Mask quality management system

Abstract

The utility model relates to a mask quality management system. The mask quality management system includes: a mask including a mask frame and a plurality of mask sheets fixed to an upper surface of the mask frame and disposed to be spaced apart from each other; a stage on which the mask is disposed; and a first module disposed on the stage and configured to measure a degree of sagging of the mask sheet from the mask frame by irradiating the mask with strong light.

Description

Technical Field

[0001] The present disclosure relates to a mask quality management system, and more particularly, to a mask quality management system used in a manufacturing process of a display device. Background Art

[0002] A mask can be used in a manufacturing process of a display device. A plurality of openings are defined in the mask. The plurality of openings defined in the mask have a specific size, a specific shape, and a specific arrangement. SUMMARY OF THE UTILITY MODEL

[0003] When the size, shape, arrangement, etc. of the plurality of openings defined in the mask are different from the design, the quality of the display device may deteriorate. For example, an un-deposited shadow area may appear in the display device.

[0004] The present disclosure relates to a mask quality management system having improved measurement speed and measurement accuracy.

[0005] The present disclosure relates to a mask quality management system capable of removing foreign matter from the surface of a mask sheet.

[0006] An embodiment of the mask quality management system includes: a mask including a mask frame and a plurality of mask sheets fixed to an upper surface of the mask frame and spaced apart from each other; a stage on which the mask of the plurality of mask sheets is placed; and a first module provided on the stage and configured to measure a degree of sagging of the mask sheet from the mask frame by irradiating the mask with strong light.

[0007] In an embodiment, the first module may include: a light beam generator that emits light; a lens through which the light emitted from the light beam generator passes and the light enters the mask through the lens, and the lens includes a focal point; a beam splitter through which the light passing through the lens is incident; a detection sensor that converts the light reflected from the beam splitter into an electrical signal; and a camera that generates image information based on the light passing through the beam splitter.

[0008] In an embodiment, the first module may be configured to measure the degree of sagging of the mask sheet by scanning the entire mask.

[0009] In an embodiment, when the degree of sagging of the mask sheet satisfies a predetermined numerical range, the mask may be determined as a normal mask, and when the degree of sagging of the mask sheet is outside the predetermined numerical range, the mask may be determined as a defective mask.

[0010] In an embodiment, the first module may measure the degree of sagging of the mask sheet from the mask frame at a micron level.

[0011] In an embodiment, the mask quality management system may further include: a second module provided on the stage that supplies gas to the mask.

[0012] In an embodiment, the second module may include: a blower that supplies gas to the mask; and a suction member that sucks foreign matter dropped from the surface of the mask due to the gas.

[0013] In an embodiment, a downward flow may be included (formed) in the stage.

[0014] In an embodiment, a plurality of vent holes through which the gas is discharged may be defined in the blowing surface of the blower.

[0015] In an embodiment, the gas may include nitrogen or clean dry air.

[0016] Another embodiment of the mask quality management system may include: a mask including a mask frame and a plurality of mask sheets fixed to the upper surface of the mask frame and spaced apart from each other; a stage on which the mask of the plurality of mask sheets is placed; and a second module disposed on the stage to supply gas to the mask.

[0017] In an embodiment, the second module may include: a blower that supplies gas to the mask; and a suction member that sucks foreign matter dropped from the surface of the mask due to the gas.

[0018] In an embodiment, a downward flow may be included (formed) in the stage.

[0019] In an embodiment, a plurality of vent holes through which the gas is discharged may be defined in the blowing surface of the blower.

[0020] In an embodiment, the gas may include nitrogen or clean dry air.

[0021] In an embodiment, the mask quality management system may further include: a first module disposed on the stage and configured to measure the degree of sagging of the mask sheet in a direction crossing the extending direction of the mask by irradiating the mask with strong light.

[0022] In an embodiment, the first module may include: a light beam generator that emits light; a lens through which the light emitted from the light beam generator passes and enters the mask, and the lens includes a focal point; a beam splitter through which the light passing through the lens is incident; a detection sensor that converts the light reflected from the beam splitter into an electrical signal; and a camera that generates image information based on the light passing through the beam splitter.

[0023] In an embodiment, the first module may be configured to measure the degree of sagging of the mask sheet by scanning the entire mask.

