Screen printing test screen

Abstract

The utility model provides a silk-screen printing test screen printing plate, and relates to the technical field of silk-screen printing test. The screen printing test screen plate comprises a screen plate body, and the screen plate body is provided with a sheet resistance test pattern, a grid line spacing test pattern, a grid line width test pattern and a contact resistance test pattern. According to the screen printing test screen provided by the embodiment of the invention, the sheet resistance test pattern, the grid line spacing test pattern, the grid line width test pattern and the contact resistance test pattern are integrated on the same screen body, and when the characterization performance of an electrode is tested, only one electrode plate needs to be prepared through the test screen; therefore, the electrode preparation time is shortened, and the test efficiency is improved.

Description

Technical Field

[0001] This application relates to the technical field of screen printing testing, and particularly to a screen printing test stencil. Background Art

[0002] Currently, electrodes of a battery are usually prepared by screen printing technology. After the electrodes are prepared, it is necessary to perform characterization performance tests on the electrodes to evaluate the screen printing technology and provide guidance for improving the screen printing technology.

[0003] In the prior art, during various characterization performance tests on electrodes, such as the morphology, conductivity, and contact resistance of the electrodes, there are different test stencils for different characterization performances. The screen printing technology is adopted, and electrodes are prepared on a sample piece through the corresponding test stencil to form electrode pieces, and then the characterization performance of the electrodes on the electrode pieces is tested by a test device.

[0004] However, the above different characterization performance tests require using different test stencils to prepare electrode pieces respectively, resulting in a relatively long time required to prepare the electrode pieces and affecting the test efficiency. Utility Model Content

[0005] This application provides a screen printing test stencil to solve the problem in the prior art that the time required to prepare electrodes is relatively long and affects the test efficiency.

[0006] The screen printing test stencil provided by this application includes: a stencil body, on which a sheet resistance test pattern, a grid line spacing test pattern, a grid line width test pattern, and a contact resistance test pattern are provided;

[0007] The sheet resistance test pattern includes at least two first mesh holes arranged at intervals;

[0008] The grid line spacing test pattern includes at least two grid line spacing test hole groups, each grid line spacing test hole group includes at least two first grid holes, and the spacing between two adjacent first grid holes in each grid line spacing test hole group is different;

[0009] The grid line width test pattern includes at least two second grid holes with different widths;

[0010] The contact resistance test pattern includes at least two contact resistance test hole groups, and the sizes of each contact resistance test hole group are different.

[0011] In some technical solutions of the above screen printing test stencil, the sheet resistance test pattern further includes at least one second mesh hole, and the area of the second mesh hole is larger than the area of the first mesh hole.

[0012] In some technical solutions of the above-mentioned screen printing test stencil, the grid line spacing test hole groups are sequentially arranged at intervals along a preset direction.

[0013] In some technical solutions of the above-mentioned screen printing test stencil, the lengths of the first grid line holes are equal.

[0014] In some technical solutions of the above-mentioned screen printing test stencil, the grid line spacing test hole group further includes two third grid line holes, and the two third grid line holes respectively communicate with the same ends of the first grid line holes.

[0015] In some technical solutions of the above-mentioned screen printing test stencil, the grid line width test pattern includes at least two grid line width test hole groups, and each grid line width test hole group includes at least two second grid line holes with the same width.

[0016] In some technical solutions of the above-mentioned screen printing test stencil, both ends of the second grid line hole have connecting parts, and the width of the connecting parts is greater than the width of part of the second grid line hole between the two connecting parts.

[0017] In some technical solutions of the above-mentioned screen printing test stencil, the second grid line holes are arranged in parallel at intervals and have equal lengths.

[0018] In some technical solutions of the above-mentioned screen printing test stencil, the grid line width test pattern further includes at least one fourth grid line hole, the length of the fourth grid line hole is greater than or less than the length of the second grid line hole, and the fourth grid line hole is located between two adjacent grid line width test hole groups.

[0019] In some technical solutions of the above-mentioned screen printing test stencil, the contact resistance test hole group includes a plurality of linearly arranged mesh holes arranged at intervals, the sizes of the linearly arranged mesh holes are the same and are parallel to each other, and the spacing between two adjacent linearly arranged mesh holes increases or decreases in sequence;

[0020] The sizes of the linearly arranged mesh holes in different contact resistance test hole groups are different.

