Clamping device for coating plane PVD (Physical Vapor Deposition) coating of extremely thin large wafer

Abstract

According to the clamping device for coating the extremely thin large wafer plane PVD coating, the movable block is moved by rotating the adjusting block, the movement of the first supporting rod is achieved through the movement of the movable block, the height of the expansion rod is adjusted through the first supporting rod, when the height of the expansion rod is increased, the elastic sleeve is supported, and therefore the clamping device can be used for coating the extremely thin large wafer plane PVD coating. Therefore, the extremely thin large wafer sleeved on the outer side of the elastic sleeve is fixed; the elastic sleeve and the ultra-thin large wafer are rotated by rotating the driving wheel, so that the ultra-thin large wafer is uniformly coated, double surfaces of the ultra-thin large wafer can be simultaneously coated, and the coating efficiency is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of planar PVD coating for ultra-thin large wafers, in particular to a clamping device for planar PVD coating of ultra-thin large wafers. Background Technique

[0002] PVD technology refers to the technology of vaporizing the surface of a material source (solid or liquid) into gaseous atoms or molecules, or partially ionizing them into ions under vacuum conditions, and depositing a thin film with a certain special function on the substrate surface through a low-pressure gas (or plasma) process. PVD technology is one of the main surface treatment technologies. PVD coating technology is mainly divided into three categories: vacuum evaporation coating, vacuum sputtering coating, and vacuum ion coating. The main methods of physical vapor deposition include: vacuum evaporation coating, sputtering coating, arc plasma coating, ion coating, and molecular beam epitaxy, etc. The corresponding vacuum coating equipment includes vacuum evaporation coating machines, vacuum sputtering coating machines, and vacuum ion coating machines. With the improvement of deposition methods and technologies, physical vapor deposition technology can not only deposit metal films, alloy films, but also deposit compounds, ceramics, semiconductors, polymer films, etc.

[0003] When an ultra-thin large wafer is subjected to planar PVD coating, it is not easy to clamp. At present, the process of coating both sides separately is mostly adopted in the market to achieve double-sided coating of the ultra-thin large wafer. However, this method is cumbersome to operate and has low coating efficiency. Summary of the Utility Model

[0004] Aiming at the deficiencies existing in the prior art, the utility model provides a clamping device for planar PVD coating of ultra-thin large wafers, which can perform coating on both sides simultaneously and improve coating efficiency.

[0005] The purpose of the utility model is achieved in the following way: A clamping device for planar PVD coating of ultra-thin large wafers, comprising:

[0006] A base;

[0007] A first side rod, arranged on the base;

[0008] A second side rod, arranged on the base;

[0009] A first runner, connected to the first side rod;

[0010] A second runner, connected to the second side rod;

[0011] A first rotating shaft, connected to both sides of the first runner;

[0012] A driving wheel, connected to the first rotating shaft;

[0013] A second rotating shaft, connected to both sides of the second runner;

[0014] The main rotating shaft is connected to the first rotating shaft at one end and the second rotating shaft at the other end;

[0015] The adjusting block is connected to one end of the main rotating shaft;

[0016] The movable block is connected to the adjusting block and the main rotating shaft;

[0017] The first support rod is hinged to the movable block;

[0018] The expansion rod is hinged to the first support rod on the side opposite to the movable block;

[0019] The fixed block is connected to the main rotating shaft;

[0020] One end of the second support rod is hinged to the fixed block, and the other end is hinged to the expansion rod;

[0021] The elastic sleeve is connected to the expansion rod.

[0022] As an alternative solution of the technical solution of the present invention, it further includes:

[0023] The second fixed block is connected to the main rotating shaft;

[0024] One end of the third support rod is hinged to the second fixed block, and the other end is hinged to the expansion rod.

[0025] As an alternative solution of the technical solution of the present invention, the adjusting block is threadedly connected to the main rotating shaft.

[0026] As an alternative solution of the technical solution of the present invention, a first rotating groove is provided on the first side rod, and the first rotating groove is movably connected to the first rotating wheel;

[0027] A second rotating groove is provided on the second side rod, and the second rotating groove is movably connected to the second rotating wheel.

