Feeding and discharging platform and magnetron sputtering equipment

Abstract

The utility model relates to the field of coating of physical vapor deposition, in particular to a feeding and discharging platform and magnetron sputtering equipment, the feeding and discharging platform is adjacent to a coating device, the feeding and discharging platform comprises a halfpace, the height of the halfpace corresponds to that of the coating device, a plurality of fences are arranged on the halfpace, part of the fences are turnover plates, and the turnover plates are arranged on the periphery of the halfpace. The supporting mechanism is arranged on the bottom face of the halfpace, the telescopic movable end of the supporting mechanism is connected with the turning plate, and after the turning plate is completely unfolded, close-distance lap joint between the turning plate and the film connecting area is maintained through the supporting mechanism; the feeding and discharging platform provides a film connecting mode with a higher safety coefficient, and the turning plate can be stably kept in an unfolded state under the action of the supporting mechanism, so that an operator can connect a film through the turning plate; compared with the prior art, the safety guarantee for the operating personnel is further enhanced, high-risk actions such as stretching out of the body cannot occur in the operating process, and the operation is extremely inconvenient.

Description

Technical Field

[0001] The utility model relates to the field of physical vapor deposition coating, in particular to a loading and unloading platform and a magnetron sputtering device. Background Art

[0002] Magnetron sputtering equipment is a device that uses vapor deposition technology to form a coating on the plated workpiece.

[0003] The structure of the magnetron sputtering equipment is quite complex. A large number of mechanisms make the equipment very large, especially the vacuum chamber, which is much higher than the normal height of an average person.

[0004] In the magnetron sputtering equipment, film rolls need to be loaded and fed. This film loading process requires manual participation, mainly in the film connection link, which is still at the stage that requires operators to complete.

[0005] The film joining operation is dangerous to a certain extent. As mentioned above, it is quite large in size and about 10 meters in height. Coincidentally, the film joining location is near the middle of the top of the magnetron sputtering equipment. Using a ladder can only solve the height problem, and it is still impossible to reach the film joining location. At this time, auxiliary tools such as slings are needed. Under the premise of ensuring the safety of the operators, the operators can lean over to the film joining area. Even if corresponding safety measures have been provided, this kind of high-altitude operation is ultimately accompanied by considerable dangers and is extremely inconvenient to operate. Utility Model Content

[0006] In order to solve the above problems, the utility model provides a loading and unloading platform and a magnetron sputtering device, which can further reduce the operation risk, improve the safety of the operators, and are more convenient to operate.

[0007] To achieve the above-mentioned purpose, the technical solution adopted by the utility model is: a loading and unloading platform, which is adjacent to the coating device, and the loading and unloading platform includes a ladder, the ladder has a height corresponding to the coating device, and a plurality of fences are arranged on the ladder, some of the fences are flip-over flaps, and a supporting mechanism is arranged on the bottom surface of the ladder, and its telescopic movable end is connected to the flap. After the flap is fully unfolded, the close overlap between the flap and the film connection area is maintained by the supporting mechanism, and the walking, film loading and roll changing operations of the staff are safe and convenient.

[0008] Furthermore, a stop rod is provided on the flap.

[0009] Furthermore, the support mechanism includes a fixed truss, which includes a telescopic cylinder and a connecting member provided on the back of the flap. The telescopic cylinder is fixed on the truss in an inclined manner, and the piston rod of the telescopic cylinder is rotatably connected to the connecting member.

[0010] Furthermore, a plurality of supporting column feet are provided below the platform, so that the platform has a height corresponding to that of the coating device.

[0011] A magnetron sputtering device comprises the above-mentioned loading and unloading platform.

[0012] Furthermore, it includes a winding device, which is arranged in a vacuum chamber. The winding device includes the above-mentioned coating roller and a water-cooling plate. The water-cooling plate has an arc that matches the outer peripheral surface of the coating roller. The water-cooling plate is fixed in the vacuum chamber, adjacent to the peripheral edges of the two ends of the coating roller, and a flow channel is provided in the water-cooling plate.

[0013] Furthermore, a plurality of long notches are provided on the surface of the water cooling plate.