[0021] In some technical solutions of the above-mentioned screen printing test stencil, the stencil body further has a reference test pattern, and the reference test pattern includes at least two reference holes with different sizes.

[0022] A screen printing test stencil proposed in this application includes: a stencil body, on which a sheet resistance test pattern, a grid line spacing test pattern, a grid line width test pattern, and a contact resistance test pattern are provided. The sheet resistance test pattern includes at least two first mesh holes arranged at intervals. By comparing the sheet resistances of the electrodes prepared by passing different silver pastes through the first mesh holes, the performance selection of the silver paste can be completed. The grid line spacing test pattern includes at least two groups of grid line spacing test holes. Each group of grid line spacing test holes includes at least two first grid holes. The spacing between two adjacent first grid holes in each group of grid line spacing test holes is different. By comparing the charge collection capabilities of the electrodes prepared by different groups of grid line spacing test holes, an electrode with a better charge collection capability is obtained, and the grid line spacing of this electrode is the preferred grid line spacing. The grid line width test pattern includes at least two second grid holes with different widths. By comparing the morphologies and conductivities of the electrodes prepared by the second grid holes with different widths, the optimization of the electrode width is completed. The contact resistance test pattern includes at least two groups of contact resistance test holes, and the sizes of each group of contact resistance test holes are different. By comparing the contact resistances of the electrodes prepared by different sizes of contact resistance test holes, the preferred group of contact resistance test holes is determined. The screen printing test stencil provided by the embodiments of this application integrates the sheet resistance test pattern, the grid line spacing test pattern, the grid line width test pattern, and the contact resistance test pattern onto the same stencil body, realizing the multi-functionality of the test stencil. When testing the characterization performance of the electrode, by preparing an electrode sheet with the test stencil, the various characterization performances of the electrode can be tested, thereby reducing the time required for preparing the electrode and improving the test efficiency. At the same time, only one test stencil is required during the test process, reducing the number of test stencils during the test process and lowering the cost. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] The accompanying drawings herein are incorporated into and constitute a part of this specification, showing embodiments consistent with this application and, together with the specification, are used to explain the principles of this application.

[0024] Figure 1 is a schematic structural diagram of the screen printing test stencil provided by the embodiments of this application;

[0025] Figure 2 is Figure 1 a schematic structural diagram of the sheet resistance test pattern and the reference test pattern in

[0026] Figure 3 is Figure 1 a schematic structural diagram of the grid line spacing test pattern in

[0027] Figure 4 is Figure 1 a schematic structural diagram of the grid line width test pattern in

[0028] Figure 5 is Figure 1Structural schematic diagram of the middle contact resistance test pattern.

[0029] Through the above-mentioned drawings, specific embodiments of the present application have been shown, and there will be more detailed descriptions hereinafter. These drawings and text descriptions are not intended to limit the scope of the inventive concept of the present utility model in any way, but to illustrate the concept of the present application to those skilled in the art by referring to specific embodiments.

[0030] Description of reference numerals:

[0031] 10 - Mesh version body;

[0032] 100 - First graphic area; 110 - Sheet resistance test pattern; 111 - First mesh hole; 112 - Second mesh hole;

[0033] 200 - Second graphic area; 210 - Grid line pitch test pattern; 211 - Grid line pitch test hole group; 212 - First grid line hole; 213 - Third grid line hole;

[0034] 300 - Third graphic area; 310 - Grid line width test pattern; 311 - Grid line width test hole group; 312 - Second grid line hole; 313 - Connection part; 320 - Fourth grid line hole;

[0035] 400 - Fourth graphic area; 410 - Contact resistance test pattern; 411 - Contact resistance test hole group; 412 - Linear mesh hole;

[0036] 500 - Fifth graphic area; 510 - Reference test pattern; 511 - Reference hole. Detailed implementation manners

[0037] Hereinafter, exemplary embodiments will be described in detail, and examples thereof are shown in the drawings. When the following description refers to the drawings, unless otherwise indicated, the same numbers in different drawings represent the same or similar elements. The implementation manners described in the following exemplary embodiments do not represent all implementation manners consistent with the present application. On the contrary, they are merely examples of devices and methods consistent with some aspects of the present application as detailed in the appended claims.

