Holographic grating exposure device and holographic grating preparation system

Abstract

The utility model discloses a holographic grating exposure device and a holographic grating preparation system, the holographic grating exposure device comprises a holographic plate, a light guide prism and a light source assembly, the light guide prism is arranged on the holographic plate, and a matching liquid layer is arranged between the holographic plate and the light guide prism; a contact surface facing the holographic plate and a first light incident surface adjacent to the contact surface are arranged on the light guide prism; the light source assembly is used for emitting a first light beam and a second light beam, the first light beam is vertically emitted to the holographic plate, and the second light beam is vertically emitted to the first light incident surface and is emitted to the holographic plate at a total reflection angle in the light guide prism; and the second light beam and the first light beam are simultaneously emitted to the same exposure area on the holographic plate. The second light beam enters the holographic plate from the light guide prism and enters the holographic plate at a total reflection angle, the first light beam and the second light beam form interference fringes in the holographic plate, and a large-size holographic grating can be prepared.

Description

Technical Field

[0001] The utility model relates to the technical field of holographic grating exposure, in particular to a holographic grating exposure device and a holographic grating preparation system. Background Art

[0002] As a diffractive optical element, the holographic grating is widely used because it is easy to fabricate, low in cost, and can achieve a high diffraction efficiency when the Bragg condition is satisfied. Currently, most of the holographic gratings used are small-sized ones, which can be formed by single exposure. However, with the gradual expansion of the application fields of diffractive optical waveguides, there is now a high demand for large-sized holographic gratings. When a large-sized holographic grating is applied in an optical waveguide display system, it is required that the light can be totally reflected and propagated inside the waveguide after being coupled into the holographic grating. To meet this characteristic, during the preparation process, one of the two coherent light beams is required to enter the substrate at the total reflection angle.

[0003] However, in the existing exposure process, the exposure device directly emits light beams into the air and irradiates the substrate material. The light directly enters the substrate material from the air, and the refraction angle is limited, making it difficult to meet the preparation conditions for holographic gratings used in waveguides. In addition, the exposure position of the exposure device is fixed, and the irradiation area is limited. When preparing a large-sized holographic grating, large-sized components or significant movement of the substrate material are required, which is inconvenient to operate.

[0004] Therefore, the existing technology still needs to be improved and developed. Summary of the Utility Model

[0005] In view of the above deficiencies in the prior art, the purpose of the present utility model is to provide a holographic grating exposure device and a holographic grating preparation system, aiming to solve the problem that the existing exposure technology cannot be applied to the preparation of large-sized holographic gratings.

[0006] The technical solution of the present utility model is as follows:

[0007] A holographic grating exposure device, which includes a holographic plate, a light guiding prism, and a light source assembly. The light guiding prism is disposed on the holographic plate, and a matching liquid layer is provided between the holographic plate and the light guiding prism. The light guiding prism is provided with a contact surface facing the holographic plate and a first light incident surface adjacent to the contact surface. The light source assembly is used to emit a first light beam and a second light beam. The first light beam is perpendicularly incident on the holographic plate, and the second light beam is perpendicularly incident on the first light incident surface and is incident on the holographic plate at the total reflection angle in the light guiding prism. And the second light beam and the first light beam are simultaneously incident on the same exposure area on the holographic plate.

[0008] The holographic grating exposure device described above, wherein the first light beam is perpendicularly incident on the side of the holographic dry plate facing away from the light guiding prism; alternatively, a second light incident surface parallel to the contact surface is further provided on the light guiding prism, the first light beam is perpendicularly incident on the second light incident surface, and enters the holographic dry plate through the light guiding prism.

[0009] The holographic grating exposure device described above, wherein the light source assembly includes an emission source, a beam splitter, a first reflection assembly, and a second reflection assembly, the beam splitter is disposed on the light path of the light emitted by the emission source; the beam splitter is used to divide the source light beam emitted by the emission source into the first light beam and the second light beam; the first reflection assembly is disposed on the light path of the first light beam, and is used to reflect the first light beam to the holographic dry plate; the second reflection assembly is disposed on the light path of the second light beam, and is used to reflect the second light beam to the light guiding prism.

