Krypton-xenon mixed gas separation and purification system

Abstract

The utility model relates to the technical field of krypton and xenon purification, in particular to a krypton and xenon mixed gas separation and purification system which comprises a raw material supply unit, the technological process of the raw material supply unit is limited; a krypton-xenon rectification separation unit; the technological process of the krypton-xenon rectification separation unit is limited; a purification unit; meanwhile, the technological process of the purification unit is limited. Experiments show that the terminal product krypton subjected to the separation and purification process reaches the electronic grade standard of 99.9999% or above, and the high-purity xenon reaches the standard of 99.9995% or above. The research and development process can safely and efficiently separate and purify crude krypton and xenon, and greatly improves the product quality of terminal products while reducing the loss of crude krypton and xenon feed gas.

Description

Technical Field

[0001] The utility model relates to the technical field of krypton-xenon purification, in particular to a krypton-xenon mixed gas separation and purification system. Background Art

[0002] Krypton and xenon are Group 0 elements in the periodic table, also known as noble gases or rare gases. They are colorless, odorless monatomic gases under normal temperature and pressure and are difficult to undergo chemical reactions. Krypton and xenon have important industrial applications and play an important role in the development of the national economy. In recent years, the demand for krypton and xenon in China and the world has continued to grow at a high speed. The main reason is that their applications are becoming more and more extensive, not only used in the traditional lighting industry, but also widely used in industries such as flat-panel TV manufacturing, insulating glass manufacturing, medical industry, electronic chips, and satellites.

[0003] Xenon is mainly used in plasma etching technology, ion engines for satellite launches, and ion plasma thrusters in the industrial electronic chip manufacturing industry. Krypton is used in electric light sources, such as high-grade electron tubes, continuous ultraviolet lamps, etc., and in scientific research fields, such as filling ionization chambers, gas lasers, bubble chambers of particle detectors, etc. In the medical field, krypton-xenon gas can be used for xenon laser therapy to cut and coagulate tissues. In addition, krypton-xenon gas has been widely used in clinical medical imaging technologies, including X-rays, magnetic resonance imaging, CT, etc.

[0004] The existing purification methods for xenon and krypton are purification by a double-column rectification method. Since the boiling points of xenon and krypton are close, and there are other impurity gases with the same boiling points as krypton and xenon, it is very difficult to achieve a high-purity level by simply using the rectification method to separate krypton and xenon gas.

[0005] Therefore, it is very necessary to design a full-process crude krypton-xenon separation and purification device. Content of the Utility Model

[0006] In view of this, the technical problem to be solved by the utility model is to provide a krypton-xenon mixed gas separation and purification system, which can obtain krypton and xenon gases with higher purity.

[0007] The present application provides a krypton-xenon mixed gas separation and purification system, including:

[0008] A raw material supply unit; the raw material supply unit includes: a crude krypton-xenon mixed raw material gas device; an adsorption device connected to the outlet of the crude krypton-xenon mixed raw material gas device; a branch is provided on the pipeline between the crude krypton-xenon mixed raw material gas device and the adsorption device, and a high-pressure helium gas device, a low-pressure helium gas device, a vacuum pumping device, and an exhaust device are connected in parallel on the branch;

[0009] Krypton-xenon rectification separation unit; the krypton-xenon rectification separation unit includes: an impurity removal rectification column; the inlet of the impurity removal rectification column is connected to the outlet of the adsorption device; the top of the impurity removal rectification column is provided with an impurity gas outlet; a xenon-krypton separation rectification column connected to the purified gas outlet of the impurity removal rectification column; the top of the xenon-krypton separation rectification column is provided with a krypton gas outlet; a xenon purification rectification column connected to the xenon gas outlet of the xenon-krypton separation rectification column;

[0010] Purification unit; the purification unit includes: a krypton gas purifier connected to the krypton gas outlet of the xenon-krypton separation rectification column; the krypton gas purifier includes a first adsorption reactor, a first purification air intake device, and a first dehydrogenation reactor connected in sequence; and a xenon gas purifier connected to the xenon gas outlet of the xenon purification rectification column; the xenon gas purifier is connected with a second adsorption reactor, a second purification air intake device, and a second dehydrogenation reactor in sequence.