[0038] In the prior art, when performing various characterization performance tests on electrodes, such as the morphology, conductivity, and contact resistance of electrodes, there are different test stencils for different characterization performances. The screen printing process is adopted, and electrodes are prepared on the sample wafer through the corresponding test stencil, and then the characterization performance of the electrodes on the sample wafer is tested by a test device. However, the above different characterization performance tests require using different test stencils to prepare electrodes separately, resulting in a relatively long time required for preparing electrodes and affecting the test efficiency.

[0039] Based on this, an embodiment of the present application provides a screen printing test screen plate, including: a screen plate body, on which there are a sheet resistance test pattern, a grid line spacing test pattern, a grid line width test pattern, and a contact resistance test pattern. The sheet resistance test pattern includes at least two first mesh holes arranged at intervals. By comparing the sheet resistance of the electrodes prepared by passing different silver pastes through the first mesh holes, the performance selection of the silver paste can be completed. The grid line spacing test pattern includes at least two grid line spacing test hole groups, and each grid line spacing test hole group includes at least two first grid line holes. The spacing between two adjacent first grid line holes in each grid line spacing test hole group is different. By comparing the charge collection capabilities of the electrodes prepared by different grid line spacing test hole groups, an electrode with a better charge collection capability is obtained, and the grid line spacing of this electrode is the preferred grid line spacing. The grid line width test pattern includes at least two second grid line holes with different widths. By comparing the morphologies and conductivities of the electrodes prepared by second grid line holes with different widths, the optimization of the electrode width is completed. The contact resistance test pattern includes at least two contact resistance test hole groups, and the sizes of the contact resistance test hole groups are different. By comparing the contact resistances of the electrodes prepared by contact resistance test hole groups with different sizes, the preferred contact resistance test hole group is determined. The screen printing test screen plate provided by the embodiment of the present application integrates the sheet resistance test pattern, the grid line spacing test pattern, the grid line width test pattern, and the contact resistance test pattern onto the same screen plate body, realizing the multi-functionality of the test screen plate. When testing the characterization performance of the electrode, by preparing an electrode sheet with the test screen plate, various characterization performances of the electrode can be tested, thereby reducing the time required for preparing the electrode and improving the test efficiency. At the same time, only one test screen plate is needed during the test process, reducing the number of test screen plates during the test process and lowering the cost.

[0040] The embodiments of the present application will be described below with reference to the accompanying drawings.

[0041] Referring to Figures 1 to 5 , the screen printing test screen plate provided by the embodiment of the present application includes: a screen plate body 10, on which there are a sheet resistance test pattern 110, a grid line spacing test pattern 210, a grid line width test pattern 310, and a contact resistance test pattern 410.

[0042] The sheet resistance test pattern 110 includes at least two first mesh holes 111 arranged at intervals. The grid line spacing test pattern 210 includes at least two grid line spacing test hole groups 211, and each grid line spacing test hole group 211 includes at least two first grid line holes 212. The spacing between two adjacent first grid line holes 212 in each grid line spacing test hole group 211 is different. The grid line width test pattern 310 includes at least two second grid line holes 312 with different widths. The contact resistance test pattern 410 includes at least two contact resistance test hole groups 411, and the sizes of the contact resistance test hole groups 411 are different.

[0043] Among them, the screen version body 10 is a wire mesh.

[0044] Exemplarily, the screen version body 10 has a first graphic area 100, a second graphic area 200, a third graphic area 300, and a fourth graphic area 400. The sheet resistance test pattern 110 is located within the first graphic area 100, the grid line pitch test pattern 210 is located within the second graphic area 200, the grid line width test pattern 310 is located within the third graphic area 300, and the contact resistance test pattern 410 is located within the fourth graphic area 400. By setting the first graphic area 100, the second graphic area 200, the third graphic area 300, and the fourth graphic area 400, the sheet resistance test pattern 110, the grid line pitch test pattern 210, the grid line width test pattern 310, and the contact resistance test pattern 410 are separated.

[0045] Furthermore, the screen version body 10 is usually square, and the length and width of the screen version body 10 are equal. The first graphic area 100, the second graphic area 200, the third graphic area 300, and the fourth graphic area 400 can be arranged in a rectangular array on the screen version body 10. Among them, the positions of the first graphic area 100, the second graphic area 200, the third graphic area 300, and the fourth graphic area 400 can be interchanged with each other.