[0010] The holographic grating exposure device described above, wherein the first reflection assembly includes a first driving member and a first reflecting member, the first reflecting member is used to reflect the first light beam; the first driving member is connected to the first reflecting member, and is used to drive the first reflecting member to move along the direction in which the first light beam exits the beam splitter.

[0011] The holographic grating exposure device described above, wherein the second reflection assembly includes a second driving member and a second reflecting member, the second reflecting member is used to reflect the second light beam; the second driving member is connected to the second reflecting member, and is used to drive the second reflecting member to move along the direction in which the second light beam exits the beam splitter.

[0012] The holographic grating exposure device described above, wherein the first reflection assembly includes a first displacement platform, a first reflecting mirror, and a second reflecting mirror, a first motion track arranged along the light path of the first light beam and a second motion track arranged perpendicular to the light path of the first light beam are provided on the first displacement platform; the second motion track is slidably disposed on the first motion track; the first reflecting mirror and the second reflecting mirror are oppositely disposed on the second motion track, and the second reflecting mirror can move in a direction towards or away from the first reflecting mirror; the first light beam is reflected by the first reflecting mirror and the second reflecting mirror in sequence to be incident on the holographic dry plate.

[0013] The holographic grating exposure device described above, wherein the second reflection assembly includes a second displacement platform, a third reflector, and a fourth reflector. The second displacement platform is provided with a third motion track arranged along the optical path of the second light beam and a fourth motion track arranged perpendicular to the optical path of the second light beam; the third motion track is slidably disposed on the fourth motion track; the third reflector and the fourth reflector are oppositely disposed on the fourth motion track, and the fourth reflector can move in a direction towards or away from the third reflector; the second light beam is sequentially reflected by the third reflector and the fourth reflector to be incident on the light guiding prism.

[0014] The holographic grating exposure device described above, wherein the light source assembly further includes a beam expander and a collimator. The beam expander and the collimator are arranged along the optical path direction between the emission source and the beam splitter. The beam expander is used to expand the diameter of the source light beam emitted by the emission source; the collimator is used to collimate and guide the expanded light beam to the beam splitter.

[0015] The holographic grating exposure device described above, wherein the light source assembly further includes an electronic shutter. The electronic shutter is disposed between the emission source and the beam expander and is used to block the optical path.

[0016] This application also discloses a holographic grating preparation system, which includes the holographic grating exposure device described in any one of the above.

[0017] Compared with the prior art, the embodiments of the present utility model have the following advantages:

[0018] The holographic grating exposure device disclosed by the present utility model sets a light source assembly to emit two laser light beams as coherent light to expose a holographic dry plate. The first light beam is vertically incident on the holographic dry plate; the second light beam is first vertically incident on the light guiding prism, propagates from an air medium to a solid medium, and then is incident on the holographic dry plate from the light guiding prism. Thus, the incident angle of the second light beam incident on the holographic dry plate can be greater than the critical angle of the holographic dry plate. The second light beam and the first light beam interfere in the holographic dry plate, and a holographic grating applicable to optical waveguide display is prepared.

[0019] In addition, the light source assembly synchronously controls the first light beam and the second light beam, exposes the same area on the holographic dry plate during a single exposure process, and can synchronously adjust the irradiation positions of the first light beam and the second light beam after the single exposure is completed, so as to perform multiple exposures and perform a scanning exposure operation on the holographic dry plate to prepare a large-size holographic grating.

[0020] In summary, the present utility model realizes the interference of coherent light in the holographic dry plate by setting a light guiding prism, and realizes the preparation of a large-size holographic grating for an optical waveguide system by synchronously regulating the exposure positions of the first light beam and the second light beam by the light source assembly. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings required in the description of the embodiments or the prior art. Obviously, the drawings in the following description are only some embodiments recorded in the present invention. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings.