[0024] In an embodiment, when the degree of sagging of the mask sheet satisfies a predetermined numerical range, the mask may be determined as a normal mask, and when the degree of sagging of the mask sheet is outside the predetermined numerical range, the mask may be determined as a defective mask.

[0025] In an embodiment, the first module can measure the degree of sagging of the mask sheet from the mask frame at the micron level.

[0026] As described above, in an embodiment, the mask quality management system includes: a mask including a mask frame and a plurality of mask sheets, wherein the mask sheets are fixed to the upper surface of the mask frame and are arranged at intervals from each other; a stage on which the mask is placed; and a first module disposed on the stage and configured to measure the degree of sagging of the mask sheet from the mask frame by irradiating the mask with strong light. By pre-confirming defective masks and not using defective masks in the deposition process, shadow defects can be prevented.

[0027] In addition, the mask quality management system may further include: a second module disposed on the stage and configured to supply a gas to the mask to remove foreign substances from the surface of the mask. Since foreign substances are removed, the yield of the display device can be improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Exemplary, non-limiting embodiments will be more clearly understood from the following detailed description in conjunction with the accompanying drawings.

[0029] Figure 1 is a diagram showing an embodiment of a mask quality management system according to the present disclosure.

[0030] Figure 2 is a diagram showing Figure 1 the first module included in the mask quality management system.

[0031] Figure 3 and Figure 4 is a diagram showing a mask Figure 1 inspected by the mask quality management system.

[0032] Figure 5 is a diagram showing Figure 2 the inspection result of the first module.

[0033] Figure 6 is a diagram showing Figure 1 the second module included in the mask quality management system.

[0034] Figure 7 is a diagram showing Figure 6 the air vents of the blower included in the second module.

[0035] Figure 8 、 Figure 9 and Figure 10 is a diagram showing Figure 6 the result of removing foreign substances by the second module. DETAILED DESCRIPTION

[0036] Embodiments of the present disclosure will now be described more fully hereinafter with reference to the accompanying drawings, in which various embodiments are shown. However, the present disclosure may be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the present disclosure to those skilled in the art. Like reference numerals always denote like elements.

[0037] It will be understood that when an element is referred to as being “on” another element, it can be directly on the other element or intervening elements may be present therebetween. In contrast, when an element is referred to as being “directly on” another element, there are no intervening elements.

[0038] It will be understood that although the terms “first,” “second,” “third,” etc. may be used herein to describe various elements, components, regions, layers and / or sections, these elements, components, regions, layers and / or sections should not be limited by these terms. These terms are only used to distinguish one element, component, region, layer or section from another element, component, region, layer or section. Thus, a “first element,” “first component,” “first region,” “first layer” or “first section” discussed below may be termed a second element, second component, second region, second layer or second section without departing from the teachings herein.

[0039] The terms used herein are for the purpose of describing particular embodiments only and are not intended to be limiting. As used herein, the singular forms “a,” “an” and “the” are intended to include the plural forms including “at least one,” unless the context clearly indicates otherwise. “Or” means “and / or.” As used herein, the term “and / or” includes any and all combinations of one or more of the associated listed items. It will also be understood that when used in this specification, the terms “comprises” and / or “comprising” or “includes” and / or “including” specify the presence of the stated features, regions, wholes, steps, operations, elements and / or components, but do not preclude the presence or addition of one or more other features, regions, wholes, steps, operations, elements, components and / or groups thereof.

[0040] In addition, relative terms such as "lower" or "bottom" and "upper" or "top" may be used herein to describe the relationship of one element to another as shown in the drawings. It will be understood that the relative terms are intended to encompass different orientations of the device in addition to the orientation depicted in the drawings. For example, if the device in one of the drawings is flipped, an element described as on the "lower" side of another element will then be oriented on the "upper" side of the other element. Thus, depending on the particular orientation of the drawing, the exemplary term "lower" can encompass both the "lower" and "upper" orientations. Similarly, if the device in one of the drawings is flipped, an element described as "below" or "beneath" another element will then be oriented "above" the other element. Thus, the exemplary terms "below" or "beneath" can encompass both the above and below orientations.

