Filtering device and filtering system

Abstract

The utility model provides a filtering device and a filtering system, particularly relates to the technical field of photovoltaic equipment manufacturing, and solves the problem that a tail gas treatment device of deposition equipment affects the equipment operation rate. The filtering device is configured to filter tail gas generated by deposition equipment, and comprises a shell; the filtering assembly is arranged in the shell and is configured to adhere particles in the tail gas to the filtering assembly, and the filtering assembly is provided with a hollow space; at least part of the cleaning assembly extends into the hollow space, and the cleaning assembly is configured to knock the filtering assembly so as to enable particles adhered to the filtering assembly to fall off. According to the filtering device provided by the embodiment of the invention, the filtering assembly is knocked by the cleaning assembly, so that particles adhered to the filtering assembly are cleaned, the problem that the filtering assembly is blocked due to long-term use is avoided, the service life of the filtering assembly is prolonged, the frequency of manual intervention for cleaning is reduced, and the cleaning efficiency is improved. And the influence on the starting rate of the deposition equipment is reduced.

Description

Technical Field

[0001] The present application relates to the technical field of photovoltaic equipment manufacturing, and in particular to a filtering device and a filtering system. Background Art

[0002] With the increasing global demand for renewable energy, especially in the context of climate change and environmental protection, photovoltaic power generation, as a clean energy, can effectively reduce greenhouse gas emissions and combat global climate change. More and more countries and regions are promoting the use of photovoltaic energy. However, in the photovoltaic industry, the precursors or by-products used in the atomic deposition passivation film process are discharged with the exhaust gas, resulting in the risk of exhaust gas polluting the environment or damaging equipment such as pumps.

[0003] Traditionally, the tail gas generated by the atomic deposition passivation equipment is treated by the tail gas treatment equipment. The tail gas is pumped out to the tail gas treatment equipment through a dry pump. The particles in the tail gas will cause the dry pump to be blocked, and the deposition equipment needs to be shut down for maintenance, affecting the deposition equipment. In addition, in some tail gas treatment methods, as the use time increases, it is necessary to shut down and perform manual intervention and cleaning, which affects the start-up rate of the deposition equipment.

[0004] Therefore, there is an urgent need for a filtering device to solve the problem of affecting the equipment start-up rate existing in the tail gas treatment method of the deposition equipment. Utility Model Content

[0005] In view of this, the embodiments of the present application provide a filtering device and a filtering system, which solve the problem of affecting the equipment startup rate existing in the exhaust gas treatment method of the deposition equipment.

[0006] In a first aspect, an embodiment of the present application provides a filtering device configured to filter exhaust gas generated by a deposition device, the filtering device comprising: a shell; a filtering component, the filtering component being disposed in the shell and configured to adhere particles in the exhaust gas to the filtering component, the filtering component having a hollow space; and a cleaning component, at least a portion of the cleaning component extending into the hollow space, the cleaning component being configured to knock the filtering component to cause particles adhered to the filtering component to fall off.

[0007] In one embodiment, the cleaning component includes: a cleaning member, which is located in the hollow space and contacts the filter component; a power member, which is transmission-connected to the cleaning member and configured to drive the cleaning member to rotate so that the cleaning member strikes the filter component to cause particles adhered to the filter component to fall off.

[0008] In one embodiment, the cleaning member includes: a main rod, extending in a vertical direction, transmission-connected to a power member, and rotating under the drive of the power member; a secondary rod, extending in a direction intersecting with the extension direction of the main rod, connected to the main rod, and in contact with the filter assembly, and the main rod can drive the secondary rod to rotate so that the secondary rod knocks the filter assembly.

[0009] In one embodiment, the auxiliary rod includes: a plurality of sub-auxiliary rods, which are arranged on the main rod at intervals along the extending direction of the main rod.

[0010] In one embodiment, the main rod is provided with a plurality of mounting holes at intervals, and the plurality of sub-auxiliary rods are respectively inserted into the plurality of mounting holes.

[0011] In one embodiment, the housing includes: a cavity, which is provided with a chamber extending in the vertical direction, and the filtering component is located in the chamber; wherein, the cavity has an air outlet and an air inlet communicating with the chamber, the air outlet is located at the top end of the cavity, and the air inlet is located on the side wall of the cavity; wherein, the orthographic projection of the filtering component in the direction towards the air inlet covers the intersection area of the air inlet and the chamber.

