Pollution detection device and semiconductor equipment
By designing a pollution detection device including light emitter, regulator and light receiver in semiconductor equipment, the problems of deposition efficiency and damage to film performance caused by low shower head contamination are solved, and accurate detection and cleaning of contaminated areas are achieved, process stability and product quality are improved.
Patent Information
- Application Number
- CN202422085706.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-27
- Publication Date
- 2025-07-01
- Estimated Expiration
- 2034-08-27
AI Technical Summary
In the chemical vapor deposition process, low shower heads are susceptible to contamination, resulting in reduced deposition efficiency and damaged film performance. The existing cleaning methods cannot detect and clean contaminated areas in a targeted manner, affecting process stability and product quality.
A pollution detection device is designed, including a light emitter, a regulator and a light receiver. By adjusting the position of the light emitter, the light receiver is used to receive light signals emitted from different positions to determine the contaminated area.
Accurate detection of low-shower head contaminated areas is achieved, which facilitates subsequent targeted cleaning and improves process stability and product yield.
Smart Images
Figure CN223051178U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the field of semiconductor equipment, and particularly relates to a pollution detection device and a semiconductor equipment. Background Art
[0002] In the process of Flowable Chemical Vapor Deposition (FCVD), the processes of Chemical Vapor Deposition (Dep) and Cure are the key steps to achieve high-performance thin film growth and property regulation. However, the complex chemical reactions and physical phenomena involved in these processes pose many challenges to process control.
[0003] In the process of chemical vapor deposition, since the thin film material has excellent fluidity and is rich in oligomers, these characteristics make the thin film show high volatility during the formation process. This volatility not only affects the uniformity and thickness control of the thin film, but also may lead to a decrease in deposition efficiency. At the same time, the presence of oligomers increases the defects and stress inside the thin film, which has an adverse effect on the final performance of the thin film.
[0004] Entering the curing stage, by introducing ozone (O3) and ultraviolet (UV) curing technologies, the aim is to further improve the stability and quality of the thin film. However, the complex chemical reactions occurring in this process, such as the breaking of Si-O / Si-N bonds, and the volatilization of volatile substances such as nitrogen oxides (NO x ) and silane (SiH4), pose new problems to the environmental control in the curing chamber. These volatile by-products not only pollute the curing chamber, but also easily adhere to key components, such as the low showerhead, thus affecting the process stability and product yield.
[0005] At present, the cleaning of the curing chamber is usually carried out by multi-X clean (such as 13X clean) regularly. Before cleaning, the main pollution areas are not known, so targeted cleaning cannot be carried out. After cleaning, it is also not known whether it has been cleaned cleanly enough to meet the production requirements. Therefore, there is still a risk of reducing the product yield. In addition, in the actual production process, it is found that due to the position structure of the pump port during the cleaning process, the low showerhead is prone to local incomplete cleaning problems, which not only shortens the service life of the components, but also may lead to abnormal distribution of the thin film thickness (THK) and refractive index (RI), seriously affecting the performance and quality of the product.
[0006] Therefore, there is an urgent need for a pollution detection device and a semiconductor equipment to improve the above problems. Summary of the Utility Model
[0007] The purpose of the present utility model is to provide a pollution detection device and a semiconductor device, which can realize the pollution detection of a low showerhead.
[0008] In a first aspect, the present utility model provides a pollution detection device, which is applied to a semiconductor device. The semiconductor device includes a reaction chamber and a low showerhead arranged on the reaction chamber. The pollution detection device includes a light emitter, a regulator, and a light receiver.
[0009] The light emitter is arranged above the low showerhead, and the light receiver is arranged below the low showerhead.
[0010] The regulator is connected to the light emitter and is used to adjust the position of the light emitter.
[0011] The light emitter is used to emit detection light passing through the low showerhead to the light receiver based on different positions.
[0012] The light receiver is used to receive the detection light emitted by the light emitter at different positions to determine the pollution area.
