Target diffusion welding structure

Abstract

The utility model discloses a target diffusion welding structure, and belongs to the technical field of target welding. The utility model provides a target material welding structure which comprises a cover plate, a back plate and an isolating layer. The back plate comprises a groove with an opening in the upper end, and the groove is used for placing a target blank; the diameter of the isolation layer is between the diameter of the groove and the diameter of the back plate; the isolating layer is arranged above the groove and covers the target blank and the back plate; and the cover plate covers the isolation layer and presses the isolation layer. According to the target material diffusion welding structure, related procedures such as sheath welding, sheath degassing and sheath gas closing in the target material diffusion welding process can be effectively reduced, the equipment requirement is lowered, the technology is simplified, and actual production and application are facilitated.

Description

Technical Field

[0001] The utility model belongs to the technical field of target welding, and particularly relates to a diffusion welding structure for a target. Background Art

[0002] In the production of large-scale integrated circuits, a target assembly is composed of a target that meets sputtering performance and a backplane with a certain strength that is combined with the target. The main functions of the backplane are for installation and fixation, conduction of electricity and heat, and providing support, etc. The backplane and the target are connected by welding. Brazing is mostly used, and they are connected through a solder. However, the melting point of the solder is relatively low and the welding strength is also poor. With the development of semiconductor technology, the target is becoming more and more precise, with larger sizes and longer service lives, resulting in the working temperature of the target assembly reaching 300 - 500 °C. In addition, one side of the target assembly is cooled strongly with cooling water, while the other side is in a high-vacuum environment, thus creating a huge pressure difference on the upper and lower sides of the target assembly; moreover, the target assembly is in a high-voltage electric field and magnetic field and is bombarded by various particles. Therefore, in such a harsh environment, if the welding strength is poor, it will cause the target to deform, crack, or even fall off the backplane under heating conditions, not only failing to achieve the effect of uniform sputtering, but also possibly causing damage to the sputtering machine. Therefore, diffusion welding is a more suitable welding method as it does not require solder and has high welding strength.

[0003] Diffusion welding is to closely fit the welded parts, maintain them at a certain temperature and pressure for a period of time, so that atoms between the contact surfaces diffuse with each other, forming a new diffusion layer at the cross-section, thereby achieving a reliable connection. It belongs to a high-temperature, high-pressure, and high-strength welding method. Hot Isostatic Press (HIP) is a method of pressing under equal static pressure at high temperature. In the prior art, diffusion welding and HIP are combined to develop the HIP diffusion welding technology, which can effectively bond two metal materials face to face, thus enabling large-area welding. Moreover, since HIP is a method of welding in a vacuum, it effectively prevents the metal from being oxidized and improves the welding strength. For example, the method provided in the prior art CN202010047061.9 is to put the combined copper target blank and copper backplane into a sheath together, seal and degas the sheath, and then perform HIP welding. The method provided in the prior art CN202110327455.4 is to put the combined cobalt target blank and copper backplane into a sheath together, seal and degas the sheath, and then perform HIP welding. In addition, for various semiconductor targets such as titanium targets, tantalum targets, and aluminum targets, when using diffusion welding, the target blank and the backplane are combined and then put into a sheath together, the sheath is sealed and degassed, and then HIP welding is performed.

[0004] However, the welding methods provided by the existing technologies all require jackets, and steps such as degassing and vacuum pumping are needed during the operation. Therefore, not only are more devices required, but the operation is also troublesome, which is not conducive to improving production efficiency. Summary of the Invention

[0005] The object of the present invention is to overcome the deficiencies of the above-mentioned existing technologies and provide a diffusion welding structure for a target that can achieve diffusion welding without using a jacket, that is, without the processes of installing and disassembling the jacket.

[0006] To achieve the above object, the present invention provides a diffusion welding structure for a target, which includes a cover plate, a back plate, and an isolation layer;

[0007] The back plate includes a groove with an open upper end, and the groove is used for placing the target blank;

[0008] The diameter of the isolation layer is between the diameters of the groove and the back plate;

[0009] The isolation layer is placed above the groove and covers the target blank and the back plate;

[0010] The cover plate covers above the isolation layer and presses the isolation layer.

[0011] The diffusion welding structure for a target provided by the present invention forms a combination by covering the back plate of the target itself with a cover plate to replace the jacket. A groove is provided in the back plate to place the target blank. At the same time, before pressing the cover plate on the back plate and the target blank, an isolation layer is first placed above the groove; it can be used without a jacket and without the degassing and vacuum pumping links during the subsequent preparation process of the target; directly use an electron beam to seal the edge between the back plate and the cover plate first, and then perform hot isostatic pressing diffusion welding; that is, the diffusion welding structure for a target provided by the present invention can effectively reduce the procedures of target welding, reduce equipment requirements, simplify the process, and is beneficial to practical production applications.

