Multi-stage circulating cleaning device for semiconductor components
Through the combination of multi-stage cyclic cleaning and dewatering tank, the problem of cleaning agent residue on the surface of the component is solved, and the rapid drying and cleaning of the component is achieved, and the cleaning efficiency is improved.
Patent Information
- Application Number
- CN202421537626.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-07-02
- Publication Date
- 2025-08-26
- Estimated Expiration
- 2034-07-02
AI Technical Summary
After the cleaning of the traditional cleaning device is completed, the residual cleaning agent on the surface of the components is difficult to evaporate effectively, resulting in a long drying time and affecting working efficiency.
A multi-stage circulating cleaning device for semiconductor components is designed. The brackets are placed in multiple cleaning boxes in sequence through the slide plate and the electric push cylinder for multi-stage cleaning. After the cleaning is completed, the dehydration treatment is performed using hydrocarbon cleaning agent in the dewatering tank to ensure that the surface of the components is dry.
It realizes thorough cleaning and rapid drying of component surfaces, prevents dust from adhering, and improves cleaning efficiency.
Smart Images

Figure CN223264387U_ABST
Abstract
Description
Technical Field
[0001] The utility model specifically relates to the technical field of multi-stage circulation cleaning, in particular to a multi-stage circulation cleaning device for semiconductor components. Background Art
[0002] Semiconductor manufacturing process is the key to achieving discrete devices or integrated systems from materials, among which the cleaning process is the most commonly used process step.
[0003] However, after the traditional cleaning device finishes cleaning the components, cleaning agents will remain on the surface of the components. In this case, the surface of the components needs to be blown dry by air drying equipment. During the drying process, the components can no longer be effectively evaporated in a short time, which makes the drying time of the components longer and affects the work efficiency.
[0004] After searching, Chinese patent publication number CN202211575591.6 discloses a wafer cleaning system; including a heating system, a liquid circulation system, a wafer placement device, a filter screen system, a molecular dialysis system and an electric field adsorption system, wherein: the heating system includes a heating module and a cleaning tank, the cleaning tank is located in the middle of the heating module, the cleaning tank is provided with a liquid circulation system, the wafer placement device, the filter screen system, the molecular dialysis system and the electric field adsorption system are sequentially arranged in the liquid circulation system along the direction of liquid flow; the heating module is used to control the temperature of the liquid; the liquid circulation system is used to control the flow rate of the liquid and the ultrasonic vibration frequency of the liquid; the wafer placement device is used to place the wafer, the filter screen system is used to remove particulate impurities, the molecular dialysis system is used to remove molecular impurities, and the electric field adsorption system is used to remove charged particle impurities;
[0005] Although the structure of the above patent can achieve an effective cleaning effect when cleaning the wafer, after cleaning is completed, the process of the above patent cannot effectively volatilize the residual cleaning agent on the surface of the wafer, so that external impurities still adhere to the surface of the wafer;
[0006] In response to the above situation, we provide a multi-stage circulation cleaning device for semiconductor components. In this device, the components to be cleaned are placed on a bracket, and the slide drives the electric push cylinder fixedly installed on the connecting plate to place the bracket into each cleaning box in turn, thereby achieving a multi-stage circulation cleaning effect on the components. After multi-stage cleaning, the surface of the components is effectively kept clean. After cleaning is completed, the push rack is finally placed in the dehydration tank, and the hydrocarbon cleaning agent inside the dehydration tank is used to achieve the dehydration effect on the surface of the components, ensuring that the surface of the components is dry and preventing dust adhesion. Utility Model Content
[0007] The purpose of the utility model is to provide a multi-stage circulation cleaning device for semiconductor components. In this device, the slide drives the electric push cylinder fixedly installed on the connecting plate to place the bracket into the inside of each cleaning box in turn, thereby realizing the multi-stage circulation cleaning effect of the components. After multi-stage cleaning, the surface of the components is effectively cleaned. After the cleaning is completed, the push rack is finally placed in the dehydration tank to solve the problems of the above-mentioned background technology.
