Tool for detecting boundary dimension of wafer product

Abstract

The utility model discloses a tool for detecting the boundary dimension of a wafer product, which comprises a working panel, a sliding rail is longitudinally arranged in the center of the working panel, a sliding plate is slidably connected onto the sliding rail and moves up and down along the sliding rail, a turntable is rotatably connected onto the sliding plate, and a product to be detected is arranged on the turntable. Two rows of sliding grooves are formed in the working panel in the sliding direction of the sliding rail from bottom to top in parallel, the upper row of sliding grooves are lower limit adjusting grooves which are divided into two sections and symmetrically distributed on the two sides of the sliding rail respectively, the lower row of sliding grooves are upper limit adjusting grooves which are divided into two sections and symmetrically distributed on the two sides of the sliding rail respectively, and lower limit check blocks are connected to the lower limit adjusting grooves in a sliding mode. The upper limit adjusting groove is slidably connected with an upper limit stop block. According to the utility model, whether the boundary dimension of a wafer product meets the specification is detected by setting an upper limit, a lower limit, up-down movement and rotation, so that the detection process is greatly simplified, excessive complex operation is not needed, and the quality is ensured, the efficiency is improved and the labor force is saved under the condition of avoiding the collision risk.

Description

Technical Field

[0001] The utility model relates to the technical field of wafer product detection, in particular to a tool for detecting the outer dimension of a wafer product. Background Art

[0002] After the existing wafer products are processed and formed, it is necessary to detect whether the outer shape (outer diameter) dimensions of the wafer products meet the specifications. The existing detection method is to measure the outer shape (outer diameter) dimensions of the products through traditional calipers or mechanical means. As Figure 1 shown, it is necessary to measure the wafer product with a caliper. To ensure quality, it is necessary to rotate the product multiple times to measure the direction and then measure. It is easy to touch the caliper during rotation, and there is a risk of product breakage caused by collision. Each measurement requires adjusting the caliper, and the measured values need to be compared one by one with the set upper and lower limits of the outer shape (outer diameter) dimensions of the wafer product to confirm whether it meets the specifications. The measurement and comparison process is cumbersome, the measurement efficiency is low, and a large amount of manual labor is consumed. Summary of the Utility Model

[0003] To solve the above technical problems, the utility model designs a tool for detecting the outer dimension of a wafer product.

[0004] The utility model adopts the following technical solutions:

[0005] A tool for detecting the outer dimension of a wafer product, including a working panel. A slide rail is longitudinally arranged at the center of the working panel. A slide plate is slidably connected to the slide rail, and the slide plate moves up and down along the slide rail. A turntable is rotatably connected to the slide plate, and the turntable is used to place the product to be detected. On the working panel, two rows of sliding grooves are arranged in parallel from bottom to top in the sliding direction of the slide rail. The upper row of sliding grooves is a lower limit adjustment groove, which is divided into two sections and symmetrically distributed on both sides of the slide rail respectively. The lower row of sliding grooves is an upper limit adjustment groove, which is divided into two sections and symmetrically distributed on both sides of the slide rail respectively. A lower limit stopper is slidably connected to the lower limit adjustment groove, and an upper limit stopper is slidably connected to the upper limit adjustment groove.

[0006] Preferably, adjustment scales are correspondingly arranged at the upper limit adjustment groove and the lower limit adjustment groove.

[0007] Preferably, locking knobs are respectively arranged on the lower limit stopper and the upper limit stopper. After the locking knobs are tightened, the corresponding lower limit stopper and upper limit stopper are restricted from moving.

[0008] Preferably, a slide plate movement groove is arranged on the working panel corresponding to the movement position of the slide plate.

[0009] Preferably, a mucosal film is attached to the turntable to prevent the product from falling off during movement or rotation.