[0013] The beneficial effect of the present utility model is as follows: By setting a light emitter, a regulator, and a light receiver; the light emitter is arranged above the low showerhead, and the light receiver is arranged below the low showerhead; the regulator is connected to the light emitter and is used to adjust the position of the light emitter; the light emitter is used to emit detection light passing through the low showerhead to the light receiver based on different positions; the light receiver is used to receive the detection light emitted by the light emitter at different positions to determine the pollution area. By changing the position of the light emitter through the regulator, the light emitter can emit detection light passing through the low showerhead to the light receiver at different positions, and pollution detection is carried out by using the different light absorption and scattering capabilities of the pollution area and the non-pollution area, resulting in different light signals received by the light receiver, so as to determine the pollution area, realize the pollution detection of the low showerhead, facilitate the subsequent targeted cleaning of the pollution area, and thus ensure the stability of the process and the yield of the product.
[0014] Optionally, the regulator is a moving mechanism or a rotating mechanism, which is used to move the light emitter to a set position or rotate it to a set angle.
[0015] And / or the light emitter is located outside the reaction chamber and is arranged on the top of the reaction chamber through the regulator. The beneficial effect thereof is that by setting the regulator as a moving mechanism or a rotating mechanism, it can be applicable to different application scenarios and improve the applicable range.
[0016] Optionally, there are two or more of the optical receivers, and all the optical receivers are arranged around the low shower head. The beneficial effect is that by setting two or more optical receivers and arranging them in a surrounding manner, the contaminated areas on the surface of the low shower head can be comprehensively detected, improving the accuracy of detection.
[0017] Optionally, the optical receiver is arranged inside the reaction chamber, on the side wall of the reaction chamber or outside the reaction chamber. The beneficial effect is that the position of the optical receiver can be determined according to actual needs, so as to meet the requirements of different scenarios.
[0018] Optionally, when the optical receiver is arranged on the side wall of the reaction chamber, there is a receiving position on the side wall of the reaction chamber, and the optical receiver is located in the receiving position;
[0019] And / or a transparent quartz plate for isolation is installed at the opening of the receiving position, and the detection light emitted by the optical transmitter passes through the transparent quartz plate and is received by the optical receiver. The beneficial effect is that by arranging the optical receiver in the receiving position, the influence on the internal flow field of the reaction chamber can be reduced, improving the stability of the process. Adding a transparent quartz plate to isolate the two sides of the space can further avoid the influence on the internal flow field of the reaction chamber caused by the addition of the optical receiver, ensuring the stability of the process.
[0020] Optionally, when the optical receiver is arranged outside the reaction chamber, there is a through hole on the side wall of the reaction chamber;
[0021] A transparent quartz plate for isolation is installed at the through hole, and the detection light emitted by the optical transmitter passes through the transparent quartz plate and is received by the optical receiver. The beneficial effect is that by arranging the optical receiver outside the reaction chamber and using a transparent quartz plate for isolation, the influence on the internal flow field of the reaction chamber is avoided, ensuring the stability of the process.
[0022] Optionally, there are two or more of the optical transmitters, and all the optical transmitters are parallel to each other;
[0023] And / or the optical transmitter is an ultraviolet lamp with a wavelength range of 340 - 380 nm. The beneficial effect is that by setting the optical transmitter as an ultraviolet lamp with a wavelength range of 340 - 380 nm, the detection effect of the contaminated area can be improved.
[0024] Optionally, the optical receiver is a wavelength and / or light intensity receiver. The beneficial effect is that it is convenient for the optical receiver to detect the contaminated area according to the wavelength, light intensity or both wavelength and light intensity together, so as to ensure the accuracy of the detection of the contaminated area.
[0025] Optionally, it further includes a processor and a display;
[0026] The display and the optical receiver are electrically connected to the processor respectively;
[0027] The processor is configured to determine a contamination area based on the detection light received by the optical receiver, and control the display to display the contamination area. The beneficial effect is that by providing the processor and the display, and using the display to display the contamination area, it is convenient to intuitively know the contamination area, thus facilitating subsequent cleaning.