[0011] Preferably, the adsorption device includes two molecular sieve adsorbent tanks: a first molecular sieve adsorbent tank A and a second molecular sieve adsorbent tank B; the first molecular sieve adsorbent tank A and the second molecular sieve adsorbent tank B are arranged in parallel.

[0012] Preferably, a No. 1 pressure reducing valve is provided at the inlet of the adsorption device;

[0013] A branch is provided on the pipeline between the crude krypton-xenon mixed raw gas device and the No. 1 pressure reducing valve, and a high-pressure helium device, a low-pressure helium device, a vacuum pumping device, and an exhaust device are arranged in parallel on the branch.

[0014] Preferably, the high-pressure helium device is a high-pressure helium purge purifier; a No. 1 helium discharge valve is provided at the outlet of the high-pressure helium device.

[0015] Preferably, the low-pressure helium device is a low-pressure helium purge purifier; a No. 2 helium discharge valve is provided at the outlet of the low-pressure helium device.

[0016] Preferably, the vacuum pumping device is a vacuum pump; a vacuum pumping valve is provided at the inlet of the vacuum pump;

[0017] The exhaust device is a No. 1 exhaust valve.

[0018] Preferably, a No. 1 mass control valve is provided at the inlet of the impurity removal rectification column;

[0019] A No. 2 exhaust valve is provided at the impurity gas outlet at the top of the impurity removal rectification column;

[0020] A No. 2 mass control valve is provided at the purified gas inlet of the xenon-krypton separation rectification column;

[0021] A No. 3 mass control valve is provided at the xenon gas inlet of the xenon purification rectification column;

[0022] An impurity gas outlet is provided at the top of the xenon purification rectification column; a No. 3 exhaust valve is provided at the impurity gas outlet of the xenon purification rectification column.

[0023] Preferably, the krypton-xenon mixed gas separation and purification system further includes: a product filling unit;

[0024] The product filling unit includes:

[0025] A krypton gas membrane compressor; the krypton gas membrane compressor is arranged on the pipeline between the krypton-xenon separation rectification column and the krypton gas purifier unit;

[0026] A krypton gas product filling end connected to the krypton gas outlet of the krypton gas purifier unit;

[0027] A xenon gas membrane compressor; the xenon gas membrane compressor is arranged on the pipeline between the xenon purification rectification column and the xenon gas purifier unit;

[0028] A xenon gas product filling end connected to the xenon gas outlet of the xenon gas purifier unit.

[0029] Preferably, the krypton gas product filling end includes two groups of krypton gas cylinders connected in parallel. The first group of krypton gas cylinders is connected to a No. 4 exhaust valve, and the second group of krypton gas cylinders is connected to a No. 5 exhaust valve;

[0030] The xenon gas product filling end includes two groups of xenon gas cylinders connected in parallel. The first group of xenon gas cylinders is connected to a No. 6 exhaust valve, and the second group of xenon gas cylinders is connected to a No. 7 exhaust valve.

[0031] Preferably, the krypton-xenon mixed gas separation and purification system further includes: a recovery unit;

[0032] The recovery unit includes a tail gas recovery unit, and the tail gas recovery unit is connected to the impurity gas outlet of the xenon purification rectification column.

[0033] Experiments show that the end product krypton after the separation and purification process will reach the standard of more than 99.9999% of electronic grade, and high-purity xenon will reach the standard of more than 99.9995%. Description of the Drawings

[0034] Figure 1 It is a diagram of the krypton-xenon mixed gas separation and purification system provided for an embodiment of the present invention. Detailed Embodiments

[0035] The following will describe the technical solutions of the present utility model in a clear and complete manner in combination with the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all of the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present utility model without creative efforts belong to the scope of protection of the present utility model.