[0008] To achieve the above objectives, the present invention provides the following technical solutions:
[0009] A multi-stage circulation cleaning device for semiconductor components includes a cleaning assembly; the cleaning assembly includes a cleaning box; a dehydration tank and a cleaning tank are provided inside the cleaning box; a partition is provided inside the cleaning box to divide the cleaning tank into multiple cleaning tanks; the bottoms of the multiple cleaning tanks are connected to a circulation pump via a first connecting pipe; the circulation pump is fixedly mounted on one side of the circulation box; the dehydration tank is provided at one end of the cleaning box, and the bottom is connected to a storage tank via a second connecting pipe;
[0010] A driving assembly is provided on one side of the cleaning assembly; the driving assembly includes a frame; a rack is installed on the top of the frame; the rack is engaged with the gear; the bottom of the gear is fixedly installed with the second driving motor; the second driving motor is fixed to the frame through a fixing plate.
[0011] As a further technical solution of the present invention, a slide is fixedly installed on the end of the rack; the bottom of the slide is installed in cooperation with the slide groove opened on the frame through a slider; a connecting plate is fixedly installed on the end of the slide away from the rack; the connecting plate is successfully L-shaped; an electric push cylinder is fixedly installed on the connecting plate.
[0012] As a further technical solution of the present invention, a lifting hook is provided at the bottom of the push rod of the electric push cylinder, and a lifting cover is connected below the hook, and a bracket is placed below the lifting cover.
[0013] As a further technical solution of the present invention, the bracket is a rectangular structure, and magnets are fixedly installed at the four inner corners of the bracket, the top of the magnet is higher than the top plane of the bracket, and multiple groups of electrode seats are arranged between any two connected groups of magnets, and mounting holes are opened inside the electrode seats, and pins are installed at the bottom of the electrode seats, and electrodes are placed inside the mounting holes, and the electrodes are electrically connected to the pins;
[0014] A connecting shaft is fixedly installed at the center of the bottom end of the bracket, and clamping grooves are penetrated at symmetrical positions of the connecting shaft.
[0015] As a further technical solution of the present invention, the hanging cover is shaped like a quadrangular pyramid structure, and electromagnets are provided at the four inner corners of the bottom end corresponding to the magnets. A hanging ring is fixedly installed on the top of the hanging cover, and the hanging ring is hung on the hook.
[0016] As a further technical solution of the present invention, the circulation box and the storage box are installed on a side of the cleaning box away from the frame.
[0017] As a further technical solution of the present invention, an electrode groove is provided inside the cleaning tank, and an electrode hole corresponding to the pin is opened at the bottom end of the electrode groove.
[0018] As a further technical solution of the present invention, a motor is fixedly installed at the inner center of the dehydration tank, with the motor rotor pointing vertically upward. The motor rotor is fixed to the connecting groove on the connecting shaft by clamping.
[0019] Compared with the prior art, the beneficial effects of the present invention are:
[0020] The utility model can effectively transfer the components that need to be cleaned through the loading rack during use. The personnel collect the components into the bracket and hang the bracket on the hook at the bottom of the push rod of the electric push cylinder. The driving assembly can realize the components in the bracket passing through the multiple cleaning slots in the cleaning box in sequence, so as to achieve a multi-stage cleaning effect for the components.
[0021] In the utility model, when cleaning, the second driving motor drives the gear to realize the movement of the rack. During the movement of the rack, the slide plate at the end of the rack moves along the slide groove opened on the top of the frame through the slider, ensuring that there will be no deviation during the movement.
[0022] The utility model places the bracket hoisted at the bottom into the cleaning tank through the electric push cylinder installed on the connecting plate after the slide moves into position, so as to realize effective cleaning of the components on the bracket;
[0023] According to the utility model, after the cleaning is completed, the connecting plate and the electric push cylinder are moved into the dehydration tank by moving the slide, and the moisture on the surface of the components is dehydrated by the hydrocarbon cleaning agent inside the dehydration tank. After the treatment is completed, the surface of the components is ensured to be dry, and finally the components are transferred to the next process through the unloading rack. BRIEF DESCRIPTION OF THE DRAWINGS
[0024] Figure 1 It is a three-dimensional structural diagram of the utility model.
