Device for preventing liquid supply pipe of polishing machine from being blocked and polishing machine system

By designing the liquid supply branch and flushing branch devices, the problem of easy blockage of the liquid supply pipeline of the polishing machine is solved, and the pipeline flushing is achieved without shutdown, reducing waste during machine time, and ensuring the stability of production capacity.

CN223012878UActive Publication Date: 2025-06-24ZHONGHUAN ADVANCED SEMICONDUCTOR TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202421213082.3
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-05-30
Publication Date
2025-06-24
Estimated Expiration
2034-05-30

AI Technical Summary

Technical Problem

The liquid supply pipeline of the polishing machine is likely to affect the liquid supply flow due to the blockage of the polishing liquid crystal, resulting in production shutdown and waste during machine time.

Method used

A device including a liquid supply branch and a flushing branch is designed. The liquid supply branch and the flushing branch are connected to the liquid supply pipeline respectively. By controlling the switches of the liquid supply and flushing branch, the polishing liquid supply and pipe flushing are separated to avoid the polishing liquid crystal blockage.

Benefits of technology

Effectively prevent the polishing liquid crystal from clogging the liquid supply pipeline, reduce waste during machine time, avoid affecting production capacity, and ensure that the quality of the polishing liquid is not affected.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model provides a device for preventing polisher liquid supply pipe from being blocked and a polisher system, which comprise a liquid supply branch for supplying liquid to the polisher and a flushing branch for flushing the liquid supply pipeline, the flushing branch and the liquid supply branch are respectively connected and communicated with one end of the liquid supply pipeline, the other end of the liquid supply pipeline is connected with the polisher, and the polisher is connected with the flushing branch. When the liquid supply branch supplies polishing liquid to the polishing machine, the flushing branch is closed, and when the flushing branch flushes the liquid supply pipeline, the liquid supply branch is closed. The polishing machine has the advantages that the liquid supply branch and the flushing branch do not work at the same time, polishing liquid and pure water can be prevented from being mixed, the quality of the polishing liquid cannot be affected, when the polishing liquid is replaced at set intervals, the liquid supply switch device is closed, the flushing switch device is opened, a large amount of pure water flows into the polishing machine along the liquid supply pipeline, and the polishing effect is good. And meanwhile, a large amount of pure water is used for flushing the liquid supply pipeline, and the phenomenon that the liquid supply pipeline is blocked due to crystallization of the polishing liquid is avoided.
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Description

Technical Field

[0001] The utility model belongs to the technical field of silicon wafer production, and particularly relates to a device for preventing the blockage of the liquid supply pipe of a polishing machine and a polishing machine system. Background Art

[0002] The polishing liquid used by the polishing machine crystallizes and precipitates, adhering to the inner wall of the pipeline. Over time, the pipeline diameter becomes narrower, which easily causes pipeline blockage and affects the liquid supply flow rate of the polishing liquid. The general method is to manually stop the machine, disassemble the polishing liquid pipeline, clean the crystallization, reinstall it, and then restart the machine. The shutdown and pipe cleaning of the polishing machine affect production capacity, and a large amount of machine time is wasted during shutdown. Summary of the Invention

[0003] In view of the above problems, the utility model provides a device for preventing the blockage of the liquid supply pipe of a polishing machine and a polishing machine system to solve the above or other previous problems existing in the prior art.

[0004] To solve the above technical problems, the technical solution adopted by the utility model is: a device for preventing the blockage of the liquid supply pipe of a polishing machine, including a liquid supply branch for supplying liquid to the polishing machine and a flushing branch for flushing the liquid supply pipeline. The flushing branch and the liquid supply branch are respectively connected and communicated with one end of the liquid supply pipeline, and the other end of the liquid supply pipeline is connected to the polishing machine. When the liquid supply branch supplies polishing liquid to the polishing machine, the flushing branch is closed; when the flushing branch flushes the liquid supply pipeline, the liquid supply branch is closed.

[0005] Further, the liquid supply branch includes a power device, a filtering device, and a liquid supply switch device arranged in sequence along the flow direction of the polishing liquid. The power device, the filtering device, and the liquid supply switch device are all arranged on the connecting pipeline between the polishing liquid storage device and the liquid supply pipeline. The polishing liquid in the polishing liquid storage device can enter the liquid supply pipeline after being filtered by the filtering device under the action of the power device, and the liquid supply switch device controls the opening and closing of the connecting pipeline between the polishing liquid storage device and the liquid supply pipeline.