[0014] Furthermore, it also includes a cooling baffle, which is closely adjacent to the two ends of the coating roller, so that a gap for heat conduction is formed between the two sides of the substrate film spread on the outer circumference of the coating roller and the cooling baffle, and a water belt is provided on the cooling baffle, and the water belt has flowing coolant, which takes away the heat radiation on the cooling baffle through the water belt.

[0015] Furthermore, the cooling baffle includes a panel, a side plate, and a water belt. The side plate has an arc-shaped edge, and the edge of the side plate coincides with the peripheral edge of the end face of the coating roller. After the edge of the side plate is connected to the side of the panel, the panel obtains a corresponding arc shape, so that the surface of the panel is flush with the outer peripheral surface of the coating roller. The water belt is arranged on the panel, and there is flowing cooling liquid in the water belt.

[0016] Furthermore, after the side panels are connected to the panel, a semi-enclosed space is formed, the panel is one side of the space as the inner side, and the water hose is assembled into the panel.

[0017] Beneficial effects of the utility model:

[0018] The loading and unloading platform of the present invention provides a film joining method with a higher safety factor. The loading and unloading platform has a reversible flap. Under the action of the supporting mechanism, the flap can be stably maintained in the expanded state, so that the operator can connect the film through the flap. It is not difficult to see that compared with the prior art, the present invention further strengthens the safety of the operators. During the operation, high-risk actions such as leaning out will no longer occur, and the operation is labor-saving and convenient. In addition, based on the use of the flap and the ladder, other loading and unloading operations will be more relaxed and simple. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 It is a three-dimensional diagram of the winding device.

[0020] Figure 2 It is a diagram of the relationship between the water cooling plate and the coating roller.

[0021] Figure 3 is Figure 2 an enlarged view of part A.

[0022] Figure 4 is a schematic view of the substrate film spread on the coating roller.

[0023] Figure 5 is a relationship diagram between the coating roller and the cooling baffle.

[0024] Figure 6 is a three-dimensional view of the cooling baffle.

[0025] Figure 7 is Figure 6 an enlarged view of part B.

[0026] Figure 8 is Figure 6 a three-dimensional view of another view surface.

[0027] Figure 9 is a cross-sectional view of the coating roller.

[0028] Figure 10 is Figure 9 an enlarged view of part C.

[0029] Figure 11 is a three-dimensional view of the outer rotating ring assembled on the inner cylinder.

[0030] Figure 12 is a three-dimensional view of the water-cooled plate.

[0031] Figure 13 is Figure 12 a cross-sectional view.

[0032] Figure 14 is Figure 13 an enlarged view of part D.

[0033] Figure 15 is a state diagram of the magnetron sputtering equipment for film receiving.

[0034] Figure 16 is Figure 15 a three-dimensional view of another view surface.

[0035] Figure 17 is a three-dimensional view of the loading and unloading platform.

[0036] Figure 18 is another schematic view of the loading and unloading platform.

[0037] Figure 19 is Figure 18 an enlarged view of part E. Specific implementation mode

[0038] Figure 15 It is a usage state diagram of a magnetron sputtering device when receiving a film, Figure 15 showing that the winding device A-A is separated from the inside of the vacuum chamber 5. From Figure 15 it can be seen that in the magnetron sputtering device, there is a loading and unloading platform 6 adjacent to the winding device A-A. Through the loading and unloading platform 6, the operator can move to the film receiving area of the winding device A-A.

[0039] The loading and unloading platform 6 is composed of a stepped platform 61, a flap 62, and a support mechanism.

[0040] Below the stepped platform 61, there are column feet 63. Under the action of the column feet 63, the stepped platform 61 has a height higher than or equal to that of the winding device A-A. A plurality of fences 64 are provided on the stepped platform 61 to provide higher safety protection for the operator. Among them, one fence 64 in this embodiment is the flap 62. The flap 62 is rotatably connected to the stepped platform 61. The support mechanism is arranged on the bottom surface of the stepped platform 61. The telescopic movable end in the support mechanism is connected to the flap 62. After the flap 62 is unfolded, the support mechanism provides a supporting force. At this time, the operator can easily approach the film receiving area through the flap 62. Under this design, the safety is higher. Stepping on the flap 62 and approaching the film receiving area, compared with the behavior of stretching forward in the prior art, the present invention significantly reduces the operation risk, and the operation is labor-saving and convenient.

