Laser transfer printing device and photovoltaic cell
By designing a device with the groove bottom of the groove not smaller than the notch in the laser transfer device, the slurry is gasified by laser thermal energy and constrained by the notch, the gate line blurring problem caused by slurry diffusion sputtering is solved, and a higher gate line clarity and aspect ratio are achieved.
Patent Information
- Application Number
- CN202421926748.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-09
- Publication Date
- 2025-07-29
- Estimated Expiration
- 2034-08-09
AI Technical Summary
During the transfer process of the existing laser transfer device, the diffusion and sputtering of the slurry lead to blurred edges of the gate line and low mass, which limits the development of further reducing the gate line width.
A laser transfer device is designed. The groove bottom size of the groove extending in the first and second directions on the transfer substrate is not less than the groove size. The organic components in the slurry are vaporized by laser thermal energy. The slurry residue is subject to the constraints of the slurry when it is detached, reducing the scattering range and increasing the density of the slurry on the surface of the cell.
The clarity and aspect ratio of the edge of the gate line are improved, and the transfer quality of the gate line is improved.
Smart Images
Figure CN223161504U_ABST
Abstract
Description
Technical Field
[0001] This application relates to the technical field of photovoltaic cells, and more specifically, to a laser transfer device and a photovoltaic cell. Background Art
[0002] Laser transfer technology is a new type of non-contact printing technology. In the actual printing process, a paste is applied in the grooves of a light-transmitting film, and then the paste is transferred to the surface of the object to be transferred by using the thermal effect of a laser for graphic scanning, thereby forming a transfer structure. At present, through this technology, the grid line width can be reduced to 15 mm - 17 mm, and the cost reduction of the silver paste is very significant.
[0003] However, in the transfer process of the existing laser transfer device, there is paste diffusion and sputtering, resulting in blurred edges and low quality of the prepared grid lines, which limits the further reduction of the grid line width. Summary of the Utility Model
[0004] In view of this, this application provides a laser transfer device and a photovoltaic cell, aiming to improve the problem of blurred edges and low quality of the grid lines obtained by the transfer of the existing laser transfer device, and to improve the quality effect of the grid lines obtained by the transfer.
[0005] In a first aspect, this application provides a laser transfer device, including: a transfer substrate;
[0006] The transfer substrate extends along a first direction and a second direction that are perpendicular to each other, and both the first direction and the second direction are perpendicular to the thickness of the transfer substrate;
[0007] A plurality of grooves for filling paste are provided on a first side of the transfer substrate, the grooves extend along the second direction and are arranged along the first direction, and the depth direction of the grooves is parallel to the thickness direction of the transfer substrate;
[0008] In the first direction, the bottom size of the groove is not less than the notch size of the groove.
[0009] Preferably, the cross-sectional shape of the groove is rectangular or trapezoidal.
[0010] Preferably, the groove includes a first groove and a second groove, the first groove is used to prepare the main grid of the photovoltaic cell, and the second groove is used to prepare the sub-grid of the photovoltaic cell.
[0011] Preferably, the depth of the first groove is 10 μm - 30 μm, and the depth of the second groove is 15 μm - 30 μm.
[0012] Preferably, the cross-sectional shape of the first groove is rectangular, and in the first direction, the size of the first groove is 45 μm - 200 μm;
[0013] Or,
[0014] The cross-sectional shape of the first groove is trapezoidal, and along the first direction, the ratio of the bottom size to the opening size of the first groove is 1.1 to 5.
[0015] Preferably, the cross-sectional shape of the second groove is rectangular, and along the first direction, the size of the second groove is 8 μm - 30 μm;
[0016] Or,
[0017] The cross-sectional shape of the second groove is trapezoidal, and along the first direction, the ratio of the bottom size to the opening size of the second groove is 1.1 to 5.
[0018] Preferably, the first groove and / or the second groove include a first sub-groove and a second sub-groove sequentially arranged from the bottom to the opening of the groove, the first sub-groove and the second sub-groove communicate with each other, and the groove wall of the first sub-groove and the groove wall of the second sub-groove are smoothly transitioned;
[0019] Along the first direction, the bottom size of the first sub-groove of the first groove is not less than the opening size of the first sub-groove, the bottom size of the second sub-groove is not less than the opening size of the second sub-groove, and the bottom size of the second sub-groove is not greater than the opening size of the first sub-groove.
[0020] Preferably, the cross-sectional shape of the first sub-groove is trapezoidal, and the cross-sectional shape of the second sub-groove is rectangular.
[0021] Preferably, along the first direction, the ratio of the bottom size to the opening size of the first sub-groove of the first groove and the ratio of the bottom size to the opening size of the first sub-groove of the second groove are both 1.1 to 5, the opening of the first sub-groove of the first groove and the bottom size of the second sub-groove are both 45 μm - 180 μm; the opening of the first sub-groove of the second groove and the bottom size of the second sub-groove are both 8 μm - 25 μm.