[0006] Further, the power device is a liquid supply pump, and the liquid supply switch device is a pneumatic valve.

[0007] Further, the filtering device is provided with a filter element.

[0008] Further, the flushing branch includes a flushing switch device, which is arranged on the connecting pipeline between the pure water supply device and the liquid supply pipeline and controls the opening and closing of the connecting pipeline between the pure water supply device and the liquid supply pipeline.

[0009] Further, the flushing switch device is a pneumatic valve.

[0010] Further, the pure water supply device includes a pure water storage device and a pure water power device. The pure water storage device is connected to the liquid supply pipeline through a connecting pipe, and the pure water power device is arranged on the connecting pipe between the pure water storage device and the liquid supply pipeline.

[0011] Further, the pure water power device is a liquid supply pump.

[0012] Further, the power device, the liquid supply switch device, and the flushing switch device are respectively connected to the control device of the polishing machine to control the actions of the power device, the liquid supply switch device, and the flushing switch device.

[0013] A polishing machine system includes a device for preventing blockage of the liquid supply pipe of the polishing machine as described above.

[0014] Due to the above technical solution, there are a liquid supply branch and a flushing branch. Both the liquid supply branch and the flushing branch are connected to and communicate with the liquid supply pipeline. When supplying polishing liquid to the polishing machine, the liquid supply branch is opened and the flushing branch is closed. When flushing the liquid supply pipeline and the polishing pad, the liquid supply branch is closed and the flushing branch is opened. The liquid supply branch and the flushing branch do not work simultaneously, which can prevent the mixing of polishing liquid and pure water and will not affect the quality of the polishing liquid.

[0015] When changing the polishing liquid at regular intervals, the liquid supply switch device is closed and the flushing switch device is opened. A large amount of pure water flows along the liquid supply pipeline into the polishing machine to brush the polishing pad. At the same time, a large amount of pure water flushes the liquid supply pipeline, avoiding blockage of the liquid supply pipeline caused by crystallization of the polishing liquid. At the same time, there is no need to stop the machine for flushing the liquid supply pipeline, reducing waste of machine time, not affecting production capacity, and effectively preventing blockage of the liquid supply pipeline caused by crystallization of the polishing liquid of the wax polishing machine. Description of the Drawings

[0016] Figure 1 is a schematic structural diagram of an embodiment of the present invention.

[0017] In the figure:

[0018] 1. Polishing liquid storage device 2. Power device 3. Filter device

[0019] 4. Liquid supply switch device 5. Flushing switch device 6. Liquid supply pipeline

[0020] 7. Polishing machine Detailed Embodiment

[0021] The present invention will be further described below with reference to the drawings and specific embodiments.

[0022] Figure 1The structure diagram of an embodiment of the present utility model is shown. This embodiment relates to a device for preventing the clogging of the liquid supply pipe of a polishing machine and a polishing machine system, which has a flushing branch and a liquid supply branch. When changing the polishing liquid, the flushing branch is opened and the liquid supply branch is closed. While flushing the polishing pad of the polishing machine, the flushing branch also flushes the liquid supply pipeline, flushing away the crystallization of the polishing liquid in the liquid supply pipeline, avoiding the clogging of the liquid supply pipeline. At the same time, there is no need to stop the machine for flushing the liquid supply pipeline, and the production capacity will not be affected.

[0023] A device for preventing the clogging of the liquid supply pipe of a polishing machine is applied to a wax polishing machine and flushes the liquid supply pipeline 6 and the polishing pad during the process of changing the polishing liquid. As Figure 1 shown, it includes a liquid supply branch for supplying liquid to the polishing machine 7 and a flushing branch for flushing the liquid supply pipeline 6. Among them, the flushing branch and the liquid supply branch are respectively connected and communicated with one end of the liquid supply pipeline 6, and the other end of the liquid supply pipeline 6 is connected to the polishing machine 7. The liquid supply branch supplies the polishing liquid to the polishing machine 7, and the flushing branch flushes the crystallization of the polishing liquid in the liquid supply pipeline 6. At the same time, the flushing branch supplies pure water to the polishing machine to brush the polishing pad. When the liquid supply branch supplies the polishing liquid to the polishing machine 7, the flushing branch is closed. When changing the polishing liquid, when the flushing branch flushes the liquid supply pipeline 6 and the polishing pad, the liquid supply branch is closed. The liquid supply branch and the flushing branch do not work simultaneously to prevent the mixing of pure water and polishing liquid. The liquid supply pipeline 6 and the polishing pad can be cleaned without stopping the machine, preventing the liquid supply pipeline 6 from being clogged by the crystallization of the polishing liquid, avoiding waste of working hours, and at the same time not affecting the production capacity.

