (130), and the pH probe mechanism is detachably mounted on the end of the probe tube (114).

10. The plasma polishing equipment according to any one of claims 1 to 9, characterized in that: The control assembly comprises a control panel (410), and the control panel (410) is arranged on a side wall of the housing (100).

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