Drainage system and semiconductor system

Abstract

The embodiment of the utility model provides a liquid discharge system and a semiconductor system, and the liquid discharge system comprises a cleaning device for providing a cleaning medium; the collecting tank is used for collecting waste liquid discharged by the semiconductor machine table; the liquid conveying pipeline is provided with a liquid inlet and a liquid outlet; the liquid inlet pipeline is communicated with the semiconductor machine table and the liquid inlet, and a liquid inlet valve for opening and closing the liquid inlet pipeline is arranged on the liquid inlet pipeline; the cleaning pipeline is communicated with the cleaning device and the liquid inlet, and a cleaning valve for opening and closing the cleaning pipeline is arranged on the cleaning pipeline; and the collecting pipeline is communicated with the collecting tank and the liquid outlet. By the adoption of the technical scheme, the liquid inlet valve is closed, the cleaning valve is opened, the cleaning medium provided by the cleaning device is conveyed into the collecting tank through the cleaning pipeline, the liquid conveying pipeline and the collecting pipeline, and in the conveying process, the cleaning medium provided by the cleaning device can clean crystals deposited on the inner walls of the liquid conveying pipeline and the collecting pipeline; therefore, the probability of blockage of the drainage system can be reduced.

Description

Technical Field

[0001] The embodiments of the present utility model relate to the field of semiconductor technology, and in particular to a liquid discharge system and a semiconductor system. Background Art

[0002] Wastewater generated during semiconductor machine production pollutes both the machine and the environment, necessitating a drainage system to treat the wastewater. However, components in the wastewater can easily form crystals, potentially clogging the drainage system's pipes. Therefore, providing a technical solution to reduce the likelihood of drainage system blockage has become a pressing technical challenge. Utility Model Content

[0003] In view of this, embodiments of the present invention provide a liquid drainage system and a semiconductor system, which can reduce the probability of clogging of the liquid drainage system.

[0004] The present invention provides a drainage system, comprising:

[0005] a cleaning device for providing a cleaning medium;

[0006] Collection tanks for waste liquid discharged from semiconductor machines;

[0007] an infusion line having a liquid inlet and a liquid outlet;

[0008] a liquid inlet pipeline connecting the semiconductor machine and the liquid inlet, wherein the liquid inlet pipeline is provided with a liquid inlet valve for opening and closing the liquid inlet pipeline;

[0009] A cleaning pipeline connected to the cleaning device and the liquid inlet, wherein the cleaning pipeline is provided with a cleaning valve for opening and closing the cleaning pipeline;

[0010] A collecting pipeline connecting the collecting tank and the liquid outlet.

[0011] Optionally, the drainage system further includes:

[0012] A pressurizing device for increasing the pressure of the cleaning medium is provided in the cleaning pipeline.

[0013] Optionally, the drainage system further includes:

[0014] a purification device for purifying the waste liquid;

[0015] a purification pipeline connecting the purification device and the liquid outlet, wherein the purification pipeline is provided with a purification valve for opening and closing the purification pipeline;

[0016] The collecting pipeline is provided with a collecting valve for opening and closing the collecting pipeline.

[0017] Optionally, the drainage system further includes:

[0018] A control device that is respectively connected to the liquid inlet valve, the cleaning valve, the collection valve, and the purification valve, and respectively controls the opening and closing of the liquid inlet valve, the cleaning valve, the collection valve, and the purification valve.

[0019] Optionally, the liquid inlet valve, the cleaning valve, the collection valve, and the purification valve are all pneumatic control valves;

[0020] The control device is pneumatically connected to the liquid inlet valve, the cleaning valve, the collection valve, and the purification valve respectively.

[0021] Optionally, the number of the collection tanks is multiple, the number of the collection pipelines is multiple, and the number of the collection valves is multiple; wherein, one collection tank corresponds to one collection pipeline, and one collection pipeline corresponds to one collection valve;

[0022] The control device is respectively connected to multiple collection valves.

[0023] Optionally, the collection tank has:

[0024] A sensor for monitoring the liquid level height of the waste liquid in the collection tank, and the sensor is electrically connected to the control device.

[0025] Optionally, the height of the cleaning pipeline is not lower than the height of the infusion pipeline, and the height of the infusion pipeline is not lower than the height of the purification pipeline.

[0026] Optionally, the height of the liquid inlet pipeline is not lower than the height of the infusion pipeline, and the height of the infusion pipeline is not lower than the height of the collection pipeline.