[0028] In a second aspect, the present invention also provides a semiconductor device, including the contamination detection device according to any possible combination of the first aspect above.
[0029] For the beneficial effects of the second aspect above, reference can be made to the description of the first aspect above. BRIEF DESCRIPTION OF THE DRAWINGS
[0030] Figure 1 FIG. is a schematic structural diagram of a contamination detection device provided by an embodiment of the present invention;
[0031] Figure 2 FIG. is a schematic structural diagram of another contamination detection device provided by an embodiment of the present invention;
[0032] Figure 3 FIG. is a schematic principle diagram of a contamination detection device provided by an embodiment of the present invention.
[0033] DESCRIPTION OF REFERENCE NUMERALS:
[0034] 1, reaction chamber; 2, lower showerhead; 3, optical transmitter; 4, optical receiver; 5, transparent quartz plate; 6, contamination area; 7, heater; 8, wafer; 9, pump port; 10, air inlet; 11, regulator; 12, processor; 13, display. DETAILED DESCRIPTION OF THE EMBODIMENTS
[0035] To make the objectives, technical solutions, and advantages of the present utility model clearer, the technical solutions in the embodiments of the present utility model will be clearly and completely described below in conjunction with the accompanying drawings of the present utility model. Apparently, the described embodiments are some, but not all, of the embodiments of the present utility model. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present utility model without creative efforts shall fall within the scope of protection of the present utility model. Unless otherwise defined, the technical terms or scientific terms used herein shall have the ordinary meanings understood by those of ordinary skill in the art to which the present utility model pertains. The technical solutions in the embodiments of the present utility model will be described below in conjunction with the accompanying drawings in the embodiments of the present utility model. Among them, in the description of the embodiments of the present utility model, the terms used in the following embodiments are only for the purpose of describing specific embodiments and are not intended to limit the present utility model. As used in the specification and appended claims of the present utility model, the singular forms "a", "the", "above-mentioned", "this", and "such" are also intended to include expressions such as "one or more", unless the context clearly indicates otherwise. It should also be understood that in the following embodiments of the present utility model, "at least one" and "one or more" mean one or more than two (including two). The term "and / or" is used to describe the association relationship of associated objects and indicates that three relationships may exist; for example, A and / or B may represent: A exists alone, A and B exist simultaneously, and B exists alone, where A and B may be singular or plural. The character " / " generally represents an "or" relationship between the associated objects before and after.
[0036] Reference to "one embodiment" or "some embodiments" described in this specification means that a particular feature, structure, or characteristic described in connection with that embodiment is included in one or more embodiments of the present utility model. Thus, the phrases "in one embodiment", "in some embodiments", "in other some embodiments", and "in still other embodiments" that appear in different places in this specification are not necessarily all referring to the same embodiment, but mean "one or more but not all embodiments", unless otherwise specifically emphasized in another way. The terms "comprise", "include", "have" and their variants all mean "including but not limited to", unless otherwise specifically emphasized in another way. The term "connection" includes direct connection and indirect connection, unless otherwise stated. "First" and "second" are only used for descriptive purposes and cannot be construed as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features.
[0037] In the embodiments of the present utility model, "exemplarily" or "for example" is used to give examples, illustrations or explanations. Any embodiment or design solution described as "exemplarily" or "for example" in the embodiments of the present utility model should not be construed as being more preferred or having more advantages than other embodiments or design solutions. Rather, the use of "exemplarily" or "for example" is intended to present relevant concepts in a specific manner.
