Composite coating equipment

Abstract

The embodiment of the utility model provides composite coating equipment, which comprises a coating cavity, a coating device, a coating device, a coating device, a coating device and a coating device, and is characterized in that the coating cavity comprises a coating chamber for placing a base material to be coated; the solid feeding device is communicated with the coating chamber and is used for conveying gas obtained by sublimating and cracking solid raw materials into the coating chamber; and the plasma discharge device is used for generating plasma in the coating chamber. According to the composite coating equipment disclosed by the embodiment of the utility model, the parylene coating technology is combined with the PECVD (Plasma Enhanced Chemical Vapor Deposition) technology, so that coatings with multiple functions can be prepared.

Description

Technical Field

[0001] The utility model relates to the technical field of film coating, in particular to a composite film coating device. Background Art

[0002] At present, the main coating processes are Parylene coating and PECVD coating, which use corresponding Parylene coating equipment and PECVD coating equipment respectively. However, when it is necessary to prepare a coating with multiple functions, it may be necessary to use different Parylene coating equipment and PECVD coating equipment to perform coating successively, and the processing steps are very cumbersome. Utility Model Content

[0003] In order to solve the above technical problems, an embodiment of the utility model provides a composite coating device, which combines the parylene coating technology with the PECVD technology to prepare a coating with multiple functions.

[0004] According to an embodiment of the utility model, the composite coating device comprises:

[0005] A coating chamber, comprising a coating chamber for placing a substrate to be coated; and

[0006] A solid feeding device, connected to the coating chamber, for conveying the gas produced by sublimation and cracking of the solid raw material into the coating chamber; and

[0007] The plasma discharge device is used to generate plasma in the coating chamber.

[0008] In some embodiments, the solid feeding device comprises:

[0009] A silo, used for placing the solid raw materials;

[0010] A sublimation chamber, used for heating and sublimating the solid raw material;

[0011] A turntable unloading mechanism, used to controllably transport the solid raw material in the silo into the sublimation chamber; and

[0012] The cracking furnace is used to crack the gas after the solid raw material is sublimated and transport it to the coating chamber.

[0013] In some embodiments, the turntable unloading mechanism includes:

[0014] A turntable is arranged in the silo and can rotate around its own central axis, the turntable has a central protrusion and a plurality of turntable holes evenly arranged around the central protrusion, and the turntable holes are used to accommodate the solid raw materials;

[0015] The blanking channel is located below the turntable and communicates with the silo and the sublimation chamber; and

[0016] The stopper is located above the turntable, allowing the solid raw material in the turntable hole to rotate to the blanking channel and blocking the remaining solid raw materials other than the solid raw material in the turntable hole from rotating to the blanking channel, so that the solid raw material in the turntable hole enters the sublimation chamber through the blanking channel.

[0017] In some embodiments, the turntable blanking mechanism further includes an indexing device for controlling the rotation angle of the turntable.

[0018] In some embodiments, the turntable blanking mechanism further includes a photoelectric detection device for detecting the feeding state of the solid raw material.

[0019] In some embodiments, the turntable is provided with a material waiting position and a blanking position, and the photoelectric detection device includes:

[0020] A first photoelectric switch sensor for detecting whether the solid raw material exists at the material waiting position of the turntable; and

[0021] A second photoelectric switch sensor for detecting whether the solid raw material exists at the blanking position of the turntable.

[0022] In some embodiments, the photoelectric detection device further includes a third photoelectric switch sensor for detecting whether the solid raw material exists at the center of the central convex portion of the turntable.

[0023] In some embodiments, the photoelectric detection device further includes an alarm. When the third photoelectric switch sensor detects that the solid raw material does not exist at the center of the central convex portion of the turntable, the alarm emits an alarm signal.

[0024] In some embodiments, the sublimation chamber includes:

[0025] A sublimation cavity, in which a quick-change material receiving tray is provided for receiving the solid raw material; and

[0026] An outlet, which is connected to the sublimation cavity and is used for discharging the gas after sublimation of the solid raw material into the cracking furnace.

[0027] In some embodiments, the sublimation chamber further includes:

[0028] A flip end cover for sealing the sublimation cavity, and the slope of the flip end cover is less than 90°.

[0029] In some embodiments, the sublimation chamber further includes:

[0030] A control valve assembly for controlling the conveyance of the solid raw material into the sublimation chamber.

[0031] In some embodiments, the control valve assembly includes at least two control valves spaced apart from each other for respectively controlling the opening and closing of the material feeding channel.

[0032] In some embodiments, each control valve includes a valve core and a heating element for regulating the temperature of the position of the valve core.

[0033] In some embodiments, the cracking furnace includes:

[0034] A cracking furnace pipe; and

[0035] A plurality of fins located inside the cracking furnace pipe.

[0036] In some embodiments, a plurality of grooves are provided on each fin.

[0037] In some embodiments, a rotating bracket or a fixed bracket for placing the substrate is provided inside the coating chamber.

[0038] In some embodiments, a flow equalizing assembly for gas flow equalization is provided inside the coating chamber.