[0024] Specifically, the above-mentioned liquid supply branch includes a power device 2, a filtering device 3, and a liquid supply switch device 4 arranged in sequence along the flow direction of the polishing liquid. The power device 2, the filtering device 3, and the liquid supply switch device 4 are all arranged on the connecting pipeline between the polishing liquid storage device 1 and the liquid supply pipeline 6. The power device 2 provides power for the flow of the polishing liquid, so that the polishing liquid flows along the connecting pipeline under the action of the power device 2. The filtering device 3 filters the polishing liquid to remove impurities in the polishing liquid entering the polishing machine 7, ensuring the cleanliness of the polishing liquid entering the polishing machine 7. The liquid supply switch device 4 controls the opening and closing of the connecting pipeline between the polishing liquid storage device 1 and the liquid supply pipeline 6, so that the polishing liquid in the polishing liquid storage device 1 can enter the liquid supply pipeline 6 after being filtered by the filtering device 3 under the action of the power device 2.

[0025] The polishing liquid storage device 1 has a storage space for storing polishing liquid. The liquid outlet end of the polishing liquid storage device 1 is connected to the liquid inlet end of the power device 2 through a connecting pipe. The liquid outlet end of the power device 2 is connected to the liquid inlet end of the filtering device 3 through a connecting pipe. The liquid outlet end of the filtering device 3 is connected to the liquid inlet end of the liquid supply switch device 4 through a connecting pipe. The liquid outlet end of the liquid supply switch device 4 is connected to the liquid supply pipeline 6 through a connecting pipe, and this connecting pipe is connected to the liquid supply pipeline 6 through a tee joint so that the liquid supply pipeline 6 can be connected to the flushing branch. When the liquid supply switch device 4 is opened, the liquid supply branch is in an open state. The power device 2 operates, and the polishing liquid in the polishing liquid storage device 1 flows along the connecting pipe under the action of the power device 2, successively flowing through the power device 2, the filtering device 3, and the liquid supply switch device 4 and entering the liquid supply pipeline 6, and flowing along the liquid supply pipeline 6 into the polishing machine 7. When the polishing liquid needs to be replaced, the liquid supply switch device 4 is closed, the liquid supply branch is shut off, the polishing liquid cannot flow along the connecting pipe and cannot enter the liquid supply pipeline 6. The liquid supply switch device 4 controls the on-off of the liquid supply branch to control whether to supply polishing liquid to the polishing machine 7.

[0026] In some implementable embodiments, preferably, the above-mentioned power device 2 is a liquid supply pump, which is a commercially available product and is selected according to actual needs.

[0027] In some implementable embodiments, preferably, the above-mentioned liquid supply switch device 4 is a pneumatic valve, which is a commercially available product and is selected according to actual needs.

[0028] In some implementable embodiments, preferably, the filtering device 3 is provided with a filter element capable of filtering the polishing liquid.

[0029] The above-mentioned flushing branch includes a flushing switch device 5. The flushing switch device 5 is arranged on the connecting pipe between the pure water supply device and the liquid supply pipeline 6 to control the opening and closing of the connecting pipe between the pure water supply device and the liquid supply pipeline 6. When the flushing switch device 5 is opened, the pure water in the pure water supply device can enter the liquid supply pipeline 6 and flow along the liquid supply pipeline 6 into the polishing machine to brush the polishing pad. A large amount of pure water flushes the crystallization of the polishing liquid in the liquid supply pipeline 6. When the flushing switch device 5 is closed, the flushing branch is closed, and the pure water in the pure water supply device cannot enter the liquid supply pipeline 6. The liquid outlet end of the pure water supply device is connected to the liquid inlet end of the flushing switch device 5 through a connecting pipe, and the liquid outlet end of the flushing switch device 5 is connected to the liquid supply pipeline 6 through a connecting pipe, and this connecting pipe is connected to the tee joint on the liquid supply pipeline 6 to form a flushing branch for pure water supply.

