Measuring range equipment for axis alignment precision of optical system of photoetching machine
By designing a range device for the axis alignment accuracy of the lithography optical system, using a prototypical shaft tube and an adjustable disc system, the problem of large measurement error of the vernier caliper is solved, and the precise alignment and dynamic monitoring of the axis of the optical system is achieved, which improves the accuracy of measurement and simplifies the adjustment process.
Patent Information
- Application Number
- CN202422443160.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-10
- Publication Date
- 2025-08-05
- Estimated Expiration
- 2034-10-10
AI Technical Summary
In the prior art, errors are easily generated when the axis alignment of the optical system of the vernier caliper measuring lithography machine. Especially when measuring between parts of different depths, it is difficult to accurately measure relative parallel positions, resulting in an error exceeding 1 mm.
Design a range device with axial alignment accuracy of a lithography optical system, including a rotatable base, a measuring assembly and a profiling shaft tube. The diameter of the upper half of the profiling shaft tube is matched with a uniform optical system and the diameter of the lower half is matched with the lighting system. The axial positioning and adjustment are performed through an adjustable disc system to ensure the alignment of the optical path.
It realizes accurate alignment of the axis of the optical system, reduces measurement deviation, simplifies the measurement and adjustment process, and improves the accuracy and accuracy of measurement.
Smart Images
Figure CN223193271U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of photolithography machines, in particular to a measuring device for the axis alignment accuracy of an optical system of a photolithography machine. Background Art
[0002] The optical system is the most core component of the lithography machine, and its main function is to transfer the pattern on the mask plate to the photoresist layer.
[0003] The light used in the exposure process comes from the light source system. A key performance criterion is that it must be as parallel as possible to ensure that the final imaged lines are close to the wavelength range. This function is achieved by the optical path collimation system within the lithography machine. The optical path collimation system is typically composed of optical components such as Keplerian or Galilean beam expanders, slits, and plane mirrors. Light collimation is achieved by adjusting the position of the lenses and slits.
[0004] After the beam is collimated, it enters the uniform light system, requiring precise adjustment of the optical path. This ensures that the axis of the parallel light entering the next optical system matches the axis of the optical system, ensuring optimal imaging. The relative position deviation of the axis cannot exceed +-0.25mm to ensure proper light transmission and imaging.
[0005] refer to Figure 3 As shown in the figure, this illustrates the alignment required for the illumination system and the uniform light system. The traditional method for measuring this circular interface is with a vernier caliper. Vernier calipers are characterized by their simple structure, ease of use, medium accuracy, and a wide measurement range. They can be used to measure parts' inner and outer diameters, lengths, widths, thicknesses, depths, and hole spacing, among other things. They have a wide range of applications and are considered universal measuring tools. However, using a vernier caliper is prone to errors, especially when the two parts are not at the same depth. Visual observation can easily cause angular deviations, resulting in errors exceeding 1 mm. Furthermore, a vernier caliper only produces one reading per test, and recalibration is necessary, which can easily lead to operational errors. Vernier calipers are suitable for measuring relative distances on the same plane, but are not suitable for measuring the relative parallel positions of two parts at different depths.
[0006] Therefore, it is necessary to design a measuring device for the axis alignment accuracy of the optical system of the lithography machine to solve the above problems. Utility Model Content
[0007] The purpose of the present invention is to provide a measuring device for the axis alignment accuracy of the optical system of a lithography machine, so as to overcome the above-mentioned deficiencies in the current prior art.
[0008] In order to achieve the above purpose, the present invention adopts the following technical solutions:
[0009] A measuring device for the axis alignment accuracy of the optical system of a photolithography machine is characterized in that it includes a rotatable base for being installed in conjunction with the top of an illumination system, several groups of measuring components evenly distributed on the rotatable base for measuring the axis centrality, and a contoured shaft tube arranged at the center of the upper rotatable base and used to simulate the illumination axis of a uniform light system, the contoured shaft tube is cylindrical, the diameter of the upper cylinder is consistent with the diameter of the uniform light system, the diameter of the lower cylinder is consistent with the diameter of the illumination system, and the axes of the two completely coincide, the measuring component includes a mounting base block arranged on the rotatable base, a mounting block fixedly mounted on the mounting base block by a nut, and a rotatable meter placed on one side of the mounting block, the measuring probe part of the meter being telescopically movable and placed in the mounting block; the measuring probes of the meter all point to the center position of the rotatable base.