[0039] In some embodiments, the flow equalizing assembly includes:

[0040] A primary flow equalizing plate for diffusing the gas in all directions; and

[0041] A secondary flow equalizing plate located downstream of the primary flow equalizing plate along the gas flow direction, and the secondary flow equalizing plate is provided with a plurality of first ventilation holes.

[0042] In some embodiments, the flow equalizing assembly further includes:

[0043] A tertiary flow equalizing plate located downstream of the secondary flow equalizing plate along the gas flow direction.

[0044] In some embodiments, the tertiary flow equalizing plate is provided with a plurality of second ventilation holes; or

[0045] The tertiary flow equalizing plate includes multiple layers of slotted plates arranged in a staggered manner; or

[0046] The tertiary flow equalizing plate includes a plurality of convection structures.

[0047] In some embodiments, the compound coating equipment further includes a vacuum system for evacuating the coating chamber.

[0048] In some embodiments, the vacuum system includes an exhaust pipeline, and the exhaust pipeline is provided with a pump group for extracting air in the coating chamber.

[0049] In some embodiments, the exhaust pipeline includes a rough exhaust pipeline and a fine exhaust pipeline, the rough exhaust pipeline is connected to the coating chamber, and the fine exhaust pipeline is connected to the coating chamber through a cold trap.

[0050] In some embodiments, the composite coating equipment further includes an exhaust gas treatment device, which is connected to the exhaust pipeline and is used to treat the gas extracted through the exhaust pipeline and discharge it.

[0051] In some embodiments, the composite coating equipment further includes a plasma discharge device, and the plasma discharge device includes an external plasma discharge mechanism or a built-in plasma discharge mechanism.

[0052] In some embodiments, the composite coating device further comprises:

[0053] A liquid feeding device, connected to the coating chamber, for conveying gas after gasification of liquid raw materials into the coating chamber; and / or

[0054] A gas feeding device is connected to the coating chamber and is used for conveying gas raw materials into the coating chamber.

[0055] In the coating equipment according to the embodiment of the utility model, the plasma discharge device is used to generate plasma in the coating chamber. By providing a plasma environment through the plasma discharge device, the parylene coating technology is combined with the PECVD technology to prepare a coating with multiple functions. At the same time, the substrate can be pre-treated by plasma before coating to improve the bonding strength of the film layer.

[0056] Furthermore, the solid feeding device includes a turntable unloading mechanism, which can control the feeding rate so that the density and rate of the monomer gas entering the coating chamber can be controlled, which greatly accelerates the coating rate, improves the protective quality of the film layer, and improves the powder utilization rate in the coating process, solving the problems of one-time feeding, uncontrollable coating process, limited deposition rate, low powder utilization rate, and poor protection effect in the prior art. BRIEF DESCRIPTION OF THE DRAWINGS

[0057] Other features and advantages of the present invention will be better understood through the optional embodiments described in detail below in conjunction with the accompanying drawings, in which the same reference numerals represent the same or similar components, wherein:

[0058] Figure 1 A schematic structural diagram of a coating device according to an embodiment of the utility model is shown;

[0059] Figure 2 shows Figure 1 a schematic structural view of the solid feeding device of the coating equipment in

[0060] Figure 3 shows Figure 2 a schematic structural view of the rotary table blanking mechanism of the solid feeding device in

[0061] Figure 4 shows Figure 2 a schematic sectional view of the rotary table blanking mechanism of the solid feeding device in

[0062] Figure 5 shows Figure 2 a schematic structural view of the photoelectric detection device of the solid feeding device in

[0063] Figure 6 shows Figure 1 a schematic structural view of the cracking furnace of the coating equipment in

[0064] Figure 7 shows Figure 1 a schematic sectional view of the cracking furnace of the coating equipment in

[0065] Figure 8A shows Figure 1 a schematic structural view of the coating cavity of the coating equipment in

[0066] Figure 8B shows Figure 1 a schematic structural view of another coating cavity of the coating equipment in

[0067] Figure 9 shows Figure 1 a schematic structural view of the flow equalizing component of the coating equipment in

[0068] Figure 10 shows Figure 1 a schematic structural view of the external plasma discharge mechanism of the coating equipment in

[0069] Figure 11 shows Figure 1 a schematic structural view of the internal plasma discharge mechanism of the coating equipment in Detailed implementation manners

[0070] The implementation and use of the embodiments will be discussed in detail below. However, it should be understood that the specific embodiments discussed are merely exemplary illustrations of specific ways of implementing and using the present utility model, rather than limiting the scope of the present utility model. When describing the structural positions of various components, expressions of directions such as up, down, top, bottom, etc. are not absolute but relative. When the components are arranged as shown in the figures, these direction expressions are appropriate, but when the positions of the components in the figures change, these direction expressions also change accordingly.

