Electronic-grade HMDS (hexamethyldisilazane) filling system

Abstract

The electronic-grade HMDS filling system comprises a product storage unit, a product filtering unit, a product detection unit, an automatic product filling unit and a gas and tail gas supply unit, the product storage unit comprises a pressure-resistant product tank, a normal-pressure storage tank and an external incoming material valve; the pressure-resistant product tank comprises a first pressure-resistant product tank and a second pressure-resistant product tank; the gas and tail gas supply unit comprises a nitrogen supply device, and the nitrogen supply end of the nitrogen supply device is connected with nitrogen input ports of the pressure-resistant product tank and the normal-pressure storage tank; a first inert pressure gas inlet valve is arranged on a pipeline between the first pressure-resistant product tank and the nitrogen supply end of the nitrogen supply device; and a second inert pressure gas inlet valve is arranged on a pipeline between the second pressure-resistant product tank and the nitrogen supply end of the nitrogen supply device. The utility model aims to realize accurate filling of high-purity chemicals and ensure the safety and cleanliness of the whole process.

Description

Technical Field

[0001] The utility model relates to the technical field of chemical equipment, in particular to the precise filling technology of high-purity chemicals in the semiconductor manufacturing process, and particularly to the filling technology of electronic-grade HMDS (hexamethyldisilazane). Background Art

[0002] In the electronics manufacturing industry, especially in the production process of semiconductor devices, HMDS (hexamethyldisilazane) plays an important role as a key chemical. HMDS is mainly used as a surface treatment agent in semiconductor manufacturing to improve the hydrophilicity or hydrophobicity of the silicon wafer surface, and as an anti-reflection layer in the lithography process to improve the accuracy and resolution of the lithography pattern. Therefore, the purity and filling accuracy of HMDS directly affect the performance and quality of semiconductor devices.

[0003] The traditional HMDS filling system has the following problems:

[0004] 1. Insufficient filling accuracy: Traditional filling equipment often fails to achieve high-precision filling, resulting in inaccurate usage of HMDS, affecting the stability of subsequent processes and product quality;

[0005] 2. Operational complexity: The traditional filling process requires a large amount of manual operation, which is not only inefficient but also increases the risk of human error;

[0006] 3. Easy product contamination: During the filling process, HMDS is easily contaminated by moisture and impurities in the environment, affecting its purity and the performance of the final product;

[0007] 4. Safety and environmental problems: The traditional filling system has deficiencies in handling tail gases and waste, which may pose potential risks to operators and the environment.

[0008] Therefore, the applicant proposes an electronic-grade HMDS filling technology. Summary of the Invention

[0009] The purpose of the utility model is to solve the problems that the existing filling technology for HMDS (hexamethyldisilazane) has deficiencies in filling accuracy, safety and cleanliness during the filling process, and to propose an electronic-grade HMDS filling technology.

[0010] To solve the above technical problems, the technical solution adopted by the utility model is as follows:

[0011] An electronic-grade HMDS filling system, which includes a product storage unit, a product filtration unit, a product detection unit, a product automatic filling unit, and a gas supply and tail gas unit;

[0012] The product storage unit includes a pressure-resistant product tank, an atmospheric storage tank, and an external incoming material valve; the pressure-resistant product tank includes a first pressure-resistant product tank and a second pressure-resistant product tank;

[0013] The gas supply and tail gas unit includes a nitrogen supply device, and the nitrogen supply end of the nitrogen supply device is connected to the nitrogen input ports of the pressure-resistant product tank and the atmospheric storage tank;

[0014] A first inert pressure feeding gas inlet valve is provided on the pipeline between the first pressure-resistant product tank and the nitrogen supply end of the nitrogen supply device; a second inert pressure feeding gas inlet valve is provided on the pipeline between the second pressure-resistant product tank and the nitrogen supply end of the nitrogen supply device; a third inert gas make-up valve is provided on the pipeline between the atmospheric storage tank and the nitrogen supply end of the nitrogen supply device.

[0015] The discharge ports of the first pressure-resistant product tank, the second pressure-resistant product tank, and the atmospheric storage tank are connected to the feed ports of the first-stage filtration device in the product filtration unit, and the discharge port of the first-stage filtration device is connected to the feed port of the second-stage filtration device; the discharge port of the second-stage filtration device is on the one hand connected to the feed port of the product automatic filling unit; the external incoming material valve is connected to the feed port of the first-stage filtration device;

[0016] The discharge port of the second-stage filtration device is on the other hand connected to the feed port of the product detection unit. The product detection unit includes an on-line particle detector LPC and a manual sampling port. An LPC injection valve is provided on the pipeline between the second-stage filtration device and the on-line particle detector LPC, and a manual sampling port discharge valve is provided between the second-stage filtration device and the manual sampling port;

[0017] The filter element precision configuration of the product filtration unit is selected according to the specific particle size requirements of the product, and the filter element size is 10 inches or 20 inches commonly used in the market.