[0022] In a second aspect, the present application provides a photovoltaic cell, including: a photovoltaic cell sheet;
[0023] The photovoltaic cell sheet is provided with main grids and sub-grids;
[0024] The main grid and / or the sub-grid are prepared by using the laser transfer device provided in the first aspect of the present application.
[0025] Compared with the prior art, the laser transfer device and the photovoltaic cell provided by the present application at least achieve the following beneficial effects:
[0026] In the laser transfer device provided by the present application, along the first direction, the bottom size of the groove is not less than the notch size of the groove. When the laser irradiates the corresponding position of the groove from the second side of the transfer substrate, the heat energy generated by the laser vaporizes the organic components contained in the paste in the groove, and some parts of the paste become loose due to the vaporization decomposition structure. During the process of the paste coming out of the groove, when the residue of the paste (which may include decomposition products) scatters out of the groove and passes through the notch with a smaller size, it is restricted by the notch, and the range of the scattered residue flying out of the notch decreases. As most of the paste is transferred onto the battery chip and the scattered residue is concentrated on the surface of the battery chip and can overlap with most of the paste, the density of the paste transferred onto the battery chip is higher, improving the clarity and aspect ratio of the edge of the grid line.
[0027] Of course, it is not necessary for any product implementing the present application to achieve all the above-mentioned technical effects simultaneously.
[0028] Other features and advantages of the present application will become clear through the following detailed description of the exemplary embodiments of the present application with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS
[0029] The drawings incorporated in and constituting a part of this specification illustrate embodiments of the present application and, together with the description, are used to explain the principles of the present application.
[0030] Figure 1 The figure shows a schematic diagram of the process of existing laser transfer;
[0031] Figure 2 The figure shows a top view of the transfer substrate provided by the embodiment of the present application;
[0032] Figure 3 The figure shows a cross-sectional view of a transfer substrate provided by the embodiment of the present application;
[0033] Figure 4 The figure shows Figure 3 a schematic diagram during the transfer process;
[0034] Figure 5 The figure shows a cross-sectional view of another transfer substrate provided by the embodiment of the present application;
[0035] Figure 6 The figure shows a cross-sectional view of another transfer substrate provided by the embodiment of the present application;
[0036] Figure 7 The figure shows Figure 6 a partial enlarged view of DETAILED DESCRIPTION OF THE EMBODIMENTS
[0037] Reference will now be made in detail to various exemplary embodiments of the present application with reference to the accompanying drawings. It should be noted that: unless otherwise specifically stated, the relative arrangements of components and steps, numerical expressions, and numerical values set forth in these embodiments do not limit the scope of the present application.
[0038] The following description of at least one exemplary embodiment is merely illustrative in nature and is in no way a limitation on the present application or its application or use.
[0039] Technologies, methods, and devices known to those of ordinary skill in the relevant art may not be discussed in detail, but where appropriate, such technologies, methods, and devices should be considered as part of the specification.
[0040] In all examples shown and discussed herein, any specific values should be construed as merely exemplary and not as a limitation. Thus, other examples of the exemplary embodiments may have different values.
[0041] Without departing from the spirit or scope of the present application, various modifications and variations can be made to the present application, which will be apparent to those skilled in the art. Therefore, the present application is intended to cover modifications and variations of the present application that fall within the scope of the corresponding claims (the claimed technical solutions) and their equivalents. It should be noted that the embodiments provided in the embodiments of the present application can be combined with each other without conflict.
[0042] It should be noted that: like reference numerals and letters denote like items in the following drawings, and thus, once an item is defined in one drawing, further discussion thereof is not required in subsequent drawings.
[0043] Laser transfer technology is a new type of non-contact printing technology. Specifically, a groove pattern is provided on one side of a specific light-transmitting film used in the laser transfer technology. This groove pattern is consistent with the pattern of the structure to be transferred (for example: grid line pattern). Based on this, in the actual manufacturing process, first, the required slurry needs to be coated on the above-mentioned specific light-transmitting film to fill the groove pattern with the printing slurry; and the excess printing slurry on the surface of the specific conductive material is removed. Next, the specific light-transmitting film filled with the printing slurry is flipped and transferred to the printing position. At the same time, the object to be transferred is mounted on a moving chuck and placed at a target distance below the specific light-transmitting film. Then, a high-efficiency laser beam is used to perform graphic scanning on the specific light-transmitting film. The emitted laser irradiance passes through the specific light-transmitting film, and its energy is first absorbed by the surface of the printing slurry. The heat generated vaporizes the organic components in the interface region between the printing slurry and the groove wall, forming a high-pressure steam layer. Under the combined action of the steam pressure and gravity, the adhesion between the printing slurry and the groove wall is overcome and it falls off, transferring the printing slurry from the specific light-transmitting film to the battery surface to form a transferred structure (for example: grid line). In the photovoltaic field, through the above non-contact laser transfer technology, the fine grid printing process of high-efficiency solar cells can be improved, and the cost reduction of the silver paste is very significant, and it can break through the line width limit of traditional screen printing.