[0046] In a specific implementation, first, the silver paste is coated on the screen version body 10, and then, by means of screen printing, the silver paste is printed on the silicon wafer through the screen version body 10 by a printing device, so that the silver paste printing patterns corresponding to the sheet resistance test pattern 110, the grid line pitch test pattern 210, the grid line width test pattern 310, and the contact resistance test pattern 410 on the screen version body 10 are formed on the silicon wafer. Then, the silicon wafer printed with the silver paste is sintered. After the sintering is completed, an electrode sheet is formed. The electrode sheet has electrodes corresponding to the sheet resistance test pattern 110, the grid line pitch test pattern 210, the grid line width test pattern 310, and the contact resistance test pattern 410 respectively. By characterizing the performance parameters such as the morphology, conductivity, and contact resistance of the electrodes on the electrode sheet, the preparation process of the electrodes is evaluated, and thus it is convenient to improve the electrode preparation process. Among them, the morphology performance parameters include the aspect ratio, broken grid, and low points of the electrodes.

[0047] It should be noted that the main factors affecting the characterization performance parameters of the electrodes include the performance of the silver paste, the printing parameters of the printing device, and the test patterns on the screen version body 10. By testing the electrodes prepared by the screen version on the same silicon wafer, the error caused by the difference in the silicon wafers can be avoided.

[0048] In some examples, the shapes and sizes of the first mesh holes 111 are all the same. The first mesh holes 111 can be square holes, round holes, oval holes, or holes of other shapes, etc. The arrangement mode of the number of the first mesh holes 111 can be adaptively set according to actual needs.

[0049] It can be understood that the electrode grid lines formed on the surface of the silicon wafer by screen printing are usually relatively thin, and it is impossible to effectively observe the relatively thin electrode grid lines through an ordinary microscope, such as the holes on the electrode grid lines and the macroscopic surface morphology of the electrode grid lines. Therefore, the first mesh hole 111 is set. Relative to the electrode grid line, the area of the first mesh hole 111 is larger, and the area of the electrode prepared through the first mesh hole 111 is larger, and the surface morphology of the electrode can be observed with a conventional microscope.

[0050] In specific implementation, under the same screen printing parameters, compare the sheet resistance of the electrodes prepared through the first mesh hole 111 with different silver pastes to complete the selection of the silver paste performance. The specific steps are as follows: First, use different silver pastes to prepare corresponding electrodes through the first mesh hole 111, then measure the sheet resistance of the electrodes by the four-probe method, and finally obtain a more suitable silver paste by comparing the sheet resistance of each electrode.

[0051] The grid line pitch, as an important screen parameter, directly affects the electrode performance. When the grid line pitch is small, the number of grid lines is large, and the overall resistance of the electrode is small. In addition, the number of front electrodes on the silicon wafer should be minimized on the basis of ensuring the effective ability to collect photo-generated charges, so as to reduce the light-shielding area and improve the efficiency.

[0052] Exemplarily, the first grid line holes 212 are parallel to each other so that the distance between adjacent two first grid line holes 212 is equal everywhere.

[0053] Specifically, under the same silver paste and screen printing parameters, compare the charge collection capabilities of the electrodes prepared through different grid line pitch test hole groups 211, and obtain the electrode with better charge collection ability. The grid line pitch of this electrode is the preferred grid line pitch. The specific steps are as follows: Prepare corresponding electrodes on the front of the silicon wafer through each grid line pitch test hole group 211. The distance between adjacent two grid lines in each electrode is different. At the same time, print a common electrode pattern on the back of the silicon wafer. Then use the external quantum efficiency (EQE) test equipment in photovoltaic testing to measure the external quantum efficiency of each electrode, and adjust the light spot of the external quantum efficiency test equipment so that it just falls in the middle of the electrode. At this time, the photo-generated charges generated by the silicon wafer are collected by the electrode, and the integral current of the corresponding electrode under the corresponding light source can be obtained through integration. By comparing the magnitudes of the integral currents, the charge collection capabilities of the electrodes with different grid line pitches can be compared.