[0025] Figure 2 This utility model Figure 1 Another perspective structural diagram.
[0026] Figure 3 This utility model Figure 1 Schematic diagram of the bottom structure.
[0027] Figure 4 This utility model Figure 1 Schematic diagram of the splitting.
[0028] Figure 5 This utility model Figure 4 Bottom view of the cleaning component bottom structure.
[0029] Figure 6 It is a structural diagram of the bracket in the utility model.
[0030] Figure 7 It is a structural schematic diagram of the hanging cover in the utility model.
[0031] Figure 8 It is an exploded view of the electrode holder and the electrode in the utility model.
[0032] Figure 9 It is a bottom view of the bracket in the present utility model.
[0033] In the figure: 1-cleaning component, 2-cleaning box, 11-cleaning tank, 12-circulation box, 13-storage box, 14-circulation pump, 15-dehydration tank, 16-first connecting pipe, 17-second connecting pipe, 2-transmission component, 20-loading rack, 21-unloading rack, 22-first drive motor, 3-drive component, 30-frame, 31-gear, 32-rack, 33-slide plate, 34-connecting plate, 35-electric push cylinder, 36-second drive motor, 4-bracket, 40-hanging cover, 41-magnet, 42-electrode seat, 43-mounting hole, 44-pin, 45-electrode, 46-electromagnet, 47-hanging ring, 48-connecting shaft, 49-clamping groove. DETAILED DESCRIPTION
[0034] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.
[0035] See also Figure 1-9In an embodiment of the present invention, a multi-stage circulation cleaning device for semiconductor components includes a cleaning assembly 1; the cleaning assembly 1 includes a cleaning box 10; a dehydration tank 15 and a cleaning tank 11 are provided inside the cleaning box 10; a partition is provided inside the cleaning box 10 to divide the cleaning box 11 into multiple cleaning tanks 11; the bottoms of the multiple cleaning tanks 11 are connected to a circulation pump 14 through a first connecting pipe 16; the circulation pump 14 is fixedly installed on one side of the circulation box 12; the dehydration tank 15 is provided at one end of the cleaning box 10, and the bottom is connected to the storage box 13 through a second connecting pipe 17;
[0036] A driving assembly 3 is provided on one side of the cleaning assembly 1; the driving assembly 3 includes a frame 30; a rack 32 is installed on the top of the frame 30; the rack 32 is engaged with the gear 31; the bottom of the gear 31 is fixedly installed with the second driving motor 36; the second driving motor 36 is fixed to the frame 30 through a fixing plate.
[0037] In this embodiment, a slide plate 33 is fixedly installed at the end of the rack 32; the bottom of the slide plate 33 is installed in cooperation with the slide groove opened on the frame 30 through a slider; a connecting plate 34 is fixedly installed at the end of the slide plate 33 away from the rack 32; the connecting plate 34 is successfully L-shaped; an electric push cylinder 35 is fixedly installed on the connecting plate 34.
[0038] In this embodiment, a lifting hook is provided at the bottom of the push rod of the electric push cylinder 35 , and a lifting cover 40 is connected below the hook, and a bracket 4 is placed below the lifting cover 40 .
[0039] In this embodiment, the bracket 4 is a rectangular structure, and magnets 41 are fixedly installed at the four inner corners of the bracket 4. The top of the magnet 41 is higher than the top plane of the bracket 4. Multiple groups of electrode holders 42 are provided between any two connected groups of magnets 41, and mounting holes 43 are provided inside the electrode holders 42. Pins 44 are installed at the bottom of the electrode holders 42. Electrodes 45 are placed inside the mounting holes 43, and the electrodes 45 are electrically connected to the pins 44.