[0071] As Figure 1 shown, the coating device 100 includes a coating chamber 10, a gas feeding device 20 (see Figure 7 ), a liquid feeding device 30, and a solid feeding device 40. The coating chamber 10 includes a coating chamber 11 for placing the substrate to be coated. The liquid feeding device 30 is connected to the coating chamber 11 and is used to transport the first gas raw material after the liquid raw material is vaporized into the coating chamber 11. The solid feeding device 40 is connected to the coating chamber 11 and is used to transport the second gas raw material after the solid raw material is sublimated and cracked into the coating chamber 11. The gas feeding device 20 is connected to the coating chamber 11 and is used to transport the third gas raw material into the coating chamber 11. In some embodiments, the coating device 100 may not include the gas feeding device 20 and only includes the liquid feeding device 30 and the solid feeding device 40.

[0072] Combined with Figures 2 to 4 shown, the solid feeding device 40 includes: a material bin 41, a sublimation chamber 42, a rotary table feeding mechanism 43, and a cracking furnace 44. The material bin 41 is used to place a plurality of solid raw materials. For example, the solid raw material is spherical parylene, sheet parylene, or granular parylene, which can be hereinafter simply referred to as material pellets. The material bin 41 can accommodate thousands of material pellets. A end cover (not shown in the figure) is provided at the top of the material bin 41, and a sealing ring is provided between the end cover and the material bin 41 to achieve the sealing of the material bin 41. The end cover can be opened through a flip mechanism, and the flip mechanism is composed of a shaft, a spring, and a plain bearing. When the inside of the material bin 41 is at normal pressure, remove the handle on the material bin 41, and the spring in the flip mechanism can overcome the gravity of the end cover, causing the end cover to bounce upward. The end cover can then easily rotate horizontally around the shaft, thereby opening the material bin 41. A plurality of glass windows are installed on the end cover of the material bin 41 for detecting the remaining materials in the material bin and the feeding state of the material pellets.

[0073] The rotary table feeding mechanism 43 is located inside the material bin 41 and is used to transport the solid raw materials in the material bin 41 into the sublimation chamber 42. The sublimation chamber 42 is used to heat and sublime the solid raw materials. The cracking furnace 44 is used to crack the gas after the solid raw materials are sublimated into the second gas raw material and transport the second gas raw material into the coating chamber 11.

[0074] The rotary disk feeding mechanism 43 controllably conveys solid raw materials into the sublimation chamber 42 at a set feeding rate. Specifically, the rotary disk feeding mechanism 43 includes a rotary disk 431, a feeding channel 432, and a stop block 433. The rotary disk 431 is disposed in the storage bin 41 and can rotate around its own central axis. The rotary disk 431 has a central convex portion 4311 and a plurality of rotary disk holes 4312 uniformly arranged around the central convex portion 4311. The size of the rotary disk holes 4312 corresponds to the size of the solid raw materials or pellets. One rotary disk hole 4312 is used to accommodate one solid raw material or pellet. A magneto-fluid sealing drive device 434 is provided below the rotary disk 431. The magneto-fluid sealing drive device 434 is driven to rotate by a servo motor outside the storage bin through a pulley, thereby driving the rotary disk 431 to rotate. The feeding channel 432 is located below the rotary disk 431 and communicates the storage bin 41 and the sublimation chamber 42. The stop block 433 can be one, two, or more. It is located above the rotary disk 431, allowing the solid raw materials or pellets in the rotary disk holes 4312 to rotate to the feeding channel 432 and blocking the remaining solid raw materials other than the solid raw materials or pellets in the rotary disk holes 4312 from rotating to the feeding channel 432. The solid raw materials or pellets in the feeding channel 432 continue to enter the sublimation chamber 42.

[0075] According to an embodiment of the present invention, the feeding system of the coating device can simultaneously achieve gas feeding, liquid feeding, and solid feeding. The multi-functional feeding method provides conditions for the coating device to deposit different film layers. By matching different types and kinds of raw materials, the coating device can deposit multi-functional composite film layers successively or simultaneously, integrating ordinary CVD, PECVD, and ICVD technologies, and solving the problem that the existing coating device can only implement a single CVD deposition technology, that is, only a single type of raw material can be introduced, and only one film layer can be deposited at a time. It is necessary to complete the composite film layer by starting and stopping the device and adding materials multiple times, resulting in poor film layer quality and long coating cycle.

[0076] In some embodiments, the rotary disk feeding mechanism 43 further includes an indexing device for controlling the rotation angle of the rotary disk 431. For example, when there are 6 rotary disk holes 4312, the angle between two adjacent rotary disk holes 4312 is 60°. The indexing device can control the rotary disk 431 to rotate 60° each time, so that the solid raw materials or pellets in the rotary disk holes 4312 can fall into the feeding channel 432 and then be conveyed to the sublimation chamber 42. The indexing device can be an optoelectronic indexing mechanism, thereby improving the rotation accuracy of the rotary disk 431 and solving the problems of synchronous pulley slipping and servo motor rotation error.