[0054] It should be noted that in the prior art, the optimization of the grid line pitch mainly relies on experiments. It is necessary to use screens with different grid line pitches to prepare electrodes on the silicon wafer, and then determine the optimal grid line pitch parameters according to the battery efficiency. Compared with the prior art, the screen printing test screen provided by the embodiments of the present application is relatively simple and convenient to determine the preferred grid line pitch parameters, and has a relatively high test efficiency.

[0055] The grid line printing morphology is an important factor affecting the performance of the electrode. By adjusting the opening width of the screen printing stencil, the grid line printing morphology can be significantly adjusted. Generally, in order to adapt the performance of the screen printing stencil opening width and the silver paste, it is necessary to make screen printing stencils with a variety of different opening widths. In this application, a variety of second grid line holes 312 with different widths are provided on the screen printing stencil body 10, and the grid line printed electrodes of the paste under different opening widths can be obtained at one time. By combining with the microscope to observe the morphology of the grid line printed electrodes, the optimal electrode opening width can be screened out.

[0056] Specifically, under the same silver paste and screen printing parameters, compare the morphology and conductivity of the electrodes prepared through the second grid line holes 312 with different widths to complete the optimization of the electrode width. The specific steps are as follows: First, select the silver paste to be tested, and prepare electrodes with different widths through the second grid line holes 312 with different widths under the same printing parameters. Then observe the morphology such as the height, width, broken grid and low points of the electrodes under a 3D microscope, and compare the performance of each electrode. In addition, the conductivity of each electrode can be determined by measuring the resistivity of each electrode and making a comparison. Thus, the preferred electrode width under the silver paste and printing parameters can be comprehensively determined. In some other embodiments, the electrode width is the opening width of the screen printing stencil body 10. The width range of the second grid line holes 312 can be from 15 microns to 100 microns, corresponding to the opening width of the screen printing stencil in the prior art.

[0057] In addition to the resistance of the electrode itself, the contact resistance between the electrode and the substrate silicon wafer is also an important factor affecting the device resistance. Specifically, under the same silver paste and screen printing parameters, compare the contact resistance of the electrodes prepared through the contact resistance test hole groups 411 with different sizes to determine the preferred contact resistance test hole groups 411.

[0058] Exemplarily, the contact resistance test hole groups 411 can be arranged at intervals in sequence.

[0059] The screen printing test screen printing stencil provided by the embodiment of the present application integrates the sheet resistance test pattern 110, the grid line spacing test pattern 210, the grid line width test pattern 310 and the contact resistance test pattern 410 onto the same screen printing stencil body 10 to realize the multi-function of the test screen printing stencil. When testing the characterization performance of the electrode, by preparing an electrode sheet through the test screen printing stencil, the various characterization performances of the electrode can be tested, thereby reducing the time for preparing the electrode sheet and improving the test efficiency. At the same time, only one test screen printing stencil is required during the test process, reducing the number of test screen printing stencils during the test process and reducing the cost.

[0060] Refer to Figure 1 and Figure 2 , in the above embodiment, the sheet resistance test pattern 110 further includes at least one second mesh hole 112, and the area of the second mesh hole 112 is larger than the area of the first mesh hole 111.

[0061] Among them, the electrodes with a larger area prepared by part of the silver paste have better contact performance with the silicon wafer. Therefore, the second mesh hole 112 is provided to facilitate the selection of the silver paste with better performance when preparing the electrodes with a larger area.

[0062] Exemplarily, the second mesh hole 112 is located on one side of one of the first mesh holes 111.

[0063] In a specific implementation, each group of gate line pitch test holes 211 is sequentially arranged at intervals along a preset direction, so that the electrodes prepared through each group of gate line pitch test holes 211 are sequentially arranged at intervals along the preset direction, thereby facilitating the measurement of the charge collection ability of each electrode.

[0064] In a specific implementation, the lengths of the first gate line holes 212 are equal.

[0065] Among them, the lengths of the first gate line holes 212 in different groups of gate line pitch test holes 211 are the same, so as to avoid errors in the test results caused by differences in the lengths of the first gate line holes 212 in each group of gate line pitch test holes 211.

[0066] Furthermore, the widths of the first gate line holes 212 are the same.

[0067] Refer to Figure 3 , in a specific implementation, the group of gate line pitch test holes 211 further includes two third gate line holes 213, and the two third gate line holes 213 are respectively connected to the same ends of the first gate line holes 212.

