Chemical vapor deposition coating device and glass production equipment

Abstract

The utility model discloses a chemical vapor deposition coating device and glass production equipment, and relates to the technical field of float coated glass manufacturing, the chemical vapor deposition coating device comprises a tin bath and a coating device, the tin bath is filled with tin liquid, and the coating device is arranged in the tin bath. The reaction gas generation assembly, the waste gas recovery assembly and the shielding gas generation assembly are arranged on the side, back to the tin bath, of the bottom plate, the bottom plate is provided with a reaction gas inlet part, exhaust parts are arranged on the two sides of the reaction gas inlet part respectively, and shielding gas inlet parts are arranged on the sides, back to the reaction gas inlet part, of the two exhaust parts respectively; the protective gas inlet part is used for generating a protective gas curtain, and the bottom plate and the protective gas curtain are jointly enclosed to form a coating area; according to the technical scheme provided by the utility model, redundant waste gas cannot enter the reduction space of the tin bath to be subjected to cross contamination with the reduction gas when encountering the protective gas curtain, and the reduction gas and pollution particles can be blocked by the protective gas curtain to be prevented from entering a film coating area, so that the film layer quality is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of float-coated glass manufacturing, and particularly relates to a chemical vapor deposition coating device and glass production equipment. Background Technique

[0002] Float glass is a kind of flat glass produced by the float process. In the float process, the molten glass liquid is continuously spread on the surface of the molten tin liquid. Due to the action of gravity and surface tension, the glass liquid flattens on the tin liquid surface and forms a flat glass ribbon, and then is gradually cooled and drawn through the roller table to the annealing furnace for annealing treatment. The glass produced by this process has the characteristics of a flat surface, uniform quality, good optical properties, etc., and is widely used in the fields of architecture, automobiles, furniture, and household appliances. Float glass can also be given special functions, such as heat insulation, ultraviolet resistance, low radiation, etc., through on-line coating technology to meet different application requirements.

[0003] The glass produced by float glass often needs to be coated. Generally, chemical vapor deposition (CVD) is used for coating. A coating device is a precision industrial device specially designed to deposit thin film materials on the surface of continuously moving glass through chemical reactions during the production of float glass. This device usually integrates a gas delivery system to precisely control the flow rate and ratio of reaction gases, a reaction chamber to provide the necessary temperature and environment to promote chemical reactions, and an advanced control system to monitor and adjust the entire coating process. The CVD coating device can modify the glass surface and endow it with special functions such as improving strength, changing optical properties, increasing heat insulation or conductivity. By precisely controlling the conditions of chemical vapor deposition, a uniform, dense and firmly bonded thin film with the glass substrate can be obtained, thereby significantly improving the performance and application range of glass products.

[0004] In the related technology, the coating device adopts a single-tank double-flow structure (that is, a single reaction gas inlet part and a double exhaust part). Since the inlet rate of the reaction gas and the exhaust rates of the exhaust gases on both sides cannot reach complete balance in actual production, the excess exhaust gas will diffuse into the tin bath space. Under the operation of the exhaust part, the reducing gas and pollution particles inside the tin bath will also enter the coating area, thus affecting the quality of the film layer. Summary of the Utility Model

[0005] The main purpose of the utility model is to propose a chemical vapor deposition coating device and glass production equipment, aiming to provide a coating device that can prevent cross-contamination between the exhaust gas after the reaction and the reducing gas in the tin bath and the influence of pollution particles in the tin bath on the film layer quality.

[0006] To achieve the above object, the chemical vapor deposition coating device proposed by the utility model includes:

[0007] A tin bath, in which tin liquid is contained; and

[0008] A coating device, which includes a bottom plate and a reaction gas generation component, an exhaust gas recovery component, and a protective gas generation component provided on a side of the bottom plate facing away from the tin bath. The bottom plate is provided with a reaction gas inlet part communicating with the reaction gas generation component. On both sides of the reaction gas inlet part, there are respectively provided exhaust parts communicating with the exhaust gas recovery component. On a side of the two exhaust parts facing away from the reaction gas inlet part, there are respectively provided protective gas inlet parts communicating with the protective gas generation component. The protective gas inlet part is used to generate a protective gas curtain, and the bottom plate and the protective gas curtain together enclose a coating area.

[0009] In one embodiment, a first vertical plate is provided on a side of the bottom plate facing the reaction gas generation component. The first vertical plate is provided with a first communication groove respectively communicating with the protective gas inlet part and the reaction gas generation component;

[0010] A first cover plate is provided at one end of the first communication groove close to the reaction gas generation component.