[0022] Figure 1 It is a schematic structural diagram of a holographic grating exposure device in an embodiment of the present invention;

[0023] Figure 2 It is an optical path diagram of a partial structure of a holographic grating exposure device in an embodiment of the present invention;

[0024] Figure 3 It is an optical path diagram of a partial structure of a holographic grating exposure device in another embodiment of the present invention;

[0025] Figure 4 It is an exposure effect diagram of a holographic dry plate in an embodiment of the present invention;

[0026] Figure 5 It is an exposure effect diagram of a holographic dry plate in another embodiment of the present invention.

[0027] Among them, 100, holographic dry plate; 200, light guide prism; 210, contact surface; 220, first light incident surface; 300, light source assembly; 310, emission source; 320, beam splitter; 330, first reflection assembly; 331, first driving member; 332, first reflector; 333, first displacement platform; 3331, first movement track; 3332, second movement track; 334, first mirror; 335, second mirror; 340, second reflection assembly; 341, second driving member; 342, second reflector; 343, second displacement platform; 3431, third movement track; 3432, fourth movement track; 344, third mirror; 345, fourth mirror; 350, beam expander; 360, collimator; 370, electronic shutter. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0028] In order to enable those skilled in the art to better understand the solution of the present invention, the following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, rather than all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts belong to the scope of protection of the present invention.

[0029] Referring to Figure 1 , in an embodiment of the present utility model application, a holographic grating exposure device is disclosed, which includes a holographic dry plate 100, a light guiding prism 200, and a light source assembly 300. The light guiding prism 200 is disposed on the holographic dry plate 100, and a matching liquid layer is provided between the holographic dry plate 100 and the light guiding prism 200. The light guiding prism 200 is provided with a contact surface 210 facing the holographic dry plate 100 and a first light incident surface 220 adjacent to the contact surface 210. The light source assembly 300 is configured to emit a first light beam and a second light beam. The first light beam is perpendicularly incident on the holographic dry plate 100, and the second light beam is perpendicularly incident on the first light incident surface 220 and is incident on the holographic dry plate 100 at a total reflection angle in the light guiding prism 200. And the second light beam and the first light beam are simultaneously incident on the same exposure area on the holographic dry plate 100.

[0030] The holographic grating exposure device disclosed in this embodiment is provided with a light source assembly 300 that emits two laser light beams as coherent light to expose the holographic dry plate 100. The first light beam is perpendicularly incident on the holographic dry plate 100. The second light beam is first perpendicularly incident on the light guiding prism 200, propagates from an air medium to a solid medium, and then is incident on the holographic dry plate 100 through the light guiding prism 200. Thus, the incident angle of the second light beam incident on the holographic dry plate 100 can be greater than the critical angle of the holographic dry plate 100. The second light beam and the first light beam interfere in the holographic dry plate, and a holographic grating applicable to waveguide display is prepared.

[0031] Specifically, the surface area of the holographic dry plate 100 disclosed in this embodiment can be greater than or equal to the area of the contact surface 210 of the light guiding prism 200. The light source assembly 300 synchronously controls the first light beam and the second light beam, and can emit light beams for single exposure, or can perform scanning multiple exposures at different positions on the holographic dry plate 100, so as to achieve the effect of zonal exposure and realize the production of a large-size holographic grating.

[0032] In summary, this embodiment realizes the interference of coherent light in the holographic dry plate 100 by setting the light guiding prism 200, and realizes the preparation of a large-size holographic grating for a waveguide system by synchronously regulating the exposure positions of the first light beam and the second light beam through the light source assembly 300.

[0033] Specifically, the holographic dry plate 100 disclosed in this embodiment can use glass or quartz material as the substrate, and an exposure material is coated on the substrate to make any one of a silver salt material holographic dry plate, a dichromate gelatin holographic dry plate, a photorefractive material holographic dry plate, a photopolymer holographic dry plate, a photochromic material holographic dry plate, and a photoanisotropic material holographic dry plate. Different materials can be selected to prepare the holographic dry plate 100 according to different grating performance requirements during the production process.