[0041] In view of the measurements discussed and the errors associated with the measurement of a particular quantity (i.e., the limitations of the measurement system), "about" or "approximate" as used herein includes the recited value and means within an acceptable deviation range of a particular value as determined by one of ordinary skill in the art. For example, a term such as "about" can mean within one or more standard deviations, or within ±30%, ±20%, ±10%, ±5% of the recited value.

[0042] Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this disclosure belongs. It will also be understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and this disclosure, and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.

[0043] Figure 1 is a diagram showing an embodiment of a mask quality management system according to the present disclosure.

[0044] Reference Figure 1 , the mask quality management system 1 in an embodiment of the present disclosure may include a stage ST, a gantry GA, a first module 10, and a second module 20.

[0045] In an embodiment, a mask (e.g., Figure 2 mask MA) may be placed on the stage ST. In an embodiment, for example, the stage ST may move in a plane defined by a first direction and a second direction intersecting the first direction, or may move in a third direction intersecting the plane. In an embodiment, for example, the first direction may be the X direction, the second direction may be the Y direction, and the third direction may be the Z direction. However, the present disclosure is not limited thereto. The stage ST may be fixed, the first direction may be the Y direction, and the second direction may be the X direction.

[0046] The first module 10 and the second module 20 can be placed on the stage GA. In an embodiment, for example, the stage GA can move in a plane defined by a first direction and a second direction, or can move in a third direction.

[0047] As the stage GA or the stage ST moves in the plane defined by the first direction and the second direction, the entire mask (e.g., Figure 2 the mask MA) can be scanned, and as the stage GA or the stage ST moves in the third direction, the distance between the mask (e.g., Figure 2 the mask MA) and the first module 10 and / or the distance between the mask (e.g., Figure 2 the mask MA) and the second module 20 can be adjusted.

[0048] As described above, the first module 10 can be placed on the stage GA. The first module 10 can inspect the defects of the mask (e.g., Figure 2 the mask MA) set (e.g., mounted) on the stage ST. In an embodiment, the first module 10 can be set on the stage ST, and the first module 10 can measure the degree of sagging of the mask sheet (e.g., Figure 2 the mask sheet MS) from the mask frame (e.g., Figure 3 the mask frame MF in Figure 3 ) by irradiating the mask (e.g., Figure 2 the mask MA) with strong light (e.g., a laser beam). When the degree of sagging of the mask sheet is outside a predetermined numerical range, the mask (e.g., Figure 2 、 Figure 3 Figure 4 and Figure 5 ) can be determined as a defective mask. A detailed description of the first module 10 will be described later with reference to

[0049] As described above, the second module 20 can be placed on the stage GA. In an embodiment, the second module 20 can supply gas to the mask (e.g., Figure 2 the mask MA) set (e.g., mounted) on the stage ST to remove foreign matter from the surface of the mask (e.g., Figure 2 the mask MA). A detailed description of the second module 20 will be described later with reference to Figure 6 、 Figure 7 、 Figure 8 、 Figure 9 and Figure 10 .

[0050] However, Figure 1 ​An embodiment is shown, and the mask quality management system 1 may further include various components. In an embodiment, for example, the mask quality management system 1 may further include a controller. The controller may control the operation of each of the console ST, the gantry GA, the first module 10, and the second module 20. In an embodiment, for example, the position of the gantry GA may be adjusted, or the first module 10 and / or the second module 20 may be turned on or off. However, the present disclosure is not limited thereto.

[0051] Figure 2 is a diagram showing the first module included in Figure 1 the mask quality management system.

[0052] Referring to Figure 2 , in an embodiment, the first module 10 may scan the entire mask MA to determine the degree of sagging of the mask sheet (e.g., Figure 3 the mask sheet MS). In this way, it is possible to check whether the mask MA has a defect.

[0053] In an embodiment, the first module 10 may include a light beam generator 102, a path conversion member 104, a lens 106, a beam splitter 108, a detection sensor 110, and a camera 112.

[0054] In an embodiment, the light beam generator 102 may emit light. In an embodiment, for example, there may be a plurality of light beam generators 102. In this case, a plurality of lights may be emitted from the light beam generator 102. Therefore, a plurality of focal points may be included (formed) on the focal plane of the mask MA, which will be described later, and defects in the mask MA may be inspected at a relatively high speed.

[0055] However, the present disclosure is not limited thereto. In an embodiment, for example, the light beam generator 102 may be one.