[0011] In one embodiment, a plurality of buffer guide vanes are provided on the inner wall of the first communication groove at intervals. The buffer guide vanes are used to slow down the gas flow rate.

[0012] In one embodiment, two second vertical plates are respectively provided on a side of the bottom plate facing the two exhaust gas recovery components. The two second vertical plates are respectively provided with second communication grooves communicating with the exhaust part and the exhaust gas recovery component;

[0013] A second cover plate is provided at one end of the second communication groove close to the exhaust gas recovery component.

[0014] In one embodiment, two third vertical plates are respectively provided on a side of the bottom plate facing the two protective gas generation components. The two third vertical plates are respectively provided with third communication grooves communicating with the reaction gas inlet part and the protective gas generation component;

[0015] A third cover plate is provided at one end of the third communication groove close to the protective gas generation component.

[0016] In one embodiment, the chemical vapor deposition coating device further includes a cross beam, and the cross beam connects the first cover plate, the second cover plate, and the third cover plate.

[0017] In one embodiment, the chemical vapor deposition coating device further includes a plurality of regulating valves, and the plurality of regulating valves are respectively provided at the reaction gas inlet part, the exhaust part, and the protective gas inlet part.

[0018] In one embodiment, the protective gas generated by the protective gas generation component is an inert gas.

[0019] In one embodiment, the protective gas generating assembly is provided with an output pipe, and the output pipe is communicated with the protective gas inlet portion.

[0020] The present utility model further provides a glass production device, including a chemical vapor deposition coating device, and the chemical vapor deposition coating device includes:

[0021] A tin bath, in which tin liquid is contained; and

[0022] A coater, which includes a bottom plate and a reaction gas generating assembly, an exhaust gas recovery assembly, and a protective gas generating assembly provided on a side of the bottom plate facing away from the tin bath. The bottom plate is provided with a reaction gas inlet portion communicating with the reaction gas generating assembly. On both sides of the reaction gas inlet portion, exhaust portions communicating with the exhaust gas recovery assembly are respectively provided. On a side of the two exhaust portions facing away from the reaction gas inlet portion, protective gas inlet portions communicating with the protective gas generating assembly are respectively provided. The protective gas inlet portion is used to generate a protective gas curtain, and the bottom plate and the protective gas curtain jointly enclose a coating area.

[0023] In the technical solution of the present utility model, a chemical vapor deposition coating device and a glass production device are provided. Among them, the chemical vapor deposition coating device includes a tin bath and a coater. The tin bath contains tin liquid for laying glass liquid. The coater includes a bottom plate and a reaction gas generating assembly, an exhaust gas recovery assembly, and a protective gas generating assembly provided on a side of the bottom plate facing away from the tin bath. During the coating operation, the reaction gas generating assembly generates reaction gas for vapor deposition. The reaction gas enters the coating area through the reaction gas inlet portion and contacts and reacts with the glass. Part of the reacted exhaust gas is discharged from the exhaust gas recovery assembly, and the excess exhaust gas overflows to both sides of the coating area. The protector generating assembly forms a protective gas curtain towards the tin bath through the protective gas inlet portion. The excess exhaust gas will not enter the reduction space of the tin bath to cross-contaminate with the reduction gas when encountering the protective gas curtain. The reduction gas and the polluted particulate matter will also be blocked by the protective gas curtain to prevent them from entering the coating area, improving the film layer quality. Description of the Drawings

[0024] In order to more clearly illustrate the technical solutions in the embodiments of the present utility model or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the following drawings are only some embodiments of the present utility model. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on the structures shown in these drawings.

[0025] Figure 1 It is a schematic structural diagram of an embodiment of the chemical vapor deposition coating device provided by the present utility model;

[0026] Figure 2 ForFigure 1 Partial enlarged view at A in the [specific context];

[0027] Figure 3 Schematic diagram of the positional relationship between the tin bath and the coating area.

[0028] Explanation of the reference numerals in the attached drawings:

[0029] 1000, Chemical vapor deposition coating device; 1, Tin bath; 11, Tin liquid; 1a, Coating area; 1b, Exhaust gas flow direction; 1c, Reducing gas flow direction; 2, Coater; 21, Bottom plate; 211, Reactive gas inlet part; 212, Exhaust part; 213, Inert gas inlet part; 214, Inert gas curtain; 3, Reactive gas generation component; 31, First vertical plate; 32, First cover plate; 4, Exhaust gas recovery component; 41, Second vertical plate; 42, Second cover plate; 5, Inert gas generation component; 51, Third vertical plate; 52, Third cover plate; 6, Buffer deflector; 7, Control valve; 8, Cross beam; 9, Output pipe.