[0028] The beneficial effect of the present invention is:

[0029] A clamping device for coating a very thin large-diameter wafer in a planar PVD coating according to the present invention moves the movable block by rotating the adjusting block. The movement of the movable block enables the movement of the first support rod, and the first support rod adjusts the height of the expansion rod. When the height of the expansion rod increases, it supports the elastic sleeve, thereby fixing the very thin large-diameter wafer sleeved outside the elastic sleeve; by rotating the driving wheel, the elastic sleeve and the very thin large-diameter wafer are rotated, so as to uniformly coat the very thin large-diameter wafer, realizing that both sides of the very thin large-diameter wafer can be coated simultaneously, and improving the coating efficiency. Description of the Drawings

[0030] To more clearly illustrate the technical solutions in the embodiments of the present utility model, the following will briefly introduce the drawings required for use in the embodiments. Obviously, the drawings described below are only some embodiments of the present utility model. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings.

[0031] Figure 1 The front view of a clamping device for planar PVD coating of an extremely thin large wafer in Embodiment 1 of the present utility model.

[0032] Figure 2 The left view of a clamping device for planar PVD coating of an extremely thin large wafer in Embodiment 1 of the present utility model;

[0033] Figure 3 The internal structure schematic diagram of a clamping device for planar PVD coating of an extremely thin large wafer in Embodiment 1 of the present utility model.

[0034] Reference numerals:

[0035] 1, base; 2, first side rod; 3, second side rod; 4, driving wheel; 5, first rotating shaft; 6, first rotating wheel; 7, second rotating shaft; 8, second rotating wheel; 9, main rotating shaft; 10, adjusting block; 11, movable block; 12, fixed block; 13, first support rod; 14, second support rod; 15, expansion rod; 16, second fixed block; 17, third support rod; 18, elastic sleeve; 19, first rotating groove; 20, second rotating groove. Detailed implementation manners

[0036] The following will clearly and completely describe the technical solutions in the embodiments of the present utility model in conjunction with the drawings in the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, rather than all embodiments.

[0037] It should be noted that all directional indications (such as up, down, left, right, front, back...) in the embodiments of the present utility model are only used to explain the relative positional relationship and movement conditions between components in a specific posture (as shown in the drawings). If this specific posture changes, then the directional indications will also change accordingly.

[0038] In the description of the embodiments, unless otherwise clearly specified and defined, terms such as "arrangement" and "connection" shall be understood in a broad sense. For example, it may be a fixed connection, a detachable connection, or an integral connection; it may be a mechanical connection, a direct connection, or a connection through an intermediate medium, and may also be the communication inside two components. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.

[0039] Embodiment 1

[0040] As Figures 1-3 shown, a clamping device for coating a planar PVD coating on an extremely thin large wafer includes: a base 1, a first side rod 2, a second side rod 3, a first runner 6, a second runner 8, a first rotating shaft 5, a driving wheel 4, a second rotating shaft 7, a main rotating shaft 9, an adjusting block 10, a movable block 11, a first support rod 13, an expansion rod 15, a fixed block 12, a second support rod 14, and an elastic sleeve 18, wherein: the first side rod 2 is arranged on the base 1; the second side rod 3 is arranged on the base 1; the first runner 6 is connected to the first side rod 2; the second runner 8 is connected to the second side rod 3; the first rotating shaft 5 is connected to both sides of the first runner 6; the driving wheel 4 is connected to the first rotating shaft 5; the second rotating shaft 7 is connected to both sides of the second runner 8; one end of the main rotating shaft 9 is connected to the first rotating shaft 5, and the other end is connected to the second rotating shaft 7; the adjusting block 10 is connected to one end of the main rotating shaft 9; the movable block 11 is connected to the adjusting block 10 and is connected to the main rotating shaft 9; the first support rod 13 is hinged to the movable block 11; the expansion rod 15 is hinged to the first support rod 13 on the other side relative to the movable block 11; the fixed block 12 is connected to the main rotating shaft 9; one end of the second support rod 14 is hinged to the fixed block 12, and the other end is hinged to the expansion rod 15; the elastic sleeve 18 is connected to the expansion rod 15.

[0041] As Figure 3 shown, as a further solution of this embodiment, a clamping device for coating a planar PVD coating on an extremely thin large wafer further includes: a second fixed block 16 and a third support rod 17, wherein: the second fixed block 16 is connected to the main rotating shaft 9; one end of the third support rod 17 is hinged to the second fixed block 16, and the other end is hinged to the expansion rod 15.