[0077] Combined Figure 5 As shown in

[0078] In some embodiments, the turntable 431 is provided with a material waiting position and a material discharging position, and the material waiting position and the material discharging position respectively correspond to two adjacent turntable holes 4312 of the turntable 431. The photoelectric detection device 435 includes a first photoelectric switch sensor 4351 and a second photoelectric switch sensor 4352. The first photoelectric switch sensor 4351 is used to detect whether there is solid raw material at the material waiting position of the turntable 431, and the second photoelectric switch sensor 4352 is used to detect whether there is solid raw material at the material discharging position of the turntable 431. The stopper 433 is provided with a first channel 4331 corresponding to the material waiting position and a second channel 4332 corresponding to the material discharging position. The first photoelectric switch sensor 4351 is installed in the first channel 4331, and the second photoelectric switch sensor 4352 is installed in the second channel 4332.

[0079] When the first photoelectric switch sensor 4351 at the material waiting position detects that there are material pellets, and the second photoelectric switch sensor 4352 at the material discharging position does not detect material pellets, it is recorded as having material once; when the first photoelectric switch sensor 4351 at the material waiting position detects that there are material pellets, and the second photoelectric switch sensor 4352 at the material discharging position detects material pellets, it is recorded as jamming material once; when the first photoelectric switch sensor 4351 at the material waiting position does not detect material pellets, and the second photoelectric switch sensor 4352 at the material discharging position does not detect material pellets, it is recorded as being empty of material once. After detecting that there are material pellets, the control valve valve acts, and the material pellets enter the sublimation chamber 42, and the system feeding times increase by 1 time; after detecting jamming material and empty material, the control valve valve does not act, the system feeding times do not increase, and the turntable 431 continues to rotate for the next feeding.

[0080] In some embodiments, the photoelectric detection device 435 further includes a third photoelectric switch sensor 4353, and the third photoelectric switch sensor 4353 is disposed above the center of the central convex portion 4311 for detecting whether there is solid raw material or material pellets at the center of the central convex portion 4311 of the turntable 431.

[0081] In some embodiments, the photoelectric detection device 435 further includes an alarm (not shown in the figure). When the third photoelectric switch sensor 4353 detects that there is no solid raw material or material pellets at the center of the central convex portion 4311 of the turntable 431, the alarm emits an alarm signal.

[0082] Specifically, when the solid raw material or the material pellets remain to a certain quantity, the screw at the center of the turntable 431 leaks out, triggering the material pellet remaining quantity alarm wire, and an alarm is given through the alarm to remind that the material bin is out of stock.

[0083] In some embodiments, a groove (not shown in the figure) is further provided below the turntable 431, and the groove can solve the problem of broken materials caused by half a pellet in the turntable 431. During normal operation, the bin 41 is filled with pellets, and the pellets enter the turntable holes 4312 on the outer ring of the turntable 431 and rotate with the rotation of the turntable 431. When it rotates to the waiting position, the stopper 433 blocks the remaining pellets on the turntable 431, and only the pellets in the turntable holes 4312 can enter the waiting position, and then continue to rotate to the discharging position for discharging. When incomplete or broken pellets enter the turntable holes 4312, if the size of the incomplete pellet is small, as the turntable 431 rotates, the pellet will fall into the groove below the turntable 431, and the next pellet will continue to enter the turntable holes 431. The pellets in the groove will rotate synchronously with the groove, which does not affect the rotation of other pellets. When passing through the discharging position, the pellets in the turntable holes 431 are discharged; if the size of the incomplete pellet is large, the pellet rotates with the turntable 431, and there will be a complete pellet above the pellet. When reaching the position of the stopper 433, the complete pellet will be pushed out of the turntable holes 431, and only the pellets in the turntable holes 431 will be discharged.

[0084] In some embodiments, the sublimation chamber 42 includes a sublimation cavity 421 and an outlet 422. A quick-change receiving tray 423 is provided in the sublimation cavity 421 for receiving solid raw materials. The outlet 422 is communicated with the sublimation cavity 421 for discharging the gas after sublimation of the solid raw materials into the cracking furnace 44. The heating method of the sublimation cavity 421 is heating of the cavity wall. The pellets are discharged into the quick-change receiving tray 423, and the quick-change receiving tray 423 can be quickly replaced according to process requirements, which is convenient for equipment maintenance and beneficial to the cleanliness of the sublimation cavity 421.

[0085] In some embodiments, the sublimation chamber 42 further includes a flip cover 424 for sealing the sublimation cavity 421. The slope of the flip cover 424 is less than 90°, and the sealing of the sublimation cavity 421 is achieved through the gravity of the flip cover 424 itself and the negative pressure in the sublimation cavity 421.

[0086] In some embodiments, the sublimation chamber 42 further includes a control valve assembly 425 for controlling the delivery of solid raw materials into the sublimation cavity 421. The control valve assembly 425 includes a first control valve and a second control valve. The first control valve and the second control valve are arranged at intervals to respectively control the opening and closing of the feeding channel 432.

[0087] The first control valve and the second control valve can be gate valves, ball valves, plug valves, etc., as long as they can achieve the opening and closing of the feeding channel 432. The embodiments of the present invention do not limit this.