[0034] Specifically, in this embodiment, a matching liquid layer is provided between the holographic dry plate 100 and the light guide prism 200. The refractive index matching liquid has a refractive index close to that of the holographic dry plate 100, which can reduce the reflection at the interface between the holographic dry plate 100 and the light guide prism 200, so that the second light beam can enter the holographic dry plate 100 more smoothly. In addition, the refractive index matching liquid is viscous, and the formed matching liquid layer can serve as an adhesive layer to connect and fix the holographic dry plate 100 and the light guide prism 200, ensuring the stability and safety of the light guide prism 200 during use, and enabling the light guide prism 200 to play a light guiding role accurately and efficiently.

[0035] Specifically, in one implementation manner of this embodiment, the first light beam is vertically incident on the side of the holographic dry plate 100 facing away from the light guide prism 200. In this embodiment, the first light beam is vertically incident on the holographic dry plate 100, so it can be directly incident from the air medium, and the exposure effect is good. The first light beam is incident from one side of the holographic dry plate 100, and the light guide prism 200 is arranged on the other side of the holographic dry plate 100, and the second light beam is incident from the catheter prism. Therefore, the two do not interfere with each other, the optical path design is simple, which is beneficial to improving the exposure efficiency and exposure effect.

[0036] Specifically, in another implementation manner of this embodiment, the light guide prism 200 is further provided with a second light incident surface parallel to the contact surface 210, and the first light beam is vertically incident on the second light incident surface and enters the holographic dry plate 100 through the light guide prism 200. In this embodiment, the first light beam and the second light beam can also be incident from the same side to reduce the occupied space of the exposure device. The second light incident surface is parallel to the contact surface 210. Therefore, after the first light beam is vertically incident on the second light incident surface, it continues to propagate, vertically incident on the contact surface 210, and thus vertically enters the holographic dry plate 100.

[0037] It can be seen that the shape of the light guide prism 200 in this embodiment is not limited, and different shapes can be designed according to the actual manufacturing environment and manufacturing requirements.

[0038] Specifically, in another implementation manner of this embodiment, the light guiding prism 200 is set as a triangular prism with a right triangle cross-sectional shape. One of the right-angled surfaces is the first light incident surface 220, and the inclined surface is set as the contact surface 210. The second light beam is perpendicularly incident from the right-angled surface. Therefore, the angle of the incident angle of the second light beam on the holographic dry plate 100, that is, the included angle between the right-angled surface and the inclined surface. That is to say, in this embodiment, the light guiding prism 200 with an included angle between the right-angled surface and the inclined surface greater than the critical angle can be manufactured through calculation, thereby controlling the angle of the second light beam incident on the holographic dry plate 100. In addition, the first light beam is perpendicularly incident on the holographic dry plate 100, so its incident angle and incident position are also calculable.

[0039] In summary, in this embodiment, the propagation paths of the first light beam and the second light beam in the holographic dry plate 100 can be accurately calculated, so that the shape of the interference fringes on the holographic dry plate 100 can be accurately designed, and thus the effect of manufacturing a holographic grating with high precision can be achieved.

[0040] As Figure 1 shown, as an implementation manner of this embodiment, it is disclosed that the light source assembly 300 includes a light emitting source 310, a beam splitter 320, a first reflection assembly 330, and a second reflection assembly 340. The beam splitter 320 is disposed on the light path of the light emitted by the light emitting source 310. The beam splitter 320 is used to divide the source light beam emitted by the light emitting source 310 into the first light beam and the second light beam. The first reflection assembly 330 is disposed on the light path of the first light beam and is used to reflect the first light beam to the holographic dry plate 100. The second reflection assembly 340 is disposed on the light path of the second light beam and is used to reflect the second light beam to the light guiding prism 200.