[0040] A connecting shaft 48 is fixedly mounted at the center of the bottom end of the bracket 4 , and engaging grooves 49 are formed through the connecting shaft 48 at symmetrical positions.
[0041] In this embodiment, the hanging cover 40 is in the shape of a quadrangular pyramid structure, and electromagnets 46 are provided at the four inner corners of the bottom end corresponding to the magnets 41. A hanging ring 47 is fixedly installed on the top of the hanging cover 40, and the hanging ring 47 is hung on the hook.
[0042] In this embodiment, the circulation box 12 and the storage box 13 are installed on a side of the cleaning box 10 away from the frame 30 .
[0043] In this embodiment, an electrode groove is provided inside the cleaning tank 11 , and an electrode hole corresponding to the pin 44 is opened at the bottom end of the electrode groove.
[0044] In this embodiment, a motor is fixedly installed at the inner center of the dehydration tank 15 , with the motor rotor pointing vertically upward. The motor rotor is fixedly engaged with the engaging groove 49 on the connecting shaft 48 .
[0045] The working principle of the present invention is as follows: when in use, the components to be cleaned are effectively transferred through the loading rack 20, the personnel collect the components into the bracket 4, and hang the bracket 4 on the hook at the bottom of the push rod of the electric push cylinder 35. By controlling the power on and off process of the electromagnet 46 at the position of the hanging cover 40, the hanging cover 40 is lifted and lowered to the bracket 4. The driving assembly 3 is used to sequentially pass the components inside the bracket 4 through the multiple cleaning slots 11 inside the cleaning box 10, thereby achieving a multi-stage cleaning effect on the components.
[0046] During cleaning, the second drive motor 36 drives the gear 31 to move the rack 32. During the movement of the rack 32, the slide 33 at the end of the rack 32 moves along the slide groove opened at the top of the frame 30 through the slider, ensuring that there is no deviation during the movement.
[0047] After the slide plate 33 is moved into position, the bracket 4 hoisted at the bottom is placed inside the cleaning tank 11 by the electric push cylinder 35 installed on the connecting plate 34, so that the components on the bracket 4 can be effectively cleaned.
[0048] At the same time, an electrode tank is set up between the cleaning tanks 11. The function of the electrode tank is to perform the electroplating or coating process. By placing an electrode 45 inside the electrode holder 42, the pin 44 of the electrode 45 is connected to the electrode hole corresponding to the electrode tank to realize power supply, thereby completing the electroplating or coating process.
[0049] After cleaning is completed, the connecting plate 34 and the electric push cylinder 35 are moved into the dehydration tank 15 by moving the slide 33. At this time, the bracket 4 moves to the inside of the dehydration tank 15. After the electromagnet 46 is powered off, the bracket 4 falls to the position of the electrode rotor. At this time, the electrode rotor is connected to the clamping groove 49 at the bottom of the bracket 4, completing the installation process. The moisture on the surface of the components is dehydrated by the hydrocarbon cleaning agent inside the dehydration tank 15. After the treatment is completed, the surface of the components is ensured to be dry. Finally, the components are transported to the next process through the unloading rack 21.
[0050] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above and that the present invention can be implemented in other specific forms without departing from the spirit or essential characteristics of the present invention. Therefore, the embodiments should be considered in all respects as illustrative and non-restrictive, and the scope of the present invention is defined by the appended claims, not the foregoing description, and all variations within the meaning and range of equivalents of the claims are intended to be encompassed within the present invention. Any reference sign in a claim should not be construed as limiting the claim to which it relates.
[0051] In addition, it should be understood that although this specification is described in terms of implementation methods, not every implementation method contains only one independent technical solution. This narrative method of the specification is only for the sake of clarity. Those skilled in the art should regard the specification as a whole. The technical solutions in each embodiment can also be appropriately combined to form other implementation methods that can be understood by those skilled in the art.