[0088] The first control valve and the second control valve are in a normally closed state. After the pellets are fed, the first control valve opens, and the pellets are fed through the feeding channel 432 to the middle of the first control valve and the second control valve. Then the first control valve closes, the second control valve opens, and the pellets are fed into the sublimation chamber 421, and the second control valve closes. By means of the normally closed first control valve and the second control valve, the material bin 41 and the sublimation chamber 421 are separated, which is beneficial to the pressure stability of the material bin 41. At the same time, it can prevent the deposition of dust in other areas and improve the service life of the first control valve and the second control valve.

[0089] In some embodiments, each control valve includes a valve core and a heating element. The valve core can move back and forth or rotate to open and close the feeding channel 432, and the heating element is used to adjust the temperature of the position of the valve core. The temperature control of the position of the valve core can be achieved through the heating element, preventing the deposition of valve core dust and the occurrence of jamming failures.

[0090] As Figure 6 and Figure 7 As shown in

[0091] The cracking furnace 44 includes a cracking furnace pipeline 441 and a plurality of fins 442. The plurality of fins 442 are located inside the cracking furnace pipeline 441, and a plurality of grooves (not shown in the figure) are provided on each fin 442 for compensating for thermal deformation. The materials of the cracking furnace pipeline 441 and the plurality of fins 442 can be stainless steel materials such as 310S stainless steel and 316 stainless steel. The installation of a plurality of fins 442 inside can increase the contact area between the cracking furnace 44 and the monomer gas molecules, improving the cracking efficiency. Other structures of the cracking furnace 44 are known to those skilled in the art, so they will not be described in detail in this utility model.

[0092] As Figure 8A and 8BAs shown, a rotating bracket 111 for placing a substrate is provided in the coating chamber 11. A motor 112 at the bottom of the coating chamber 10 drives the rotation of a magneto-fluid sealing transmission device, and the magneto-fluid sealing transmission device drives the rotation of the rotating bracket 111 through a transmission mechanism. The rotating bracket 111 can be a circular rotating frame, and the circular rotating frame can have various structures, including a sector-shaped rotating frame or a large flat-layer rotating frame. The layer spacing of the sector-shaped rotating frame can be adjusted through a support plate, and the layer spacing of the large flat-layer rotating frame can be adjusted through spacer columns. Driving the substrate 80 to rotate through the rotating bracket 111 can improve the uniformity of the film layer.

[0093] In other embodiments, a fixed bracket for placing a substrate is provided in the coating chamber 11. The fixed bracket can achieve higher production efficiency when the film layer has good uniformity.

[0094] In some embodiments, a flow homogenizing component 12 for homogenizing a second gas raw material is provided in the coating chamber 11.

[0095] As Figure 9 shown, the flow homogenizing component 12 includes a primary flow homogenizing plate 121 and a secondary flow homogenizing plate 122. The primary flow homogenizing plate 121 is used to diffuse the second gas raw material in all directions. The secondary flow homogenizing plate 122 is located downstream of the primary flow homogenizing plate 121 along the gas flow direction of the second gas raw material, and the secondary flow homogenizing plate 122 is provided with a plurality of first ventilation holes 1221.

[0096] In some embodiments, the flow homogenizing component 12 further includes a tertiary flow homogenizing plate 123. The tertiary flow homogenizing plate 123 is located downstream of the secondary flow homogenizing plate 122 along the gas flow direction of the second gas raw material.

[0097] In some embodiments, the tertiary flow homogenizing plate 123 is provided with a plurality of second ventilation holes.

[0098] In some embodiments, the tertiary flow homogenizing plate 123 includes multiple layers of slotted plates arranged in an interleaved manner.

[0099] In some embodiments, the tertiary flow homogenizing plate 123 includes a plurality of convection structures 1231. The convection structure 1231 includes two convection plates 12311, and the two convection plates 12311 are arranged oppositely to form a V-shaped structure, and the top of the V-shaped structure faces the gas flow direction of the second gas raw material.

[0100] The monomer gas after cracking in the cracking furnace enters the coating chamber 11 through the air inlet 113 of the coating cavity 10, forms a trend of diffusing horizontally from the center to the entire plane along the primary flow homogenizing plate 121, and then further diffuses uniformly after passing through the secondary flow homogenizing plate 122 and the tertiary flow homogenizing plate 123.

[0101] In Figure 8AIn the illustrated embodiment, the second gas raw material adopts an upper and lower air inlet mode. The air inlet 113 is located above and is connected to the solid feeding device 40. The air extraction port 114 is located below and is connected to the air extraction pipeline 51. The primary flow equalizing plate 121 is a disc, which converts the airflow flowing in the vertical direction into the airflow flowing in the horizontal direction and can rapidly diffuse in the horizontal direction. The secondary flow equalizing plate 122 is provided with a plurality of first ventilation holes 1221, which increases the uniformity of the airflow. The tertiary flow equalizing plate 123 can further increase the uniformity and at the same time slow down the airflow velocity by increasing the airflow path.