[0041] In this embodiment, a laser emitter is used as the light emitting source 310 to emit a source light beam. The source light beam is split into two by the beam splitter 320 to form a first light beam and a second light beam, and then guided to the holographic dry plate 100. The structure is simple and the optical path design is simple, which is beneficial to saving space and facilitating operation. Specifically, the beam splitter 320 adopts a beam splitting prism, which can split the source light beam into a first light beam and a second light beam with perpendicular optical paths. The holographic dry plate 100 and the light guiding prism 200 are arranged between the optical paths of the two light beams, and are reflected by the first reflection assembly 330 and the second reflection assembly 340, and finally the first light beam and the second light beam are both guided to the holographic dry plate 100.

[0042] As Figure 2As shown, as another implementation manner of this embodiment, it is disclosed that the first reflection component 330 includes a first driving member 331 and a first reflecting member 332. The first reflecting member 332 is used to reflect the first light beam; the first driving member 331 is connected to the first reflecting member 332 and is used to drive the first reflecting member 332 to move along the direction in which the first light beam exits the beam splitter 320.

[0043] In this embodiment, the holographic grating disclosed is a large-sized holographic grating. During the exposure process, due to the limited radius of the light beam, exposure can only be carried out in partitions. Therefore, the first driving member 331 is set to drive the first reflecting member 332 to move, so as to perform multiple consecutive exposures, so as to cover all areas on the holographic dry plate 100 and complete the complete exposure process.

[0044] Specifically, the first reflecting member 332 can be set as a reflector, and a connector is arranged on the back of the reflector; the first driving member 331 can be set as a motor or an electric motor, a transmission rod is connected to the output end of the first driving member 331, and the transmission rod is connected to the connector on the reflector, so as to realize mechanical transmission, so as to accurately and efficiently control the position of the first reflecting member 332, so that the position control accuracy of the first light beam hitting the holographic dry plate 100 is high, so as to accurately perform partition exposure.

[0045] Another example is Figure 2 As shown, as another implementation manner of this embodiment, it is disclosed that the second reflection component 340 includes a second driving member 341 and a second reflecting member 342. The second reflecting member 342 is used to reflect the second light beam; the second driving member 341 is connected to the second reflecting member 342 and is used to drive the second reflecting member 342 to move along the direction in which the second light beam exits the beam splitter 320.

[0046] In this embodiment, the structure of the second driving member 341 is the same as that of the first driving member 331, and the structure of the second reflecting member 342 is the same as that of the first reflecting member 332. By driving the second reflecting member 342 to move, the second driving member 341 can adjust the position where the second light beam enters the holographic dry plate 100, so as to accurately cooperate with the first light beam and expose in the target exposure area to generate interference fringes.

[0047] In summary, the first reflection component 330 and the second reflection component 340 disclosed in this embodiment are movable, so that holographic gratings of any large size can be prepared. For example Figure 4 As shown, during the preparation process, only the position where the exposure light beam is aligned needs to be moved. After multiple exposures, a holographic grating with partition exposure can be prepared for use in an optical waveguide. Compared with the traditional exposure process, it is not necessary to use large-aperture optical elements for exposure, which reduces the manufacturing difficulty and facilitates processing and alignment.

[0048] In addition, in this embodiment, the size of the holographic dry plate 100 is large, and the contact surface 210 with the light guide prism 200 is large. Therefore, the area of the matching liquid layer is also large. During the process of multiple exposures, if the holographic dry plate 100 or the light guide prism 200 is moved, the matching liquid layer will be disturbed, resulting in a long waiting time between two exposures. Therefore, by moving the first reflector 332 and the second reflector 342, the operation is simplified, which is beneficial to shortening the waiting time between two exposures and improving production efficiency.