[0012] In one embodiment, the bottom end of the cavity has a replacement opening; wherein, the housing further includes: a collection member, which is configured to close or open the replacement opening and collect the particles falling from the filtering component.

[0013] In one embodiment, the air inlet is located in the middle of the cavity.

[0014] In a second aspect, an embodiment of the present application provides a filtering system, including: a deposition device, which is configured to perform a deposition process on a substrate and generate tail gas; the above-mentioned filtering device, which is connected to the deposition device and is configured to filter the tail gas; an air extraction device, which is connected to the filtering device and is configured to extract the tail gas in the deposition device to the filtering device and extract the tail gas filtered by the filtering device from the filtering device.

[0015] In some embodiments, the filtering system further includes: a reaction gas exhaust pipeline, which is respectively connected to the deposition device and the filtering device, and the unreacted reaction gas during the deposition process enters the filtering device through the reaction gas exhaust pipeline; a water vapor exhaust pipeline, which is respectively connected to the deposition device and the filtering device, and the water vapor not participating in the reaction during the deposition process enters the filtering device through the water vapor exhaust pipeline.

[0016] The filtering device provided by the embodiment of the present application realizes the cleaning of the particles adhered to the filtering component by the cleaning component knocking the filtering component, avoids the problem of blockage of the filtering component due to long-term use, prolongs the service life of the filtering component, reduces the frequency of manual intervention for cleaning, and reduces the impact on the startup rate of the deposition equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] By describing the embodiments of the present application in more detail in conjunction with the drawings, the above-mentioned and other objects, features and advantages of the present application will become more obvious. The drawings are used to provide a further understanding of the embodiments of the present application, and constitute a part of the specification, and are used to explain the present application together with the embodiments of the present application, and do not constitute a limitation to the present application.

[0018] Figure 1 The structural schematic diagram of the filtering device provided by an embodiment of the present application is shown.

[0019] Figure 2 Shown is what is provided by an embodiment of the present application Figure 1 The cross-sectional schematic diagram of the structure of the filtering device shown in the A-A direction.

[0020] Figure 3 The top view of the filtering device provided by an embodiment of the present application is shown.

[0021] Figure 4 The structural schematic diagram of the cleaning component provided by an embodiment of the present application is shown.

[0022] Figure 5 The structural schematic diagram of the cleaning part provided by an embodiment of the present application is shown.

[0023] Figure 6 The structural schematic diagram of the cleaning part provided by another embodiment of the present application is shown.

[0024] Figure 7 The structural schematic diagram of the housing provided by an embodiment of the present application is shown.

[0025] Figure 8 Shown is what is provided by an embodiment of the present application Figure 7 The cross-sectional structural schematic diagram of the housing shown in the B-B direction.

[0026] Figure 9 The structural schematic diagram of the housing provided by another embodiment of the present application is shown.

[0027] Figure 10 The structural schematic diagram of the filtering system provided by an embodiment of the present application is shown.

[0028] Figure 11 The structural schematic diagram of the filtering system provided by another embodiment of the present application is shown.

[0029] Reference numerals:

[0030] 100. Filter device; 110. Housing; 120. Filter assembly; 130. Cleaning assembly; 121. Hollow space; 131. Cleaning part; 132. Power part; 1311. Main rod; 1312. Sub-rod; 13121. Sub-sub rod; 13111. Mounting hole; 111. Cavity; 1111. Chamber; 1112. Air outlet; 1113. Air inlet; 1114. Intersecting area; 1115. Replacement port; 112. Collection part; 200. Filtration system; 210. Deposition device; 220. Air extraction device; 230. Reaction gas exhaust pipeline; 240. Water vapor exhaust pipeline. Detailed implementation manners

[0031] Next, the technical solutions in the embodiments of the present application will be clearly and completely described with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present application.

[0032] Figure 1 The figure shows a schematic structural diagram of a filter device provided by an embodiment of the present application. Figure 2 Shown is provided by an embodiment of the present application Figure 1 A schematic cross-sectional view of the structure of the shown filter device in the A-A direction. As Figure 1 and Figure 2 shown, the filter device 100 provided by the embodiment of the present application includes a housing 110, a filter assembly 120, and a cleaning assembly 130. Specifically, the filter assembly 120 is disposed inside the housing 110 and is configured to adhere the particles in the tail gas to the filter assembly 120. As Figure 3 shown, the filter assembly 120 has a hollow space 121. At least a part of the cleaning assembly 130 extends into the hollow space 121 and is configured to knock the filter assembly 120 so that the adhered particles on the filter assembly 120 fall off.