[0041] Specifically, this support mechanism is a telescopic cylinder 65, a connecting member 66, and a truss 67. The truss 67 is fixed to the bottom surface of the stepped platform 61. The truss 67 provides an installation position for the telescopic cylinder 65. The telescopic cylinder 65 is assembled to the truss 67. The connecting member 66 is arranged outside the flap 62 (after the flap 62 is unfolded, its inner surface provides a supporting surface for the operator). This outer surface faces downward after the flap 62 is unfolded. The connecting member 66 is rotatably connected to the piston rod of the telescopic cylinder 65. Among them, the telescopic cylinder 65 always maintains an inclined state, which is to provide a good supporting effect. It can be seen from the figure that the unfolded flap 62 is horizontal, and the telescopic cylinder 65 is inclined relative to the flap 62. Under this design, the flap 62 has better stability; under the propulsion of the telescopic cylinder 65, the extension of the piston rod causes the flap 62 to perform a rotational movement, and the rotation direction is to rotate towards the surface of the stepped platform 61. This rotation withdraws the flap 62 from the surrounding space of the winding device A-A to prevent interference when the winding device A-A closes into the vacuum chamber 5.

[0042] A retaining bar 68 is provided on the flap 62. This retaining bar 68 provides safety for walking on the flap 62 and provides a certain supporting effect;

[0043] It should be noted that the flipping range of the flap 62 only needs to not affect the closing of the winding device A-A into the vacuum chamber 5.

[0044] As Figure 1-2 , as shown in Figure 4, the winding device A-A includes three parts: a coating roller 1, a cooling baffle 2, and a water-cooled plate 3. The substrate film 4 is spread on the coating roller 1. Specifically, through the guiding roller, the substrate film 4 covers the lower circumferential surface of the coating roller 1;

[0045] The cooling baffle 2 is located outside both ends of the coating roller 1. The cooling baffle 2 and the coating roller 1 are in a closely adjacent relationship. Its purpose is to weaken the temperature of both sides 41 of the substrate film 4. Therefore, the cooling baffle 2 has a cooling effect to prevent the temperature from being too high and causing the edges of the substrate film 4 at both sides 41 to burn;

[0046] As Figure 5 shown, in addition, the cooling baffle 2 can also act as a shielding effect. In the vacuum chamber 5, the space between both ends of the coating roller 1 and the inner wall of the vacuum chamber 5 is the installation position of the cooling baffle 2 (as Figure 1 shown). The cooling baffle 2 has a considerable area in the above space, blocking the entry of copper atoms into the above space, which also makes it impossible for copper atoms to transfer from the above space to both ends of the coating roller 1, thus avoiding the situation of slag falling at both ends of the coating roller 1 due to deposition; at the same time, it can also block the transfer of copper atoms from both ends of the coating roller 1 to both sides 41 of the substrate film 4. No coating can be produced on both sides 41 of part of the substrate film 4, otherwise wire dropping will occur.

[0047] It should be noted that there is a gap for heat conduction between the cooling baffle 2 and both sides 41 of the substrate film 4, and this gap is less than 3 mm.

[0048] As Figures 6-8 shown, the cooling baffle 2 includes a panel 21, side plates 22, and a water belt 23, as Figure 8As shown in the figure, the upper edge of the side plate 22 is arc-shaped, and the upper edge of the side plate 22 coincides with the peripheral edge of the end face of the coating roller 1. After the upper edge of the side plate 22 is connected to the side face of the panel 21, the panel 21 obtains a corresponding arc shape, so that the surface of the panel 21 is flush with the outer peripheral surface of the coating roller 1. In other words, there is a distance of less than 3 mm between the two sides 41 of the base film 4 laid on the coating roller 1 and the panel 21. The advantage of this design is that the distance between the panel 21 and the two sides 41 of the base film 4 can be controlled below 3 mm. In this solution, the side plate 22 with the same radius as the coating roller 1 is used. After connecting the panel 21 to the upper edge of the side plate 22, a surface flush with the outer peripheral surface of the coating roller 1 can be obtained on the panel 21. In the prior art, only a heat dissipation plate similar to the panel 21 is used and bent by external mechanical equipment. However, due to the lack of complex technical parameters, the arc of the heat dissipation plate cannot be flush with the outer peripheral surface of the coating roller 1. Then, for the non-flush area, their straight-line distance is far more than 3 mm, generally in the range of 10 mm.