[0018] A first discharge valve is provided on the pipeline between the discharge port of the first pressure-resistant product tank and the feed port of the first-stage filtration device, a second discharge valve is provided on the pipeline between the discharge port of the second pressure-resistant product tank and the feed port of the first-stage filtration device, and a third discharge valve and a pneumatic diaphragm pump are provided on the pipeline between the discharge port of the atmospheric storage tank and the feed port of the first-stage filtration device.

[0019] A product filling unit feed valve is provided on the pipeline between the discharge port of the second-stage filtration device and the feed port of the product automatic filling unit. A fourth inert pressure feeding gas inlet valve is provided on the pipeline between the product automatic filling unit and the nitrogen supply end of the nitrogen supply device. The product automatic filling unit further includes a weighing module.

[0020] The tail gas discharge end of the product filtration unit is connected to the tail gas input end of the gas supply and tail gas unit.

[0021] Compared with the prior art, the utility model has the following technical effects:

[0022] 1. Precision filling of products: The system ensures the precise filling of high-purity chemicals through multi-stage filtration and accurate weighing modules. Different types of containers and pressure-resistant product tanks in the product storage unit, as well as the use of pneumatic diaphragm pumps, guarantee the high purity and precise control of material transportation. The fully automatic operation of the automatic filling unit improves the filling efficiency and accuracy;

[0023] 2. Quality control: The online monitoring and manual sampling pipelines of the product detection unit can monitor the particle size of products in real time and offline, ensuring the monitoring and control of product quality. Multi-stage filtration and pressure gauges monitor the filter status, guaranteeing the stability of the filtration effect and the timely maintenance of filters;

[0024] 3. Operability: The application of the PLC controller realizes the unified control and linkage of each unit, improving the accuracy and automation of operation. The fully automatic operation of the system reduces the complexity and errors of manual operation, improving the overall operability.

[0025] 4. Safety: The system is equipped with multiple safety measures, such as liquid leakage sensors, flammable gas detectors, high-temperature sensors, smoke alarms, and CO2 automatic fire extinguishing systems, as well as gas filters for the gas supply and exhaust units, ensuring the safety and cleanliness of the entire filling process. Description of the Drawings

[0026] The following further describes the present utility model in conjunction with the drawings and embodiments:

[0027] Figure 1 It is a schematic structural diagram of the system in the present utility model; Detailed Embodiment

[0028] As Figure 1 shown, an electronic-grade HMDS filling system, which includes a product storage unit 1, a product filtration unit 2, a product detection unit 3, a product automatic filling unit 4, and a gas supply and exhaust unit 5;

[0029] The product storage unit 1 includes a pressure-resistant product tank, an atmospheric storage tank 13, and an external incoming material valve 16; the pressure-resistant product tank includes a first pressure-resistant product tank 11 and a second pressure-resistant product tank 12;

[0030] The gas supply and exhaust unit 5 includes a nitrogen supply device, and the nitrogen supply end of the nitrogen supply device is connected to the nitrogen input ports of the pressure-resistant product tank and the atmospheric storage tank 13;

[0031] A first inert pressure feeding gas inlet valve 17 is provided on the pipeline between the first pressure-resistant product tank 11 and the nitrogen supply end of the nitrogen supply device; a second inert pressure feeding gas inlet valve 18 is provided on the pipeline between the second pressure-resistant product tank 12 and the nitrogen supply end of the nitrogen supply device; a third inert gas filling valve 15 is provided on the pipeline between the atmospheric storage tank 13 and the nitrogen supply end of the nitrogen supply device.

[0032] The discharge ports of the first pressure-resistant product tank 11, the second pressure-resistant product tank 12, and the atmospheric storage tank 13 are connected to the feed inlet of the first-stage filtering device 21 in the product filtering unit 2, and the discharge port of the first-stage filtering device 21 is connected to the feed inlet of the second-stage filtering device 22; the discharge port of the second-stage filtering device 22 is connected to the feed inlet of the product automatic filling unit 4 on the one hand; the external incoming material valve 16 is connected to the feed inlet of the first-stage filtering device 21;

[0033] The discharge port of the second-stage filtering device 22 is connected to the feed inlet of the product detection unit 3 on the other hand. The product detection unit 3 includes an on-line particle detector LPC and a manual sampling port. An LPC sampling valve 31 is provided on the pipeline between the second-stage filtering device 22 and the on-line particle detector LPC, and a manual sampling port discharge valve 32 is provided between the second-stage filtering device 22 and the manual sampling port;

[0034] The filter element precision configuration of the product filtering unit is selected according to the specific particle size requirements of the product, and the filter element size is 10 inches or 20 inches commonly used in the market.