[0056] The path conversion member 104 may change the path of the light emitted from the light beam generator 102. In an embodiment, for example, the path conversion member 104 may be a rotating mirror. The light emitted from the light beam generator 102 may be reflected by the path conversion member 104 and incident on the mask MA. As the rotating mirror rotates, the position of the focal point included (formed) on the mask MA may also change. Defects may be inspected for each position of the mask MA while changing the position of the focal point.

[0057] However, the present disclosure is not limited thereto. In an embodiment, for example, the path conversion member 104 may be fixed, and defects may be inspected for each position of the mask MA while moving the stage ST.

[0058] In an embodiment, the lens 106 can allow light to enter the mask MA and includes a focal point. In an embodiment, for example, the lens 106 can be an objective lens. In an embodiment, for example, the light passing through the lens 106 can include a focal point at the focal plane of the mask MA.

[0059] In an embodiment, for example, the lens 106 can include a first focal point F1 at a first deformed position M1 of a mask sheet (e.g., Figure 3 the mask sheet MS), and a second focal point F2 can be included (formed) at a second deformed position M2, and a third focal point F3 can be included (formed) at a mask frame (e.g., Figure 3 the mask frame MF).

[0060] The position (e.g., Z-axis coordinate) of each of the first focal point F1, the second focal point F2, and the third focal point F3 can be provided to the controller. In an embodiment, for example, the position information of each of the first focal point F1, the second focal point F2, and the third focal point F3 can be provided to the controller by a wired communication method or a wireless communication method.

[0061] The beam splitter 108 can separate light. In an embodiment, the beam splitter 108 can transmit some of the light that has passed through the lens 106 and reflect the rest of the light. Some of the light reflected from the beam splitter 108 can be incident on the detection sensor 110, and the rest of the light transmitted through the beam splitter 108 can be incident on the camera 112.

[0062] In an embodiment, the detection sensor 110 can convert the light reflected from the beam splitter 108 into an electrical signal. In an embodiment, for example, the detection sensor 110 can convert the brightness of the light passing through a plurality of openings defined in the mask MA into an electrical signal.

[0063] In an embodiment, for example, the detection sensor 110 can be a complementary metal oxide semiconductor (“CMOS”) sensor, a charge-coupled device (“CCD”) sensor, etc. However, the present disclosure is not limited thereto.

[0064] In an embodiment, the camera 112 can generate image information based on the light passing through the beam splitter 108. The image information can be provided to the controller. In an embodiment, for example, the image information can be provided to the controller by wired communication or wireless communication.

[0065] In an embodiment, the first module 10 may scan the entirety of the mask MA and calculate the distances between the first focus F1 and the second focus F2 and between the second focus F2 and the third focus F3 (hereinafter, also referred to as “vertical distances”) using the position information of each of the first focus F1, the second focus F2, and the third focus F3 and the image information provided by the camera 112.

[0066] In an embodiment, the first module 10 may measure the degree of sagging of the mask sheet (e.g., Figure 3 the mask sheet MS) from the mask frame (e.g., Figure 3 the mask frame MF) at a level of micrometers (μm) or less. In other words, the vertical distance may be calculated with sub-micron accuracy. Thus, it is possible to quickly determine whether there is a defect in the mask. A detailed description of the method for determining a defective mask will be described later with reference to 、 [[ID=|47]]Figure 3 and Figure 4 .

[0067] In the case of a mask quality management system according to a comparative example, a microscope probe may be used. In this case, the microscope probe must be manually focused and measured for each point, so the measurement speed is slow, and the measurement accuracy is only about 1 micrometer (μm).

[0068] However, the first module 10 included in the mask quality management system 1 according to an embodiment of the present disclosure can automatically focus and change the focus position in real time and quickly to quickly inspect the mask MA. In an embodiment, for example, the measurement speed of the first module 10 may be about 2 kilohertz (kHz) or higher, and the measurement accuracy may be about 0.15 micrometer (μm) or lower.

[0069] For a mask quality management system according to another comparative example, a scanning electron microscope may be used. In this case, since a part of the mask is damaged and measured, the entirety of the mask cannot be inspected, and the mask is damaged.