[0036] The present application provides a krypton-xenon mixed gas separation and purification system, including:

[0037] A raw material supply unit; the raw material supply unit includes: a crude krypton-xenon mixed raw material gas device; an adsorption device connected to the outlet of the crude krypton-xenon mixed raw material gas device; a branch is provided on the pipeline between the crude krypton-xenon mixed raw material gas device and the adsorption device, and a high-pressure helium gas device, a low-pressure helium gas device, a vacuum pumping device, and an exhaust device are connected in parallel on the branch;

[0038] A krypton-xenon rectification separation unit; the krypton-xenon rectification separation unit includes: an impurity removal rectification column; the inlet of the impurity removal rectification column is connected to the outlet of the adsorption device; an impurity gas outlet is provided at the top of the impurity removal rectification column; a xenon-krypton separation rectification column connected to the purified gas outlet of the impurity removal rectification column; a krypton gas outlet is provided at the top of the xenon-krypton separation rectification column; a xenon purification rectification column connected to the xenon gas outlet of the xenon-krypton separation rectification column;

[0039] A purification unit; the purification unit includes: a krypton gas purifier connected to the krypton gas outlet of the xenon-krypton separation rectification column; the krypton gas purifier includes a first adsorption reactor, a first purification and suction device, and a first dehydrogenation reactor connected in sequence; and a xenon gas purifier connected to the xenon gas outlet of the xenon purification rectification column; the xenon gas purifier includes a second adsorption reactor, a second purification and suction device, and a second dehydrogenation reactor connected in sequence.

[0040] Figure 1 It is a diagram of the krypton-xenon mixed gas separation and purification system provided by an embodiment of the present utility model.

[0041] 1 is the impurity removal rectification column, 2 is the xenon-krypton separation rectification column, 3 is the xenon purification rectification column, 4 is the adsorption device, 5 is the crude krypton-xenon mixed raw material gas device, 6 is the high-pressure helium gas device, 7 is the low-pressure helium gas device, 8 is the vacuum pumping device, 9 is the exhaust device, 10 is the krypton gas membrane compressor, 11 is the krypton gas purifier unit, 12 is the xenon gas membrane compressor, 13 is the xenon gas purifier unit, and 14 is the tail gas recovery unit.

[0042] Regarding the raw material supply unit:

[0043] The raw material supply unit includes: a crude krypton-xenon mixed raw material gas device 5; an adsorption device 4 connected to the outlet of the crude krypton-xenon mixed raw material gas device 5; a branch is provided on the pipeline between the crude krypton-xenon mixed raw material gas device 5 and the adsorption device 4, and a high-pressure helium gas device 6, a low-pressure helium gas device 7, a vacuum pumping device 8 and an exhaust device 9 are connected in parallel on the branch.

[0044] In this application, the crude krypton-xenon mixed raw material gas device 5 is a crude krypton-xenon mixed raw material gas cylinder for storing the crude krypton-xenon mixed raw material gas.

[0045] In certain embodiments of this application, in the crude krypton-xenon mixed raw material gas, the mass concentration of krypton is 92.8%, the mass concentration of xenon is 7%, and the mass concentration of impurity gases is 0.2%. The impurity gases include non-volatile components such as nitrogen, oxygen, methane, and carbon monoxide.

[0046] The adsorption device 4 is a molecular sieve adsorbent tank; it is filled with molecular sieve adsorbent. The adsorption device is used to remove moisture in the crude krypton-xenon mixed raw material gas and continuously supply qualified raw materials to the subsequent rectification and purification unit. In certain embodiments of this application, the adsorption device 4 includes two molecular sieve adsorbent tanks: a first molecular sieve adsorbent tank A and a second molecular sieve adsorbent tank B; the first molecular sieve adsorbent tank and the second molecular sieve adsorbent tank are connected in parallel. When in use, usually one of the molecular sieve adsorbent tanks can be opened and the other one is reserved. After the molecular sieve adsorbent tank works for a certain period of time, it needs to be regenerated. To enable continuous production, A and B are connected in parallel, and one can be in operation while the other is being regenerated.

[0047] A No. 1 pressure reducing valve is provided at the inlet of the adsorption device.

[0048] In certain embodiments of this application, a branch is provided on the pipeline between the crude krypton-xenon mixed raw material gas device and the No. 1 pressure reducing valve, and a high-pressure helium gas device, a low-pressure helium gas device, a vacuum pumping device and an exhaust device are connected in parallel on the branch.

[0049] The high-pressure helium gas device is a high-pressure helium gas purge purifier. A No. 1 helium gas discharge valve is provided at the outlet of the high-pressure helium gas device.