[0035] A first discharge valve 19 is provided on the pipeline between the discharge port of the first pressure-resistant product tank 11 and the feed inlet of the first-stage filtering device 21, a second discharge valve 110 is provided on the pipeline between the discharge port of the second pressure-resistant product tank 12 and the feed inlet of the first-stage filtering device 21, and a third discharge valve 111 and a pneumatic diaphragm pump 14 are provided on the pipeline between the discharge port of the atmospheric storage tank 13 and the feed inlet of the first-stage filtering device 21.

[0036] A product filling unit feed valve 41 is provided on the pipeline between the discharge port of the second-stage filtering device 22 and the feed inlet of the product automatic filling unit 4. A fourth inert pressure feeding gas inlet valve is provided on the pipeline between the product automatic filling unit 4 and the nitrogen supply end of the nitrogen supply device. The product automatic filling unit 4 further includes a weighing module 42.

[0037] The tail gas discharge end of the product filtering unit 2 is connected to the tail gas input end of the gas supply and tail gas unit 5.

[0038] Figure 1Among them, P1 refers to the first pressure gauge; P2 refers to the second pressure gauge; P3 refers to the third pressure gauge; P4 refers to the fourth pressure gauge; P5 refers to the fifth pressure; P6 refers to the sixth pressure gauge; P7 refers to the seventh pressure gauge; P8 refers to the eighth pressure gauge; P9 refers to the ninth pressure gauge; P10 refers to the tenth pressure gauge;

[0039] Among them, each package of the product storage unit is protected by an inert gas (taking high-purity nitrogen as an example) to avoid direct contact between HMDS and air and ensure its stability;

[0040] Furthermore, for the product storage unit: the HMDS storage unit includes three pressure-resistant product tanks and one atmospheric storage tank; the pressure-resistant product tanks are sent to the product automatic filling unit by high-purity nitrogen gas, while the atmospheric storage tank transports materials through a high-purity pneumatic diaphragm pump. The atmospheric storage tank is equipped with a high-purity nitrogen gas make-up valve, which is controlled by a PLC controller and linked with the material transport pump; during filling, the PLC controller issues instructions to ensure that the make-up valve and the discharge valve are in the open state, and the material is first transported to the product filtration unit through the diaphragm pump;

[0041] The product filtration unit adopts a multi-stage (in this embodiment, two-stage filtration is selected and the filter element size is 10 inches) filtration system to effectively remove particulate impurities in HMDS;

[0042] Furthermore, pressure gauges P8, P9, and P10 are equipped at the inlets and outlets of each stage of the filter, and are connected to the PLC controller to monitor the filter status in real time. The exhaust port of the filter is connected to the tail gas pipeline, and the tail gas is discharged after treatment;

[0043] The product detection unit adopts an online particle detector (LPC), which can monitor the particle size of HMDS in real time online. The manual sampling port ensures the cleanliness of the sampling environment and can sample for offline analysis of the HMDS product to be filled, including but not limited to key indicators such as purity, metal impurity content, and moisture.

[0044] Furthermore, after two-stage filtration, the product directly enters the online monitoring pipeline and is connected to a particle counter to monitor the product particle size in real time. The valves of the detection unit are connected to the PLC controller to achieve automatic control. In this embodiment, the waste discharge port is used to collect the waste liquid generated during the online detection process;

[0045] The product automatic filling unit is divided into a packaging buffer room and a filling room; the filling room is equipped with high-purity inert gas pipelines and valves, and can use high-purity inert gas (taking high-purity nitrogen as an example) to deeply purge and displace the inside of the packaging. The filling unit adopts a precision filling head, an accurate weighing module (accuracy 1 / 6000) and a control system to achieve precise control of the filling volume.

[0046] Further, manually place the packaging (the packaging can be a gallon bottle) into the packaging buffer room of the product automatic filling unit, close the cabinet door, and the buffer room automatically purges and replaces the ambient atmosphere through the FFU. After the replacement and purging of the buffer room are completed and the online particle analyzer passes the product analysis, it reaches the filling pending state.

[0047] When using the present utility model for filling, the following process is included:

[0048] a. The gallon bottle is transferred to the filling position in the canning area through the track, and a weighing module is arranged below the filling position with a weighing accuracy of 1 / 6000;

[0049] b. The automatic capping device opens the gallon bottle, and the purging pipeline extends to the bottom of the bottle for in-depth purging inside the bottle. In this embodiment, the purging gas is ultra-pure nitrogen, and the purging time is 30s;

[0050] c. The purging pipeline is lifted, the filling pipeline extends to a specified height inside the bottle, and filling starts. The filling pipeline rises with the liquid level. In this embodiment, the filling rate is set to 4L / min.