[0027] Correspondingly, an embodiment of the present invention further provides a semiconductor system, including:

[0028] A semiconductor machine tool having a liquid discharge port;

[0029] The liquid discharge system according to any one of the foregoing embodiments, and the liquid inlet pipeline of the liquid discharge system is communicated with the liquid discharge port.

[0030] Compared with the prior art, the technical solution of the embodiment of the present invention has the following advantages:

[0031] In the liquid discharge system and the semiconductor system provided by the embodiment of the present invention, when the liquid inlet valve is opened and the cleaning valve is closed, the waste liquid discharged from the semiconductor machine tool is transported to the collection tank for storage through the liquid inlet pipeline, the infusion pipeline, and the collection pipeline; when the liquid inlet valve is closed and the cleaning valve is opened, the cleaning medium provided by the cleaning device is transported to the collection tank through the cleaning pipeline, the infusion pipeline, and the collection pipeline. During the transportation process, the cleaning medium provided by the cleaning device can clean the crystals deposited on the inner walls of the infusion pipeline and the collection pipeline, thereby reducing the probability of blockage of the liquid discharge system. Brief Description of the Drawings

[0032] In order to more clearly illustrate the technical solutions of the embodiments of the present utility model, the following will briefly introduce the drawings required for the description of the embodiments of the present utility model or the prior art. Obviously, the following described drawings are only some embodiments of this specification. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings.

[0033] Figure 1 It shows a schematic structural diagram of a semiconductor system in an embodiment of the present utility model. Detailed Embodiments

[0034] As described in the background art, waste liquid will be generated during the production process of semiconductor machines. For example, when etching a silicon substrate with phosphoric acid, phosphoric acid waste liquid will be generated; and when etching a metal layer with sulfuric acid, sulfuric acid waste liquid will be generated. Considering that the waste liquid will pollute the machine and the environment, a drainage system is required to treat the waste liquid.

[0035] As an example, the drainage system includes an infusion pipeline and a collection tank. Among them, both ends of the infusion pipeline are respectively connected to the semiconductor machine and the collection tank, and the waste liquid discharged from the semiconductor machine is transported to the collection tank through the infusion pipeline for storage.

[0036] The inventor found during the process of treating waste liquid by the drainage system that the components in the waste liquid will form crystals. For example, phosphoric acid waste liquid will form phosphate crystals and deposit on the inner wall of the pipeline of the drainage system. As time accumulates, the crystals deposited on the inner wall of the pipeline will gradually reduce the inner diameter of the pipeline channel until the pipeline channel is blocked.

[0037] Therefore, how to provide a drainage system to reduce the probability of blockage has become an urgent technical problem to be solved.

[0038] To solve the above technical problems, an embodiment of the present utility model provides a drainage system, wherein the drainage system includes: a cleaning device for providing a cleaning medium; a collection tank for collecting the waste liquid discharged from the semiconductor machine; an infusion pipeline having an inlet and an outlet; an inlet pipeline connecting the semiconductor machine and the inlet, and an inlet valve for switching the inlet pipeline is provided on the inlet pipeline; a cleaning pipeline connecting the cleaning device and the inlet, and a cleaning valve for switching the cleaning pipeline is provided on the cleaning pipeline; a collection pipeline connecting the collection tank and the outlet.

[0039] In the liquid discharge system provided by the embodiment of the present utility model, when the liquid inlet valve is opened and the cleaning valve is closed, the waste liquid discharged from the semiconductor machine is transported through the liquid inlet pipeline, the liquid delivery pipeline, and the collection pipeline to be stored in the collection tank; when the liquid inlet valve is closed and the cleaning valve is opened, the cleaning medium provided by the cleaning device is transported through the cleaning pipeline, the liquid delivery pipeline, and the collection pipeline to the collection tank. During the transportation process, the cleaning medium provided by the cleaning device can clean the crystals deposited on the inner walls of the liquid delivery pipeline and the collection pipeline, thereby reducing the probability of blockage of the liquid discharge system.

[0040] In order to make the above-mentioned objects, features, and advantages of the embodiments of the present utility model more obvious and understandable, the following will describe the specific embodiments of the present utility model in detail with reference to the accompanying drawings.