[0010] The beneficial effects of the present utility model are as follows: The present utility model designs a tool for detecting the outer dimensions of a wafer product, which facilitates detecting whether the outer dimensions of the wafer product meet the specifications by adjusting and setting the upper and lower limits, moving up and down, and rotating. This greatly simplifies the detection process, without the need for excessive complex operations. It can ensure quality, improve efficiency, and save labor force while avoiding the risk of bruising. Description of the Drawings

[0011] Figure 1 It is a schematic structural diagram during the measurement of the wafer product;

[0012] Figure 2 It is a schematic structural diagram of the present utility model;

[0013] In the figure: 1, working panel; 2, slide rail; 3, slide plate; 4, turntable; 5, slide plate movement groove; 6, lower limit adjustment groove; 7, lower limit stop block; 8, upper limit adjustment groove; 9, upper limit stop block; 10, locking knob; 11, adjustment scale. Detailed Embodiment

[0014] The technical solution of the present utility model will be further specifically described below through specific embodiments and in conjunction with the drawings:

[0015] Embodiment: As Figure 2 shown, a tool for detecting the outer dimensions of a wafer product includes a working panel 1. A slide rail 2 is longitudinally arranged at the center of the working panel. A slide plate 3 is slidably connected to the slide rail, and the slide plate moves up and down along the slide rail. A turntable 4 is rotatably connected to the slide plate, and the turntable is used to place the product to be detected. Two rows of chutes are respectively arranged in parallel on the working panel in the sliding direction of the slide rail from bottom to top. The upper row of chutes is the lower limit adjustment groove 6, which is divided into two sections and symmetrically distributed on both sides of the slide rail respectively. The lower row of chutes is the upper limit adjustment groove 8, which is divided into two sections and symmetrically distributed on both sides of the slide rail respectively. A lower limit stop block 7 is slidably connected to the lower limit adjustment groove, and an upper limit stop block 9 is slidably connected to the upper limit adjustment groove.

[0016] Adjustment scales 11 are correspondingly arranged at the upper limit adjustment groove and the lower limit adjustment groove. Locking knobs 10 are respectively arranged on the lower limit stop block and the upper limit stop block. After the locking knobs are tightened, the corresponding lower limit stop block and upper limit stop block are restricted from moving. A slide plate movement groove 5 is arranged on the working panel corresponding to the movement position of the slide plate. A mucosal film is attached to the turntable.

[0017] When the utility model is in use, the product to be measured is adsorbed on the center of the turntable. The upper and lower limits of the product shape are determined, and the upper and lower limit baffles are respectively adjusted to the specified values. Then the sliding plate is moved to drive the product to be measured to move upward. The product to be measured passes through the upper limit baffle and is blocked by the lower limit baffle, and it is a product that meets the specifications. The turntable can be rotated to quickly move the sliding plate up and down for multiple measurements at multiple rotation angles to ensure quality. The detection process is greatly simplified, without too many complex operations. It can ensure quality, improve efficiency and save labor force while avoiding the risk of bruising.

[0018] The above-described embodiments are only a preferred solution of the present utility model, and do not impose any form of limitation on the present utility model. There are other variants and modifications without exceeding the technical solutions recorded in the claims.

Claims

1. A tool for detecting the external dimensions of a wafer product, including a working panel, characterized in that, A slide rail is longitudinally arranged at the center of the working panel. A sliding plate is slidably connected to the slide rail, and the sliding plate moves up and down along the slide rail. A turntable is rotatably connected to the sliding plate, and the turntable is used to place the product to be detected. Two rows of chutes are arranged in parallel on the working panel in the sliding direction of the slide rail from bottom to top. The upper row of chutes is a lower limit adjustment chute, which is divided into two sections and symmetrically distributed on both sides of the slide rail respectively. The lower row of chutes is an upper limit adjustment chute, which is divided into two sections and symmetrically distributed on both sides of the slide rail respectively. A lower limit stopper is slidably connected to the lower limit adjustment chute, and an upper limit stopper is slidably connected to the upper limit adjustment chute.

2. A tool for detecting the external dimensions of a wafer product according to claim 1, characterized in that, Adjustment scales are correspondingly arranged at the upper limit adjustment chute and the lower limit adjustment chute.

3. A tool for detecting the external dimensions of a wafer product according to claim 1, characterized in that, Locking knobs are respectively arranged on the lower limit stopper and the upper limit stopper. After the locking knobs are tightened, the corresponding lower limit stopper and upper limit stopper are restricted from moving.

4. A tool for detecting the external dimensions of a wafer product according to claim 1, characterized in that, A sliding plate movement groove is arranged on the working panel corresponding to the movement position of the sliding plate.

5. A tool for detecting the external dimensions of a wafer product according to claim 1, characterized in that, A mucosal film is attached to the turntable.

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