[0044] Figure 1 The following shows a schematic diagram of the laser transfer process of the prior art. Refer to Figure 1 , in the prior art, the slurry 310-1' is filled in the groove 20' of the light-transmitting film 10'. The bottom width of the groove 20' is smaller than the width of the groove opening, that is, the groove 20' is flared, and the side wall surface of the groove 20' has a certain slope with the bottom of the groove. The advantage of this is that it is beneficial for the slurry 310-1' to escape from the groove 20'. However, after the slurry 310-1' absorbs laser heat and vaporizes and decomposes, a part of its texture becomes loose, and at this time the slurry 310-1' has a certain fluidity. The slurry 310-1' in the groove 20' will scatter outwards from the groove 20' under the combined action of the steam layer and gravity. At the same time, the top of the slurry 310-1' (that is, the part where the slurry 310 contacts the bottom of the groove 20') is easily deformed by force. Eventually, after the slurry 310-1' transferred to the surface of the photovoltaic cell 40' is formed into the grid line 310-2', its edge is blurred and the aspect ratio is low, ultimately affecting the working performance of the grid line 310-1'.
[0045] Figure 2 The following shows a top view of the transfer substrate provided by the embodiment of the present application, Figure 3 The following shows a cross-sectional schematic diagram of a transfer substrate provided by the embodiment of the present application, Figure 4 The following shows Figure 3 a schematic diagram during the transfer process, Figure 5The figure shows a cross-sectional schematic diagram of another transfer substrate provided by an embodiment of the present application.
[0046] Please refer to Figures 1 to 5 , an embodiment of the present application provides a laser transfer device, including: a transfer substrate 100; the transfer substrate 100 extends along a first direction D1 and a second direction D2 that are perpendicular to each other, and both the first direction D1 and the second direction D2 are perpendicular to the thickness of the transfer substrate 100; a plurality of grooves 200 for filling slurry are provided on the first side of the transfer substrate 100, the grooves 200 extend along the second direction D2 and are arranged along the first direction D1, and the depth direction of the grooves 200 is parallel to the thickness direction of the transfer substrate 100; along the first direction D1, the bottom size of the grooves 200 is not less than the notch size of the grooves 200.
[0047] It should be understood that the size of the transfer substrate 100 can be set according to the size and requirements of the prepared battery cells. For example, for photovoltaic battery cells with common sizes of 182 mm or 210 mm specifications, the size of the transfer substrate 100 can be adaptively set. The transfer substrate 100 extends along a first direction D1 and a second direction D2 that are perpendicular to each other. Specifically, in implementation, the orthographic projection of the transfer substrate 100 in its thickness direction can be a square, a rectangle, etc. Taking a rectangle as an example, the first direction D1 is the extension direction of any one side of the rectangle, and the second direction D2 is the extension direction of the side of the rectangle that is perpendicular to the first direction D1. As Figure 2 shown, the transfer substrate 100 extends along the left-right direction and the up-down direction, and the left-right direction is denoted as the first direction D1, and the up-down direction is denoted as the second direction D2.
[0048] It should be understood that the transfer substrate 100 is a specific light-transmitting film, which has high light transmittance. The laser corresponding to the laser transfer device can pass through the transfer substrate 100 and act on the slurry filled in the grooves 200, so that the slurry can be separated from the transfer substrate 100 and printed on the object to be transferred - the photovoltaic cell. The transfer substrate 100 may include at least one of polyethylene, polypropylene, polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, wholly aromatic polyester, polymethyl methacrylate, polycarbonate, polyamide, polysulfone, polyethersulfone, polyether ketone, polyamideimide, polyetherimide, aromatic polyimide, alicyclic polyimide, fluorinated polyimide, cellulose acetate, cellulose nitrate, aromatic polyamide, polyvinyl chloride, polyphenol, polyarylate, polyphenylene sulfide, polyphenylene ether, and polystyrene.
[0049] It should be understood that in the existing laser transfer device, a squeegee is used to fill the slurry into the groove 200 of the transfer substrate 100, and the excess slurry is scraped off from the surface of the transfer substrate 100. The slurry filled in the groove 200 includes a first surface and a second surface. The first surface of the slurry contacts the bottom of the groove 200, and the second surface of the slurry is flush with the surface of the printing substrate. After the slurry is transferred to the surface of the battery, the second surface of the slurry directly contacts the surface of the battery, and the first surface of the slurry does not contact the surface of the battery.