[0102] In Figure 8B In the illustrated embodiment, the second gas raw material adopts a side-in and side-out air inlet mode. The air inlet 113 is located on one side and is connected to the solid feeding device 40. The air extraction port 114 is located on the other side and is connected to the air extraction pipeline 51. In the side-in and side-out air inlet mode, the uniformity of the airflow is easier to control, without relying on the upper and lower temperatures of the cavity for regulation. At the same time, it can also avoid the downward settlement of large particles under the dual action of gravity and suction force, thereby affecting the quality of the film layer. In addition, the uniformity of the film layer in the side-in and side-out air inlet mode can be achieved by the rotation of the bracket, and the vertical uniformity mainly depends on the air equalizing component to make the air inlet evenly distributed in the vertical direction.

[0103] In some embodiments, a flow equalizing component for the first gas raw material and / or a flow equalizing component for the third gas raw material are also provided in the coating chamber 11. The flow equalizing component may include a single flow equalizing plate, and the single flow equalizing plate may be a short baffle or a long strip opening baffle covering a plurality of single air inlets. The single gas enters the cavity and is evenly dispersed through the single flow equalizing plate, thereby improving the film layer uniformity between the upper and lower layers.

[0104] In some embodiments, a temperature control device is provided on the cavity wall of the coating cavity 10, which can realize multi-region regulation of the cavity wall temperature. By adjusting the temperature of the cavity wall of the coating cavity 10, the deposition rates of the upper and lower layer single gases are made consistent under the combined influence of the density and temperature of the single gas, and the thickness of the upper and lower layer coating film layers is made uniform.

[0105] According to an embodiment of the present utility model, a flow homogenization component is provided in the coating chamber, which optimizes and improves the uniformity of gas deposition, including three optimization methods: adding a flow homogenization component between the air inlet and the rotating turntable, controlling and adjusting the temperature of the chamber wall at multiple points, and using the rotating turntable. The monomer gas after pyrolysis in the cracking furnace enters the coating chamber through the air inlet of the coating chamber, forms a trend of spreading horizontally from the center to the entire plane along the first-stage flow homogenization plate after passing through the first-stage flow homogenization plate, and then spreads more uniformly after passing through the second-stage flow homogenization plate and the third-stage flow homogenization plate; adjusting the temperature of the chamber wall of the coating chamber enables the deposition rates of the upper and lower layer monomer gases to be the same under the combined influence of the monomer gas density and temperature, making the thicknesses of the coating films of the upper and lower layers uniform; at the same time, during the coating process, the substrate revolves around the central rotation axis, avoiding the phenomenon of uneven thickness of the substrate film layer in a fixed area caused by uneven density of chemical monomer gases in each region.

[0106] Combined with Figure 1 As shown in , the coating equipment 100 further includes a vacuum system 50 for evacuating the coating chamber 11.

[0107] The vacuum system 50 includes an exhaust pipeline 51, and a pump set for extracting the air in the coating chamber 11 is provided on the exhaust pipeline 51. The exhaust pipeline 51 includes a rough pumping pipeline and a fine pumping pipeline. The rough pumping pipeline is connected to the coating chamber 11, and the fine pumping pipeline is connected to the coating chamber 11 through a cold trap 52. The cold trap 52 is used to trap the condensable gases in the extracted air. Before coating, the chamber is evacuated. First, the chamber is roughly pumped, and after reaching a certain vacuum degree, the chamber is finely pumped.

[0108] In some embodiments, the coating equipment 100 further includes an exhaust gas treatment device 60. The exhaust gas treatment device 60 is connected to the exhaust pipeline 51 and is used to treat the gas extracted through the exhaust pipeline 51 and discharge it. The exhaust gas treatment device 60 includes, but is not limited to, recovering or treating without pollution the reaction raw materials, process gases or auxiliary gases such as doping elements such as nitrogen, inert gases, hydrogen, and hydrocarbon gases, and then discharging them to the outside to prevent environmental pollution and enable recycling.

[0109] According to an embodiment of the present utility model, the coating chamber 11 is connected to the pump set through two pipelines, namely a rough pumping pipeline and a fine pumping pipeline. The rough pumping pipeline is directly connected to the coating chamber 11. A cold trap 52 is added between the fine pumping pipeline and the coating chamber 11. During the vacuum pumping stage, the rough pumping pipeline is first opened to quickly pump out most of the air in the coating chamber 11. After reaching a certain pressure, the fine pumping pipeline is opened. The low-temperature condensation and adsorption effect of the cold trap 52 can accelerate the vacuum pumping rate and enable the coating chamber 11 to obtain a lower ultimate vacuum degree. During the coating process, the fine pumping pipeline is used. The process mixed gas extracted from the coating chamber 11 is cooled and condensed at low temperature by the cold trap 52, adsorbed, and then pumped away by the pump set, and discharged after passing through the tail gas treatment device 60. This greatly reduces the impurities entering the pump set, extends the service life of the pump set, and effectively filters the tail gas, making the equipment more environmentally friendly.

