Laser film carving machine for special-shaped light kinetic energy battery piece
Through the combination of CCD visual positioning and picosecond laser, high-precision scoring of special-shaped photokinetic cells is achieved, solving the problems of low accuracy and unstable complex graphics processing in the prior art, and improving electrical performance and production efficiency.
Patent Information
- Application Number
- CN202421999085.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-19
- Publication Date
- 2025-07-08
- Estimated Expiration
- 2034-08-19
AI Technical Summary
When the existing laser film machines scribe special-shaped photokinetic battery cells, the accuracy is low, resulting in reduced electrical performance and it is difficult to achieve stable processing of complex patterns.
The CCD visual positioning system and picosecond laser are used to move the platform rather than the laser head, combining visual recognition and laser fine-tuning to achieve accurate scribing; the laser output from the laser device is fine-tuned and divided into two ways, and is scribed through a clamping positioning mechanism. The clamping positioning mechanism is accurately positioned by CCD visual positioning, and the motion platform realizes accurate movement in the XY plane.
It realizes high-precision scoring of special-shaped photokinetic battery cells, improves electrical performance, reduces processing and conversion, and improves production efficiency and electrical energy output.
Smart Images

Figure CN223070653U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to a laser film engraving machine for special-shaped photokinetic energy battery sheets, belonging to the technical field of laser film engraving automation equipment. Background Art
[0002] Thin-film photovoltaic cells with glass as substrate, such as amorphous silicon cells, deposit front electrode film layers, photoelectric conversion film layers and back electrode film layers on the glass substrate, and use lasers to carve these film layers into required microcircuit patterns for series and parallel connection to achieve the power output of the photovoltaic cells. Especially for some special-shaped photovoltaic cells, complex patterns need to be carved according to the shape of the cells, which requires the laser film engraving machine to have the function of realizing the carving curve. For example, China Patent Publication No.: CN100464434C "Special-Shaped Silicon Thin-Film Solar Cells" uses a moving laser head for pattern carving. We know that the back and forth movement of the laser head will cause its precision The degree of rotation is reduced, resulting in deformation of the engraved pattern and reduced electrical performance. To address this problem, Chinese Patent Publication No.: CN202555971U "A CCD Fully Automatic Identification and Positioning System" provides a method of acquiring images through a high-resolution industrial CCD, analyzing and processing the images by an industrial PC, and then controlling the automatic movement of the solar panel by micro-movement. However, due to the complex graphics of special-shaped photovoltaic cells, the distance to be moved is very long, the path changes a lot, and the need to start and end engraving frequently, resulting in instability caused by changes in contact pulse width and action time. Therefore, this micro-movement is not suitable for adjusting the laser head after such complex movement. Summary of the invention
[0003] One of the purposes of the utility model is to invent a laser film engraving machine for special-shaped photovoltaic cells. The laser head is divided into two paths and does not move, but the photovoltaic cells are moved by platform movement, and the CCD is used for positioning through visual recognition to achieve accurate engraving of the required graphics and ensure the output electrical performance requirements of the special-shaped photovoltaic cells. The second purpose is to achieve the engraving of different film layers on the same platform by adjusting the laser output power and focal length, thereby reducing processing conversion and improving production efficiency.
[0004] To achieve the above purpose, the utility model invents a film engraving machine with a CCD visual positioning system and a laser fine-tuning device, which performs visual recognition, graphic import, and motion calculation compensation on a motion platform carrying a photovoltaic cell, thereby realizing automatic engraving of the film layer, obtaining a high-precision engraved film graphic, and ensuring maximum power output. The specific technical scheme adopted is: a laser film engraving machine for special-shaped photovoltaic cells, characterized in that it includes a laser device and a visual positioning device, as well as a motion platform mechanism and a clamping positioning mechanism; the laser device is a picosecond laser, and a fine-tuning device is installed on the optical path to change the output power and focal length of the picosecond laser; the motion The moving platform mechanism can realize linkage in the XY plane, the clamping and positioning mechanism is installed on the moving platform mechanism, and the laser device and the visual positioning device are located above the clamping and positioning mechanism; when the photovoltaic cell is placed on the clamping and positioning mechanism, the visual positioning device accurately grasps and positions the photovoltaic cell, and the computer logic operation accurately positions the moving platform mechanism, and the motion pattern path is introduced. The moving platform mechanism drives the photovoltaic cell to move along the scratching path in the XY plane, and the laser device realizes continuous and stable laser output to scratch the photovoltaic cell, so as to obtain the internal series-parallel microcircuit pattern and edge insulation of the special-shaped photovoltaic cell with the required electrical properties.
[0005] The laser device described above emits a light source from a picosecond laser, which is converted into the power and focal length required for engraving the film layer by a fine-tuning device. The laser is divided into two laser light paths by a beam splitter, and then enters a laser head through a polarizer and is projected onto two sets of photovoltaic cells on the clamping and positioning mechanisms.