[0033] Exemplarily, the filter assembly 120 includes a metal filter element or a filter element of other materials. The filter element can also be composed of a multi-layer folded stainless steel filter. The use of a metal filter element in the filter assembly 120 can achieve repeated use and save costs. In addition, since the tail gas generated by atomic layer deposition contains the reaction gas trimethylaluminum, water vapor neutralization is usually used for the trimethylaluminum in the tail gas. The particles produced after neutralization are viscous, and the metal filter element has a better filtering effect on viscous particles. In actual applications, the process reaction gas trimethylaluminum used in the deposition equipment generally reacts with the water vapor in the reaction process in the filter device to produce a neutralization reaction, and in a wet state, a sticky block is produced, which is attached to the filter assembly 120. The cleaning assembly 130 knocks on the filter assembly 120 to assist the sticky block particles on the filter assembly 120 to fall off, thereby achieving the purpose of cleaning the filter assembly 120.

[0034] Exemplarily, there may be a contact area between the cleaning component 130 and the filter component 120 , and the cleaning component 130 strikes the contact area, and the vibration of the contact area is transmitted to the entire filter component, thereby cleaning the filter component 120 .

[0035] The filter device provided in the embodiment of the present application realizes cleaning of the filter component through a cleaning component, thereby avoiding the problem of clogging of the filter component due to long-term use, extending the service life of the filter component, reducing the frequency of manual intervention for cleaning, and reducing the impact on the start-up rate of the deposition equipment.

[0036] Figure 4 The figure is a schematic diagram of the structure of a cleaning component provided by an embodiment of the present application. Figure 4 As shown, the cleaning assembly 130 includes a cleaning member 131 and a power member 132. Specifically, the cleaning member 131 is located in the hollow space 121 and contacts the filter assembly 120; the power member 132 is in transmission connection with the cleaning member 131 and is configured to drive the cleaning member 131 to rotate so that the cleaning member 131 knocks against the filter assembly 120 to drop particles adhered to the filter assembly 120.

[0037] Exemplarily, the power member 132 includes a motor, such as a servo motor, a stepper motor, a DC motor, and an AC motor. It should be understood that the power member 132 can achieve the purpose of driving the cleaning member 131 to rotate, and the embodiment of the present application does not further limit the specific type of the power member.

[0038] Exemplarily, the power member 132 also includes accessories that cooperate with the cleaning member 131, such as a motor and a coupling and a magnetic fluid seal that are respectively connected to the motor and the cleaning member 131, so as to achieve the purpose of driving the cleaning member 131. In actual application, the selection of a magnetic fluid seal can ensure the sealing effect and transmit the force of the motor, and can provide reliable sealing and force transmission under different working conditions.

[0039] In the embodiment of the present application, the cleaning component realizes self-cleaning of the filter component through the cooperation of the power member 132 and the cleaning member 131. By contacting the cleaning member 131 with the filter component 120 and driving it to rotate by the power member 132, the filter component 120 is knocked, making the vibration transmission more uniform and further improving the cleaning degree of the filter component 120.

[0040] Figure 5 The following shows a schematic structural diagram of the cleaning member provided by an embodiment of the present application. As Figure 5 shown, the cleaning member 131 includes a main rod 1311 and a sub-rod 1312. The main rod 1311 extends in the vertical direction and is connected to the power member 132. The sub-rod 1312 extends in a direction intersecting with the extending direction of the main rod 1311, is connected to the main rod 1311, and contacts the filter component 120. The main rod 1311 can drive the sub-rod 1312 to rotate so that the sub-rod 1312 knocks the filter component 120.

[0041] Exemplarily, the materials of the main rod 1311 and the sub-rod 1312 can be selected according to requirements, such as metal materials or alloy materials. The embodiment of the present application does not further limit the materials of the main rod 1311 and the sub-rod 1312. The connection between the main rod 1311 and the sub-rod 1312 drives the sub-rod 1312 to rotate through the rotation of the main rod 1311. Since the sub-rod 1312 contacts the filter component 120, the filter component 120 is knocked during the rotation process, realizing the cleaning of the filter component 120.