[0012] As a preferred embodiment of the diffusion welding structure for a target of the present invention, the side wall thickness of the groove can be adjusted according to actual use conditions, for example, it can be any point value or any two-point range value in 20 - 50 mm, such as 20 mm, 23 mm, 25 mm, 28 mm, 30 mm, 33 mm, 35 mm, 38 mm, 40 mm, 43 mm, 45 mm, 48 mm, 50 mm, etc.

[0013] As a preferred embodiment of the diffusion welding structure for a target of the present invention, the depth of the bottom of the groove from the bottom of the back plate can be adjusted according to actual conditions, for example, it can be any point value or any two-point range value in 10 - 20 mm, such as 10 mm, 11 mm, 12 mm, 13 mm, 14 mm, 15 mm, 16 mm, 17 mm, 18 mm, 19 mm, 20 mm, etc.

[0014] As a preferred embodiment of the diffusion welding structure of the target in the present utility model, the thickness of the isolation layer is 0.1 - 0.5 mm.

[0015] Exemplarily, the thickness of the isolation layer can be any point value or any two - point range value between 0.1 - 0.5 mm, such as 0.1 mm, 0.15 mm, 0.2 mm, 0.25 mm, 0.3 mm, 0.35 mm, 0.4 mm, 0.45 mm, 0.5 mm, etc.

[0016] As a preferred embodiment of the diffusion welding structure of the target in the present utility model, the thickness of the cover plate is 5 - 10 mm.

[0017] Exemplarily, the thickness of the cover plate can be any point value or any two - point range value between 5 - 10 mm, such as 5 mm, 6 mm, 7 mm, 8 mm, 9 mm, 10 mm, etc.

[0018] As a preferred embodiment of the diffusion welding structure of the target in the present utility model, there is a gap between the side wall of the groove and the edge of the target blank, and the width of the gap is 0.2 - 0.6 mm.

[0019] Exemplarily, the width of the gap can be any point value or any two - point range value between 0.2 - 0.6 mm, such as 0.2 mm, 0.23 mm, 0.25 mm, 0.28 mm, 0.30 mm, 0.33 mm, 0.35 mm, 0.38 mm, 0.40 mm, 0.43 mm, 0.45 mm, 0.48 mm, 0.5 mm, 0.53 mm, 0.55 mm, 0.58 mm, 0.6 mm, etc.

[0020] As a preferred embodiment of the diffusion welding structure of the target in the present utility model, the thickness of the target blank is equal to the depth of the groove.

[0021] As a preferred embodiment of the diffusion welding structure of the target in the present utility model, the material of the isolation layer is stainless steel or graphite paper.

[0022] As a preferred embodiment of the diffusion welding structure of the target in the present utility model, the back plate includes any one of an aluminum back plate and a copper back plate.

[0023] Exemplarily, the aluminum alloy used in the aluminum back plate can be any one of A6061, A2024, and A5083.

[0024] Exemplarily, the copper alloy used in the copper back plate can be any one of TU1, C18200, and C18000.

[0025] As a preferred embodiment of the diffusion welding structure of the target material of the present utility model, the cover plate includes any one of an aluminum cover plate and a copper cover plate, and its type is consistent with that of the back plate.

[0026] Compared with the prior art, the beneficial effects of the present utility model are as follows:

[0027] The diffusion welding structure of the target material provided by the present utility model forms a combination by covering the back plate of the target material itself with a cover plate, replacing the jacket. A groove is provided in the back plate. At the same time, before pressing the cover plate against the back plate and the target blank, an isolation layer is placed above the groove first; it is possible not to use a jacket and there is no need for a degassing and vacuum pumping process during the subsequent preparation process of the target material; that is, the diffusion welding structure of the target material provided by the present utility model can effectively reduce the procedures of target material welding, reduce equipment requirements, simplify the process, and is beneficial to actual production applications. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 It is a schematic diagram of the diffusion welding structure of the target material of the present utility model:

[0029] 1 - Back plate, 2 - Target blank, 3 - Isolation layer, 4 - Cover plate;

[0030] Figure 2 It is a schematic diagram of the back plate structure of the present utility model:

[0031] 5 - Groove. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0032] To better illustrate the purpose, technical solution and advantages of the present utility model, the present utility model will be further described below in conjunction with specific embodiments.