[0041] Reference Figure 1 shows a schematic structural diagram of a semiconductor system in an embodiment of the present utility model. In this embodiment, the liquid discharge system M includes:

[0042] A cleaning device 11 that provides a cleaning medium;

[0043] A collection tank 12 that collects the waste liquid discharged from the semiconductor machine N;

[0044] A liquid delivery pipeline b0 having a liquid inlet b01 and a liquid outlet b02;

[0045] A liquid inlet pipeline b1 that connects the semiconductor machine N and the liquid inlet b01, and a liquid inlet valve a1 for switching the liquid inlet pipeline b1 is provided on the liquid inlet pipeline b1;

[0046] A cleaning pipeline b2 that connects the cleaning device 11 and the liquid inlet b01, and a cleaning valve a2 for switching the cleaning pipeline b2 is provided on the cleaning pipeline b2;

[0047] A collection pipeline b3 that connects the collection tank 12 and the liquid outlet b02.

[0048] In this embodiment, the cleaning medium can be water. In this way, the water provided by the cleaning device can wash and dissolve the crystals deposited on the inner walls of the liquid delivery pipeline and the collection pipeline, thereby reducing the probability of blockage of the liquid discharge system.

[0049] It should be understood that the above embodiments are only for illustrative purposes, used to illustrate the types of cleaning media that the cleaning device 11 may provide, and should not be construed as a limitation on the types of liquids actually provided by the cleaning device 11 in the present utility model. Any gas or solution that those skilled in the art can recognize as being capable of removing the crystals deposited on the inner walls of the infusion line b0 and the collection line b3 can be equivalently substituted for the cleaning media in the present utility model. For example, in other examples, the cleaning device 11 can also provide an acid cleaning agent adapted to the crystal composition to remove the crystals deposited on the inner walls of the infusion line b0 and the collection line b3.

[0050] In this embodiment, the liquid inlet valve a1 is used to open and close the liquid inlet line b1.

[0051] In this way, when the semiconductor machine N needs to discharge waste liquid, the liquid inlet valve a1 opens the liquid inlet line b1, enabling the waste liquid to enter the collection tank 12 through the infusion line b0 and the collection line b3; when the infusion line b0 needs to be cleaned, the liquid inlet valve a1 closes the liquid inlet line b1, which can prevent the water in the cleaning line b2 from entering the semiconductor machine N through the liquid inlet line b1 during the cleaning process, thereby reducing the probability of damaging the semiconductor machine N.

[0052] In this embodiment, the cleaning valve a2 is used to open and close the cleaning line b2.

[0053] In this way, when the infusion line b0 needs to be cleaned, the cleaning valve a2 opens the cleaning line b2, enabling water to enter the infusion line b0 and the collection line b3. During the transportation process, the water can wash and dissolve the crystals deposited on the inner walls of the infusion line b0 and the collection line b3, thereby reducing the probability of blockage of the liquid discharge system M; when the semiconductor machine N needs to discharge waste liquid, the cleaning valve a2 closes the cleaning line b2, which can prevent the waste liquid in the liquid inlet line b1 from entering the cleaning device 11 through the cleaning line b2 during the liquid discharge process, thereby reducing the probability of damaging and polluting the cleaning device 11.

[0054] In this embodiment, the height of the liquid inlet line b1 is not lower than the height of the infusion line b0, and the height of the infusion line b0 is not lower than the height of the collection line b3. In this way, when the semiconductor machine N discharges waste liquid, the waste liquid can naturally enter the collection tank 12 under the action of gravity.

[0055] In this embodiment, the height of the cleaning line b2 is not lower than the height of the infusion line b0. In this way, when the cleaning line b2 supplies water, the water can naturally enter the infusion line b0 under the action of gravity. In other examples, the height of the cleaning line b2 can also be lower than the height of the infusion line b0. At this time, the flow direction of the water is related to the water pressure provided by the cleaning device 11.

[0056] To further reduce the probability of blockage of the liquid drainage system M, in this embodiment, the liquid drainage system M may further include: a pressurizing device (not shown in the figure) disposed on the cleaning pipeline b2, and the pressurizing device is used to increase the water pressure. In this way, when the cleaning valve a2 opens the cleaning pipeline b2, the pressurizing device can increase the pressure and the water flow rate in the cleaning pipeline b2, the infusion pipeline b0, and the collection pipeline b3, which means that it can increase the scouring force of water on the crystals deposited on the inner walls of the infusion pipeline b0 and the collection pipeline b3, thereby further reducing the probability of blockage of the liquid drainage system M.