[0042] The cleaning member 131 of the embodiment of the present application includes a main rod 1311 and a sub-rod 1312. The movement of the sub-rod 1312 is realized by rotating the main rod 1311, with a simple structure and low manufacturing cost.

[0043] In some embodiments, as Figure 5 shown, the sub-rod 1312 includes a plurality of sub-sub-rods 13121. The plurality of sub-sub-rods 13121 are spaced along the extending direction of the main rod 1311 on the main rod 1311. Exemplarily, the plurality of sub-sub-rods 13121 are connected to the main rod 1311 by welding, bonding, bolt connection or riveting. The embodiment of the present application does not further limit the connection method between the sub-sub-rods 13121 and the main rod 1311. The intervals at which the plurality of sub-sub-rods 13121 are arranged along the extending direction of the main rod 1311 can be selected according to requirements. The sub-rod 1312 provided by the embodiment of the present application includes a plurality of sub-sub-rods 13121, and the plurality of sub-sub-rods 13121 are spaced along the extending direction of the main rod 1311 on the main rod 1311, increasing the contact area between the sub-rod 1312 and the filter component 120 and increasing the knocking area during rotation, thereby improving the vibration effect and further improving the cleaning effect on the filter component 120.

[0044] Figure 6 The following is a schematic structural diagram of a cleaning member provided by another embodiment of the present application. In Figure 5 Based on the illustrated embodiment, Figure 6 the illustrated embodiment is extended. Figure 6 Below, the differences between the Figure 5 illustrated embodiment and the

[0045] As Figure 6 shown, a plurality of mounting holes 13111 are spaced on the main rod 1311, and a plurality of sub-secondary rods 13121 are respectively inserted into the plurality of mounting holes 13111, which can make the connection between the sub-secondary rod 13121 and the main rod 1311 more stable. A plurality of mounting holes 13111 are spaced on the main rod 1311 of the filtering device provided by the embodiment of the present application, and a plurality of sub-secondary rods 13121 are respectively inserted into the plurality of mounting holes 13111, which simplifies the installation method of the sub-secondary rod 13121 and the main rod 1311 and saves the manufacturing cost.

[0046] Figure 7 The following is a schematic structural diagram of a housing provided by an embodiment of the present application. Figure 8 The following is Figure 7 a schematic cross-sectional structure diagram of the Figure 7 illustrated Figure 8 housing. As Figure 7 and Figure 8 shown, the housing 110 includes: a cavity 111, provided with a chamber 1111 extending in the vertical direction, and the filtering assembly 120 is located in the chamber 1111; wherein, the cavity 111 has an air outlet 1112 and an air inlet 1113 communicating with the chamber 1111, the air outlet 1112 is located at the top end of the cavity 111, and the air inlet 1113 is located on the side wall of the cavity 111; wherein, the positive projection of the filtering assembly 120 in the direction towards the air inlet 1113 covers the intersection area 1114 of the air inlet and the chamber. The positive projection of the filtering assembly provided by the embodiment of the present application in the direction towards the air inlet 1113 covers the intersection area 1114 of the air inlet and the chamber, ensuring that the path of gas inlet and outlet passes through the filtering assembly 120 and improving the filtering effect of the filtering assembly 120.

[0047] In some embodiments, such as Figure 8As shown, the bottom end of the cavity 111 has a replacement opening 1115; wherein, the housing 110 further includes: a collection member 112, which is configured to close or open the replacement opening 1115 and collect the particles falling from the filter assembly 120. As the usage time and the number of cleaning times increase, the particles falling from the filter assembly 120 increase and will accumulate. In the embodiment of the present application, through the replacement opening 1115 at the bottom end of the cavity 111, in cooperation with the collection member 112, the accumulated particles can be collected and cleaned, which is convenient for operation. In addition, as the usage time increases, when the filter assembly 120 needs to be replaced, it can be replaced through the replacement opening 1115, and the operation is simple and convenient.

[0048] Figure 9 The following is a schematic structural diagram of a housing provided by another embodiment of the present application. In Figure 7 Based on the embodiment shown, Figure 9 the embodiment shown is extended, and the following will focus on Figure 9 the differences between the embodiment shown and Figure 7 the embodiment shown, and the same parts will not be described in detail.