[0030] The realization, functional features and advantages of the purpose of the present utility model will be further described with reference to the embodiments and the attached drawings. Detailed implementation manners

[0031] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described with reference to the drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all of the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present utility model without creative efforts shall fall within the protection scope of the present utility model.

[0032] It should be noted that if there are directional indications (such as up, down, left, right, front, back,...) involved in the embodiments of the present utility model, the directional indications are only used to explain the relative positional relationship and movement conditions between components in a specific posture. If the specific posture changes, the directional indications will also change accordingly.

[0033] In addition, if the embodiments of the present utility model involve descriptions such as "first", "second", etc., the descriptions of "first", "second", etc. are only for descriptive purposes and should not be construed as indicating or implying their relative importance or implicitly specifying the quantity of the indicated technical features. Thus, the features defined with "first", "second" may explicitly or implicitly include at least one such feature. In addition, if "and / or" or "and / or" appears throughout the text, its meaning includes three parallel scenarios. Taking "A and / or B" as an example, it includes scenario A, or scenario B, or the scenario where both A and B are satisfied simultaneously. In addition, the technical solutions between various embodiments can be combined with each other, but it must be based on the fact that those of ordinary skill in the art can implement it. When the combination of technical solutions results in contradictions or cannot be implemented, it should be considered that such a combination of technical solutions does not exist and is not within the scope of protection required by the present utility model.

[0034] The present utility model provides a chemical vapor deposition coating device and a glass production device, aiming to provide a coating device that can prevent cross-contamination between the exhaust gas after reaction and the reducing gas in the tin bath, as well as prevent the contaminated particulate matter in the tin bath from affecting the quality of the film layer. Figures 1 to 3 It is a schematic structural diagram of an embodiment provided by the chemical vapor deposition coating device of the present utility model.

[0035] Please refer to Figures 1 to 3 , the present utility model provides a chemical vapor deposition coating device and a glass production device, including a tin bath 1 and a coater 2. The tin bath 1 contains molten tin 11. The coater 2 includes a bottom plate 21, and a reaction gas generation component 3, an exhaust gas recovery component 4, and a protective gas generation component 5 provided on the side of the bottom plate 21 facing away from the tin bath 1. The bottom plate 21 is provided with a reaction gas inlet part 211 communicating with the reaction gas generation component 3. On both sides of the reaction gas inlet part 211, there are exhaust parts 212 communicating with the exhaust gas recovery component 4 respectively. On the sides of the two exhaust parts 212 facing away from the reaction gas inlet part 211, there are protective gas inlet parts 213 communicating with the protective gas generation component 5 respectively. The protective gas inlet part 213 is used to generate a protective gas curtain 214. The bottom plate 21 and the protective gas curtain 214 jointly enclose a coating area 1a.

[0036] In the technical solution of the present utility model, a chemical vapor deposition coating device and a glass production device are proposed. Among them, the chemical vapor deposition coating device includes a tin bath 1 and a coater 2. The tin bath 1 contains tin liquid 11 for laying glass liquid. The coater 2 includes a bottom plate 21 and a reaction gas generation component 3, an exhaust gas recovery component 4, and a protective gas generation component 5 provided on the side of the bottom plate 21 facing away from the tin bath 1. During the coating operation, the reaction gas production component generates reaction gas for vapor deposition. The reaction gas enters the coating area 1a through the reaction gas inlet 211 and reacts with the glass. Part of the reacted exhaust gas is discharged through the exhaust gas recovery component 4, and the excess exhaust gas overflows to both sides of the coating area 1a. The protector generation component forms a protective gas curtain 214 in the tin bath 1 through the protective gas inlet 213. The excess exhaust gas will not enter the reduction space of the tin bath 1 to cross-contaminate with the reduction gas when it encounters the protective gas curtain 214. The reduction gas and contaminated particulate matter will also be blocked by the protective gas curtain 214 to prevent them from entering the coating area 1a, improving the film layer quality.