[0038] Regarding the problems existing in the prior art, such as Figure 1 As shown, the present utility model provides a pollution detection device, which is applied to semiconductor equipment (such as a flowable chemical vapor deposition equipment or similar semiconductor equipment that requires pollution detection). The semiconductor equipment includes a reaction chamber 1 (such as a curing chamber) and a low showerhead 2 (lowShowerhead) provided on the reaction chamber 1. The pollution detection device includes a light emitter 3 (such as an ultraviolet lamp), a regulator 11 (not shown), and a light receiver 4. The light emitter 3 is provided above the low showerhead 2, and the light receiver 4 is provided below the low showerhead 2. The regulator 11 is connected to the light emitter 3 and is used to adjust the position of the light emitter 3. The light emitter 3 is used to emit detection light passing through the low showerhead 2 to the light receiver 4 based on different positions. The light receiver 4 is used to receive the detection light emitted by the light emitter 3 at different positions to determine the pollution area 6. The working principle of the present utility model is as follows: When in use, the light emitter 3 works to emit detection light passing through the low showerhead 2 to the light receiver 4 based on the initial position. Then the regulator 11 works to adjust the initial position of the light emitter 3 to a set position or a set angle by moving or rotating. The light emitter 3 works to emit detection light passing through the low showerhead 2 to the light receiver 4 based on the set position or the set angle. Due to the different absorption and scattering capabilities of the pollution area 6 and the non-pollution area 6 for light, resulting in different light signals received by the light receiver 4, pollution detection is performed according to the difference in the light signals received before and after (such as the difference in wavelength or the attenuation degree of light intensity) to determine the pollution area 6, realizing the pollution detection of the low showerhead 2, facilitating subsequent targeted cleaning of the pollution area 6, and thus ensuring the stability of the process and the yield of the product. It should be understood that the regulator 11 can also be used to change the position of the light emitter 3 multiple times (the specific number of times can be adjusted according to actual needs) for pollution detection. For example, the light emitter 3 first emits detection light to the light receiver 4 based on the initial position, then rotates 90° clockwise and emits detection light to the light receiver 4, and finally rotates 90° clockwise again and emits detection light to the light receiver 4. The light receiver 4 performs pollution detection based on the differences in wavelength and light intensity of the detection light emitted by the light emitter 3 at the three positions of the initial position / rotation of 90° / rotation of 180° to determine the pollution area 6, which can further improve the accuracy of pollution detection.
[0039] In some embodiments, in order to be applicable to different application scenarios and improve the scope of application, such as Figure 1 or Figure 2 as shown, the regulator 11 (not shown) is a moving mechanism or a rotating mechanism for moving the light emitter 3 to a set position or rotating it to a set angle; and / or the light emitter 3 is located outside the reaction chamber 1, and the top of the reaction chamber 1 is arranged through the regulator 11. Among them, the moving mechanism can be a cooperating structure of a robotic arm or a slide rail and slider for moving the regulator 11, and the rotating mechanism can be a motor or a rotating table, etc. Exemplarily, the light emitter 3 and the regulator are mounted on the top of the reaction chamber 1 (such as by fixed connection methods such as welding or integral molding, or by detachable connection methods such as threads or snap fits).
[0040] In some embodiments, in order to be able to comprehensively detect the contaminated area 6 on the surface of the lower showerhead 2 and improve the accuracy of detection, such as Figure 1 or Figure 2 as shown, two light receivers 4 are provided (the specific number can be adjusted according to actual needs), and the two light receivers 4 are arranged around the lower showerhead 2.
[0041] In some embodiments, in order to meet the requirements of different scenarios, the light receiver 4 is arranged inside the reaction chamber 1, or as Figure 2 shown, the light receiver 4 is arranged outside the reaction chamber 1, or as Figure 1 shown, the light receiver 4 can also be directly arranged on the side wall of the reaction chamber 1. It should be noted that when the light receiver 4 is arranged inside the reaction chamber 1 or on the side wall of the reaction chamber 1, the transparent quartz plate 5 may not be provided.