[0050] The low-pressure helium gas device is a low-pressure helium gas purge purifier. A No. 2 helium gas discharge valve is provided at the outlet of the low-pressure helium gas device.

[0051] Connecting the high-pressure helium gas device and the low-pressure helium gas device in parallel can achieve the replacement and purging of high-pressure helium gas and low-pressure helium gas.

[0052] The vacuum pumping device is a vacuum pump. A vacuum pumping valve is provided at the inlet of the vacuum pump.

[0053] The exhaust device is Exhaust Valve No. 1.

[0054] The settings of each valve are for purging, evacuating, or pressure checking the raw material pipeline, and for achieving raw material feeding.

[0055] Regarding the krypton-xenon rectification separation unit:

[0056] The krypton-xenon rectification separation unit includes: an impurity removal rectification column 1; the inlet of the impurity removal rectification column 1 is connected to the outlet of the adsorption device 4; an impurity gas outlet is provided at the top of the impurity removal rectification column 1; a xenon-krypton separation rectification column 2 connected to the purified gas outlet of the impurity removal rectification column 1; a krypton gas outlet is provided at the top of the xenon-krypton separation rectification column 2; a xenon purification rectification column 3 connected to the xenon gas outlet of the xenon-krypton separation rectification column 2.

[0057] A No. 1 mass control valve is provided at the inlet of the impurity removal rectification column 1 to control the gas flow rate, so that the dehydrated crude krypton-xenon mixed raw material gas enters the impurity removal rectification column 1 stably.

[0058] A No. 2 exhaust valve is provided at the impurity gas outlet at the top of the impurity removal rectification column 1 for intermittent discharge of the impurity gas.

[0059] The temperature in the impurity removal rectification column 1 is -110 to -90 °C, such as -100 °C; the pressure is 1.2 to 1.6 MPa, such as 1.4 MPa. In the impurity removal rectification column 1, the krypton-xenon mixture will liquefy, and impurity gases with boiling points lower than krypton and xenon will be discharged from the top of the column. The impurity gases include non-volatile components such as nitrogen, oxygen, methane, and carbon monoxide.

[0060] The purified gas inlet of the xenon-krypton separation rectification column 2 is connected to the purified gas outlet of the impurity removal rectification column 1. The purified gas after impurity removal enters the xenon-krypton separation rectification column 2. A No. 2 mass control valve is provided at the purified gas inlet of the xenon-krypton separation rectification column 2 to control the gas flow rate entering the xenon-krypton separation rectification column 2.

[0061] The temperature in the xenon-krypton separation rectification column 2 is -110 to -90 °C, such as -100 °C; the pressure is 0.5 to 0.9 MPa, such as 0.7 MPa. In the xenon-krypton separation rectification column 2, xenon gas will liquefy, and the unliquefied krypton gas will accumulate at the top of the column.

[0062] The xenon gas inlet of the xenon purification rectification column 3 is connected to the xenon gas outlet of the xenon-krypton separation rectification column 2. A No. 3 mass control valve is provided at the xenon gas inlet of the xenon purification rectification column 3 to control the xenon gas flow rate entering the xenon purification rectification column 3.

[0063] The temperature in the xenon purification distillation column 3 is -60 to -80 °C, such as -70 °C; the pressure is 0.3 to 0.5 MPa, such as 0.4 MPa.

[0064] In the xenon purification distillation column 3, while removing the unseparated krypton-xenon mixed gas, impurities including nitrogen, oxygen, methane, and carbon monoxide are also removed.

[0065] The top of the xenon purification distillation column 3 is provided with an impurity gas (tail gas) outlet. A No. 3 exhaust valve is provided at the impurity gas outlet of the xenon purification distillation column 3 to control the emission of the tail gas.

[0066] The xenon purification distillation column 3 is also provided with a xenon gas outlet. A No. 4 mass control valve is provided at the xenon gas outlet of the xenon purification distillation column 3 to control the flow rate of the purified xenon gas.

[0067] The impurity removal distillation column 1, the krypton-xenon separation distillation column 2, and the xenon purification distillation column 3 can be commercially available distillation columns.