[0049] After the side plate 22 is connected to the panel 21, a semi-enclosed space is formed. The panel 21 serves as the inner surface of this space. The water belt 23 is assembled into the panel 21, and there is flowing coolant (in this embodiment, the coolant is refrigerant) in the water belt 23. For the base film 4 laid on the coating roller 1, the heat of its two sides 41 is transferred to the panel 21 in a non-contact form, and with the help of the coolant on the inner surface of the panel 21, the heat on the panel 21 is taken away.

[0050] The cooling baffle 2 is fixed in the vacuum chamber 5 through the side plate 22. It is not difficult to see that when the cooling baffle 2 is disassembled, the connection between the panel 21 and the side plate 22 can always maintain the arc shape of the panel 21. After the above-mentioned heat dissipation plate is bent by mechanical equipment, it is assembled into the vacuum chamber 5 through bolts. However, when using bolts for assembly, there will be a situation of secondary bending of the heat dissipation plate, and this secondary bending situation will not change the bending coefficient of the heat dissipation plate in the free state. Therefore, there will be a rebound action during disassembly. In the present invention, the bending of the panel 21 is maintained by the side plate 22. Only the bolts fixing the side plate 22 in the vacuum chamber 5 need to be disassembled. Obviously, this disassembly action will not have a rebound action, thus solving the problem of the danger during disassembly.

[0051] The water belt 23 is assembled onto the panel 21 after the panel 21 is connected to the side plate 22. Therefore, there will be no problem of coolant leakage at the connection due to stress.

[0052] In some embodiments, the stability of the side plate 22 on the panel 21 is also maintained by providing connection columns 24. The connection columns 24 are located in the above-mentioned space, and both ends thereof are connected to the above-mentioned side plate 22.

[0053] Furthermore, the side plate 22 and the panel 21 are fixed by welding, so that the connection stability between the side plate 22 and the panel 21 can be further improved.

[0054] The lower edge of the side plate 22 is formed with a plurality of inner angles 22a or is arc-shaped. Preferably, the way of forming the inner angle a is more convenient for processing.

[0055] As shown in the figure, inside the coating roller 1, there is a multi-head spiral water channel 100. This setting method is mainly to form more heat dissipation areas on the outer peripheral surface of the coating roller 1 and allow for rapid circulation, which is beneficial for quickly cooling the base film 4;

[0056] As Figures 9-11 shown, specifically, the coating roller 1 includes an inner cylinder 101 and an outer cylinder 102. On the outer peripheral surface of the inner cylinder 101, there are formed multiple spiral outer rotation rings 103. After the outer cylinder 102 is sleeved on the inner cylinder 101, the outer rotation rings 103 and the inner surface of the outer cylinder 102 form the spiral water channel 100;

[0057] At the same time, for each rotation of this spiral water channel 100, the coolant in the spiral water channel 100 is advanced by a pitch. With the continuous rotation of the coating roller 1, the coolant can be transported from the water inlet to the water outlet. Therefore, the cyclic iteration of the coolant in the spiral water channel 100 also ensures that the surface temperature of the coating roller 1 is always in a cooled state.

[0058] Each head of the spiral water channel 100 supplies the flow of one path of coolant, and the coolants between the multi-head spiral water channels 100 are not connected.

[0059] The length of the coating roller 1 is longer than the width of the base film 4. For example, if the width of the base film 4 is 1350 mm, then the length of the coating roller 1 should be at least more than 1500 mm. That is to say, the lower part of the outer peripheral surface of the coating roller 1 (when coating, the base film 4 is located on the lower half of the coating roller 1) has an unobstructed area. The water-cooling plate 3 is fixed in the vacuum chamber 5 and blocks this area. During coating, it can prevent copper atoms from coating this area. Similarly, it can prevent a coating layer from appearing on the outer peripheral surface of the coating roller 1, avoid the coating layer from chipping due to deposition on the outer peripheral surface of the coating roller 1, and prevent the slag from transferring to the base film 4 so as not to damage the base film 4;

[0060] As Figures 12-14 shown, the water-cooling plate 3 is provided with a flow channel 31 for the flow of condensate (refrigerant in this embodiment). The purpose is to prevent the water-cooling plate 3 from forming a second heat source. The water-cooling plate 3 will deform when heated. The distance between the water-cooling plate 3 and the base film 4 is 3 mm. This uncontrolled deformation amplitude will break through this distance and scratch or interfere with the transportation of the base film 4.