[0068] Among them, the third gate line holes 213 are perpendicular to the first gate line holes 212. The third gate line holes 213 are parallel to each other. The distances between the two third gate line holes 213 in each group of gate line pitch test holes 211 are equal.

[0069] Exemplarily, one end of the third gate line hole 213 is connected to the first gate line hole 212 at one end of the group of gate line pitch test holes 211, and the other end of the third gate line hole 213 extends out of the first gate line hole 212 at the other end of the group of gate line pitch test holes (211)211.

[0070] Specifically, electrodes are prepared on the front surface of the silicon wafer through the group of gate line pitch test holes 211, and the photo-generated charges generated by the silicon wafer are collected by the gate lines corresponding to the first gate line holes 212 in the electrodes and converge to the gate lines corresponding to the third gate line holes 213 in the electrodes, so as to facilitate the test equipment to detect the photo-generated charges on the electrodes.

[0071] Refer to Figure 1 and Figure 4, in some embodiments, the gate line width test pattern 310 includes at least two groups of gate line width test holes 311, and each group of gate line width test holes 311 includes at least two second gate line holes 312 with the same width.

[0072] Specifically, under different silver pastes and screen printing parameters, by comparing the morphologies and conductivities of the electrodes prepared through the respective second gate line holes 312 in the same group of gate line width test holes 311, the preferred silver paste properties and the preferred screen printing parameters can be determined.

[0073] In a specific implementation, both ends of the second gate line hole 312 have connecting portions 313, and the width of the connecting portions 313 is greater than the width of a part of the second gate line hole 312 between the two connecting portions 313.

[0074] Among them, the width of the connecting portions 313 is larger relative to a part of the second gate line hole 312 between the two connecting portions 313, so as to facilitate the resistance measurement of the electrodes with a fixed length, and thus deduce information such as the conductivity of the electrodes.

[0075] Exemplarily, the connecting portion 313 is a rectangular hole.

[0076] In some embodiments, the respective second gate line holes 312 are arranged in parallel at intervals and have equal lengths.

[0077] Among them, by arranging the respective second gate line holes 312 in parallel at intervals, it is convenient to compare the morphologies of the electrodes corresponding to the respective second gate line holes 312. By setting the lengths of the respective second gate line holes 312 to be the same, it is possible to avoid errors in the test results caused by differences in the lengths of the second gate line holes 312 in each group of gate line width test holes 311.

[0078] Referring to Figure 1 and Figure 4 , in some embodiments, the gate line width test pattern 310 further includes at least one fourth gate line hole 320, the length of the fourth gate line hole 320 is greater than or less than the length of the second gate line hole 312, and the fourth gate line hole 320 is located between two adjacent groups of gate line width test holes 311.

[0079] Among them, the width differences of the respective second gate line holes 312 in each group of gate line width test holes 311 are small, and it is not easy to distinguish each group of gate line width test holes 311. Therefore, a fourth gate line hole 320 with a length greater than that of the second gate line hole 312 is arranged between two adjacent groups of gate line width test holes 311, so as to facilitate the distinction of each group of gate line width test holes 311.

[0080] Furthermore, the lengths of the fourth grid line holes 320 can be equal, while the widths of the fourth grid line holes 320 are different. Thus, under the same silver paste and screen printing parameters, the morphologies and conductivities of the electrodes prepared through the fourth grid line holes 320 with different widths can be compared to determine the preferred grid line width.

[0081] In some other embodiments, a separation area is provided between two adjacent grid line width test hole groups 311, and the width of the separation area is greater than the distance between two adjacent second grid line holes 312 in the grid line width test hole group 311, so as to facilitate the distinction between the grid line width test hole groups 311.

[0082] Referring to Figure 5 , in a specific implementation, the contact resistance test hole group 411 includes a plurality of linearly arranged mesh holes 412 arranged at intervals. The sizes of the linearly arranged mesh holes 412 are the same and parallel to each other, and the distances between two adjacent linearly arranged mesh holes 412 increase or decrease in sequence. The sizes of the linearly arranged mesh holes 412 in different contact resistance test hole groups 411 are different.

[0083] Exemplarily, the size of the linearly arranged mesh hole 412 includes the width and length of the linearly arranged mesh hole 412. The number of the contact resistance test hole groups 411 is two. The number of the linearly arranged mesh holes 412 in one contact resistance test hole group 411 is six, and the linearly arranged mesh holes 412 are parallel to each other. The widths and lengths of the linearly arranged mesh holes 412 in the two contact resistance test hole groups 411 are different.