[0110] In some embodiments, the vacuum system 50 further includes a valve 53 with adjustable opening for adjusting the pumping speed of the pumping pipeline 51 to control the stability of the vacuum pressure in the coating chamber 11.

[0111] In some embodiments, the vacuum system 50 further includes a first vacuum pressure sensor 54 for detecting the pressure in the pumping pipeline 51.

[0112] In some embodiments, the sublimation chamber 42 includes a second vacuum pressure sensor 426 for detecting the pressure in the sublimation chamber 42.

[0113] In some embodiments, as Figure 8A shown, the coating equipment 100 further includes a plasma discharge device 70. The plasma discharge device 70 includes an external plasma discharge mechanism or an internal plasma discharge mechanism.

[0114] In some embodiments, as Figure 8A shown, the coating equipment 100 further includes a real-time film thickness monitoring system 90 for monitoring the thickness of the film layer on the substrate 80 through the real-time film thickness monitoring system. When the thickness of the film layer reaches a predetermined thickness, the gas feeding device, the liquid feeding device, and / or the solid feeding device are closed.

[0115] As Figure 10 and 11As shown in the figure, the plasma discharge device 70 includes an external plasma discharge mechanism 71 and / or an internal plasma discharge mechanism 72. In the external plasma discharge mechanism, the plasma discharge device is installed on the outer wall of the cavity to perform plasma treatment on the substrate inside the cavity. The plasma discharge device may include a plasma excitation power supply, a matcher, a discharge coil or electrode, a quartz / ceramic plate, a glass cover plate, and a gas distribution flange; through the plasma excitation power supply and the matcher, a glow discharge is generated in the coating cavity by the discharge coil or electrode; the cavity wall is connected and sealed with the quartz / ceramic plate through the gas distribution flange, the gas distribution flange is connected with a plurality of air inlets, and the side connected to the cavity is densely distributed with air outlets, which can realize the function of uniformly introducing gas into the cavity; the glass cover plate can prevent the film layer from depositing on the quartz / ceramic plate. In the internal plasma discharge mechanism, the plasma excitation power supply applies a voltage to the loading shelf, so that the loading shelf acts as an electrode to discharge and generate plasma. The plasma excitation power supply can be a radio frequency, intermediate frequency or pulse power supply. The plasma excitation power supply generates high-energy plasma in the coating chamber 11, excites the raw material gas to generate active groups, and deposits on the surface of the substrate 80 to form a cross-linked structure, thereby forming a film layer on the surface of the substrate 80. On the other hand, the bombardment of the high-energy ions and electrons in the plasma on the film layer can make the film layer dense and improve the film layer quality.

[0116] In other embodiments, in the internal plasma discharge mechanism, the plasma excitation power supply (such as a radio frequency power supply) generates a radio frequency electric field in the coating chamber 11 of the coating cavity 10 by directly loading on the electrode plate in the cavity, so as to act on the gas in the coating chamber 11. Specifically, during coating, the radio frequency power supply discharges the gas in the coating chamber 11, such as nitrogen or inert gas and reaction raw material gas, through the provided radio frequency electric field, so that the coating chamber 11 is in a plasma environment and the reaction gas raw material is in a high-energy state.

[0117] According to an embodiment of the present invention, the side wall discharge coil of the coating chamber is connected to a matcher and a radio frequency power supply. After the coating chamber is evacuated, the alternating current of the radio frequency power supply is used to excite the introduced argon / helium / oxygen and other gases to generate plasma, which acts on the surface of the substrate to perform surface treatment on the substrate, solving the cumbersome processing steps of the existing process that require using a plasma device to perform surface treatment on the substrate before coating and then coating.

[0118] The technical content and technical features of the present invention have been disclosed above. However, it can be understood that under the creative concept of the present invention, those skilled in the art can make various changes and improvements to the above disclosed concept, but all belong to the protection scope of the present invention. The description of the above embodiments is illustrative rather than restrictive, and the protection scope of the present invention is determined by the claims.

Claims

1. A composite coating device, characterized in that: include: The coating chamber includes a coating chamber for placing a substrate to be coated; A solid feeding device, connected to the coating chamber, for conveying the gas produced by sublimation and cracking of the solid raw material into the coating chamber; as well as A plasma discharge device, used to generate plasma in the coating chamber; Wherein, the solid feeding device comprises: A silo, used for placing the solid raw materials; A sublimation chamber, used for heating and sublimating the solid raw material; A turntable unloading mechanism, used to controllably transport the solid raw material in the silo into the sublimation chamber; and The cracking furnace is used to crack the gas after the solid raw material is sublimated and transport it to the coating chamber.

2. The composite coating device according to claim 1, characterized in that: The turntable unloading mechanism comprises: A turntable is arranged in the silo and can rotate around its own central axis, the turntable has a central protrusion and a plurality of turntable holes evenly arranged around the central protrusion, and the turntable holes are used to accommodate the solid raw materials; A material discharge channel, located below the turntable and connected to the material bin and the sublimation chamber; and The stopper is located above the turntable, allowing the solid raw material in the turntable hole to rotate to the feed channel and blocking the remaining solid raw materials except the solid raw material in the turntable hole from rotating to the feed channel, so that the solid raw material in the turntable hole enters the sublimation chamber through the feed channel.

