Waste gas monitoring device and waste gas monitoring system for annealing device

Abstract

The utility model discloses a waste gas monitoring device and a waste gas monitoring system for an annealing device, and the waste gas monitoring device comprises a connecting pipeline, a pressure detection element, a flow detection element and a control element, one end of the connecting pipeline forms an access end, and the access end is used for being connected with the annealing cavity and receiving waste gas in the annealing cavity; the pressure detection element is arranged on the connecting pipeline, and the pressure detection element is used for detecting the pressure in the connecting pipeline; the flow detection element is connected with the connecting pipeline, and the flow detection element is used for detecting the flow in the connecting pipeline; and the control element is connected with the pressure detection element and the flow detection element and is used for monitoring the flow of the waste gas in the connecting pipeline. The waste gas monitoring device and the waste gas monitoring system provided by the utility model are used for monitoring the waste gas emission of the annealing cavity so as to ensure the normal emission of the waste gas in the annealing cavity and ensure the nucleation and crystallization quality of a perovskite film.

Description

Technical Field

[0001] The utility model relates to the technical field of annealing devices, in particular to an exhaust gas monitoring device and an exhaust gas monitoring system for an annealing device. Background Art

[0002] The annealing device is used to anneal the perovskite film to promote nucleation and crystallization. The annealing device typically places the perovskite film in an annealing chamber for annealing. During the annealing process, the perovskite film is baked, generating waste gas that contaminates the annealing chamber and affects the nucleation and crystallization quality of the perovskite film.

[0003] Existing annealing devices use an organic exhaust pipe connected to the annealing chamber, allowing exhaust gases to be discharged from the annealing chamber through the pipe to reduce the exhaust gas concentration within the annealing chamber. However, this organic exhaust pipe cannot monitor whether the exhaust gas in the annealing chamber is being discharged normally. If the exhaust gas in the annealing chamber cannot be discharged through the organic exhaust pipe properly, the exhaust gas will accumulate in the annealing chamber and adversely affect the nucleation and crystallization quality of the perovskite film. Utility Model Content

[0004] The purpose of the utility model is to provide an exhaust gas monitoring device and an exhaust gas monitoring system for an annealing device, which are used to monitor the exhaust gas emissions of an annealing chamber to ensure that the exhaust gas in the annealing chamber is normally discharged and ensure the nucleation and crystallization quality of the perovskite film.

[0005] The purpose of this utility model is achieved by the following technical solutions:

[0006] An exhaust gas monitoring device for an annealing device, the annealing device comprising an annealing chamber, the exhaust gas monitoring device comprising:

[0007] A connecting pipeline, one end of which forms an access end, the access end being used to connect to the annealing chamber and receive exhaust gas in the annealing chamber;

[0008] a pressure detection element, provided on the connecting pipeline, and located downstream of the access end along the gas flow direction, and used to detect the pressure in the connecting pipeline;

[0009] a flow detection element connected to the connecting pipeline and located downstream of the access end along the gas flow direction, the flow detection element being used to detect the flow in the connecting pipeline;

[0010] A control element is connected to the pressure detection element and the flow detection element and is used to monitor the flow of exhaust gas in the connecting pipeline.

[0011] Preferably, an end of the connecting pipeline away from the access end forms a recovery end, and the recovery end is used to be connected to an external recovery component to recover the exhaust gas in the connecting pipeline.

[0012] Preferably, the connecting pipeline includes a first connecting pipe and a third connecting pipe, one end of the first connecting pipe forms the access end, and one end of the third connecting pipe forms the recovery end; the flow detection element includes a main body portion and a connecting portion that are connected to each other, and the connecting portion is provided between the first connecting pipe and the third connecting pipe and is communicated with the first connecting pipe and the third connecting pipe respectively;

[0013] The pressure detecting element is arranged on the first connecting pipe.

[0014] Preferably, a plurality of connecting pipelines are provided, each connecting pipeline is used to connect to an annealing chamber in the annealing device; each connecting pipeline is respectively provided with the pressure detection element and is respectively connected to the flow detection element.

[0015] Preferably, a flange portion is provided at one end of the first connecting pipe adjacent to the connecting portion, a flange portion is provided at one end of the third connecting pipe adjacent to the connecting portion, and flange portions are provided at both opposite ends of the connecting portion; the connecting portion is connected to the first connecting pipe and the third connecting pipe respectively through the flange portions.

[0016] Preferably, it further comprises a mounting plate, wherein the mounting plate is connected to the flange portion of the third connecting pipe and the connecting portion is adjacent to the flange portion of the third connecting pipe.