[0033] Embodiment 1

[0034] The embodiment of the present utility model provides a diffusion welding structure of a target material, and its structural schematic diagram is as Figure 1 shown:

[0035] It includes a back plate 1, and the structural schematic diagram of the back plate 1 is as Figure 2 shown. The back plate 1 includes a groove 5 with an open upper end, and the groove 5 is used to place the target blank 2;

[0036] The diameter of the isolation layer 3 is between the diameter of the groove 5 and the diameter of the back plate 1;

[0037] The isolation layer 3 is placed above the groove 5, covering the target blank 2 and the back plate 1;

[0038] The cover plate 4 covers above the isolation layer 3, pressing the isolation layer 3;

[0039] Among them, the diameter of the backplane 1 is 430 mm, the thickness is 23 mm, the diameter of the groove 5 is 351.84 mm, the thickness of the side wall of the groove 5 is 39.08 mm, and the depth from the bottom of the groove 5 to the bottom of the backplane 1 is 13 mm;

[0040] The diameter of the isolation layer 3 is 424 mm, and the thickness is 0.2 mm;

[0041] The diameter of the target blank 2 is 351.64 mm, and the thickness is 10 mm;

[0042] The diameter of the cover plate 4 is 430 mm, and the thickness is 8 mm;

[0043] The material of the isolation layer is stainless steel, the backplane is an aluminum backplane, and the cover plate is an aluminum cover plate.

[0044] Embodiment 2

[0045] The embodiment of the present utility model provides a diffusion welding structure for a target, and its structural schematic diagram is as Figure 1 shown:

[0046] It includes a backplane 1, and the structural schematic diagram of the backplane 1 is as Figure 2 shown. The backplane 1 includes a groove 5 with an open upper end, and the groove 5 is used to place the target blank 2;

[0047] The diameter of the isolation layer 3 is between the diameter of the groove 5 and the diameter of the backplane 1;

[0048] The isolation layer 3 is placed above the groove 5 to cover the target blank 2 and the backplane 1;

[0049] The cover plate 4 covers above the isolation layer 3 to press the isolation layer 3;

[0050] Among them, the diameter of the backplane 1 is 530 mm, the thickness is 18.01 mm, the diameter of the groove 5 is 447.60 mm, the thickness of the side wall of the groove 5 is 41.2 mm, and the depth from the bottom of the groove 5 to the bottom of the backplane 1 is 14.01 mm;

[0051] The diameter of the isolation layer 3 is 520 mm, and the thickness is 0.3 mm;

[0052] The diameter of the target blank 2 is 447 mm, and the thickness is 4 mm;

[0053] The diameter of the cover plate 4 is 530 mm, and the thickness is 6 mm;

[0054] The material of the isolation layer is graphite paper, the backplane is a copper backplane, and the cover plate is a copper cover plate.

[0055] Finally, it should be noted that the above embodiments are used to illustrate the technical solutions of the present invention rather than limit the protection scope of the present invention. Although the present invention has been described in detail with reference to the preferred embodiments, those of ordinary skill in the art should understand that the technical solutions of the present invention can be modified or equivalently replaced without departing from the essence and scope of the technical solutions of the present invention.

Claims

1. A diffusion welding structure of a target, characterized in that, It includes a cover plate, a back plate and an isolation layer; The back plate includes a groove with an open upper end, and the groove is used for placing a target blank; The diameter of the isolation layer is between the diameters of the groove and the back plate; The isolation layer is placed above the groove and covers the target blank and the back plate; The cover plate covers above the isolation layer and presses the isolation layer.

2. The diffusion bonding structure of the target according to claim 1, wherein The thickness of the isolation layer is 0.1 - 0.5 mm.

3. The target diffusion welding structure according to claim 1, characterized in that, The thickness of the cover plate is 5 - 10 mm.

4. The target diffusion welding structure according to claim 1, characterized in that, There is a gap between the side wall of the groove and the edge of the target blank, and the width of the gap is 0.2 - 0.6 mm.

5. The target diffusion welding structure according to claim 1, characterized in that, The thickness of the target blank is equal to the depth of the groove.

6. The diffusion welding structure of the target according to claim 1, characterized in that, The material of the isolation layer is stainless steel or graphite paper.

7. The diffusion welding structure of the target according to claim 1, wherein The back plate includes any one of an aluminum back plate and a copper back plate.

8. The target diffusion welding structure according to claim 1, characterized in that, The cover plate includes any one of an aluminum cover plate and a copper cover plate, and its type is consistent with that of the back plate.

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