[0042] As Figure 3 shown, as a further solution of this embodiment, the adjusting block 10 is threadedly connected to the main rotating shaft 9.

[0043] As Figure 3 shown, as a further solution of this embodiment, a first rotating groove 19 is provided on the first side rod 2, and the first rotating groove 19 is movably connected to the first runner 6; a second rotating groove 20 is provided on the second side rod 3, and the second rotating groove 20 is movably connected to the second runner 8.

[0044] When the rotation adjustment block 10 moves towards the center of the main rotating shaft 9, the adjustment block 10 pushes the movable block 11 towards the center of the main rotating shaft 9. The movable block 11 jacks up the first support rod 13, and the first support rod 13 jacks up the expansion rod 15. At the same time, the second support rod 14 and the third support rod 17 also jack up the expansion rod 15, thereby expanding the elastic sleeve 18. When the rotation adjustment block 10 moves towards the outside of the main rotating shaft 9, the adjustment block 10 pulls the movable block 11 towards the outside of the main rotating shaft 9. The movable block 11 pulls down the first support rod 13, and the first support rod 13 pulls down the expansion rod 15. At the same time, the second support rod 14 and the third support rod 17 also pull down the expansion rod 15, and the elastic sleeve 18 returns to its original state.

[0045] The working process of this embodiment is as follows: First, a plurality of extremely thin large discs are sleeved on the elastic sleeve 18, and a certain interval is controlled between the extremely thin large discs. Then, the rotation adjustment block 10 is rotated to move towards the center of the main rotating shaft 9, and the elastic sleeve 18 is expanded to fix the extremely thin large discs. Then, coating is carried out. During the coating process, the driving wheel 4 is rotated to make the extremely thin large discs rotate. Then, after the coating is completed, the elastic sleeve 18 returns to its original state, and the extremely thin large discs can be removed from the elastic sleeve 18.

[0046] The above are only the preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention shall be included in the protection scope of the present invention. In addition, the technical solutions between the various embodiments can be combined with each other, but it must be based on the fact that those skilled in the art can implement them. When the combination of technical solutions is contradictory or cannot be implemented, it should be considered that such a combination of technical solutions does not exist and is not within the protection scope required by the present invention.

Claims

1. A clamping device for coating extremely thin large wafers with planar PVD coating, characterized in that, Comprising: Base (1); First side rod (2), provided on the base (1); Second side rod (3), provided on the base (1); First runner (6), connected to the first side rod (2); Second runner (8), connected to the second side rod (3); First rotating shaft (5), connected to both sides of the first runner (6); Drive wheel (4), connected to the first rotating shaft (5); Second rotating shaft (7), connected to both sides of the second runner (8); Main rotating shaft (9), one end connected to the first rotating shaft (5) and the other end connected to the second rotating shaft (7); Adjusting block (10), connected to one end of the main rotating shaft (9); Moving block (11), connected to the adjusting block (10) and connected to the main rotating shaft (9); First support rod (13), hinged to the moving block (11); Expansion rod (15), hinged to the first support rod (13) on the other side relative to the moving block (11); Fixing block (12), connected to the main rotating shaft (9); Second support rod (14), one end hinged to the fixing block (12) and the other end hinged to the expansion rod (15); Elastic sleeve (18), connected to the expansion rod (15).

2. The clamping device for coating a planar PVD coating on an extremely thin large wafer according to claim 1, wherein Further comprising: Second fixing block (16), connected to the main rotating shaft (9); Third support rod (17), one end hinged to the second fixing block (16) and the other end hinged to the expansion rod (15).

3. The clamping device for coating a very thin large wafer plane by PVD according to claim 1, characterized in that, The adjusting block (10) is threadedly connected to the main rotating shaft (9).

4. A clamping device for coating a planar PVD coating on an extremely thin large wafer, characterized in that, A first rotating groove (19) is provided on the first side rod (2), and the first rotating groove (19) is movably connected to the first runner (6); A second rotating groove (20) is provided on the second side rod (3), and the second rotating groove (20) is movably connected to the second runner (8).

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