Claims
1. A multi-stage circulation cleaning device for semiconductor components, characterized in that: The invention comprises a cleaning assembly (1); the cleaning assembly (1) comprises a cleaning box (10); a dehydration tank (15) and a cleaning tank (11) are provided inside the cleaning box (10); a partition is provided inside the cleaning box (10) to divide the cleaning box (11) into a plurality of cleaning tanks (11); the bottoms of the plurality of cleaning tanks (11) are connected to a circulation pump (14) through a first connecting pipe (16); the circulation pump (14) is fixedly installed on one side of the circulation box (12); the dehydration tank (15) is provided at one end of the cleaning box (10), and the bottom is connected to the storage box (13) through a second connecting pipe (17); A driving assembly (3) is provided on one side of the cleaning assembly (1); the driving assembly (3) includes a frame (30); a rack (32) is mounted on the top of the frame (30); the rack (32) is meshed with a gear (31); the bottom of the gear (31) is fixedly mounted with a second driving motor (36); the second driving motor (36) is fixed to the frame (30) via a fixing plate.
2. The multi-stage circulation cleaning device for semiconductor components according to claim 1, characterized in that: A slide plate (33) is fixedly mounted on the end of the rack (32); the bottom of the slide plate (33) is mounted in cooperation with a slide groove provided on the frame (30) through a slider; a connecting plate (34) is fixedly mounted on the end of the slide plate (33) away from the rack (32); the connecting plate (34) is successfully L-shaped; an electric push cylinder (35) is fixedly mounted on the connecting plate (34).
3. The multi-stage circulation cleaning device for semiconductor components according to claim 1, characterized in that: A lifting hook is provided at the bottom of the push rod of the electric push cylinder (35), and a lifting cover (40) is connected below the hook, and a bracket (4) is placed below the lifting cover (40).
4. The multi-stage circulation cleaning device for semiconductor components according to claim 3, characterized in that: The bracket (4) is a rectangular structure, and magnets (41) are fixedly installed at the four inner corners of the bracket (4), the top of the magnet (41) is higher than the top plane of the bracket (4), and multiple groups of electrode seats (42) are arranged between any two connected groups of the magnets (41), and mounting holes (43) are opened inside the electrode seats (42), and pins (44) are installed at the bottom of the electrode seats (42), and electrodes (45) are placed inside the mounting holes (43), and the electrodes (45) are electrically connected to the pins (44); A connecting shaft (48) is fixedly mounted at the center of the bottom end of the bracket (4), and engaging grooves (49) are provided through symmetrical positions of the connecting shaft (48).
5. The multi-stage circulation cleaning device for semiconductor components according to claim 3, characterized in that: The hanging cover (40) is in the shape of a quadrangular pyramid structure, and electromagnets (46) are provided at the four inner corner positions of the bottom end corresponding to the magnets (41). A hanging ring (47) is fixedly installed at the top end of the hanging cover (40), and the hanging ring (47) is hung on a hook.
6. The multi-stage circulation cleaning device for semiconductor components according to claim 1, characterized in that: The cleaning component (1) is equipped with a transmission component (2) at both ends; the transmission component (2) includes a loading rack (20) and a unloading rack (21); wherein the unloading rack (21) is equipped with an end of the cleaning box (10) provided with a dewatering tank (15); a first drive motor (22) is fixedly installed on one side of the loading rack (20).
7. The multi-stage circulation cleaning device for semiconductor components according to claim 1, characterized in that: The circulation box (12) and the storage box (13) are installed on a side of the cleaning box (10) away from the frame (30).
8. The multi-stage circulation cleaning device for semiconductor components according to claim 1, characterized in that: An electrode groove is provided inside the cleaning tank (11), and an electrode hole corresponding to the pin (44) is opened at the bottom end of the electrode groove.
9. The multi-stage circulation cleaning device for semiconductor components according to claim 1, characterized in that: A motor is fixedly installed at the inner center of the dehydration tank (15), with the motor rotor pointing vertically upward. The motor rotor is fixedly engaged with the engaging groove (49) at the connecting shaft (48).
Citation Information
Patent Citations
Wafer cleaning system
CN115889332A