[0006] The visual positioning device comprises a CCD visual positioning system and a display. The CCD visual positioning system automatically captures the positioning cross mark on the photovoltaic cell sheet and displays it on the display.
[0007] The motion platform mechanism includes a machine platform, an X-axis motion mechanism on the machine platform, and a Y-axis motion mechanism on the X-axis motion mechanism; the X-axis motion mechanism is driven by a linear stepping motor to drive the X-axis motion platform to perform X-axis motion on the guide rail on the machine platform; the Y-axis motion mechanism is driven by a linear stepping motor to drive the Y-axis motion platform to perform Y-axis motion on the guide rail on the X-axis motion platform.
[0008] The clamping and positioning mechanism is installed on the Y-axis motion mechanism, and includes a positioning rib, a supporting positioning micro-cylinder and a product placement ejector. The ejector is installed on the Y-axis motion platform. The positioning rib is two right-angle baffles or a T-shaped baffle, which are installed on the inner side. The supporting positioning micro-cylinder is installed opposite to the positioning rib. The entire plate of solar cells is placed on the ejector with one right-angle side against the positioning rib, and the other side is supported and positioned by the supporting positioning micro-cylinder.
[0009] After the fine-tuning device of the laser device performs light source adjustment, three processes of scribing the optoelectronic conversion layer, the back electrode layer, and the edge insulation are carried out using the same positioning reference to improve the registration accuracy.
[0010] The laser has a pulse width less than 10 picoseconds, a green light wavelength of 532 nanometers, and a beam quality M² < 1.2.
[0011] The machine platform is made of marble.
[0012] The positive and beneficial effects produced by the present invention are as follows: (1) Two products can be processed simultaneously, and after positioning, automatic label grabbing and precise positioning can be achieved; (2) Shaping or linear scribing can be realized for the incoming materials; (3) One machine can meet the process requirements for three film layer scribing processes; (4) The picosecond laser precisely controls the line width of the scribed pattern, and the scribed cutting surface is regular without thermal effect sawteeth; (5) The vision label grabbing and positioning uses the same reference for the three processes, achieving the registration accuracy of the three processes; (6) The effective power generation area of the photovoltaic cell is increased by 2.44%; (7) By using a marble base, the repeat accuracy of the linear motor transmission is improved from ±0.05 mm to ±0.01 mm. Description of the Drawings
[0013] Figure 1 : Schematic diagram of the overall structure of the present utility model.
[0014] Figure 2 : Schematic diagram of the machine platform structure of the present utility model.
[0015] Figure 3 : Schematic diagram of the X-axis moving platform structure of the present utility model.
[0016] Figure 4 : Schematic diagram of the Y-axis moving platform structure of the present utility model.
[0017] Figure 5 : Schematic diagram of the laser device structure of the present utility model.
[0018] In the figure, 1 is a laser device, 101 is a laser, 102 is a beam splitter, 103 is a polarizer, 104 is a fine-tuning device for the picosecond laser output optical path, 105 is a laser head, 106 is an optical path, 2 is a visual positioning device, 201 is a CCD visual positioning system, 202 is a display, 3 is a motion platform mechanism, 301 is a machine table, 302 is a stepping motor on the machine table, 303 is a guide rail on the machine table, 4 is an X-axis motion mechanism, 401 is an X-axis motion platform, 401-1 is a mounting surface for the stepping motor on the machine table, 401-2 is a mating groove for the guide rail on the machine table, 402 is a stepping motor on the X-axis motion platform, 403 is a guide rail on the X-axis motion platform, 5 is a Y-axis motion mechanism, 501 is a Y-axis motion platform, 501-1 is a mounting surface for the stepping motor on the X-axis motion platform, 501-2 is a mating groove for the guide rail on the X-axis motion platform, 502 is a clamping and positioning micro-cylinder, 503 is a thimble, 504 is a positioning edge, 6 is a control system, 7 is a photovoltaic kinetic energy battery cell. Specific embodiments
[0019] The laser film engraving machine of the present utility model is composed of four parts, namely a laser device 1, a visual positioning device 2, and a motion platform mechanism 3. The laser mechanism 1 is a picosecond green laser 101. The picosecond green laser emitted by the laser 101 is adjusted in power and focal length by the fine-tuning device 104 for the picosecond laser output optical path, and is split into two laser optical paths 106 by the beam splitter 102, and then enters the laser head 105 through the polarizer 103 to perform laser film engraving on the photovoltaic kinetic energy battery cell 7. The motion platform mechanism 3 includes an X-axis motion mechanism 4 placed on a marble machine table 301 and a Y-axis motion mechanism 5 placed on the X-axis motion mechanism 4. A stepping motor 302 on the machine table and a guide rail 303 on the machine table are installed on the machine table 301. The X-axis motion platform 401 of the X-axis motion mechanism 4 is machined with a mounting surface 401-1 for the stepping motor on the machine table and a mating groove 401-2 for the guide rail on the machine table for mating installation with the stepping motor 302 on the machine table and the guide rail 303 on the machine table. An X-axis motion platform stepping motor 402 and an X-axis motion platform guide rail 403 are installed on the X-axis motion platform 401. The Y-axis motion platform 501 of the Y-axis motion mechanism 5 is machined with a mounting surface 501-1 for the stepping motor on the X-axis motion platform and a mating groove 501-2 for the guide rail on the X-axis motion platform for mating installation with the stepping motor 402 on the X-axis motion platform and the guide rail 403 on the X-axis motion platform. A thimble 503, a positioning edge 504, and a clamping and positioning micro-cylinder 502 of the clamping and positioning mechanism are installed on the Y-axis motion platform 501.