[0049] As Figure 9 shown, the air inlet 1113 of the housing 110 provided by another embodiment of the present application is located in the middle of the cavity 111. In the actual application process, as the number of cleaning times increases, particle accumulation will occur at the bottom of the cavity 111. The closer the air inlet 1113 is to the bottom of the cavity 111, the greater the probability of being blocked by the accumulated particles. In addition, in order to ensure the filtering effect, the distance between the air inlet 1113 and the top end of the cavity 111 should not be too far. Therefore, the air inlet 1113 in the embodiment of the present application is located in the middle of the cavity 111, which reduces the risk of the air inlet being blocked by particle accumulation while ensuring the filtering effect.

[0050] Figure 10 The following is a schematic structural diagram of a filtering system provided by an embodiment of the present application. As Figure 10 shown, the filtering system 200 provided by the embodiment of the present application includes: a deposition device 210, a filtering device 100, and an air extraction device 220. Specifically, the deposition device 210 is configured to perform deposition processing on the substrate and generate tail gas; the filtering device 100, which is connected to the deposition device 210, is configured to filter the tail gas; the air extraction device 220, which is connected to the filtering device 100, is configured to extract the tail gas in the deposition device 210 to the filtering device 100 and extract the tail gas filtered by the filtering device 100 from the filtering device 100.

[0051] The beneficial effects of the filtering system provided by the embodiment of the present application are the same as those of the above-mentioned filtering device, and will not be described in detail here.

[0052] Figure 11The following is a schematic structural diagram of a filtration system provided by another embodiment of the present application. In Figure 10 the embodiment shown, another embodiment is extended Figure 11 from the embodiment shown. Below, the differences between the Figure 11 embodiment shown and the Figure 10 embodiment shown will be emphasized, and the same parts will not be elaborated again.

[0053] As Figure 11 shown, another filtration system provided by another embodiment of the present application includes: a reaction gas exhaust pipeline 230 and a water vapor exhaust pipeline 240. Specifically, the reaction gas exhaust pipeline 230 is respectively connected to the deposition device 210 and the filtration device 100. During the deposition process, the unreacted reaction gas enters the filtration device 210 through the reaction gas exhaust pipeline 230; the water vapor exhaust pipeline 240 is respectively connected to the deposition device 210 and the filtration device 100. During the deposition process, the unreacted water vapor enters the filtration device 100 through the water vapor exhaust pipeline 240.

[0054] Exemplarily, when the deposition device 210 adopts a spatial atomic deposition process, during the edge passivation deposition process of a solar cell, when the reaction gas trimethylaluminum and water vapor are simultaneously supplied to the deposition device 210, nitrogen is used for isolation to avoid direct reaction of the two gases in the deposition device 210. At the same time, a vacuum dry pump is used to evacuate through the filtration device 100, the reaction gas exhaust pipeline 230 and the water vapor exhaust pipeline 240, and the unreacted reaction gas and water vapor during the reaction process can be extracted.

[0055] The filtration system provided by the embodiment of the present application includes a reaction gas exhaust pipeline 230 and a water vapor exhaust pipeline 240, so that the unreacted reaction gas and the unreacted water vapor during the deposition process are discharged from two pipelines respectively, and will not meet in the pipeline, and no neutralization reaction will occur to generate particles and accumulate in the channel, thereby avoiding pipeline blockage caused by particle accumulation.

[0056] The expressions "an embodiment", "the embodiment" and the like mentioned in the specification indicate that the described embodiment may include specific features, structures or characteristics, but not necessarily every embodiment includes such specific features, structures or characteristics. In addition, such phrases do not necessarily refer to the same embodiment. In addition, when combining specific features, structures or characteristics with an embodiment, it is within the knowledge scope of those skilled in the art to implement such features, structures or characteristics in combination with other embodiments, whether explicitly or implicitly described.

[0057] It should be understood that the terms "on", "above", and "over" in this application should be construed in the broadest manner such that "on" not only means "directly on something", but also includes the meaning of "on something" with intermediate features or layers therebetween, and "above" or "over" not only includes the meaning of "above" or "over something", but may also include the meaning of "above" or "over something" with no intermediate features or layers therebetween (i.e., directly on something).

[0058] In addition, for ease of description, spatial relative terms may be used in the text, such as "below", "beneath", "under", "above", "over", etc., to describe the relationship of one component or feature to another component or feature as shown in the figures. Spatial relative terms are intended to encompass different orientations of a component in use or operation in addition to the orientation shown in the figures. The device may have other orientations (rotated 90 degrees or in other orientations), and the spatial relative descriptors used in the text may be interpreted accordingly as well.