[0057] In other examples, the pressurizing device may also be integrally disposed on the cleaning device 11. Specifically, the integral setting can simplify the installation process and reduce the installation time.

[0058] In this embodiment, the liquid drainage system M may further include: a purification device 13 for purifying the waste liquid; and a purification pipeline b4 for connecting the purification device 13 and the liquid outlet b02.

[0059] In this way, part of the waste liquid and water that originally entered the collection tank 12 through the collection pipeline b3 can enter the purification device 13 through the purification pipeline b4, and after being purified by the purification device 13, it can be directly discharged into the municipal sewage treatment plant, so that the amount of waste liquid and water entering the collection tank 12 through the collection pipeline b3 can be reduced, and the collection pressure of the collection tank 12 can be relieved.

[0060] To reduce the energy consumption of the liquid drainage system M, in this embodiment, the height of the infusion pipeline b0 is not lower than the height of the purification pipeline b4. In this way, when there is a solution in the infusion pipeline b0, the solution can naturally enter the purification pipeline b4 under the action of gravity, thereby reducing the energy consumption of the liquid drainage system M.

[0061] In other examples, the height of the infusion pipeline b0 may also be lower than the height of the purification pipeline b4. At this time, the solution can enter the purification pipeline b4 under the drive of the pressurizing device.

[0062] To maintain the concentration of the waste liquid in the collection tank 12, in this embodiment, a collection valve a3 for opening and closing the collection pipeline b3 is provided on the collection pipeline b3.

[0063] In this way, when the semiconductor machine N needs to discharge the waste liquid, by opening the collection pipeline b3 through the collection valve a3, the waste liquid can enter the collection tank 12 through the infusion pipeline b0 and the collection pipeline b3; when the infusion pipeline b0 needs to be cleaned, by closing the collection pipeline b3 through the collection valve a3, it can be avoided that water enters the collection tank 12 through the collection pipeline b3 and reduces the concentration of the waste liquid in the collection tank 12. That is, the collection tank 12 can selectively store the liquid through the collection valve a3, which can maintain the concentration of the waste liquid in the collection tank 12 and facilitate the subsequent recycling of the waste liquid.

[0064] In order to reduce the purification pressure of the purification device 13, in this embodiment, a purification valve a4 for switching the purification pipeline b4 is provided on the purification pipeline b4.

[0065] In this way, when the semiconductor machine N needs to discharge waste liquid, by closing the purification pipeline b4 through the purification valve a4, it is possible to prevent the high-concentration waste liquid from entering the purification device 13 through the purification pipeline b4; when it is necessary to clean the infusion pipeline b0, by opening the purification pipeline b4 through the purification valve a4, water can carry the flushing and dissolve some of the crystals deposited on the inner wall of the infusion pipeline b0 into the purification device 13. Therefore, the purification device 13 only needs to purify the crystals carried and dissolved in the water, and the purification pressure of the purification device 13 is reduced.

[0066] It should be noted that the waste liquid discharged from the semiconductor machine N may include one or more of phosphoric acid waste liquid, sulfuric acid waste liquid, nitric acid waste liquid, etc., which can deposit crystals on the inner wall of the pipeline of the drainage system M. In this embodiment, the waste liquid discharged from the semiconductor machine N is phosphoric acid waste liquid.

[0067] Correspondingly, the purification device 13 can be a fluorine-containing wastewater treatment device, which is used to treat phosphoric acid waste liquid. The waste liquid purified by the fluorine-containing wastewater treatment device can be directly discharged into the municipal sewage treatment plant. Among them, the fluorine-containing wastewater treatment device can refer to the existing fluorine-containing wastewater treatment device, which will not be elaborated here.

[0068] It can be understood that the above embodiments are only for illustrative purposes, used to illustrate the possible structure of the purification device 13 for treating phosphoric acid waste liquid, and cannot be understood as a limitation on the actual structure of the purification device 13 in the present invention. Any possible purification device 13 for treating phosphoric acid waste liquid that can be recognized by those skilled in the art can be equivalently replaced with the fluorine-containing wastewater treatment device in the present invention.

[0069] In order to improve the automation level of the drainage system M, the drainage system M may further include a control device (not shown in the figure). The control device can be connected to at least one of the inlet valve a1, the cleaning valve a2, the collection valve a3, or the purification valve a4. In this way, the valve connected to the control device can switch the corresponding pipeline according to the control signal of the control device.