[0070] However, the first module 10 included in the mask quality management system 1 according to an embodiment of the present disclosure can automatically focus and change the focus position in real time and quickly to quickly inspect the entirety of the mask MA. In addition, by a non-contact inspection method of the mask MA, damage to the mask due to a destructive inspection method can be prevented.

[0071] However, Figure 5 shows an embodiment, and the first module 10 may further include various components. In addition, some components may be omitted from Figure 2 the first module 10. In an embodiment, for example, the first module 10 may further include a focusing lens for focusing light, a filter for removing noise, and the like.

[0072] Figure 2 and Figure 3 is a diagram showing a mask that has been inspected by a mask quality management system that has undergone Figure 4 of.

[0073] Reference Figure 1 and Figure 3 In an embodiment, for example, the mask MA may include a mask frame MF and a mask sheet MS. The mask sheet MS may be fixed to the upper surface of the mask frame MF. The mask sheet MS may be plural. In this case, the plural mask sheets MS may be spaced apart from each other.

[0074] In an embodiment, for example, the mask MA may be used in a deposition process to deposit a deposition material on a substrate.

[0075] In an embodiment, for example, the substrate may include glass, quartz, plastic, etc. In an embodiment, for example, the substrate may have flexible, bendable, or rollable characteristics.

[0076] In an embodiment, for example, the deposition material may include materials for a cathode electrode, a cover layer, a packaging layer, etc. In an embodiment, for example, the deposition material may be a material that can be evaporated by heating. In an embodiment, for example, the deposition material may include an organic material. In an embodiment, for example, the organic material may include a light-emitting material, a hole injection material, a hole transport material, an electron injection material, an electron transport material, etc.

[0077] In an embodiment, for example, the light-emitting material may include anthracene, phenyl-substituted cyclopentadiene, perylene, tris(8-hydroxyquinoline)aluminum (Alq3), etc. These may be used alone or in combination with each other. However, the present disclosure is not limited thereto. The light-emitting material may include various materials that can emit light of a predetermined color. In an embodiment, for example, the predetermined color may be any one of red, blue, and green.

[0078] In an embodiment, for example, the hole injection material may include copper phthalocyanine (CuPc), poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (“PEDOT:PSS”), etc. These may be used alone or in combination with each other. However, the present disclosure is not limited thereto. The hole injection material may include various materials that can facilitate the injection of holes from the anode electrode.

[0079] In an embodiment, for example, the hole transport material may include aromatic amines, etc. These may be used alone or in combination with each other. However, the present disclosure is not limited thereto. The hole transport material can easily transport holes and may include various materials that can increase the probability of exciton formation by confining electrons to the light-emitting region.

[0080] In an embodiment, for example, the electron transport material may include a compound containing an electron withdrawing agent or consisting of an electron withdrawing agent, or a metal compound capable of accepting electrons. In an embodiment, for example, the electron transport material may include a compound containing a functional group capable of attracting electrons by resonance or consisting of such a functional group, such as a cyanide group, oxadiazole, triazole, triazine, etc. These may be used alone or in combination with each other. However, the present disclosure is not limited thereto. The electron transport material may include various materials capable of stabilizing an anion radical generated when electrons are injected from the cathode electrode.

[0081] In an embodiment, for example, the electron injection material may include a metal having an electron affinity. However, the present disclosure is not limited thereto. The electron injection material may include various materials capable of promoting electron injection from the cathode electrode.

[0082] In an embodiment, for example, the deposition process may be a chemical vapor deposition (“CVD”) process. However, the present disclosure is not limited thereto. In an embodiment, for example, the mask MA may be a mask used in a development process.

[0083] As Figure 4 shown, in a side view, the mask sheet MS may droop from the mask frame MF. In an embodiment, for example, the drooping may be caused by various reasons such as incorrect welding or a reduction in tensile strength due to coating.

[0084] By checking the vertical distance AD from one side of the mask frame MF to the mask sheet MS, the mask MA can be determined to be normal or defective. In an embodiment, when the degree of drooping of the mask sheet MS satisfies a predetermined numerical range, the mask MA can be determined to be a normal mask. However, when the degree of drooping of the mask sheet MS is outside the predetermined numerical range, the mask MA can be determined to be a defective mask. In an embodiment, for example, as Figure 4 shown, the mask MA may have a quadrilateral shape, for example, a rectangular shape having a long side LD and a short side SD. When the deformation amount of the long side LD is greater than about 300 microns or the deformation amount of the short side SD is greater than about 200 microns, the mask MA can be determined to be defective.