[0030] In some implementable embodiments, preferably, the flushing switch device 5 is a pneumatic valve, which is a commercially available product and is selected according to actual needs.

[0031] In some feasible embodiments, the above-mentioned pure water supply device includes a pure water storage device and a pure water power device. The pure water storage device is connected to the liquid supply pipeline 6 through a connecting pipe. The pure water power device is arranged on the connecting pipe between the pure water storage device and the liquid supply pipeline 6. The pure water storage device has a storage space, and pure water is stored in this storage space. The liquid outlet end of the pure water storage device is connected to the liquid inlet end of the pure water power device through a connecting pipe. The liquid outlet end of the pure water power device is connected to the liquid inlet end of the flushing switch device 5 through a connecting pipe. The liquid outlet end of the flushing switch device 5 is connected to the liquid supply pipeline 6 through a connecting pipe. When the flushing switch device 5 is opened, the pure water in the pure water storage device flows along the connecting pipe under the action of the pure water power device, passes through the flushing switch device 5 and enters the liquid supply pipeline 6.

[0032] In some feasible embodiments, preferably, the above-mentioned pure water power device 2 is a liquid supply pump, which is a commercially available product and can be selected according to actual needs.

[0033] Of course, in some feasible embodiments, the pure water supply device can also be a pure water supply system in a production workshop.

[0034] In order to automatically brush the polishing pad and flush the liquid supply pipeline during the liquid change of the polishing liquid when the polishing machine 7 is working, the power device 2, the liquid supply switch device 4, and the flushing switch device 5 are respectively connected to the control device of the polishing machine 7 to control the actions of the power device 2, the liquid supply switch device 4, and the flushing switch device 5. When the control device of the polishing machine 7 receives a signal for liquid change, the control device controls the liquid supply switch device 4 to close, and at the same time controls the power device 2 to stop working, shuts off the liquid supply branch, stops supplying the polishing liquid, and controls the flushing switch device 5 to open. The pure water supply device operates, and pure water enters the liquid supply pipeline 6 to flush the crystallization of the polishing liquid in the liquid supply pipeline 6, thereby preventing the liquid supply pipeline 6 from being blocked by the crystallization of the polishing liquid. The pure water flowing out of the liquid supply pipeline 6 enters the polishing machine to brush the polishing pad, which can avoid the mixing of the polishing liquid and pure water, and there is no need to stop the machine to flush the liquid supply pipeline 6, reducing the waste of working hours and not affecting the production capacity.

[0035] The pure water supply device can be manually opened, or the pure water supply device is connected to the control device of the polishing machine 7, and the control device controls the operation of the pure water supply device according to the received signal to supply pure water.

[0036] A polishing machine system includes the above-mentioned device for preventing blockage of the liquid supply pipe of the polishing machine, and this device for preventing blockage of the liquid supply pipe of the polishing machine is connected to the polishing machine.

[0037] The device for preventing the clogging of the liquid supply pipe of the polishing machine is connected to the polishing machine 7. When the polishing machine 7 is working, the liquid supply switch device 4 is opened, and the power device 2 operates. Under the action of the power device 2, the polishing liquid in the polishing liquid storage device 1 flows along the connecting pipe, successively passing through the power device 2, the filtering device 3, and the liquid supply switch device 4, entering the liquid supply pipeline 6, and flowing out from the liquid supply pipeline 6 and entering the polishing machine 7 to continuously supply the polishing liquid to the polishing machine 7. At the same time, the flushing switch device 5 is closed, and the pure water supply device does not supply pure water, so that the polishing liquid and pure water are not mixed, and the supply of the polishing liquid is not affected. After every 6 - 7 hours, the polishing liquid is changed. At this time, the control device of the polishing machine 7 controls the liquid supply switch device 4 to close, and at the same time, controls the power device 2 to stop operating, the liquid supply branch is shut off, and the supply of the polishing liquid is not carried out. At the same time, the flushing switch device 5 is controlled to be opened, and the pure water supply device supplies pure water. A large amount of pure water enters the liquid supply pipeline 6 and flows along the liquid supply pipeline 6 to flush the crystallization of the polishing liquid in the liquid supply pipeline 6. At the same time, a large amount of pure water enters the polishing machine 7 to brush the polishing pad of the polishing machine 7, realizing the flushing of the liquid supply pipeline 6 while brushing the polishing pad, preventing the clogging of the liquid supply pipeline 6 by the crystallization of the polishing liquid, and eliminating the need to stop the machine for flushing the liquid supply pipeline 6, reducing the waste of machine time.