[0070] In this embodiment, the control device is respectively connected to the inlet valve a1, the cleaning valve a2, the collection valve a3, and the purification valve a4, and respectively controls the opening and closing of the inlet valve a1, the cleaning valve a2, the collection valve a3, and the purification valve a4.

[0071] When the semiconductor machine N needs to drain the waste liquid, the liquid inlet valve a1 and the collection valve a3 open the liquid inlet pipeline b1 and the collection pipeline b3 respectively according to the control signal of the control device, and the cleaning valve a2 and the purification valve a4 close the cleaning pipeline b2 and the purification pipeline b4 respectively according to the control signal of the control device, so that the waste liquid in the current infusion pipeline b0 only enters the collection tank 12; when the infusion pipeline b0 needs to be cleaned, the liquid inlet valve a1 and the collection valve a3 close the liquid inlet pipeline b1 and the collection pipeline b3 respectively according to the control signal of the control device, and the cleaning valve a2 and the purification valve a4 open the cleaning pipeline b2 and the purification pipeline b4 respectively according to the control signal of the control device, so that the water in the current infusion pipeline b0 only enters the purification device 13.

[0072] It should be noted that the cleaning frequency and cleaning time of the infusion pipeline b0 can be adjusted according to the production situation. In this embodiment, the control device can control the opening and closing of the liquid inlet valve a1, the cleaning valve a2, the collection valve a3 and the purification valve a4, and the infusion pipeline b0 is cleaned once a day at a preset time, and each cleaning lasts for two minutes.

[0073] In this embodiment, the liquid inlet valve a1, the cleaning valve a2, the collection valve a3 and the purification valve a4 are pneumatic control valves. Correspondingly, the liquid inlet valve a1, the cleaning valve a2, the collection valve a3 and the purification valve a4 can open and close the corresponding pipelines according to the pneumatic control signals issued by the control device.

[0074] It can be understood that the above embodiments are only for illustrative purposes, used to illustrate the possible types of the liquid inlet valve a1, the cleaning valve a2, the collection valve a3 and the purification valve a4, and cannot be construed as a limitation on the types of the liquid inlet valve a1, the cleaning valve a2, the collection valve a3 and the purification valve a4 in the present invention. Any valve that can open and close the corresponding pipeline according to the control signal of the control device recognized by those skilled in the art can be equivalently replaced with the pneumatic control valve in the present invention. For example, in other examples, the liquid inlet valve a1, the cleaning valve a2, the collection valve a3 and the purification valve a4 can also be one of an electric control valve, a liquid valve or other valves.

[0075] It should be noted that in order to reduce the downtime of the liquid discharge system M and improve production efficiency, the number of the collection tanks 12 can also be multiple, the number of the collection pipelines b3 can be multiple, and the number of the collection valves a3 can be multiple; among them, one collection tank 12 corresponds to one collection pipeline b3, and one collection pipeline b3 corresponds to one collection valve a3. Correspondingly, the control device is respectively connected to multiple collection valves a3.

[0076] In this embodiment, the number of the collection tanks 12 is two, the number of the collection pipelines b3 and the collection valves a3 is adapted to the number of the collection tanks 12, and the control device is respectively pneumatically connected to the two collection valves a3.

[0077] When the current collection tank 12 needs to be shut down (for example, reaching the maximum collection volume, preventive maintenance, or malfunction), the control device can timely switch to another collection tank 12 to receive the waste liquid. That is, by setting two collection tanks 12 in a one - in - use and one - standby mode, the control device can ensure the continuous operation of the liquid discharge system M and avoid the shutdown of the liquid discharge system M caused by the shutdown of the collection tank 12.

[0078] To monitor the collection volume of the waste liquid in the collection tank 12, in this embodiment, the collection tank 12 may be provided with a sensor (not shown in the figure), and the sensor is electrically connected to the control device. In this way, the sensor can send the situation of the collection volume of the waste liquid in the collection tank 12 to the control device in real - time. When the collection volume of the waste liquid in the collection tank 12 reaches a preset value, the control device can control the collection valve a3 corresponding to the current collection tank 12 to close the corresponding collection pipeline b3 according to the signal sent by the sensor.

[0079] It should be noted that the sensor can be one or more of a pressure sensor, an ultrasonic sensor, a capacitance sensor, etc. In this embodiment, the sensor is a pressure sensor.