[0050] In specific implementation, the slurry may include one or more stacked layers. When the slurry includes multiple stacked layers, the slurry includes a release layer. The release layer directly contacts the bottom of the groove 200. When the laser irradiates from the second side of the transfer substrate 100, the release layer can quickly absorb the energy of the laser and undergo gasification decomposition, which is beneficial to the slurry smoothly and quickly escaping from the groove 200.
[0051] In the laser transfer device provided in this embodiment, along the first direction D1, the bottom size of the groove 200 is not less than the notch size of the groove 200. When the laser irradiates the corresponding position of the groove 200 from the second side of the transfer substrate 100, the heat energy generated by the laser vaporizes the organic components contained in the slurry in the groove 200, and some parts of the slurry become loose due to this gasification decomposition structure. During the process of the slurry escaping from the groove 200, when the residue of the slurry (which may include decomposition products) scatters out from the groove 200 and passes through the notch with a smaller size, it is restricted by the notch, and the range of the scattered residue flying out of the notch decreases. As most of the slurry is transferred to the battery chip, and the scattered residue is concentrated on the surface of the battery chip and can overlap with most of the slurry, the density of the slurry transferred to the battery chip is higher, improving the clarity and aspect ratio of the gate line edge.
[0052] It should be noted that the organic component substances that may exist in the residue and have not undergone gasification decomposition can be removed by means such as selective laser irradiation and high-temperature decomposition (such as sintering) after the transfer process is completed.
[0053] See Figure 3 and Figure 5 , in some embodiments, the cross-sectional shape of the groove 200 is rectangular or trapezoidal.
[0054] In a specific implementation manner, see Figure 3, the cross-sectional shape of the groove 200 can be rectangular. Along the first direction, the size of the bottom of the groove 200 is equal to the size of the notch of the groove 200. During the process of the slurry 310-1 coming out of the groove 200, when the residue of the slurry 310-1 scatters out of the groove 200, under the action of the notch, the range of the scattered residue flying out of the notch is small, and the density of the slurry 310-1 transferred to the photovoltaic cell 400 is relatively high, which is beneficial to improving the clarity and aspect ratio of the edge of the grid line 310-2. In this embodiment, the structure of the groove 200 is simple, which is beneficial to the manufacture of the groove 200 on the transfer substrate 100.
[0055] In a specific embodiment, referring to Figure 5 , the cross-sectional shape of the groove 200 is trapezoidal. Along the first direction, the size of the bottom of the groove 200 is larger than the size of the notch of the groove 200. During the process of the slurry 310-1 coming out of the groove 200, when the residue of the slurry 310-1 scatters out of the groove 200, the beam focusing ability of the notch is higher, which is beneficial to further reducing the range of the scattered residue flying out of the notch, and the density of the slurry 310-1 transferred to the photovoltaic cell 400 is higher, which is more beneficial to improving the clarity and aspect ratio of the edge of the grid line 310-2.
[0056] Figure 6 The following shows a schematic cross-sectional view of another transfer substrate 100 provided by the embodiment of the present application. Figure 7 As shown in Figure 6 is a partial enlarged view. Referring to Figure 6 and Figure 7 , in some embodiments, the groove 200 includes a first sub-groove 210 and a second sub-groove 220 arranged in sequence from the bottom to the notch of the groove 200. The first sub-groove 210 and the second sub-groove 220 are in communication with each other, and the groove wall of the first sub-groove 210 and the groove wall of the second sub-groove 220 are smoothly transitionally connected; along the first direction, the size of the bottom of the first sub-groove 210 is not less than the size of the notch of the first sub-groove 210, the size of the bottom of the second sub-groove 220 is not less than the size of the notch of the second sub-groove 220, and the size of the bottom of the second sub-groove 220 is not greater than the size of the notch of the first sub-groove 210.
[0057] It should be understood that in this embodiment, the groove 200 includes a first sub-groove 210 and a second sub-groove 220 arranged in sequence from its bottom to the notch. The first sub-groove 210 and the second sub-groove 220 are in communication with each other and the groove wall of the first sub-groove 210 and the groove wall of the second sub-groove 220 are smoothly transitionally connected. In this way, when the slurry 310-1 filled in the groove 200 is subjected to the action of the steam layer and gravity, the slurry 310-1 can smoothly slide from the groove wall of the first sub-groove 210 to the groove wall of the second sub-groove 220, and the occurrence of the phenomenon of slurry hanging on the groove wall at the connection of the first sub-groove 210 and the second sub-groove 220 is reduced.