[0049] As Figure 3 shown, as another implementation manner of this embodiment, it is disclosed that the first reflection assembly 330 includes a first displacement platform 333, a first reflector 334, and a second reflector 335. The first displacement platform 333 is provided with a first movement track 3331 arranged along the optical path of the first light beam and a second movement track 3332 arranged perpendicular to the optical path of the first light beam; the second movement track 3332 is slidably arranged on the first movement track 3331; the first reflector 334 and the second reflector 335 are oppositely arranged on the second movement track 3332, and the second reflector 335 can move in a direction towards or away from the first reflector 334; the first light beam is reflected by the first reflector 334 and the second reflector 335 in sequence to be directed towards the holographic dry plate 100.

[0050] In this embodiment, by arranging the first movement track 3331 on the first displacement platform 333 and slidably arranging the second movement track 3332 on the first movement track 3331, the first reflector 334 and the second reflector 335 on the second movement track 3332 can move synchronously in a direction towards or away from the beam splitter 320; the second reflector 335 is slidably arranged on the second movement track 3332 and can move towards or away from the first reflector 334, so that the first light beam is directed towards the holographic dry plate 100 through two reflections.

[0051] Specifically, by controlling the movement of the first reflector 334 and the movement of the second reflector 335, two-direction control can be achieved, that is, two-dimensional adjustment of the optical path of the first light beam, thereby improving the control flexibility of the exposure position and exposure area on the holographic dry plate, so as to accurately and efficiently prepare holographic gratings on the large-sized holographic dry plate 100.

[0052] Specifically, the first movement track 3331 and the second movement track 3332 can both be set as lathes, slide rail vehicles, cable cars, etc. to carry and flexibly control the first reflector 334 and the second reflector 335. The first reflector 334 is arranged facing the beam splitter 320 and is located on the optical path of the first light beam. The second reflector 335 is oppositely arranged with the first reflector 334 and is arranged perpendicular to the optical path of the first light beam to direct the reflected light beam of the first reflector 334 towards the holographic dry plate 100.

[0053] During the actual exposure process of large sizes, the moving directions of the first reflector 334 and the second reflector 335 are perpendicular to each other, one being the same as the length direction of the holographic dry plate 100 and the other being the same as the width direction of the holographic dry plate, so as to cover each corner of the holographic dry plate 100 and improve the exposure efficiency.

[0054] For another example Figure 3 As shown, as another implementation manner of this embodiment, it is disclosed that the second reflection assembly 340 includes a second displacement platform 343, a third reflector 344, and a fourth reflector 345. A third motion track 3431 arranged along the optical path of the second light beam and a fourth motion track 3432 arranged perpendicular to the optical path of the second light beam are provided on the second displacement platform 343; the third motion track 3431 is slidably arranged on the fourth motion track 3432; the third reflector 344 and the fourth reflector 345 are oppositely arranged on the fourth motion track 3432, and the fourth reflector 345 can move in a direction towards or away from the third reflector 344; the second light beam is reflected by the third reflector 344 and the fourth reflector 345 in sequence to be emitted towards the light guide prism 200.

[0055] The exposure device disclosed in this embodiment requires the first light beam and the second light beam to irradiate simultaneously to achieve the interference exposure effect. Therefore, the third reflector 344 and the fourth reflector 345 are arranged on the optical path of the second light beam. The third reflector 344 and the fourth reflector 345 are driven to move by the third motion track 3431 on the second displacement platform 343, and the fourth reflector 345 can be driven independently by the fourth motion track 3432. Overall, the effect of two-dimensionally controlling the optical path of the second light beam is achieved, so that the exposure position of the second light beam on the holographic dry plate 100 can be flexibly adjusted, and it is coordinated with the first light beam to align to the same area together, so as to facilitate area-by-area exposure.

[0056] Specifically, the second displacement platform 343 disclosed in this embodiment can be set to be the same as the first displacement platform 333. Using the same platform can simplify the structure and facilitate operation. Similarly, the first reflector 334, the second reflector 335, the third reflector 344, and the fourth reflector 345 can be made of exactly the same reflectors, and the moving modes can all adopt mechanical transmission modes such as guide rails, slideways, and ropes. For example Figure 5 As shown, by two-dimensionally controlling the first light beam and the second light beam, a holographic grating for area-by-area exposure can be fabricated.