[0042] In some specific embodiments, in order to reduce the influence on the internal flow field of the reaction chamber 1 and improve the stability of the process, such as Figure 1 as shown, when the light receiver 4 is arranged (such as by fixed connection methods such as welding or integral molding, or by detachable connection methods such as threads or snap fits) on the side wall of the reaction chamber 1, a receiving position is provided on the side wall of the reaction chamber 1, and the light receiver 4 is located in the receiving position; and / or a transparent quartz plate 5 for isolation is installed (such as by fixed connection methods such as sealing glue bonding, or by detachable connection methods such as threads or snap fits) at the opening of the receiving position. The detection light emitted by the light emitter 3 passes through the transparent quartz plate 5 and is received by the light receiver 4. Adding the transparent quartz plate 5 to isolate the two sides of the space can further avoid the influence of the addition of the light receiver 4 on the internal flow field of the reaction chamber 1 and ensure the stability of the process. Among them, the transparent quartz plate 5 is preferably made of high-strength light transmissivity.
[0043] In some other specific embodiments, in order to avoid affecting the internal flow field of the reaction chamber 1 and ensure the stability of the process, as Figure 2 shown, when the optical receiver 4 is arranged (such as by fixed connection means such as welding or integral molding, or by detachable connection means such as threading or clamping) outside the reaction chamber 1, a through hole is provided on the side wall of the reaction chamber 1; a transparent quartz plate 5 for isolation is installed (such as by fixed connection means such as bonding with sealant, or by detachable connection means such as threading or clamping) at the through hole, and the detection light emitted by the optical transmitter 3 passes through the transparent quartz plate 5 and is received by the optical receiver 4. Among them, the transparent quartz plate 5 is preferably made of high-strength light transmissivity.
[0044] In some embodiments, in order to improve the detection effect on the contamination area 6, two optical transmitters 3 are provided (the specific number can be adjusted according to actual needs), and the two optical transmitters 3 are parallel to each other; and / or the optical transmitter 3 is an ultraviolet lamp with a wavelength range of 340 - 380 nm.
[0045] In some embodiments, in order to ensure the accuracy of the detection of the contamination area 6, the optical receiver 4 is a wavelength and / or light intensity receiver.
[0046] In some embodiments, in order to intuitively know the contamination area 6, so as to facilitate subsequent cleaning, as Figure 3 shown, the contamination detection device further includes a processor 12 and a display 13; the display 13 and the optical receiver 4 are respectively electrically connected to the processor 12; the processor 12 is configured to determine the contamination area 6 according to the optical signal generated when the optical receiver 4 receives the detection light, and control the display 13 to display the contamination area 6. In addition, the processor 12 is also electrically connected to the regulator 11, and is used to control the regulator 11 to work to change the position of the optical transmitter 3.
[0047] Based on the above contamination detection device, as Figure 1 or Figure 2As shown, the present utility model also provides a semiconductor device. Exemplarily, when the semiconductor device is a flowable chemical vapor deposition device, the reaction chamber 1 is a curing chamber at this time. The device includes a curing chamber, a low showerhead 2 (low Showerhead) provided on the reaction chamber 1, and a heater 7 provided in the curing chamber for carrying the wafer 8. The curing chamber is also provided with a pump port 9 for pumping air and an air inlet 10 for introducing ammonia. The air inlet 10 is located at the bottom of the curing chamber, and the pump port 9 is located on the side wall of the curing chamber. The pollution detection device includes a light emitter 3 (such as an ultraviolet lamp), a regulator 11, and a light receiver 4; the light emitter 3 is provided above the low showerhead 2, and the light receiver 4 is provided below the low showerhead 2; the regulator 11 is connected to the light emitter 3 for adjusting the position of the light emitter 3; the light emitter 3 is used to emit detection light passing through the low showerhead 2 to the light receiver 4 based on different positions; the light receiver 4 is used to receive the detection light emitted by the light emitter 3 at different positions to determine the pollution area 6. The working principle of the present utility model is as follows: During flowable chemical vapor deposition, the precursors are selected as TSA (trimethylsilylamine) and NH3 (ammonia), the reaction temperature during deposition should be 65°C, and the reaction temperature during curing is 10°C. The curing process is divided into ozone preliminary treatment and ultraviolet curing treatment. The low showerhead 2 in the curing chamber adopts