[0084] Specifically, the specific steps for determining the preferred contact resistance test hole group 411 are as follows: silver paste is used to prepare corresponding electrodes on the surface of the substrate silicon wafer through each contact resistance test hole group 411 under the same printing parameters, and then a resistance tester with four probes is used to measure the resistance values of the electrodes at different intervals in combination with the TLM (Transmission Line Method) resistance test method. The electrode interval and the resistance value show a linear relationship. Finally, a straight line is plotted with the electrode interval as the abscissa and the resistance value as the ordinate for fitting. The intercept of the straight line is the magnitude of the contact resistance. In addition, the sheet resistance of the substrate silicon wafer can be deduced from the slope of the above straight line, so as to compare the influence of different electrode widths on the contact resistance test results.

[0085] It can be understood that different silver pastes can also be used to prepare contact resistance test electrodes through the contact resistance test hole group 411 under the same screen printing parameters, and the performance differences of different silver pastes under the same printing conditions can be judged by comparing the obtained contact resistances, so as to determine the silver paste with better performance. Further, the same silver paste can also be used to prepare contact resistance test electrodes through the contact resistance test hole group 411 under different printing parameters, and the performance differences of the same silver paste under different screen printing parameters can be judged by comparing the obtained contact resistances, so as to determine the better screen printing parameters.

[0086] Referring to Figure 1 and Figure 2 , in some embodiments, the screen body 10 further has a reference test pattern 510, and the reference test pattern 510 includes at least two reference holes 511 with different sizes.

[0087] Among them, the reference hole 511 includes a MARK point. MARK points are usually used for visual positioning in the screen printing process. Usually, the prepared MARK points need to have regular shapes and uniform surfaces, and there should be no paste leakage, missing, etc. Due to the performance differences of different silver paste formulations, it is necessary to adjust the shape and size of the MARK points to meet the preparation requirements.

[0088] Specifically, under the same silver paste and screen printing parameters, the morphologies of the reference electrodes prepared through different reference holes 511 are compared to determine the better reference hole 511. The specific steps are as follows: Different-sized reference electrodes are prepared using the same silver paste under the same screen printing parameters. The reference electrodes are observed through a microscope. When there is no paste leakage, the edges are neat, and the surface is uniform for the reference electrode, it means that the size of the reference hole 511 meets the requirements under the silver paste and printing conditions.

[0089] In some examples, the screen body 10 has a fifth graphic area 500, and the reference test pattern 510 is located within the fifth graphic area 500. Further, the fifth graphic area 500 can be located on one side of any one of the first graphic area 100, the second graphic area 200, the third graphic area 300, and the fourth graphic area 400. At the same time, the fifth graphic area 500 can be located between at least any two of the first graphic area 100, the second graphic area 200, the third graphic area 300, and the fourth graphic area 400.

[0090] Exemplarily, the reference hole 511 is a round hole. The diameter of the round hole is 0.15 mm - 1 mm.

[0091] It can be understood that the reference hole 511 can also be a hollow ring, a cross mark, etc.

[0092] Thus, by designing different reference holes 511, it is possible to quickly screen out suitable reference holes 511 for silver pastes with different characteristics. Each reference hole 511 is located on the same screen body 10, and the parameters suitable for the corresponding silver paste can be quickly found through one printing, saving the time for preparing the electrodes and improving the test efficiency.

[0093] In the description of the embodiments of the present application, the terms "first", "second", etc. in the specification, claims and the above drawings are used to distinguish similar objects and do not necessarily describe a specific order or sequence. It should be understood that such data may be interchanged under appropriate circumstances so as to implement the embodiments of the present application described herein. In addition, the terms "comprising" and "having", and any variations thereof, are intended to cover non-exclusive inclusion.

[0094] In the embodiments of the present application, the orientation or positional relationship indicated by the terms "upper", "lower", "inner", "middle", "outer", "front", "rear", etc. is based on the orientation or positional relationship shown in the drawings. These terms are mainly used to better describe the present application and its embodiments, and are not used to limit that the indicated device, element or component must have a specific orientation or be constructed and operated in a specific orientation. And, in addition to being used to represent the orientation or positional relationship, some of the above terms may also be used to represent other meanings. For example, the term "upper" may also be used to represent a certain attachment relationship or connection relationship in some cases. For those of ordinary skill in the art, the specific meanings of these terms in the embodiments of the present application can be understood according to specific circumstances.