[0017] Preferably, the mounting plate is mounted on a frame of the annealing device or on an external fixing frame to fix the exhaust gas monitoring device.

[0018] Preferably, the pressure detection element is a pressure transmitter, the flow detection element is a flow sensor, and the control element includes a programmable logic controller.

[0019] An annealing device exhaust gas monitoring system, the annealing device includes three annealing chambers, the annealing device exhaust gas monitoring system includes any one of the above-mentioned annealing device exhaust gas monitoring devices, the annealing device exhaust gas monitoring device includes three connecting pipelines, each connecting pipeline is connected to one of the annealing chambers.

[0020] Preferably, a secondary exhaust pipe is further included, which is connected to the plurality of connecting pipes and is used to receive the exhaust gas in the plurality of connecting pipes to discharge the exhaust gas to a target area.

[0021] Compared with the prior art, the beneficial effects of the present invention include at least:

[0022] By setting up a pressure detection element and a flow detection element, the pressure signal and flow signal in the connecting pipeline can be detected, and a control element can be used to receive the pressure signal and flow signal to determine whether the exhaust gas is normally discharged into the connecting pipeline based on the pressure signal and flow signal in the connecting pipeline, so that when the exhaust gas is not normally discharged into the connecting pipeline, the annealing device can be adjusted in time to ensure that the exhaust gas in the annealing chamber is discharged normally and the nucleation and crystallization quality of the perovskite film is ensured. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 This is a schematic structural diagram of an exhaust gas monitoring device for an annealing device according to an embodiment of the present invention;

[0024] Figure 2 This is an exploded view of an exhaust gas monitoring device for an annealing device according to an embodiment of the present utility model;

[0025] Figure 3 This is a schematic structural diagram of an annealing device exhaust gas monitoring device according to an embodiment of the present invention when multiple connecting pipelines are used.

[0026] In the figure: 1. connecting pipeline; 11. access end; 12. recovery end; 13. first connecting pipe; 131. flange part; 15. third connecting pipe; 16. mounting plate; 2. pressure detection element; 3. flow detection element; 31. main body; 32. connecting part. DETAILED DESCRIPTION

[0027] Example embodiments will now be described more fully with reference to the accompanying drawings. However, the example embodiments can be implemented in many forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided to make this disclosure more comprehensive and complete and to fully convey the concepts of the example embodiments to those skilled in the art. Identical reference numerals in the figures denote identical or similar structures, and thus repeated descriptions thereof will be omitted.

[0028] The words expressing positions and directions described in this utility model are all explained with reference to the accompanying drawings as examples, but they can be changed as needed, and all such changes are included in the protection scope of this utility model.

[0029] like Figure 1 As shown, the utility model provides an exhaust gas monitoring device for an annealing device. The annealing device includes an annealing chamber, which can be used to accommodate a perovskite film and perform annealing treatment on the perovskite film, and exhaust gas is generated in the annealing chamber during the annealing treatment. The exhaust gas monitoring device for an annealing device of the present application is used to monitor whether the exhaust gas in the annealing chamber is normally discharged from the annealing chamber. The exhaust gas monitoring device for an annealing device includes a connecting pipeline 1, a pressure detection element 2, a flow detection element 3 and a control element.

[0030] One end of the connecting pipe 1 forms an access end 11, and the other end can form a recovery end 12. The access end 11 of the connecting pipe 1 can be connected to the annealing chamber and used to receive the exhaust gas in the annealing chamber; for example, the connecting pipe 1 extends directly to the interior of the annealing chamber or extends to be exposed to the interior of the annealing chamber, or the connecting pipe 1 is connected to the annealing chamber through a pipe that can communicate with the interior of the annealing chamber, so that the access end 11 of the connecting pipe 1 can receive the exhaust gas in the annealing chamber. The recovery end 12 of the connecting pipe 1 can be used to connect to a recovery component to recover the exhaust gas in the connecting pipe 1; for example, the recovery end 12 of the connecting pipe 1 is connected to an external secondary exhaust pipe so that the exhaust gas in the connecting pipe 1 can be discharged into the secondary exhaust pipe, and the secondary exhaust pipe can extend to a target area so that the exhaust gas in the secondary exhaust pipe can be discharged into the target area. The target area can be a waste gas collection area. After the waste gas is collected, it can be left to cool and condense to produce a perovskite solution, which can be used for recycling and reuse. In other embodiments, the waste gas discharged from the recovery end 12 may be treated without being recovered, and the target area may also be a waste gas treatment area, where the waste gas is treated after being discharged to the target area.