[0058] Moreover, in this embodiment, along the first direction, the bottom size of the first sub-groove 210 is not less than the notch size of the first sub-groove 210, the bottom size of the second sub-groove 220 is not less than the notch size of the second sub-groove 220, and the bottom size of the second sub-groove 220 is not greater than the notch size of the first sub-groove 210. Thus, during the process of the slurry 310-1 escaping from the groove 200, the notches of the first sub-groove 210 and the second sub-groove 220 have a certain constraining effect on the residues, making the scattered residues more concentrated, which is beneficial to improving the edge clarity of the grid line 310-2 and the aspect ratio of the grid line 310-2.
[0059] In some embodiments, the groove 200 includes a first groove and a second groove. The first groove is used to prepare the main grid of the photovoltaic cell, and the second groove is used to prepare the sub-grid of the photovoltaic cell.
[0060] It should be understood that the first groove and the second groove are two types of the groove 200, which are respectively used to prepare the main grid and the sub-grid of the photovoltaic cell. It should be noted that they are different from the first sub-groove 210 and the second sub-groove 220. The first sub-groove 210 and the second sub-groove 220 are components of the groove 200. The first groove and / or the second groove may include the first sub-groove 210 and the second sub-groove 220. Of course, the cross-section of the first groove and / or the second groove may also be rectangular or trapezoidal. Among them, for the first groove and the second groove corresponding to the main grid and the sub-grid of the same photovoltaic cell, their structures and shapes do not have to be the same or different. For example, in some feasible ways, in the same photovoltaic cell, the cross-section shape of the first groove corresponding to its main grid is rectangular, and the cross-section shape of the second groove corresponding to its sub-grid is trapezoidal.
[0061] In some embodiments, the cross-section shape of the first sub-groove 210 is trapezoidal, and the cross-section shape of the second sub-groove 220 is rectangular.
[0062] In this embodiment, the cross-section shape of the first sub-groove 210 is trapezoidal, and the size difference between the notch and the bottom of the first sub-groove 210 is larger. The notch of the first sub-groove 210 plays an obvious blocking role on the scattered slurry 310-1, which is beneficial to improving the clarity and aspect ratio of the grid line 310-2. At the same time, the cross-section shape of the second sub-groove 220 is rectangular, and the size difference between the notch and the bottom of the second sub-groove 220 is smaller. The blocking effect of the notch on the scattered slurry 310-1 is smaller, which is beneficial to the slurry 310-1 escaping from the groove 200. Thus, it can be seen that in the laser transfer device provided in this embodiment, the groove 200 of the transfer substrate 100 can not only scatter and constrain the slurry 310-1, improve the edge clarity and aspect ratio of the grid line 310-2, but also make the slurry 310-1 easily escape from the groove 200, improve the escape efficiency of the slurry 310-1 from the groove 200, and thus improve the preparation efficiency and quality of the grid line 310-2.
[0063] Based on the same inventive concept, the present application also provides a photovoltaic cell, including: a photovoltaic cell sheet 400, the photovoltaic cell 400 is provided with main grids and sub-grids, and the main grids and / or sub-grids are prepared by using the laser transfer printing device provided in any of the above embodiments.
[0064] In the photovoltaic cell 400 provided in this embodiment, its main grids and / or sub-grids are prepared by using the laser transfer printing device provided in any of the above embodiments, and its main grid lines and / or sub-grids can have clear edges, increased aspect ratio, and improved working performance, thereby improving the photoelectric conversion efficiency of the photovoltaic cell 400.
[0065] During specific implementation, the main grid of the photovoltaic cell 400 can adopt the laser transfer printing device provided in the above embodiments, and the depth range of the first groove of the laser transfer printing device corresponding to the main grid is 15 μm - 30 μm. Specifically, the depth of the first groove can be set according to the height of the main grid. For example, the depth of the first groove is any value within 15 μm - 30 μm, such as 15 μm, 18 μm, 20 μm, 25 μm, or 30 μm, etc. If the depth of the first groove is greater than 30 μm, it is not conducive to the slurry 310-1 for preparing the main grid to escape from the first groove; because the depth of the first groove directly affects the height of the slurry 310-1 for preparing the main grid, so if the depth of the first groove is less than 15 μm, the capacity of the first groove is limited and the depth is small, and the first groove will be difficult to meet the height requirements of the main grid of the existing photovoltaic cell sheet 400. In this embodiment, the depth range of the first groove is 15 μm - 30 μm, which can not only meet the preparation height requirements of the main grid of the photovoltaic cell sheet, but also ensure that the slurry 310-1 for preparing the main grid can smoothly and easily escape from the first groove.