[0068] Regarding the purification unit:

[0069] The purification unit includes:

[0070] A krypton gas purifier unit 11 connected to the krypton gas outlet of the krypton-xenon separation distillation column 2; the krypton gas purifier unit 11 includes a first adsorption reactor, a first purification suction device, and a first dehydrogenation reactor connected in sequence;

[0071] And a xenon gas purifier unit 13 connected to the xenon gas outlet of the xenon purification distillation column 3; the xenon gas purifier unit 13 includes a second adsorption reactor, a second purification suction device, and a second dehydrogenation reactor connected in sequence.

[0072] The material of the first adsorption reactor is stainless steel 316L EP grade, and the pressure resistance level is high pressure 20 Mpa. The first adsorption reactor is an ultra-pure krypton gas purifier.

[0073] The first purification suction device is a purification suction device. The first purification suction device is filled with a getter, specifically an active metal, such as a titanium alloy.

[0074] The first dehydrogenation reactor is a generally commercially available dehydrogenation reactor. The first dehydrogenation reactor is filled with a dehydrogenation catalyst, specifically activated carbon.

[0075] The material of the second adsorption reactor is stainless steel 316L EP grade, and the pressure resistance level is high pressure 20 Mpa. The second adsorption reactor is an ultra-pure xenon gas purifier.

[0076] The second purification and suction device is a purification suction device. The second purification and suction device is filled with a getter, specifically an active metal such as a titanium alloy.

[0077] The second dehydrogenation reactor is a commercially available dehydrogenation reactor. The second dehydrogenation reactor is filled with a dehydrogenation catalyst, specifically activated carbon.

[0078] After the krypton gas discharged from the xenon-krypton separation and rectification column 2 enters the first adsorption reactor, impurities such as O2, CO2, and H2O in the gas are removed. The krypton gas after impurity removal enters the first purification and suction device. The getter has extremely high activity at a constant temperature controlled electric heating high temperature (such as 500 - 600 °C), and can purify impurities such as O2, H2O, CO, CO2, N2, CH4, and TCH in the gas to the ppb level. Then, the purified gas enters the first dehydrogenation reactor. The dehydrogenation catalyst in the first dehydrogenation reactor has extremely high activity at room temperature and can purify the H2 impurity in the gas to the 10 ppb level. The purified gas flows into the filling end.

[0079] After the xenon gas discharged from the xenon purification rectification column 3 enters the second adsorption reactor, impurities such as O2, CO2, and H2O in the gas are removed. The krypton gas after impurity removal enters the second purification and suction device. The getter has extremely high activity at a constant temperature controlled electric heating high temperature (such as 500 - 600 °C), and can purify impurities such as O2, H2O, CO, CO2, N2, CH4, and TCH in the gas to the ppb level. Then, the purified gas enters the second dehydrogenation reactor. The dehydrogenation catalyst in the second dehydrogenation reactor has extremely high activity at room temperature and can purify the H2 impurity in the gas to the 10 ppb level. The purified gas flows into the filling end.

[0080] The krypton-xenon mixed gas separation and purification system provided by this application further includes: a product filling unit.

[0081] Regarding the product filling unit:

[0082] The product filling unit includes:

[0083] A krypton gas membrane compressor 10; the krypton gas membrane compressor 10 is arranged on the pipeline between the xenon-krypton separation and rectification column 2 and the krypton gas purifier unit 11;

[0084] A krypton gas product filling end connected to the krypton gas outlet of the krypton gas purifier unit 11;

[0085] A xenon gas membrane compressor 12; the xenon gas membrane compressor 12 is arranged on the pipeline between the xenon purification rectification column 3 and the xenon gas purifier unit 13;

[0086] A xenon gas product filling end connected to the xenon gas outlet of the xenon gas purifier unit 13.

[0087] The krypton gas membrane press 10 uses a water-cooled oil-free two-stage pressurized membrane press, which can pressurize the krypton gas product to 13-17 MPa, such as 15 MPa.

[0088] The xenon gas membrane press 12 uses a water-cooled oil-free two-stage pressurized membrane press, which can pressurize the xenon gas product to 5-9 MPa, such as 7 MPa.