[0020] The fine-tuning device 104 for the picosecond laser output optical path belongs to known technology and will not be elaborated in detail in this specification.
[0021] The photo - kinetic energy cell 7 is placed on the thimble 503, with one right - angled side closely against the positioning edge 504, and the other right - angled side is tightened by the clamping and positioning micro - cylinder 502 to complete the clamping of the photo - kinetic energy cell 7. The CCD vision positioning system 201 of the vision positioning device 2 captures and positions the cross - mark on the photo - kinetic energy cell 7 and displays it on the display 202. The movements of the mechanism are all controlled by the control system 6, and the movement of the special - shaped pattern path is accurately controlled by the motion control system.
[0022] The laser device 1 can achieve continuous and stable laser scribing on the product. The vision calibration device 2 can achieve precise mark - grasping, accurately position the X and Y axes through computer logic operations and display them on the mark - grasping display for the operator to check. The product is placed on the thimble, closely against the positioning edge, and the clamping and positioning micro - cylinder is jogged to achieve product clamping and stillness. After vision mark - grasping and positioning, the device is started, and laser scribing is realized according to the pattern path imported into the motion control system.
[0023] The picosecond laser precisely controls the line width of the scribed pattern. It uses a pulse width less than 10 picoseconds, a green light wavelength of 532 nanometers, and a beam quality M² < 1.2. Compared with the nanosecond level, the beam quality is better. The scribed film layer cutting surface is regular and toothless. The picosecond pulse width is narrower, and there is no thermal effect on the product, which significantly improves the product performance. The line width scribed by the picosecond - level laser can be as thin as 0.02 mm, which is thinner than the 0.08 mm line width scribed by the nanosecond - level laser, thus increasing the effective area of the product by 2.44%.
[0024] Example 1: Laser scribing is performed on the front - electrode film layer, photo - electric conversion film layer, and back - electrode film layer of the special - shaped photo - kinetic energy cell to form an in - line pattern.
[0025] The first process: Scribing the cross - mark and the front - electrode layer: At the same time, place the film - facing - up surfaces of two un - cut photo - kinetic energy cells 7 with dimensions of 356×406×1.1 on the thimbles 503 of the clamping and positioning mechanism. One right - angled side is closely against the positioning edge 504, and the other right - angled side is tightened and positioned by the clamping and positioning micro - cylinder 502. After clamping, import the scribing pattern into the computer control system 6. The control motion software automatically generates the scribing path. The motion platform mechanism 3 drives the photo - kinetic energy cell 7 to move in the XY plane. Cross - marks are scribed at 10 mm on both the left and right sides to provide a mark - grasping reference for the second - process scribing. The picosecond green laser 101 generates laser light, and the optical path 106 is divided into two paths through the beam splitter 102 and the polarizing mirror 103 and sent to the laser head 105 to enter the two photo - kinetic energy cells 7. According to the processing motion path required by the pattern, laser focusing is performed to scribe the conductive film of the required pattern, realizing circuit segmentation and completing the scribing process of the first front - electrode layer.
[0026] The second process: scribing the optoelectronic conversion layer. After coating the two optoelectronic kinetic battery wafers 7 with the scribed front electrode layer with the optoelectronic conversion layer, they are fixed in the same way as in the first process. The scribing pattern is imported into the control computer system. The scribing path is automatically generated by the control motion software. The left and right cross marks reserved in the first process are automatically captured by the CCD vision positioning system 201. Through logical operation, the same reference as in the first process is achieved. According to the processing motion path required by the pattern, laser focusing is carried out to scribe the amorphous silicon film layer of the required pattern, realizing circuit segmentation and completing the scribing process of the second optoelectronic conversion layer.