[0066] When the cross-section of the first groove is rectangular, the width of the first groove (i.e., the dimension along the first direction D1) is 45 μm - 200 μm; because the width of the first groove directly affects the width of the slurry for preparing the main grid, if the width of the first groove is less than 45 μm or greater than 200 μm, the capacity in the first groove is too small or too large. Therefore, it does not meet or exceeds the width requirements of the main grid of the photovoltaic cell sheet; in this embodiment, the width of the first groove with a rectangular cross-section is 45 μm - 200 μm, which can meet the width requirements of the main grid of the photovoltaic cell sheet.
[0067] When the cross-sectional shape of the first groove is trapezoidal, the ratio between the bottom width and the opening width of the first groove is 1.1 to 5. If the ratio between the bottom width and the opening width of the first groove is less than 1.1, when the paste 310-1 for preparing the main grid is discharged from the first groove, the restraining effect of the first groove on the paste 310-1 is small, and the edge of the main grid is not clear enough. If the ratio between the bottom width and the opening width of the first groove is greater than 5, the opening width is too narrow relative to the bottom width. When the paste 310-1 for preparing the main grid passes through the opening, the acting force of the opening on the paste 310-1 is large, and the probability of paste hanging at the opening will increase. In this embodiment, for the first groove with a trapezoidal cross-section, the ratio between the bottom width and the opening width is 1.1 to 5, which can ensure that when the paste 310-1 for preparing the main grid is discharged from the first groove, the first groove can play a good restraining role on the flowing and dispersed paste 310-1 and reduce the occurrence of paste hanging.
[0068] When the first groove includes a first sub-groove 210 and a second sub-groove 220, and the cross-sectional shape of the first sub-groove 210 is trapezoidal and the cross-sectional shape of the second sub-groove 220 is rectangular, along the first direction D1, the ratio range of the bottom width to the notch width of the first sub-groove 210 is 1.1 to 5, and the notch width of the first sub-groove 210 and the bottom width of the second sub-groove 220 are both 45 μm - 180 μm. If the ratio between the bottom width and the notch width of the first sub-groove 210 of the first groove is less than 1.1, when the paste 310-1 for preparing the main grid exits from the first sub-groove 210, the first sub-groove 210 has a small effect on the paste 310-1, and the beam-forming effect on the paste 310-1 is poor; if the ratio between the bottom width and the notch width of the first sub-groove 210 is greater than 5, its notch width is too narrow relative to the bottom width. When the paste 310-1 for preparing the main grid passes through the notch of the first sub-groove 210, the notch has a large acting force on the paste 310-1, and the probability of paste hanging at the notch of the first sub-groove 210 will increase; in this embodiment, for the first sub-groove 210 of the first groove, the ratio between its bottom width and notch width is 1.1 to 5, which can ensure that when the paste 310-1 for preparing the main grid exits from the first sub-groove 210, the first sub-groove 210 can play a good constraining role on the flowing and dispersed paste 310-1, while reducing the occurrence of paste hanging. In the corresponding first groove for preparing the main grid, the notch width of the first sub-groove 210 and the bottom width of the second sub-groove 220 are both 45 μm - 180 μm, and the second sub-groove 220 is rectangular. Because in the first groove, the second sub-groove 220 is closer to the notch of the first groove than its first sub-groove 210, the width of the second sub-groove directly affects the width of the paste for preparing the main grid of the photovoltaic cell. If the width of the second sub-groove is less than 45 μm or greater than 180 μm, the capacity in the second sub-groove is too small or too large. Therefore, it does not meet or exceeds the width requirement of the main grid of the photovoltaic cell; in this embodiment, when the first groove includes a first sub-groove 210 and a second sub-groove 220, and the cross-sectional shape of the first sub-groove 210 is trapezoidal and the cross-sectional shape of the second sub-groove 220 is rectangular, along the first direction D1, the ratio range of the bottom width to the notch width of the first sub-groove 210 is 1.1 to 5, and the notch width of the first sub-groove 210 and the bottom width of the second sub-groove 220 are both 45 μm - 180 μm, which can ensure the beam-forming effect of the first groove on the paste 310-2 without paste hanging, and at the same time can meet the width requirement of the main grid of the photovoltaic cell.
[0069] In specific implementation, the laser transfer printing device provided in the above embodiments can be used for the secondary grid of the photovoltaic cell 400, and the depth range of the second groove of the laser transfer printing device corresponding to the secondary grid is 10 μm - 30 μm. Specifically, the depth of the groove 200 can be set according to the height of the secondary grid. For example, the depth of the second groove 200 is any value within 10 μm - 30 μm, such as 10 μm, 15 μm, 20 μm, 25 μm, or 30 μm. If the depth of the second groove is greater than 30 μm, it is not conducive to the slurry 310-1 for preparing the secondary grid to escape from the second groove; because the depth of the second groove directly affects the height of the slurry 310-1 for preparing the secondary grid, therefore, if the depth of the second groove is less than 10 μm, the capacity of the second groove is limited and the depth is small, and it will be difficult for the second groove to meet the height requirements of the secondary grid of the existing photovoltaic cell 400. In this embodiment, the depth range of the second groove is 10 μm - 30 μm, which can not only meet the preparation height requirements of the secondary grid of the photovoltaic cell, but also ensure that the slurry 310-1 for preparing the secondary grid can smoothly escape from the second groove.