[0037] It should be noted that nitrogen is used as the protective gas during the glass coating process. Nitrogen is an inert gas with an inactive chemical property. It can form a stable protective atmosphere in the coating area 1a, effectively preventing adverse reactions between the active reaction gas and oxygen, reduction gas, or other potential pollutants such as particulate matter and dust in the environment of the tin bath 1, thereby ensuring the purity and quality of the coating layer. Using nitrogen can also reduce the safety risks to operators and the environment and improve the safety of the production process.

[0038] To connect the protective gas inlet 213 and the reaction gas generation component 3, a first vertical plate 31 is provided on the side of the bottom plate 21 facing the reaction gas generation component 3. Specifically, please further refer to Figure 1 , in a chemical vapor deposition (CVD) system, the first vertical plate 31 can provide a structural separation and directional guidance. The vertical plate can serve as a flow guiding structure for gas, ensuring that the reaction gas can be effectively transported before entering the coating area 1a, thereby improving the gas utilization efficiency and the uniformity of the reaction. In addition, the design of the vertical plate helps to prevent cross-contamination between different gases and ensure the purity of the reaction environment, which is crucial for improving the coating quality and the consistency of the thin film. At the same time, the vertical plate can also serve as a structural support to enhance the stability and durability of the entire system, enabling the CVD system to maintain stable performance during long-term operation. In summary, this design optimizes the gas transportation and reaction process, improving the performance and efficiency of the entire coating device. To ensure the airtightness of the first vertical plate 31, a first cover plate 32 is provided at one end of the first communication groove close to the reaction gas generation component 3. The first cover plate 32 can enclose with the first vertical plate 31 to form an area isolated from the outside, which can ensure that various gases will not cross-contaminate before entering the coating area 1a.

[0039] To control the flow rate of the reaction gas entering the coating region 1a, a plurality of buffer guide vanes 6 are provided on the inner wall of the first communication groove. Specifically, please further refer to Figure 1 , the plurality of spaced buffer guide vanes 6 are alternately arranged, which can finely control the flow rate and flow direction of the reaction gas entering the coating region 1a. Such a design optimizes the uniformity of gas flow, reduces turbulence and eddy currents during gas flow, thereby ensuring the uniformity and film layer quality during the coating process. At the same time, the buffer guide vanes 6 help to improve the mixing efficiency of the reaction gas, ensure the full progress of the chemical reaction, and improve the coating efficiency. In addition, they also play a certain thermal buffering role, helping to maintain the temperature stability of the coating region 1a and avoiding film layer defects caused by temperature fluctuations. In short, this design improves the stability and coating quality of the entire CVD coating process by precisely controlling gas flow. Further, buffer guide vanes 6 are also provided in the connection grooves of the second vertical plate 41 and the third vertical plate 51 to slow down the input flow rate of the protective gas and the output flow rate of the waste gas.

[0040] It can be understood that the coating device further includes a second vertical plate 41 and a third vertical plate 51. There are two second vertical plates 41 in total. Each of the two second vertical plates 41 is provided with a second communication groove connecting the exhaust part 212 and the waste gas recovery component 4. A second cover plate 42 is provided at one end of the second communication groove close to the waste gas recovery component 4. When the waste gas generated after the reaction gas reacts with the glass diffuses to both sides and is discharged from the exhaust parts 212 on both sides. Protective gas inlet parts 213 are further provided on the outer sides of the two exhaust parts 212. Correspondingly, two third vertical plates 51 are respectively provided on one side of the bottom plate 21 facing the two protective gas generation components 5. Each of the two third vertical plates 51 is provided with a third communication groove connecting the reaction gas inlet part 211 and the protective gas generation component 5. A third cover plate 52 is provided at one end of the third communication groove close to the protective gas generation component 5 to ensure good airtightness of the protective gas inlet.

[0041] To ensure the overall structural reliability of the coating device, a cross beam 8 is provided on the upper part of the coating device. Specifically, please further refer to Figure 1 , the cross beam 8 serially installs the first cover plate 32, the second cover plate 42 and the third cover plate 52, improving the structural strength and reliability.