[0085] However, the present disclosure is not limited thereto. In an embodiment, for example, the shape, deformation amount, etc. of the mask MA can be changed in various ways.

[0086] When the deformation amount of the vertical distance AD from one side of the mask frame MF to the mask sheet MS is outside a predetermined numerical range (for example, the deformation amount of the long side LD is about 300 micrometers or less and / or the deformation amount of the short side SD is outside about 200 micrometers or less), the shape, size, and / or arrangement of the plurality of openings defined in the mask MA may be different from the design. When a deposition process is performed using such a defective mask (i.e., a mask in which the vertical distance AD from one side of the mask frame MF to the mask sheet MS is outside the predetermined numerical range), a shadow region (i.e., a region where the deposition material is not deposited) may appear in the display device.

[0087] The mask quality management system in an embodiment of the present disclosure (for example, Figure 3 the mask quality management system 1) can check whether the vertical distance AD from one side of the mask frame MF to the mask sheet MS satisfies a predetermined numerical range. Therefore, a defective mask can be confirmed in advance before performing the deposition process, and defects caused by the defective mask in the deposition process can be prevented.

[0088] Figure 1 is a diagram showing Figure 5 the inspection result of the first module.

[0089] In Figure 2 it, the x-axis (horizontal axis) represents the mask number MN, and the y-axis (vertical axis) represents the vertical distance AD from one side of the mask frame to the mask sheet (for example, the vertical distance AD from one surface of the mask frame MF to the mask sheet MS). Specifically, the solid line represents the maximum value of the vertical distance AD, and the dashed line represents the minimum value of the vertical distance AD.

[0090] Referring to Figure 5 , including in the mask quality management system (for example, Figure 5 the mask quality management system 1) the first module (for example, Figure 1 the first module 10) can confirm a defective mask. As described above, in the embodiment, when the sagging degree of the mask sheet MS satisfies a predetermined numerical range, the mask can be determined as a normal mask, and when the sagging degree of the mask sheet is outside the predetermined numerical range, the mask can be determined as a defective mask.

[0091] In the embodiment, for example, in the case of the first mask MA1, as a result of measuring the vertical distance AD from one side of the mask frame to the mask sheet (for example, the vertical distance AD from one surface of the mask frame MF to the mask sheet MS), an error numerical range NG outside the predetermined numerical range OK may be measured. In this case, the first mask MA1 can be determined as a defective mask and can not be used in the deposition process.

[0092] In an embodiment, for example, in the case of the second mask MA2, as a result of measuring the vertical distance AD from one side of the mask frame to the mask sheet (e.g., the vertical distance AD from one surface of the mask frame MF to the mask sheet MS), a predetermined numerical range OK may be measured. In this case, the second mask MA2 may be determined as a normal mask and may be used in the deposition process.

[0093] Figure 1 is a diagram showing the second module included in Figure 6 the mask quality management system. is a diagram showing the vent of the blower included in Figure 1 the second module.

[0094] Refer to Figure 7 and Figure 6 , the second module 20 may remove foreign matter from the surface of the mask (e.g., Figure 6 the mask MA) provided on the stage ST.

[0095] In an embodiment, the second module 20 may include a blower 202 and a suction member 204.

[0096] In an embodiment, the blower 202 may supply gas to the mask. In an embodiment, the gas may be nitrogen (N2) or clean dry air ("CDA"). These may be used alone or in combination with each other. However, the present disclosure is not limited thereto. In an embodiment, for example, as long as the gas can remove foreign matter from the surface of the mask, the gas can be used without limitation.

[0097] In an embodiment, a vent BH may be defined in the blowing surface BS of the blower 202. The gas discharged from the vent BH may cause foreign matter to fall off the surface of the mask.

[0098] In an embodiment, a plurality of vents BH may be defined in the blowing surface BS of the blower 202. In an embodiment, for example, a first opening HO1, a second opening HO2, and a third opening HO3 spaced apart from each other in the direction BD may be defined in the blowing surface BS of the blower 202. In an embodiment, the direction BD may be parallel to the direction along which the side (e.g., the longer side) of the blowing surface BS extends, but the present disclosure is not limited thereto.