[0057] For another example Figure 1As shown, as another implementation of this embodiment, it is disclosed that the light source assembly 300 further includes a beam expander 350 and a collimator 360. The beam expander 350 and the collimator 360 are arranged between the emission source 310 and the beam splitter 320 along the optical path direction. The beam expander 350 is used to expand the diameter of the source light beam emitted by the emission source 310; the collimator 360 is used to collimate and direct the expanded light beam to the beam splitter 320.

[0058] In this embodiment, the diameter of the laser beam emitted by the emission source 310 is small. Therefore, a beam expander 350 is provided to increase the diameter of the source light beam, which is beneficial to improving the exposure efficiency. Specifically, the beam expander 350 is arranged before the beam splitter 320, so that the diameter of the light beam incident on the beam splitter 320 is large, which is beneficial to increasing the area of the holographic dry plate 100 irradiated each time. Compared with the scheme of arranging the beam expander 350 after the beam splitter 320, only one beam expander 350 needs to be set in this embodiment, and only one-time debugging is required. The operation is simple and the cost is saved.

[0059] A collimator 360 is also provided in this embodiment. The expanded light beam is collimated by the collimator 360 to ensure that the expanded light beam is parallelly incident on the beam splitter 320, so as to be divided into two parallel light beams in the beam splitter 320, reducing the problems of stray light and light leakage.

[0060] Another example Figure 1 As shown, as another implementation of this embodiment, it is disclosed that the light source assembly 300 further includes an electronic shutter 370. The electronic shutter 370 is arranged between the emission source 310 and the beam expander 350 and is used to block the optical path.

[0061] When the holographic grating exposure device disclosed in this embodiment performs multiple exposures on the holographic dry plate 100, it is necessary to close the optical path between two consecutive exposures. By setting the electronic shutter 370, the optical path of the source light beam can be blocked, which facilitates the movement of the first reflection assembly 330 and the second reflection assembly 340 and avoids light irradiation on the holographic dry plate 100 during the movement process.

[0062] As another embodiment of the present application, a holographic grating preparation system is disclosed, which includes the holographic grating exposure device described in any one of the above.

[0063] In summary, the present application discloses a holographic grating exposure device, which includes a holographic dry plate 100, a light guiding prism 200, and a light source assembly 300. The light guiding prism 200 is disposed on the holographic dry plate 100, and a matching liquid layer is provided between the holographic dry plate 100 and the light guiding prism 200. The light guiding prism 200 is provided with a contact surface 210 facing the holographic dry plate 100 and a first light incident surface 220 adjacent to the contact surface 210. The light source assembly 300 is configured to emit a first light beam and a second light beam. The first light beam is perpendicularly incident on the holographic dry plate 100, and the second light beam is perpendicularly incident on the first light incident surface 220 and is incident on the holographic dry plate 100 at a total reflection angle in the light guiding prism 200. Moreover, the second light beam and the first light beam are simultaneously incident on the same exposure area on the holographic dry plate 100. The holographic grating exposure device disclosed in this embodiment is provided with a light source assembly 300 that emits two laser light beams as coherent light to achieve the interference of the coherent light in the holographic dry plate 100. By synchronously controlling the exposure positions of the first light beam and the second light beam by the light source assembly 300, the preparation of a large-sized holographic grating for an optical waveguide system is realized.

[0064] It should be noted that, without conflict, the embodiments in the present application and the features in the embodiments can be combined with each other.

[0065] It should be noted that the present utility model takes the holographic grating exposure device and the holographic grating preparation system as examples to introduce the specific structure and working principle of the present utility model. However, the application of the present utility model is not limited to the holographic grating exposure device and the holographic grating preparation system, and can also be applied to the production and use of other similar workpieces.

[0066] It should be understood that the present utility model is not limited to the precise structure that has been described above and shown in the drawings, and various modifications and changes can be made without departing from its scope. The scope of the present utility model is only limited by the appended claims.