[0042] To control the flow rates of the reaction gas, the waste gas and the protective gas, the coating device further includes a plurality of regulating valves 7. Specifically, please further refer to Figure 1, a plurality of regulating valves 7 are respectively arranged at the reaction gas inlet part 211, the exhaust part 212 and the protective gas inlet part 213. The regulating valves 7 can precisely control the flow rate and flow volume of various gases. Such a design allows the operator to flexibly adjust the gas flow rate according to specific process requirements and coating conditions, ensuring the stability and uniformity of gas supply, thereby optimizing the chemical reaction process and coating quality. In addition, the regulating valves 7 that independently control each gas flow path also help to improve the response speed and adjustment accuracy of the system, enabling it to quickly adapt to process changes during the coating process and improving production efficiency. At the same time, this design also enhances the safety of the system because the gas supply can be timely cut off or reduced through the regulating valves 7 to deal with possible emergencies or system failures, ensuring the safety and controllability of the operation process. In short, this design of multiple regulating valves 7 provides a high degree of process flexibility and system safety, which is the key to realizing efficient and stable coating production. Further, the protective gas generation component 5 is provided with an output pipe 9, and the regulating valve 7 is arranged on the output pipe 9. The existence of the output pipe 9 can ensure the distance between the protective gas production component 5 and the coating area 1a, reducing the adverse effects of the high temperature of the coating on the protective gas production component 5 and optimizing the overall structure of the device.

[0043] The present utility model also provides a glass production device, which includes a chemical vapor deposition coating device. The specific structure of the chemical vapor deposition coating device refers to the above-mentioned embodiments. Since this glass production device adopts all the technical solutions of the above-mentioned embodiments, it at least has all the beneficial effects brought by the technical solutions of the above-mentioned embodiments, and will not be elaborated here one by one.

[0044] The above description is only an exemplary embodiment of the present utility model, and does not limit the patent scope of the present utility model. Any equivalent structural transformation made under the technical concept of the present utility model by using the content of the specification and drawings of the present utility model, or any direct / indirect application in other related technical fields is included in the patent protection scope of the present utility model.

Claims

1. A chemical vapor deposition coating device, characterized in that, Comprising: A tin bath, in which molten tin is contained; and A coating device, which includes a bottom plate and a reaction gas generating component, an exhaust gas recovery component, and a protective gas generating component provided on a side of the bottom plate facing away from the tin bath. The bottom plate is provided with a reaction gas inlet part communicating with the reaction gas generating component. On both sides of the reaction gas inlet part, exhaust parts communicating with the exhaust gas recovery component are respectively provided. On a side of the two exhaust parts facing away from the reaction gas inlet part, protective gas inlet parts communicating with the protective gas generating component are respectively provided. The protective gas inlet part is used to generate a protective gas curtain, and the bottom plate and the protective gas curtain jointly enclose a coating area.

2. The chemical vapor deposition coating device according to claim 1, characterized in that, A first vertical plate is provided on a side of the bottom plate facing the reaction gas generating component, and the first vertical plate is provided with a first communication groove respectively communicating with the protective gas inlet part and the reaction gas generating component; A first cover plate is provided at one end of the first communication groove close to the reaction gas generating component.

3. The chemical vapor deposition coating device according to claim 2, characterized in that, A plurality of buffer guide vanes are provided on the inner wall of the first communication groove at intervals, and the buffer guide vanes are used to slow down the gas flow rate.

4. The chemical vapor deposition coating device according to claim 2, wherein, Two second vertical plates are respectively provided on a side of the bottom plate facing the two exhaust gas recovery components, and the two second vertical plates are respectively provided with second communication grooves communicating with the exhaust part and the exhaust gas recovery component; A second cover plate is provided at one end of the second communication groove close to the exhaust gas recovery component.

5. The chemical vapor deposition coating device according to claim 4, wherein, Two third vertical plates are respectively provided on a side of the bottom plate facing the two protective gas generating components, and the two third vertical plates are respectively provided with third communication grooves communicating with the reaction gas inlet part and the protective gas generating component; A third cover plate is provided at one end of the third communication groove close to the protective gas generating component.

6. The chemical vapor deposition coating apparatus according to claim 5, wherein, The chemical vapor deposition coating device further includes a cross beam, and the cross beam connects the first cover plate, the second cover plate, and the third cover plate.

7. The chemical vapor deposition coating device according to any one of claims 1 to 6, characterized in that, The chemical vapor deposition coating device further includes a plurality of regulating valves, and the plurality of regulating valves are respectively provided at the reaction gas inlet part, the exhaust part, and the protective gas inlet part.

8. The chemical vapor deposition coating apparatus according to any one of claims 1 to 6, characterized in that, The protective gas generated by the protective gas generating component is an inert gas.

9. The chemical vapor deposition coating apparatus according to any one of claims 1 to 6, characterized in that, The protective gas generating component is provided with an output pipe, and the output pipe communicates with the protective gas inlet part.

10. A glass production device, characterized in that, Comprising the chemical vapor deposition coating device according to any one of claims 1 to 9.

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