[0070] When the cross-section of the second groove is rectangular, the width of the second groove (i.e., the dimension along the first direction D1) is 8 μm - 30 μm; because the width of the second groove directly affects the width of the slurry for preparing the secondary grid, if the width of the second groove is less than 8 μm or greater than 30 μm, the capacity in the second groove is too small or too large, and therefore, it does not meet or exceeds the width requirements of the secondary grid of the photovoltaic cell; in this embodiment, for the second groove with a rectangular cross-section, its width is 8 μm - 30 μm, which can meet the width requirements of the main grid of the photovoltaic cell.
[0071] When the cross-sectional shape of the second groove is trapezoidal, the ratio of the bottom width to the opening width of the first groove is 1.1 - 5. If the ratio of the bottom width to the opening width of the second groove is less than 1.1, when the slurry 310-1 for preparing the secondary grid escapes from the second groove, the restraining effect of the second groove on the slurry 310-1 is small, and the edge of the secondary grid is not clear enough; if the ratio of the bottom width to the opening width of the second groove is greater than 5, the opening width is too narrow relative to the bottom width, and when the slurry 310-1 for preparing the secondary grid passes through the opening, the acting force of the opening on the slurry 310-1 is large, and the probability of slurry hanging at the opening will increase; in this embodiment, for the second groove with a trapezoidal cross-section, the ratio of its bottom width to the opening width is 1.1 - 5, which can ensure that when the slurry 310-1 for preparing the secondary grid escapes from the second groove, the second groove can play a good restraining role on the flowing and dispersing slurry 310-1, and reduce the occurrence of slurry hanging.
[0072] When the second groove 200 includes a first sub-groove 210 and a second sub-groove 220, and the cross-sectional shape of the first sub-groove 210 is trapezoidal and the cross-sectional shape of the second sub-groove 220 is rectangular, along the first direction D1, the ratio range of the bottom width to the notch width of the first sub-groove 210 is 1.1 to 5, and the notch width of the first sub-groove 210 and the bottom width of the second sub-groove 220 are both 8μm - 25μm. If the ratio between the bottom width and the notch width of the first sub-groove 210 of the second groove is less than 1.1, when the paste 310-1 for preparing the auxiliary grid escapes from the first sub-groove 210, the first sub-groove 210 has a small effect on the paste 310-1, and the beam-forming effect on the paste 310-1 is not good; if the ratio between the bottom width and the notch width of the first sub-groove 210 is greater than 5, its notch width is too narrow relative to the bottom width. When the paste 310-1 for preparing the auxiliary grid passes through the notch of the first sub-groove 210, the notch has a large acting force on the paste 310-1, and the probability of paste hanging at the notch of the first sub-groove 210 will increase; in this embodiment, for the first sub-groove 210 of the second groove, the ratio between its bottom width and notch width is 1.1 to 5, which can ensure that when the paste 310-1 for preparing the auxiliary grid escapes from the first sub-groove 210, the first sub-groove 210 can play a good constraining role on the flowing and dispersed paste 310-1, and at the same time reduce the occurrence of paste hanging. In the corresponding second groove for preparing the auxiliary grid, the notch width of the first sub-groove 210 and the bottom width of the second sub-groove 220 are both 45μm - 180μm, and the second sub-groove 220 is rectangular. Because in the second groove, relative to its first sub-groove 210, the second sub-groove 220 is closer to the notch of the second groove, the width of the second sub-groove directly affects the width of the paste for preparing the auxiliary grid of the photovoltaic cell. If the width of the second sub-groove is less than 45μm or greater than 180μm, the capacity in the second sub-groove is too small or too large. Therefore, it does not meet or exceeds the width requirement of the auxiliary grid of the photovoltaic cell; in this embodiment, when the second groove includes a first sub-groove 210 and a second sub-groove 220, and the cross-sectional shape of the first sub-groove 210 is trapezoidal and the cross-sectional shape of the second sub-groove 220 is rectangular, along the first direction D1, the ratio range of the bottom width to the notch width of the first sub-groove 210 is 1.1 to 5, and the notch width of the first sub-groove 210 and the bottom width of the second sub-groove 220 are both 45μm - 1800μm, which can ensure the beam-forming effect of the second groove on the paste 310-2 without paste hanging, and at the same time can meet the width requirement of the auxiliary grid of the photovoltaic cell.