[0089] The krypton gas product filling end includes two groups of krypton gas cylinders connected in parallel. The first group of krypton gas cylinders is connected to the No. 4 exhaust valve, and the second group of krypton gas cylinders is connected to the No. 5 exhaust valve.

[0090] The xenon gas product filling end includes two groups of xenon gas cylinders connected in parallel. The first group of xenon gas cylinders is connected to the No. 6 exhaust valve, and the second group of xenon gas cylinders is connected to the No. 7 exhaust valve.

[0091] Through the product filling unit, the product gas can be filled into the product gas cylinders.

[0092] In some embodiments of the present application, the krypton-xenon mixed gas separation and purification system further includes: a utility unit.

[0093] Regarding the utility unit:

[0094] The utility unit is designed for the start-up preparation, maintenance of each node in the crude krypton-xenon purification process, and the monitoring of analysis data at each point, so as to support the adjustment of the operating conditions of each node of the complex system with data.

[0095] In some embodiments of the present application, the krypton-xenon mixed gas separation and purification system further includes: a recovery unit.

[0096] Regarding the recovery unit:

[0097] In some embodiments, the recovery unit includes a tail gas recovery unit 14, which is connected to the impurity gas (tail gas) outlet of the xenon purification distillation column 3 for collecting tail gas. The tail gas recovery unit 14 is a cryogenic vacuum barrel. The cryogenic vacuum barrel is placed in a cryogenic tank.

[0098] The recovery unit utilizes the material characteristics of xenon gas and adopts a liquid nitrogen cryogenic recovery process to recover the xenon gas material after the system stops. After the system stops, liquid nitrogen is introduced into the tail gas recovery unit 14 in the cryogenic tank. When the cryogenic temperature reaches -160 to -140 °C (such as -150 °C), the xenon gas in the pure xenon distillation column and the filling end of the xenon purifier (specifically including the xenon purification distillation column 3, the xenon gas membrane press 12, and the xenon purifier unit 13) will be sucked into the recovery bottle. The purpose of xenon gas recovery is achieved, and the loss rate of high-purity xenon production is greatly reduced.

[0099] The krypton-xenon mixed gas separation and purification system provided by this application includes a utility unit, which can purify the whole system in the early stage of production preparation and effectively purify the system environment. This application also includes a high-pressure helium device and a low-pressure helium device, which can realize the replacement and purging of high-pressure helium and low-pressure helium, the purification of evacuation and static vacuum, and meet the requirements for higher-purity gases. The design of the recovery unit can maximize the recovery of the precious gas xenon tail gas and reduce production losses.

[0100] The krypton-xenon mixed gas separation and purification system provided by this application can finally obtain 6N electronic-grade krypton gas and 5.5N electronic-grade ultra-pure xenon gas. The intermittent discharge control process of the distillation column improves the recovery rates of krypton gas and xenon gas, and is economical and energy-saving. This application can safely and efficiently separate and purify crude krypton and xenon, greatly improving the product quality of the end product while reducing the loss of crude krypton and xenon raw material gas.

[0101] The above description of the disclosed embodiments enables those skilled in the art to implement or use the present invention. Various modifications to these embodiments will be obvious to those skilled in the art, and the general principles defined herein can be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention will not be limited to the embodiments shown herein, but will be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A krypton-xenon mixed gas separation and purification system, comprising: A raw material supply unit; The raw material supply unit includes: a crude krypton-xenon mixed raw gas device; an adsorption device connected to the outlet of the crude krypton-xenon mixed raw gas device; a branch is provided on the pipeline between the crude krypton-xenon mixed raw gas device and the adsorption device, and a high-pressure helium device, a low-pressure helium device, a vacuum pumping device and an exhaust device are arranged in parallel on the branch; A krypton-xenon rectification separation unit; the krypton-xenon rectification separation unit includes: an impurity removal rectification column; the inlet of the impurity removal rectification column is connected to the outlet of the adsorption device; an impurity gas outlet is arranged at the top of the impurity removal rectification column; a xenon-krypton separation rectification column connected to the purified gas outlet of the impurity removal rectification column; a krypton gas outlet is arranged at the top of the xenon-krypton separation rectification column; a xenon purification rectification column connected to the xenon gas outlet of the xenon-krypton separation rectification column; A purification unit; the purification unit includes: a krypton gas purifier connected to the krypton gas outlet of the xenon-krypton separation rectification column; the krypton gas purifier includes a first adsorption reactor, a first purification and suction device and a first dehydrogenation reactor connected in sequence; and a xenon gas purifier connected to the xenon gas outlet of the xenon purification rectification column; the xenon gas purifier is connected with a second adsorption reactor, a second purification and suction device and a second dehydrogenation reactor in sequence.