[0027] The third process: scribing the back electrode layer. After coating the two optoelectronic kinetic battery wafers 7 with the scribed optoelectronic conversion layer with the back electrode layer, they are fixed in the same way as in the first process. This time, the film surface should face downwards, and the laser scribes through the glass from above. The scribing pattern is imported into the control computer system. The scribing path is automatically generated by the control motion software. The left and right cross marks reserved in the first process are automatically captured by the CCD vision positioning system 201. Through logical operation, the same reference as in the first process is achieved. According to the processing motion path required by the pattern, laser focusing is carried out to scribe the back electrode layer of the required pattern, realizing circuit segmentation and completing the scribing process of the back electrode layer. The key to this process is to cut off the back electrode layer while not allowing damage to the front electrode layer and the optoelectronic conversion layer.
[0028] Example 2: Fabricating the circuit film layer of the optoelectronic kinetic processor.
[0029] The optoelectronic kinetic processor needs to print a circuit on the back protection layer of the optoelectronic kinetic battery wafer 7, and then paste electronic components on the printed circuit. For different electronic components, the surrounding film layer needs to be removed. Therefore, this laser film scribing machine can be used for film removal.
Claims
1. A laser film engraving machine for special-shaped photo-kinetic battery chips, characterized in that: It includes a laser device and a vision positioning device, as well as a motion platform mechanism and a clamping and positioning mechanism; the laser device is a picosecond laser, and a fine-tuning device is installed on the optical path to change the output power and focal length of the picosecond laser; the motion platform mechanism can achieve linkage in the XY plane, the clamping and positioning mechanism is installed on the motion platform mechanism, and the laser device and the vision positioning device are located above the clamping and positioning mechanism; when the opto-kinetic solar cell is placed on the clamping and positioning mechanism, the vision positioning device accurately grabs and locates the opto-kinetic solar cell, and the motion platform mechanism is accurately positioned by computer logic operation, and the motion pattern path is imported. The motion platform mechanism drives the opto-kinetic solar cell to move in the XY plane according to the scribing path, and the laser device realizes continuous and stable laser output to scribe the opto-kinetic solar cell, obtaining the microcircuit pattern of internal series and parallel connection and edge insulation of the shaped opto-kinetic solar cell with the required electrical performance.
2. The laser film engraving machine for a special-shaped photo-kinetic battery sheet according to claim 1, wherein: The laser device emits light from the picosecond laser, the light source is changed into the required power and focal length for scribing the film layer by the fine-tuning device, the laser is divided into two laser optical paths by the beam splitter, and then enters the laser head through the polarizer and is projected onto the opto-kinetic solar cells on two sets of clamping and positioning mechanisms respectively.
3. The laser film engraving machine for a special-shaped photovoltaic cell according to claim 1, characterized in that: The vision positioning device includes a CCD vision positioning system and a display. The CCD vision positioning system automatically grabs the positioning cross on the opto-kinetic solar cell and displays it on the display.
4. The laser film engraving machine for a special-shaped photo-kinetic battery chip according to claim 1, wherein: The motion platform mechanism includes a machine table, an X-axis motion mechanism on the machine table, and a Y-axis motion mechanism on the X-axis motion mechanism; the X-axis motion mechanism is driven by a linear stepping motor to make the X-axis motion platform move along the guide rail on the machine table in the X-axis direction; the Y-axis motion mechanism is driven by a linear stepping motor to make the Y-axis motion platform move along the guide rail on the X-axis motion platform in the Y-axis direction.
5. The laser film engraving machine for a special-shaped photoenergy battery chip according to claim 1, wherein: The clamping and positioning mechanism is installed on the Y-axis motion mechanism and includes a positioning edge, a clamping and positioning micro cylinder, and a product placement thimble. The thimble is installed on the Y-axis motion platform. The positioning edge is two right-angled baffles or a T-shaped baffle, which is installed inside. The clamping and positioning micro cylinder is installed opposite to the positioning edge. The whole opto-kinetic solar cell is placed on the thimble, one right-angled side leans against the positioning edge, and the other side is held in place by the clamping and positioning micro cylinder.
6. The laser film engraving machine for a special-shaped photo-kinetic battery cell according to claim 1, wherein: After the light source is adjusted by the fine-tuning device of the laser device, three processes of scribing the optoelectronic conversion layer, the back electrode layer, and the edge insulation are carried out.
7. The laser film engraving machine for a special-shaped photovoltaic cell according to claim 1, wherein: The laser has a pulse width less than 10 picoseconds, a green light wavelength of 532 nanometers, and a beam quality M² < 1.
2.
8. The laser film engraving machine for a special-shaped photovoltaic cell according to claim 4, characterized in that: The machine table is made of marble.
Citation Information
Patent Citations
Deformed silicon thin-film solar battery
CN100464434C
Charge coupled device (CCD) full-automatic identification and position system
CN202555971U