[0010] Preferably, a groove is provided on the rotatable base.
[0011] Preferably, a rotating handle is also provided on the rotatable base.
[0012] Preferably, the measuring probe of the meter is arranged perpendicular to the contoured shaft tube.
[0013] Preferably, a plurality of mounting holes are provided on the rotatable base, and the mounting holes are evenly distributed with the circle of the rotatable base as the center.
[0014] The beneficial effect of the present invention is that the present technical solution truly simulates the axis of the uniform light system and the axis of the lighting system. By setting a contoured shaft tube, the diameter of the cylindrical upper part is consistent with the diameter of the uniform light system, and the diameter of the cylindrical lower part is consistent with the diameter of the lighting system, and the axes of the two completely coincide, thereby simulating the axis of the light path. Then, the axis is positioned through an adjustable disc system, and the disc is installed on the lighting system. The lighting system is adjusted according to the deviation, so that the axis can be accurately adjusted, and the difference in the axes of different planes can be dynamically monitored, which makes measurement and adjustment simpler and less likely to cause deviation. BRIEF DESCRIPTION OF THE DRAWINGS
[0015] Figure 1 This is a schematic structural diagram of a device for measuring the axis alignment accuracy of an optical system of a lithography machine according to the present invention;
[0016] Figure 2 This is a top view of a device for measuring the axis alignment accuracy of an optical system of a photolithography machine according to the present invention;
[0017] Figure 3 Illustration of the alignment required for the lighting system and the uniform light system;
[0018] In the figure: 1. Rotatable base; 2. Measuring assembly; 3. Contoured shaft tube; 11. Groove; 12. Rotating handle; 13. Mounting hole; 21. Mounting base block; 22. Mounting block; 23. Measuring tool; 24. Measuring probe;. DETAILED DESCRIPTION
[0019] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.
[0020] In the description of the present invention, it should be understood that the terms "upper", "lower", "front", "back", "left", "right", "top", "bottom", "inside", "outside", etc., indicating directions or positional relationships, are based on the directions or positional relationships shown in the accompanying drawings. They are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific direction, be constructed and operated in a specific direction. Therefore, they cannot be understood as limitations on the present invention.
[0021] Reference Figures 1 to 2 A device for measuring the axis alignment accuracy of the optical system of a photolithography machine comprises a rotatable base 1 for being mounted on the top of an illumination system, a plurality of measurement components 2 evenly distributed on the rotatable base for measuring the axis alignment, and a contoured axis tube 3 disposed at the center of the upper rotatable base for simulating the illumination axis of a uniform light system.
[0022] The contoured shaft tube 3 is cylindrical, the diameter of the upper half of the cylinder is consistent with the diameter of the uniform light system, the diameter of the lower half of the cylinder is consistent with the diameter of the lighting system, and the axes of the two completely coincide.
[0023] In order to facilitate the installation of the rotatable base 1 with the top of the lighting system, a groove 11 is opened on the rotatable base 1, and the diameter of this groove is the same as the outer ring diameter of the mounting seat on the top of the lighting system. When in use, the rotatable base 1 is directly installed on the outer ring of the top mounting seat to ensure the bottom position is limited and improve the alignment accuracy;
[0024] In order to facilitate the rotation of the rotatable base 1, a rotating handle 12 is further provided on the rotatable base. Manually adjusting the rotating handle 12 drives the rotatable base 1 to rotate, thereby driving the rotation of the measuring component 2 and adjusting its angle, thereby measuring the axis at other positions and improving the accuracy of the axis alignment;
[0025] The measuring assembly 2 includes a mounting base block 21 arranged on the rotatable base 1, a mounting block 22 fixedly mounted on the mounting base block by a nut, and a rotatable meter 23 placed on one side of the mounting block. The measuring probe 24 of the meter is partially telescopically movable and placed in the mounting block; the measuring probes of the meter are all pointed to the center position of the rotatable base 1; the measuring head can simultaneously measure two data of the axis (Xn, Yn). When measuring, the annular disk can be rotated to dynamically measure the axis data. By monitoring the maximum deviation value of the 360° rotation measurement, the difference between the two plane axis centers can be known.