2. The krypton-xenon mixed gas separation and purification system according to claim 1, wherein The adsorption device includes two molecular sieve adsorbent tanks: a first molecular sieve adsorbent tank A and a second molecular sieve adsorbent tank B; the first molecular sieve adsorbent tank A and the second molecular sieve adsorbent tank B are arranged in parallel.

3. The krypton-xenon mixed gas separation and purification system according to claim 1, characterized in that, A No. 1 pressure reducing valve is arranged at the inlet of the adsorption device; A branch is provided on the pipeline between the crude krypton-xenon mixed raw gas device and the No. 1 pressure reducing valve, and a high-pressure helium device, a low-pressure helium device, a vacuum pumping device and an exhaust device are arranged in parallel on the branch.

4. The krypton-xenon mixed gas separation and purification system according to claim 3, characterized in that, The high-pressure helium device is a high-pressure helium purge purifier; a No. 1 helium discharge valve is arranged at the outlet of the high-pressure helium device.

5. The krypton-xenon mixed gas separation and purification system according to claim 3, wherein, The low-pressure helium device is a low-pressure helium purge purifier; a No. 2 helium discharge valve is arranged at the outlet of the low-pressure helium device.

6. The krypton-xenon mixed gas separation and purification system according to claim 3, wherein The vacuum pumping device is a vacuum pump; a vacuum pumping valve is arranged at the inlet of the vacuum pump; The exhaust device is a No. 1 exhaust valve.

7. The krypton-xenon mixed gas separation and purification system according to claim 1, wherein A No. 1 mass control valve is arranged at the inlet of the impurity removal rectification column; A No. 2 exhaust valve is arranged at the impurity gas outlet at the top of the impurity removal rectification column; A No. 2 mass control valve is arranged at the purified gas inlet of the xenon-krypton separation rectification column; A No. 3 mass control valve is arranged at the xenon gas inlet of the xenon purification rectification column; An impurity gas outlet is arranged at the top of the xenon purification rectification column; a No. 3 exhaust valve is arranged at the impurity gas outlet of the xenon purification rectification column.

8. The krypton-xenon mixed gas separation and purification system according to claim 1, wherein, The krypton-xenon mixed gas separation and purification system further includes: a product filling unit; The product filling unit includes: A krypton gas membrane compressor; the krypton gas membrane compressor is arranged on the pipeline between the xenon-krypton separation rectification column and the krypton gas purifier unit; A krypton gas product filling end connected to the krypton gas outlet of the krypton gas purifier unit; A xenon gas membrane compressor; the xenon gas membrane compressor is arranged on the pipeline between the xenon purification rectification column and the xenon gas purifier unit; A xenon product filling end connected to the xenon gas outlet of the xenon purifier unit.

9. The krypton-xenon mixed gas separation and purification system according to claim 8, wherein, The krypton product filling end includes two groups of krypton gas cylinders connected in parallel. The first group of krypton gas cylinders is connected to the No. 4 exhaust valve, and the second group of krypton gas cylinders is connected to the No. 5 exhaust valve; The xenon product filling end includes two groups of xenon gas cylinders connected in parallel. The first group of xenon gas cylinders is connected to the No. 6 exhaust valve, and the second group of xenon gas cylinders is connected to the No. 7 exhaust valve.

10. The krypton-xenon mixed gas separation and purification system according to claim 1, characterized in that, The krypton-xenon mixed gas separation and purification system further includes: a recovery unit; The recovery unit includes a tail gas recovery unit, and the tail gas recovery unit is connected to the impurity gas outlet of the xenon purification distillation column.

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