[0099] When the vent BH is defined straight in the blowing surface BS of the blower 202, the flow rate of the gas may vary depending on the position of the vent BH. In an embodiment, for example, the central portion of the vent BH may discharge more gas than the edge portion of the vent BH. In this case, depending on the flow rate of the gas, it may cause the mask sheet (e.g., Figure 7The sagging of the mask sheet MS). When the flow rate is reduced to prevent the mask sheet from sagging, foreign matter may not be removed from the surface of the mask.

[0100] In an embodiment, the suction member 204 can suck foreign matter that has fallen from the surface of the mask.

[0101] The suction holes SH can be defined in the suction surface SS of the suction member 204. As foreign matter is sucked in through the suction holes SH, the foreign matter that has flown to the upper part of the stage ST can be removed.

[0102] As Figure 2 shown, when a plurality of vent holes BH are included (formed) in the blowing surface BS of the blower 202, the flow rate of the gas can be constant for each position of the vent holes BH.

[0103] In an embodiment, a downward flow can be included (formed) in the stage ST. In an embodiment, for example, the downward flow can mean the flow of gas from the second module 20 toward the stage ST. The foreign matter that has not been removed from the suction holes SH can be removed to the lower part of the stage ST along the downward flow.

[0104] In the case of the mask quality management system according to the comparative example, the blower can be provided on the upper part of the stage ST, and the suction member can be provided on the lower part of the stage ST. In this case, since the suction member is only provided at the lower part of the stage ST, the foreign matter that has flown to the upper part of the stage ST may not be removed. As a result, the mask quality management system including the mask may be contaminated by foreign matter.

[0105] In the case of the mask quality management system in the embodiment of the present disclosure, the blower 202 and the suction member 204 can be provided on the upper part of the stage ST, the blower 202 and the suction member 204 can be provided on the same line, and the device for forming the downward flow can be provided on the stage ST. Therefore, the foreign matter that has fallen to the lower part of the stage ST can be removed to the lower part of the stage ST along the downward flow, and the foreign matter that has flown to the upper part of the stage ST can be removed by the suction member 204. As a result, contamination of the mask quality management system including the mask by foreign matter can be prevented.

[0106] However, Figure 3 shows one embodiment, and the second module 20 can also include various components. In addition, some components can be omitted from Figure 7 the second module 20.

[0107] Figure 6 、 Figure 6 and Figure 8 are diagrams showing the results of removing foreign matter by Figure 9 the second module.

[0108] For example, Figure 10is a plan view showing a display device PA, Figure 6 Is shown in the use Figure 8 An enlarged plan view of the non-display area NDA before the second module 20, and Figure 9 Is shown in the use Figure 6 FIG. 1 is an enlarged plan view of a non-display area NDA behind the second module 20 .

[0109] refer to Figure 10 , the display device PA may include a display area DA and a non-display area NDA.

[0110] In an embodiment, for example, the mask may include a metal oxide. In an embodiment, for example, the mask may include an aluminum oxide (AlO x ).

[0111] Fluorine radicals (F*) may be generated during the mask cleaning process. As shown in the following chemical formula, the fluorine radicals may react with aluminum oxide to form coarse particles (hereinafter, also referred to as "foreign matter").

[0112] <Chemical formula>

[0113] AlO x +F*→AlF2

[0114] While performing the deposition process, the deposition material may also be deposited on the mask (e.g., Figure 6 When the deposited material is not removed, the shape, size and / or arrangement of the plurality of openings defined in the mask may be different from the design. In this case, as described above, a shadow area may appear in the display device PA.

[0115] In order to prevent this defect from occurring in the display device PA, a mask cleaning process may be performed after the deposition process is performed. In an alternative embodiment, the mask cleaning process may be performed in real time while the deposition process is performed.

[0116] The more a mask undergoes a mask cleaning process, the more foreign matter may be included (formed), and the more foreign matter may fall on the display apparatus PA during a deposition process. When the number and size of the foreign matter are large, the display apparatus PA may be determined to be defective.

[0117] The mask quality management system (eg, Figure 8 The mask quality management system 1) can remove foreign matter included (formed) on the surface of the mask frame MF. Therefore, foreign matter that may fall on the display device PA and cause defects in the display device PA can be removed in advance, and the yield of the display device PA can be improved.