[0051] d. The weighing module real-time feedbacks the filling quality. When the set filling quality is reached, the PLC controller closes the air supplement valve 15, the discharge valve 111, the material pump 14, and the filling unit feed valve 41;

[0052] e. The PLC controller controls capping and moves the filled HMDS gallon bottle back to the buffer room;

[0053] f. After filling is completed, the filling room is deeply purged and maintained at a cleanliness level of 100.

[0054] In the present utility model, the air supply and tail gas unit includes an air compressor and a tail gas treatment device to ensure power supply and environmental safety during the filling process; the air supply and tail gas unit provides high-purity nitrogen for the system and treats the tail gas. A gas filter is provided at the nitrogen inlet and outlet, and the filtration accuracy is not less than 3nm; the tail gas is treated by two-stage activated carbon adsorption and then discharged into the tail gas pipeline.

[0055] In the present utility model, the material pipeline is made of high-purity PFA material, and the high-purity nitrogen pipeline is made of 316L EP polished stainless steel.

[0056] The safety facilities equipped in the system provided by the present utility model, such as liquid leakage sensors, flammable gas detectors, high-temperature sensors, smoke alarms, and CO2 automatic fire extinguishing systems, are all in an online state in this embodiment to ensure the safety of filling operations.

[0057] Through the above embodiments, the present utility model provides an efficient, safe, and automated automatic filling system for electronic-grade HMDS, which is suitable for precise filling of high-purity chemicals to ensure product quality and production safety.

Claims

1. An electronic-grade HMDS filling system, characterized in that, The system includes a product storage unit (1), a product filtration unit (2), a product detection unit (3), a product automatic filling unit (4), and a gas supply and tail gas unit (5); The product storage unit (1) includes a pressure-resistant product tank, an atmospheric storage tank (13), and an external incoming material valve (16); the pressure-resistant product tank includes a first pressure-resistant product tank (11) and a second pressure-resistant product tank (12); The gas supply and tail gas unit (5) includes a nitrogen supply device, and the nitrogen supply end of the nitrogen supply device is connected to the nitrogen input ports of the pressure-resistant product tank and the atmospheric storage tank (13); A first inert pressure feeding gas inlet valve (17) is provided on the pipeline between the first pressure-resistant product tank (11) and the nitrogen supply end of the nitrogen supply device; a second inert pressure feeding gas inlet valve (18) is provided on the pipeline between the second pressure-resistant product tank (12) and the nitrogen supply end of the nitrogen supply device; a third inert gas make-up valve (15) is provided on the pipeline between the atmospheric storage tank (13) and the nitrogen supply end of the nitrogen supply device.

2. The system according to claim 1, wherein The discharge ports of the first pressure-resistant product tank (11), the second pressure-resistant product tank (12), and the atmospheric storage tank (13) are connected to the feed inlet of the first-stage filtration device (21) in the product filtration unit (2), and the discharge port of the first-stage filtration device (21) is connected to the feed inlet of the second-stage filtration device (22); the discharge port of the second-stage filtration device (22) is on the one hand connected to the feed inlet of the product automatic filling unit (4); the external incoming material valve (16) is connected to the feed inlet of the first-stage filtration device (21); The discharge port of the second-stage filtration device (22) is on the other hand connected to the feed inlet of the product detection unit (3), and the product detection unit (3) includes an on-line particle detector LPC and a manual sampling port. An LPC injection valve (31) is provided on the pipeline between the second-stage filtration device (22) and the on-line particle detector LPC, and a manual sampling port discharge valve (32) is provided between the second-stage filtration device (22) and the manual sampling port; The filter element precision configuration of the product filtration unit is selected according to the specific particle size requirements of the product, and the filter element size is 10 inches or 20 inches commonly used in the market.

3. The system according to claim 2, characterized in that A first discharge valve (19) is provided on the pipeline between the discharge port of the first pressure-resistant product tank (11) and the feed inlet of the first-stage filtration device (21), a second discharge valve (110) is provided on the pipeline between the discharge port of the second pressure-resistant product tank (12) and the feed inlet of the first-stage filtration device (21), and a third discharge valve (111) and a pneumatic diaphragm pump (14) are provided on the pipeline between the discharge port of the atmospheric storage tank (13) and the feed inlet of the first-stage filtration device (21).

4. The system according to claim 3, wherein A product filling unit feed valve (41) is provided on the pipeline between the discharge port of the second-stage filtration device (22) and the feed inlet of the product automatic filling unit (4), a fourth inert pressure feeding gas inlet valve is provided on the pipeline between the product automatic filling unit (4) and the nitrogen supply end of the nitrogen supply device, and the product automatic filling unit (4) further includes a weighing module (42).

5. The system according to any one of claims 1 to 4, characterized in that, The exhaust gas discharge end of the product filtration unit (2) is connected to the exhaust gas input end of the gas supply and exhaust gas unit (5).

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