[0031] Reference Figure 1 and Figure 2 , the connecting pipeline 1 may include a first connecting pipe 13 and a third connecting pipe 15. The first connecting pipe 13 is arranged adjacent to the annealing chamber, and one end of the first connecting pipe 13 forms an access end 11 and is used to connect to the annealing chamber, and the other end of the first connecting pipe 13 is used to connect to the flow detection element 3. One end of the third connecting pipe 15 is connected to the flow detection element 3, and the other end forms a recovery end 12 and can be connected to the recovery component. Among them, the third connecting pipe 15 and the first connecting pipe 13 can be located at opposite ends of the flow detection element 3. By connecting the first connecting pipe 13 and the third connecting pipe 15 to the flow detection element 3 respectively, a gas flow channel extending from the access end 11 of the first connecting pipe 13 to the recovery end 12 of the third connecting pipe 15 can be formed, and the gas flow channel is used to supply exhaust gas flow.

[0032] To facilitate the connection of the first connecting tube 13, the flow detection element 3, and the third connecting tube 15, a flange portion 131 is provided at one end of the first connecting tube 13 adjacent to the flow detection element 3, and a flange portion 131 is provided at one end of the flow detection element 3 for connection to the first connecting tube 13. The flange portion 131 of the first connecting tube 13 is docked with the corresponding flange portion 131 of the flow detection element 3, so that the first connecting tube 13 and the flow detection element 3 can be flange-connected via the flange portion 131. The flow detection element 3 can be flange-connected at one end of the third connecting tube 15, and a flange portion 131 can be provided at one end of the third connecting tube 15 adjacent to the flow detection element 3. The corresponding flange portion 131 of the flow detection element 3 is docked with the flange portion 131 of the third connecting tube 15, so that the flow detection element 3 and the third connecting tube 15 can be flange-connected via the flange portion 131.

[0033] Pressure sensing element 2 is disposed on connecting pipe 1 and is located downstream of access end 11 in the direction of gas flow. Pressure sensing element 2 can be used to detect pressure changes within connecting pipe 1. When exhaust gas flows from access end 11 of connecting pipe 1, it can further flow toward pressure sensing element 2, causing the pressure signal detected by pressure sensing element 2 to change. The change in pressure signal can then be used to determine whether exhaust gas is flowing within connecting pipe 1. Specifically, when the annealing device is not operating, connecting pipe 1 does not receive exhaust gas from the annealing chamber, and the pressure within connecting pipe 1 remains unchanged or substantially unchanged. When the annealing device is operating, exhaust gas is generated within the annealing chamber and flows into connecting pipe 1. At this time, the pressure within connecting pipe 1 changes, for example, the pressure increases. By determining the pressure change detected by pressure sensing element 2, it can be determined whether the exhaust gas is being discharged normally into connecting pipe 1. Furthermore, as the perovskite film annealing process progresses, the amount of exhaust gas generated within the annealing chamber may also change accordingly. The pressure change detected by pressure sensing element 2 during this period can be used to indicate whether the exhaust gas within the annealing chamber is being discharged normally during that period. The pressure detection element 2 may be a pressure transmitter and may be provided in the first connecting pipe 13 .

[0034] The flow detection element 3 is connected to the connecting pipe 1, and the flow detection element 3 is located downstream of the access end 11 along the gas flow direction. After the exhaust gas flows into the connecting pipe 1 from the access end 11 of the connecting pipe 1, the exhaust gas can further flow to the flow detection element 3, so that the flow detection element 3 can detect the flow of the exhaust gas in the connecting pipe 1. According to the flow change of the exhaust gas detected by the flow detection element 3, it can be determined whether the exhaust gas is normally discharged from the annealing chamber to the connecting pipe 1. In addition, as the annealing process of the perovskite film proceeds, the amount of exhaust gas generated in the annealing chamber may also change accordingly. The flow change detected by the flow detection element 3 during the corresponding time can reflect whether the exhaust gas in the annealing chamber at the corresponding time is normally discharged.

[0035] The flow detection element 3 may specifically include a main body portion 31 and a connecting portion 32 that are interconnected. Flange portions 131 may be provided at opposite ends of the connecting portion 32, and the first connecting pipe 13 and the third connecting pipe 15 are distributed at opposite ends of the connecting portion 32, so that the connecting portion 32 may be flange-connected to the first connecting pipe 13 and the third connecting pipe 15, respectively, and the first connecting pipe 13, the connecting portion 32 and the third connecting pipe 15 may form a gas flow channel extending from the access end 11 of the first connecting pipe 13 to the recovery end 12 of the third connecting pipe 15. The flow detection element 3 may be arranged downstream of the pressure detection element 2 along the gas flow direction. The flow detection element 3 may be a flow sensor.