[0118] In an embodiment, for example, referring toFigure 2 When the mask quality management system in the embodiments of the present disclosure may not be used (for example, Figure 1 the mask quality management system 1), relatively large and numerous foreign objects DU may be seen in part A' of the non-display area NDA. When the mask undergoes a mask cleaning process, more foreign objects DU may be included (formed), and more foreign objects DU may fall on the display device (for example, Figure 9 the display device PA). When the number of foreign objects DU is relatively large and numerous, the display device may be determined to be defective. As the number of defective display devices increases, the yield of the display device may decrease.

[0119] However, referring to Figure 1 , for example, when the mask quality management system in the embodiments of the present disclosure is used (for example, Figure 8 the mask quality management system 1), the size and number of foreign objects DU in part A of the non-display area NDA can be reduced.

[0120] Figure 10 and Figure 1 Figure 9 Figure 10 are briefly shown. However, for example, before applying the mask quality management system, the number of detected foreign objects DU was about 79, and as a result of applying the mask quality management system, the number of foreign objects DU was about 1. It has been detected and proven that the effect of removing foreign objects DU exceeds 98.7%. That is, the foreign objects DU generated during the mask cleaning process can be removed by the mask quality management system. Therefore, the yield of the display device can be increased.

Claims

1. A mask quality management system, characterized in that: include: Mask, including: a mask frame; and a plurality of mask sheets fixed to the upper surface of the mask frame and spaced apart from each other; a stage on which the mask including the plurality of mask sheets is placed; and The first module is disposed on the stage and configured to measure a sagging degree of the mask sheet from the mask frame by irradiating strong light onto the mask.

2. The mask quality management system according to claim 1, characterized in that: The first module includes: a beam generator, emitting light; a lens through which the light emitted from the beam generator passes and through which the light enters the mask, and wherein the lens includes a focal point; a beam splitter through which the light passing through the lens is incident; a detection sensor that converts the light reflected from the beam splitter into an electrical signal; and A camera generates image information based on the light passing through the beam splitter.

3. The mask quality management system according to claim 1, wherein: The first module is configured to measure the sagging degree of the mask sheet by scanning the entire mask.

4. The mask quality management system according to claim 1, wherein: Also includes: A second module is provided on the stage and provides gas to the mask.

5. The mask quality management system according to claim 4, characterized in that: The second module includes: a blower for supplying the gas to the mask; and A suction member sucks foreign matter dropped from the surface of the mask by the gas.

6. The quality management system according to claim 5, characterized in that: A downflow is formed in the station.

7. The mask quality management system according to claim 5, characterized in that: A plurality of vents are defined in a blowing surface of the blower, through which the gas is exhausted.

8. The mask quality management system according to claim 4, wherein: The gas includes nitrogen or clean dry air.

9. A mask quality management system, characterized in that: include: Mask, including: a mask frame; and a plurality of mask sheets fixed to the upper surface of the mask frame and spaced apart from each other; a stage on which the mask including the plurality of mask sheets is placed; and A second module is provided on the stage and provides gas to the mask.

10. The mask quality management system according to claim 9, wherein: The second module includes: a blower for supplying the gas to the mask; and A suction member sucks foreign matter dropped from the surface of the mask by the gas.

11. The mask quality management system according to claim 10, wherein: A downflow is formed in the station.

12. The mask quality management system according to claim 10, wherein: A plurality of vents are defined in a blowing surface of the blower, through which the gas is exhausted.

13. The mask quality management system according to claim 9, wherein: The gas includes nitrogen or clean dry air.

14. The mask quality management system according to claim 9, wherein: Also includes: The first module is provided on the stage and configured to measure a sagging degree of the mask sheet in a direction intersecting with an extending direction of the mask by irradiating strong light to the mask.

15. The mask quality management system according to claim 14, wherein: The first module includes: a beam generator, emitting light; a lens through which the light emitted from the beam generator passes and through which the light enters the mask, and wherein the lens includes a focal point; a beam splitter through which the light passing through the lens is incident; a detection sensor that converts the light reflected from the beam splitter into an electrical signal; and A camera generates image information based on the light passing through the beam splitter.

16. The mask quality management system according to claim 14, wherein: The first module is configured to measure the sagging degree of the mask sheet by scanning the entire mask.

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