[0026] The measuring probe of the meter is arranged perpendicular to the contoured shaft tube 3;
[0027] A plurality of mounting holes 13 are provided on the rotatable base 1, and the mounting holes are evenly distributed around the circular shape of the rotatable base 1, and the mounting holes are used to cooperate with the measuring component 2 for fixed installation;
[0028] In this embodiment, before the measuring instrument can be used, it must first be calibrated using the reference object, the contoured shaft tube 3, and the meter reading must be reset to zero by adjusting the position of the measuring probes. In this case, the axis of the two probes is already aligned with the disk system. After adjustment, the contoured shaft tube 3 is removed, and the rotatable base is placed on the outer ring of the mounting seat at the top of the lighting system. The contoured shaft tube 3 is then placed in the center of the rotatable base 1, that is, between the lighting system and the uniform light system. Since the dial is now aligned with the lighting system, the reading obtained at this time is the entrance deviation of the uniform light system. Since the lighting system can automatically adjust its position internally, the position of the lighting system light is then adjusted according to the deviation to ensure alignment with the axis, thereby ensuring normal light transmission.
[0029] The benefits of the present invention are that the technical solution truly simulates the axis of the uniform light system and the axis of the lighting system by setting a contoured shaft tube, the diameter of the upper cylindrical part of which is consistent with the diameter of the uniform light system, and the diameter of the lower cylindrical part is consistent with the diameter of the lighting system, and the axes of the two completely coincide, thereby simulating the axis of the light path, and then the axis is positioned by an adjustable disc system, and the disc is installed on the lighting system. The lighting system is adjusted according to the deviation, so that the axis can be accurately adjusted, and the difference in the axes of different planes can be dynamically monitored, which makes measurement and adjustment simpler and less likely to cause deviation.
[0030] The above is only a preferred specific implementation method of the present invention, but the protection scope of the present invention is not limited to this. Any technician familiar with the technical field within the technical scope disclosed by the present invention can make equivalent replacements or changes based on the technical solution and utility model concept of the present invention, which should be covered by the protection scope of the present invention.
Claims
1. A measuring device for the axis alignment accuracy of an optical system of a lithography machine, characterized by: It includes a rotatable base for being installed on the top of the lighting system, several groups of measuring components evenly distributed on the rotatable base for measuring the centrality of the axis, and a contoured shaft tube arranged at the center of the upper rotatable base and used to simulate the illumination axis of the uniform light system. The contoured shaft tube is cylindrical, and the diameter of the upper half of the cylinder is consistent with the diameter of the uniform light system, and the diameter of the lower half of the cylinder is consistent with the diameter of the lighting system, and the axes of the two completely coincide. The measuring component includes a mounting base block arranged on the rotatable base, a mounting block fixedly mounted on the mounting base block by a nut, and a meter placed on one side of the mounting block and rotatable. The measuring probe part of the meter can be telescopically moved and placed in the mounting block; the measuring probes of the meter all point to the center position of the rotatable base.
2. The measuring device for measuring the axis alignment accuracy of the optical system of a lithography machine according to claim 1, characterized in that: A groove is provided on the rotatable base.
3. The measuring device for measuring the axis alignment accuracy of the optical system of a lithography machine according to claim 1, characterized in that: A rotating handle is also provided on the rotatable base.
4. The measuring device for measuring the axis alignment accuracy of the optical system of a lithography machine according to claim 1, characterized in that: The measuring probe of the meter is arranged perpendicular to the contoured shaft tube.
5. The measuring device for measuring the axis alignment accuracy of the optical system of a lithography machine according to claim 1, characterized in that: A plurality of mounting holes are provided on the rotatable base, and the mounting holes are evenly distributed with the circle of the rotatable base as the center.