a dual-channel showerhead (Duel Channel Showerhead) design. When the wafer 8 on the heating plate completes flowable chemical vapor deposition, the pollution detection device starts to work. The light emitter 3 emits detection light passing through the low showerhead 2 to the light receiver 4 based on the initial position. Then the regulator 11 works to control the light emitter 3 to rotate 90° clockwise and emit detection light to the light receiver 4. Finally, the light emitter 3 is controlled to rotate 90° clockwise again and emit detection light to the light receiver 4. The light receiver 4 performs pollution detection based on the differences in the wavelength and light intensity of the detection light emitted by the light emitter 3 at the three positions of the initial position / rotating 90° / rotating 180°. Due to the different absorption and scattering abilities of light by the pollution area 6 and the non-pollution area 6, the light signals received by the light receiver 4 are different. Pollution detection is carried out based on the differences in the light signals received before and after (such as the difference in wavelength or the attenuation degree of light intensity) to determine the pollution area 6 and display it, realizing the pollution detection of the low showerhead 2, facilitating the subsequent targeted cleaning of the pollution area 6, and thus ensuring the stability of the process and the yield of the product.
[0048] Although the embodiments of the present utility model have been described in detail above, it is obvious to those skilled in the art that various modifications and changes can be made to these embodiments. However, it should be understood that such modifications and changes are all within the scope and spirit of the present utility model described in the claims. Moreover, the present utility model described herein can have other embodiments and can be implemented or realized in various ways.
Claims
1. A contamination detection device, applied to a semiconductor device, the semiconductor device comprising a reaction chamber and a low shower head arranged on the reaction chamber, characterized in that: The pollution detection device includes a light transmitter, a regulator and a light receiver; The light transmitter is arranged above the low shower head, and the light receiver is arranged below the low shower head; The adjuster is connected to the light emitter and is used to adjust the position of the light emitter; The light transmitter is used to transmit the detection light passing through the lower shower head to the light receiver based on different positions; The optical receiver is used to receive the detection light emitted by the optical transmitter at different positions to determine the contaminated area.
2. The device according to claim 1, characterized in that The regulator is a moving mechanism or a rotating mechanism, which is used to move the light emitter to a set position or rotate it to a set angle; And / or the light emitter is located outside the reaction chamber, and the top of the reaction chamber is set by the regulator.
3. The device according to claim 1, characterized in that There are more than two light receivers, and all the light receivers are arranged around the low shower head.
4. The device according to claim 1, characterized in that The optical receiver is arranged in the reaction chamber, on the side wall of the reaction chamber or outside the reaction chamber.
5. The device according to claim 4, characterized in that When the optical receiver is disposed on the side wall of the reaction chamber, a receiving position is provided on the side wall of the reaction chamber, and the optical receiver is located in the receiving position; And / or a transparent quartz plate for isolation is installed at the opening of the accommodation position, and the detection light emitted by the light transmitter passes through the transparent quartz plate and is received by the light receiver.
6. The device according to claim 4, characterized in that When the optical receiver is arranged outside the reaction chamber, a through hole is provided on the side wall of the reaction chamber; A transparent quartz plate for isolation is installed at the through hole, and the detection light emitted by the light transmitter is received by the light receiver after passing through the transparent quartz plate.
7. The device according to claim 1, characterized in that There are more than two light emitters, and all the light emitters are parallel to each other; And / or the light emitter is an ultraviolet lamp with a wavelength range of 340-380nm.
8. The device according to claim 1, characterized in that The optical receiver is a wavelength and / or light intensity receiver.
9. The device according to claim 1, characterized in that It also includes a processor and a display; The display and the optical receiver are electrically connected to the processor respectively; The processor is used to determine the contaminated area according to the detection light received by the light receiver, and control the display to display the contaminated area.
10. A semiconductor device, characterized in that: Comprising a pollution detection device as claimed in any one of claims 1 to 9.