[0036] The control element is connected to the pressure detection element 2 and the flow detection element 3 so that the control element can receive the pressure signal detected by the pressure detection element 2 and the flow signal detected by the flow detection element 3. The control element can monitor the flow of exhaust gas in the connecting pipeline 1 through the pressure signal and the flow signal. Specifically, when the exhaust gas is discharged from the annealing chamber into the connecting pipeline 1, the pressure detection element 2 and the flow detection element 3 located on the connecting pipeline 1 detect the pressure signal and flow signal of the exhaust gas, and the control element receives the pressure signal and flow signal to determine whether the exhaust gas in the annealing chamber is discharged normally. For example, when the exhaust gas needs to be discharged from the annealing chamber, the control element determines whether the pressure signal and the flow signal change due to the flow of the exhaust gas, and can determine whether the pressure signal and the flow signal also change accordingly according to the change in the amount of exhaust gas generated during the annealing process, thereby monitoring whether the exhaust gas in the annealing chamber is discharged normally. When the control component determines that the exhaust gas in the annealing chamber is discharged normally, the annealing device is operating normally. When the control component determines that the exhaust gas in the annealing chamber is not discharged normally, it can prompt an error signal to remind the staff to adjust the annealing device, thereby ensuring the normal discharge of the exhaust gas in the annealing chamber and the nucleation and crystallization quality of the perovskite film. The control component includes a programmable logic controller (PLC), and the pressure signal detected by the pressure detection element 2 and the flow signal detected by the flow detection element 3 are fed back to the programmable logic controller.

[0037] The exhaust gas monitoring device for the annealing device can be connected to only one annealing chamber and monitor whether the exhaust gas in the annealing chamber is discharged normally; in this case, the annealing device includes a connecting pipe 1, on which a pressure detection element 2 is provided and connected to a flow detection element 3. Alternatively, refer to Figure 3 The exhaust gas monitoring device for the annealing device can be connected to multiple annealing chambers and monitor whether the exhaust gas in the multiple annealing chambers is discharged normally. In this case, multiple connecting pipes 1 can be provided, and the number of connecting pipes 1 can be the same as the number of annealing chambers. Each connecting pipe 1 is connected to an annealing chamber and receives the exhaust gas in the annealing chamber. Each connecting pipe 1 is respectively provided with a pressure detection element 2 and a flow detection element 3, so that the pressure detection element 2 and flow detection element 3 corresponding to each connecting pipe 1 can monitor whether the exhaust gas in the corresponding annealing chamber is discharged normally. Among them, the pressure detection element 2 and flow detection element 3 corresponding to each connecting pipe 1 can be connected to a control element, or the pressure detection elements 2 and flow detection elements 3 corresponding to multiple connecting pipes 1 are connected to the same control element.

[0038] Reference Figure 3 In order to facilitate the installation of the exhaust gas monitoring device for the annealing device, the exhaust gas monitoring device for the annealing device may include a mounting plate 16. A portion of the mounting plate 16 is arranged at the connection between the third connecting pipe 15 and the connecting portion 32 and is fixedly connected to the third connecting pipe 15 and the connecting portion 32. For example, a portion of the mounting plate 16 is fixedly connected to the flange portion 131 of the third connecting pipe 15 and the flange portion 131 of the connecting portion 32 adjacent to the third connecting pipe 15. The mounting plate 16 can be mounted on the frame of the annealing device to be fixedly connected to the frame of the annealing device, or the mounting plate 16 can be mounted on an external fixing frame to be fixed to the external fixing frame, thereby allowing the exhaust gas monitoring device for the annealing device to remain in a fixed position. Among them, one mounting plate 16 can be fixedly connected to multiple connecting portions 32 and multiple flange portions 131 of third connecting pipes 15, respectively.

[0039] The present invention also provides an annealing device exhaust gas monitoring system, comprising the above-mentioned annealing device exhaust gas monitoring device, and further comprising a secondary exhaust pipe. Specifically, the annealing device may include three annealing chambers, and the annealing device exhaust gas monitoring device may include three connecting pipes 1, each connecting pipe 1 being connected to one annealing chamber.