[0073] It should be noted that the bottom width, notch width, and depth of the groove need to be designed in combination with parameters such as the width of the grid line 310-2 to be prepared, the fluidity of the paste 310-1, and the performance related to forming.
[0074] In summary, the display panel, its manufacturing method, and the display device provided by the present application at least achieve the following beneficial effects:
[0075] In the present application, by making the bottom dimension of the groove 200 along the first direction D1 not less than the notch dimension of the groove 200, when the laser irradiates the corresponding position of the groove 200 from the second side of the transfer substrate 100, the heat energy generated by the laser vaporizes the organic components contained in the slurry in the groove 200, and some parts of the slurry become loose due to the vaporization decomposition structure. During the process of the slurry coming out of the groove 200, when the residue of the slurry (which may include decomposition products) scatters out of the groove 200 and passes through the notch with a smaller dimension, it is restricted by the notch, and the range of the scattered residue flying out of the notch is reduced. As most of the slurry is transferred onto the battery chip and the scattered residue is concentrated on the surface of the battery chip and can overlap with most of the slurry, the density of the slurry transferred onto the battery chip is higher, improving the clarity and aspect ratio of the edge of the grid line.
[0076] Although some specific embodiments of the present application have been described in detail by way of examples, those skilled in the art should understand that the above examples are only for illustration and not for limiting the scope of the present application. Those skilled in the art should understand that the above embodiments can be modified without departing from the scope and spirit of the present application. The scope of the present application is defined by the appended claims.
Claims
1. A laser transfer device, characterized in that, Comprising: A transfer substrate; The transfer substrate extends along a first direction and a second direction that are perpendicular to each other, and both the first direction and the second direction are perpendicular to the thickness of the transfer substrate; A plurality of grooves for filling a paste are provided on a first side of the transfer substrate, the grooves extend along the second direction and are arranged along the first direction, and the depth direction of the grooves is parallel to the thickness direction of the transfer substrate; In the first direction, the bottom size of the groove is not less than the notch size of the groove.
2. The laser transfer device according to claim 1, wherein The cross-sectional shape of the groove is rectangular or trapezoidal.
3. The laser transfer device according to claim 1, characterized in that, The groove includes a first groove and a second groove, the first groove is used for preparing the main grid of the photovoltaic cell, and the second groove is used for preparing the sub-grid of the photovoltaic cell.
4. The laser transfer device according to claim 3, characterized in that, The depth of the first groove is 15μm - 30μm, and the depth of the second groove is 10μm - 30μm.
5. The laser transfer device according to claim 3, wherein The cross-sectional shape of the first groove is rectangular, and in the first direction, the size of the first groove is 45μm - 200μm; Or, The cross-sectional shape of the first groove is trapezoidal, and in the first direction, the ratio of the bottom size to the notch size of the first groove is 1.1 - 5.
6. The laser transfer device according to claim 3, wherein The cross-sectional shape of the second groove is rectangular, and in the first direction, the size of the second groove is 8μm - 30μm; Or, The cross-sectional shape of the second groove is trapezoidal, and in the first direction, the ratio of the bottom size to the notch size of the second groove is 1.1 - 5.
7. The laser transfer device according to claim 3, characterized in that, The first groove and / or the second groove include a first sub-groove and a second sub-groove that are sequentially arranged from the bottom to the notch of the groove, the first sub-groove and the second sub-groove are in communication with each other, and the groove wall of the first sub-groove and the groove wall of the second sub-groove are smoothly transitioned; In the first direction, the bottom size of the first sub-groove is not less than the notch size of the first sub-groove, the bottom size of the second sub-groove is not less than the notch size of the second sub-groove, and the bottom size of the second sub-groove is not greater than the notch size of the first sub-groove.
8. The laser transfer device according to claim 7, characterized in that, The cross-sectional shape of the first sub-groove is trapezoidal, and the cross-sectional shape of the second sub-groove is rectangular.
9. The laser transfer device according to claim 8, wherein, In the first direction, the ratio of the bottom size to the notch size of the first sub-groove of the first groove and the ratio of the bottom size to the notch size of the first sub-groove of the second groove are both 1.1 - 5, and the notch of the first sub-groove of the first groove and the bottom size of the second sub-groove are both 45μm - 180μm; the notch of the first sub-groove of the second groove and the bottom size of the second sub-groove are both 8μm - 25μm.
10. A photovoltaic cell, characterized in that, Comprising: A photovoltaic cell; The photovoltaic cell is provided with a main grid line and a sub-grid line; The main grid line and / or the sub-grid line are prepared by using the laser transfer device according to any one of claims 1 - 9.