[0038] Due to the adoption of the above technical solution, there are a liquid supply branch and a flushing branch. Both the liquid supply branch and the flushing branch are connected and communicated with the liquid supply pipeline. When supplying the polishing liquid to the polishing machine, the liquid supply branch is opened and the flushing branch is closed. When flushing the liquid supply pipeline and the polishing pad, the liquid supply branch is closed and the flushing branch is opened. The liquid supply branch and the flushing branch do not work simultaneously, which can prevent the mixing of the polishing liquid and pure water and will not affect the quality of the polishing liquid. When the polishing liquid is changed every once in a while, the liquid supply switch device is closed and the flushing switch device is opened. A large amount of pure water flows along the liquid supply pipeline into the polishing machine to brush the polishing pad. At the same time, a large amount of pure water flushes the liquid supply pipeline, avoiding the clogging of the liquid supply pipeline by the crystallization of the polishing liquid. At the same time, there is no need to stop the machine for flushing the liquid supply pipeline, reducing the waste of machine time, not affecting the production capacity, and effectively preventing the clogging of the liquid supply pipeline by the crystallization of the polishing liquid of the wax polishing machine.

[0039] The above has described the embodiments of the present invention in detail, but the content described is only the preferred embodiments of the present invention and cannot be considered as limiting the scope of implementation of the present invention. All equivalent changes and improvements made according to the scope of the application of the present invention shall still fall within the scope covered by the patent of the present invention.

Claims

1. A device for preventing a polishing machine liquid supply pipe from being blocked, characterized in that: It includes a liquid supply branch for supplying liquid to the polishing machine and a flushing branch for flushing the liquid supply pipeline, wherein the flushing branch and the liquid supply branch are respectively connected to and communicated with one end of the liquid supply pipeline, and the other end of the liquid supply pipeline is connected to the polishing machine. When the liquid supply branch supplies polishing liquid to the polishing machine, the flushing branch is closed, and when the flushing branch flushes the liquid supply pipeline, the liquid supply branch is closed; The flushing branch includes a flushing switch device, which is arranged on the connecting pipe between the pure water supply device and the liquid supply pipeline to control the opening and closing of the connecting pipe between the pure water supply device and the liquid supply pipeline; The liquid supply branch includes a power device, a filter device and a liquid supply switch device which are sequentially arranged along the flow direction of the polishing liquid. The power device, the filter device and the liquid supply switch device are all arranged on the connecting pipe between the polishing liquid storage device and the liquid supply pipeline. The polishing liquid in the polishing liquid storage device can enter the liquid supply pipeline after being filtered by the filter device under the action of the power device. The liquid supply switch device controls the opening and closing of the connecting pipe between the polishing liquid storage device and the liquid supply pipeline. The pure water supply device comprises a pure water storage device and a pure water power device, the pure water storage device is connected to the liquid supply pipeline via a connecting pipeline, and the pure water power device is arranged on the connecting pipeline between the pure water storage device and the liquid supply pipeline; The power device, the liquid supply switch device and the flushing switch device are respectively connected to the control device of the polishing machine to control the actions of the power device, the liquid supply switch device and the flushing switch device.

2. The device for preventing the polishing machine liquid supply pipe from being blocked according to claim 1, characterized in that: The power device is a liquid supply pump, and the liquid supply switch device is a pneumatic valve.

3. The device for preventing the polishing machine liquid supply pipe from being blocked according to claim 2, characterized in that: The filtering device is provided with a filtering core.

4. The device for preventing the polishing machine liquid supply pipe from being blocked according to claim 1, characterized in that: The flushing switch device is a pneumatic valve.

5. The device for preventing the polishing machine liquid supply pipe from being blocked according to claim 4, characterized in that: The pure water power device is a liquid supply pump.

6. A polishing machine system, characterized in that: It comprises a device for preventing the polishing machine liquid supply pipe from being blocked as described in any one of claims 1 to 5.