3. The composite coating device according to claim 2, characterized in that: The turntable unloading mechanism also includes a dividing device for controlling the rotation angle of the turntable.

4. The composite coating device according to claim 2, characterized in that: The turntable unloading mechanism also includes a photoelectric detection device for detecting the feeding state of the solid raw material.

5. The composite coating device according to claim 4, characterized in that: The turntable is provided with a waiting position and a material discharge position, and the photoelectric detection device comprises: A first photoelectric switch sensor is used to detect whether the solid raw material exists at the material position of the turntable; and The second photoelectric switch sensor is used to detect whether the solid raw material exists at the lower material position of the turntable.

6. The composite coating device according to claim 5, characterized in that: The photoelectric detection device further includes a third photoelectric switch sensor for detecting whether the solid raw material exists at the center of the central protrusion of the turntable.

7. The composite coating device according to claim 6, characterized in that: The photoelectric detection device further comprises an alarm, and when the third photoelectric switch sensor detects that the solid raw material does not exist at the center of the central protrusion of the turntable, the alarm sends out an alarm signal.

8. The composite coating device according to any one of claims 2 to 7, characterized in that: The sublimation chamber comprises: A sublimation chamber, wherein a quick-change receiving tray is provided in the sublimation chamber for receiving the solid raw material; and The outlet is connected to the sublimation chamber and is used to discharge the gas after the solid raw material is sublimated into the cracking furnace.

9. The composite coating device according to claim 8, characterized in that: The sublimation chamber also includes: The flip end cover is used to seal the sublimation chamber, and the slope of the flip end cover is less than 90°.

10. The composite coating device according to claim 8, characterized in that: The sublimation chamber also includes: The control valve assembly is used to control the delivery of the solid raw material into the sublimation chamber.

11. The composite coating device according to claim 10, characterized in that: The control valve assembly includes at least two control valves, which are arranged at intervals from each other and are used to respectively control the opening and closing of the feeding channel.

12. The composite coating device according to claim 11, characterized in that: Each control valve includes a valve core and a heating element for adjusting the temperature of the position of the valve core.

13. The composite coating device according to any one of claims 1 to 7, characterized in that: The cracking furnace comprises: Cracking furnace pipes; and A plurality of fins are located in the cracking furnace pipe.

14. The composite coating device according to claim 13, characterized in that: Each fin is provided with a plurality of grooves.

15. The composite coating device according to any one of claims 1 to 7, characterized in that: The coating chamber is provided with a rotating bracket or a fixed bracket for placing the substrate.

16. The composite coating device according to claim 15, characterized in that: The coating chamber is provided with a flow-uniform component for uniform flow of gas.

17. The composite coating device according to claim 16, characterized in that: The flow-uniform component comprises: A primary flow plate, used to diffuse the gas to all sides; and The secondary flow equalizer plate is located downstream of the primary flow equalizer plate along the gas flow direction of the gas, and the secondary flow equalizer plate is provided with a plurality of first vent holes.

18. The composite coating device according to claim 17, characterized in that: The flow-uniform component further comprises: The third level flow equalizer plate is located downstream of the second level flow equalizer plate along the gas flow direction.

19. The composite coating device according to claim 18, characterized in that: The three-stage flow equalizer is provided with a plurality of second vent holes; or The three-stage flow equalizer plate comprises multiple layers of staggered slotted plates; or The three-stage flow plate includes a plurality of convection structures.

20. The composite coating device according to any one of claims 1 to 7, characterized in that: The composite coating equipment also includes a vacuum system for evacuating the coating chamber.

21. The composite coating device according to claim 20, characterized in that: The vacuum system comprises an exhaust pipeline, and the exhaust pipeline is provided with a pump group for extracting air in the coating chamber.

22. The composite coating device according to claim 21, characterized in that: The exhaust pipeline includes a rough exhaust pipeline and a fine exhaust pipeline. The rough exhaust pipeline is connected to the coating chamber, and the fine exhaust pipeline is connected to the coating chamber through a cold trap.

23. The composite coating device according to claim 21, characterized in that: The composite coating equipment also includes an exhaust gas treatment device, which is connected to the exhaust pipeline and is used to treat the gas extracted through the exhaust pipeline and discharge it.

24. The composite coating device according to any one of claims 1 to 7, characterized in that: The plasma discharge device includes an external plasma discharge mechanism or a built-in plasma discharge mechanism.

25. The composite coating device according to any one of claims 1 to 7, characterized in that: The composite coating equipment also includes: A liquid feeding device, connected to the coating chamber, for conveying gas after gasification of liquid raw materials into the coating chamber; and / or A gas feeding device is connected to the coating chamber and is used for conveying gas raw materials into the coating chamber.

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