[0080] Correspondingly, continuing to refer to Figure 1 , the present utility model further provides a semiconductor system, including:

[0081] A semiconductor machine N having a liquid discharge port (not shown in the figure);

[0082] The liquid discharge system M described in any of the foregoing embodiments, and the liquid inlet pipeline b1 of the liquid discharge system M is communicated with the liquid discharge port.

[0083] In the semiconductor system provided by the embodiment of the present utility model, when the liquid inlet valve is opened and the cleaning valve is closed, the waste liquid discharged from the liquid discharge port of the semiconductor machine is transported to the collection tank for storage through the liquid inlet pipeline, the liquid delivery pipeline, and the collection pipeline; when the liquid inlet valve is closed and the cleaning valve is opened, the cleaning medium provided by the cleaning device is transported to the collection tank through the cleaning pipeline, the liquid delivery pipeline, and the collection pipeline. During the transportation process, the cleaning medium provided by the cleaning device can clean the crystals deposited on the inner walls of the liquid delivery pipeline and the collection pipeline, thereby reducing the probability of blockage of the liquid discharge system.

[0084] It can be understood that the above - mentioned embodiments provide multiple implementation schemes, and each implementation scheme can be combined and cross - referenced with each other without conflict, thereby extending multiple possible implementation schemes, all of which can be considered as the implementation schemes disclosed and made public in the embodiments of the present application.

[0085] It should be noted that the "example" or "embodiment" mentioned in this specification refers to specific features, structures, or characteristics that can be included in at least one implementation mode of the embodiment of the present utility model.

[0086] Although the embodiments of the present utility model are disclosed as above, the present utility model is not limited thereto. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the present utility model. Therefore, the protection scope of this specification shall be subject to the scope defined by the claims.

Claims

1. A liquid drainage system, characterized in that, Comprising: A cleaning device for providing a cleaning medium; A collection tank for collecting the waste liquid discharged from the semiconductor machine tool; An infusion pipeline having an inlet and an outlet; An inlet pipeline connecting the semiconductor machine tool and the inlet, and an inlet valve for switching the inlet pipeline is provided on the inlet pipeline; A cleaning pipeline connecting the cleaning device and the inlet, and a cleaning valve for switching the cleaning pipeline is provided on the cleaning pipeline; A collection pipeline connecting the collection tank and the outlet.

2. The liquid drainage system according to claim 1, wherein Further comprising: A pressurizing device for increasing the pressure of the cleaning medium, and the pressurizing device is arranged on the cleaning pipeline.

3. The drainage system according to claim 1, characterized in that, Further comprising: A purification device for purifying the waste liquid; A purification pipeline connecting the purification device and the outlet, and a purification valve for switching the purification pipeline is provided on the purification pipeline; A collection valve for switching the collection pipeline is provided on the collection pipeline.

4. The liquid drainage system according to claim 3, characterized in that, Further comprising: A control device respectively connected to the inlet valve, the cleaning valve, the collection valve and the purification valve, and respectively controlling the opening and closing of the inlet valve, the cleaning valve, the collection valve and the purification valve.

5. The drainage system according to claim 4, characterized in that, The inlet valve, the cleaning valve, the collection valve and the purification valve are all pneumatic control valves; The control device is respectively pneumatically connected to the inlet valve, the cleaning valve, the collection valve and the purification valve.

6. The liquid drainage system according to claim 4, wherein, The number of the collection tanks is multiple, the number of the collection pipelines is multiple, and the number of the collection valves is multiple; wherein, one collection tank corresponds to one collection pipeline, and one collection pipeline corresponds to one collection valve; The control device is respectively connected to multiple collection valves.

7. The liquid drainage system according to claim 4, wherein, The collection tank has: A sensor for monitoring the liquid level height of the waste liquid in the collection tank, and the sensor is electrically connected to the control device.

8. The liquid drainage system according to claim 3, characterized in that, The height of the cleaning pipeline is not lower than the height of the infusion pipeline, and the height of the infusion pipeline is not lower than the height of the purification pipeline.

9. The liquid drainage system according to claim 1, wherein The height of the inlet pipeline is not lower than the height of the infusion pipeline, and the height of the infusion pipeline is not lower than the height of the collection pipeline.

10. A semiconductor system, characterized in that, Comprising: A semiconductor machine tool having a liquid discharge port; The liquid discharge system according to any one of claims 1-9, and the inlet pipeline of the liquid discharge system is communicated with the liquid discharge port.

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