[0067] The above are only the preferred embodiments of the present utility model, and are not intended to limit the present utility model. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present utility model shall be included in the protection scope of the present utility model.

Claims

1. A holographic grating exposure device, characterized in that Comprising: A holographic dry plate; A light guiding prism disposed on the holographic dry plate, with a matching liquid layer provided between the holographic dry plate and the light guiding prism; the light guiding prism has a contact surface facing the holographic dry plate, and a first light incident surface adjacent to the contact surface; A light source assembly for emitting a first light beam and a second light beam, the first light beam perpendicularly incident on the holographic dry plate, the second light beam perpendicularly incident on the first light incident surface and totally reflected in the light guiding prism towards the holographic dry plate; and the second light beam and the first light beam are simultaneously incident on the same exposure area on the holographic dry plate.

2. The holographic grating exposure device according to claim 1, characterized in that, The first light beam perpendicularly irradiates the side of the holographic dry plate away from the light guiding prism; Alternatively, the light guiding prism is further provided with a second light incident surface parallel to the contact surface, the first light beam perpendicularly incident on the second light incident surface and entering the holographic dry plate through the light guiding prism.

3. The holographic grating exposure device according to claim 1, characterized in that, The light source assembly includes: An emission source; A beam splitter disposed on the light path of the emission source; the beam splitter is used to split the source beam emitted by the emission source into the first light beam and the second light beam; A first reflection assembly disposed on the light path of the first light beam for reflecting the first light beam to the holographic dry plate; A second reflection assembly disposed on the light path of the second light beam for reflecting the second light beam to the light guiding prism.

4. The holographic grating exposure device according to claim 3, wherein, The first reflection assembly includes a first driving member and a first reflecting member, the first reflecting member for reflecting the first light beam; the first driving member is connected to the first reflecting member for driving the first reflecting member to move along the direction in which the first light beam exits the beam splitter.

5. The holographic grating exposure device according to claim 3, wherein, The second reflection assembly includes a second driving member and a second reflecting member, the second reflecting member for reflecting the second light beam; the second driving member is connected to the second reflecting member for driving the second reflecting member to move along the direction in which the second light beam exits the beam splitter.

6. The holographic grating exposure device according to claim 3, characterized in that, The first reflection assembly includes: A first displacement platform having a first motion track arranged along the light path of the first light beam and a second motion track arranged perpendicular to the light path of the first light beam; the second motion track is slidably disposed on the first motion track; A first reflecting mirror and a second reflecting mirror oppositely disposed on the second motion track, the second reflecting mirror being movable in a direction towards or away from the first reflecting mirror; Wherein, the first light beam is sequentially reflected by the first reflecting mirror and the second reflecting mirror to irradiate the holographic dry plate.

7. The holographic grating exposure device according to claim 3, wherein, The second reflection assembly includes: A second displacement platform having a third motion track arranged along the light path of the second light beam and a fourth motion track arranged perpendicular to the light path of the second light beam; the third motion track is slidably disposed on the fourth motion track; A third reflecting mirror and a fourth reflecting mirror oppositely disposed on the fourth motion track, the fourth reflecting mirror being movable in a direction towards or away from the third reflecting mirror; Wherein, the second light beam is sequentially reflected by the third reflecting mirror and the fourth reflecting mirror to irradiate the light guiding prism.

8. The holographic grating exposure device according to any one of claims 3 to 7, characterized in that, The light source assembly further includes a beam expander and a collimator. The beam expander and the collimator are arranged between the emission source and the beam splitter along the optical path direction. The beam expander is used to expand the diameter of the source beam emitted by the emission source; the collimator is used to collimate and direct the expanded beam to the beam splitter.

9. The holographic grating exposure device according to claim 8, wherein The light source assembly further includes an electronic shutter, which is arranged between the emission source and the beam expander and is used to block the optical path.

10. A holographic grating preparation system, characterized in that, It includes the holographic grating exposure device according to any one of claims 1 to 9.

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