[0059] It should be noted that in this text, the term "comprising", "including", or any other variant thereof is intended to cover non-exclusive inclusion, such that a process, method, article, or device comprising a series of elements includes not only those elements, but also other elements not expressly listed, or elements that are inherent to such process, method, article, or device. Without further limitation, an element defined by the phrase "comprising a..." does not exclude the presence of additional identical elements in the process, method, article, or device comprising the element.

[0060] Those of ordinary skill in the art should understand that the discussion of any of the above embodiments is merely exemplary and is not intended to imply that the scope of this application (including the claims) is limited to these examples; within the concept of this application, the technical features in the above embodiments or different embodiments may also be combined, the steps may be implemented in any order, and there are many other variations in different aspects of the embodiments of this application as described above, which are not provided in detail for the sake of brevity.

[0061] The embodiments of this application are intended to cover all such substitutions, modifications, and variations that fall within the broad scope of the appended claims. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc., made within the spirit and principle of the embodiments of this application shall be included within the protection scope of this application.

Claims

1. A filtering device, characterized in that, The filter device is configured to filter exhaust gas generated by a deposition device, the filter device comprising: case; A filter assembly, the filter assembly is disposed in the housing and is configured to adhere particles in the exhaust gas to the filter assembly, and the filter assembly has a hollow space; A cleaning component, at least a portion of which extends into the hollow space, is configured to knock the filter component to cause the particles adhering to the filter component to fall off.

2. The filtering device according to claim 1, characterized in that, The cleaning component comprises: A cleaning member, the cleaning member is located in the hollow space and contacts the filter assembly; A power member is in driving connection with the cleaning member and is configured to drive the cleaning member to rotate so that the cleaning member knocks against the filter assembly to make the particles adhered to the filter assembly fall off.

3. The filtering device according to claim 2, wherein The cleaning element comprises: A main rod extending in a vertical direction, connected to the power member in a transmission manner, and driven to rotate by the power member; The auxiliary rod extends in a direction intersecting with the extension direction of the main rod, is connected to the main rod, and contacts the filter assembly. The main rod can drive the auxiliary rod to rotate so that the auxiliary rod knocks the filter assembly.

4. The filtering device according to claim 3, characterized in that, The auxiliary rod comprises: A plurality of sub-rods are provided on the main rod at intervals along the extension direction of the main rod.

5. The filtering device according to claim 4, wherein, The main rod is provided with a plurality of mounting holes at intervals, and the plurality of sub-rods are respectively passed through the plurality of mounting holes.

6. The filtering device according to any one of claims 2 to 5, characterized in that The housing comprises: The cavity body is provided with a chamber extending in a vertical direction, and the filter assembly is located in the chamber; Wherein, the cavity has an air outlet and an air inlet communicated with the chamber, the air outlet is located at the top of the cavity, and the air inlet is located at the side wall of the cavity; Wherein, the orthographic projection of the filter assembly in the direction toward the air inlet covers the intersection area of the air inlet and the chamber.

7. The filtering device according to claim 6, wherein The bottom end of the cavity is provided with a replacement port; Wherein, the housing further comprises: The collecting member is configured to close or open the replacement port and collect particles dropped from the filter assembly.

8. The filtering device according to claim 7, characterized in that, The air inlet is located in the middle of the cavity.

9. A filtering system, characterized in that, include: A deposition device, wherein the deposition device is configured to perform a deposition process on a substrate and generate tail gas; The filtering device according to any one of claims 1 to 8, connected to the deposition device, and configured to filter the exhaust gas; The exhaust device is connected to the filtering device and is configured to extract the exhaust gas in the deposition device to the filtering device, and to extract the exhaust gas filtered by the filtering device from the filtering device.

10. The filtration system according to claim 9, characterized in that, Also includes: A reaction gas exhaust pipeline, wherein the reaction gas exhaust pipeline is connected to the deposition device and the filtering device respectively, and unreacted reaction gas during the deposition process enters the filtering device from the reaction gas exhaust pipeline; A water vapor exhaust pipeline is connected to the deposition device and the filtering device respectively, and the water vapor that does not participate in the reaction during the deposition process enters the filtering device from the water vapor exhaust pipeline.

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