[0095] In addition, the terms "arranged", "connected", "fixed" should be understood in a broad sense. For example, "connected" may be a fixed connection, a detachable connection, or an integral structure; it may be a mechanical connection or an electrical connection; it may be directly connected, or indirectly connected through an intermediate medium, or there may be internal communication between two devices, elements or components. For those of ordinary skill in the art, the specific meanings of the above terms in the embodiments of the present disclosure can be understood according to specific circumstances.

[0096] Unless otherwise specified, the term "plurality" means two or more.

[0097] After considering the specification and practicing the application disclosed herein, those skilled in the art will readily conceive of other embodiments of the present application. The present application is intended to cover any variations, uses or adaptations of the present application, which follow the general principles of the present application and include common general knowledge or conventional technical means in the technical field not disclosed in the present application. The specification and embodiments are only to be considered as exemplary, and the scope of the present application is limited only by the appended claims.

Claims

1. A screen printing test screen plate, characterized in that, Comprising: A mesh version body (10) with a sheet resistance test pattern (110), a grid line spacing test pattern (210), a grid line width test pattern (310), and a contact resistance test pattern (410) thereon; The sheet resistance test pattern (110) includes at least two first mesh holes (111) arranged at intervals; The grid line spacing test pattern (210) includes at least two grid line spacing test hole groups (211), and each grid line spacing test hole group (211) includes at least two first grid line holes (212), and the spacing between adjacent two of the first grid line holes (212) in each grid line spacing test hole group (211) is different; The grid line width test pattern (310) includes at least two second grid line holes (312) with different widths; The contact resistance test pattern (410) includes at least two contact resistance test hole groups (411), and the sizes of each contact resistance test hole group (411) are different.

2. The screen printing test screen plate according to claim 1, characterized in that, The sheet resistance test pattern (110) further includes at least one second mesh hole (112), and the area of the second mesh hole (112) is larger than the area of the first mesh hole (111).

3. The screen printing test screen plate according to claim 1, wherein, Each of the grid line spacing test hole groups (211) is arranged at intervals in a preset direction.

4. The screen printing test stencil according to claim 1, wherein The lengths of each of the first grid line holes (212) are equal.

5. The screen printing test screen plate according to claim 4, wherein, The grid line spacing test hole group (211) further includes two third grid line holes (213), and the two third grid line holes (213) respectively communicate with the same end of each of the first grid line holes (212).

6. The screen printing test stencil according to any one of claims 1-5, characterized in that The grid line width test pattern (310) includes at least two grid line width test hole groups (311), and each grid line width test hole group (311) includes at least two of the second grid line holes (312) with the same width.

7. The screen printing test stencil according to claim 6, characterized in that, Both ends of the second grid line hole (312) have connecting portions (313), and the width of the connecting portions (313) is larger than the width of the part of the second grid line hole (312) between the two connecting portions (313).

8. The screen printing test stencil according to claim 6, wherein Each of the second grid line holes (312) is arranged in parallel at intervals and has an equal length.

9. The screen printing test stencil according to claim 8, characterized in that, The grid line width test pattern (310) further includes at least one fourth grid line hole (320), the length of the fourth grid line hole (320) is greater than or less than the length of the second grid line hole (312), and the fourth grid line hole (320) is located between two adjacent grid line width test hole groups (311).

10. The screen printing test screen plate according to any one of claims 1-5, characterized in that, The contact resistance test hole group (411) includes a plurality of linearly arranged mesh holes (412) arranged at intervals, the sizes of each of the linearly arranged mesh holes (412) are the same and are parallel to each other, and the spacing between adjacent two of the linearly arranged mesh holes (412) increases or decreases in sequence; The sizes of the linearly arranged mesh holes (412) in different contact resistance test hole groups (411) are different.

11. The screen printing test stencil according to any one of claims 1-5, characterized in that, The mesh version body (10) further has a reference test pattern (510), and the reference test pattern (510) includes at least two reference holes (511) with different sizes.

Images