[0040] The secondary emission pipe is connected to multiple connecting pipes 1 and receives the exhaust gas in multiple connecting pipes 1. Specifically, the secondary emission pipe is connected to three connecting pipes 1, and one end of the secondary emission pipe is connected to the target area so that the exhaust gas can be discharged into the target area through the connecting pipe 1 and the secondary emission pipe.

[0041] Although the embodiments of the present invention have been shown and described above, it can be understood that the above embodiments are illustrative and cannot be understood as limiting the present invention. Ordinary technicians in this field can change, modify, replace and modify the above embodiments within the scope of the utility model without departing from the principles and purpose of the utility model. All of these changes should fall within the scope of protection of the claims of the present invention.

Claims

1. An exhaust gas monitoring device for an annealing device, the annealing device comprising an annealing chamber, characterized in that: The exhaust gas monitoring device comprises: A connecting pipe (1) has one end forming an access end (11), wherein the access end (11) is used to connect to the annealing chamber and receive exhaust gas in the annealing chamber; a pressure detection element (2) provided on the connecting pipeline (1), and the pressure detection element (2) is located downstream of the access end (11) along the gas flow direction, and the pressure detection element (2) is used to detect the pressure in the connecting pipeline (1); a flow detection element (3) connected to the connecting pipeline (1), and the flow detection element (3) is located downstream of the access end (11) along the gas flow direction, and the flow detection element (3) is used to detect the flow in the connecting pipeline (1); A control element is connected to the pressure detection element (2) and the flow detection element (3) and is used to monitor the flow of exhaust gas in the connecting pipeline (1).

2. The exhaust gas monitoring device for an annealing device according to claim 1, characterized in that: An end of the connecting pipeline (1) facing away from the access end (11) forms a recovery end (12), and the recovery end (12) is used to be connected to an external recovery component to recover the waste gas in the connecting pipeline (1).

3. The exhaust gas monitoring device for an annealing device according to claim 2, characterized in that: The connecting pipeline (1) comprises a first connecting pipe (13) and a third connecting pipe (15), one end of the first connecting pipe (13) forms the access end (11), and one end of the third connecting pipe (15) forms the recovery end (12); the flow detection element (3) comprises a main body (31) and a connecting portion (32) connected to each other, the connecting portion (32) being arranged between the first connecting pipe (13) and the third connecting pipe (15) and being in communication with the first connecting pipe (13) and the third connecting pipe (15) respectively; The pressure detection element (2) is arranged on the first connecting pipe (13).

4. The exhaust gas monitoring device for an annealing device according to claim 3, characterized in that: A plurality of connecting pipelines (1) are provided, and each connecting pipeline (1) is used to connect to an annealing chamber in the annealing device; each connecting pipeline (1) is provided with the pressure detection element (2) and is connected to the flow detection element (3).

5. The exhaust gas monitoring device for an annealing device according to claim 4, characterized in that: The first connecting pipe (13) is provided with a flange portion (131) at one end adjacent to the connecting portion (32), the third connecting pipe (15) is provided with a flange portion (131) at one end adjacent to the connecting portion (32), and flange portions (131) are respectively provided at opposite ends of the connecting portion (32); the connecting portion (32) is connected to the first connecting pipe (13) and the third connecting pipe (15) respectively through the flange portions (131).

6. The exhaust gas monitoring device for an annealing device according to claim 5, characterized in that: It also includes a mounting plate (16), the mounting plate (16) being connected to the flange portion (131) of the third connecting pipe (15), and the connecting portion (32) being adjacent to the flange portion (131) of the third connecting pipe (15).

7. The exhaust gas monitoring device for an annealing device according to claim 6, characterized in that: The mounting plate (16) is mounted on the frame of the annealing device or on an external fixing frame to fix the exhaust gas monitoring device.

8. The exhaust gas monitoring device for an annealing device according to claim 1, characterized in that: The pressure detection element (2) is a pressure transmitter, the flow detection element (3) is a flow sensor, and the control element includes a programmable logic controller.

9. An annealing device exhaust gas monitoring system, characterized in that: The annealing device includes three annealing chambers, and the annealing device exhaust gas monitoring system includes the annealing device exhaust gas monitoring device according to any one of claims 1 to 8, and the annealing device exhaust gas monitoring device includes three connecting pipes (1), each of the connecting pipes (1) is connected to one of the annealing chambers.

10. The annealing device exhaust gas monitoring system according to claim 9, characterized in that: It also includes a secondary exhaust pipe, which is connected to the plurality of connecting pipes (1) and is used to receive the exhaust gas in the plurality of connecting pipes (1) to discharge the exhaust gas to a target area.

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