[0061] The surface of the water-cooling plate 3 is provided with a plurality of long notches 32 distributed in an array. Bolts pass through the long notches 32 and are connected to the inner wall of the vacuum chamber 5. The long notches 32 have an appropriate length for adjusting the position of the water-cooling plate 3 and adjusting the shielding area of the water-cooling plate 3 for the coating roller 1.

[0062] The water-cooling plate 3 has an arc shape adapted to the outer circumference of the coating roller 1.

[0063] Similarly, the water belt 23 in the cooling baffle 2 can also prevent the panel 21 from deforming.

[0064] In summary, there is no contact between the cooling baffle 2, the water-cooling plate 3 and the coating roller 1. The cooling baffle 2 and the water-cooling plate 3 are both adjacent to both sides 41 of the base film 4 at a short distance.

[0065] This short-distance adjacency is a gap with a distance less than 3 mm between them.

[0066] The above embodiments are only descriptions of the preferred embodiments of the present invention, and do not limit the scope of the present invention. Without departing from the design spirit of the present invention, various deformations and improvements made by those of ordinary skill in the art to the technical solutions of the present invention shall fall within the protection scope determined by the claims of the present invention.

Claims

1. A loading and unloading platform, characterized in that, It is adjacent to the coating device. The loading and unloading platform includes a stepped platform. The stepped platform has a height corresponding to the coating device, and there are a number of fences on the stepped platform. Some of the fences are flip plates that can be turned over. A support mechanism is provided on the bottom surface of the stepped platform, and the movable end for its expansion and contraction is connected to the flip plate. After the flip plate is fully unfolded, the support mechanism maintains a close overlap between the flip plate and the film receiving area.

2. The loading and unloading platform according to claim 1, characterized in that A retaining bar is provided on the flip plate.

3. The loading and unloading platform according to claim 1, wherein, The support mechanism includes a truss for fixed use. The support mechanism includes a telescopic cylinder and a connecting member provided on the back of the flip plate. The telescopic cylinder is fixed to the truss in an inclined manner, and the piston rod of the telescopic cylinder is rotatably connected to the connecting member.

4. A loading and unloading platform according to claim 1, characterized in that, A plurality of supporting column feet are provided below the stepped platform, so that the stepped platform obtains a height corresponding to the coating device.

5. A magnetron sputtering device, characterized in that, It includes a loading and unloading platform as described in any one of claims 1-4.

6. A magnetron sputtering device according to claim 5, characterized in that, It includes a winding device, which is arranged in the vacuum chamber. The winding device includes a coating roller and a water-cooled plate. The water-cooled plate has a curvature adapted to the outer peripheral surface of the coating roller. The water-cooled plate is fixed in the vacuum chamber, adjacent to the peripheries at both ends of the coating roller, and a flow channel is provided in the water-cooled plate.

7. A magnetron sputtering device according to claim 6, characterized in that, A plurality of long notches are provided on the surface of the water-cooled plate.

8. A magnetron sputtering device according to claim 5, characterized in that, It also includes a cooling baffle, which is closely adjacent to the outside of both ends of the coating roller. A gap for heat conduction is formed between both sides of the base film spread on the outer peripheral surface of the coating roller and the cooling baffle. A water belt is provided on the cooling baffle, and a flowing coolant is provided in the water belt, and the heat radiation on the cooling baffle is carried away through the water belt.

9. A magnetron sputtering device according to claim 8, characterized in that, The cooling baffle includes a panel, a side plate, and a water belt. One edge of the side plate is arc-shaped, and the edge of the side plate coincides with the periphery of the end face of the coating roller. After the edge of the side plate is connected to the side face of the panel, the panel obtains a corresponding arc shape, so that the surface of the panel is flush with the outer peripheral surface of the coating roller. The water belt is arranged on the panel, and a flowing coolant is provided in the water belt.

10. A magnetron sputtering device according to claim 9, characterized in that, After the side plate is connected to the panel, a semi-enclosed space is formed. The panel is used as the inner surface of this space, and the water belt is assembled into the panel.

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